JP5125271B2 - Reflective screen manufacturing method and reflective screen - Google Patents

Description

  The present invention relates to a method for manufacturing a reflective screen and a reflective screen.

2. Description of the Related Art Conventionally, a reflection screen that makes it possible to observe a projection image by reflecting the image is known. As such a reflective screen, a plurality of convex unit shape portions having the same shape are regularly arranged two-dimensionally on the front side of the screen substrate, and a part of the convex unit shape portions toward the projection light incident direction. A reflective screen having a reflective surface formed on the observation surface is disclosed (for example, see Patent Document 1).
JP 2006-215162 A

  However, the conventional reflective screen uses a spray coating method, a printing method, or the like as a method for forming the reflective surface. In these methods, there is a problem that it is difficult to accurately form the reflecting surface in a predetermined portion. When the reflection surface is not accurately formed in a predetermined portion, problems such as a decrease in contrast, an increase in reflection of external light, and a deviation in contrast in the observation surface occur.

  Accordingly, the present invention provides a method of manufacturing a reflective screen and a reflective screen that can accurately form a reflective film at a predetermined portion.

In order to solve the above-described problems, a manufacturing method of a reflective screen according to the present invention is such that a projector disposed at a position shifted in a direction perpendicular to the normal line of the observation surface of the screen substrate is inclined toward the observation surface. A method of manufacturing a reflective screen that reflects the projection light emitted to the observation side, forming a plurality of concave portions or a plurality of convex portions in a vertical direction and a horizontal direction of the observation surface of the screen substrate; Forming a reflection film on the observation surface; forming a photosensitive resist on the reflection film; and projecting light for exposing the resist onto the observation surface from an incident direction of the projection light to the observation surface A resist exposure process in which the resist is exposed by being incident at an angle equal to or smaller than an incident angle of light, the exposed resist is left, and the other resist is peeled off and exposed. And having etching the reflection film, and a step of peeling the resist is left, the.
By manufacturing in this way, a reflective film is formed along the concave portion or convex portion of the observation surface, and the resist formed on the reflective film is left in the portion irradiated with the projection light of the concave portion or convex portion. be able to. By etching the reflective film in this state, it is possible to form the reflective film in the portion irradiated with the projection light of the concave portion or the convex portion. In addition, by making the light that sensitizes the resist incident at an angle smaller than the incident angle of the projection light with respect to the observation surface, the difference in the areas of the plurality of reflection films formed in the observation surface is reduced, and the reflection film is applied. The incidence of external light can be prevented.
Therefore, according to the manufacturing method of the reflective screen of the present invention, the reflective film of the reflective screen is accurately formed on the concave or convex portions irradiated with the projection light, the contrast is prevented, and the reflection of external light is prevented. It is possible to achieve prevention, prevention of contrast bias in the observation plane, and the like.

The method for producing a reflective screen according to the present invention is characterized in that it includes a step of forming a light absorption layer in at least the non-formation region of the reflective film on at least the observation side of the screen substrate.
By manufacturing in this way, it is possible to absorb the external light incident on the non-formation region of the reflective film by the screen substrate, prevent reflection of external light, and obtain a reflective screen with good contrast.

Further, the manufacturing method of the reflective screen according to the present invention allows projection light emitted obliquely toward the observation surface from a projector disposed at a position shifted in a direction perpendicular to the normal line of the observation surface of the screen substrate. A method of manufacturing a reflective screen that reflects to an observation side, the method comprising: forming a plurality of concave portions or a plurality of convex portions in a vertical direction and a horizontal direction of the observation surface of the screen substrate; and a reflective film on the observation surface Forming a photosensitive resist on the reflective film, and light for sensitizing the resist from the incident direction of the projection light to the observation surface, an angle equal to or smaller than the incident angle of the projection light with respect to the observation surface A resist exposure step of exposing the resist by being incident on the substrate, and a step of separating the exposed resist and leaving the other resist as a light absorbing film. And wherein the door.
By manufacturing in this way, a reflective film is formed along the concave portion or convex portion of the observation surface, and only the resist formed in the portion irradiated with the projection light of the concave portion or convex portion on the reflective film is removed. be able to. Thereby, the reflective film of the part irradiated with the projection light of the concave part or the convex part is exposed, the other part is covered with the resist, and the resist can function as the light absorbing film. Further, by making the light for sensitizing the resist incident at an angle smaller than the incident angle of the projection light with respect to the observation surface, the difference in the areas of the plurality of reflection films exposed in the observation surface is reduced, and the reflection film is applied to the reflection film. The incidence of external light can be prevented.
Therefore, according to the manufacturing method of the reflective screen of the present invention, the reflective film of the reflective screen is accurately formed on the portion of the concave or convex portion irradiated with the projection light, the contrast is lowered, the external light is reflected, and the observation surface It is possible to prevent the deviation of contrast in the interior.

Moreover, the manufacturing method of the reflective screen of this invention has the process of baking the said light absorption film | membrane, It is characterized by the above-mentioned.
By manufacturing in this way, the light absorption film is deformed by heat, and the light absorption film is formed so as to gradually become thinner as it approaches the outer edge. Thereby, a sharp change in reflectance at the boundary between the light absorption film and the reflection film can be alleviated.

Further, the manufacturing method of the reflective screen according to the present invention allows projection light emitted obliquely toward the observation surface from a projector disposed at a position shifted in a direction perpendicular to the normal line of the observation surface of the screen substrate. A method of manufacturing a reflective screen that reflects to an observation side, the step of forming a plurality of concave portions or a plurality of convex portions in a vertical direction and a horizontal direction of a non-observation surface opposite to the observation surface of the screen substrate; Forming a reflective film on the non-observation surface; forming a photosensitive resist on the reflective film; and exposing the resist to light from the direction opposite to the incident direction of the projection light. A resist exposure process for exposing the resist by making it incident at an angle equal to or smaller than an incident angle of the projection light with respect to the observation surface, leaving the exposed resist, and removing the other resist. Allowed to etching the exposed reflective film, and a step of peeling the resist is left, characterized in that it has a.
By manufacturing in this way, a reflective film is formed along the concave portion or convex portion of the observation surface, and the resist formed on the reflective film is left in the portion irradiated with the projection light of the concave portion or convex portion. be able to. By etching the reflective film in this state, it is possible to form the reflective film in the portion irradiated with the projection light of the concave portion or the convex portion. In addition, by making the light that sensitizes the resist enter the non-observation surface at an angle smaller than the incident angle of the projection light with respect to the observation surface, the difference in the areas of the plurality of reflective films formed in the non-observation surface is reduced. In addition, it is possible to prevent external light from entering the reflective film.
Therefore, according to the manufacturing method of the reflective screen of the present invention, the reflective film of the reflective screen is accurately formed on the portion of the concave or convex portion irradiated with the projection light, the contrast is lowered, the external light is reflected, and the observation surface It is possible to prevent the deviation of contrast in the interior.

Moreover, the manufacturing method of the reflective screen of this invention has the process of forming a light absorption layer in the said non-observation surface, It is characterized by the above-mentioned.
By manufacturing in this way, external light that has passed through the screen substrate and entered the non-formation region of the reflective film of the concave or convex portion can be absorbed by the light absorption layer, and reflection of external light is prevented, and contrast is improved. Can be produced.

