JP5133837B2 - Power supply for pulse laser - Google Patents

Description

  The present invention relates to a twin-chamber (two-stage system) pulsed laser power supply apparatus having an oscillation stage laser and an amplification stage laser, and in particular, discharges alternately by dividing the chamber discharge section into two parts for high repetition operation. The present invention relates to a twin-chamber (two-stage type) oscillation type pulse laser power supply device having an amplification stage laser that increases the number of oscillation repetitions.

In order to meet the demand for higher integration of semiconductor devices, excimer laser devices are used as light sources for semiconductor exposure apparatuses.
In recent years, in order to improve the throughput of the exposure apparatus and make the circuit pattern ultra-fine, the twin chamber system including the oscillation stage laser and the amplification stage laser shown in Patent Document 1 and Patent Document 2 has increased output. It is measured.
In the future, as the integration of semiconductor devices progresses and the node process becomes 32 nm, the exposure apparatus will be required for high NA (1.3 to 1.5) by liquid immersion technology and introduction of technologies such as double patterning. In order to increase the throughput of the exposure apparatus compatible with the 32 nm node and beyond, the ArF excimer laser may be required to have a high repetition frequency (above 6 kHz) and a high output (over 90 W).

In order to respond to the demand for higher output, the twin chamber system is composed of an oscillation stage laser that produces laser light with high light quality (spectral performance, etc.) and small output, and an amplification stage laser that amplifies the laser light. The form of the twin chamber system is broadly divided into a MOPA (Master Oscillator Power Amplifier) system in which no resonator mirror is provided in the amplification stage chamber and a MOPO (Master Oscillator Power Oscillator) system in which a resonator mirror is provided.
In the MOPO system, the laser oscillation synchronization timing of the oscillation stage laser and the amplification stage laser is important. Similarly, in the MOPA system, it is important to perform an amplification operation at a timing when the output laser beam of the oscillation stage laser is inside the amplification stage. In both MOPO and MOPA, since the timing of energy injection (high voltage pulse voltage) into the laser chamber and amplification stage chamber of the oscillation stage laser has a great influence on the laser oscillation and optical performance, the synchronization timing is controlled within a few ns. There is a need to.

Further, for high repetition operation, it is one of the means to increase the number of oscillation repetitions by dividing the discharge part of the amplification stage laser into two parts and alternately discharging them.
For example, Patent Documents 3 and 4 disclose a method in which two pairs of electrodes are arranged in a resonator of an amplification stage laser and the discharge is alternately oscillated with a half-cycle shift.
FIG. 5 shows the configuration of an alternating discharge twin chamber laser device that divides the discharge part into two parts and alternately discharges them.
In the figure, the MOPO method is used, and two pairs of electrodes are arranged in the amplification stage chamber 30.
The oscillation stage laser 100 generates high-quality laser light (spectral performance, etc.) and small output laser light. Then, the laser light is amplified by the amplification stage laser 300. That is, the optical quality (spectral performance, etc.) of the entire laser system is determined by the optical quality (spectral performance, etc.) of the laser light output from the oscillation stage laser 100, and the energy of the laser system itself is determined by the amplification stage laser 300. .

The oscillation stage laser 100 includes an oscillation stage chamber 10, an oscillation stage high voltage pulse generator 12, a narrow band module (hereinafter referred to as LNM) 16 that narrows the spectrum, and a front mirror 17. .
The amplification stage laser 300 includes an amplification stage chamber 30, amplification stage high voltage pulse generators 33 and 34, a rear mirror 36, and a front mirror 37.
Inside the oscillation stage chamber 10, a pair of electrodes (cathode electrode and anode electrode) 10a, 10b that are separated by a predetermined distance, are parallel to each other in the longitudinal direction, and face the discharge surface are provided.
The oscillation stage chamber 10 is filled with argon (Ar) gas, fluorine (F ₂ ) gas, and buffer gas neon (Ne). The buffer gas may be helium (He).

