JP4985812B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4985812B2
JP4985812B2 JP2010087346A JP2010087346A JP4985812B2 JP 4985812 B2 JP4985812 B2 JP 4985812B2 JP 2010087346 A JP2010087346 A JP 2010087346A JP 2010087346 A JP2010087346 A JP 2010087346A JP 4985812 B2 JP4985812 B2 JP 4985812B2
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optical system
liquid
projection optical
light
substrate
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Expired - Fee Related
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JP2010087346A
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Japanese (ja)
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JP2010153933A5 (enExample
JP2010153933A (ja
Inventor
恒幸 萩原
正弘 中川
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Nikon Corp
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Nikon Corp
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010087346A 2010-04-05 2010-04-05 露光装置及びデバイス製造方法 Expired - Fee Related JP4985812B2 (ja)

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JP2010087346A JP4985812B2 (ja) 2010-04-05 2010-04-05 露光装置及びデバイス製造方法

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JP2010087346A JP4985812B2 (ja) 2010-04-05 2010-04-05 露光装置及びデバイス製造方法

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JP2003344940A Division JP4513299B2 (ja) 2003-10-02 2003-10-02 露光装置、露光方法、及びデバイス製造方法

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JP2010153933A JP2010153933A (ja) 2010-07-08
JP2010153933A5 JP2010153933A5 (enExample) 2011-08-04
JP4985812B2 true JP4985812B2 (ja) 2012-07-25

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020162337A (ja) * 2019-03-27 2020-10-01 株式会社カネカ 検査装置および検査方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (ja) * 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP3747566B2 (ja) * 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JPH11176727A (ja) * 1997-12-11 1999-07-02 Nikon Corp 投影露光装置

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JP2010153933A (ja) 2010-07-08

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