JP5016958B2 - 光学素子の製造方法 - Google Patents

光学素子の製造方法 Download PDF

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Publication number
JP5016958B2
JP5016958B2 JP2007072429A JP2007072429A JP5016958B2 JP 5016958 B2 JP5016958 B2 JP 5016958B2 JP 2007072429 A JP2007072429 A JP 2007072429A JP 2007072429 A JP2007072429 A JP 2007072429A JP 5016958 B2 JP5016958 B2 JP 5016958B2
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optical element
substrate
manufacturing
metal
plasmon resonance
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JP2007072429A
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Japanese (ja)
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JP2008232806A5 (enrdf_load_stackoverflow
JP2008232806A (ja
Inventor
亮 黒田
聡 西馬
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Canon Inc
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Canon Inc
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • G01N21/553Attenuated total reflection and using surface plasmons
    • G01N21/554Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance

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  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2007072429A 2007-03-20 2007-03-20 光学素子の製造方法 Expired - Fee Related JP5016958B2 (ja)

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JP2007072429A JP5016958B2 (ja) 2007-03-20 2007-03-20 光学素子の製造方法

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Application Number Priority Date Filing Date Title
JP2007072429A JP5016958B2 (ja) 2007-03-20 2007-03-20 光学素子の製造方法

Publications (3)

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JP2008232806A JP2008232806A (ja) 2008-10-02
JP2008232806A5 JP2008232806A5 (enrdf_load_stackoverflow) 2010-05-27
JP5016958B2 true JP5016958B2 (ja) 2012-09-05

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JP2007072429A Expired - Fee Related JP5016958B2 (ja) 2007-03-20 2007-03-20 光学素子の製造方法

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6067290B2 (ja) * 2011-09-13 2017-01-25 旭化成株式会社 メタマテリアル転写用積層体及びメタマテリアル被転写基材の製造方法
JP5957877B2 (ja) * 2011-12-26 2016-07-27 旭硝子株式会社 メタマテリアルの製造方法およびメタマテリアル
JP2014190834A (ja) 2013-03-27 2014-10-06 Fujifilm Corp 光電場増強デバイスおよびその製造方法
JP6790498B2 (ja) * 2016-06-24 2020-11-25 凸版印刷株式会社 表示体
US11220735B2 (en) * 2018-02-08 2022-01-11 Medtronic Minimed, Inc. Methods for controlling physical vapor deposition metal film adhesion to substrates and surfaces

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060130543A (ko) * 2003-08-06 2006-12-19 유니버시티 오브 피츠버그 오브 더 커먼웰쓰 시스템 오브 하이어 에듀케이션 표면 플라즈몬-강화 나노-광 소자 및 그의 제조 방법

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