When a high voltage pulse is applied to the electrodes 10a and 10b by a power supply device including a high voltage pulse generator 12 and a charger (not shown), a discharge occurs between the electrodes 10a and 10b, and an ArF excimer is formed. . And it resonates with the resonator comprised by LNM16 and the front mirror 17, and a laser beam generate | occur | produces. The LNM 16 includes a magnifying prism and a grating (diffraction grating) as a wavelength selection element, and narrows the spectral width of the laser light from about 400 pm to about 0.3 pm.
High reflection mirrors 21 and 22 and a monitor module 19 are provided between the front mirror 17 of the oscillation stage laser 100 and the rear mirror 36 of the amplification stage laser 300.
The laser beam transmitted through the front mirror 17 is guided to the monitor module 19 by changing the beam direction by the high reflection mirror 21. The monitor module 19 monitors the energy of the seed light. Thereafter, the beam direction is changed by the high reflection mirror 22, and the laser beam is injected from the rear mirror 36 into the amplification stage laser 300.

In the amplification stage chamber 30, two pairs of electrodes 30a and 30b, 30c and 30d are arranged, and a high repetition operation is realized by discharging alternately. The electrode length is about half of the electrode of the oscillation stage laser.
Similarly to the oscillation stage chamber 10, the amplification stage chamber 30 is filled with argon (Ar) gas, fluorine (F ₂ ) gas, and buffer gas neon (Ne). The buffer gas may be helium (He).
When a high voltage pulse is applied to the electrodes 30a and 30b by a power supply device including a high voltage pulse generator 33 and a charger (not shown), a discharge occurs between the electrodes 30a and 30b, and an ArF excimer is formed. . Then, it is resonated by a resonator composed of the rear mirror 36 and the front mirror 37, and the laser light injected from the oscillation stage laser is amplified.
Next, when a high voltage pulse is applied to the electrodes 30c and 30d by a power supply device including a high voltage pulse generator 34 and a charger (not shown), a discharge occurs between the electrodes 30c and 30d, and an ArF excimer is formed. Is done. Then, it is resonated by a resonator composed of the rear mirror 36 and the front mirror 37, and the laser light injected from the oscillation stage laser is amplified. These two pairs of electrodes 30a and 30b, and discharges at 30c and 30d are alternately repeated.
In the twin chamber system of FIG. 5, the high voltage pulse generator 12 of the oscillation stage laser has an oscillation frequency f1 that is twice the oscillation frequency f2 of the high voltage pulse generator 33 and the high voltage pulse generator 34 of the amplification stage laser. It is required to work. In order to synchronize and synchronize the discharge and oscillation timing of the oscillation stage laser and the amplification stage laser, it is necessary to accurately grasp and control the delay time of the discharge timing of the oscillation stage laser and the amplification stage laser.

FIG. 6 shows an example of a power supply device (high voltage pulse generator) for generating discharge in the laser chamber and exciting the laser gas in the laser device.
The high voltage pulse generator shown in FIG. 6 includes a two-stage magnetic pulse compression circuit using three magnetic switches SR1, SR2 and SR3 each composed of a saturable reactor and a step-up transformer TC1. The magnetic switch SR1 is for reducing switching loss in the solid-state switch SW which is a semiconductor switching element such as IGBT, and is also called magnetic assist.
The first magnetic switch SR2 and the second magnetic switch SR3 constitute a two-stage magnetic pulse compression circuit.

When the main capacitor C0 is charged by a charger (not shown), the switch SW is turned on, and the time integral value of the charging voltage Vc0 of the main capacitor C0 applied to both ends of the magnetic assist SR1 is determined by the characteristic of the magnetic assist SR1. , The magnetic assist SR1 is saturated and the magnetic switch is turned on, and a current flows through the primary capacitor C0, the magnetic assist SR1, the primary side of the step-up transformer TC1, and the loop of the switch SW. At the same time, a current flows through the secondary side of the step-up transformer TC1 and the loop of the capacitor C1, and the charge stored in the main capacitor C0 is transferred to be charged in the capacitor C1.
When the capacitor C1 is charged, when the time integration value of the voltage Vc1 in the capacitor C1 reaches a limit value determined by the characteristics of the magnetic switch SR2, the magnetic switch SR2 is saturated and the magnetic switch is turned on, and the capacitor C1, the capacitor C2, the magnetic switch A current flows through the loop of the switch SR3, and the charge stored in the capacitor C1 is transferred to charge the capacitor C2.

