JP5098432B2 - Metal foil with adhesive layer, metal-clad laminate and printed wiring board using the same - Google Patents
Metal foil with adhesive layer, metal-clad laminate and printed wiring board using the same Download PDFInfo
- Publication number
- JP5098432B2 JP5098432B2 JP2007132635A JP2007132635A JP5098432B2 JP 5098432 B2 JP5098432 B2 JP 5098432B2 JP 2007132635 A JP2007132635 A JP 2007132635A JP 2007132635 A JP2007132635 A JP 2007132635A JP 5098432 B2 JP5098432 B2 JP 5098432B2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive layer
- metal
- metal foil
- resin
- wiring board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000012790 adhesive layer Substances 0.000 title claims description 72
- 229910052751 metal Inorganic materials 0.000 title claims description 63
- 239000002184 metal Substances 0.000 title claims description 63
- 239000011888 foil Substances 0.000 title claims description 59
- 239000003795 chemical substances by application Substances 0.000 claims description 30
- 229920005989 resin Polymers 0.000 claims description 26
- 239000011347 resin Substances 0.000 claims description 26
- 239000000853 adhesive Substances 0.000 claims description 20
- 230000001070 adhesive effect Effects 0.000 claims description 18
- 239000010410 layer Substances 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 238000003825 pressing Methods 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 description 44
- 229920000647 polyepoxide Polymers 0.000 description 44
- 239000002966 varnish Substances 0.000 description 27
- 229920003986 novolac Polymers 0.000 description 24
- 239000002245 particle Substances 0.000 description 16
- 239000005011 phenolic resin Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 14
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 13
- 239000011354 acetal resin Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- 229920006324 polyoxymethylene Polymers 0.000 description 12
- 238000011282 treatment Methods 0.000 description 12
- 229920002554 vinyl polymer Polymers 0.000 description 12
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 11
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 11
- 229910000679 solder Inorganic materials 0.000 description 11
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000011889 copper foil Substances 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000011256 inorganic filler Substances 0.000 description 8
- 229910003475 inorganic filler Inorganic materials 0.000 description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 229930003836 cresol Natural products 0.000 description 7
- 125000000753 cycloalkyl group Chemical group 0.000 description 7
- 239000003063 flame retardant Substances 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 229920000459 Nitrile rubber Polymers 0.000 description 6
- 239000004305 biphenyl Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 150000004756 silanes Chemical class 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- -1 4-tert-butyl-styryl Chemical group 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 235000010290 biphenyl Nutrition 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 229910052698 phosphorus Inorganic materials 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- 238000007788 roughening Methods 0.000 description 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 3
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical class C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 3
- 239000011258 core-shell material Substances 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 150000003018 phosphorus compounds Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Natural products O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229920003051 synthetic elastomer Polymers 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical class OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- KGSFMPRFQVLGTJ-UHFFFAOYSA-N 1,1,2-triphenylethylbenzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 KGSFMPRFQVLGTJ-UHFFFAOYSA-N 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- BSWWXRFVMJHFBN-UHFFFAOYSA-N 2,4,6-tribromophenol Chemical compound OC1=C(Br)C=C(Br)C=C1Br BSWWXRFVMJHFBN-UHFFFAOYSA-N 0.000 description 1
- LZRQJPJABAXNCV-UHFFFAOYSA-O 2-(2-phenyl-1h-imidazol-1-ium-1-yl)propanenitrile Chemical compound N#CC(C)[NH+]1C=CN=C1C1=CC=CC=C1 LZRQJPJABAXNCV-UHFFFAOYSA-O 0.000 description 1
- KMRIWYPVRWEWRG-UHFFFAOYSA-N 2-(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(P2(=O)C3=CC=CC=C3C3=CC=CC=C3O2)=C1 KMRIWYPVRWEWRG-UHFFFAOYSA-N 0.000 description 1
- HEXHLHNCJVXPNU-UHFFFAOYSA-N 2-(trimethoxysilylmethyl)butane-1,4-diamine Chemical compound CO[Si](OC)(OC)CC(CN)CCN HEXHLHNCJVXPNU-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- LIAWCKFOFPPVGF-UHFFFAOYSA-N 2-ethyladamantane Chemical compound C1C(C2)CC3CC1C(CC)C2C3 LIAWCKFOFPPVGF-UHFFFAOYSA-N 0.000 description 1
- GSKNLOOGBYYDHV-UHFFFAOYSA-N 2-methylphenol;naphthalen-1-ol Chemical compound CC1=CC=CC=C1O.C1=CC=C2C(O)=CC=CC2=C1 GSKNLOOGBYYDHV-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical class OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- ZEABUURVUDRWCF-UHFFFAOYSA-N 3-(4-tert-butylphenyl)-5-[2-(4-tert-butylphenyl)ethenyl]-2-phenyl-1,3-dihydropyrazole Chemical compound C1=CC(C(C)(C)C)=CC=C1C=CC1=CC(C=2C=CC(=CC=2)C(C)(C)C)N(C=2C=CC=CC=2)N1 ZEABUURVUDRWCF-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- YHZRACBOZSXPQR-UHFFFAOYSA-N NC1=C(C(S(=O)(=O)O)(C=CC2=CC=CC=C2)N)C=CC=C1 Chemical class NC1=C(C(S(=O)(=O)O)(C=CC2=CC=CC=C2)N)C=CC=C1 YHZRACBOZSXPQR-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 241000233855 Orchidaceae Species 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- QHWKHLYUUZGSCW-UHFFFAOYSA-N Tetrabromophthalic anhydride Chemical compound BrC1=C(Br)C(Br)=C2C(=O)OC(=O)C2=C1Br QHWKHLYUUZGSCW-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- XFWJKVMFIVXPKK-UHFFFAOYSA-N calcium;oxido(oxo)alumane Chemical compound [Ca+2].[O-][Al]=O.[O-][Al]=O XFWJKVMFIVXPKK-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- AFYCEAFSNDLKSX-UHFFFAOYSA-N coumarin 460 Chemical compound CC1=CC(=O)OC2=CC(N(CC)CC)=CC=C21 AFYCEAFSNDLKSX-UHFFFAOYSA-N 0.000 description 1
- 150000004775 coumarins Chemical class 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- WHHGLZMJPXIBIX-UHFFFAOYSA-N decabromodiphenyl ether Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br WHHGLZMJPXIBIX-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- PPTYNCJKYCGKEA-UHFFFAOYSA-N dimethoxy-phenyl-prop-2-enoxysilane Chemical compound C=CCO[Si](OC)(OC)C1=CC=CC=C1 PPTYNCJKYCGKEA-UHFFFAOYSA-N 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 238000005040 ion trap Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- ZQKXQUJXLSSJCH-UHFFFAOYSA-N melamine cyanurate Chemical compound NC1=NC(N)=NC(N)=N1.O=C1NC(=O)NC(=O)N1 ZQKXQUJXLSSJCH-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- VSWALKINGSNVAR-UHFFFAOYSA-N naphthalen-1-ol;phenol Chemical compound OC1=CC=CC=C1.C1=CC=C2C(O)=CC=CC2=C1 VSWALKINGSNVAR-UHFFFAOYSA-N 0.000 description 1
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
本発明は、接着剤層付き金属箔、これを用いた金属張積層板及びプリント配線板に関する。 The present invention relates to a metal foil with an adhesive layer, a metal-clad laminate using the same, and a printed wiring board.
プリント配線板は、繊維基材に、熱硬化性樹脂組成物のワニスを含浸乾燥してなるプリプレグを1枚又は所要枚数重ねた構成体を加熱加圧成形して積層板を得、この積層板を基板としてその表面に回路を形成して製造される。 A printed wiring board is obtained by heat-press molding a structure in which a prepreg formed by impregnating and drying a varnish of a thermosetting resin composition on a fiber base material is laminated to obtain a laminated board. Is manufactured by forming a circuit on the surface thereof.
通常、積層板を製造するときに銅箔を構成体に重ねて銅張積層板とし、この銅箔をエッチングして回路を形成している。 Usually, when manufacturing a laminated board, a copper foil is piled up on a structure to make a copper-clad laminated board, and this copper foil is etched to form a circuit.
プリント配線板(以下、配線板という)の製造工程において、通常、ソルダーレジスト(以下、レジストという)を形成する工程がある。レジストは、はんだ付け時のライン間のはんだブリッジによるショート防止、部品の足と回路との接続信頼性向上、プリント配線板の表面保護、絶縁劣化の防止など、配線板の表面の保護及び不要な箇所にはんだが付着しないようにする目的で形成される。レジスト材料としては、最近は感光性の材料が広く用いられるようになっている。感光性のレジスト材料を用いてレジストを形成する工程においては、レジスト材料の層を配線板表面に形成した後、紫外線を照射する露光工程がある。配線板は殆どの場合両面に回路を有する両面配線板であり、この場合、レジストも両面に形成される。このような両面配線板にレジストを効率よく形成するため、両面同時露光が行われる。ところが、配線板が薄型化するのに伴い、照射した紫外線が配線板を透過して反対面のレジスト材料を感光させる、いわゆる裏かぶりを生ずることがある。 In the manufacturing process of a printed wiring board (hereinafter referred to as a wiring board), there is usually a process of forming a solder resist (hereinafter referred to as a resist). Resist protects the surface of the wiring board and prevents unnecessary, such as prevention of short-circuits due to solder bridges between lines during soldering, improvement of connection reliability between component legs and circuits, surface protection of printed wiring boards, prevention of insulation deterioration, etc. It is formed for the purpose of preventing solder from adhering to the location. Recently, photosensitive materials have been widely used as resist materials. In the step of forming a resist using a photosensitive resist material, there is an exposure step of irradiating ultraviolet rays after forming a layer of the resist material on the surface of the wiring board. In most cases, the wiring board is a double-sided wiring board having circuits on both sides, and in this case, a resist is also formed on both sides. In order to efficiently form a resist on such a double-sided wiring board, double-sided simultaneous exposure is performed. However, as the wiring board becomes thinner, so-called back fogging may occur in which the irradiated ultraviolet rays pass through the wiring board and sensitize the resist material on the opposite surface.
