JP5212681B2 - Defect correction method for color filter forming substrate - Google Patents

Description

  The present invention relates to a defect correcting method and a color filter substrate subjected to defect correction in a color filter forming substrate in which a multilayer film including a colored layer of a color filter is disposed on a glass substrate.

A color filter forming substrate for a display device using a liquid crystal display element or the like (hereinafter also referred to as a color filter substrate or a CF substrate) is, for example, Bk (black), R (red), G (green), B on the substrate. A (blue) fine colored pattern (also referred to as a colored layer) is formed, and an overcoat layer is formed on the colored pattern. When producing such a color filter forming substrate, during the manufacturing process, A pattern defect occurs with a certain probability due to a minute foreign matter that is generated or exists in the material.
The defects of the colored pattern are mainly classified into black defects caused by extra pattern portions and minute foreign matters, and white defects (color loss defects or pattern defect defects) in which patterns are missing or whitish colors are lost.
A black defect is not only visually recognized as a dark point, but also has a protrusion due to a foreign substance or the like. If there is a protrusion, the color filter substrate is bonded to the TFT substrate and the display panel is assembled. In addition, the protrusion reaches the TFT substrate, causing a short circuit, which may cause a serious product failure.
The white defect is a defect that should be avoided when a liquid crystal display element is assembled and displayed, even if it is a small defect of several tens of microns, it shines like a pinhole and stands out.
In recent years, with the increase in the pattern area accompanying the increase in the screen size of liquid crystal display elements, black defects and white defects have become more likely to occur, and the quality requirements for defects in colored patterns have become increasingly severe. The importance of pattern defect correction is increasing.

Under such circumstances, recently, even if a defective portion is generated, in order to improve the yield and do not impair the productivity, a partially defective portion as shown in Japanese Patent Laid-Open No. 6-109919 (Patent Document 1). The technology to correct this has come to be established.
The defect repairing method described here is one in which the black defect is burned and scattered by a laser, or a colored UV curable resin is applied to the color defect portion of the white defect and cured by UV.
JP-A-6-109919

As a means for applying the colored ultraviolet curable resin, a required amount of paste is dropped by a dispenser as described in the above publication, an inkjet method, or as disclosed in Japanese Patent Laid-Open No. 8-182949 (Patent Document 2). There is a means for attaching a color ultraviolet curable resin to the tip of a needle-like object whose tip forms a flat surface and pressing it against a defective part. Among these, a method of directly applying a color ultraviolet curable resin with a needle-like material is considered preferable because it can cope with finer white defects.
JP-A-8-182949

Here, an example of a conventional defect correction method will be briefly described with reference to FIG.
In FIG. 4, the defect correction is performed after the colored pattern layer is formed and before the overcoat layer is formed.
For example, when there is a white defect 440 in the second colored pattern layer 422 of the color filter substrate for a liquid crystal display device (FIG. 4A), the correction ink 465 is partially coated directly on the white defect 440 location. In addition to this, there is a basic correction method (FIG. 4 (b)), but in addition to this, a laser is used to make holes so as to reach the glass substrate 410 in a region size including a defective portion (FIG. d)), there is a correction method in which a correction ink 465 is coated on the hole 450 (FIG. 4E) and correction is performed.
Further, for example, in the case where there is a black defect 445 due to foreign matter in the second colored pattern layer 422 (FIG. 4C), as in the latter method, the region size including the defective portion is obtained by a laser. A hole was formed so as to reach the glass substrate 410 (FIG. 4D), and correction was made by applying a correction ink 465 to the hole 450.
Here, the colored pattern defect portion formed when the foreign substance in the black defect portion is removed by correction is also referred to as a white defect.
JP 10-268122 A

However, even if the ink used for correction is appropriate and highly reliable, in the above-described conventional method for correcting defects in the colored pattern, it is assumed that correction is performed immediately after forming the colored pattern. In the case of a color filter substrate for an IPS (In Plane Switching) type liquid crystal display device, it corresponds to a white defect discovered after the formation of an overcoat layer (also referred to as a protective film) or a white defect standard change due to customer circumstances, etc. I can't.
Similarly, in the case of a color filter substrate for a VA (Vertical Alignment) type liquid crystal display device, correction after ITO film formation cannot be performed.
Incidentally, the black defect is also dealt with by a conventional correction by a polishing method.