Thereafter, when the time integration value of the voltage Vc2 in the capacitor C2 reaches a limit value determined by the characteristics of the magnetic switch SR3, the magnetic switch SR3 is saturated and the magnetic switch is turned on, and the capacitors C2, peaking capacitor Cp, and magnetic switch SR3 A current flows through the loop, and the charge stored in the capacitor C2 is transferred to charge the peaking capacitor Cp. When the peaking capacitor Cp is charged and the voltage Vcp reaches a certain value (breakdown voltage) Vb, main discharge starts between main discharge electrodes in a chamber (not shown), the laser medium is excited by this main discharge, and the laser Light is generated.
JP 2001-24265 A JP 2004-342964 A JP 2008-78372 A U.S. Pat. No. 7,600,547

The twin chamber type MOPO method and MOPA method require synchronous control to match the discharge timing.
Several systems have been proposed for the chamber operation of the twin chamber system. Among them, two pairs of electrodes are arranged in the resonator of the amplification stage laser, and the discharge is alternately oscillated with a half cycle shift. As described above, when the operating frequencies of the oscillation stage laser and the amplification stage laser are different, it is necessary to consider the influence of the delay time characteristics in the high frequency oscillation operation.
It has been confirmed that the on-time of the switch changes in nanosecond units with respect to the operating frequency during the delay time of the IGBT which is the main switch (switch SW in FIG. 6) of the high voltage pulse generator. This is a phenomenon in which the switching-on time changes transiently according to the oscillation frequency from the start of operation to several tens of pulses.

FIG. 7 is a plot of the ON signal delay time when operating at each frequency based on the IGBT ON signal. The horizontal axis represents the number of IGBT operation pulses, and the vertical axis represents the ON signal input. This is the delay time (ns) until the device is turned on.
Since the amount of change of the on-delay time of the IGBT itself changes depending on the operating frequency, the amount of delay time of the high voltage pulse generator changes when the operating frequency changes.
When the operating voltage of the high voltage pulse generator of the oscillation stage laser and that of the amplification stage laser are the same, the relative time difference between the delay times of the oscillation stage laser and the amplification stage laser does not change. Therefore, if the operating frequency is the same, the synchronous control of the oscillation stage laser and the amplification stage laser is possible.
However, in the system shown in FIG. 5, the operating frequency differs between the oscillation stage laser and the amplification stage laser, and the IGBT turn-on time changes.
Therefore, the delay time of the PPM changes according to the characteristics of FIG. 7 until the IGBT on-time is saturated. As a result, the synchronization between the oscillation stage laser and the amplification stage laser is shifted.
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a twin chamber system in which a plurality of pairs of electrodes are arranged in a resonator of an amplification stage laser to alternately oscillate with a discharge period shifted. In the pulse laser power supply apparatus, the synchronization stage between the oscillation stage laser and the amplification stage laser is prevented from occurring due to a change in the turn-on time of a switching element such as an IGBT provided in the power supply apparatus.