上記に示すような問題を解決するために、従来の方法では紫外線遮蔽剤として1−(フェニル)−3−(4−tert−ブチル−スチリル)−5−(4−tert−ブチル−フェニル)−ピラゾリンを、熱硬化性樹脂組成物中に配合してプリプレグを作製し、このプリプレグを少なくとも1枚含む構成体を加熱加圧して積層板を製造することが提案されている(例えば、特許文献1参照)。しかしながら、上記1−(フェニル)−3−(4−tert−ブチル−スチリル)−5−(4−tert−ブチル−フェニル)−ピラゾリンはワニスとするときの溶解性が乏しく、また紫外線遮蔽性も充分とはいえない。このため、例えば、合計の厚さが0.5mm以下の薄型配線板を作製するときに両面同時露光を行うと裏かぶりを生ずることがあり、このような薄型配線板では両面同時露光を行うことができなかった。 In order to solve the above problems, conventional methods use 1- (phenyl) -3- (4-tert-butyl-styryl) -5- (4-tert-butyl-phenyl)-as an ultraviolet shielding agent. It has been proposed to prepare a prepreg by blending pyrazoline in a thermosetting resin composition, and to produce a laminate by heating and pressurizing a structure containing at least one prepreg (for example, Patent Document 1). reference). However, the above 1- (phenyl) -3- (4-tert-butyl-styryl) -5- (4-tert-butyl-phenyl) -pyrazoline has poor solubility when used as a varnish, and has an ultraviolet shielding property. Not enough. For this reason, for example, when double-sided simultaneous exposure is performed when producing a thin wiring board having a total thickness of 0.5 mm or less, double-sided simultaneous exposure may occur when such double-sided exposure is performed. I could not.
また、紫外線遮蔽性を向上するため、紫外線遮蔽剤を熱硬化性樹脂組成物中に多量に配合すると、配線板のガラス転移温度(Tg)や耐熱性などが低下することがある。
本発明の目的は、薄型配線板製造時であっても両面同時露光が可能で、耐熱性及びTgの低下を抑えた配線板の形成に有用な接着剤層付き金属箔、これを用いた金属張積層板及びプリント配線板を提供することである。 An object of the present invention is to provide a metal foil with an adhesive layer, which is capable of simultaneous exposure on both sides even when manufacturing a thin wiring board, and is useful for forming a wiring board with reduced heat resistance and Tg, and a metal using the same It is to provide a tension laminate and a printed wiring board.
本発明は、(1)金属箔と接着剤層を備える接着剤層付き金属箔であって、前記接着剤層が接着剤層を構成する樹脂固形分に対し紫外線遮蔽剤を0.01〜5重量部含有し、厚さが10μm以下であることを特徴とする接着剤層付き金属箔に関する。 The present invention is (1) a metal foil with an adhesive layer comprising a metal foil and an adhesive layer, wherein the adhesive layer contains 0.01 to 5 UV shielding agent with respect to the resin solids constituting the adhesive layer. The present invention relates to a metal foil with an adhesive layer, which contains parts by weight and has a thickness of 10 μm or less.
また、本発明は、(2)前記(1)記載の接着剤層付き金属箔とプリプレグを積層し加熱加圧成形してなる金属張積層板に関する。 The present invention also relates to (2) a metal-clad laminate obtained by laminating a metal foil with an adhesive layer described in (1) above and a prepreg and then heating and pressing.
また、本発明は、(3)厚さが0.2mm以下である前記(2)記載の金属張積層板に関する。 The present invention also relates to (3) the metal-clad laminate according to (2), wherein the thickness is 0.2 mm or less.
また、本発明は、(4)前記(3)記載の金属張積層板に回路を形成してなるプリント配線板に関する。 The present invention also relates to (4) a printed wiring board obtained by forming a circuit on the metal-clad laminate described in (3).
また、本発明は、(5)合計の厚さが0.5mm以下である前記(4)記載のプリント配線板に関する。 The present invention also relates to (5) the printed wiring board according to (4), wherein the total thickness is 0.5 mm or less.
本発明によれば、薄型配線板製造時であっても両面同時露光が可能で、耐熱性及びTgの低下を抑えた配線板の形成に有用な接着剤層付き金属箔、これを用いた金属張積層板及びプリント配線板を提供することができる。 According to the present invention, a metal foil with an adhesive layer that can be simultaneously exposed on both sides even when manufacturing a thin wiring board and is useful for forming a wiring board with reduced heat resistance and Tg, and a metal using the same A tension laminate and a printed wiring board can be provided.
本発明の接着剤層付き金属箔は、金属箔と接着剤層を備える接着剤層付き金属箔である。本発明では、前記目的を達成するために前記接着剤層に含まれる紫外線遮蔽剤の含有量及び接着剤層の厚さが重要である。前記接着剤層に含まれる紫外線遮蔽剤の含有量は、接着剤層を構成する樹脂固形分に対し0.01〜5重量部、好ましくは0.1〜3.0重量部、さらに好ましくは0.5〜2.0重量部である。前記紫外線遮蔽剤の含有量が0.01重量部未満である場合は、両面同時露光の際に,紫外線の遮蔽が完全ではなくなり裏かぶりが生じ、5重量部を超える場合は,接着剤層のTgや耐熱性が低下するため,金属張積層板としてのTgや耐熱性も低下してしまう。 The metal foil with an adhesive layer of the present invention is a metal foil with an adhesive layer comprising a metal foil and an adhesive layer. In the present invention, in order to achieve the above object, the content of the ultraviolet shielding agent contained in the adhesive layer and the thickness of the adhesive layer are important. The content of the ultraviolet shielding agent contained in the adhesive layer is 0.01 to 5 parts by weight, preferably 0.1 to 3.0 parts by weight, more preferably 0 with respect to the resin solid content constituting the adhesive layer. 0.5 to 2.0 parts by weight. When the content of the ultraviolet shielding agent is less than 0.01 parts by weight, the ultraviolet shielding is not complete during double-sided simultaneous exposure, and back fogging occurs. When the content exceeds 5 parts by weight, the adhesive layer Since Tg and heat resistance are lowered, Tg and heat resistance as a metal-clad laminate are also lowered.
また、前記接着剤層の厚さは10μm以下、好ましくは1〜5μm、さらに好ましくは2〜4μmである。前記接着剤層の厚さは10μmを超える場合は、プリント配線板のTg及び耐熱性が低下してしまう。
本発明で用いられる金属箔は、特に限定されず、銅箔、ニッケル箔、アルミ箔など挙げられるが、これらのなかでも銅箔が好ましく、電界銅箔又は圧延銅箔がさらに好ましい。また、本発明ではピーラブルタイプの金属箔や、アルミキャリアやニッケルキャリアを有するようなエッチャブルタイプの金属箔などを用いることもできる。
The adhesive layer has a thickness of 10 μm or less, preferably 1 to 5 μm, more preferably 2 to 4 μm. If the thickness of the adhesive layer exceeds 10 μm, the Tg and heat resistance of the printed wiring board will decrease.
The metal foil used in the present invention is not particularly limited, and examples thereof include a copper foil, a nickel foil, and an aluminum foil. Among these, a copper foil is preferable, and an electric field copper foil or a rolled copper foil is more preferable. In the present invention, a peelable metal foil, an etchable metal foil having an aluminum carrier or a nickel carrier, or the like can also be used.
さらに、一般にプリント配線板に用いられる金属箔には、粗化処理が施されているが、本発明でも、そのような金属箔を用いることができ、また粗化処理が施されていなくても特に差し支えない。 Furthermore, the metal foil generally used for printed wiring boards has been subjected to a roughening treatment, but in the present invention, such a metal foil can be used and even if the roughening treatment is not performed. There is no problem.
本発明に用いる金属箔には、一般的な金属箔の樹脂接着面に行う防錆処理がなされていることが好ましい。防錆処理は、ニッケル、錫、亜鉛、クロム、モリブデン、コバルト等のいずれか又はこれらの合金を用いて行うことができるが、亜鉛及びクロムから選択される少なくとも1種を用いることが好ましい。防錆処理に用いる金属の量は、金属の種類によって異なるが、合計で10〜2000μg/dm2が好適である。防錆処理が厚すぎるとエッチング阻害と電気特性の低下を引き起こす傾向があり、薄すぎると樹脂とのピール強度低下の要因となりうる傾向がある。さらに、防錆処理上にクロメート処理層が形成されていれば樹脂とのピール強度低下を抑制できるため有用である。 The metal foil used in the present invention is preferably subjected to a rust prevention treatment performed on the resin bonding surface of a general metal foil. The antirust treatment can be performed using any one of nickel, tin, zinc, chromium, molybdenum, cobalt, or an alloy thereof, but it is preferable to use at least one selected from zinc and chromium. The amount of metal used for the rust prevention treatment varies depending on the type of metal, but is preferably 10 to 2000 μg / dm 2 in total. If the rust preventive treatment is too thick, it tends to cause etching inhibition and a decrease in electrical characteristics, and if it is too thin, it tends to cause a decrease in peel strength with the resin. Furthermore, if a chromate treatment layer is formed on the rust prevention treatment, it is useful because a reduction in peel strength with the resin can be suppressed.
