JP5107547B2 - Interferometric surface shape measuring device - Google Patents

Description

  The present invention relates to a planar shape measuring apparatus (referred to as an interference-type surface shape measuring apparatus) using an interferometer used for highly accurate surface shape measurement. In particular, it is possible to measure the shape of a minute spherical surface, such as an optical component for connecting an optical fiber frequently used in the communication field with a radius of curvature of several millimeters to several micrometers, or a minute shape on a flat substrate such as a semiconductor. The present invention relates to an interference type surface shape measuring apparatus.

  As a surface shape measuring apparatus using an interferometer, the applicant is described in Patent Document 1, and an interference optical system that forms interference fringes by each of reflected light from a subject irradiated with light from a light source and a reference body, A surface texture measurement unit that measures the surface texture of the subject based on interference fringes, a condensing optical system that collects reflected light from the subject, and a converging optical system that translates the subject Proposed is a curved surface shape measuring apparatus including a curvature radius measuring unit that measures the radius of curvature of the subject based on a change in the light collected by.

  Further, when the surface to be measured is a flat surface, the object to be measured or the reference surface or the objective lens is moved by an actuator such as a piezoelectric element (PZT) to perform phase shift and enable shape measurement. It is described in Patent Documents 2 and 3.

JP 2002-54910 A JP-A-8-110204 JP-A-8-313205

  However, in the case of measuring the shape of a minute spherical surface with a radius of curvature of several millimeters to several micrometers, the following problem has occurred.

  (1) Similar to the measurement of a general lens or the like, the reflected light from the measurement object is very small because the measurement must be performed using a large interferometer compared to the measurement object having a diameter of φ60 to 100 mm. However, since the optical axis adjustment mechanism cannot be used effectively, a great amount of time is required for the adjustment work before the measurement.

  (2) Since the object to be measured is very small, a reference lens composed of several lenses used when measuring a lens having a general size that has been used in the past has a precision of the reference reference surface. Even if there is no problem, there is a lack of spherical aberration correction.

  (3) In the “method of phase shifting by moving the reference lens with an actuator such as PZT and making the optical path length variable” which has been generally used for conventional spherical shape measurement, the radius of curvature of the surface to be measured is micrometer. When the order is reached, the wavefront shape of the measurement light that irradiates the surface to be measured changes with the movement of the standard reference surface due to the phase shift, and cannot be measured accurately.

  In addition, the technique of performing phase shift by moving the reference surface and the objective lens with an actuator such as PZT as in Patent Documents 2 and 3, requires a highly accurate moving mechanism and control device, and is expensive. Had a point.

  The present invention has been made to solve the above-mentioned conventional problems, and in the case of measuring the shape of a minute spherical surface with a radius of curvature of several millimeters to several micrometers, the optical system of an interferometer is used as an enlargement optical system such as a microscope. The optical axis can be easily adjusted to support high-accuracy measurement and provide a measurement method with little error during measurement.In planar shape measurement, the wavelength of the coherent light source is changed to shift the phase. It is an object of the present invention to provide a technique that eliminates the need for a mechanical movement mechanism for performing phase shift by using the method for performing phase shift, and that enables measurement of a fine shape using phase shift at low cost. .

The present invention includes a magnifying optical system, a laser light source disposed so as to transmit a part of the magnifying optical system and irradiate the measurement target surface, and the magnifying optical system between the laser light source and the measurement target surface. has a reference plane, by interference with the reference plane the reference light reflected by, and a test light obtained by reflecting the measurement target surface passes through the reference plane, measure the shape of the object surface An interference type surface shape measuring apparatus including an interferometer configured as described above, wherein an imaging optical system of an interferometer unit that generates an interference fringe image on an image sensor has a microscope objective lens , and the enlargement The present invention solves the above problem by allowing an image at an arbitrary position up to infinity through an optical system to be formed on the image sensor of the interferometer.

By changing the wavelength of the laser light source, a plurality of interference fringe images with different fringe phases can be obtained, and the shape information of the measurement target surface can be obtained.