In the following description, the term “amplification stage laser” is used because the MOPO system is taken as an example. However, the MOPA system is different from MOPO only in that the amplification stage does not have a resonator mirror, and the present invention can be applied. Is possible.
According to the present invention, in a twin chamber type pulse laser power supply device in which a plurality of pairs of electrodes are arranged in a resonator of an amplification stage laser to alternately oscillate with a discharge period shifted, the power supply device of the oscillation stage laser and the amplification Align the switching frequency of the switch of the power supply device of the stage laser. Specifically, the switching frequency on the high frequency operation side is determined in accordance with the switch operation with the slowest switching operation frequency.
That is, the operating frequency of the switching element of the high voltage generator for the oscillation stage laser is matched with the operating frequency of the switching element of the high voltage pulse generator for the amplification stage laser. In this case, the number of necessary switches of the oscillation stage laser high voltage generator is equal to the number of amplification stage laser high voltage generators.
For example, when two pairs of electrodes are arranged in the resonator of the amplification stage laser, in the power supply circuit on the oscillation stage laser side, two high voltage pulse generators are connected in parallel and operated alternately.
That is, by adjusting the operating frequency of the oscillation stage laser side to the operating frequency of the amplification stage laser side, the characteristics shown in FIG.
Based on the above, the present invention solves the above problems as follows.
(1) A first power supply circuit connected to a first discharge electrode arranged in the oscillation stage laser and a second power supply circuit connected to each of the plurality of second discharge electrodes arranged in the amplification stage laser. The first power supply circuit of the pulse laser power supply device includes a first secondary winding connected to the first discharge electrode, and a primary winding for the first secondary winding, The same number of first primary windings as the number of the second discharge electrodes arranged in the amplification stage laser, and a plurality of first switching transistors connected in series with each of the first primary windings, The second power supply circuit includes a plurality of second secondary windings connected to each of the plurality of second discharge electrodes on a one-to-one basis, and a plurality of second secondary windings on a one-to-one basis. A plurality of second primary windings facing each other, and each of the second primary windings, one to one A plurality of second switching transistors connected in series, configured to include.
(2) In the above (1), the number of the second discharge electrodes is two, the two first switching transistors are alternately turned on, and the two second switching transistors are alternately turned on. May be.
(3) In the above (1) or (2), the plurality of first switching transistors and the plurality of second switching transistors may be turned on in the same operation cycle.
(4) In the above (2), the two second discharge electrodes may discharge alternately.
(5) In the above (2) or (4), the discharge cycle of the first discharge electrode may be twice the discharge cycle of each second discharge electrode.
(6) In the above (1), the plurality of first switching transistors of the first power supply device may be configured such that physical arrangement and wiring stray inductance are equal to each other.

In the present invention, the following effects can be obtained.
(1) Since each switching element of the oscillation stage laser power supply device is driven so as to be equal to the switching frequency of the switching element of the amplification stage laser power supply device, switching of the IGBT or the like provided in the power supply device is performed. The change in the turn-on time of the element can be canceled relatively. For this reason, it is possible to prevent synchronization deviation between the oscillation stage laser and the amplification stage laser.
(2) By configuring the plurality of switching elements of the oscillation stage laser power supply device so that their physical arrangement and wiring stray inductance are equal, the operation delay due to the difference in their electrical characteristics is reduced. And synchronization loss can be reduced.

FIG. 1 is a diagram showing a configuration of a power supply apparatus according to a first embodiment of the present invention applied to the twin chamber laser apparatus of the alternating discharge system shown in FIG.
In the figure, 12 is a high voltage pulse generator for an oscillation stage laser, 33 and 34 are high voltage pulse generators for an amplification stage laser, and each of the main capacitors C01 and C02, C20 and C30 is charged. Units CH1, CH2, and CH3 are connected in parallel to constitute a power supply device for a pulse laser.
Connected to the output side of the high voltage pulse generator 12 is a discharge part of an oscillation stage laser composed of a peaking capacitor CP1 and the pair of electrodes.
In addition, the amplification stage laser chamber is provided with the two discharge parts composed of the two pairs of discharge electrodes as described above, and the high voltage pulse generator 33 is connected to the peaking capacitor CP2 of one of the discharge parts and a pair of discharge parts. The high voltage pulse generator 34 is connected to a peaking capacitor CP3 and a pair of electrodes (for example, electrodes 30c and 30d in FIG. 5) of the other discharge section.

The step-up transformer TC1 of the high-voltage pulse generator 12 for the oscillation stage laser includes first and second primary windings TCL1 and TCL1 ′. The first primary winding TCL1 includes a main capacitor C01 and a magnetic assist. A series circuit of SR11 and switch SW1-1 is connected, and a series circuit of main capacitor C02, magnetic assist SR11 'and switch SW1-2 is connected to the second primary winding TCL1'. The switches SW1-1 and SW1-2 are composed of IGBT elements as described above.
The main capacitors C01 and C01 ′ are connected in parallel to the charger CH1 and charged by the charger CH1.
The secondary side of the step-up transformer TC1 is connected to a two-stage magnetic compression circuit including a capacitor C11, a magnetic switch SR12, a capacitor C12, a magnetic switch SR13, and a peaking capacitor CP1, as shown in FIG.

