JP5003909B2 - Reflector and lighting device - Google Patents

Description

  The present invention relates to a reflector in which fine irregularities are formed on a surface by mixing particles in an underlayer and an illumination device including the reflector.

  A reflector in which fine irregularities are formed on the surface by mixing particles in an underlayer is known. As this type of reflector, a diffusion functional material comprising an organic resin 2 and at least two types of microspheres 3 on a substrate 1 has a resin film thickness (d) and microsphere radius (r) of d = r (1 + cos θ ) <2r, and a diffuse reflection surface in which a metal thin film to be the reflection surface 4 is laminated (see Patent Document 1). This reflector describes that the diffusion state can be controlled by controlling θ in the above formula. However, the relationship between the resin film thickness (d) and the microsphere radius (r) is defined as described above, but it is unclear what kind of configuration the two or more types of microspheres are and how they work. is there.

  In addition, as another configuration, when a particle is contained, a base layer having irregularities is formed on the surface of the substrate by a film, and the surface distribution, the formation area, the formation region, etc. of the base layer are changed, thereby distributing the light on the reflecting mirror surface. Some change the characteristics (see Patent Document 2). In this reflector, by adjusting the particle size distribution of the particles, the unevenness formed on the surface of the underlayer can be changed to adjust the light distribution characteristics, but the specific configuration is unknown.

JP 2002-006119 A JP 2002-107516 A

  In the case of a reflecting mirror having a three-dimensional shape such as a base material having a rotating quadratic curved surface, for example, the layer thickness tends to vary depending on the part when the base layer is coated on the base material. If the layer thickness is within the range of the design value, a desired diffuse reflection surface can be obtained. However, in a region where the layer thickness is larger than the design value, particles are buried in the coating film and the desired diffuse reflection surface cannot be obtained. I understood that. As a result, there exists a problem that the light distribution characteristic of a lighting fixture will deteriorate.

  An object of this invention is to provide the reflector which can obtain a diffuse reflection surface, and an illuminating device using the same even if the layer thickness of the base layer formed in the base material has dispersion | variation.

  The reflector of the present invention includes a base material; a film-forming body and at least two kinds of particles having an average particle size, and is formed on the surface of the base material. Particles protrude from the surface of the film forming body, and in the region where the film forming body has a large film thickness, the particles having the largest average particle diameter protrude from the surface of the film forming body and the particles having the smallest average particle diameter enter the film forming body. A buried underlayer; and a reflective film formed on the underlayer.

  The present invention allows the following aspects.

  In general, the base material is often a member giving the shape of a reflector, but this is not an essential requirement in the present invention, and the constituent material is not particularly limited. For example, a material such as metal, glass, plastics, concrete, stone, wood and paper is allowed. Further, the shape of the substrate can be arbitrarily selected according to the application.

  The underlayer includes a film forming body and at least two kinds of particles having an average particle diameter, and is interposed between the base material and the reflective film to form an uneven surface on the surface. For this reason, when a reflection film described later is formed on the upper surface of the underlayer, a diffuse reflection surface having an uneven surface following the uneven surface of the underlayer can be obtained. Therefore, the film forming body carries the particles such that a part of the particles protrudes from the surface of the film forming body. In addition, it is permitted to form the diffuse reflection surface by forming the base layer according to the present invention only on the whole or part of the planned reflection surface area of the substrate.

  In the present invention, a good diffuse reflection surface can be formed. In addition, the film thickness of a film formation body means the film thickness in the site | part in which particle | grains do not protrude. In order to realize the above configuration, in the region where the film forming body has a small film thickness, almost all the particles having all average particle diameters protrude from the surface of the film forming body to the outside. Therefore, in the region where the film forming body has a small thickness, all the particles having an average particle diameter contribute to the formation of irregularities on the surface of the underlayer. However, since the density of the particles tends to be small in the region where the thickness of the film forming body is small, by optimizing the coating liquid and the coating method of the film forming body, the dispersion density of the unevenness can be reduced. Can be accommodated to an appropriate degree.