Moreover, the manufacturing method of the reflective screen of this invention forms a recessed part in the process of forming the said several recessed part or these several convex part, It is characterized by the above-mentioned.
By manufacturing in this way, when a concave portion is formed on the observation surface side, a concave reflective film is formed with respect to the projection light, and when a concave portion is formed on the non-observation surface side, Thus, a convex reflective film is formed. Therefore, when a concave reflective film is formed with respect to the projection light, a reflective screen excellent in light condensing performance with respect to the normal direction of the observation surface is obtained. Further, when a convex reflection film is formed with respect to the projection light, a reflection screen having excellent light scattering properties is obtained.

Moreover, the manufacturing method of the reflective screen of this invention forms a convex part in the process of forming the said several recessed part or these several convex part, It is characterized by the above-mentioned.
By manufacturing in this way, when a convex part is formed on the observation surface side, a convex reflective film is formed with respect to the projection light, and when a convex part is formed on the non-observation surface side, the projection is performed. A concave reflective film is formed with respect to light. Therefore, when a concave reflective film is formed with respect to the projection light, a reflective screen excellent in light condensing performance with respect to the normal direction of the observation surface is obtained. Further, when a convex reflection film is formed with respect to the projection light, a reflection screen having excellent light scattering properties is obtained.

Further, the reflection screen of the present invention is configured to project projection light emitted obliquely toward the observation surface from a projector disposed at a position shifted in a direction perpendicular to the normal line of the observation surface of the screen substrate. A plurality of concave portions or a plurality of convex portions formed in the vertical direction and the horizontal direction of the screen substrate, and along the portions of the concave portions or the convex portions irradiated with the projection light. A reflection film that reflects the projection light is formed, and a light absorption film is formed on the reflection film excluding a portion of the concave portion or the convex portion that is irradiated with the projection light, and the thickness of the light absorption film is It is characterized by being gradually thinner as it approaches the boundary with the reflective film.
With such a configuration, the light absorptivity of the outer edge portion of the light absorption film can be gradually reduced, and a steep change in reflectance at the boundary between the reflection film and the light absorption film can be mitigated. Therefore, when the observation angle with respect to the reflective screen is changed, the change in contrast of the projected image can be moderated.

<First embodiment>
Hereinafter, a first embodiment of the present invention will be described with reference to the drawings. In the following drawings, the scale is appropriately changed for each layer and each member so that each layer and each member can be recognized on the drawing. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the vertical plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the vertical plane is defined as a Y-axis direction, and a direction orthogonal to the X-axis direction and the Y-axis direction is defined as a Z-axis direction.

(Reflection screen manufacturing method)
As shown in FIGS. 1 and 2, first, a plurality of concave portions 2 are formed in the vertical direction (Y-axis direction) and the horizontal direction (X-axis direction) of the observation surface 1 a of the screen substrate 1.
A known method can be used for forming the recess 2. For example, as described in Japanese Patent Application Laid-Open No. 2004-286906, an etching hole corresponding to the formation position of the recess 2 is formed by laser processing on an etching mask film formed on the observation surface 1a of the screen substrate 1, By performing wet etching, the concave portion 2 can be formed.
Thereby, the substantially hemispherical recessed part 2 is formed. The diameter D1 of the recess 2 and the distance D2 between the horizontal centers are, for example, about 100 μm.

Next, the entire screen substrate 1 on which the recesses 2 are formed is colored black, for example, by staining. Thereby, the screen substrate 1 itself can function as a light absorption layer.
Next, as shown in FIG. 3, the reflective film 3 is formed on the observation surface 1 a of the screen substrate 1 with a material having excellent reflectivity such as aluminum. The reflective film 3 is formed by, for example, a sputtering method, a vapor deposition method, an electrostatic spray method, or the like. Thereby, the reflective film 3 is formed on the observation surface 1 a of the screen substrate 1 including the surface 2 a of the recess 2.

Next, a negative resist NR is formed on the reflective film 3 on the observation surface 1 a of the screen substrate 1.
Next, as shown in FIG. 4, the resist NR is exposed by irradiating light Ls for exposing the resist NR obliquely from the exposure light source S to the observation surface 1a. Here, the emission position of the projection light with respect to the reflection screen is assumed in advance as the virtual light source position PV. The incident angle θs of the light Ls that exposes the resist NR emitted from the exposure light source S with respect to each concave portion 2 of the observation surface 1a is equal to or smaller than the incident angle θp with respect to each concave portion 2 of the projection light Lp emitted from the virtual light source position PV. The exposure light source S is arranged so that
By exposing the resist NR in this state, a portion of the resist NR corresponding to the portion irradiated with the projection light Lp of the recess 2 is exposed. In addition, the area of the recess 2 where the light Ls for exposing the resist NR is irradiated is equal to or less than the area of the recess 2 where the projection light Lp is irradiated.

Next, the resist NR is immersed in a developing solution to leave the exposed portion of the resist NR as shown in FIG. 5A, and the other resist NR is peeled off. Thereby, the reflective film 3 is exposed except for the exposed portion of the resist NR.
Next, the exposed reflective film 3 is removed by etching as shown in FIG. As a result, the surface 2a of the recess 2 is exposed except for the portion where the resist NR is exposed.
Next, the resist NR remaining on the reflective film 3 is dissolved or peeled off to expose the reflective film 3 as shown in FIG. Thereby, the reflective film 3 is formed in the part corresponding to the part irradiated with the projection light Lp of the recess 2. Further, the reflective film 3 is formed to have an area equal to or smaller than the area of the concave portion 2 where the projection light Lp is irradiated.

Further, by forming the reflective film 3 as described above, the exposure light source S is formed on the observation surface 1a of the screen substrate 1 corresponding to the incident direction of the projection light Lp from the virtual light source position PV as shown in FIG. It is formed radially with the position of.
Thus, by forming the reflective film 3 in the concave portion 2 by photoresist and etching, it corresponds to the portion where the projection light Lp is incident as compared with the case where the conventional spray coating method, printing method, or the like is used. The reflective film 3 can be formed accurately.

Next, as shown in FIG. 7, a protective layer 4 is formed on the observation surface 1 a of the screen substrate 1 including the surface 2 a of the recess 2. The protective layer 4 is formed of, for example, a light transmissive material such as a transparent resin. Further, an antireflection layer 5 is formed on the surface of the protective layer 4. The antireflection layer 5 is formed of the same material as that of the protective layer 4, and is refracted between the protective layer 4 so that projection light Lp and external light incident on the antireflection layer 5 are not reflected on the surface of the protective layer 4. The rate has been adjusted.
As described above, according to the reflective screen manufacturing method of the present embodiment, the reflective screen 100 as shown in FIG. 7 can be manufactured.

(Reflective screen)
Next, the reflective screen 100 manufactured by the manufacturing method of this embodiment will be described.
As shown in FIG. 8, the reflective screen 100 is emitted obliquely toward the observation surface 100a from the projector P arranged at a position shifted in the direction perpendicular to the normal line NL of the observation surface 100a (Y-axis direction). The projected light Lp thus reflected is reflected to the observation side (Z-axis positive direction side) of the reflection screen 100. The reflective screen 100 is arranged so that the normal line NL is parallel to the Z axis.

  The projector P includes a mirror M that reflects the projection light Lp toward the observation surface 100 a of the reflection screen 100. Here, it is assumed that the position of the projector P when the projection light Lp is emitted from the projector P that does not include the mirror M is the virtual light source position PV. Similarly to the projector P, the virtual light source position PV is also shifted in a direction perpendicular to the normal line NL of the observation surface 100a of the reflection screen 100.