The high voltage pulse generator 33 for the amplification stage laser is similar to the one shown in FIG. 6, the main capacitor C20, the magnetic assist SR21, the switch SW2-1, the step-up transformer TC2, the magnetic switches SR22 and SR23, the capacitor C21, It consists of a two-stage magnetic pulse compression circuit using C22 and a peaking capacitor CP2.
Similarly, the high voltage pulse generator 34 for the amplification stage laser uses a main capacitor C30, a magnetic assist SR31, a switch SW2-2, a step-up transformer TC3, magnetic switches SR32 and SR33, capacitors C31 and C32, and a peaking capacitor CP3. It consists of a two-stage magnetic pulse compression circuit. The main capacitors C20 and C30 are connected in parallel to the chargers CH2 and CH3, respectively, and are charged.
The switches SW1-1, SW1-2, SW2-1, SW2-2 are composed of IGBT elements as described above.

The operation of the high voltage pulse generators 12, 33, 34 shown in FIG. 1 is the same as that described with reference to FIG.
That is, in the high voltage pulse generator 12, when the switch SW1-1 is turned on while the main capacitor C01 is charged, a current flows through the primary loop of the step-up transformer TC1, and the secondary of the step-up transformer TC1. On the other hand, a current flows through the loop of the capacitor C1, and the electric charge stored in the main capacitor C0 is transferred to charge the capacitor C1. When the magnetic switch SR2 is saturated after the capacitor C1 is charged, the charge stored in the capacitor C1 is transferred and charged to the capacitor C2.
Further, when the magnetic switch SR3 is saturated, the charge stored in the capacitor C2 is transferred and the peaking capacitor Cp is charged. When the voltage Vcp reaches a certain value, main discharge starts between the main discharge electrodes in the chamber of the oscillation stage laser, the laser medium is excited by this main discharge, and laser light is generated.
Similarly, when the switch SW1-2 is turned on while the main capacitor C01 is charged, the two-stage magnetic compression operation is performed as described above to charge the peaking capacitor CP1, and the oscillation stage laser chamber is charged. The main discharge starts between the main discharge electrodes, and the main discharge excites the laser medium to generate laser light.

The operation of the high voltage pulse generators 33 and 34 is the same as described above. In the high voltage pulse generator 33, when the switch SW2-1 is turned on while the main capacitor C20 is charged, the step-up transformer TC2 is turned on. A current flows in the primary loop, a current flows in the secondary side of the step-up transformer TC2, and the capacitor C21 loop. Sequentially, the peaking capacitor Cp is charged. Then, main discharge starts between one of the two main discharge electrodes in the amplification stage laser chamber, and the laser medium is excited by this main discharge to generate laser light.
Similarly, in the high voltage pulse generator 34, when the switch SW2-2 is turned on while the main capacitor C30 is charged, the two-stage magnetic compression operation is performed as described above to charge the peaking capacitor Cp3. Then, main discharge starts between the other main discharge electrodes of the two pairs of main discharge electrodes in the chamber of the amplification stage laser, the laser medium is excited by this main discharge, and laser light is generated.

Here, the laser device targeted by this embodiment is a twin chamber laser device of an alternating discharge type, and two pairs of electrodes of the amplification stage laser are alternately discharged with respect to the discharge of the oscillation stage laser. For this reason, the operating frequency of the high voltage pulse generator 12 of the oscillation stage laser needs to be double the operating frequency of the high voltage pulse generators 33 and 34 of the amplification stage laser.
In the present embodiment, as shown in FIG. 1, two switches SW1-1 and SW1-2 are provided in the high voltage pulse generator 12 for the oscillation stage laser, which are connected in parallel, and the switch SW1-1 and SW2-1 is operated at the same timing, and switches SW1-2 and SW2-2 are operated at the same timing, so that the group of switches SW1-1 and SW2-1 and the group of switches SW1-2 and SW2-2 are It is operating alternately.
Therefore, the switches SW1-1 and SW1-2 of the high-voltage pulse generator 12 and the high-voltage pulse generators 33 and 34 have the same switching frequency, but the high-voltage pulse generator 12 The frequency of the discharge pulse output by is twice the frequency of the discharge pulse output by each of the high voltage pulse generators 33 and 34.