本発明においては、金属箔の最外層に、さらに、シランカップリング剤が吸着していることが好ましい。シランカップリング剤としては、例えば、3−グリシドキシプロピルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン等のエポキシ官能性シラン、3−アミノプロピルトリメトキシシラン、N−2−(アミノエチル)3−アミノプロピルトリメトキシシラン、N−2−(アミノエチル)3−アミノプロピルメチルジメトキシシラン等のアミノ官能性シラン、ビニルトリメトキシシラン、ビニルフェニルトリメトキシシラン、ビニルトリス(2−メトキシエトキシ)シラン等のオレフィン官能性シラン、3−アクリロキシプロピルトリメトキシシランなどのアクリル官能性シラン、3−メタクリロキシプロピルトリメトキシシランなどのメタクリル官能性シラン、3−メルカプトプロピルトリメトキシシランなどのメルカプト官能性シランが用いられる。後に塗工する接着補助剤との相性を考えると、分子内にエポキシ基又はアミノ基を有することが望ましい。これらは単独で用いることもでき、複数を混合して用いてもよい。 In the present invention, it is preferable that a silane coupling agent is further adsorbed on the outermost layer of the metal foil. Examples of the silane coupling agent include 3-glycidoxypropyltrimethoxysilane, epoxy-functional silanes such as 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-aminopropyltrimethoxysilane, N- Amino-functional silanes such as 2- (aminoethyl) 3-aminopropyltrimethoxysilane and N-2- (aminoethyl) 3-aminopropylmethyldimethoxysilane, vinyltrimethoxysilane, vinylphenyltrimethoxysilane, vinyltris (2 Olefin functional silanes such as -methoxyethoxy) silane, acrylic functional silanes such as 3-acryloxypropyltrimethoxysilane, methacrylic functional silanes such as 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxy Mercapto-functional silanes such as orchids are used. In view of compatibility with an adhesion aid to be applied later, it is desirable to have an epoxy group or amino group in the molecule. These may be used alone or in combination.
本発明では金属箔の厚みは、特に制限はなく、一般にプリント配線板に用いられている厚み105μm以下の金属箔が用いられる。
本発明の接着剤層は、紫外線遮蔽剤を含有する接着剤から形成される。
In the present invention, the thickness of the metal foil is not particularly limited, and a metal foil having a thickness of 105 μm or less generally used for a printed wiring board is used.
The adhesive layer of the present invention is formed from an adhesive containing an ultraviolet shielding agent.
本発明で用いられる紫外線遮蔽剤としては、レジストの露光に用いられる波長の紫外線を吸収できるものであればよく、このことから、本発明で紫外線遮蔽剤には紫外線を吸収して螢光を発する螢光染料を含む。紫外線遮蔽剤としては、クマリン系、ピラゾリン系、ピロジン系等が挙げられ、具体的には、ヒドロキシベンゾフェノン類、ヒドロキシベンゾトリアゾール類、ジアミノスチリルベンジルスルホン酸誘導体、イミダゾール誘導体、クマリン誘導体等が挙げられる。このようなものとしては、2−ヒドロキシ−4−オクトキシベンゾフェノン、2−(2−ヒドロキシ−5−メチル−フェニル)ベンゾトリアゾール、4−メチル−7−ジエチルアミノクマリン、ビス−(1、5−ジフェニル−ピラゾリン−3−イル)−スチレン、1−(フェニル)−3−3−(4−tert−ブチル−スチリル)−5−(4−tert−ブチル−フェニル)−ピラゾリン等の有機紫外線遮蔽剤が挙げられる。これらは単独で使用してもよく、2種以上併用しても差し支えない。また、黒色のアジン系錯体、カーボン系顔料、アゾ系染料等を用いてもよい。例えば、市販品として、アジン系錯体は、中央合成化学(株)製、商品名チュウオー ブラック F5(ChuoBrack F5)、ジスアゾ系染料は、中央合成化学(株)製、商品名チュウオー スーダンブラック141が好適に用いられる。
また、本発明においては有機紫外線遮蔽剤に加えて、無機紫外線遮蔽剤を併用することができる。無機紫外線遮蔽剤としては、例えば、酸化チタン、クレー、タルク、水酸化アルミニウム、ワラストナイト、水酸化マグネシウムアルミナ、カルシウムアルミネート、炭酸カルシウム等が挙げられる。
The ultraviolet shielding agent used in the present invention is not limited as long as it can absorb ultraviolet rays having the wavelength used for resist exposure. In this invention, the ultraviolet shielding agent absorbs ultraviolet rays and emits fluorescence. Contains fluorescent dye. Examples of the ultraviolet shielding agent include coumarin, pyrazoline, and pyrrolidine, and specific examples include hydroxybenzophenones, hydroxybenzotriazoles, diaminostyrylbenzyl sulfonic acid derivatives, imidazole derivatives, and coumarin derivatives. Such as 2-hydroxy-4-octoxybenzophenone, 2- (2-hydroxy-5-methyl-phenyl) benzotriazole, 4-methyl-7-diethylaminocoumarin, bis- (1,5-diphenyl) Organic UV screening agents such as -pyrazolin-3-yl) -styrene, 1- (phenyl) -3--3- (4-tert-butyl-styryl) -5- (4-tert-butyl-phenyl) -pyrazoline Can be mentioned. These may be used alone or in combination of two or more. Moreover, you may use a black azine complex, a carbon pigment, an azo dye, etc. For example, as a commercial product, the azine complex is preferably Chuo Synthetic Chemical Co., Ltd., trade name Chuo Black F5, and the disazo dye is Chuo Synthetic Chemical Co., Ltd., trade name Chuo Sudan Black 141. Used for.
In the present invention, an inorganic ultraviolet shielding agent can be used in combination with the organic ultraviolet shielding agent. Examples of the inorganic ultraviolet shielding agent include titanium oxide, clay, talc, aluminum hydroxide, wollastonite, magnesium hydroxide alumina, calcium aluminate, calcium carbonate and the like.
本発明で用いられる接着剤は熱硬化性樹脂組成物であることが望ましい。かかる熱硬化性樹脂組成物は、(A)エポキシ樹脂、(B)高分子成分、(C)エポキシ樹脂硬化剤及び(D)硬化促進剤を含むことが好ましい。さらに前記接着剤は、所望により、(E)リン系難燃剤、(F)無機フィラーを含むことができる。 The adhesive used in the present invention is preferably a thermosetting resin composition. Such a thermosetting resin composition preferably contains (A) an epoxy resin, (B) a polymer component, (C) an epoxy resin curing agent, and (D) a curing accelerator. Further, the adhesive may contain (E) a phosphorus-based flame retardant and (F) an inorganic filler as desired.
本発明で用いられる(A)エポキシ樹脂は分子内に2個以上のエポキシ基を持つ化合物であれば特に限定さないが、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビフェニル型エポキシ樹脂、テトラメチルビフェニル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、テトラフェニルエタン型エポキシ樹脂、ジシクロペンタジエン−フェノール付加反応型エポキシ樹脂、フェノールアラルキル型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂、ナフトールアラルキル型エポキシ樹脂、ナフトール−フェノール共縮ノボラック型エポキシ樹脂、ナフトール−クレゾール共縮ノボラック型エポキシ樹脂、芳香族炭化水素ホルムアルデヒド樹脂変性フェノール樹脂型エポキシ樹脂、ビフェニルノボラック型エポキシ樹脂等が挙げられる。これらエポキシ樹脂は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。これらエポキシ樹脂のなかでも、ノボラック型エポキシ樹脂が好ましく、ビフェニル構造を有するノボラック型エポキシ樹脂がより好ましい。ビフェニル構造を有するノボラック型エポキシ樹脂とは、分子中にビフェニル誘導体の芳香族環を含有したノボラック型のエポキシ樹脂をいい、例えば、一般式(1)で示されるエポキシ樹脂が挙げられる。
一般式(1)中、pは、1〜5を示す。市販品としては、日本化薬(株)製、商品名NC−3000S〔pが1.7の一般式(1)のエポキシ樹脂〕、NC−3000S−H(pが2.8の一般式(1)のエポキシ樹脂)が挙げられる。 In general formula (1), p shows 1-5. Commercially available products include Nippon Kayaku Co., Ltd., trade name NC-3000S [epoxy resin of general formula (1) where p is 1.7], NC-3000S-H (general formula where p is 2.8 ( 1) epoxy resin).
また、本発明では、(A)エポキシ樹脂はゴム変性エポキシ樹脂と併用することができる。ゴム変性エポキシ樹脂は、接着剤用又は塗料用として市販されている製品であれば、特に制限なく使用することができ、例えば、EPICLON TSR−960(商品名、大日本インキ社製)、EPOTOHTO YR−102(商品名、東都化成社製)、スミエポキシESC−500(商品名、住友化学社製)等が挙げられる。これらのゴム変成エポキシ樹脂は1種類を単独で使用しても、2種類以上を混合して使用してもよい。併用するゴム変性エポキシ樹脂の含有量は、硬化時の伸びが大きくなる他、銅箔表面への接着性が向上する点で、全エポキシ樹脂量の10〜80重量%が好ましく、30〜70重量%がより好ましい。前記ゴム変性エポキシ樹脂の含有量が10重量%未満である場合はその併用効果を十分に発揮することができない傾向があり、80重量%を超える場合は耐熱性に劣る傾向がある。 In the present invention, the (A) epoxy resin can be used in combination with a rubber-modified epoxy resin. The rubber-modified epoxy resin can be used without particular limitation as long as it is a product that is commercially available for adhesives or paints. For example, EPICLON TSR-960 (trade name, manufactured by Dainippon Ink Co., Ltd.), EPOTOOHTO YR -102 (trade name, manufactured by Toto Kasei Co., Ltd.), Sumiepoxy ESC-500 (trade name, manufactured by Sumitomo Chemical Co., Ltd.), and the like. These rubber-modified epoxy resins may be used alone or in combination of two or more. The content of the rubber-modified epoxy resin to be used in combination is preferably 10 to 80% by weight of the total amount of epoxy resin, and 30 to 70% by weight because the elongation at curing is increased and the adhesion to the copper foil surface is improved. % Is more preferable. When the content of the rubber-modified epoxy resin is less than 10% by weight, the combined effect tends to be insufficient, and when it exceeds 80% by weight, the heat resistance tends to be inferior.