  The projector P sets the distance D between the virtual light source position PV and the observation surface 100a to about 900 mm, and the angle θ formed between the projection light Lp from the virtual light source position PV toward the center point C of the reflection screen 100 and the observation surface 100a is about 36 °. In this case, an image having a vertical dimension H of about 996 mm and a horizontal dimension (X-axis direction) W of 1771 mm can be projected onto the reflective screen 100. That is, the reflective screen 100 has a size capable of displaying an 80-inch projection image.

Next, the operation of the reflective screen 100 will be described.
As shown in FIG. 8, the projector P emits projection light Lp toward the mirror M. The projection light Lp emitted toward the mirror M is reflected by the mirror M and incident obliquely on the observation surface 100a of the reflection screen 100, similarly to the projection light Lp assumed to be emitted from the virtual light source position PV. . At this time, the angle θ formed between the projection light Lp incident on the center point C of the reflection screen 100 and the observation surface 100a of the reflection screen 100 is about 36 °.

The projection light Lp that has reached the observation surface 100a of the reflection screen 100 enters the antireflection layer 5 shown in FIG. The projection light Lp incident on the antireflection layer 5 passes through the antireflection layer 5 and enters the protective layer 4. At this time, since the refractive index of the antireflection layer 5 is adjusted with respect to the protective layer 4, the projection light Lp transmitted through the antireflection layer 5 is prevented from being reflected by the surface 4 a of the protective layer 4.
The projection light Lp incident on the protective layer 4 passes through the protective layer 4 and reaches the reflective film 3 formed on the surface 2 a of the recess 2. The projection light Lp that has reached the reflective film 3 is reflected by the reflective film 3 toward the observation side of the reflective screen 100.

Here, as shown in FIGS. 6 and 7, the reflective film 3 is accurately formed corresponding to the portion irradiated with the projection light Lp of the recess 2. Accordingly, it is possible to prevent a decrease in contrast due to a positional shift of the reflective film 3, a deviation in contrast in the observation surface 1a, and the like.
Further, along the portion irradiated with the projection light Lp on the surface 2a of the recess 2, the concave reflective film 3 as viewed from the observation side (Z-axis positive direction side) corresponds to the incident direction of the projection light Lp on the observation surface 1a. The exposure light source S is formed radially. Thereby, the projection light Lp incident on the observation surface 100a at an angle in the vertical direction and the horizontal direction on the upper side in the vertical direction (Y-axis direction positive direction) side and the both ends in the horizontal direction of the reflection screen 100 is reflected on the reflection film. 3 allows efficient reflection in the direction closer to the normal line NL on the observation side, and improves the reflectance of the projection light Lp.

  As shown in FIG. 8, outside light Lo enters the observation surface 100a of the reflective screen 100 from the upper side in the vertical direction (Y-axis positive direction) in addition to the projection light Lp. The external light Lo incident on the observation surface 100a is incident on the antireflection layer 5 shown in FIG. 7, passes through the antireflection layer 5, and reaches the surface 4a of the protective layer 4. At this time, the antireflection layer 5 prevents the external light Lo incident on the observation surface 100a from above the observation surface 100a from being reflected on the surface 4a of the protective layer 4 to the observation side.

The external light Lo that has reached the surface 4 a of the protective layer 4 passes through the protective layer 4 and enters the recess 2. The external light Lo incident on the concave portion 2 reaches the non-formation region of the reflective film 3 in the concave portion 2.
Here, since the screen substrate 1 is colored as described above and is formed so as to function as a light absorption layer with respect to visible light, the screen substrate 1 reaches the non-formation region of the reflection film 3 on the surface 2a of the recess 2. External light Lo is absorbed by the screen substrate 1. Further, the external light Lo that has reached the non-formation region of the concave portion 2 of the screen substrate 1 is similarly absorbed by the screen substrate 1. Further, since the reflection film 3 is formed corresponding to the portion where the projection light Lp emitted from the lower side in the vertical direction (Y-axis negative direction) is incident on the recess 2, the external light Lo is applied to the reflection film 3. Incident is prevented. Therefore, it is possible to prevent the external light Lo incident on the observation surface 100a of the reflective screen 100 from being reflected to the observation side.

Further, the reflective film 3 is formed to have an area equal to or smaller than the area of the concave portion 2 where the projection light Lp is irradiated. Thereby, the area of the non-formation area | region of the reflecting film 3 in the surface 2a of the recessed part 2 can be enlarged. Therefore, the external light Lo can be more reliably incident on the non-formation region of the reflective film 3, and the external light Lo can be prevented from entering the reflective film 3, and reflection of external light can be prevented.
Further, as shown in FIGS. 6 and 7, as the distance from the virtual light source position PV increases, the area of the surface 2 a of the concave portion 2 where the reflective film 3 is formed is reduced, and the non-formed region of the reflective film 3 is formed. Is expanding. Therefore, it is possible to improve the light absorptivity for the external light Lo on the upper side in the vertical direction of the reflective screen 100 that is more easily affected by the external light Lo.

  Further, the incident angle θs of the light Ls for exposing the resist NR with respect to each concave portion 2 is set to be equal to or smaller than the incident angle with respect to each concave portion 2 of the projection light Lp emitted from the virtual light source position PV. The difference in the area of the reflective film 3 due to the difference in distance from the recess 2 to each recess 2 is small. Therefore, it is possible to reduce the deviation of the reflectance in the observation surface 1a of the screen substrate 1 and reduce the difference in contrast in the observation surface 1a of the projected image.

  Further, the antireflection layer 5 reliably causes the projection light Lp to reach the projection light Lp incident on the observation surface 100a of the reflection screen 100 from the projector P by the reflection film 3, thereby improving the reflectance of the projection light Lp. There is an effect to make. On the other hand, with respect to the external light Lo incident on the observation surface 100a, there is an effect that the external light Lo is absorbed by the screen substrate 1 without being reflected by the protective layer 4 to the observation side. Therefore, the contrast of the reflective screen 100 can be improved by forming the antireflection layer 5 as described above.

As described above, according to the reflective screen 100 of the present embodiment, the reflective film 3 of the reflective screen 100 is accurately formed corresponding to the portion irradiated with the projection light Lp of the recess 2, and the reflective film 3 is non-reflective. By absorbing the external light Lo in the formation region, it is possible to prevent the contrast from being lowered, the external light from being reflected, and the contrast from being biased in the observation plane.
In addition, since the protective layer 4 is formed so as to cover the reflective film 3, damage and deterioration of the reflective film 3 can be prevented.

<Second embodiment>
Next, a second embodiment of the present invention will be described with reference to FIGS. 9A to 9C with reference to FIGS. This embodiment is different from the manufacturing method of the reflective screen 100 described in the first embodiment described above in that the convex portion 21 is formed on the observation surface 11 a of the screen substrate 11. Since the other points are the same as in the first embodiment, the same parts are denoted by the same reference numerals and description thereof is omitted.

(Reflection screen manufacturing method)
As shown in FIGS. 1 and 9A, first, a plurality of convex portions 21 are formed in the vertical direction (Y-axis direction) and the horizontal direction (X-axis direction) of the observation surface 11a of the screen substrate 11.
A well-known thing can be used for the formation method of the convex part 21. FIG. For example, as described in Japanese Patent Application Laid-Open No. 2004-286906, a surface on which a concave portion corresponding to the convex portion 21 is formed by etching or the like on a mold for forming the convex portion 21 and the concave portion of the mold is formed. The convex portion 21 can be formed by pressing a thermoplastic resin or the like while applying heat thereto.
Thereby, the substantially hemispherical convex part 21 is formed. The diameter D1 of the convex portion 21 and the distance D2 between the centers in the horizontal direction are, for example, about 100 μm.

