JP5021716B2 - Ｘ線発生装置及び携帯型非破壊検査装置 - Google Patents
Ｘ線発生装置及び携帯型非破壊検査装置 Download PDFInfo
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- JP5021716B2 JP5021716B2 JP2009274147A JP2009274147A JP5021716B2 JP 5021716 B2 JP5021716 B2 JP 5021716B2 JP 2009274147 A JP2009274147 A JP 2009274147A JP 2009274147 A JP2009274147 A JP 2009274147A JP 5021716 B2 JP5021716 B2 JP 5021716B2
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- 238000007689 inspection Methods 0.000 title claims description 11
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 230000001066 destructive effect Effects 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 230000001133 acceleration Effects 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 239000010408 film Substances 0.000 description 6
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- 238000010894 electron beam technology Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000012212 insulator Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
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- 230000002093 peripheral effect Effects 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
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- 239000011521 glass Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
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- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009274147A JP5021716B2 (ja) | 2009-12-02 | 2009-12-02 | Ｘ線発生装置及び携帯型非破壊検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009274147A JP5021716B2 (ja) | 2009-12-02 | 2009-12-02 | Ｘ線発生装置及び携帯型非破壊検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011119084A JP2011119084A (ja) | 2011-06-16 |
| JP2011119084A5 JP2011119084A5 (enExample) | 2012-06-21 |
| JP5021716B2 true JP5021716B2 (ja) | 2012-09-12 |
Family
ID=44284200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009274147A Expired - Fee Related JP5021716B2 (ja) | 2009-12-02 | 2009-12-02 | Ｘ線発生装置及び携帯型非破壊検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5021716B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5044005B2 (ja) * | 2010-11-08 | 2012-10-10 | マイクロＸジャパン株式会社 | 電界放射装置 |
| EP3240010B1 (en) | 2014-12-25 | 2022-02-09 | Meidensha Corporation | Field emission device and reforming treatment method |
| CN105334529B (zh) * | 2015-11-26 | 2017-09-29 | 天华化工机械及自动化研究设计院有限公司 | 同位素仪表内置放射源射线束方向的定向调节装置 |
| JP6791480B2 (ja) * | 2016-06-06 | 2020-11-25 | 富士電機株式会社 | Ｘ線照射システム |
| JP6811952B2 (ja) * | 2016-06-06 | 2021-01-13 | 富士電機株式会社 | Ｘ線検査システム |
| JP6206541B1 (ja) * | 2016-06-13 | 2017-10-04 | 株式会社明電舎 | 電界放射装置および改質処理方法 |
| JP6206546B1 (ja) * | 2016-06-23 | 2017-10-04 | 株式会社明電舎 | 電界放射装置および改質処理方法 |
| JP6226033B1 (ja) | 2016-06-24 | 2017-11-08 | 株式会社明電舎 | 電界放射装置および電界放射方法 |
| WO2020085291A1 (ja) | 2018-10-26 | 2020-04-30 | 学校法人早稲田大学 | 炭素－金属構造体および炭素－金属構造体の製造方法 |
| JP6973592B1 (ja) * | 2020-09-24 | 2021-12-01 | 株式会社明電舎 | ガード電極および電界放射装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2634369B2 (ja) * | 1993-07-15 | 1997-07-23 | 浜松ホトニクス株式会社 | Ｘ線装置 |
| JP4026976B2 (ja) * | 1999-03-02 | 2007-12-26 | 浜松ホトニクス株式会社 | Ｘ線発生装置、ｘ線撮像装置及びｘ線検査システム |
| JP4347456B2 (ja) * | 1999-06-30 | 2009-10-21 | 浜松ホトニクス株式会社 | Ｘ線発生装置 |
| JP4261691B2 (ja) * | 1999-07-13 | 2009-04-30 | 浜松ホトニクス株式会社 | Ｘ線管 |
| EP1833075B1 (en) * | 2004-12-27 | 2011-02-16 | Hamamatsu Photonics K.K. | X-ray tube and x-ray source |
-
2009
- 2009-12-02 JP JP2009274147A patent/JP5021716B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011119084A (ja) | 2011-06-16 |
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