In a color filter forming substrate used for a display device using a liquid crystal display element or the like, black defects and white defects are likely to occur as the pattern area increases with the recent increase in screen size. As the quality requirements for pattern defects are becoming more stringent and the importance of defect correction for colored patterns is increasing, more efficient correction is required, and the conventional overcoat layer ( (Also called a protective film) A method that can overcome the limitation of not being able to cope with defects found and defect standard changes due to customer circumstances after the formation of the ITO film on the overcoat layer Was demanded.
The present invention corresponds to these, and can be expected to improve the efficiency of correction, and was discovered after the overcoat layer was formed on the colored layer and further after the ITO film was formed on the overcoat layer. An object of the present invention is to provide a defect correction method for a color filter forming substrate for a display device, which corrects a defect.
At the same time, it is an object of the present invention to provide a color filter forming substrate for a display device modified by such a modification method.

The defect correction method for a color filter forming substrate according to the present invention is a method for correcting a defect in a color filter forming substrate comprising a multilayer film having a colored layer of a color filter on a glass substrate and an overcoat layer as the uppermost layer. A method comprising: irradiating a region including various defect portions of any layer of the multilayer structure film with laser light, removing the lowermost layer of the multilayer structure film in the region, and A white defect portion that spans all the layers of the film is formed, and the white defect portion that has been formed includes a solvent component for correcting the white defect portion of each layer from the bottom layer to the top layer in order. After applying the solution, drying or heat treatment (also called baking) to remove the solvent, and after curing, forming a solid film that is not liquid, the correction solution is applied. Flat in the liquid application area Against a surface, planarizing the corrective liquid coating region, which a planarization process is performed, solution for modifications to correct the white defect portion of the top layer is a UV-curable top layer of white the correcting fluid for correcting a defective portion is applied, the top layer formed performs a UV curing process for curing by irradiation with UV light, at least one of the previous SL colored layer of a color filter, heat A curable resin, a thermosetting resin is applied, and a thermosetting treatment is performed to heat and cure the formed layer, and the lowermost layer of the multilayer structure film. The laser beam irradiated when removing the above is the third harmonic or the fourth harmonic of YAG, and the UV curing treatment is performed as UV light when removing up to the lowest layer of the multilayered film. 3rd harmonic or 4th harmonic of YAG same as laser light It is characterized in that is performed using.
Here, “coating and film formation” means that a correction liquid containing a solvent is applied, drying or heat treatment (baking) is performed to remove the solvent, and a curing process is performed. It means to form as a solid film.

In the above-described defect correction method for the color filter-formed substrate , the UV curing treatment involves locally irradiating the correction liquid application region with UV light, or irradiating the entire substrate with UV light. It is characterized by being.
And also wherein the be any defect correction method of the color filter formation substrate, the thermosetting process heats the locally modified for liquid application region, or is intended to heat the entire substrate It is what.
Here, the “applied and formed (uppermost) layer” is formed by applying a correction liquid containing a solvent component and performing drying or heat treatment (baking) to remove the solvent component ( Top) layer ”.

  Also, in any one of the above color filter forming substrate defect correction methods, the correction liquid is applied in several steps for at least one of the layers formed by applying the correction liquid. It is what.

Further, in any one of the above-described defect correction methods for a color filter forming substrate, the laser beam is irradiated to remove the lowermost layer of the multilayer structure film in the region, so that all layers of the multilayer structure film are formed. The shape of the white defect portion to be removed by the laser beam when forming the straddling white defect portion is a circular shape or an elliptical shape.
The circular shape referred to here includes, for example, a shape close to a circle such as the outer shape of a figure formed by superimposing polygons of pentagons or more, and an elliptical shape also conforms to this.

Also, in any one of the above-described defect correction methods for the color filter forming substrate, the correction liquid is applied with an application needle.
Alternatively, in any one of the above-described defect correction methods for the color filter forming substrate, the correction liquid is applied by an inkjet method application.
Alternatively, in any one of the above-described defect correction methods for the color filter forming substrate, the correction liquid is applied by a dispenser.