Next, as in the first embodiment, the entire screen substrate 11 is colored black by, for example, staining. Thereby, the screen substrate 1 itself can function as a light absorption layer.
Next, the reflective film 31 is formed on the observation surface 11a of the screen substrate 11 including the surface 21a of the convex portion 21 as in the first embodiment. Then, a negative resist NR that covers the reflective film 31 is formed on the reflective film 31.
Next, as shown in FIG. 9A, the light LS for exposing the resist NR is obliquely irradiated from the exposure light source S to the observation surface 11a to expose the resist NR.

Here, the emission position of the projection light Lp with respect to the reflection screen is assumed as the virtual light source position PV. The incident angle θs of the light Ls that exposes the resist NR emitted from the exposure light source S with respect to each convex portion 21 of the observation surface 11a is the incident angle with respect to each convex portion 21 of the projection light Lp emitted from the virtual light source position PV. The exposure light source S is arranged so as to be equal to or less than θp.
By exposing the resist NR in this state, a portion of the resist NR corresponding to the portion irradiated with the projection light Lp of the convex portion 21 is exposed. Further, the area of the portion irradiated with the light Ls for exposing the resist NR of the convex portion 21 is equal to or smaller than the area of the portion irradiated with the projection light Lp of the convex portion 21.

Next, the resist NR is immersed in a developer, and as shown in FIG. 9B, the exposed resist NR is left, the other resist NR is peeled off, and the exposed reflective film 31 is etched. Remove. Thereby, the surface 21a of the convex portion 21 is exposed except for the portion where the resist NR is exposed.
Next, as shown in FIG. 9C, similarly to the first embodiment, the resist NR remaining on the reflective film 31 is dissolved or peeled off, and the protective layer 4 and the antireflection are formed on the observation surface 11a of the screen substrate 11. Layer 5 is formed.

As a result, the reflective film 31 is formed on the portion of the convex portion 21 that is irradiated with the light Ls that exposes the resist NR, and the area of the reflective film 31 is less than the area of the convex portion 21 that is irradiated with the projection light Lp. Is done.
As described above, according to the manufacturing method of the reflective screen 200 of the present embodiment, the reflective screen 200 as shown in FIG. 9C can be manufactured.

(Reflective screen)
Next, the reflective screen 200 manufactured by the manufacturing method of this embodiment will be described.
As shown in FIG. 8, the reflective screen 200 is disposed in the same manner as the reflective screen 100 of the first embodiment. The projector P is configured in the same manner as in the first embodiment, and is arranged in the same manner as in the first embodiment.
The projection light Lp emitted from the projector P toward the mirror M is obliquely incident on the observation surface 200a of the reflection screen 200, similarly to the projection light Lp assumed to be emitted from the virtual light source position PV.

  The projection light Lp that has reached the observation surface 200a of the reflection screen 200 is incident on the antireflection layer 5 shown in FIG. The projection light Lp incident on the antireflection layer 5 passes through the antireflection layer 5 and enters the protective layer 4. At this time, since the refractive index of the antireflection layer 5 is adjusted with the protective layer 4, the projection light Lp transmitted through the antireflection layer 5 is prevented from being reflected by the surface 4 a of the protective layer 4.

The projection light Lp incident on the protective layer 4 passes through the protective layer 4 and reaches the reflective film 31 formed on the surface of the convex portion. The projection light Lp that has reached the reflective film 31 is reflected by the reflective film 31 toward the observation side of the reflective screen 200.
Here, as shown in FIGS. 9A and 9C, the reflective film 31 is accurately formed corresponding to the portion of the convex portion 21 irradiated with the projection light Lp. Therefore, it is possible to prevent the contrast from being lowered due to the displacement of the reflective film 31 and to prevent the deviation of the contrast in the observation surface 11a.

  Further, along the portion irradiated with the projection light Lp on the surface 21a of the convex portion 21, the convex reflective film 31 as viewed from the observation side (Z-axis positive direction side) is centered on the exposure light source S on the observation surface 11a. , Corresponding to the incident direction of the projection light Lp. Thereby, the projection light Lp incident on the observation surface 200a at an angle in the vertical direction and the horizontal direction on the upper side in the vertical direction (Y-axis direction positive direction) side and the both ends in the horizontal direction of the reflection screen 200 is reflected on the reflection film. By 31, it can reflect efficiently in the direction close | similar to the normal line NL on the observation side, and the reflectance of the projection light Lp can be improved.

On the other hand, as shown in FIG. 8, external light Lo incident on the observation surface 200a of the reflective screen 200 from above in the vertical direction (Y-axis positive direction side) is shown in FIG. 9C as in the first embodiment. The antireflection layer 5 shown prevents reflection from the surface 4a of the protective layer 4 toward the observation side.
The external light Lo that has reached the surface 4 a of the protective layer 4 passes through the protective layer 4 and reaches the convex portion 21. The external light Lo that has reached the convex portion 21 is incident on the non-formation region of the reflective film 33 of the convex portion 21.
Here, since the screen substrate 11 is colored as described above and is formed so as to function as a light absorption layer for visible light, the screen substrate 11 reaches the non-formation region of the reflection film 31 on the surface 21a of the convex portion 21. The external light Lo thus absorbed is absorbed by the screen substrate 11. Further, the external light Lo reaching the non-formation region of the convex portion 21 of the screen substrate 11 is similarly absorbed by the screen substrate 1. Furthermore, since the reflective film 31 is formed corresponding to the portion of the projection 21 where the projection light Lp is incident, the external light Lo is prevented from entering the reflective film 31. Therefore, it is possible to prevent the external light Lo incident on the observation surface 200a of the reflection screen 200 from being reflected to the observation side.

Further, the reflective film 31 is formed to have an area equal to or smaller than the area of the projection 21 irradiated with the projection light Lp. Thereby, the area of the non-formation area | region of the reflecting film 31 in the surface 21a of the convex part 21 can be enlarged. Therefore, the external light Lo can be reliably incident on the non-formation region of the reflective film 31, and the external light Lo can be prevented from entering the reflective film 31, and the reflection of the external light Lo can be prevented.
Further, as shown in FIGS. 9A to 9C, as the distance from the virtual light source position PV increases, the area of the portion of the surface 21a of the convex portion 21 where the reflective film 31 is formed is reduced. The non-formation region of the reflective film 31 is enlarged. Therefore, it is possible to improve the light absorptivity with respect to the external light Lo on the upper side in the vertical direction of the reflective screen 200 that is more easily affected by the external light Lo.

  Further, the incident angle θs of the light Ls for exposing the resist NR to the observation surface 11a is set to be equal to or smaller than the incident angle θp of the projection light Lp emitted from the virtual light source position PV to the observation surface 11a. The difference in the area of the reflective film 31 due to the difference in distance from the PV to each convex portion 21 is small. Therefore, it is possible to reduce the deviation of the reflectance in the observation surface 11a of the screen substrate 11 and reduce the contrast difference of the projected image.

  Further, the antireflection layer 5 reliably causes the projection light Lp to reach the projection light Lp incident on the observation surface 200a of the reflection screen 200 from the projector P by the reflection film 31 and improves the reflectance of the projection light Lp. There is an effect to make. On the other hand, the external light Lo incident on the observation surface 200a has an effect of absorbing the external light Lo on the screen substrate 11 without reflecting the external light Lo to the observation side by the protective layer 4. Therefore, the contrast of the reflective screen 200 can be improved by forming the antireflection layer 5 as described above.

