JP5038913B2 - 測定システムに関するツール群マッチング問題及び根本原因問題点の判定 - Google Patents

測定システムに関するツール群マッチング問題及び根本原因問題点の判定 Download PDF

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Publication number
JP5038913B2
JP5038913B2 JP2007557116A JP2007557116A JP5038913B2 JP 5038913 B2 JP5038913 B2 JP 5038913B2 JP 2007557116 A JP2007557116 A JP 2007557116A JP 2007557116 A JP2007557116 A JP 2007557116A JP 5038913 B2 JP5038913 B2 JP 5038913B2
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JP
Japan
Prior art keywords
msut
offset
tool
bms
measurement
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Expired - Fee Related
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JP2007557116A
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English (en)
Japanese (ja)
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JP2008537635A5 (enExample
JP2008537635A (ja
Inventor
アーチー、チャールズ、エヌ
バンク、ジョージ、ダブリュー、ジュニア
ソレッキー、エリック、ピー
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International Business Machines Corp
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International Business Machines Corp
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Priority claimed from US11/065,740 external-priority patent/US7340374B2/en
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JP2008537635A publication Critical patent/JP2008537635A/ja
Publication of JP2008537635A5 publication Critical patent/JP2008537635A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
    • G01B21/045—Correction of measurements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D18/00—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Complex Calculations (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Testing Of Engines (AREA)
JP2007557116A 2005-02-25 2006-02-22 測定システムに関するツール群マッチング問題及び根本原因問題点の判定 Expired - Fee Related JP5038913B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US65616205P 2005-02-25 2005-02-25
US60/656,162 2005-02-25
US11/065,740 2005-02-25
US11/065,740 US7340374B2 (en) 2005-02-25 2005-02-25 Determining fleet matching problem and root cause issue for measurement system
US11/245,865 2005-10-07
US11/245,865 US7532999B2 (en) 2005-02-25 2005-10-07 Determining root cause of matching problem and/or fleet measurement precision problem for measurement system
PCT/US2006/006224 WO2006093747A2 (en) 2005-02-25 2006-02-22 Determining fleet matching problem and root cause issue for measurement system

Publications (3)

Publication Number Publication Date
JP2008537635A JP2008537635A (ja) 2008-09-18
JP2008537635A5 JP2008537635A5 (enExample) 2009-03-05
JP5038913B2 true JP5038913B2 (ja) 2012-10-03

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007557116A Expired - Fee Related JP5038913B2 (ja) 2005-02-25 2006-02-22 測定システムに関するツール群マッチング問題及び根本原因問題点の判定

Country Status (4)

Country Link
US (1) US7532999B2 (enExample)
EP (1) EP1851658A4 (enExample)
JP (1) JP5038913B2 (enExample)
WO (1) WO2006093747A2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7571070B2 (en) * 2006-08-30 2009-08-04 International Business Machines Corporation Measurement system fleet optimization
US20080244607A1 (en) * 2007-03-27 2008-10-02 Vladislav Rysin Economic allocation and management of resources via a virtual resource market
JP2011503713A (ja) * 2007-11-06 2011-01-27 クレディ スイス セキュリティーズ （ユーエスエイ） エルエルシー サービスレベル契約に従ったリソース割り振りの予測及び管理
US8219358B2 (en) * 2008-05-09 2012-07-10 Credit Suisse Securities (Usa) Llc Platform matching systems and methods
US10642255B2 (en) 2013-08-30 2020-05-05 Taiwan Semiconductor Manufacturing Company, Ltd. Component control in semiconductor performance processing with stable product offsets
RU2597789C2 (ru) * 2014-11-10 2016-09-20 Илья Владимирович Духовлинов Анальгетическое средство на основе плазмидной днк, кодирующей hnp-1, либо hnp-2, либо hnp-3 (варианты)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5526293A (en) * 1993-12-17 1996-06-11 Texas Instruments Inc. System and method for controlling semiconductor wafer processing
CN1239969C (zh) * 1999-06-22 2006-02-01 布鲁克斯自动化公司 用于微电子学器件生产的逐次运行控制器
US6604013B1 (en) * 2000-10-11 2003-08-05 Ford Motor Company Tool failure detection utilizing frequency derived, pre-characterization templates
US6432760B1 (en) * 2000-12-28 2002-08-13 Infineon Technologies Ag Method and structure to reduce the damage associated with programming electrical fuses
US6965895B2 (en) * 2001-07-16 2005-11-15 Applied Materials, Inc. Method and apparatus for analyzing manufacturing data
TWI266249B (en) * 2002-05-16 2006-11-11 Mosel Vitelic Inc Statistical process control method and system thereof
US7212950B2 (en) * 2002-09-18 2007-05-01 Onwafer Technologies, Inc. Methods and apparatus for equipment matching and characterization
US6885977B2 (en) * 2002-12-20 2005-04-26 Applied Materials, Inc. System to identify a wafer manufacturing problem and method therefor
WO2004059247A1 (en) 2002-12-20 2004-07-15 International Business Machines Corporation Assessment and optimization for metrology instrument
US7062411B2 (en) * 2003-06-11 2006-06-13 Scientific Systems Research Limited Method for process control of semiconductor manufacturing equipment
US7127358B2 (en) * 2004-03-30 2006-10-24 Tokyo Electron Limited Method and system for run-to-run control
US7065423B2 (en) * 2004-07-08 2006-06-20 Timbre Technologies, Inc. Optical metrology model optimization for process control

Also Published As

Publication number Publication date
WO2006093747A2 (en) 2006-09-08
US20060195295A1 (en) 2006-08-31
EP1851658A2 (en) 2007-11-07
JP2008537635A (ja) 2008-09-18
EP1851658A4 (en) 2010-11-03
US7532999B2 (en) 2009-05-12
WO2006093747A3 (en) 2007-09-27

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