(Function)
The defect correction method of the color filter forming substrate of the present invention can be expected to improve the efficiency of the correction, and was discovered after the overcoat layer was formed on the colored layer and further after the ITO film was formed on the overcoat layer. It is possible to provide a defect correction method for a color filter forming substrate for a display device that corrects a defect.
As described above, in the conventional method for correcting a defect in a colored pattern, correction is basically performed immediately after the colored pattern is formed. In the case of a color filter substrate for an IPS type liquid crystal display device, an overcoat layer is formed. It has been said that it cannot cope with defects discovered later or defect standard changes due to customer circumstances, etc. In the case of color filter substrates for VA type liquid crystal display devices, correction after ITO film formation Although it has been said that it cannot be performed, the present invention has been found to cope with these problems.
Specifically, the multilayer structure film is irradiated with a laser beam to a region including various defects in any layer of the multilayer structure film, and the multilayer structure film is removed to the lowest layer of the multilayer structure film. A white defect portion that spans all the layers of the film is formed, and the white defect portion that has been formed includes a solvent component for correcting the white defect portion of each layer from the bottom layer to the top layer in order. Applying the liquid for correction, applying drying or heat treatment (baking) to remove the solvent component, further curing, forming a solid film that is not liquid, and then applying the liquid for correction A flat surface is pressed against the area to flatten the correction liquid application area, and a flattening process is performed , and the correction liquid for correcting the white defect portion of the uppermost layer is UV curable, Apply and apply correction liquid to correct the top white defect. The top layer performs a UV curing process for curing by irradiation with UV light was, at least one of the previous SL colored layers of the color filter is a thermosetting resin, for modifying a thermosetting resin A laser beam is applied to remove the bottom layer of the multilayered film, and the third harmonic of YAG is applied. The third or fourth harmonic of the same YAG as the laser beam irradiated when removing the UV light up to the bottom layer of the multilayer structure film. by is performed using, we have achieved this.
In particular, the quality can be improved by performing a flattening step in which a flat surface is pressed against the correction liquid application region to which the correction liquid is applied to flatten the correction liquid application region.
In addition, by irradiating with laser light, the region up to the lowest layer of the multilayer structure film is removed to form a white defect portion that spans all layers of the multilayer structure film. From the bottom layer to the top layer in order, when applying a correction liquid for correcting the white defect portion of each layer and forming a film, the shape and size of the white defect portion formed by laser irradiation By controlling the (size) and controlling the correction liquid for correcting the white defect portion of each layer to a predetermined amount, it is possible to obtain a uniform correction state, and full automation of the correction can be expected. .
Further, for each defect portion to be corrected, by controlling the shape and size (size) of the white defect portion formed by irradiating the laser beam, that is, the white defect portion formed by the laser beam has the same shape, By setting the same size, correction can be performed under the same processing conditions, and the correction efficiency can be improved.
For this purpose, the shape and size (size) of the white defect portion formed by irradiating the laser beam in advance, a predetermined amount of correction liquid for correcting the white defect portion of each layer, and the application state of each layer Or data relating the film formation state, and using this as a database, it is possible to automatically control the irradiation condition of the laser beam and the application amount of the correction liquid.

The correction liquid for correcting the white defect portion of the uppermost layer is UV curable, and the correction liquid for correcting the white defect portion of the uppermost layer is applied and UV light is applied to the formed uppermost layer. It is a form in which a UV curing process is performed by irradiating and curing , and at least one of the colored layers of the color filter is a thermosetting resin, and is formed by applying a correction liquid that is a thermosetting resin. layer a thermosetting process for curing by heating in a row Umono the can as easily modifications.
For example, examples of the UV curing treatment include a mode in which the correction liquid application region is locally irradiated with UV light, or a mode in which the entire substrate is irradiated with UV light.
Examples of the type of the UV light source include a high-pressure mercury UV lamp, a UV-LED, and a YAG laser, and a laser that forms a white defect can be used in combination.
Also, as the thermosetting process, the form is heated locally modified for liquid application region, or include the form of heating the entire substrate.

Further, for at least one of the layers formed by applying the correction liquid, the correction liquid is applied in several times, so that the correction liquid is applied in the form of the invention of claim 4. And the amount of coating can be controlled easily.

In addition, the white light to be removed by the laser beam when the white defect portion extending over the whole layer of the multilayer structure film is formed by irradiating the laser beam to remove the region up to the lowest layer of the multilayer structure film. Examples of the shape of the defect portion include a circular shape or an oval shape in terms of the spread of the applied correction liquid.
As described above, the circular shape referred to here includes a shape close to a circle, such as the outer shape of a figure in which polygons of five or more pentagons are overlapped, and an elliptical shape also conforms to this.
In short, any shape can be used as long as the applied correction liquid can be uniformly spread, but a circular shape and an elliptical shape can be mentioned as general shapes.
The angle formed by the tangent lines on both sides sandwiching each point is preferably large at all points on the outer peripheral line of the white defect portion to be removed by the laser beam. Specifically, the angle formed by the tangent lines on both sides sandwiching each point is as follows: It is preferable that the size is not less than one interior angle (108 °) of a regular pentagon.

  Examples of the means for applying the correction liquid include a first method in which application is performed with an application needle, a second method in which application is performed by an inkjet method, and a third method in which application is performed with a dispenser.

As the laser beam to be irradiated, the third harmonic or the fourth harmonic of YAG is used.
When removing each layer using such a laser beam, because of the short wavelength, only the absorption at the surface, the absorption is not deep, the absorption region is limited and the excavation resolution is high, There is no thermal influence (becomes a keloid) seen in the case of a long wavelength (335 nm or more), and the amount of excavation by the laser is easily controlled.