本発明で用いられる(B)高分子成分は、架橋ゴム粒子、ポリビニルアセタール樹脂、カルボン酸変性ポリビニルアセタール樹脂等から選択される少なくとも1種からなる樹脂を用いることが好ましい。 The polymer component (B) used in the present invention is preferably a resin composed of at least one selected from crosslinked rubber particles, polyvinyl acetal resin, carboxylic acid-modified polyvinyl acetal resin and the like.
架橋ゴム粒子としては、アクリロニトリルブタジエンゴム粒子、カルボン酸変性アクリロニトリルブタジエンゴム粒子及びブタジエンゴム−アクリル樹脂のコアシェル粒子からなる群より選ばれる1種以上の粒子からなることがより好ましい。アクリロニトリルブタジエンゴム粒子は、アクリロニトリル及びブタジエンを共重合させ、かつ共重合する段階で、部分的に架橋させ、粒子状にしたものである。またその共重合の段階で、アクリル酸、メタクリル酸等のカルボン酸を併せて共重合させることにより、カルボン酸変性アクリロニトリルブタジエンゴム粒子を得ることも可能である。ブタジエンゴム−アクリル樹脂のコアシェル粒子は、乳化重合でブタジエン粒子を重合させ、引き続きアクリル酸エステル、アクリル酸等のアクリル樹脂の原料となるモノマーを添加して重合を続ける二段階の重合方法で得ることができる。粒子の大きさは、一次平均粒子径で、50nm〜1μmにすることができる。これらは、1種を単独で又は2種以上を組み合わせて用いてもよい。アクリロニトリルブタジエンゴム粒子の市販品としては、例えば日本合成ゴム株式会社製、XER−81(商品名)が挙げられ、カルボン酸変性アクリロニトリルブタジエンゴム粒子の市販品としては、例えば日本合成ゴム株式会社製のXER−91(商品名)が挙げられる。また、ブタジエンゴム−アクリル樹脂のコアシェル粒子としては、呉羽化学工業株式会社製のEXL−2655、武田薬品工業株式会社のAC−3832(いずれも商品名)が挙げられる。 The crosslinked rubber particles are more preferably composed of one or more kinds of particles selected from the group consisting of acrylonitrile butadiene rubber particles, carboxylic acid-modified acrylonitrile butadiene rubber particles, and butadiene rubber-acrylic resin core-shell particles. Acrylonitrile butadiene rubber particles are obtained by copolymerizing acrylonitrile and butadiene, and partially cross-linking at the stage of copolymerization. Further, at the stage of the copolymerization, carboxylic acid-modified acrylonitrile butadiene rubber particles can be obtained by copolymerizing together carboxylic acids such as acrylic acid and methacrylic acid. The core-shell particles of butadiene rubber-acrylic resin are obtained by a two-stage polymerization method in which butadiene particles are polymerized by emulsion polymerization, followed by addition of a monomer that is a raw material for acrylic resin such as acrylic acid ester and acrylic acid. Can do. The size of the particles can be 50 nm to 1 μm as the primary average particle size. You may use these individually by 1 type or in combination of 2 or more types. Examples of commercially available products of acrylonitrile butadiene rubber particles include XER-81 (trade name) manufactured by Nippon Synthetic Rubber Co., Ltd. Examples of commercially available products of carboxylic acid-modified acrylonitrile butadiene rubber particles include those manufactured by Nippon Synthetic Rubber Co., Ltd. XER-91 (trade name) may be mentioned. Examples of the core-shell particles of butadiene rubber-acrylic resin include EXL-2655 manufactured by Kureha Chemical Industry Co., Ltd. and AC-3832 (trade name) of Takeda Pharmaceutical Company Limited.
ポリビニルアセタール樹脂としては、その種類、水酸基量、アセチル基量は特に制限はないが、数平均重合度は1000〜2500のものが好ましい。この範囲であれば、はんだ耐熱性が一層確保でき、またワニスの粘度、取り扱い性も更に良好である。ここで、ポリビニルアセタール樹脂の数平均重合度は、たとえば、その原料であるポリ酢酸ビニルの数平均分子量(ゲルパーミエーションクロマトグラフィによる標準ポリスチレンの検量線を用いて測定する)から決定することができる。 As a polyvinyl acetal resin, the kind, the amount of hydroxyl groups, and the amount of acetyl groups are not particularly limited, but those having a number average polymerization degree of 1000 to 2500 are preferred. Within this range, the solder heat resistance can be further secured, and the viscosity and handling properties of the varnish are further improved. Here, the number average degree of polymerization of the polyvinyl acetal resin can be determined, for example, from the number average molecular weight of polyvinyl acetate as a raw material (measured using a standard polystyrene calibration curve by gel permeation chromatography).
カルボン酸変性ポリビニルアセタール樹脂としては、ポリビニルアセタール樹脂を常法によりカルボン酸変性して得られるものを使用することが出来る。カルボン酸変性ポロビニルアセタール樹脂についても、ポリビニルアセタール樹脂と同様の理由により、数平均重合度が1000〜2500のものが好ましい。 As the carboxylic acid-modified polyvinyl acetal resin, those obtained by modifying a polyvinyl acetal resin with a carboxylic acid by a conventional method can be used. As for the carboxylic acid-modified polo vinyl acetal resin, those having a number average polymerization degree of 1000 to 2500 are preferred for the same reason as the polyvinyl acetal resin.
ポリビニルアセタール樹脂及びカルボン酸変性ポリビニルアセタール樹脂は常法により合成してもよく、市販品を入手してもよい。市販品としては、例えば、積水化学工業(株)製、商品名、エスレックBX−1、BX−2、BX−5、BX−55、BX−7、BH−3、BH−S、KS−3Z、KS−5、KS−5Z、KS−8、KS23Z、電気化学工業(株)製、商品名、電化ブチラール4000−2、5000A、6000C、6000EP等を使用することができる。これらの樹脂は単独で、又は2種類以上混合して用いることもできる。 The polyvinyl acetal resin and the carboxylic acid-modified polyvinyl acetal resin may be synthesized by a conventional method, or commercially available products may be obtained. Examples of commercially available products include Sekisui Chemical Co., Ltd., trade names, ESREC BX-1, BX-2, BX-5, BX-55, BX-7, BH-3, BH-S, and KS-3Z. KS-5, KS-5Z, KS-8, KS23Z, manufactured by Denki Kagaku Kogyo Co., Ltd., trade names, electrified butyral 4000-2, 5000A, 6000C, 6000EP, and the like can be used. These resins can be used alone or in admixture of two or more.
(B)高分子成分の含有量は、接着剤層を構成する樹脂固形分に対し、好ましくは0.5〜25重量部、より好ましくは3.0〜15重量部である。前記(B)高分子成分の含有量が0.5重量部未満である場合は、ピール強度や化学粗化後の無電解めっきのピール強度が低くなる傾向があり、25重量部を超える場合は、はんだ耐熱性などや絶縁信頼性が低下する傾向がある。特に、架橋ゴム粒子とポリビニルアセタール樹脂をそれぞれ1重量部以上併用すると、金属箔の引き剥がし強さや化学粗化後の無電解めっきの引き剥がし強さが向上し、さらに好ましい。 (B) Content of a high molecular component becomes like this. Preferably it is 0.5-25 weight part with respect to the resin solid content which comprises an adhesive bond layer, More preferably, it is 3.0-15 weight part. When the content of the polymer component (B) is less than 0.5 parts by weight, the peel strength or the peel strength of electroless plating after chemical roughening tends to be low, and when it exceeds 25 parts by weight , Solder heat resistance and insulation reliability tend to decrease. In particular, it is more preferable to use the crosslinked rubber particles and the polyvinyl acetal resin in an amount of 1 part by weight or more because the peel strength of the metal foil and the peel strength of the electroless plating after chemical roughening are improved.
本発明で用いられる(C)エポキシ樹脂硬化剤としては、ノボラック型フェノール樹脂であることが好ましく、トリアジン環含有ノボラック型フェノール樹脂であると金属箔の引き剥がし強さや化学粗化後の無電解めっきの引き剥がし強さが向上し、さらに好ましい。トリアジン環含有ノボラック型フェノール樹脂とは、ノボラック型フェノール樹脂の主鎖にトリアジン環を含むノボラック型フェノール樹脂であり、トリアジン環を有するクレゾールノボラック型フェノール樹脂でも構わない。 The (C) epoxy resin curing agent used in the present invention is preferably a novolac type phenol resin, and if it is a triazine ring-containing novolac type phenol resin, the electroless plating after the metal foil peel strength and chemical roughening The peel strength of the resin is improved, which is more preferable. The triazine ring-containing novolak type phenol resin is a novolac type phenol resin having a triazine ring in the main chain of the novolak type phenol resin, and may be a cresol novolac type phenol resin having a triazine ring.
