JP5052528B2 - 半導体プロセスにおけるナノリソグラフィ技法を利用した単電子トランジスタ(set)を作製する方法 - Google Patents
半導体プロセスにおけるナノリソグラフィ技法を利用した単電子トランジスタ(set)を作製する方法 Download PDFInfo
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Description
(c)ガス分子または原子状態の堆積物質Bの出力をそれまでと同一の方向に維持し、縮小されたナノアパーチャ20を中心として基板1を傾斜角θに右側に傾け、縮小されたナノアパーチャ20を再び通過する堆積物質Bによって、基板1の表面上の既存の島電極Iの予想される右の位置に、ドレイン電極Dナノ量子ドット50が堆積する(図10および図10の2−2の断面図に示される)。
(d)ガス分子または原子状態の堆積物質Bの出力をそれまでと同一の方向に維持し、縮小されたナノアパーチャ20を中心として基板1を傾斜角θ2に左側に傾け、縮小されたナノアパーチャ20を再び通過する堆積物質によって、基板1の表面上の既存の島電極Iの予想される左の位置に、ソース電極Sナノ量子ドット60が堆積する(図11および図11の3−3の断面図に示される)。
(e)ガス分子または原子状態の堆積物質Bの出力を以前と同一の方向に維持し、縮小されたナノアパーチャ20を中心軸として、基板を傾斜角θと連携する回転角 Φ に時計回りに回転させ、縮小されたナノアパーチャ20を再び通過する堆積物質Bによって、ゲート電極Gナノ量子ドット70が、基板1の表面上の既存の島電極Iの予想される前方位置に堆積する(図12および図12の4−4の断面図に示される)。
(f)最後に、溶液リンス(すなわちウエットエッチング)またはガスエッチング(すなわちドライエッチング)によって、基板1上のフォトレジスト2内のナノ円筒形孔10を除去し、これにより、ナノスケールの島電極Iナノ量子ドット40、ドレイン電極Dナノ量子ドット50、ソース電極Sナノ量子ドット60およびゲート電極Gナノ量子ドット70を含む単電子トランジスタ(SET)が、基板1の表面上に直接作製される(図13の上面図に示される)。
(2)傾斜回転コンソールRを傾斜角θの勾配に維持し、徐々にそれを完全に一回転させ(図b、c、d、e、fおよび図6の対応する側面図にそれぞれ示される)、これにより、ガス分子または原子状態の密封材、すなわち密封物質Aが堆積することによって、頂部開口11のものより小さい直径を有する縮小されたナノアパーチャ20が、ナノ円筒形孔10の頂部開口11の上に形成される(図gおよび図6の対応する側面図に示される)ステップを含む。
さらに図18から図22を参照すると、ドレイン電極Dナノロッド50a、ソース電極Sナノロッド60aおよびゲート電極Gナノロッド70aの各ナノロッドの端部をそれぞれ拡幅するために、上述のステップ(c)、(d)および(e)における回転各Φ1、Φ2、 Φ3 および Φ4を制御可能な調整方法で徐々に増大させることができ、その結果、ドレイン電極Dナノロッド50a、ソース電極Sナノロッド60aおよびゲート電極Gナノロッド70aの各ナノロッドの拡幅された端部を含むSETが首尾よく実現される。 結論として、本発明の単電子トランジスタ(SET)を作製する方法を採用し、傾斜角θ、回転角Φおよび縮小されたナノアパーチャの直径を好適に調整することによって、現在既存のナノリソグラフィに適合可能な方法で、島電極I、ドレイン電極D、ソース電極Sおよびゲート電極G内の各ナノ量子ドット全ての位置、サイズ、構成および密度を精密が制御され、室温のプロセスで作製することができ、その結果、大量生産において極めて簡素でコスト効果の高いものとなり、さらにSET(単電子トランジスタ)の作製プロセスおよび技術における技術的克服となる。したがって、本発明は、産業上の用途および利用に適合するだけでなく、実際の使用において、新規で進歩性のある実用的進歩の特許性の本質的な基準を有する。
Claims (8)
- 半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法であって、以下の処理ステップ:
(a)まず、密封材、すなわちガス分子または原子状態の密封物質を、基板上のフォトレジスト内に形成されたナノ円筒形孔の頂部開口上に堆積させ、その結果、前記頂部開口の直径が徐々に縮小して、開口の直径が前記頂部開口のものより小さい縮小されたナノアパーチャとなるステップ、
(b)前記基板を水平方向に維持し、ガス分子または原子状態の堆積物質を縮小されたナノアパーチャに向かって垂直に向くように整列させ、その結果、前記堆積物質が前記縮小されたナノアパーチャを通過することによって、縮小されたナノアパーチャのものと同一の直径を有する島電極ナノ量子ドットが、ナノ円筒形孔内の前記基板の表面上の予想される位置に直接堆積するステップ、
(c)ガス分子または原子状態の堆積物質の出力を前のステップと同じ方向に維持し、前記基板を縮小されたナノアパーチャを中心とする傾斜角へ右側に傾け、縮小されたナノアパーチャを再度通過する堆積物質によって、前記基板の表面上の前記既存の島電極の予想される右の位置にドレイン電極ナノ量子ドットが堆積するステップ、
(d)ガス分子または原子状態の堆積物質の出力を前のステップと同じ方向に維持し、前記基板を縮小されたナノアパーチャを中心とする傾斜角へ左側に傾け、縮小されたナノアパーチャを再度通過する堆積物質によって、前記基板の表面上の前記既存の島電極の予想される左の位置にソース電極ナノ量子ドットが堆積するステップ、
(e)ガス分子または原子状態の堆積物質の出力を前のステップと同じ方向に維持し、前記縮小されたナノアパーチャを中央軸として、前記基板を傾斜角θと連携する回転角に時計回りに回転させ、縮小されたナノアパーチャを再度通過する堆積物質によって、前記基板の表面上の前記既存の島電極の予想される前方位置にゲート電極ナノ量子ドットが堆積するステップ、および