As described above, according to the reflective screen 200 of the present embodiment, the reflective film 31 of the reflective screen 200 is accurately formed corresponding to the portion irradiated with the projection light Lp of the convex portion 21 to prevent a reduction in contrast. In addition, it is possible to prevent the reflection of external light and to prevent the deviation of the contrast in the observation surface 11a.
In addition, since the protective layer 4 is formed so as to cover the reflective film 31, damage and deterioration of the reflective film 31 can be prevented.

<Third embodiment>
Next, a third embodiment of the present invention will be described with reference to FIGS. 10A to 10C with reference to FIGS. 1 to 4, 6, and 8. This embodiment differs from the manufacturing method of the reflective screen 100 described in the first embodiment described above in that a light absorbing film is formed on the reflective film 3 formed in the concave portion 2 of the observation surface 1a of the screen substrate 1. Yes. Since the other points are the same as in the first embodiment, the same parts are denoted by the same reference numerals and description thereof is omitted.

(Reflection screen manufacturing method)
As shown in FIGS. 1 and 2, a plurality of recesses 2 are formed in the vertical direction (Y-axis direction) and the horizontal direction (X-axis direction) of the observation surface 1a of the screen substrate 1 as in the first embodiment.
Next, the entire screen substrate 1 on which the recesses 2 are formed is colored black, for example, by staining. Thereby, the screen substrate 1 itself can function as a light absorption layer.
Next, as shown in FIG. 3, the reflective film 3 is formed on the observation surface 1 a of the screen substrate 1 as in the first embodiment.

Next, a positive resist PR is formed on the reflective film 3 on the observation surface 1 a of the screen substrate 1. Here, as the resist PR, for example, a resist colored in black and capable of absorbing visible light is used. Next, as shown in FIG. 4, similarly to the first embodiment, the resist PR is exposed by irradiating light for exposing the resist PR obliquely from the exposure light source S to the observation surface 1 a.
Next, the resist PR is immersed in a developing solution, and as shown in FIG. 10A, the exposed portion of the resist PR is peeled off, and the other resist PR is left. As a result, the portion of the reflective film 3 exposed to the resist PR is exposed, and the other portion of the reflective film 3 is covered with the resist PR that functions as a light absorbing film capable of absorbing visible light. It can be a formation region.

Next, the remaining resist PR is baked. As a result, as shown in FIG. 10B, the resist PR is deformed by heat, and the film thickness of the resist PR is formed so as to gradually decrease as it approaches the boundary with the reflective film 3 on the outer edge of the resist PR. The
Further, by forming the reflective film 3 as described above, the exposure light source S is formed on the observation surface 1a of the screen substrate 1 corresponding to the incident direction of the projection light Lp from the virtual light source position PV as shown in FIG. It is exposed radially around the position of.

Thus, by exposing the reflective film 3 to the concave portion 2 with the photoresist, it is possible to accurately correspond to the portion where the projection light Lp is incident as compared with the case where the conventional spray coating method, printing method, or the like is used. The reflective film 3 can be formed.
Moreover, since the process of etching the reflective film 3 can be omitted as compared with the first embodiment, the process can be simplified to facilitate the manufacturing, improve the productivity, and reduce the manufacturing cost.

Next, as shown in FIG. 10B, the protective layer 4 and the antireflection layer 5 are formed as in the first embodiment.
As mentioned above, according to the manufacturing method of the reflective screen 101 of this embodiment, the reflective screen 101 as shown in FIG.10 (c) can be manufactured.

(Reflective screen)
Next, the reflective screen 101 manufactured by the manufacturing method of this embodiment will be described.
As shown in FIG. 8, the reflective screen 101 is disposed in the same manner as the reflective screen 100 of the first embodiment. The projector P is configured in the same manner as in the first embodiment, and is arranged in the same manner as in the first embodiment.
As shown in FIG. 8, the projection light Lp emitted from the projector P toward the mirror M is reflected by the mirror M and is incident obliquely on the observation surface 101 a of the reflection screen 101.

The projection light Lp that has reached the observation surface 101a of the reflective screen 101 enters the antireflection layer 5 shown in FIG. 10C, passes through the antireflection layer 5, and enters the protective layer 4. At this time, the antireflection layer 5 prevents the projection light Lp from being reflected by the surface 4 a of the protective layer 4.
The projection light Lp incident on the protective layer 4 passes through the protective layer 4 and reaches the reflective film 3 formed on the surface 2 a of the recess 2. The projection light Lp that has reached the reflective film 3 is reflected by the reflective film 3 toward the observation side of the reflective screen 101, as in the first embodiment.

On the other hand, as shown in FIG. 8, the external light Lo incident on the observation surface 101a is prevented from being reflected on the surface 4a of the protective layer 4 to the observation side by the antireflection layer 5, as in the first embodiment. The
The external light Lo that has passed through the protective layer 4 and entered the concave portion 2 reaches a non-formation region of the reflective film 3 in the concave portion 2.
Here, since the resist PR that functions as a light absorption film is formed in the non-formation region of the reflection film 3 as described above, the outer surface that has reached the non-formation region of the reflection film 3 on the surface 2a of the recess 2 is formed. The light Lo is absorbed by the resist PR. Further, since the reflection film 3 is formed corresponding to the portion where the projection light Lp emitted from the lower side in the vertical direction (Y-axis negative direction) is incident on the recess 2, the external light Lo is applied to the reflection film 3. Incident is prevented. Therefore, it is possible to prevent the external light Lo incident on the observation surface 100a of the reflective screen 100 from being reflected to the observation side.

Further, the reflective film 3 is exposed to an area equal to or less than the area of the concave portion 2 where the projection light Lp is irradiated. Thereby, the area of the resist PR on the surface 2a of the recess 2 can be increased. Therefore, the external light Lo can be reliably incident by the resist PR, the external light Lo can be prevented from entering the reflective film 3, and the reflection of the external light Lo can be prevented.
Further, as shown in FIGS. 6 and 10C, as the distance from the virtual light source position PV increases, the area of the portion of the surface 2a of the recess 2 where the reflective film 3 is exposed decreases, and the area of the resist PR Is expanding. Therefore, it is possible to improve the light absorptivity with respect to the external light Lo on the upper side in the vertical direction of the reflective screen 101 that is more easily influenced by the external light Lo.

Further, the incident angle θs of the light Ls for exposing the resist PR to the observation surface 1a is set to be equal to or smaller than the incident angle θp of the projection light Lp emitted from the virtual light source position PV to the observation surface 1a. The difference in the area of the reflective film 3 due to the difference in distance from the PV to each recess 2 is small. Therefore, it is possible to reduce the deviation of the reflectance in the observation surface 1a of the screen substrate 1 and reduce the difference in contrast of the projected image in the observation surface 1a.
Further, as in the first embodiment, the contrast of the reflective screen 101 can be improved by forming the antireflection layer 5.

  Further, the resist PR functioning as a light absorption film is formed such that the film thickness gradually decreases as the film thickness approaches the boundary with the reflective film 3 on the outer edge of the resist PR. Therefore, the light absorption rate gradually decreases as the outer edge of the resist PR is approached, and light is reflected by the reflective film 3 under the resist PR. Thereby, it is possible to prevent a sharp change in reflectance at the boundary between the outer periphery of the resist PR and the reflective film 3.

  As described above, according to the reflective screen 100 of the present embodiment, not only the same effects as in the first embodiment can be obtained, but also steep reflection at the boundary between the reflective film 3 and the non-formation region of the reflective film 3. It is possible to prevent a change in rate and prevent a sharp change in contrast due to a change in observation angle with respect to the observation surface 1a.