Further, a plurality of the laser light sources can be mounted so that the surface to be measured can be irradiated alone or in combination.

Further, a semiconductor laser can be used as the laser light source, and a change in wavelength caused by a change in driving current of the semiconductor laser can be used.

  In addition, an independent illumination light source for normal observation and an observation optical system can be further provided, and the interference measurement optical system and the observation optical system can be switched and used.

Further, an independent illumination light source for performing normal observation and an observation optical system are further provided, and different polarization characteristics are given to the laser light source for interference measurement and the light source for observation, and these are simultaneously measured. After the irradiation, the measurement image and the observation image can be separated using the difference in polarization characteristics, and can be obtained at the same time.

  According to the present invention, when measuring the shape of a microsphere having a radius of curvature of several millimeters to several μm, the optical axis can be easily adjusted by combining the optical system of the interferometer with an enlarged optical system such as a microscope. Corresponding to high-accuracy measurement, it is possible to perform measurement with less error during measurement.

In planar shape measurement, a method of phase shifting by changing the wavelength of the laser light source eliminates the need for a mechanical movement mechanism for phase shifting, and makes it possible to reduce the cost by using phase shifting at low cost. The shape measurement of the shape can be realized.

  Furthermore, it can be utilized for performance evaluation and assembly adjustment of a highly accurate optical component (lens or the like) that realizes the above measurement.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

In the first embodiment of the present invention, the present invention is used for spherical measurement. As shown in FIG. 1, an optical system including a microscope objective lens 10, lenses 12 and 14, and an optical system of the optical system A laser light source 20 arranged so as to transmit a part and irradiate the measurement target surface of the object 8 to be measured, and a reference surface (also referred to as a reference surface) in the magnifying optical system between the laser light source 20 and the measurement target surface ) 30 and a beam splitter (BS) 32 for causing interference between the reference light reflected by the reference surface 30 and the test light that is transmitted by the reference surface 30 and reflected by the measurement target surface. An interference fringe imaging system 40 for imaging the generated interference fringes. In the figure, reference numeral 22 denotes a magnifying lens for magnifying the light from the laser light source 20.

In the first embodiment, the light beam emitted from the laser light source 20 is enlarged in beam diameter by the lens 22 and incident on the lens 12 to become a parallel light beam. The reference surface 30 may be on either side, but the surface on the light source 20 side (right side surface in the figure) is usually a semi-transmissive surface, and the reflected light from this surface is used as reference light.

  The light transmitted through the reference surface 30 passes through the lens 10 as it is and enters the measurement target surface vertically. As the lens 10, an objective lens of a microscope is used, and here, an infinite correction objective lens is used. All objective lenses that are normally used can be used at magnifications from 1X to 200X. Since the infinite correction objective lens does not form an image as it is, the lens 12 serves as an imaging lens as a microscope and a relay lens as an interferometer.

  Here, the reason why the microscope objective lens 10 is used as a lens for interference measurement is that the spherical aberration important for high-precision spherical measurement is sufficiently corrected, and the radius of curvature of the measurement target surface is very small. Because.

  The light reflected and returned from the measurement target surface passes through the lens 10, the reference surface 30, and the lens 12 again, passes through the beam splitter 32, and generates an interference fringe image in the imaging system 40 by the lens 14. .

  When adjusting the focus as a normal microscope, as shown in FIG. 2, the microscope optical system unit 70 is moved with respect to the object 8 to be measured using a Z3 moving mechanism, or the object 8 to be measured is moved. In the present invention, apart from this, the interference optical system unit 72 is also provided with a moving mechanism Z2 that can move independently.

  For this reason, it is possible to adjust the focus separately from the focusing of the microscope, and it is possible to focus on an arbitrary position that reaches the infinite distance through the microscope objective lens 10. Thereby, on the interference optical system side, it is possible to observe the object 8 to be measured outside the focal position of the microscope objective lens 10. For this reason, it is possible to perform alignment while viewing the image of the object 8 to be measured, and the optical axis adjustment work becomes much easier.

