JP5062597B2 - トンネル磁気抵抗素子 - Google Patents
トンネル磁気抵抗素子 Download PDFInfo
- Publication number
- JP5062597B2 JP5062597B2 JP2009158982A JP2009158982A JP5062597B2 JP 5062597 B2 JP5062597 B2 JP 5062597B2 JP 2009158982 A JP2009158982 A JP 2009158982A JP 2009158982 A JP2009158982 A JP 2009158982A JP 5062597 B2 JP5062597 B2 JP 5062597B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- ferromagnetic
- ferromagnetic film
- magnetization
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/098—Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3909—Arrangements using a magnetic tunnel junction
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1675—Writing or programming circuits or methods
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
Description
12 第1強磁性膜
14 導電膜
16 第2強磁性膜
20 トンネル絶縁膜
30 固定層
Claims (8)
- 強磁性体を有する固定層と、
前記固定層に接して設けられたトンネル絶縁膜と、
前記トンネル絶縁膜に接して設けられた第1強磁性膜と、前記第1強磁性膜と平行に層間交換結合した磁化を有する第2強磁性膜と、前記第1強磁性膜と前記第2強磁性膜とに挟まれた導電膜と、を有する自由層と、
を具備し、
前記第2強磁性膜の磁化と体積の積が前記第1強磁性膜の磁化と体積の積の2倍以上であり、
前記自由層はスピン注入法によりスピン反転することを特徴とするトンネル磁気抵抗素子。 - 前記第2強磁性膜の磁化と体積の積が前記第1強磁性膜の磁化と体積の積の3倍より小さいことを特徴とする請求項1記載のトンネル磁気抵抗素子。
- 前記導電膜はRuであることを特徴とする請求項1または2記載のトンネル磁気抵抗素子。
- 前記第1強磁性膜は、CoFeBであることを特徴とすることを特徴とする請求項3記載のトンネル磁気抵抗素子。
- 前記第1強磁性膜および前記第2強磁性膜は、CoFeBであることを特徴とする請求項3記載のトンネル磁気抵抗素子。
- 前記導電膜の膜厚は、1.3〜1.7nmであることを特徴とする請求項4または5記載のトンネル磁気抵抗素子。
- 前記トンネル絶縁膜は、酸化マグネシウムであることを特徴とする請求項1から6のいずれか一項記載のトンネル磁気抵抗素子。
- 前記自由層の形状磁気一軸異方性エネルギーは、前記自由層の磁気一軸異方性エネルギーから前記形状磁気一軸異方性エネルギーを減じたエネルギーより大きいことを特徴とする請求項1から7のいずれか一項記載のトンネル磁気抵抗素子。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009158982A JP5062597B2 (ja) | 2008-08-29 | 2009-07-03 | トンネル磁気抵抗素子 |
US12/547,978 US20100055502A1 (en) | 2008-08-29 | 2009-08-26 | Tunneling magnetoresistive device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008222753 | 2008-08-29 | ||
JP2008222753 | 2008-08-29 | ||
JP2009158982A JP5062597B2 (ja) | 2008-08-29 | 2009-07-03 | トンネル磁気抵抗素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010080920A JP2010080920A (ja) | 2010-04-08 |
JP5062597B2 true JP5062597B2 (ja) | 2012-10-31 |
Family
ID=41725921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009158982A Expired - Fee Related JP5062597B2 (ja) | 2008-08-29 | 2009-07-03 | トンネル磁気抵抗素子 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20100055502A1 (ja) |
JP (1) | JP5062597B2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102153559B1 (ko) | 2013-08-02 | 2020-09-08 | 삼성전자주식회사 | 수직 자기터널접합을 구비하는 자기 기억 소자 |
US9490000B2 (en) | 2014-04-10 | 2016-11-08 | Samsung Electronics Co., Ltd. | Method and system for providing thermally assisted magnetic junctions having a multi-phase operation |
US9536549B1 (en) * | 2015-08-14 | 2017-01-03 | Seagate Technology Llc | Multiple sensor magnetic reproducing device with reduced inter-sensor spacing |
KR102356201B1 (ko) * | 2016-03-24 | 2022-01-26 | 고쿠리츠다이가쿠호진 도호쿠다이가쿠 | 자기 터널 접합 소자의 열안정성 지수의 측정 방법 및 측정 시스템, 반도체 집적회로, 및 반도체 집적회로의 생산관리 방법 |
US10439133B2 (en) * | 2017-03-13 | 2019-10-08 | Samsung Electronics Co., Ltd. | Method and system for providing a magnetic junction having a low damping hybrid free layer |
US10510390B2 (en) * | 2017-06-07 | 2019-12-17 | International Business Machines Corporation | Magnetic exchange coupled MTJ free layer having low switching current and high data retention |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3863484B2 (ja) * | 2002-11-22 | 2006-12-27 | 株式会社東芝 | 磁気抵抗効果素子および磁気メモリ |
CN100533589C (zh) * | 2002-11-26 | 2009-08-26 | 株式会社东芝 | 磁单元和磁存储器 |
JP4568152B2 (ja) * | 2004-09-17 | 2010-10-27 | 株式会社東芝 | 磁気記録素子及びそれを用いた磁気記録装置 |
JP2006319259A (ja) * | 2005-05-16 | 2006-11-24 | Fujitsu Ltd | 強磁性トンネル接合素子、これを用いた磁気ヘッド、磁気記録装置、および磁気メモリ装置 |
US7973349B2 (en) * | 2005-09-20 | 2011-07-05 | Grandis Inc. | Magnetic device having multilayered free ferromagnetic layer |
US7280389B2 (en) * | 2006-02-08 | 2007-10-09 | Magic Technologies, Inc. | Synthetic anti-ferromagnetic structure with non-magnetic spacer for MRAM applications |
TWI449040B (zh) * | 2006-10-06 | 2014-08-11 | Crocus Technology Sa | 用於提供內容可定址的磁阻式隨機存取記憶體單元之系統及方法 |
JP2008153527A (ja) * | 2006-12-19 | 2008-07-03 | Sony Corp | 記憶素子及びメモリ |
WO2008099626A1 (ja) * | 2007-02-13 | 2008-08-21 | Nec Corporation | 磁気抵抗効果素子、および磁気ランダムアクセスメモリ |
-
2009
- 2009-07-03 JP JP2009158982A patent/JP5062597B2/ja not_active Expired - Fee Related
- 2009-08-26 US US12/547,978 patent/US20100055502A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20100055502A1 (en) | 2010-03-04 |
JP2010080920A (ja) | 2010-04-08 |
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