<Fourth embodiment>
Next, a fourth embodiment of the present invention will be described with reference to FIGS. 11 (a) to 11 (c) with reference to FIGS. 1, 8 and 9 (a). This embodiment is different from the manufacturing method of the reflection screen 200 described in the second embodiment described above in that a light absorption film is formed on the reflection film 31 formed on the convex portion 21. Since the other points are the same as those of the second embodiment, the same parts are denoted by the same reference numerals and description thereof is omitted.

(Reflection screen manufacturing method)
As shown in FIGS. 1 and 9A, in the vertical direction (Y-axis direction) and the horizontal direction (X-axis direction) of the observation surface 11a of the screen substrate 11, a plurality of convex portions 21 are provided as in the second embodiment. Form.
Next, the entire screen substrate 11 on which the convex portions 21 are formed is colored black, for example, by staining. Thereby, the screen substrate 11 itself can function as a light absorption layer.
Next, the reflective film 31 is formed on the observation surface 11a of the screen substrate 11 as in the second embodiment.

Next, a positive resist PR covering the reflective film 31 is formed on the reflective film 31 on the observation surface 11 a of the screen substrate 11. Here, as the resist PR, for example, a resist colored in black and capable of absorbing visible light is used. Next, as in the second embodiment, the resist PR is exposed by irradiating light Ls for exposing the resist PR obliquely from the exposure light source S to the observation surface 11a.
Next, the resist PR is immersed in a developing solution, and as shown in FIG. 11A, the exposed portion of the resist PR is peeled off, and the other resist PR is left. As a result, the reflective film 31 in the portion exposed to the resist PR is exposed, and the reflective film 31 in the other portion is covered with the resist PR that functions as a light absorbing film capable of absorbing visible light. It can be a formation region.

Next, the remaining resist PR is baked. As a result, as shown in FIG. 11B, the resist PR is deformed by heat, and the film thickness of the resist PR is formed so as to gradually decrease as it approaches the boundary with the reflective film 31 at the outer edge of the resist PR. The
Further, by forming the reflection film 31 as described above, the exposure surface 11a of the screen substrate 11 is exposed to light corresponding to the incident direction of the projection light Lp from the virtual light source position PV, as in the second embodiment. It is exposed radially with the position of the light source S as the center.

In this way, by exposing the reflective film 3 to the convex portion 21 with the photoresist, compared to the case where the conventional spray coating method, printing method, or the like is used, the projection light Lp is more accurately incident. The reflective film 31 can be formed on the substrate.
Moreover, since the process of etching the reflective film 31 can be omitted as compared with the second embodiment, the process can be simplified to facilitate manufacture, improve productivity, and reduce manufacturing cost.

Next, as shown in FIG. 11C, the protective layer 4 and the antireflection layer 5 are formed as in the second embodiment.
As mentioned above, according to the manufacturing method of the reflective screen 201 of this embodiment, the reflective screen 201 as shown in FIG.11 (c) can be manufactured.

(Reflective screen)
Next, the reflective screen 201 manufactured by the manufacturing method of this embodiment will be described.
As shown in FIG. 8, the reflective screen 201 is disposed in the same manner as the reflective screen 100 of the first embodiment. The projector P is configured in the same manner as in the first embodiment, and is arranged in the same manner as in the first embodiment.
As shown in FIG. 8, the projection light Lp emitted from the projector P toward the mirror M is reflected by the mirror M and is incident obliquely on the observation surface 201 a of the reflection screen 201.

The projection light Lp that has reached the observation surface 201a of the reflection screen 201 enters the antireflection layer 5 shown in FIG. 11C, passes through the antireflection layer 5, and enters the protective layer 4. At this time, the antireflection layer 5 prevents the projection light Lp from being reflected by the surface 4 a of the protective layer 4.
The projection light Lp incident on the protective layer 4 passes through the protective layer 4 and reaches the reflection film 31 formed on the surface 2 a of the convex portion 21. The projection light Lp that has reached the reflective film 3 is reflected by the reflective film 31 to the observation side of the reflective screen 201 as in the second embodiment.

On the other hand, as shown in FIG. 8, the external light Lo incident on the observation surface 201a is prevented from being reflected by the antireflection layer 5 on the surface 4a of the protective layer 4 to the observation side, as in the second embodiment. The
The external light Lo that has passed through the protective layer 4 and reached the convex portion 21 is incident on a region where the reflective film 31 of the convex portion 21 is not formed.
Here, since the resist PR that functions as a light absorption film is formed in the non-formation region of the reflection film 31 as described above, the non-formation region of the reflection film 31 on the surface 21a of the convex portion 21 is reached. The external light Lo is absorbed by the resist PR. Further, since the reflective film 31 is exposed corresponding to the portion where the projection light Lp emitted from the lower side in the vertical direction (Y-axis negative direction) is incident on the convex portion 21, the reflective film 31 is exposed to the reflective film 31 of the external light Lo. Is prevented from entering. Therefore, the external light Lo incident on the observation surface 201a of the reflection screen 201 can be prevented from being reflected to the observation side.

Further, the reflective film 31 is formed to have an area equal to or smaller than the area of the projection 21 irradiated with the projection light Lp. Thereby, the area of the resist PR on the surface 21a of the convex portion 21 can be increased. Therefore, the external light Lo can be reliably incident by the resist PR, the external light Lo can be prevented from entering the reflective film 31, and the reflection of the external light Lo can be prevented.
Further, as shown in FIGS. 8 and 11C, as the distance from the virtual light source position PV increases, the area of the portion of the surface 21a where the reflective film 31 is exposed on the surface 21a of the convex portion 21 is reduced. The area is expanding. Therefore, it is possible to improve the light absorptivity for the external light Lo on the upper side in the vertical direction of the reflective screen 100 that is more easily affected by the external light Lo.

Further, the incident angle θs of the light for exposing the resist PR to the observation surface 11a is set to be equal to or smaller than the incident angle θp of the projection light Lp emitted from the virtual light source position PV with respect to the observation surface 11a. The difference in the area of the reflective film 31 due to the difference in distance from the projections 21 to the projections 21 is small. Therefore, it is possible to reduce the deviation of the reflectance in the observation surface 11a of the screen substrate 11 and reduce the contrast difference of the projected image.
Moreover, the contrast of the reflective screen 201 can be improved by forming the antireflection layer 5 as in the second embodiment.

  Further, the resist PR functioning as a light absorption film is formed such that the film thickness gradually decreases as the film thickness approaches the boundary with the reflective film 3 on the outer edge of the resist PR. Therefore, similar to the third embodiment, it is possible to prevent a steep change in reflectance at the boundary between the outer periphery of the resist PR and the reflective film 31.

  As described above, according to the reflective screen 201 of the present embodiment, not only the same effects as in the second embodiment are obtained, but also steep reflection at the boundary between the reflective film 31 and the non-formation region of the reflective film 31. It is possible to prevent a change in rate and prevent a sharp change in contrast due to a change in observation angle with respect to the observation surface 11a.

<Fifth embodiment>
Next, a fifth embodiment of the present invention will be described with reference to FIGS. 12A and 12B and FIGS. 13A to 13C with reference to FIGS. This embodiment is different from the manufacturing method of the reflective screen 100 described in the first embodiment described above in that a recess 22 is formed on the surface 12b of the screen substrate 12 opposite to the observation surface 12a. Since the other points are the same as in the first embodiment, the same parts are denoted by the same reference numerals and description thereof is omitted.