トリアジン環含有ノボラック型フェノール樹脂の分子中の窒素含有量は、好ましくは10〜25重量%、より好ましくは12〜19重量%である。前記分子中の窒素含有量がこの範囲であれば、誘電損失が大きくなりすぎることもなく、接着剤をワニスとする場合に、溶剤への溶解度が適切で、未溶解物の残存量が抑えられ易くなる。トリアジン環含有ノボラック型フェノール樹脂は、数平均分子量が500〜600であるものが好適に用いることができる。これらは単独で用いてもよく、2種以上を組み合せて用いてもよい。なお、トリアジン環含有ノボラック型フェノール樹脂は、フェノールとアデヒドとトリアジン環含有化合物を、pH5〜9の条件下で常法により反応させて得ることができる。トリアジン環含有化合物としては、メラミン、グアナミン及びその誘導体、シアヌル酸及びその誘導体などを使用することができる。原料のフェノールに代えてクレゾールを用いるとトリアジン環含有クレゾールノボラック型フェノール樹脂が得られる。クレゾールは、o−、m−、p−クレゾールのいずれも使用することができる。 The nitrogen content in the molecule of the triazine ring-containing novolak type phenol resin is preferably 10 to 25% by weight, more preferably 12 to 19% by weight. If the nitrogen content in the molecule is in this range, the dielectric loss does not become too large, and when the adhesive is used as a varnish, the solubility in the solvent is appropriate, and the residual amount of undissolved material can be suppressed. It becomes easy. As the triazine ring-containing novolac type phenol resin, those having a number average molecular weight of 500 to 600 can be suitably used. These may be used alone or in combination of two or more. The triazine ring-containing novolak type phenol resin can be obtained by reacting phenol, aldehyde, and a triazine ring-containing compound under a pH of 5 to 9 by a conventional method. As the triazine ring-containing compound, melamine, guanamine and derivatives thereof, cyanuric acid and derivatives thereof, and the like can be used. When cresol is used instead of the raw material phenol, a triazine ring-containing cresol novolac type phenol resin is obtained. As the cresol, any of o-, m-, and p-cresol can be used.
トリアジン環含有ノボラック型フェノール樹脂の市販品としては、大日本インキ化学工業(株)製、商品名トリアジン環含有クレゾールノボラック型フェノール樹脂フェノライトLA−3018(窒素含有量18重量%)が挙げられる。 Commercially available products of the triazine ring-containing novolak type phenol resin include Dainippon Ink and Chemicals, Inc., trade name triazine ring-containing cresol novolac type phenol resin phenolite LA-3018 (nitrogen content 18% by weight).
(C)エポキシ樹脂硬化剤の含有量は、(A)エポキシ樹脂のエポキシ当量に対する硬化剤の水酸基当量の比率が0.7〜1.3、より好ましくは0.9〜1.1となる量である。前記エポキシ硬化剤の含有量が(A)エポキシ樹脂のエポキシ当量に対する硬化剤の水酸基当量の比率が0.7未満である場合,もしくは1.3を超える場合は,樹脂の硬化度が著しく低下し,耐熱性が低下する傾向にある。
本発明で用いられる(D)硬化促進剤は、潜在性の熱硬化剤である各種イミダゾール類やBF3アミン錯体を配合することが好ましい。接着剤の保存安定性、Bステージにした際の取り扱い性及びはんだ耐熱性の点から、2−フェニルイミダゾール、2−エチル−4−メチルイミダゾール、1−シアノエチル−2−フェニルイミダゾリウムトリメリテートが好ましい。
(C) The content of the epoxy resin curing agent is such that the ratio of the hydroxyl equivalent of the curing agent to the epoxy equivalent of (A) the epoxy resin is 0.7 to 1.3, more preferably 0.9 to 1.1. It is. When the content of the epoxy curing agent is (A) the ratio of the hydroxyl equivalent of the curing agent to the epoxy equivalent of the epoxy resin is less than 0.7, or exceeds 1.3, the degree of cure of the resin is significantly reduced. , Heat resistance tends to decrease.
The (D) curing accelerator used in the present invention preferably contains various imidazoles and BF 3 amine complexes which are latent thermosetting agents. 2-phenylimidazole, 2-ethyl-4-methylimidazole, and 1-cyanoethyl-2-phenylimidazolium trimellitate are available from the viewpoints of storage stability of the adhesive, handleability at the B-stage and solder heat resistance. preferable.
(D)硬化促進剤の含有量は、(A)エポキシ樹脂100重量部に対し、好ましくは0.1〜5重量部、より好ましくは0.3〜1重量部である。硬化剤の含有量が前記数値範囲であれば、十分なはんだ耐熱性、良好な接着剤の保存安定性及びBステージにした際の良好な取り扱い性が得られ易くなる。 (D) Content of a hardening accelerator becomes like this. Preferably it is 0.1-5 weight part with respect to 100 weight part of (A) epoxy resins, More preferably, it is 0.3-1 weight part. When the content of the curing agent is within the above numerical range, sufficient solder heat resistance, good storage stability of the adhesive, and good handleability when using the B stage are easily obtained.
さらに、本発明では難燃性を向上させるため、接着剤に(E)難燃剤を含有させることができる。難燃剤としては、デカブロモジフェニルエーテル、テトラブロモビスフェノールA、テトラブロモ無水フタル酸、トリブロモフェノールなどの臭素化合物、トリフェニルフォスフェート、トリクレジルフォスフェート、トリキシリルフォスフェート、クレジルジフェニルフォスフェートなどのリン化合物、水酸化マグネシウム、水酸化アルミニウムなどの金属水酸化物、赤リン及びその変性物、三酸化アンチモン、五酸化アンチモンなどのアンチモン化合物、メラミン、シアヌール酸、シアヌール酸メラミンなどのトリアジン化合物など公知慣例の難燃剤を用いることができる。これらのなかでも、リン系難燃剤が好適に用いられ,特に下記一般式(2)で表されるフェノール性水酸基含有リン化合物がさらに好適に用いられる。
式中、nが、1の場合、R4は、水素原子、直鎖状又は分枝状のアルキル基、シクロアルキル基、アリール基若しくはアラルキル基であり、nが2の場合、それぞれのR4は独立して、水素原子、直鎖状又は分枝状のアルキル基、シクロアルキル基、アリール基若しくはアラルキル基であるか、2つのR4は、それぞれが結合している炭素原子と一緒になって、非置換又はアルキル基若しくはシクロアルキル基で置換されているベンゼン環を形成し、xは、2以上の自然数である。これらフェノール性水酸基含有リン化合物は、単独でも、2種以上を組み合せて用いてもよい。 In the formula, when n is 1, R 4 is a hydrogen atom, a linear or branched alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group, and when n is 2, each R 4 Is independently a hydrogen atom, a linear or branched alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, or two R 4 s together with the carbon atom to which each is attached. A benzene ring which is unsubstituted or substituted with an alkyl group or a cycloalkyl group, and x is a natural number of 2 or more. These phenolic hydroxyl group-containing phosphorus compounds may be used alone or in combination of two or more.
上記一般式(2)において、R4が直鎖状又は分枝状のアルキル基の場合、C1〜C6アルキル基が好ましく、シクロアルキル基の場合は、C6〜C8シクロアルキル基が好ましい。アリール基の場合、フェニル基が好ましく、アラルキルの場合、C7〜C10アラルキル基が好ましい。xは、2が好ましい。 In the general formula (2), when R 4 is a linear or branched alkyl group, a C 1 -C 6 alkyl group is preferable, and when it is a cycloalkyl group, a C 6 -C 8 cycloalkyl group is preferable. In the case of an aryl group, a phenyl group is preferable, and in the case of an aralkyl, a C 7 to C 10 aralkyl group is preferable. x is preferably 2.
また、一般式(2)において、nが2であり、2つのR4が、それぞれが結合している炭素原子と一緒になって、非置換又はアルキル基若しくはシクロアルキル基で置換されているベンゼン環を形成する場合は、非置換又はC1〜C4アルキル基若しくはC6〜C8シクロアルキル基で置換されているベンゼン環が好ましい。 In the general formula (2), n is 2, and two R 4 s , together with the carbon atoms to which each is bonded, are unsubstituted or substituted with an alkyl group or a cycloalkyl group. When a ring is formed, a benzene ring which is unsubstituted or substituted with a C 1 to C 4 alkyl group or a C 6 to C 8 cycloalkyl group is preferable.
具体的には、一般式(3)又は一般式(4)で示されるリン化合物が挙げられる。
又は
式中、R5は、水素原子、メチル、エチル、n−プロピル、イソプロピル、n−ブチル、イソブチル、sec−ブチル、tert−ブチル基、シクロヘキシル基を表す。 In the formula, R 5 represents a hydrogen atom, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl group, or cyclohexyl group.
特に、10−(2,5−ジヒドロキシフェニル)−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキシド及びそれらの誘導体が好ましい。市販品としては、三光(株)製、商品名HCA−HQが挙げられる。 In particular, 10- (2,5-dihydroxyphenyl) -9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and derivatives thereof are preferred. As a commercial item, Sanko Co., Ltd. make and brand name HCA-HQ are mentioned.
リン系難燃剤の含有量は、前記(A)〜(D)成分の重量の合計中、リン原子換算で、好ましくは1.5〜3.5重量%、より好ましくは1.8〜2.5重量%である。リン系難燃剤の含有量が前記範囲にあれば、難燃性が良好で、絶縁信頼性に優れ、かつ硬化塗膜のTgが低すぎることもない。 The content of the phosphorus-based flame retardant is preferably 1.5 to 3.5% by weight, more preferably 1.8 to 2.% in terms of phosphorus atoms in the total weight of the components (A) to (D). 5% by weight. If the content of the phosphorus flame retardant is in the above range, the flame retardancy is good, the insulation reliability is excellent, and the Tg of the cured coating film is not too low.
さらに、本発明では信頼性を向上させるため、接着剤に(F)無機フィラーを含有させることができる。(F)無機フィラーは、特に制限はないが、例えば、シリカ、溶融シリカ、タルク、アルミナ、水酸化アルミニウム、硫酸バリウム、水酸化カルシウム、アエロジル、炭酸カルシウム等が挙げられる。(F)無機フィラーには、分散性を高めるなどの目的で、これらをシランカップリング剤などの各種カップリング剤で処理したものを含む。これら無機フィラーは、単独でも、2種以上を組み合せて用いてもよい。なお、誘電特性や低熱膨張の点からシリカが好ましい。 Furthermore, in this invention, in order to improve reliability, the adhesive can contain (F) inorganic filler. (F) The inorganic filler is not particularly limited, and examples thereof include silica, fused silica, talc, alumina, aluminum hydroxide, barium sulfate, calcium hydroxide, aerosil, and calcium carbonate. (F) Inorganic fillers include those treated with various coupling agents such as silane coupling agents for the purpose of enhancing dispersibility. These inorganic fillers may be used alone or in combination of two or more. Silica is preferred from the viewpoint of dielectric properties and low thermal expansion.