Further, UV hardening process of the uppermost overcoat layer is to perform by using the third harmonic or the fourth harmonic of YAG as UV light, to form a white defect portion by irradiating a laser beam and processing, and the UV curing treatment, performed by irradiating the same light, in order to both processes, for example, can also serves as a light source, a device configuration for both processes can be simplified.

As described above, the present invention can be expected to improve the efficiency of correction, and correct defects found after the overcoat layer is formed on the colored layer and further after the ITO film is formed on the overcoat layer. It is possible to provide a defect correction method for a color filter forming substrate for a display device.
Furthermore, the automation of such a correction method is facilitated.
At the same time, it is possible to provide a color filter forming substrate for a display device corrected by such a correction method.

Embodiments of the present invention will be described with reference to the drawings.
FIG. 1A to FIG. 1E are diagrams for explaining the steps of the first example of the embodiment of the defect correcting method for a color filter forming substrate according to the present invention. FIG. 1 (a1) and FIG. FIGS. 1B to 1E are diagrams for explaining the steps of the second example of the embodiment of the defect correction method for a color filter forming substrate according to the present invention. FIGS. 1A1 and 1C1 to FIG. FIG. 1 (e1) is a view for explaining the steps of the third example of the embodiment of the defect correcting method of the color filter forming substrate of the present invention, and FIGS. 2 (a) to 2 (c) are shown in FIG. FIG. 3 shows a defect correcting method for a color filter forming substrate of the first example shown in a wider section of the color filter forming substrate, and FIG. 3 shows a laser irradiation apparatus used for the defect correcting method for the color filter substrate of the present invention. It is the figure which showed schematic structure of one example.
1-3, 1 and 2 are color filter substrates before correction, 1a and 2a are color filter substrates before correction, 10 is a transparent substrate, 10A is a color filter substrate before correction, and 10B is a color filter after correction. Substrate, 15 is a black matrix portion (also referred to as a fourth colored pattern layer), 20 is a colored layer (also referred to as a colored pattern layer), 20a is a first colored pattern layer (Red), and 20b is a second colored pattern layer. (Green), 20c is a third colored pattern layer, 30 is an overcoat layer, 35 is a raised portion (of the overcoat layer), 37 is a white defect, 40 is a black defect (also referred to as a foreign object), 50 is a laser beam, 55 is a white defect part (also referred to as a removal part), 61 is a correction liquid (for the colored layer), 62 is a correction liquid (for the overcoat), and 61a is a correction liquid (for the first colored pattern layer). , 6 a is a correction liquid (for overcoat), 70 is a pressing member, 70S is a flat surface (also referred to as a flat portion), 110 is a color filter forming substrate, 120 is a substrate holder, 130 is an XY stage, and 140 is a laser beam (YAG laser of 355 nm wavelength here), 150 is a laser irradiation means, 156 is an objective lens, 160 is a guide rail for Z direction movement, 170 is a control unit, 180 is a database for irradiation intensity control, and 190 is a display monitor.

First, a first example of an embodiment of a defect correction method for a color filter forming substrate according to the present invention will be described with reference to FIG.
In the first example of the defect correcting method for the color filter forming substrate, the colored pattern layer 20 (corresponding to 15, 20a, 20b, and 20c in FIG. 2) and the overcoat layer 30 are sequentially formed on one surface of the transparent substrate 10. A defect correcting method for correcting a black defect in a colored layer 20 (corresponding to the first colored layer in FIG. 2) in a color filter substrate for an IPS (In Plane Switching) type liquid crystal display device. A region including the defect portion 40 is irradiated with a laser beam 50, and the region up to the lowest layer of the multilayer structure film is removed to form a white defect portion 55 extending over all layers of the multilayer structure film. The correction liquid for correcting the white defect portion of each layer is applied to the formed white defect portion 55 in order from the lowermost layer to the uppermost layer, and after the film is formed, the correction liquid is applied. In the liquid application area, By pressing a Tanmen, planarizing the corrective liquid coating region, in which a planarization process is performed.
In the color filter substrate defect correcting method of this example, the black defect 40 of the colored layer 20 is not corrected until the overcoat layer 30 is formed, and the black defect portion 40 of the colored layer 20 is formed after the overcoat layer 30 is formed. Applies when correcting
For example, although the manufacturer has delivered the black defect 40 of the colored layer 20 to the customer as an inspection OK, the black color layer on the customer side is changed by changing the defect standard or by the difference in the inspection level between the customer and the manufacturer. This is applied to the case where the black defect pointed out is corrected with respect to the product which is set to OUT by the defect 40.
The defect correction method of the color filter forming substrate of this example can be expected to improve the efficiency of the correction, and was discovered after the overcoat layer was formed on the colored layer and further after the ITO film was formed on the overcoat layer. It is possible to provide a defect correction method for a color filter forming substrate for a display device that corrects a defect.
In this example, as the color filter forming substrate 1 to be corrected (corresponding to 10A in FIG. 2), a first colored pattern layer (20a in FIG. 2) and a second colored pattern layer (20b in FIG. 2). The third colored pattern layer (20c in FIG. 2) and the black matrix (fourth colored pattern layer in FIG. 2 in FIG. 2) are all formed using the pigment dispersion method. .