FIG. 2 shows ON signals of the switches SW1-1, SW1-2, SW2-1, and SW2-2.
The high voltage pulse generator 12 for the oscillation stage laser (OSC) has two switch elements, and the switch SW1-1 of the high voltage pulse generator 12 for the oscillation stage laser and the high voltage for the amplification stage laser (AMP). The switch SW2-1 of the voltage pulse generator 33 is turned on at the same timing, and the switch SW1-2 of the oscillation stage laser high voltage pulse generator 12 and the switch SW2-2 of the amplification stage laser high voltage pulse generator 34 are It is turned on at the same timing, and its operation cycle is the same as shown in FIG. In the present embodiment, the operating frequency of the high-voltage pulse generator 12 for the oscillation stage laser and the high-voltage pulse generators 33 and 34 for the amplification stage laser are the same as described above. The characteristic that the turn-on delay time changes according to the number of operations can be canceled relatively. For this reason, it is possible to prevent synchronization deviation between the oscillation stage laser and the amplification stage laser.

FIG. 3 is a diagram showing a second embodiment of the present invention applied to the twin chamber laser apparatus of the alternating discharge method shown in FIG.
This figure shows the configuration of the high voltage pulse generator 12 for the oscillation stage laser, and the configuration of the high voltage pulse generators 33 and 34 for the amplification stage laser is the same as that shown in FIG.
This embodiment shows a case where the switching elements of the high voltage pulse generator for the laser for the oscillation stage are configured in a combination of two parallel sets, and the arrangement of the switch elements and the stray inductance of the wiring are configured to be uniform.
In the figure, reference numeral 12 denotes a high voltage pulse generator for an oscillation stage laser, and a charger CH1 is connected in parallel to a main capacitor C01 to constitute a pulse laser power supply device.
As described above, the discharge part of the oscillation stage laser composed of the peaking capacitor CP1 and the pair of electrodes is connected to the output side of the high voltage pulse generator 12.
The step-up transformer TC1 of the high voltage pulse generator 12 includes first and second primary windings TCL1 and TCL1 ′. The first primary winding TCL1 includes a main capacitor C01, a magnetic assist SR11, and a switch SW1-. 1 is connected, and a switch SW1-1 ′ is connected in parallel to the switch SW1-1.

A series circuit of a main capacitor C01, a magnetic assist SR11 ′, and a switch SW1-2 is connected to the second primary winding TCL1 ′ of the step-up transformer TC1, and the switch SW1-2 is connected in parallel to the switch 1-2. 'Is connected. As these switch elements, IGBT elements are used as described above. The main capacitor C01 is connected to the charger CH1 and is charged by the charger CH1.
The secondary side of the step-up transformer TC1 is connected to a two-stage magnetic compression circuit including a capacitor C11, a magnetic switch SR12, a capacitor C2, a magnetic switch SR13, and a peaking capacitor CP1, as shown in FIG.

FIG. 4 shows ON signals of the switches SW1-1, SW1-1 ′, SW1-2, and SW1-2 ′.
As shown in the figure, the switch SW1-1 and the switch 1-2 ′ are turned on, and the switch SW1-1 ′ and the switch SW1-2 are turned on, for example, an amplification stage (not shown). The switch SW2-1 of the laser high voltage pulse generator 33 is turned on in accordance with the on timing of the switches SW1-1 and 1-2 ', and the switch SW2 of the amplification stage laser high voltage pulse generator 34 (not shown). -2 is turned on in accordance with the on timing of the switch SW1-1 ′ and the switch 1-2.