(F)無機フィラーの含有量は、前記(A)〜(D)成分の容積の合計中、好ましくは5〜35容積%、より好ましくは10〜30容積%である。無機フィラーの含有量が前記範囲にあれば、熱膨張係数と誘電損失が大きくなることもなく、絶縁層を内層回路上に形成するのに、十分なフローが得られ易くなる。なお、本発明に用いられる接着剤に無機フィラーを分散させるには、例えば、ニーダー、ボールミル、ビーズミル、3本ロール等既知の混練方法を用いることができる。 (F) The content of the inorganic filler is preferably 5 to 35% by volume, more preferably 10 to 30% by volume, in the total volume of the components (A) to (D). If the content of the inorganic filler is in the above range, the thermal expansion coefficient and the dielectric loss are not increased, and a sufficient flow can be easily obtained for forming the insulating layer on the inner layer circuit. In order to disperse the inorganic filler in the adhesive used in the present invention, a known kneading method such as a kneader, a ball mill, a bead mill, or a three roll can be used.
本発明に用いられる接着剤には、必要に応じて、顔料、レベリング剤、消泡剤、イオントラップ剤等の添加剤を配合してもよい。 You may mix | blend additives, such as a pigment, a leveling agent, an antifoamer, and an ion trap agent, with the adhesive agent used for this invention as needed.
本発明の接着剤層付き金属箔は、公知の方法により製造することができる。すなわち、上記の紫外線遮蔽剤を含有する接着剤、またはこの接着剤を溶剤に希釈させたワニスを、金属箔の片面に塗布した後、乾燥させて半硬化させ接着剤層を金属箔上に形成することにより接着剤層付き金属箔を得ることができる。塗布は、公知の方法により実施可能であり、例えばキスコーター、ロールコーター、コンマコーター、グラビアコータ等を用いて行うことができる。塗布する厚みは、乾燥後又は半硬化時の接着剤層の厚みが10μm以下となるように調整する。乾燥は、加熱乾燥炉中等で通常70〜250℃、好ましくは100〜200℃の温度で、1〜30分間、好ましくは3〜15分間乾燥する方法が挙げられる。この際の乾燥温度は、ワニスの作製に使用した溶剤の揮発可能な温度以上であると好ましい。 The metal foil with an adhesive layer of the present invention can be produced by a known method. That is, an adhesive containing the above ultraviolet shielding agent or a varnish diluted with a solvent is applied to one side of a metal foil, and then dried and semi-cured to form an adhesive layer on the metal foil. By doing so, a metal foil with an adhesive layer can be obtained. Application | coating can be implemented by a well-known method, for example, can be performed using a kiss coater, a roll coater, a comma coater, a gravure coater etc. The applied thickness is adjusted such that the thickness of the adhesive layer after drying or semi-curing is 10 μm or less. The drying may be performed in a heat drying oven or the like, usually at a temperature of 70 to 250 ° C., preferably 100 to 200 ° C., for 1 to 30 minutes, preferably 3 to 15 minutes. The drying temperature at this time is preferably equal to or higher than the temperature at which the solvent used for the production of the varnish can be volatilized.
ワニスの作製に使用する溶剤としては、アセトン、メチルエチルケトン、シクロヘキサノン等のケトン類、ベンゼン、キシレン、トルエン等の芳香族炭化水素類、エチレングリコールモノエチルエーテルなどのアルコール類、エチルエトキシプロピオネートなどのエステル類、N、N−ジメチルホルムアミド、N、N−ジメチルアセトアミド等のアミド類が挙げられる。これらの溶剤は、単独でも、2種以上を混合して用いてもよい。接着剤に対する溶剤の使用量は、特に制限はなく、従来から使用されている量とすることができる。例えば、コンマコータやグラビアコータを用いてワニスを金属箔に塗布する場合は、接着剤の全固形分量が、10〜30重量%となるように溶剤の使用量を調節することが好ましい。 Solvents used for the production of varnish include ketones such as acetone, methyl ethyl ketone and cyclohexanone, aromatic hydrocarbons such as benzene, xylene and toluene, alcohols such as ethylene glycol monoethyl ether, and ethyl ethoxypropionate. Examples thereof include amides such as esters, N, N-dimethylformamide, N, N-dimethylacetamide and the like. These solvents may be used alone or in combination of two or more. There is no restriction | limiting in particular in the usage-amount of the solvent with respect to an adhesive agent, It can be set as the quantity currently used conventionally. For example, when the varnish is applied to the metal foil using a comma coater or a gravure coater, it is preferable to adjust the amount of the solvent used so that the total solid content of the adhesive is 10 to 30% by weight.
本発明の金属張積層板は、上記接着剤層付き金属箔とプリプレグを積層して加熱加圧成形して得ることができる。例えば、プリプレグの少なくとも片面に、上記接着剤層付き金属箔を、該接着剤層付き金属箔の接着剤層が接するように積層して積層体を得、該積層体を加熱加圧成形することにより得られる。プリプレグとしては、ポリイミド樹脂、エポキシ樹脂、フェノール樹脂、あるいはこれらの混合物等と、それぞれの樹脂の硬化剤をガラス繊維、有機繊維等の基材に含浸させて公知の方法により作製されたものを用いることができる。 The metal-clad laminate of the present invention can be obtained by laminating the above metal foil with an adhesive layer and a prepreg and heating and pressing. For example, the metal foil with an adhesive layer is laminated on at least one surface of a prepreg so that the adhesive layer of the metal foil with an adhesive layer is in contact with it to obtain a laminate, and the laminate is heated and pressed. Is obtained. As the prepreg, a polyimide resin, an epoxy resin, a phenol resin, or a mixture thereof and a material prepared by impregnating a base material such as glass fiber or organic fiber with a curing agent of each resin is used. be able to.
次に準備したプリプレグを、好ましくは複数枚重ねた状態とし、このプリプレグに、上記接着剤層付き金属箔をその接着剤層が接するように被着させ、被着後、所定の条件で加熱加圧成形することにより金属張積層板が形成される。この場合の加熱は、好ましくは150〜250℃の温度で実施することができ、加圧は、好ましくは0.5〜10.0MPaの圧力で実施することができる。加熱及び加圧は真空プレス等を用いて同時に行うことが好ましく、この場合、これらの処理を30分〜10時間実施することで、接着剤層(硬化層)及びプリプレグが十分に硬化した金属張積層板を製造することができる。なお、かかる接着剤層付き金属箔の被着は、プリプレグの片面にのみ行ってもよく、両面に被着させて両面金属張積層板を製造してもよい。 Next, a plurality of prepared prepregs are preferably stacked, and the metal foil with the adhesive layer is adhered to the prepreg so that the adhesive layer is in contact with the prepreg. A metal-clad laminate is formed by pressure forming. The heating in this case can be carried out preferably at a temperature of 150 to 250 ° C., and the pressurization can be carried out preferably at a pressure of 0.5 to 10.0 MPa. Heating and pressing are preferably performed simultaneously using a vacuum press or the like. In this case, by performing these treatments for 30 minutes to 10 hours, the adhesive layer (cured layer) and the prepreg are sufficiently cured. Laminates can be manufactured. The metal foil with an adhesive layer may be applied to only one side of the prepreg, or may be applied to both sides to produce a double-sided metal-clad laminate.
本発明における効果的な金属張積層板の厚さは、好ましくは0.2mm以下、より好ましくは0.1mm以下である。 The effective thickness of the metal-clad laminate in the present invention is preferably 0.2 mm or less, more preferably 0.1 mm or less.
本発明のプリント配線板は、上記金属張積層板に回路を形成することによりえることができる。すなわち、上記金属張積層板を公知の方法によって、穴開け加工や金属メッキを施した後、金属箔をエッチングにより回路状に加工して得られる。 The printed wiring board of the present invention can be obtained by forming a circuit on the metal-clad laminate. That is, the metal-clad laminate is obtained by drilling or metal plating by a known method and then processing the metal foil into a circuit by etching.
また、このプリント配線板を内層コア基板に用い、多層プリント配線板を形成することができる。まず、上記プリント配線板である内層コア基板の片面又は両面上に、上述したプリプレグを1層又は複数の層積層し、更にそのプリプレグの層上に金属箔を配置する。あるいは、プリプレグの層上に本発明に係る接着剤層付き金属箔を、接着剤層がプリプレグと接するように配置してもよい。そして、得られた積層体を加熱加圧成形し、穴開け加工や金属めっきを施した後、最外層の金属箔を回路形状に加工等して、多層プリント配線板を得ることができる。 Moreover, a multilayer printed wiring board can be formed using this printed wiring board as an inner layer core substrate. First, one layer or a plurality of layers of the above-described prepreg are laminated on one or both sides of an inner layer core substrate that is the printed wiring board, and a metal foil is disposed on the prepreg layer. Or you may arrange | position the metal foil with an adhesive layer which concerns on this invention on the layer of a prepreg so that an adhesive bond layer may contact | connect a prepreg. Then, the obtained laminate can be heat-pressed and subjected to drilling or metal plating, and then the outermost metal foil can be processed into a circuit shape to obtain a multilayer printed wiring board.
本発明における効果的なプリント配線板の合計の厚さは、好ましくは0.5mm以下、より好ましくは0.3mm以下である。 The total thickness of the effective printed wiring board in the present invention is preferably 0.5 mm or less, more preferably 0.3 mm or less.