The defect correcting method for the color filter forming substrate of the first example will be described with reference to FIGS. 1 (a) to 1 (e).
Note that FIGS. 2A to 2C show the correction states of corresponding portions in a larger range.
As shown in FIG. 1A (corresponding to FIG. 2A), the black defect 40 exists between the colored layer 20 and the overcoat layer 30 in the color filter forming substrate 1 to be corrected. Here, the black defect 40 is corrected as follows.
Here, the overcoat layer 30 on the black defect 40 is slightly raised.
First, the region including the black defect 40 is irradiated with the laser beam 50, and the lowermost layer of the region is removed to form a white defect portion 55 extending over the entire layer. (Equivalent to FIG. 1 (b) and FIG. 2 (b))
The laser beam 50 is not particularly limited as long as it has a high resolution of excavation for removing each layer and does not cause a problem in quality such as the influence of heat (becomes a keloid) and is easy to control. For example, the third harmonic or the fourth harmonic of YAG can be mentioned.
In the case of the third harmonic or the fourth harmonic of YAG, when each layer is removed, since it is a short wavelength, only absorption at the surface is not deep, absorption is limited, and the resolution of excavation is limited. In addition, there is no influence of heat (becomes a keloid shape) seen in the case of a long wavelength (335 nm or more), and the amount of excavation by the laser is easily controlled.

Irradiation with the laser beam 50 is performed by, for example, a laser irradiation apparatus configured as shown in FIG.
3 includes a drive monitor (XY stage 130, Z-direction moving guide rail 160), laser irradiation means 150, a display monitor 190 as a confirmation means for confirming the state of the defective portion, and the like. The irradiation intensity control database 180 for facilitating the control of the irradiation intensity is provided, but each unit is controlled by the control unit 170 to perform a predetermined irradiation operation.
The laser irradiation means 150 is simply provided with a laser light generation unit, a transmittance variable filter, a lens, an aperture for forming laser light, a lens, an objective lens, and the like, forming an optical system, and formed. The laser light is condensed and irradiated by the objective lens 156, but a shutter, a filter, a half mirror, a total reflection mirror and the like for controlling the irradiation shot of the laser light are not clearly shown, but are provided as necessary. .
Here, a light source and an imaging device are incorporated so that an image can be obtained on an observation or display monitor 190 via a half mirror in the optical system of the laser irradiation means 150.
The database 180 for controlling the irradiation intensity is a database of irradiation intensity that can remove the resin portion and that does not damage the underlying layer. The irradiation area size also provides a guideline that can be adjusted to a predetermined controlled irradiation intensity.
For example, in the optical system, when the irradiation intensity is adjusted only by the transmittance level of the transmittance variable filter and the reduction magnification of the objective lens at a predetermined aperture opening, the transmittance level of the transmittance variable filter, Using the reduction magnification of the objective lens as a parameter, it is possible to give a condition that the irradiation intensity is within a desired range for various resin member qualities.
In addition, the defect correcting apparatus shown in FIG. 3 has a mechanism that can change the area size without controlling the aperture, and without changing the reduction magnification, although it is not explicitly shown. I have.
Thereby, the irradiation area can be easily changed with the same irradiation intensity, and the defect can be removed by avoiding the irradiation to the part where the resin is removed as much as possible so as not to apply the laser as much as possible to the base.

Next, a correction liquid for correcting the white defect portion of each layer is applied to the formed white defect portion 55 in order from the lowermost layer to the uppermost layer to form a film. (Fig. 1 (c))
The correction ink is applied, for example, by placing a color filter substrate on an XY stage, performing XY control, and using a dispenser, a microsyringe, a needle-like application unit, and the like at a predetermined position. Coating.
Then, after coating, if necessary, a correction liquid containing a solvent component is applied, drying or heat treatment (baking) is performed to remove the solvent component, a curing process is performed, and a solid film that is not liquid Form as.
Here, the correction liquid for the colored layer (corresponding to 20a in FIG. 2) is a thermosetting resin.
At least one of the correction liquids is a thermosetting resin, and the form of applying the correction liquid that is a thermosetting resin and performing a thermosetting process of heating and curing the formed layer is an operation. From the viewpoint of sex.
Further, here, the correction liquid for correcting the white defect portion of the uppermost layer (overcoat layer 30) is UV curable, and the correction liquid for correcting the white defect portion of the uppermost layer is applied, Although the formed uppermost layer is cured by irradiation with UV light, the present invention is not limited to this.
Incidentally, the light for photocuring includes all wavelengths of visible and non-visible regions capable of causing a photoreaction in the modified photoreactive functional group, such as microwaves, visible light, ultraviolet rays, electromagnetic waves, Although all the electron beams etc. are contained, the form which performs UV hardening process is preferable from the surface of workability | operativity.
As said thermosetting process, the form which heat-processes with respect to a defective part locally, and the form which heat-processes with respect to the whole color filter formation board | substrate are mentioned.
Moreover, as said UV hardening process, the form which performs a UV irradiation process to a defective part locally, and the form which performs a UV irradiation process with respect to the whole color filter formation board | substrate are mentioned.