The operation of the high voltage pulse generator 12 is the same as that shown in FIG. 1, and the switch SW1-1, SW1-2 ′ or the switch SW1-1 ′, while the main capacitor C01 is charged. When the switch SW1-2 is turned on, a current flows through the secondary side of the step-up transformer TC1 and the loop of the capacitor C1, and the charge stored in the main capacitor C0 is transferred to be charged in the capacitor C1. When the magnetic switch SR2 is saturated after the capacitor C1 is charged, the charge stored in the capacitor C1 is transferred and charged to the capacitor C2.
Further, when the magnetic switch SR3 is saturated, the charge stored in the capacitor C2 is transferred and the peaking capacitor Cp is charged. When the voltage Vcp reaches a certain value, main discharge starts between the main discharge electrodes in the chamber of the oscillation stage laser, the laser medium is excited by this main discharge, and laser light is generated.
In this embodiment, since the switching elements of the high voltage pulse generator are composed of a combination of two parallel sets, it is easy to align the arrangement of the switch elements and the stray inductance of the wiring, and the difference in electrical characteristics The operation delay due to can be reduced.

It is a figure which shows the structure of the power supply device of 1st Example of this invention. It is a figure which shows the ON signal of switch SW1-1 of FIG. 1, SW1-2, SW2-1, SW2-2. It is a figure which shows the structure of the power supply device of the 2nd Example of this invention. It is a figure which shows the ON signal of switch SW1-1 of FIG. 3, SW1-1 ', SW1-2, SW1-2'. It is a figure which shows the structure of the twin chamber laser apparatus of the alternating discharge system discharged alternately. It is a figure which shows the structural example of the high voltage pulse generator of the power supply device for pulse lasers. It is the figure which plotted the ON signal delay time when making it operate | move at each frequency on the basis of the ON signal of IGBT.

Explanation of symbols

12 High voltage pulse generator for oscillation stage laser 33, 34 High voltage pulse generator for amplification stage laser CH1, CH2, CH3 Chargers C01, C02, C20, C30 Main capacitors CP1, CP2, CP3 Peaking capacitors TC1, TC2 , TC3 Step-up transformer SR11, SR11′SR21 SR31 Magnetic assist SW1-1, SW1-2, SW1-1 ′, SW1-2 ′ switch SW2-1, SW2-2 switch C11, C12, C21, C22, C31, C32 capacitors SR12, SR13, SR22, SR23, SR32, SR33 Magnetic switch

Claims (6)

A pulse laser including a first power supply circuit connected to a first discharge electrode arranged in the oscillation stage laser and a second power supply circuit connected to each of the plurality of second discharge electrodes arranged in the amplification stage laser. Power supply unit for
The first power supply circuit includes:
A first secondary winding connected to the first discharge electrode;
Primary windings for the first secondary winding, the same number of first primary windings as the number of the second discharge electrodes disposed in the amplification stage laser;
A plurality of first switching transistors connected in series with each of the first primary windings;
Including
The second power supply circuit includes:
A plurality of second secondary windings connected one-to-one with each of the plurality of second discharge electrodes;
A plurality of second primary windings facing each of the plurality of second secondary windings on a one-to-one basis;
A plurality of second switching transistors connected in series with each of the second primary windings;
including
A power supply device for a pulsed laser. The number of the second discharge electrodes is two;
The two first switching transistors are alternately turned on
The two second switching transistors are alternately turned on
The power supply device for pulse laser according to claim 1. 3. The pulse laser power supply device according to claim 1, wherein the plurality of first switching transistors and the plurality of second switching transistors are turned on in the same operation cycle. 4. 3. The pulse laser power supply device according to claim 2, wherein the two second discharge electrodes discharge alternately. 5. The pulse laser power supply device according to claim 2, wherein the discharge cycle of the first discharge electrode is twice the discharge cycle of each second discharge electrode. 6. Wherein said plurality of first switching transistor of the first power supply, the pulsed laser power supply device according to claim 1, characterized in that it is constructed as stray inductance physical placement and routing are equal to each other .

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