  In the present embodiment, the focus adjustment mechanism Z1 is also provided inside the interference optical system.

  In order to explain the meaning of focusing on an arbitrary position reaching infinity through the microscope objective lens 10, FIG. 3 shows an image in a state where a measurement object (sphere) is set and alignment is not performed yet. . Since the apparatus is installed in the horizontal position, an image of the surrounding situation and an image of the sphere of the measurement object installed in a shifted position can be seen in the interferometer field of view.

  The detailed situation at the time of adjustment will be described below.

  At the time of interference measurement, since the focal position is at infinity, the surroundings can be seen through the objective lens in the state shown in FIG.

  FIG. 4B shows a state where the measurement target sphere is set.

  Next, while viewing the screen, as shown in FIG. 4C, the position of the measurement target sphere is set at the approximate center of the field of view. Then, the sphere is brought closer to the optical axis direction as it is.

  FIG. 11D shows the place where the measurement target sphere fills the screen. The objective lens is visible after reflection on the sphere.

  When approaching further, as shown in FIG. 4 (E), the laser beam appears to be reflected at the center of the objective lens, so that the optical axis can be quickly adjusted if this light beam is not deviated from the screen.

  When approaching further, the light beam gradually increases as shown in FIG.

  When it is further closer, as shown in FIG.

  When it comes closer, the bright part becomes smaller this time as shown in FIG. If the beam falls off the screen halfway through, correct it as needed.

  When it comes closer, a bright part once becomes a point as shown in FIG. This position is the position where the surface of the sphere is in focus.

  As it gets closer, it becomes larger as shown in FIG.

  When approaching further, interference fringes appear as shown in FIG.

  FIG. 4L shows a state in which the optical axis adjustment (alignment) mode is switched on this side.

  Next, as shown in FIG. 4 (M), the size is adjusted by adjusting the Z axis, and the position in the optical axis direction is set.

  Next, as shown in FIG. 4N, the X and Y directions are adjusted to superimpose the light beams.

  Next, when the alignment mode is changed to the interference fringe measurement mode, interference fringes of the degree shown in FIG.

  Thereafter, X, Y, and Z are adjusted as appropriate to adjust the appearance of the desired interference fringes as illustrated in FIG.

  As described above, since the spot of the laser beam for measurement is always visible, the interference fringes can always be quickly observed by adjusting the position while keeping the light beam from deviating from the field of view.

  4A to 4P, it is usually about 30 seconds to 1 minute.

  In this embodiment, by using a highly accurate spherical surface or plane that can serve as a reference for the spherical shape as a measurement target surface, an application of measuring the performance of the lens 10 itself is possible.

  1st Embodiment is an example at the time of using the general microscope objective lens 10 as a measurement lens, and the reference surface 30 different from the lens 10 is provided and used. Since the microscope objective lens 10 is sufficiently corrected for aberrations, such a configuration is practically possible.

  Next, a second embodiment of the present invention will be described with reference to FIG.

  In the present embodiment, the outermost surface on the measurement target surface side of the microscope objective lens 10 is used as a reference surface 30, and the light rays pass through the reference surface 30, which is a spherical surface, vertically and are perpendicular to the measurement target surface. Irradiate.

  Since other points are the same as those of the first embodiment, description thereof is omitted.

  Note that even if a reference surface having an arbitrary shape is arranged at an arbitrary position between the light source 20 and the measurement target surface, the interferometer can be established and can be selected according to the purpose.

  Next, FIG. 6 shows a third embodiment of the present invention used in the case of performing interference measurement on a planar shape.

  In the present embodiment, the reference surface 30 is flattened according to the measurement target surface (plane) 9 of the object to be measured, and a parallel light beam is emitted from the measurement lens 10 toward the measurement target surface 9. Thus, the point from which the collimator lens 24 is arrange | positioned at the exit side of the magnifying lens 22 differs from 2nd Embodiment.