As the application of the correction liquid, the application state and the application amount of the correction liquid can be appropriately controlled by performing the application while observing the application in several times.
Moreover, as a shape of the white defect part 55 removed with the laser beam 50, the shape which can make the spreading | diffusion of the apply | coated correction | amendment liquid uniform is preferable, for example, circular shape or an oval shape is mentioned.
As described above, the circular shape mentioned here includes a shape close to a circle, for example, the outer shape of a figure formed by superimposing polygons of five or more pentagons, and an elliptical shape conforms to this. .
In short, any shape can be used as long as the applied correction liquid can be uniformly spread, but a circular shape and an elliptical shape can be mentioned as general shapes.
The shape of the white defect portion 55 is preferably such that, at all points on the outer peripheral line of the white defect portion to be removed by laser light, the angle formed by the tangent lines on both sides sandwiching each point is large. Specifically, it is preferable that the angle formed by the above is greater than or equal to one interior angle (108 °) of a regular pentagon.

After the film formation, the flat surface 70S is pressed by the pressing member 70 onto the correction liquid application area to which the correction liquid is applied (FIG. 1D), and the correction liquid application area is flattened. (Equivalent to FIG. 1 (e) and FIG. 2 (c))
The flat surface 70S covers the entire correction application region, and is preferably slightly convex outward from the center of the defect correction portion in terms of contact.
Here, the flat surface 70S may be subjected to water repellent treatment as necessary.
It is desirable to cure the correction liquid while the flat surface 70S is pressed, particularly when the fluidity of the liquid is high.
The thermosetting correction liquid may be heated by heat conduction from the pressing member 70.
Further, heating by infrared rays using a halogen lamp or the like may be used.
In the UV curable correction liquid, the UV light is irradiated through the transparent substrate 10 or the pressing member 70 is formed of a transparent material such as glass and the UV light is irradiated through the flat surface 70S. You can also.
As a result, it is possible to make the correction portion the same as the peripheral portion in terms of quality.
In this way, the defect correcting method for the color filter forming substrate of the first example is performed.

In the first example, as the color filter forming substrate 1 to be corrected (corresponding to 10A in FIG. 2), the first colored pattern layer (20a in FIG. 2) and the second colored pattern layer (FIG. 2n20b). The third colored pattern layer (20c in FIG. 2) and the black matrix (fourth colored pattern layer, 15 in FIG. 2), all colored pattern layers formed using the pigment dispersion method are used. However, it is not limited to this.
The transparent substrate 10 is usually a glass substrate such as non-alkali glass or a plastic substrate.
In addition to those formed by the pigment dispersion method, those in which each colored pattern layer is formed by a conventionally known dyeing method, electrodeposition method, printing method, ink jet method or the like may be used.
Below, the formation method of each said colored pattern layer is demonstrated easily.
In the pigment dispersion method, a step of forming a photosensitive resin layer in which a pigment is dispersed on a substrate and patterning it to obtain a monochromatic colored pattern layer is repeated to form a colored pattern layer of each color.
In the dyeing method, a water-soluble polymer material, which is a dyeing material, is applied onto a glass substrate, patterned into a desired shape by a photolithography process, and then the resulting pattern is immersed in a dyeing bath and colored. The process of obtaining the pattern is repeated to form a colored pattern layer for each color.
The electrodeposition method repeats a process of patterning a transparent electrode on a substrate and immersing it in an electrodeposition coating solution containing a pigment, a resin, an electrolytic solution, etc. and electrodepositing a predetermined color. To thermally cure the resin.
In the printing method, a pigment is dispersed in a thermosetting resin, each color is separately applied by repeating printing, and then the resin is thermally cured to form a colored layer.
In the ink jet method, a color filter portion is formed by discharging a liquid containing a colorant (hereinafter also referred to as ink or paste) from an opening such as a nozzle or an orifice.
For the black matrix portion 130, a light shielding layer mainly composed of chromium formed by sputtering or the like may be used in addition to the one formed by the above forming method.