(f)最後に、溶液リンス(すなわちウエットエッチング)またはガスエッチング(すなわちドライエッチング)によって、前記基板上の前記ナノ円筒形孔が形成された前記フォトレジストを除去し、これにより、ナノスケールの島電極ナノ量子ドット、ドレイン電極ナノ量子ドット、ソース電極ナノ量子ドットおよびゲート電極ナノ量子ドットを含む単電子トランジスタ(SET)が、前記基板の表面上に直接作製されるステップ、
を含む方法。 - 前記ステップ(c)の傾斜角、前記ステップ(d)の傾斜角および前記ステップ(e)の傾斜角が、互いに同等であるまたは同等でない、請求項1に記載の半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法。
- 前記ステップ(e)の傾斜角および回転角が、前記島電極ナノ量子ドットと前記ゲート電極ナノ量子ドットの間の距離によって決定される、請求項1に記載の半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法。
- 前記ステップ(b)、(c)、(d)および(e)の上記の手順を、一連の順番を柔軟性を持って相互に変えることができる、請求項1に記載の半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法。
- 前記島電極ナノ量子ドット、ドレイン電極ナノ量子ドット、ソース電極ナノ量子ドットおよびゲート電極ナノ量子ドットの各ナノ量子ドットの材料が、半導体または金属である、請求項1に記載の半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法。
- 前記ステップ(b)における前記堆積物質が、堆積供給デバイスから出力され、ガス分子または原子状態の前記堆積物質の移動方向がより凝集的となるように、前記堆積供給デバイスと前記縮小されたナノアパーチャの間にコリメータが設置され、これにより、前記基板の表面上に形成されるより小さいサイズスケールの前記ナノ構造の信頼性が向上する、請求項1に記載の半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法。
- 島電極ナノ量子ドット、ドレイン電極ナノロッド、ソース電極ナノロッドおよびゲート電極ナノロッドを含むSETを作製するために、前記ステップ(c)、(d)および(e)における前記傾斜角および前記回転角が徐々に増大される、請求項1に記載の半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法。
- 前記ステップ(c)、(d)および(e)における前記ドレイン電極ナノロッド、ソース電極ナノロッドおよびゲート電極ナノロッドの各端部が、前記回転角を制御可能な調整方法で徐々に増大させることによって拡幅され、その結果、ドレイン電極ナノロッド、ソース電極ナノロッドおよびゲート電極ナノロッドそれぞれの各ナノロッドの拡幅された端部を含むSETが首尾よく実現される、請求項7に記載の半導体プロセスにおけるナノリソグラフィ技法を利用する単電子トランジスタ(SET)の作製方法。
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US11/646,383 US7749784B2 (en) | 2005-12-30 | 2006-12-28 | Fabricating method of single electron transistor (SET) by employing nano-lithographical technology in the semiconductor process |
US11/646,383 | 2006-12-28 | ||
PCT/US2006/049474 WO2007079174A2 (en) | 2005-12-30 | 2006-12-29 | The fabricating method of single electron transistor (set) by employing nano-lithographical technology in the semiconductor process |
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US20090112564A1 (en) * | 2007-09-25 | 2009-04-30 | Robert William Schmieder | Circuits for simulating dynamical systems |
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US8206568B2 (en) | 1999-06-22 | 2012-06-26 | President And Fellows Of Harvard College | Material deposition techniques for control of solid state aperture surface properties |
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CN101346829B (zh) | 2010-10-13 |
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US7749784B2 (en) | 2010-07-06 |
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