  In the present embodiment, the reference surface 30 is disposed on the measurement target surface side between the lens 10 and the measurement target surface 9. In this case, the magnification of the microscope objective lens 10 that can be practically used is medium to low magnification (about 20 to 50 ×) or less.

In the first to third embodiments, when the wavelength of the laser light source 20 is changed, a phase shift of interference fringes as shown in FIG. 7 can be generated. Here, the phase shift is a phenomenon in which the position of the interference fringe changes as shown in FIG.

  FIG. 8 shows a three-dimensional display of shape data calculated by applying a well-known analysis algorithm such as the Hari Haran method to the five phase-shifted interference fringe images shown in FIG. .

  Further, with respect to the representative example of the interference fringe image shown in FIG. 9, FIG. 10 shows an example in which five images having the same phase shift are obtained and the shape is measured.

Next, FIG. 11 shows a main part of a fourth embodiment in which a plurality of light sources are incorporated using a semiconductor laser as a laser light source. In the figure, 51, 52 and 53 are laser diodes (LD), 61, 62 and 63 are collimator lenses, and 34 is a prism.

Even if it is a laser light source capable of changing the wavelength, its variable range is limited. In the case of using a semiconductor laser, the external resonator type tunable laser is several nm, and in the method by controlling the driving current, it is about 0.1 nm at most. In addition, the measurement may be performed with a plurality of light sources by changing the wavelength greatly. Therefore, in this embodiment, three individual laser diodes 51, 52, and 53 are arranged. For example, if the oscillation wavelengths of the three laser diodes 51, 52, and 53 are 403 nm, 635 nm, and 780 nm and the respective on / off states are controlled, measurement can be performed individually or in combination with each wavelength. In addition, each laser diode can be individually phase-shifted by controlling the drive current.

  Of course, it is possible to use a reflecting surface of the prism 34 having wavelength selectivity. Thereby, the transmission efficiency and the separation of each laser diode can be improved.

  Next, FIG. 12 shows a fifth embodiment in which a measurement target surface that is expected to have a large application effect according to the present invention is a flat surface. In the figure, the illumination light beam is indicated by a solid line, and the imaging light ray is indicated by a broken line.

In the present embodiment, an illumination light source 80 and a lens 82 are newly added, and the measurement target surface 9 can be illuminated by the beam splitter (BS) 84 through the same optical path as the laser light source 20 for the interferometer. It is arranged to be.

In the present embodiment, the light beam (broken line) coming from the measurement target surface 9 by illumination from the illumination light source 80 and the light reflected from the measurement target surface 9 by irradiation of the laser light source 20 (solid line) are newly added. The provided beam splitter (BS) 86 passes through an optical path different from that of the interferometer, and in this example, it is divided into one that enters the eyepiece 88 and one that enters the interferometer (40).

The beam splitter 86 moves to the position indicated by the broken line in the direction of the arrow in the figure, and can enter and exit the optical path. For this reason, in conjunction with the insertion of the beam splitter 86 into the optical path, the laser light source 20 and the illumination light source 80 are switched on and off or blocked by a shutter or the like, so that the interference fringe imaging system 40 performs normal microscope observation. The image and the interference image can be individually observed, and visual observation can be performed separately by the eyepiece 88.

Further, by switching from the laser light source 20 to the illumination light source 80 in conjunction with the insertion of the beam splitter 86 in the optical path, it is possible to use such as ensuring safety during observation.

  Next, a sixth embodiment of the present invention will be described in detail with reference to FIG.

In the fifth embodiment, the light beams from the laser light source 20 and the illumination light source 80 are converted into p-polarized light and s-polarized light, which are linearly polarized light orthogonal to each other, by the polarizing elements 90 and 92, respectively. When a semiconductor laser or the like is used for the laser light source 20, it may already be linearly polarized light. In that case, it can be used as it is.

  These are overlapped by the polarization beam splitter 85 and further introduced into the measurement observation optical system via the non-polarization beam splitter 33.