  On the contrary, in the region where the film forming body has a large film thickness, only the particles having the largest average particle diameter protrude from the surface of the film forming body to the outside, and almost all the particles having the smallest average particle diameter are coated film forming body. Buried inside. Accordingly, the particles having the smallest average particle diameter do not substantially contribute to forming irregularities on the surface of the underlayer. However, since the dispersion density of the particles tends to increase in a region where the film forming body has a large film thickness, optimization is performed in the same manner as described above, and the density of irregularities due to particles having a large average particle diameter is suitable as a diffuse reflection film. Can fit in.

  As described above, the reason why the dispersion density of the formed unevenness can be accommodated to an appropriate level as a diffuse reflection film even when the film forming body has a large or small region has been explained. The same holds true even when three or more kinds of particles are used. That is, for example, when three kinds of particles are mixed, in the region of the intermediate film thickness of the film forming body, the medium average particle diameter and the largest particle protrude from the surface of the film forming body, and the smallest average particle diameter Particles are buried inside the film forming body. In the region where the thickness of the film forming body is large, only the particles having the largest average particle diameter protrude from the surface of the film forming body, and almost all of the middle and smallest particles of the average particle diameter are buried inside the film forming body. In the region where the film forming body has a small thickness, all particles having an average particle diameter protrude from the surface of the film forming body.

  The film-forming body is set to a value that allows the film thickness of the region having a small film thickness to be smaller than the diameter of the particles having the smallest average particle diameter and to carry particles having all average particle diameters. Further, the material of the film forming body may be either organic or inorganic. For example, plastics can be used as the organic substance. For example, it is preferable that the liquefied plastics material is applied by using a coating liquid obtained by diluting with an organic or water solvent and cured. As the inorganic material, for example, low-melting glass, gypsum and plaster can be used.

  The constituent material of the particles is selected based on the correlation with the constituent material of the film forming body, but may basically be either organic or inorganic. In the case of organic particles, it is preferably made of plastics. Since the particles made of plastics have a relatively small specific gravity, the dispersibility is good when a plastics coating material is used. In the case of inorganic particles, for example, the particles can be formed of glass, metal oxide, ceramics, or the like.

  Further, the particles can be made uniform in particle size with relatively high accuracy, and can therefore be controlled so that the particle size distribution becomes narrow. For this reason, even if particles having a plurality of types of average particle diameters are included, the peak of their particle size distribution appears clearly by observing the reflective surface with a microscope, so the number of types of average particle diameters of the particles is determined. be able to.

  Further, the size of the average particle diameter of the particles is not particularly limited, but may be set to a particle diameter capable of forming a rough surface preferable for obtaining a diffusing surface of the reflector. Generally, two or more kinds of suitable particle sizes can be selected from the range of about 5 to 50 μm. When the average particle size is less than 5 μm, the unevenness becomes so fine that it becomes difficult to form a diffuse reflection surface exhibiting a good diffusing action on the underlayer. On the other hand, if the average particle size exceeds 50 μm, the unevenness becomes too rough and the diffuse reflection becomes too rough, making it difficult to form a good diffuse reflection surface. The range is preferably about 10 to 40 μm. In this case, the practical and preferable range of the number of types of the average particle diameter is 2 or 3.

  The particle diameter of the particles having a small average particle diameter is set so as to be larger than the film thickness in the region where the film forming body has a small film thickness and smaller than the film thickness in the region where the film thickness is large. This relationship can be applied to the region where the film forming body has the smallest film thickness and the smallest average particle size. Further, the present invention can also be applied to a region where the film forming body has an intermediately small film thickness and an intermediately small particle.

  On the other hand, the particle diameter of the particles having a large average particle diameter is preferably larger than the film thickness in the region where the film forming body has a large film thickness and not more than twice that. This relationship can be applied to the region where the film forming body has the largest film thickness and the largest average particle diameter.

  Thus, with the above configuration, all the average particle diameter particles protrude from the surface of the film forming body in the region where the film forming body has a small film thickness, and the average particle diameter in the region where the film forming body has a large film thickness. Only large particles can be reliably projected from the surface of the film-forming body and can be supported well, so that a good diffuse reflection surface can be formed in any region even if the thickness of the underlayer changes due to variations, etc. it can.