The color layer correction liquid (also referred to as correction ink) contains at least a colorant, a monomer and / or polymer having a reactive functional group, and a solvent.
The correction ink is preferably blended with a polymerization inhibitor and / or a pigment dispersant and / or a polymerization initiator.
In addition, a surfactant, a crosslinking agent, and the like may be added.
The reaction type of the reactive functional group is not particularly limited as long as it is a curing reaction. For example, it may belong to either photoreaction or thermal reaction in terms of reaction energy, radical polymerization in terms of active species, It may belong to any of cationic polymerization, anionic polymerization, photodimerization reaction and the like.
Preferably, it contains at least a colorant, a monomer having a reactive functional group, a polymer, and a solvent described in JP-A-2004-67777 filed by the applicant of the present application, and the blending amount of the solvent is ink. Examples thereof include ink for correcting colored pattern defects that is 25% to 70% by weight of the total and the viscosity of the ink is 40 to 300 mPa · sec.
The colorant that can be used in the correction ink is not particularly limited, but is preferably selected according to the color of the color pattern to be corrected, and various organic or inorganic pigments can be used.

The overcoat layer 30 is also called a protective film, and a general cross-linked polymer material such as acrylic, styrene, polyether or polyimide is usually used.
In this case, in forming the overcoat layer, for example, a spin coating method, a roll coating method, a bar coating method, a casting method, or the like can be applied to the colored pattern layer of the color filter substrate. It is sufficient if the surface can be flattened.
Here, as a correction liquid (also referred to as correction ink) for the overcoat layer 30, from the viewpoint of workability, a UV curing type liquid is used, and after the coating film is irradiated with light and UV cured, If the workability is good and there is no problem in terms of quality, there is no limitation to this.
Here, light includes all wavelengths in the visible and non-visible regions that can cause photoreactive functional groups to cause photoreactions, such as microwaves, visible light, ultraviolet rays, electromagnetic waves, and electron beams. Etc. are all included.

Next, a second example of the embodiment of the defect correction method for a color filter forming substrate according to the present invention will be described with reference to FIGS. 1 (a1) and 1 (b) to 1 (e).
The defect correction method for the color filter forming substrate of the second example is to correct the white defect 37 of the uppermost layer (overcoat layer 30) with the same color filter forming substrate as that of the first example being corrected. Briefly, the region including the white defect 37 is irradiated with the laser beam 50, and the region up to the lowest layer of the multilayer structure film is removed from the region, and the white defect portion 55 extending over the entire layer of the multilayer structure film. The correction liquid for correcting the white defect portion of each layer is applied to the formed white defect portion 55 in order from the lowermost layer to the uppermost layer, and after the film formation, the correction liquid is applied. A flattening step of flattening the correction liquid application area by pressing a flat surface against the correction liquid application area is performed.
The processing in FIGS. 1B to 1E is the same as that in the first example, and a description thereof will be omitted.
Each part and the correction liquid are the same as in the first example, and the description thereof is omitted here.

Next, a first embodiment of a defect correction method for a color filter forming substrate according to the present invention will be described with reference to FIGS. 1 (a1) and 1 (c1) to 1 (e1).
The defect correction method for the color filter forming substrate of Reference Embodiment 1 is targeted for the same color filter forming substrate as in the first and second examples, and the top layer is the same as in the second example. The white defect 37 of the (overcoat layer 30) is corrected, but the entire layer in the region including the defective portion is not removed by the laser beam.
In the first embodiment, for example , the white defect 37 of the uppermost layer (overcoat layer 30) shown in FIG. 1 (a1) is coated with a correction liquid for correcting this to form a film (FIG. 1). 1 (c1)), a flat surface is pressed against the correction liquid application area to which the correction liquid 62 has been applied (FIG. 1 (d1)) to flatten the correction liquid application area. (Fig. 1 (e1))
The application of the correction liquid 62 and the pressing of the flat surface are the same as in the first example, and the description is omitted.
Each part and the correction liquid are also the same as in the first example, and the description is omitted here.

The first example, the second example, and the reference embodiment example 1 are all methods for correcting a color filter forming substrate for an IPS (In Plane Switching) type liquid crystal display device, but are not limited thereto. For example, even when a defect correction method for a color filter substrate for a VA (vertical alignment) type liquid crystal display device in which a colored pattern layer, an overcoat layer, and an ITO pattern layer are sequentially formed on a transparent substrate is used. In particular, the correction method can be applied in the same manner.
The method for correcting a color filter forming substrate of the present invention can be applied to the defect correction of a multilayer film having various layer configurations.