Since p-polarized light and s-polarized light returning from the measurement target surface 9 return while maintaining the polarization state, an image of the measurement target surface by illumination that is s-polarized light is observed by the polarization beam splitter 87. The interference image by the laser light source 20 which is introduced into the eyepiece 88 of the system and is p-polarized light is separately introduced into the imaging optical system 40 in the interferometer.

Therefore, although the measurement target surface 9 is simultaneously irradiated with the laser light source 20 and the normal illumination light source 80, the observation optical system (88) can observe a normal microscope observation image, In addition, in the image pickup system 40 in the interferometer optical system, only the interference image can be obtained at the same time.

1 is an optical path diagram showing an optical system according to a first embodiment of the present invention. Sectional view showing the overall configuration Illustration to show focusing on an arbitrary position that reaches infinity Figure showing the situation during detailed adjustment Optical path diagram showing optical system of second embodiment of the present invention Similarly, an optical path diagram showing the optical system of the third embodiment. The figure which shows the interference fringe image by which the phase was shifted obtained when the wavelength of a laser light source was changed in 1st thru | or 3rd embodiment. The figure which shows the example which displayed the shape data calculated from FIG. 7 three-dimensionally The figure which shows the typical example of an interference fringe image FIG. 9 is a diagram illustrating an example in which five images obtained by phase shifting in FIG. 9 are acquired and their shapes are measured. Optical path diagram showing essential parts of the fourth embodiment of the present invention Similarly, an optical path diagram showing the optical system of the fifth embodiment. Similarly, an optical path diagram showing the optical system of the sixth embodiment.

Explanation of symbols

8 ... object to be measured 9 ... measurement target surface 10 ... microscope objective lens 12, 14 ... lens 20 ... laser light source 30 ... reference plane 32, 33, 85, 87 ... beam splitter (BS)
40 ... Interference fringe imaging system 51, 52, 53 ... Laser diode (LD)
70 ... Microscope optical system part 72 ... Interference optical system part 88 ... Eyepiece 90, 92 ... Polarizing element

Claims (6)

Magnifying optics,
A laser light source disposed so as to transmit a part of the magnifying optical system and irradiate the measurement target surface;
A reference surface in the magnifying optical system between the laser light source and the measurement target surface, the reference light reflected by the reference surface, and the test light obtained by passing through the reference surface and reflecting by the measurement target surface; by interference, a interferometric profilometer having a configured interferometer so that to measure the shape of the object surface by a
The imaging optical system of the interferometer unit that generates an interference fringe image on the image sensor has a microscope objective lens , and an image at an arbitrary position up to infinity is connected to the image sensor of the interferometer through the magnification optical system. An interference-type surface shape measuring apparatus characterized by being capable of imaging. The interference type surface shape measurement according to claim 1, wherein a plurality of interference fringe images having different fringe phases are obtained by changing a wavelength of the laser light source to obtain shape information of a measurement target surface. apparatus. The interference type surface shape measuring apparatus according to claim 1, wherein a plurality of the laser light sources are mounted and configured to irradiate the measurement target surface alone or in combination. 4. The interference type surface shape measuring apparatus according to claim 1, wherein the laser light source uses a semiconductor laser and utilizes a change in wavelength caused by a change in driving current of the semiconductor laser. In addition, it has an independent illumination light source for normal observation, and an observation optical system,
5. The interference-type surface shape measuring apparatus according to claim 1, wherein the interference-type surface shape measuring apparatus is configured to be usable by switching between the interference measurement optical system and the observation optical system. In addition, it has an independent illumination light source for normal observation, and an observation optical system,
The laser light source for interference measurement and the light source for observation are given different polarization characteristics,
5. The apparatus according to claim 1, wherein a measurement image and an observation image are separated using a difference in polarization characteristics after being simultaneously irradiated onto a measurement target surface, and can be simultaneously acquired. The interference type surface shape measuring apparatus according to any one of the above.

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