  It is preferable that at least two kinds of particles having an average particle diameter have a reciprocal relationship between the size of each average particle diameter and the number of particles having each average particle diameter. For example, when three types of particles d1, d2, and d3 having an average particle diameter are used and the relationship between the average particle diameters of the respective particles is d1 <d2 <d3, When the number of particles is P1, P2, and P3, it is preferable to set so that the relationship of P1> P2> P3 is established.

  And if it is the said structure, the diffuse reflection surface in the area | region where the film thickness of a film formation body is small and a large area | region will come to exhibit diffuse reflection with comparatively high approximation.

  When a base layer is formed by applying a coating solution prepared by mixing particles to a substrate, various known coating methods can be appropriately selected and employed. For example, methods such as spraying, pouring and dipping can be employed. According to the present invention, when the coating liquid is applied to the substrate surface by these methods and dried or cured to form the underlayer, according to the present invention, the film thickness of the formed film forming body varies depending on the part of the substrate. Even if it changes depending on the above, almost the same diffuse reflection surface can be obtained for the above-mentioned reason.

  The reflective film is a specular reflective coating, and is formed on the underlayer following the surface shape. The material is not particularly limited. For example, an aluminum film is generally formed by a known film formation method, for example, vapor deposition.

  In the present invention, although it is not an essential component, a protective film can be formed on the upper surface of the reflective film if desired. As the protective film, for example, a transparent plastic film or a low-melting glass film can be used.

  An illuminating device according to the present invention comprises: an illuminating device main body; a reflector according to any one of claims 1 to 3 disposed in the illuminating device main body; a light source disposed in a light incident relationship with respect to the reflector; It is characterized by having;

  In the present invention, the illuminating device is a concept that includes all devices including a lighting fixture and a light source, and its application is not limited to illumination. The lighting device main body refers to the remaining part of the lighting device excluding the reflector and the light source. The light source is allowed to be various light emitters such as an incandescent bulb, a discharge lamp, and a light emitting diode.

  According to the present invention, the undercoat layer is formed on the surface of the base material including the film forming body and at least two kinds of particles having an average particle diameter. Particles protrude from the surface of the film former, and in the region where the film former has a large film thickness, the particles having the largest average particle diameter project from the surface of the film former and the smallest particle diameter is buried in the film former. By doing so, it is possible to provide a reflector capable of obtaining a required diffuse reflection surface even when there is a change due to variations in the layer thickness of the base layer formed on the substrate, and an illumination device using the reflector.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.

  1 to 3 show a reflector of a lighting fixture as an embodiment for implementing the reflector of the present invention, FIG. 1 is a schematic sectional view of the reflector, and FIG. 2 is a region where the film forming body has a small film thickness. FIG. 3 is a schematic enlarged cross-sectional view of the main part in a region where the film forming body has a large film thickness.

  As for the reflecting plate 1, the base material 2 has made the rotation secondary curved surface shape, and the reflective surface 3 is formed in the inner surface. As shown in FIGS. 2 and 3, the reflective surface 3 includes a base layer 4 and a reflective film 5 that are sequentially formed on the surface of the substrate 2.

  The base material 2 is formed by, for example, drawing an aluminum plate with a spatula or pressing. Further, the rotational quadratic curved surface preferably has a shape approximating a paraboloid of revolution, and at least the inner surface is smooth.

  The underlayer 4 includes a film forming body 4a and two types of particles having different average particle diameters, that is, particles 4b1 having a large average particle diameter and particles 4b2 having a small average particle diameter. The film forming body 4a is formed on a predetermined portion of the diffuse reflection surface on the surface of the substrate 2 by applying a plastics paint and curing. In this embodiment, the upper region of the reflecting surface 3 in FIG. 1 is a region 4a1 where the film forming body 4a has a small film thickness, and the lower region near the top of the paraboloid is a region where the film forming body 4a has a large film thickness. 4a2.

  The particles 4b1 and 4b2 having two kinds of average particle diameters are made of, for example, plastics and are supported on the film forming body 4a. The particles 4b2 having a small average particle diameter are mixed in a larger quantity than the particles 4b1 having a large average particle diameter.

  In the region 4a1 where the thickness of the film forming body 4a shown in FIG. 2 is small, the particles 4b1 and 4b2 having two kinds of average particle diameters both protrude from the surface of the film forming body 4a to form irregularities on the surface of the underlayer 4 is doing. However, the dispersion density of the two types of particles 4b1 and 4b2 is relatively small.