FIG. 1A to FIG. 1E are diagrams for explaining the steps of the first example of the embodiment of the defect correcting method for a color filter forming substrate according to the present invention. FIG. 1 (a1) and FIG. FIGS. 1B to 1E are diagrams for explaining the steps of the second example of the embodiment of the defect correction method for a color filter forming substrate according to the present invention. FIGS. 1A1 and 1C1 to FIG. FIG. 1 (e 1) is a diagram for explaining the process of the first embodiment . FIG. 2A to FIG. 2C show the defect correcting method for the color filter forming substrate of the first example shown in FIG. 1 in a wider section of the color filter forming substrate. It is the figure which showed schematic structure of one example of the laser irradiation apparatus used for the defect correction method of the color filter substrate of this invention. It is process sectional drawing for demonstrating the defect correction method of the conventional color filter substrate.

Explanation of symbols

1, 2 Color filter substrate 1a, 2a before correction Color filter substrate 10 before correction Transparent substrate 10A Color filter substrate 10B before correction Color filter substrate 15 after correction Black matrix portion (also referred to as fourth colored pattern layer)
20 Colored layer (also called colored pattern layer)
20a First colored pattern layer (Red)
20b Second colored pattern layer (Green)
20c 3rd coloring pattern layer 30 Overcoat layer 35 Swelling part 37 (overcoat layer) White defect 40 Black defect (it is also called a foreign material)
50 Laser light 55 White defect part (also called removal part)
61 Correction liquid 62 (for the overcoat) Correction liquid 61a (for the first colored pattern layer) Correction liquid 62a (for the overcoat) Correction liquid 70 Pressing member 70S Flat surface (Also called flat surface)
110 Color filter forming substrate 120 Substrate holder 130 XY stage 140 Laser beam (here, 355 nm wavelength YAG laser)
150 Laser irradiation means 156 Objective lens 160 Z-direction moving guide rail 170 Controller 180 Irradiation intensity control database 190 Display monitor 410 Glass substrate 421 First colored pattern layer 422 Second colored pattern layer 423 Third colored pattern layer 430 Black matrix part 440 White defect 445 Black defect 450 Hole 465 Correction ink

Claims (8)

  A method for correcting a defect in a color filter forming substrate comprising a multilayer film having a colored layer of a color filter on a glass substrate, the uppermost layer being an overcoat layer, wherein any one of the films having the multilayer structure A region including various defect portions of the layer is irradiated with laser light, and the layer is removed up to the lowest layer of the multilayer structure film to form white defect portions extending over all layers of the multilayer structure film. Applying a correction liquid containing a solvent component for correcting the white defect portion of each layer to the white defect portion formed from the lowest layer to the uppermost layer in order, and drying or removing the solvent component After performing heat treatment, further performing a curing process, forming a film as a solid film that is not liquid, pressing the flat surface against the correction liquid application area to which the correction liquid is applied, the correction liquid application area Perform flattening, flattening process The correction liquid for correcting the white defect portion of the uppermost layer is UV curable, the correction liquid for correcting the white defect portion of the uppermost layer is applied, and the formed upper layer is irradiated with UV light. The at least one of the colored layers of the color filter is a thermosetting resin, and is formed by applying a correction liquid that is a thermosetting resin. The laser beam irradiated when removing the layers up to the lowest layer of the multi-layered film is the third harmonic or the fourth harmonic of YAG. The UV curing process is performed using the third harmonic or the fourth harmonic of YAG, which is the same as the laser beam irradiated when removing even the lowest layer of the multilayer structure film as UV light. Defect correction of color filter forming substrate characterized by Law.   2. The defect correction method for a color filter-formed substrate according to claim 1, wherein the UV curing treatment is performed by locally irradiating the correction liquid application region with UV light or irradiating the entire substrate with UV light. A defect correction method for a color filter forming substrate, characterized in that:   3. The defect correction method for a color filter forming substrate according to claim 1, wherein the thermosetting treatment locally heats the correction liquid application region or heats the entire substrate. 4. A defect correction method for a color filter-formed substrate, characterized in that:   4. The defect correction method for a color filter forming substrate according to claim 1, wherein the correction liquid is applied several times for at least one layer formed by applying the correction liquid. A defect correction method for a color filter forming substrate, which is performed separately.   5. The defect correction method for a color filter forming substrate according to claim 1, wherein a laser beam is irradiated to remove the lowermost layer of the multilayer structure film in the region, and the multilayer A defect correction method for a color filter forming substrate, wherein a white defect portion to be removed with a laser beam is formed in a circular shape or an elliptic shape when forming a white defect portion extending over all layers of a film having a structure.   6. The defect correction method for a color filter forming substrate according to claim 1, wherein the correction liquid is applied by a coating needle.   6. The defect correction method for a color filter forming substrate according to claim 1, wherein the correction liquid is applied by an inkjet method. 6. The defect correction method for a color filter forming substrate according to claim 1, wherein the correction liquid is applied by a dispenser .

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