(Reflection screen manufacturing method)
As shown in FIGS. 1 and 12A, first, the first implementation is performed in the vertical direction (Y-axis direction) and the horizontal direction (X-axis direction) of the surface 12b opposite to the observation surface 12a of the screen substrate 12. A plurality of recesses 22 are formed in the same manner as the form. Further, the screen substrate 12 is formed of a resin having light transparency.
Next, a reflective film 32 and a negative resist NR similar to those of the first embodiment are formed on the surface 12 b opposite to the observation surface 12 a of the screen substrate 12 including the surface 22 a of the recess 22.

Next, as shown in FIG. 12B, the resist NR is exposed by irradiating light Ls for exposing the resist NR obliquely from the exposure light source S to the surface 12b opposite to the observation surface 12a. Here, the emission position of the projection light Lp with respect to the reflection screen is assumed as the virtual light source position PV. The incident angle θs of the light Ls that exposes the resist NR emitted from the exposure light source S with respect to the center Cb of the surface 12b opposite to the observation surface 12a is the observation surface 12a of the projection light Lp emitted from the virtual light source position PV. The exposure light source S is arranged so that the incident angle θp with respect to the center Ca is equal to or less.
By exposing the resist NR in this state, a portion of the resist NR corresponding to the portion irradiated with the projection light Lp of the recess 22 is exposed. Further, the area of the portion irradiated with the light Ls for exposing the resist NR in the recess 22 is equal to or smaller than the area of the portion irradiated with the projection light Lp of the recess 22.

Next, the resist NR is immersed in a developing solution to leave the exposed portion of the resist NR as shown in FIG. 13A, and the other resist NR is peeled off. As a result, the reflective film 32 is exposed except for the exposed portion of the resist NR.
Next, as shown in FIG. 13B, the exposed reflective film 32 is removed by etching. As a result, the surface of the recess 22 is exposed except for the exposed portion of the resist NR.
Next, the resist NR remaining on the reflective film 32 is dissolved or peeled off to expose the reflective film 32 as shown in FIG. Thereby, the reflective film 32 is formed in the part corresponding to the part irradiated with the projection light of the recess 22. Further, the reflective film 32 is formed to have an area equal to or smaller than the area of the recess 22 where the projection light Lp is irradiated.

Next, the light absorption layer 6 is formed on the surface 12 b opposite to the observation surface 12 a of the screen substrate 12 including the surface 22 a of the recess 22. The light absorption layer 6 is formed using, for example, a resin colored black by dyeing or the like, or a resin containing a black pigment. Further, an antireflection layer 51 is formed on the observation surface 12 a of the screen substrate 12. The antireflection layer 51 is formed of, for example, a transparent resin, and the projection light Lp and the external light Lo incident on the antireflection layer 51 are not reflected between the screen substrate 12 and the screen substrate 12 so as not to be reflected by the observation surface 12a. The refractive index is adjusted.
As described above, according to the reflective screen manufacturing method of the present embodiment, the reflective screen 300 shown in FIG. 13C can be manufactured.

(Reflective screen)
Next, the reflective screen 300 manufactured by the manufacturing method of this embodiment will be described.
As shown in FIG. 8, the reflective screen 300 is disposed in the same manner as the reflective screen 100 of the first embodiment.
The projection light Lp emitted from the projector P toward the mirror M is obliquely incident on the observation surface 300a of the reflective screen 300 in the same manner as the projection light Lp assumed to be emitted from the virtual light source position PV.

Here, the reflective screen 300 has substantially the same configuration as the reflective screen 200 of the second embodiment shown in FIG. Therefore, according to the reflective screen 300 of this embodiment, substantially the same effect as that of the reflective screen 200 of the second embodiment can be obtained.
In addition, unlike the reflective screen 200 of the second embodiment, as the distance from the virtual light source position PV increases, the area of the portion where the reflective film 32 is formed increases and the non-formation region of the reflective film 32 decreases.

Therefore, according to the reflective screen 300 of this embodiment, the area of the reflective film 32 far from the virtual light source position PV can be made larger than the area of the reflective film 32 near the virtual light source position PV. Therefore, the reflectance of the part far from the virtual light source position PV of the reflective screen 300 can be improved.
Further, since the observation side of the reflection film 32 can be protected by the screen substrate 12, the step of forming the protective layer 4 on the observation surface 300a side of the reflection screen 300 can be omitted.

<Sixth embodiment>
Next, a sixth embodiment of the present invention will be described with reference to FIGS. 14A and 14B and FIGS. 15A to 15C with reference to FIGS. 1 and 8. This embodiment is different from the manufacturing method of the reflective screen 300 described in the fifth embodiment described above in that the convex portion 23 is formed on the observation surface 13a of the screen substrate 13. Since the other points are the same as in the fifth embodiment, the same parts are denoted by the same reference numerals and description thereof is omitted.

(Reflection screen manufacturing method)
As shown in FIG. 1 and FIG. 14 (a), first, in the second direction in the vertical direction (Y-axis direction) and horizontal direction (X-axis direction) of the surface 13b opposite to the observation surface 13a of the screen substrate 13. Similar to the form, a plurality of convex portions 23 are formed. Further, the screen substrate 13 is formed of a resin having light transparency.
Next, a reflective film 33 and a negative resist NR similar to those of the second embodiment are formed on the surface 13 b opposite to the observation surface 13 a of the screen substrate 13 including the surface 23 a of the convex portion 23.

Next, as shown in FIG. 14B, the resist NR is exposed by irradiating light Ls for exposing the resist NR obliquely from the exposure light source S to the surface 13b opposite to the observation surface 13a. Here, the emission position of the projection light Lp with respect to the reflection screen is assumed as the virtual light source position PV. The incident angle θs of the light Ls that exposes the resist NR emitted from the exposure light source S with respect to the center Cb of the surface 13b opposite to the observation surface 13a is the observation surface 13a of the projection light Lp emitted from the virtual light source position PV. The exposure light source S is arranged so that the incident angle θp with respect to the center Ca is equal to or less.
By exposing the resist NR in this state, a portion of the resist NR corresponding to the portion irradiated with the projection light Lp of the convex portion 21 is exposed. Further, the area of the portion irradiated with the light Ls for exposing the resist NR of the convex portion 21 is equal to or smaller than the area of the portion irradiated with the projection light Lp of the convex portion 21.

Next, the resist NR is immersed in a developing solution, the exposed resist NR remains, the other resist NR is peeled off, and the exposed reflective film 33 is removed by etching. As a result, as shown in FIG. 15A, the surface 23a of the convex portion 23 is exposed except for the exposed portion of the resist NR.
Next, the resist NR remaining on the reflective film 33 is dissolved or peeled off to expose the reflective film 33 as shown in FIG. Thereby, the reflective film 33 is formed in the part corresponding to the part irradiated with the projection light Lp of the convex part 23. Further, the reflective film 33 is formed to have an area equal to or smaller than the area of the projection 23 irradiated with the projection light Lp.

Next, the light absorption layer 6 similar to that of the fifth embodiment is formed on the surface 13 b opposite to the observation surface 13 a of the screen substrate 13 including the surface 23 a of the convex portion 23. Further, an antireflection layer 51 is formed on the observation surface 13 a of the screen substrate 13.
As described above, according to the manufacturing method of the reflective screen 400 of the present embodiment, the reflective screen 400 shown in FIG. 13C can be manufactured.

(Reflective screen)
Next, the reflective screen 400 manufactured by the manufacturing method of this embodiment will be described.
As shown in FIG. 8, the reflective screen 400 is disposed in the same manner as the reflective screen 100 of the first embodiment.
The projection light Lp emitted from the projector P toward the mirror M is obliquely incident on the observation surface 400a of the reflective screen 400 in the same manner as the projection light Lp assumed to be emitted from the virtual light source position PV.

Here, the reflective screen 400 has substantially the same configuration as the reflective screen 100 of the first embodiment shown in FIG. 7 when viewed from the observation side. Therefore, according to the reflective screen 400 of the present embodiment, substantially the same effect as the reflective screen 100 of the first embodiment can be obtained.
Further, unlike the reflective screen 100 of the first embodiment, as the distance from the virtual light source position PV increases, the area of the portion where the reflective film 33 is formed increases and the non-formation region of the reflective film 33 decreases.

Therefore, according to the reflective screen 400 of this embodiment, the area of the reflective film 33 far from the virtual light source position PV can be made larger than the area of the reflective film 33 near the virtual light source position PV. Therefore, the reflectance of the part far from the virtual light source position PV of the reflective screen 400 can be improved.
Further, since the observation side of the reflection film 33 can be protected by the screen substrate 13, the step of forming the protective layer 4 on the observation surface 400a side of the reflection screen 400 can be omitted.

The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention. The light absorption layer should just be formed in the non-formation area | region of the reflection film at least on the observation surface side, such as painting the surface with a black paint instead of dyeing the whole screen substrate.
Moreover, the shape of a recessed part or a convex part is not restricted to a hemisphere. Further, the arrangement of the concave portions or the convex portions is not limited to the arrangement of the above-described embodiment.

It is manufacturing process explanatory drawing of the reflective screen which concerns on 1st embodiment of this invention. It is manufacturing process explanatory drawing of the reflective screen which concerns on 1st embodiment of this invention. It is manufacturing process explanatory drawing of the reflective screen which concerns on 1st embodiment of this invention. It is manufacturing process explanatory drawing of the reflective screen which concerns on 1st embodiment of this invention. (A)-(c) is manufacturing process explanatory drawing of the reflective screen which concerns on 1st embodiment of this invention. It is manufacturing process explanatory drawing of the reflective screen which concerns on 1st embodiment of this invention. It is manufacturing process explanatory drawing of the reflective screen which concerns on 1st embodiment of this invention. It is sectional drawing which shows arrangement | positioning of the reflective screen which concerns on 1st embodiment of this invention. (A)-(c) is manufacturing process explanatory drawing of the reflective screen which concerns on 2nd embodiment of this invention. (A)-(c) is manufacturing process explanatory drawing of the reflective screen which concerns on 3rd embodiment of this invention. (A)-(c) is manufacturing process explanatory drawing of the reflective screen which concerns on 4th embodiment of this invention. (A) And (b) is manufacturing process explanatory drawing of the reflective screen which concerns on 5th embodiment of this invention. (A)-(c) is manufacturing process explanatory drawing of the reflective screen which concerns on 5th embodiment of this invention. (A) And (b) is manufacturing process explanatory drawing of the reflective screen which concerns on 6th embodiment of this invention. (A)-(c) is manufacturing process explanatory drawing of the reflective screen which concerns on 6th embodiment of this invention.

Explanation of symbols

1, 11 Screen substrate (light absorption layer), 12, 13 Screen substrate, 1a, 11a, 12a, 13a Observation surface, 2, 22 concave portion, 21, 23 convex portion, 3, 31, 32, 33 Reflective film, 12b, 13b surface (non-observation surface), 6 light absorption layer, 100, 101, 200, 201, 300, 400 reflection screen, Lp projection light, Ls light, NL normal, NR, PR resist (light absorption film), P projector , Θp, θs angle

Claims (9)

A method of manufacturing a reflective screen that reflects projection light emitted obliquely toward the observation surface from a projector disposed at a position shifted in a direction perpendicular to the normal line of the observation surface of the screen substrate to the observation side. There,
Forming a plurality of concave portions or a plurality of convex portions in a vertical direction and a horizontal direction of the observation surface of the screen substrate;
Forming a reflective film on the observation surface;
A photosensitive resist is formed on the reflective film, and light for exposing the resist is incident on the observation surface from an incident direction of the projection light at an angle equal to or smaller than an incident angle of the projection light with respect to the observation surface. A resist exposure process for exposing the resist;
Leaving the exposed resist, peeling off the other resist, and etching the exposed reflective film;
Peeling off the remaining resist,
A method for producing a reflective screen, comprising:   2. The method of manufacturing a reflective screen according to claim 1, further comprising a step of forming a light absorption layer in at least the non-formation region of the reflective film on at least the observation side of the screen substrate. A method of manufacturing a reflective screen that reflects projection light emitted obliquely toward the observation surface from a projector disposed at a position shifted in a direction perpendicular to the normal line of the observation surface of the screen substrate to the observation side. There,
Forming a plurality of concave portions or a plurality of convex portions in a vertical direction and a horizontal direction of the observation surface of the screen substrate;
Forming a reflective film on the observation surface;
A photosensitive resist is formed on the reflective film, and light for exposing the resist is incident on the observation surface from an incident direction of the projection light at an angle equal to or smaller than an incident angle of the projection light with respect to the observation surface. A resist exposure process for exposing the resist;
Peeling off the exposed resist and leaving the other resist as a light absorbing film;
A method for producing a reflective screen, comprising:   The method of manufacturing a reflective screen according to claim 3, further comprising a step of baking the light absorption film. A method of manufacturing a reflective screen that reflects projection light emitted obliquely toward the observation surface from a projector disposed at a position shifted in a direction perpendicular to the normal line of the observation surface of the screen substrate to the observation side. There,
Forming a plurality of concave portions or a plurality of convex portions in a vertical direction and a horizontal direction of a non-observation surface opposite to the observation surface of the screen substrate;
Forming a reflective film on the non-observation surface;
A photosensitive resist is formed on the reflective film, and the light for exposing the resist is incident on the non-observation surface from the direction opposite to the incident direction of the projection light, and an angle equal to or smaller than the incident angle of the projection light with respect to the observation surface. A resist exposure process in which the resist is exposed to light,
Leaving the exposed resist, peeling off the other resist, and etching the exposed reflective film;
Peeling off the remaining resist,
A method for producing a reflective screen, comprising:   6. The method of manufacturing a reflective screen according to claim 5, further comprising a step of forming a light absorption layer on the non-observation surface.   The method for manufacturing a reflective screen according to claim 1, wherein in the step of forming the plurality of concave portions or the plurality of convex portions, concave portions are formed.   The method for manufacturing a reflective screen according to any one of claims 1 to 6, wherein a convex portion is formed in the step of forming the plurality of concave portions or the plurality of convex portions. A reflection screen that reflects the projection light emitted obliquely toward the observation surface from the projector disposed at a position shifted in a direction perpendicular to the normal of the observation surface of the screen substrate, to the observation side,
A plurality of concave portions or a plurality of convex portions are formed in the vertical direction and the horizontal direction of the screen substrate,
A reflection film that reflects the projection light is formed along a portion of the concave portion or the convex portion irradiated with the projection light,
A resist functioning as a light absorption film is formed on the reflective film except the portion irradiated with the projection light of the concave portion or the convex portion,
The reflective screen, wherein the thickness of the light absorbing film is gradually reduced as it approaches a boundary with the reflective film inside the concave portion or the convex portion of the outer edge of the light absorbing film.

Images