  On the other hand, in the region 4a2 where the thickness of the film forming body 4a shown in FIG. 3 is large, only the particles 4b1 having a large average particle diameter protrude from the surface of the film forming body 4a to form irregularities on the surface of the base layer 4. . On the other hand, the particles 4b2 having a small average particle diameter are buried in the film forming body 4a and do not contribute to the formation of irregularities. Further, the dispersion density of the particles 4b1 and 4b2 having two kinds of average particle diameters is relatively large. Therefore, the unevenness formed by the particles 4b1 having a large average particle diameter protruding from the surface of the film forming body 4a forms a diffuse reflection surface that is substantially the same as the unevenness in the region 4a1 where the film forming body 4a has a small film thickness. Can do.

  In this embodiment, a thin film of a film-forming substance is formed on the surfaces of the particles 4b1 and 4b2 having two kinds of average particle diameters protruding from the surface of the film-forming body 4a shown in FIGS. It may not be formed.

  The reflection film 5 is made of an aluminum vapor deposition film, and is formed on the surface of the film forming body 4 a at a predetermined portion of the diffuse reflection surface on the surface of the substrate 2.

  Next, examples of the present invention will be described.

  In Example 1, the underlayer 4 was formed using three types of particles having an average particle size of 14 μm, 30 μm, and 40 μm. In the present embodiment, if the film forming body 4a has a film thickness of 10 μm or less, all particles having an average particle diameter protrude from the surface of the film forming body 4a and contribute to the formation of irregularities. If the film forming body 4a has a film thickness of 20 μm or less, two types of particles having an average particle diameter of 30 μm and 40 μm protrude from the surface of the film forming body 4a and contribute to the formation of irregularities. Further, when the film forming body 4a has a film thickness of 30 μm or less, only particles having an average particle diameter of 40 μm protrude from the surface of the film forming body 4a and contribute to the formation of irregularities. Then, the dispersion density of the particles protruding from the surface of the film forming body 4a can be made almost uniform so as to form a similar diffuse reflection surface.

  The relationship between the optimum number of particles having average particle diameters in Example 1 will be described. When the film thickness is 10 μm or less, the uneven area formed by the particles protruding from the surface of the film forming body 4a is S1, when the film thickness is 20 μm or less, the uneven area is S2, and when the film thickness is 30 μm or less. Similarly, the uneven surface area is S3, the average particle diameters of three kinds of particles having an average particle diameter of 14 μm, 30 μm, and 40 μm are d1, d2, and d3, and the quantities per unit area are P1, P2, and P3, and the mixing ratio of the quantities Are l, m, and n, the areas S1, S2, and S3 of the concavo-convex surface in each film thickness of the film forming body 4a are as follows. In the equation, k is a constant and t is the film thickness of the film forming body 4a.

S1 = (d1 / 2) ² π · P1 · k · t + (d2 / 2) ² π · P2 · k · t + (d3 / 2) ² π · P3 · k · t
^{S2 = (d2 / 2) 2} π · P2 · k · t + (d3 / 2) 2 π · P3 · k · t
^{S3 = (d3 / 2) 2} π · P3 · k · t
Here, assuming that l + m + n = 1 and P1: P2: P3 = 1: m: n, the mixing ratios l, m and n of the quantities are as shown in the following equation.

m = 2 (d1 ² + d3 ² ) ・ d2 ² / (2 ・ d1 ²・ d2 ² + d3 ²・ d1 ² + 7 ・ d3 ²・ d1 ² + d3 ⁴ )
l = d3 ² / (d1 ² + d2 ² ) ・ (5/2) m
^{n = (d3 2/2 ·} d2 2) m
Therefore, when 14 μm is substituted for d1, 30 μm is substituted for d2, and 40 μm is substituted for d3, the mixture ratios l, m, and n of the quantities are as follows.

l = 0.54, m = 0.24, n = 0.22
Furthermore, when converted to a weight mixing ratio, the mixing ratios l ′, m ′, and n ′ are as follows.

l ′ = 7%, m ′ = 30%, n ′ = 63%
The above is summarized as follows. That is, if the base layer 4 is formed by mixing three types of particles having an average particle size of 14 μm, 30 μm, and 40 μm in a weight ratio of 7:30:63 to the film forming body 4a, the film thickness of the film forming body 4a. Is approximately 30 μm or less, a substantially equivalent diffusive reflecting surface can be formed.