実施例1
(1)接着剤層用樹脂ワニスの作製
(A)成分としてビフェニル構造を有するノボラック型エポキシ樹脂〔日本化薬(株)製、商品名NC3000−H〕60重量部に、(B)成分としてカルボン酸変性ポリビニルアセタール樹脂 KS−23Z〔積水化学工業(株)製、商品名KS−23Z〕15重量部、(C)成分としてトリアジン環含有クレゾールノボラック型フェノール樹脂〔窒素含有量18%、水酸基当量151、大日本インキ化学工業(株)製、商品名フェノライトLA−3018〕24重量部(エポキシ当量/水酸基当量=1.0)、(D)成分としてイミダゾール誘導体化合物 1−シアノエチル−2フェニルイミダゾリウムトリメリテート〔四国化成工業(株)製、商品名2PZ−CNS〕0.3重量部、紫外線遮蔽剤としてアジン系錯体〔中央合成化学(株)製、商品名チュウオー ブラック F5〕1重量部を配合して樹脂組成物を得た後、メチルエチルケトンをワニスの固形分が20%になるように配合して接着剤層用樹脂ワニスを作製した。
(2)接着剤層付き金属箔の作製
幅510mm、厚み12μmの電解銅箔(古河サーキットフォイル社製、商品名F0−WS12、Rz=1.2μm)の接着面(M面)に、上記接着剤層用樹脂ワニスを塗布し、塗布後の残溶剤量が5重量%以下になるように160℃で10分程度の乾燥を行い、接着剤層付き金属箔を作製した。該接着剤層付き金属箔の接着剤層の厚みは、3.0μmであった。
Example 1
(1) Preparation of resin varnish for adhesive layer (A) 60 parts by weight of a novolak type epoxy resin having a biphenyl structure as a component (manufactured by Nippon Kayaku Co., Ltd., trade name NC3000-H), Acid-modified polyvinyl acetal resin KS-23Z [manufactured by Sekisui Chemical Co., Ltd., trade name KS-23Z] 15 parts by weight, (C) Triazine ring-containing cresol novolac type phenol resin [nitrogen content 18%, hydroxyl group equivalent 151 Manufactured by Dainippon Ink & Chemicals, Inc., trade name Phenolite LA-3018] 24 parts by weight (epoxy equivalent / hydroxyl equivalent = 1.0), (D) imidazole derivative compound 1-cyanoethyl-2-phenylimidazolium as component Trimellitate [trade name 2PZ-CNS, manufactured by Shikoku Kasei Kogyo Co., Ltd.] 0.3 parts by weight as an ultraviolet shielding agent After blending 1 part by weight of an azine complex [manufactured by Chuo Synthetic Chemical Co., Ltd., trade name Chuo Black F5], a resin composition was obtained, and then methyl ethyl ketone was blended so that the solid content of the varnish was 20%. A resin varnish for the agent layer was prepared.
(2) Production of metal foil with adhesive layer The above adhesion to the adhesive surface (M surface) of an electrolytic copper foil (Furukawa Circuit Foil, trade name F0-WS12, Rz = 1.2 μm) having a width of 510 mm and a thickness of 12 μm The resin varnish for the agent layer was applied, and dried for about 10 minutes at 160 ° C. so that the residual solvent amount after application was 5% by weight or less to prepare a metal foil with an adhesive layer. The thickness of the adhesive layer of the metal foil with the adhesive layer was 3.0 μm.
(3)金属張積層板の作製
ガラス布基材高Tgエポキシ樹脂プリプレグ(日立化成工業(株)製、商品名GEA−679FG、厚み0.04mm)の両面に、上記接着剤層付き金属箔の接着剤層が接するように接着剤層付き金属箔を積層し、180℃、3.0MPaの条件で1時間プレス成形し、両面金属張積層板を作製した。
(3) Production of metal-clad laminate On both sides of a glass cloth substrate high Tg epoxy resin prepreg (manufactured by Hitachi Chemical Co., Ltd., trade name GEA-679FG, thickness 0.04 mm), the metal foil with the adhesive layer A metal foil with an adhesive layer was laminated so that the adhesive layer was in contact, and press molded at 180 ° C. and 3.0 MPa for 1 hour to prepare a double-sided metal-clad laminate.
実施例2
実施例1(1)の接着剤層用樹脂ワニスの作製において、チュウオー ブラック F5の配合量を5重量部にしたこと以外は実施例1(1)と同様の材料を使用し接着剤層用樹脂ワニスを作製し、実施例1(2)と同様の工程を経て接着剤層付き金属箔を作製した。該接着剤層付き金属箔の接着剤層の厚みは、 3.0μmであった。次いで、実施例1(3)と同様の工程を経て両面金属張積層板を作製した。
Example 2
In the production of the resin varnish for the adhesive layer of Example 1 (1), the same material as in Example 1 (1) was used except that the blending amount of Choo Black F5 was 5 parts by weight. A varnish was produced, and a metal foil with an adhesive layer was produced through the same steps as in Example 1 (2). The thickness of the adhesive layer of the metal foil with the adhesive layer was 3.0 μm. Next, a double-sided metal-clad laminate was produced through the same steps as in Example 1 (3).
実施例3
実施例1(1)で作製した接着剤層用樹脂ワニスを用い、接着剤層の厚みが10μmになるように接着剤層用樹脂ワニスを塗布すること以外は実施例1(2)と同様の工程を経て接着剤層付き金属箔を作製した。次いで、実施例1(3)と同様の工程を経て両面金属張積層板を作製した。
Example 3
Similar to Example 1 (2), except that the resin varnish for adhesive layer prepared in Example 1 (1) was used and the resin varnish for adhesive layer was applied so that the thickness of the adhesive layer became 10 μm. A metal foil with an adhesive layer was produced through the steps. Next, a double-sided metal-clad laminate was produced through the same steps as in Example 1 (3).
実施例4
実施例1(3)で厚みが0.15mmのプリプレグを用いた以外は実施例1(1)と同様の工程を経て接着剤層用樹脂ワニスを作製し、(2)と同様の工程を経て接着剤層付き金属箔を作製した。次いで、実施例1(3)と同様の工程を経て両面金属張積層板を作製した。
Example 4
A resin varnish for an adhesive layer was prepared through the same steps as in Example 1 (1) except that a prepreg having a thickness of 0.15 mm was used in Example 1 (3), and through the same steps as in (2). A metal foil with an adhesive layer was prepared. Next, a double-sided metal-clad laminate was produced through the same steps as in Example 1 (3).
実施例5
実施例1(1)の接着剤層用樹脂ワニスの作製において、チュウオー ブラック F5のかわりに,チュウオースーダンブラック141(ジスアゾ系染料:中央合成化学株式会社製)を1重量部を用いたこと以外は実施例1(1)と同様の材料を使用し接着剤層用樹脂ワニスを作製し、実施例1(2)と同様の工程を経て接着剤層付き金属箔を作製した。該接着剤層付き金属箔の接着剤層の厚みは、3.0μmであった。次いで、実施例1(3)と同様の工程を経て両面金属張積層板を作製した。
Example 5
In the production of the resin varnish for the adhesive layer of Example 1 (1), except that 1 part by weight of Chuo Sudan Black 141 (disazo dye: manufactured by Chuo Synthetic Chemical Co., Ltd.) was used instead of Chuo Black F5. Produced a resin varnish for an adhesive layer using the same material as in Example 1 (1), and produced a metal foil with an adhesive layer through the same steps as in Example 1 (2). The thickness of the adhesive layer of the metal foil with the adhesive layer was 3.0 μm. Next, a double-sided metal-clad laminate was produced through the same steps as in Example 1 (3).
比較例1
ガラス布基材高Tgエポキシ樹脂プリプレグ(日立化成工業(株)製、商品名GEA−679FG、厚み0.04mm)の両面に、上幅510mm、厚み12μmの電解銅箔(古河サーキットフォイル社製、商品名F0−WS12、Rz=1.2μm)を積層し、180℃、3.0MPaの条件で1時間プレス成形し、両面金属張積層板を作製した。
Comparative Example 1
A glass cloth base high Tg epoxy resin prepreg (manufactured by Hitachi Chemical Co., Ltd., trade name GEA-679FG, thickness 0.04 mm), an electrolytic copper foil (Furukawa Circuit Foil Co., Ltd.) having an upper width of 510 mm and a thickness of 12 μm. (Trade name F0-WS12, Rz = 1.2 μm) was laminated and press-molded under conditions of 180 ° C. and 3.0 MPa for 1 hour to prepare a double-sided metal-clad laminate.
比較例2
実施例1(1)の接着剤層用樹脂ワニスの作製において、チュウオー ブラック F5の配合量を0.005重量部にしたこと以外は実施例1(1)と同様の材料を使用し接着剤層用樹脂ワニスを作製し、実施例1(2)と同様の工程を経て接着剤層付き金属箔を作製した。該接着剤層付き金属箔の接着剤層の厚みは,3.0μmであった。次いで、実施例1(3)と同様の工程を経て両面金属張積層板を作製した。
Comparative Example 2
In the production of the resin varnish for the adhesive layer of Example 1 (1), the same material as in Example 1 (1) was used except that the amount of Choo Black F5 was 0.005 parts by weight. A resin varnish was prepared, and a metal foil with an adhesive layer was prepared through the same steps as in Example 1 (2). The thickness of the adhesive layer of the metal foil with the adhesive layer was 3.0 μm. Next, a double-sided metal-clad laminate was produced through the same steps as in Example 1 (3).
