JP5113767B2 - 構造およびシステムの変更のための非ラインオブサイトリバースエンジニアリング - Google Patents
構造およびシステムの変更のための非ラインオブサイトリバースエンジニアリング Download PDFInfo
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- JP5113767B2 JP5113767B2 JP2008554372A JP2008554372A JP5113767B2 JP 5113767 B2 JP5113767 B2 JP 5113767B2 JP 2008554372 A JP2008554372 A JP 2008554372A JP 2008554372 A JP2008554372 A JP 2008554372A JP 5113767 B2 JP5113767 B2 JP 5113767B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/203—Measuring back scattering
Description
この発明は、構造および/またはシステムの変更の設計の前段階として構造および/またはシステムの物理的寸法および構成を測定することに関し、特に、X線後方散乱技術を利用して隠れた物体を分析することによって構造および/またはシステムの物理的寸法および構成を測定することに関する。
この発明の1つの局面においては、構造および/またはシステム内の隠れた物体を分析することによって構造および/またはシステムの変更の設計の前段階として構造および/またはシステムの物理的寸法および構成を測定する方法が提供される。この方法は、変更の準備のために変更の前に構造および/またはシステムにアクセスするステップと、x線後方散乱ユニットを用いて構造および/またはシステムを走査するステップと、x線後方散乱ユニットからデータを収集し、そのデータを組合せて2D、2Dパノラマおよび/または3Dデータセットに再構築するステップと、データセットから、隠れた物体の表面および構造を生成するステップと、隠れた物体の表面および構造を構造および/またはシステムの既存の座標系に結び付けて3Dモデルを作成するステップとを含む。
のデータを収集するためのX線後方散乱システムと、データを組合せて2D、2Dパノラマおよび/または3Dデータセットに再構築し、データセットから表面および構造を生成するための計算システムと、構造の物体および/またはシステムの表面を表示するための、計算システムに接続されるディスプレイとを含む。
以下の詳細な説明は、本発明を実行するのに最善であると現在考えられるモードについてのものである。本発明の範囲は添付の請求項によって最もよく定義されるため、本説明は限定的に解釈されるべきではなく、単に本発明の一般原理を例示するためになされる。
目すべきである。応用/業務環境の種類に基づいて、計算システム106のコンポーネントはより多くても少なくてもよい。たとえば、計算システム106はセットトップボックス、ラップトップ型コンピュータ、ノートブック型コンピュータ、デスクトップシステムまたは他の種類のシステムであってもよい。
Claims (1)
- 構造および/またはシステム内の隠れた対象を分析することによって構造および/またはシステムの物理的寸法および構成を測定し、構造および/またはシステムの変更の設計をする方法であって、
構造および/またはシステムの物理的寸法および構成を測定することは、
変更の準備のために変更の前に構造および/またはシステムにアクセスするステップと、
x線後方散乱ユニットを用いて前記構造および/またはシステムを走査するステップと、
前記x線後方散乱ユニットからデータを収集し、前記データを組合せて2D、2Dパノラマおよび/または3Dデータセットに再構築するステップと、
前記データセットから、隠れた対象の表面および構造を生成するステップと、
前記隠れた対象の前記表面および構造を前記構造および/またはシステムの既存の座標系に結び付けて3Dモデルを作成するステップとを備え、
構造および/またはシステムの変更の設計をすることは、
前記隠れた対象の前記表面および構造の前記3Dモデルを利用して前記構造および/またはシステムの変更の設計をするステップを備えた、方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/352,118 US7649976B2 (en) | 2006-02-10 | 2006-02-10 | System and method for determining dimensions of structures/systems for designing modifications to the structures/systems |
US11/352,118 | 2006-02-10 | ||
PCT/US2007/003466 WO2007095085A1 (en) | 2006-02-10 | 2007-02-09 | Non-line of sight reverse engineering for modifications of structures and systems |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012185423A Division JP5364188B2 (ja) | 2006-02-10 | 2012-08-24 | 構造およびシステムの変更のための非ラインオブサイトリバースエンジニアリング |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009526326A JP2009526326A (ja) | 2009-07-16 |
JP2009526326A5 JP2009526326A5 (ja) | 2009-11-05 |
JP5113767B2 true JP5113767B2 (ja) | 2013-01-09 |
Family
ID=38222320
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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JP2008554372A Expired - Fee Related JP5113767B2 (ja) | 2006-02-10 | 2007-02-09 | 構造およびシステムの変更のための非ラインオブサイトリバースエンジニアリング |
JP2012185423A Expired - Fee Related JP5364188B2 (ja) | 2006-02-10 | 2012-08-24 | 構造およびシステムの変更のための非ラインオブサイトリバースエンジニアリング |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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JP2012185423A Expired - Fee Related JP5364188B2 (ja) | 2006-02-10 | 2012-08-24 | 構造およびシステムの変更のための非ラインオブサイトリバースエンジニアリング |
Country Status (4)
Country | Link |
---|---|
US (1) | US7649976B2 (ja) |
EP (1) | EP1982165B1 (ja) |
JP (2) | JP5113767B2 (ja) |
WO (1) | WO2007095085A1 (ja) |
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2007
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2012
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EP1982165B1 (en) | 2017-09-13 |
JP2013030170A (ja) | 2013-02-07 |
JP5364188B2 (ja) | 2013-12-11 |
WO2007095085A1 (en) | 2007-08-23 |
US7649976B2 (en) | 2010-01-19 |
EP1982165A1 (en) | 2008-10-22 |
US20070189454A1 (en) | 2007-08-16 |
JP2009526326A (ja) | 2009-07-16 |
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