  In the same manner as in Example 1, two types of particles having an average particle diameter of 14 μm and 40 μm were used. When the film forming body 4a has a film thickness of 10 μm or less and 20 μm or less, the number of mixing ratios n and l and the weight mixing ratios n ′ and l ′ for forming a substantially equivalent diffusive reflecting surface are as follows. is there.

That is, the mixing ratio n of the quantities is the following value because the formula n = d1 ² / (d3 ² + d1 ² ) and l = 1−n.

l = 89%, n = 11%
l ′ = 26%, n ′ = 74%

  As in Example 1, two types of particles having an average particle diameter of 30 μm and 40 μm were used. The mixing ratios n and l and the mixing ratios n ′ and l ′ of the weights for forming a substantially equivalent diffusive reflecting surface when the film forming body 4a is 20 μm or less and 30 μm or less are as follows. .

l = 47%, n = 53%
l ′ = 27%, n ′ = 73%
FIG. 4 is a graph showing the relationship between the film thickness and the specularity of the film forming body on the reflecting surface in the present invention and comparative examples. In the figure, the horizontal axis represents the film thickness (μm) of the film-forming body, and the vertical axis represents the specularity having a reverse relationship to the diffusivity. In the figure, curve A is the present invention, curve B is Comparative Example 1, and curve C is Comparative Example 2.

  The present invention (curve A) is data when the film thickness of the film-forming body is changed in Example 1.

  In Comparative Example 1 (curve B), an underlayer is formed using only particles having an average particle diameter of 20 μm, and the film thickness of the film forming body is changed.

  In Comparative Example 2 (curve C), an underlayer is formed using only particles having an average particle diameter of 30 μm, and the film thickness of the film-forming body is changed.

  As can be understood from FIG. 4, according to the present invention, a reflective surface having a generally uniform low specularity, in other words, good diffusibility, can be obtained at a film forming body thickness of 10 to 25 μm. On the other hand, in both Comparative Examples 1 and 2, the degree of specularity with respect to the change in film thickness of the film-forming body, in other words, the change in diffusibility is large.

Schematic cross-sectional view of a reflector in a lighting fixture as an embodiment for implementing the reflector of the invention Similarly, a schematic enlarged cross-sectional view of a main part in a region where the film forming body has a small thickness. Similarly, a schematic enlarged cross-sectional view of the main part in a region where the film forming body has a large thickness. The graph which shows the relationship between the film thickness of the film formation body of a reflective surface in this invention and a comparative example, and specularity

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Reflecting plate, 2 ... Base material, 3 ... Reflecting surface, 4 ... Base layer, 4a ... Film formation body, 4a1 ... Area | region with small film thickness, 4a2 ... Area | region with large film thickness, 4b1 ... Particle with large average particle diameter 4b2 ... Particles with a small average particle size, 5 ... Reflective film

Claims (4)

A substrate;
The film forming body and at least two kinds of particles having an average particle diameter are formed on the surface of the substrate, and in the region where the film forming body has a small film thickness, all particles having an average particle diameter protrude from the surface of the film forming body, In the region where the film forming body has a large film thickness, the underlayer in which the particles having the largest average particle diameter protrude from the surface of the film forming body and the particles having the smallest average particle diameter are buried in the film forming body;
A reflective film formed on the underlayer;
The reflector characterized by comprising.   The particle diameter of the smallest average particle diameter is larger than the film thickness of the area where the film forming body is small and smaller than the film forming area of the area where the film thickness is the largest, and the average particle diameter is large. 2. The reflector according to claim 1, wherein the particle diameter of the particle is larger than a film thickness of a region where the film forming body has a large film thickness, but not more than twice that.   3. The reflector according to claim 1, wherein at least two kinds of particles having an average particle diameter have a reciprocal relationship between the size of each average particle diameter and the number of particles having each average particle diameter. A lighting device body;
A reflector according to any one of claims 1 to 3 disposed in a lighting device body;
A light source arranged in a light incident relationship with respect to the reflector;
An illumination device comprising:

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