比較例3
実施例1(1)の接着剤層用樹脂ワニスの作製において、チュウオー ブラック F5の配合量を20重量部にしたこと以外は実施例1(1)と同様の材料を使用し接着剤層用樹脂ワニスを作製し、実施例1(2)と同様の工程を経て接着剤層付き金属箔を作製した。該接着剤層付き金属箔の接着剤層の厚みは、 3.0μmであった。次いで、実施例1(3)と同様の工程を経て両面金属張積層板を作製した。
Comparative Example 3
In the production of the resin varnish for the adhesive layer of Example 1 (1), the same material as in Example 1 (1) was used except that the blending amount of Choo Black F5 was 20 parts by weight. A varnish was produced, and a metal foil with an adhesive layer was produced through the same steps as in Example 1 (2). The thickness of the adhesive layer of the metal foil with the adhesive layer was 3.0 μm. Next, a double-sided metal-clad laminate was produced through the same steps as in Example 1 (3).
比較例4
実施例1(1)で作製した接着剤層用樹脂ワニスを用い、接着剤層の厚みが30μmになるように接着剤層用樹脂ワニスを塗布すること以外は実施例1(2)と同様の工程を経て接着剤層付き金属箔を作製した。次いで、実施例1(3)と同様の工程を経て両面金属張積層板を作製した。
Comparative Example 4
Similar to Example 1 (2) except that the adhesive varnish resin varnish was applied so that the thickness of the adhesive layer was 30 μm using the adhesive varnish resin varnish produced in Example 1 (1). A metal foil with an adhesive layer was produced through the steps. Next, a double-sided metal-clad laminate was produced through the same steps as in Example 1 (3).
実施例1〜5及び比較例1〜4で作製した両面金属張積層板の評価を以下のとおり行なった。結果を表1に示す。 Evaluation of the double-sided metal-clad laminate produced in Examples 1-5 and Comparative Examples 1-4 was performed as follows. The results are shown in Table 1.
〔ガラス転移温度(Tg)の測定〕
作製した両面金属張積層板のTgの測定はデュポン社製の熱機械分析法(TMA法)により測定した。
[Measurement of glass transition temperature (Tg)]
The Tg of the produced double-sided metal-clad laminate was measured by a thermomechanical analysis method (TMA method) manufactured by DuPont.
(はんだ耐熱性の評価)
両面金属張積層板のはんだ耐熱性は、吸湿処理後(PCT処理:121℃、2.13×105Paのプレッシャークッカー処理装置内に3時間保持)に288℃のはんだ槽に20秒間浸漬した両面金属張積層板を観察した結果である。各記号は、○:変化無し、△:ミーズリング発生、×:ふくれ発生を意味し、3つの記号は、3つの試験片により評価した結果をそれぞれ示したものである。
(Evaluation of solder heat resistance)
The solder heat resistance of the double-sided metal-clad laminate was immersed in a solder bath at 288 ° C. for 20 seconds after moisture absorption treatment (PCT treatment: 121 ° C., kept in a pressure cooker treatment device of 2.13 × 10 5 Pa for 3 hours). It is the result of observing a double-sided metal-clad laminate. Each symbol means ◯: no change, Δ: occurrence of measling, ×: occurrence of blistering, and three symbols respectively show the results of evaluation using three test pieces.
(両面同時露光による裏かぶり有無の確認)
両面金属張積層板にエッチングを施し、回路を形成して両面配線板を作製した。作製した両面配線板の両面にレジスト材料(太陽インキ製造(株)製、商品名PSR−400)を塗布して乾燥し、マスクフィルムを介して、紫外線照射装置((株)オーク製作所製、商品名HMW−532D)により、500mJ/cm2の紫外線を両面から照射して露光し、炭酸ナトリウム溶液を用いて現像し、レジストを形成した。そして、形成されたレジストを目視観察して裏かぶりの有無を確認した。
(Confirmation of the presence of back cover by simultaneous exposure on both sides)
Etching was performed on the double-sided metal-clad laminate to form a circuit, thereby producing a double-sided wiring board. A resist material (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PSR-400) is applied to both sides of the produced double-sided wiring board, dried, and then passed through a mask film through an ultraviolet irradiation device (manufactured by Oak Manufacturing Co., Ltd., product). No. HMW-532D) was exposed by irradiating with 500 mJ / cm 2 ultraviolet rays from both sides, and developed using a sodium carbonate solution to form a resist. And the formed resist was visually observed and the presence or absence of back fogging was confirmed.
表1に示されるように、実施例1〜5で作製した両面金属張積層板は、はんだ耐熱性、Tgとも良好であり、両面同時露光による裏かぶりも認められないことが明らかである。これに対して比較例1及び2で作製した両面金属張積層板は、耐熱性、Tgは良好であったが、裏かぶりが発生した。また比較例3及び4作製した両面金属張積層板は、裏かぶりは発生しなかったが、耐熱性、Tgが著しく低下した。 As shown in Table 1, it is clear that the double-sided metal-clad laminates produced in Examples 1 to 5 have good solder heat resistance and Tg, and no back fogging due to double-sided simultaneous exposure. In contrast, the double-sided metal-clad laminate produced in Comparative Examples 1 and 2 had good heat resistance and Tg, but back fogging occurred. Further, the double-sided metal-clad laminates produced in Comparative Examples 3 and 4 did not cause back fogging, but the heat resistance and Tg were significantly reduced.
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007132635A JP5098432B2 (en) | 2006-12-05 | 2007-05-18 | Metal foil with adhesive layer, metal-clad laminate and printed wiring board using the same |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006328151 | 2006-12-05 | ||
JP2006328151 | 2006-12-05 | ||
JP2007132635A JP5098432B2 (en) | 2006-12-05 | 2007-05-18 | Metal foil with adhesive layer, metal-clad laminate and printed wiring board using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008162253A JP2008162253A (en) | 2008-07-17 |
JP5098432B2 true JP5098432B2 (en) | 2012-12-12 |
Family
ID=39692352
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007132635A Active JP5098432B2 (en) | 2006-12-05 | 2007-05-18 | Metal foil with adhesive layer, metal-clad laminate and printed wiring board using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5098432B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010070653A (en) * | 2008-09-18 | 2010-04-02 | Sekisui Chem Co Ltd | Insulating sheet and laminated structure |
JP2010083072A (en) * | 2008-10-01 | 2010-04-15 | Hitachi Chem Co Ltd | Copper-clad laminated sheet and printed circuit board |
TWI506082B (en) * | 2009-11-26 | 2015-11-01 | Ajinomoto Kk | Epoxy resin composition |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63114639A (en) * | 1986-10-31 | 1988-05-19 | 日立化成工業株式会社 | Beam non-transmitting laminated board |
JPH0767777B2 (en) * | 1986-12-23 | 1995-07-26 | 日立化成工業株式会社 | Electric laminate |
TW213532B (en) * | 1991-07-26 | 1993-09-21 | Mitsubishi Gas Chemical Co | |
JP3949676B2 (en) * | 2003-07-22 | 2007-07-25 | 三井金属鉱業株式会社 | Copper foil with ultrathin adhesive layer and method for producing the copper foil with ultrathin adhesive layer |
JP2006290997A (en) * | 2005-04-08 | 2006-10-26 | Hitachi Chem Co Ltd | Thermosetting resin composition, adhesive sheet using the composition and adhesive sheet with copper foil |
-
2007
- 2007-05-18 JP JP2007132635A patent/JP5098432B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2008162253A (en) | 2008-07-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2008037957A (en) | Thermosetting resin composition, b-stage resin film and multilayer build-up substrate | |
JP2007305963A (en) | Substrate for mounting semiconductor element with stress relaxation layer and its manufacturing method | |
JP2007224242A (en) | Thermosetting resin composition, resin film in b stage and multilayer build-up base plate | |
JP6931542B2 (en) | Cured resin composition, resin composition and multilayer substrate | |
JP2005272722A (en) | Thermosetting resin composition, resin film and product | |
JP2007001291A (en) | Metallic foil with adhesion adjuvant, printed-wiring board using the same, and manufacturing method for printed-wiring board | |
JP2006290997A (en) | Thermosetting resin composition, adhesive sheet using the composition and adhesive sheet with copper foil | |
JP2013040298A (en) | Epoxy resin material and multilayer board | |
JP2002359444A (en) | Copper foil with resin and printed wiring board using the same | |
JP5799174B2 (en) | Insulating resin film, pre-cured product, laminate and multilayer substrate | |
JP2006218855A (en) | Metallic foil with adhesive assistant, printed wiring board and its manufacturing method | |
JP5098432B2 (en) | Metal foil with adhesive layer, metal-clad laminate and printed wiring board using the same | |
JP5752071B2 (en) | B-stage film and multilayer substrate | |
KR20090078051A (en) | Adhesive composition for halogen-free coverlay film and coverlay film using the same | |
JP2011051247A (en) | Metal foil with thermosetting resin composition layer, metal clad laminated plate, and printed wiring board | |
JP2009185087A (en) | Phosphorus-containing epoxy resin, phosphorus-containing epoxy resin composition, method for producing phosphorus-containing epoxy resin, curable resin composition using phosphorus-containing epoxy resin, and cured product | |
JP2013082873A (en) | B-stage film and multilayer board | |
JP5508342B2 (en) | B-stage film for printed wiring board and multilayer board | |
JP2012041510A (en) | Resin composition, b-stage film, laminated film, and multilayer substrate | |
JP5662858B2 (en) | B-stage film and multilayer substrate | |
JP5370794B2 (en) | Copper foil with adhesive aid, laminated board using the same, printed wiring board, and method for manufacturing printed wiring board | |
JP7341828B2 (en) | Curable resin compositions, dry films, copper foils with resin, cured products, and electronic components | |
JP5727325B2 (en) | Thermosetting resin material and multilayer substrate | |
JP4039118B2 (en) | Prepreg, laminated board for printed wiring board and printed wiring board | |
JP5482831B2 (en) | Metal foil with adhesion aid, printed wiring board using the same, and method for producing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100430 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110404 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111013 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111018 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111216 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120828 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120910 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151005 Year of fee payment: 3 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 5098432 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151005 Year of fee payment: 3 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151005 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |