JP4981190B1 - Manufacturing method of bonding device - Google Patents

Manufacturing method of bonding device Download PDF

Info

Publication number
JP4981190B1
JP4981190B1 JP2011269229A JP2011269229A JP4981190B1 JP 4981190 B1 JP4981190 B1 JP 4981190B1 JP 2011269229 A JP2011269229 A JP 2011269229A JP 2011269229 A JP2011269229 A JP 2011269229A JP 4981190 B1 JP4981190 B1 JP 4981190B1
Authority
JP
Japan
Prior art keywords
substrate
adhesive
curing
bonding
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011269229A
Other languages
Japanese (ja)
Other versions
JP2013120352A (en
Inventor
道也 横田
涼 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Engineering Co Ltd
Shinko Engineering Co Ltd
Original Assignee
Shin Etsu Engineering Co Ltd
Shinko Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Engineering Co Ltd, Shinko Engineering Co Ltd filed Critical Shin Etsu Engineering Co Ltd
Priority to JP2011269229A priority Critical patent/JP4981190B1/en
Application granted granted Critical
Publication of JP4981190B1 publication Critical patent/JP4981190B1/en
Priority to TW101145326A priority patent/TWI541562B/en
Priority to KR1020120141049A priority patent/KR101969597B1/en
Priority to CN201210524707.3A priority patent/CN103160214B/en
Publication of JP2013120352A publication Critical patent/JP2013120352A/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • C09J5/02Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving pretreatment of the surfaces to be joined
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/28Adhesive materials or arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)

Abstract

【課題】接着剤の外形を硬化時の形状に保持しながら基板同士を合着する。
【解決手段】第一基板1又は第二基板2のいずれか一方の内面に接着剤3を硬化時と同形状に塗布した後に、接着剤3の周縁部3aのみをその粘度が接着性を保持したまま他の部位の粘度よりも高くなるように部分的に半硬化させ、その後、周縁部3aを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させることにより、接着剤3の周縁部3aで囲まれた中心部3bが未硬化状態であったとしても、半硬化した周縁部3aで堰き止められて外へ伸展しない。
【選択図】図1
Substrates are bonded together while maintaining the outer shape of an adhesive in a cured shape.
An adhesive 3 is applied to the inner surface of either a first substrate 1 or a second substrate 2 in the same shape as when cured, and the viscosity of only the peripheral portion 3a of the adhesive 3 is kept adhesive. The first substrate 1 and the second substrate 2 are bonded so that the adhesive 3 including the peripheral edge portion 3a is sandwiched between the first substrate 1 and the second substrate 2 so as to be partially semi-cured so as to be higher than the viscosity of other portions. Thus, even if the central portion 3b surrounded by the peripheral edge portion 3a of the adhesive 3 is in an uncured state, it is blocked by the semi-cured peripheral edge portion 3a and does not extend outward.
[Selection] Figure 1

Description

本発明は、例えば液晶ディスプレイ(LCD)、有機ELディスプレイ(OLED)、プラズマディスプレイ(PDP)、フレキシブルディスプレイなどのフラットパネルディスプレイ(FPD)や、例えばタッチパネルや3D(3次元)ディスプレイや電子書籍などのようなFPDなどの基板に対して、カバーガラスやFPDなどのもう一枚の基板を合着する貼合デバイスの製造方法に関する。
詳しくは、対向する第一基板と第二基板を、その間に塗布された接着剤が挟み込まれるように合着する貼合デバイスの製造方法に関する。
The present invention includes, for example, a liquid crystal display (LCD), an organic EL display (OLED), a plasma display (PDP), a flat panel display (FPD) such as a flexible display, a touch panel, a 3D (three-dimensional) display, an electronic book, etc. It is related with the manufacturing method of the bonding device which adhere | attaches another board | substrates, such as a cover glass and FPD, with respect to such board | substrates, such as FPD.
In detail, it is related with the manufacturing method of the bonding device which bonds the 1st board | substrate and 2nd board | substrate which oppose so that the adhesive agent apply | coated between them may be pinched | interposed.

従来、基板に対する貼合デバイスの製造方法として、液晶パネル上に防塵ガラスを接着する際、先ず、液晶パネルの接着側に配置される基板の表面においてその中心付近のみに接着剤が部分的に供給され、その次に、吸着加圧部材で吸着した防塵ガラスを移動させ、既に接着剤が供給されている前記基板に載置し、そのまま加圧して接着剤を防塵ガラスと基板の界面に沿って前記基板の外縁に向け均一に押し広げ、その後、前記接着剤を硬化させることにより固着させている(例えば、特許文献1参照)。
また、2枚の基板の一方あるいは両方の接着面となる面の周辺部に、前記基板からはみ出した接着性樹脂を溜めるための溝を設け、先ず、2枚の前記基板の接着面となる少なくとも一方の面においてその中心付近のみに前記接着性樹脂を滴下し、その次に、前記2枚の基板を前記接着性樹脂が挟まれるように接合し、加圧手段により前記接着性樹脂を均一に展開させ、余分な前記接着性樹脂が前記樹脂溜まり溝に流入した後、紫外線の照射や加熱装置による加熱処理で前記接着性樹脂を硬化させる方法もある(例えば、特許文献2参照)。
Conventionally, as a method of manufacturing a bonding device for a substrate, when adhering dust-proof glass on a liquid crystal panel, first, the adhesive is partially supplied only near the center on the surface of the substrate arranged on the bonding side of the liquid crystal panel. Next, the dust-proof glass adsorbed by the suction pressure member is moved, placed on the substrate to which the adhesive has already been supplied, and pressurized as it is along the interface between the dust-proof glass and the substrate. It is uniformly spread toward the outer edge of the substrate, and then fixed by curing the adhesive (for example, see Patent Document 1).
In addition, a groove for storing the adhesive resin protruding from the substrate is provided in the peripheral portion of the surface to be the bonding surface of one or both of the two substrates, and first, at least the bonding surface of the two substrates The adhesive resin is dropped only near the center on one surface, and then the two substrates are joined so that the adhesive resin is sandwiched between them, and the adhesive resin is uniformly distributed by a pressing means. There is also a method in which the adhesive resin is cured by ultraviolet irradiation or heat treatment by a heating device after unfolding and the excess adhesive resin flows into the resin reservoir groove (see, for example, Patent Document 2).

特開2007−240914号公報JP 2007-240914 A 特開平8−36151号公報JP-A-8-36151

しかし乍ら、このような従来の貼合デバイスの製造方法では、基板の中心付近のみに接着剤を塗布した後に押圧して伸展させるため、接着剤が基板の周縁から部分的にはみ出したり、接着剤が基板の周縁まで部分的に届かず不足したりするなど、接着剤を基板の外形状に合わせて整形するのが困難であるという問題があった。伸展した接着剤の大きさは、基板同士の押圧具合に応じて微妙に変化するため、精度に劣るとともに、製造環境の温度や湿度などの変化に応じて基板同士の押圧具合を微調整する必要もあるから生産性に劣るという問題もあった。
さらに、貼合デバイスの種類によっては、接着剤の膜厚(厚さ寸法)を約0.1〜0.5mmする要望がある。このサイズは一般的なLCDにおける接着剤の膜厚(約1〜10μm程度)に比べて数十倍にもなるため、接着剤の流動性が大きくて、接着剤を押圧伸展させる方法では、基板の周縁から接着剤が流れ出てしまうなど、対応が難しいという問題があった。
また、接着剤を伸展させる過程において気泡が発生するおそれがあり、特に接着剤の中に発ガス性を有する硬化制御材が含まれている場合には、真空雰囲気で硬化制御材がガス化して気泡となるため、基板同士を完全な無気泡で合着できないという問題もあった。
However, in such a conventional method of manufacturing a bonding device, since the adhesive is applied only to the vicinity of the center of the substrate and then pressed and extended, the adhesive partially protrudes from the peripheral edge of the substrate or adheres. There is a problem that it is difficult to shape the adhesive in accordance with the outer shape of the substrate, for example, the agent does not reach the peripheral edge of the substrate and is insufficient. Since the size of the extended adhesive changes slightly depending on the pressure between the substrates, it is inferior in accuracy, and it is necessary to finely adjust the pressure between the substrates according to changes in the temperature and humidity of the manufacturing environment. There was also a problem that productivity was inferior.
Furthermore, depending on the kind of the bonding device, there is a demand for the film thickness (thickness dimension) of the adhesive to be about 0.1 to 0.5 mm. Since this size is several tens of times larger than the film thickness (about 1 to 10 μm) of an adhesive in a general LCD, the fluidity of the adhesive is large, and the method of pressing and extending the adhesive requires a substrate. There was a problem that it was difficult to deal with, such as the adhesive flowing out from the periphery of.
In addition, there is a possibility that bubbles may be generated in the process of extending the adhesive, and in particular, when the adhesive includes a curing control material having gas generating properties, the curing control material is gasified in a vacuum atmosphere. Due to the bubbles, there was a problem that the substrates could not be bonded together completely without bubbles.

本発明は、このような問題に対処することを課題とするものであり、接着剤の外形を硬化時の形状に保持しながら基板同士を合着すること、などを目的とするものである。   An object of the present invention is to cope with such a problem, and it is an object of the present invention to bond substrates together while maintaining the outer shape of an adhesive in a cured shape.

このような目的を達成するために本発明は、対向する第一基板と第二基板を、その間に塗布された液状の接着剤が挟み込まれるように合着する貼合デバイスの製造方法であって、前記第一基板又は前記第二基板のいずれか一方の内面に前記接着剤を当初から硬化時の外形状と同形状に塗布する工程と、前記接着剤の周縁部をその粘度が接着性を保持したまま他の部位の粘度よりも高くなるように部分的に半硬化させる工程と、前記周縁部を含む前記接着剤の全体が挟まれるように前記第一基板と前記第二基板を合着させる工程とを含むことを特徴とする。   In order to achieve such an object, the present invention is a method for manufacturing a bonding device in which a first substrate and a second substrate facing each other are bonded so that a liquid adhesive applied therebetween is sandwiched therebetween. The step of applying the adhesive to the inner surface of either the first substrate or the second substrate from the beginning in the same shape as the outer shape at the time of curing, and the viscosity of the peripheral portion of the adhesive is adhesive The first substrate and the second substrate are bonded together so that the entire adhesive including the peripheral portion is sandwiched between the step of partially curing so as to be higher than the viscosity of other parts while being held. And a step of causing the step to occur.

前述した特徴を有する本発明は、第一基板又は第二基板のいずれか一方の内面に接着剤を硬化時と同形状に塗布した後に、接着剤の周縁部のみをその粘度が接着性を保持したまま他の部位の粘度よりも高くなるように部分的に半硬化させ、その後、周縁部を含む接着剤の全体が挟まれるように第一基板と第二基板を合着させることにより、接着剤の周縁部で囲まれた中心部が未硬化状態であったとしても、半硬化した周縁部で堰き止められて外へ伸展しないので、接着剤の外形を硬化時の形状に保持しながら基板同士を合着することができる。
その結果、基板の中心付近のみに接着剤を塗布して押圧伸展させる従来の方法に比べ、接着剤の流動性による基板の周縁からのはみ出しや、接着剤が基板の周縁まで届かない不足などを防止できて接着剤の整形性に優れる。
さらに、基板同士の合着に伴って接着剤が押圧されても、接着剤の大きさが変化しないため、精度に優れるとともに、接着剤は塗布時から硬化時と同形状に塗布されたまま、製造環境の温度や湿度などの変化に応じて基板同士の押圧具合を微調整する必要がないため、生産性に優れる。
さらに、接着剤の膜厚(厚さ寸法)が一般的なLCDにおける接着剤の膜厚よりも遥かに厚い貼合デバイスを製造する場合には、基板の周縁から接着剤が流れ出ることがなく、対応が容易である。
In the present invention having the above-described features, after the adhesive is applied to the inner surface of one of the first substrate and the second substrate in the same shape as when cured, the viscosity of the peripheral edge of the adhesive is kept adhesive. Adhering by bonding the first substrate and the second substrate so that the entire adhesive including the peripheral part is sandwiched between the first substrate and the semi-cured partially so as to be higher than the viscosity of the other part as it is Even if the central part surrounded by the peripheral part of the agent is in an uncured state, it is blocked by the semi-cured peripheral part and does not extend outside, so the substrate is maintained while maintaining the outer shape of the adhesive in the shape at the time of curing. They can be joined together.
As a result, compared to the conventional method in which the adhesive is applied only near the center of the substrate and pressed and stretched, the fluidity of the adhesive protrudes from the periphery of the substrate and the adhesive does not reach the periphery of the substrate. It can be prevented and has excellent adhesive formability.
Furthermore, even if the adhesive is pressed along with the bonding between the substrates, the size of the adhesive does not change, so it is excellent in accuracy, and the adhesive is applied in the same shape as at the time of curing from the application, Since it is not necessary to finely adjust the degree of pressing between the substrates according to changes in the temperature and humidity of the manufacturing environment, the productivity is excellent.
Furthermore, when manufacturing a bonding device in which the film thickness (thickness dimension) of the adhesive is much thicker than the film thickness of the adhesive in a general LCD, the adhesive does not flow out from the peripheral edge of the substrate. Easy to handle.

本発明の実施形態に係る貼合デバイスの製造方法の全体構成を示す説明図であり、(a)が塗布工程の一部切欠縦断正面図、(b)が周縁硬化工程の一部切欠縦断正面図、(c)が中心硬化工程の一部切欠縦断正面図、(d)が合着工程の一部切欠縦断正面図である。It is explanatory drawing which shows the whole structure of the manufacturing method of the bonding device which concerns on embodiment of this invention, (a) is a partially notched longitudinal front view of a coating process, (b) is a partially notched longitudinal front of a periphery hardening process. FIG. 4C is a partially cut longitudinal front view of the center curing process, and FIG. 4D is a partially cut longitudinal front view of the attaching process. (a)が図1(a)に示された塗布工程の縮小平面図、(b)が図1(b)に示された周縁硬化工程の縮小平面図である。(A) is a reduction | restoration top view of the application | coating process shown by Fig.1 (a), (b) is a reduction | restoration top view of the periphery hardening process shown by FIG.1 (b).

以下、本発明の実施形態を図面に基づいて詳細に説明する。
本発明の実施形態に係る貼合デバイスAの製造方法は、図1〜図2に示すように、対向する一対の第一基板1と第二基板2を、その間に塗布された液状の接着剤3が挟み込まれるように合着するために用いる方法である。
貼合デバイスAの製造方法として、第一基板1又は第二基板2のいずれか一方の内面に接着剤3を当初から硬化時における外形状と同形状に塗布する塗布工程と、塗布された接着剤3における周縁部3aをその粘度が接着性を保持したまま他の部位の粘度よりも高くなるように部分的に半硬化させる周縁硬化工程と、半硬化された周縁部3aを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させる合着工程を含んでいる。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
As shown in FIGS. 1-2, the manufacturing method of the bonding device A which concerns on embodiment of this invention is a liquid adhesive apply | coated between the pair of 1st board | substrate 1 and 2nd board | substrate 2 which oppose between them. This is a method used for joining so that 3 is sandwiched.
As the manufacturing method of the bonding device A, the application | coating process which apply | coats the adhesive agent 3 to the inner surface of either one of the 1st board | substrate 1 or the 2nd board | substrate 2 from the beginning in the same shape as the outer shape at the time of hardening, and the apply | coated adhesion | attachment A peripheral curing step in which the peripheral edge 3a of the agent 3 is partially semi-cured so that the viscosity thereof is higher than the viscosity of other parts while maintaining adhesiveness, and the adhesive 3 including the semi-cured peripheral edge 3a A bonding step of bonding the first substrate 1 and the second substrate 2 so as to be sandwiched between them.

第一基板1及び第二基板2としては、例えば液晶ディスプレイ(LCD)、有機ELディスプレイ(OLED)、プラズマディスプレイ(PDP)、フレキシブルディスプレイなどのフラットパネルディスプレイ(FPD)や、例えばタッチパネルや3D(3次元)ディスプレイや電子書籍などに用いられるFPDと、透明なガラス製基板又はPES(Poly-Ether-Sulphone)などの透明なプラスチックフィルムや合成樹脂製基板若しくはカバーガラスやバリアガラスなどが用いられる。
また、第一基板1及び第二基板2は、その製作段階で複数の第一基板1及び第二基板2が並設される分離前の一枚ものを使用することも可能である。
さらに、第一基板1及び第二基板2の外形状は、例えば矩形など、同じ大きさに形成され、合着工程においてそれぞれの外縁同士が重なり合うように合着させることが好ましい。
As the first substrate 1 and the second substrate 2, for example, a liquid crystal display (LCD), an organic EL display (OLED), a plasma display (PDP), a flat panel display (FPD) such as a flexible display, for example, a touch panel or 3D (3 Dimension) FPD used for displays and electronic books, and transparent glass substrates, transparent plastic films such as PES (Poly-Ether-Sulphone), synthetic resin substrates, cover glass, barrier glass, and the like are used.
In addition, the first substrate 1 and the second substrate 2 may be one before separation in which a plurality of the first substrate 1 and the second substrate 2 are juxtaposed in the manufacturing stage.
Furthermore, it is preferable that the outer shapes of the first substrate 1 and the second substrate 2 are formed to have the same size, for example, a rectangle, and are bonded so that the outer edges overlap each other in the bonding step.

接着剤3としては、例えば光エネルギーを吸収して重合が進行することにより硬化して接着性を発現する光硬化性を有する光硬化型接着剤などが用いられる。また光硬化型接着剤に代えて、熱エネルギーの吸収により重合が進行して硬化する熱硬化型接着剤や二液混合硬化型接着剤などを用いることも可能である。
さらに、接着剤3は、第一基板1又は第二基板2のいずれか一方に塗布される時点で、その粘度、詳しくは重合度(硬化度)が低くて流動性を有し、光エネルギーや熱エネルギーなどを吸収することにより、粘度(重合度、硬化度)が高くなるにつれて流動性が低下するものの、変形可能で且つ接着剤3の表面は固まらずに接着性を保持しているゲル状化状態を半硬化状態と呼んでいる。この半硬化状態の接着剤3は、更に光エネルギーや熱エネルギーなどを吸収することにより、変形し難くなって本硬化状態となる。
接着剤3の具体例としては、例えばアクリル系UV硬化型樹脂やシリコン系UV硬化型樹脂などからなる紫外線硬化型接着剤を用い、特に空気中ではその表面が固まらない酸素阻害性を有する硬化制御材が含まれるものを用いることが好ましい。なお、この種の硬化制御材は、真空雰囲気においてガス化する性質を有する場合が多い。
As the adhesive 3, for example, a photo-curing adhesive having a photo-curing property which is cured by absorbing light energy and developing due to the progress of polymerization is used. Further, instead of the photo-curing adhesive, it is also possible to use a thermosetting adhesive or a two-component mixed curing adhesive that is cured by polymerization by absorption of thermal energy.
Furthermore, when the adhesive 3 is applied to either the first substrate 1 or the second substrate 2, the viscosity, specifically, the degree of polymerization (degree of curing) is low and has fluidity, Although the fluidity decreases as the viscosity (degree of polymerization, degree of cure) increases by absorbing heat energy, etc., it is deformable and the surface of the adhesive 3 does not solidify and maintains the adhesive property This is called a semi-cured state. The semi-cured adhesive 3 is further hard to be deformed by absorbing light energy, heat energy, and the like, and is in a fully cured state.
As a specific example of the adhesive 3, for example, an ultraviolet curable adhesive made of, for example, an acrylic UV curable resin or a silicon UV curable resin is used, and the curing control has an oxygen inhibition property that the surface does not harden particularly in the air. It is preferable to use a material containing a material. In many cases, this type of curing control material has the property of being gasified in a vacuum atmosphere.

また、接着剤3は、例えばディスペンサなどからなる定量吐出ノズルなどを用い、第一基板1又は第二基板2のいずれか一方の内面に対して、当初から硬化時における外形状と同じ所望形状に塗布することが好ましい。
なお、接着剤3を塗布する前に、接着剤3の中に混在している気泡は脱気しておき、塗布時においても気泡を巻き込まないように注意が必要である。
Moreover, the adhesive agent 3 is made into the same desired shape as the outer shape at the time of hardening from the beginning with respect to the inner surface of either one of the first substrate 1 or the second substrate 2 using, for example, a quantitative discharge nozzle composed of a dispenser or the like. It is preferable to apply.
In addition, before apply | coating the adhesive agent 3, the bubble mixed in the adhesive agent 3 is deaerated, and care must be taken so that an air bubble may not be involved at the time of application | coating.

図1(a)及び図2(a)に示される塗布工程の具体例では、大気中において、第一基板1の内面1aに対し接着剤3を、第一基板1及び第二基板2の外形状に沿った矩形状に塗布している。
また、その他の例として図示しないが、定量吐出ノズルに代えて印刷などにより接着剤3を塗布したり、第二基板2の内面2aに接着剤3を塗布したり、第一基板1又は第二基板2のいずれか一方の内面に対して接着剤3を矩形以外の形状に塗布することなども可能である。
In the specific example of the coating process shown in FIG. 1A and FIG. 2A, the adhesive 3 is applied to the inner surface 1a of the first substrate 1 in the atmosphere, and the outer surfaces of the first substrate 1 and the second substrate 2 are removed. It is applied in a rectangular shape along the shape.
Although not shown in the drawings as other examples, the adhesive 3 is applied by printing or the like instead of the fixed discharge nozzle, the adhesive 3 is applied to the inner surface 2a of the second substrate 2, or the first substrate 1 or the second substrate 2 is used. It is also possible to apply the adhesive 3 to a shape other than a rectangle on the inner surface of one of the substrates 2.

塗布された接着剤3の周縁部3aを半硬化させる周縁硬化工程の具体例では、接着剤3として光硬化型接着剤を用いるとともに、遮光マスク4を用いる場合を示している。
詳しくは、図1(b)及び図2(b)に示されるように、周縁部3aで囲まれた接着剤3の中心部3bを覆うように平板状の遮光マスク4が配設され、遮光マスク4を挟むように光源(図示しない)から紫外線などの光線Lを照射している。
また、LEDなどの点光源を用いる場合には、周縁部3aに沿って点光源を照射することも可能である。
それにより、接着剤3の周縁部3aのみが額縁状に光エネルギーを吸収してゲル状化し、額縁状の周縁部3aはその表面もゲル状化するが接着性を保持する半硬化状態となる。
特に、接着剤3に酸素阻害性を有する硬化制御材が含まれる場合には、酸素阻害性のため、空気中において周縁部3aの表面層が完全に固まることはなく接着性を残している。
また、その他の例として図示しないが、紫外線などの光線Lに代えて、熱源から熱線などを周縁部3aのみに向けて照射することにより、熱エネルギーなどが吸収されてゲル状化し周縁部3aを半硬化させることも可能である。
In the specific example of the peripheral curing step in which the peripheral edge 3a of the applied adhesive 3 is semi-cured, a case where a light curable adhesive is used as the adhesive 3 and a light shielding mask 4 is used is shown.
Specifically, as shown in FIGS. 1B and 2B, a flat light-shielding mask 4 is disposed so as to cover the central portion 3b of the adhesive 3 surrounded by the peripheral edge portion 3a. Light L such as ultraviolet rays is irradiated from a light source (not shown) so as to sandwich the mask 4.
Moreover, when using point light sources, such as LED, it is also possible to irradiate a point light source along the peripheral part 3a.
As a result, only the peripheral edge 3a of the adhesive 3 absorbs light energy in a frame shape and gels, and the frame-shaped peripheral edge 3a also gels on its surface but is in a semi-cured state that retains adhesion. .
In particular, when the adhesive 3 includes a curing control material having oxygen inhibition properties, the surface layer of the peripheral edge portion 3a is not completely solidified in the air because of the oxygen inhibition properties, and the adhesiveness remains.
Although not shown in the drawings as another example, instead of the light beam L such as ultraviolet rays, the heat source is irradiated toward only the peripheral portion 3a, so that the heat energy is absorbed and gelled to form the peripheral portion 3a. Semi-curing is also possible.

さらに必要に応じて、周縁硬化工程の後は、その状態を所定時間に亘って放置するためのレベリング工程を含むことが好ましい。
このレベリング工程によって、半硬化状態になった接着剤3の周縁部3aと中心部3bにおける表面が自然に平滑化されるとともに、塗布時に巻き込んだ気泡を自然に脱泡させることが可能となる。
Further, if necessary, it is preferable to include a leveling step for leaving the state for a predetermined time after the peripheral edge curing step.
By this leveling step, the surfaces of the peripheral edge portion 3a and the central portion 3b of the adhesive 3 in a semi-cured state are naturally smoothed, and bubbles that are entrained during application can be naturally defoamed.

そして、周縁硬化工程の後には、図1(c)に示されるように、周縁部3aで囲まれた接着剤3の中心部3bをその粘度が高くなるように半硬化させる中心硬化工程と、半硬化された周縁部3a及び中心部3bを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させる合着工程を含むことが好ましい。
図1(c)に示される具体例では、接着剤3の中心部3bを覆う遮光マスク4が除去された後に、前記光源から紫外線などの光線Lを全面、あるいは中心部3bを選択的に照射することにより、中心部3bが光エネルギーを吸収してゲル状化するものの接着性を保持する半硬化状態となる。
特に、接着剤3に酸素阻害性を有する硬化制御材が含まれる場合には、酸素阻害性のため、空気中において中心部3bの表面層が完全に固まることはなく表面層に接着性を残している。
したがって、接着剤3の塗布形成は、合着工程時における両基板の上下関係として、第一基板1又は第二基板2に区別なくどちらに形成しても良い。それ以外には第一基板1及び第二基板2の両方にそれぞれ接着剤3に形成することにより、遥かに厚い接着剤3の厚膜形成が容易になる。
また、その他の例として図示しないが、既に半硬化した周縁部3aの粘度が上がらないように、周縁部3aを覆う額縁状の遮光マスクが配設され、接着剤3の中心部3bのみに光線Lを照射して半硬化させたり、紫外線などの光線Lに代えて熱源から熱線などを中心部3bに向けて照射したり、中心硬化工程を含まず周縁硬化工程の後に、半硬化された周縁部3aと未硬化状態の中心部3bを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させる合着工程を実行することなども可能である。
Then, after the peripheral curing step, as shown in FIG. 1 (c), a central curing step of semi-curing the central portion 3b of the adhesive 3 surrounded by the peripheral portion 3a so as to increase its viscosity, It is preferable to include a bonding step of bonding the first substrate 1 and the second substrate 2 so that the entire adhesive 3 including the semi-cured peripheral edge portion 3a and the center portion 3b is sandwiched.
In the specific example shown in FIG. 1C, after the light shielding mask 4 covering the central portion 3b of the adhesive 3 is removed, the light source L is selectively irradiated on the entire surface or the central portion 3b from the light source. By doing so, the central portion 3b becomes a semi-cured state that retains the adhesiveness although it is gelled by absorbing light energy.
In particular, when the adhesive 3 includes a curing control material having oxygen inhibition properties, the surface layer of the central portion 3b is not completely solidified in the air due to oxygen inhibition properties, and the surface layer remains adhesive. ing.
Therefore, the adhesive 3 may be formed on the first substrate 1 or the second substrate 2 regardless of the vertical relationship between the two substrates during the bonding process. In addition, by forming the adhesive 3 on both the first substrate 1 and the second substrate 2, it is easy to form a thick film of the much thicker adhesive 3.
Although not shown as another example, a frame-shaped shading mask that covers the peripheral edge 3 a is provided so that the viscosity of the already semi-cured peripheral edge 3 a does not increase, and light is applied only to the central part 3 b of the adhesive 3. Irradiated with L and semi-cured, or irradiated with heat rays or the like from the heat source instead of the light beam L such as ultraviolet rays toward the central portion 3b, or the semi-cured peripheral after the peripheral curing step without including the central curing step It is also possible to execute a bonding step of bonding the first substrate 1 and the second substrate 2 so that the entire adhesive 3 including the portion 3a and the uncured center portion 3b is sandwiched.

図1(d)に示される合着工程の具体例では、真空中又は大気中において、接着剤3が塗布された第一基板1に対し、第二基板2をその内面2aが接着剤3の表面3cと接触するように重ね合わせ、第一基板1と第二基板2が接着剤3を挟んで互いに平行となるように合着させている。
詳しくは、第一基板1又は第二基板2のいずれか一方若しくは両方を互いに接近移動させる昇降駆動部(図示しない)が設けられている。この昇降駆動部は、コントローラ(図示しない)で作動制御され、第一基板1と第二基板2をそれらの内面1a,2a同士の間隔が、接着剤3の塗布高さと略同じになるまで接近移動させるように構成している。
In the specific example of the bonding process shown in FIG. 1D, the inner surface 2a of the second substrate 2 is made of the adhesive 3 with respect to the first substrate 1 coated with the adhesive 3 in a vacuum or in the atmosphere. The first substrate 1 and the second substrate 2 are bonded so as to be parallel to each other with the adhesive 3 interposed therebetween so as to be in contact with the surface 3c.
Specifically, an elevating drive unit (not shown) that moves either one or both of the first substrate 1 and the second substrate 2 toward each other is provided. This lifting drive unit is controlled by a controller (not shown) and approaches the first substrate 1 and the second substrate 2 until the distance between the inner surfaces 1a and 2a is substantially the same as the coating height of the adhesive 3. It is configured to move.

また、合着工程の後工程としては、合着工程が実行される場所、又は合着工程の実行場所とは異なる場所などに搬送された状態で、紫外線などの光線Lや熱線などを半硬化状態の周縁部3aと半硬化状態又は未硬化状態の中心部3bに向け照射して本硬化させることが好ましい。
それにより、接着剤3全体の粘度が更に高くなって変形不能な完全接着状態となり、第一基板1と第二基板2がそれらの間に本硬化状態の接着剤3を均等な充填膜厚(ギャップ)で挟み込むように合着した貼合デバイスAが生産される。
In addition, as a post-process of the coalescence process, light L such as ultraviolet rays or heat rays are semi-cured in a state where the process is carried to a place where the coalescence process is performed or a place different from the place where the coalescence process is performed. It is preferable to irradiate the peripheral portion 3a in the state and the central portion 3b in the semi-cured state or the uncured state to perform the main curing.
Thereby, the viscosity of the adhesive 3 as a whole is further increased to be in a completely bonded state that cannot be deformed, and the first substrate 1 and the second substrate 2 have an even filling film thickness ( A bonding device A bonded so as to be sandwiched by a gap) is produced.

このような本発明の実施形態に係る貼合デバイスAの製造方法によると、図1(a)及び図2(a)に示される塗布工程で、第一基板1又は第二基板2のいずれか一方の内面1aに接着剤3を硬化(半硬化及び本硬化)時と同形状に塗布した後に、図1(b)及び図2(b)に示される周縁硬化工程で、接着剤3の周縁部3aのみをその粘度が接着性を保持したまま他の部位の粘度よりも高くなるように部分的に半硬化させ、その後、図1(d)に示される合着工程で、周縁部3aを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させるため、接着剤3の周縁部3aで囲まれた中心部3bが未硬化状態であったとしても、半硬化した周縁部3aで堰き止められて外へ伸展しない。
それにより、接着剤3の外形を硬化時の形状に保持しながら基板1,2同士を合着することができる。したがって、接着剤3の流動性によるはみ出しなどを防止できて接着剤3の整形性に優れる。
According to the manufacturing method of the bonding device A according to such an embodiment of the present invention, either the first substrate 1 or the second substrate 2 is applied in the coating step shown in FIG. 1 (a) and FIG. 2 (a). After the adhesive 3 is applied to one inner surface 1a in the same shape as when it is cured (semi-cured and fully cured), the peripheral edge of the adhesive 3 is subjected to the peripheral curing step shown in FIGS. 1 (b) and 2 (b). Only the part 3a is partially semi-cured so that the viscosity thereof is higher than the viscosity of other parts while maintaining the adhesiveness, and then the peripheral part 3a is formed in the attaching step shown in FIG. In order to bond the first substrate 1 and the second substrate 2 so that the entire adhesive 3 is sandwiched, even if the central portion 3b surrounded by the peripheral portion 3a of the adhesive 3 is in an uncured state, It is blocked by the semi-cured peripheral edge 3a and does not extend outward.
Thereby, the substrates 1 and 2 can be bonded together while maintaining the outer shape of the adhesive 3 in the shape at the time of curing. Therefore, the adhesive 3 can be prevented from protruding due to the fluidity, and the adhesive 3 has excellent formability.

特に、周縁硬化工程の後には、図1(c)に示される中心硬化工程で、接着剤3の中心部3bをその粘度が高くなるように半硬化させ、その後、図1(d)に示される合着工程で、半硬化された周縁部3a及び中心部3bを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させる場合には、第一基板1及び第二基板2の合着前に、周縁部3及び中心部3bの接着剤3の全体が半硬化状態となっている。
それにより、基板1,2同士の合着後における接着剤3の流動を完全に防止することができる。したがって、接着剤3を本硬化するたに、合着された基板1,2を搬送するか又は表裏反転移動させるなどしても、品質低下のトラブルを避けることができて生産上の自由度が向上する。
次に、本発明の一実施例を図面に基づいて説明する。
In particular, after the peripheral curing step, the central portion 3b of the adhesive 3 is semi-cured so as to increase its viscosity in the central curing step shown in FIG. 1 (c), and then shown in FIG. 1 (d). When the first substrate 1 and the second substrate 2 are bonded so that the entire adhesive 3 including the semi-cured peripheral portion 3a and the center portion 3b is sandwiched in the bonding step, the first substrate 1 And before bonding of the 2nd board | substrate 2, the whole adhesive agent 3 of the peripheral part 3 and the center part 3b is a semi-hardened state.
Thereby, the flow of the adhesive 3 after the bonding of the substrates 1 and 2 can be completely prevented. Therefore, even if the bonded substrates 1 and 2 are transported or moved upside down in order to fully cure the adhesive 3, it is possible to avoid the problem of quality degradation and to increase the degree of freedom in production. improves.
Next, an embodiment of the present invention will be described with reference to the drawings.

この実施例は、接着剤3が真空雰囲気においてガス化する硬化制御材を含み、合着工程が真空雰囲気において半硬化状態の周縁部3a及び中心部3bを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させている。
図1(d)に示される例では、所定の真空度に維持されたチャンバー5の内部において、第一基板1と第二基板2の合着を実行している。
In this embodiment, the adhesive 3 includes a curing control material that gasifies in a vacuum atmosphere, and the entire adhesive 3 including the peripheral portion 3a and the center portion 3b in which the bonding process is semi-cured in the vacuum atmosphere is sandwiched. The first substrate 1 and the second substrate 2 are bonded together.
In the example shown in FIG. 1D, the first substrate 1 and the second substrate 2 are bonded together inside the chamber 5 maintained at a predetermined degree of vacuum.

さらに、合着工程において、第一基板1又は第二基板2のいずれか他方の内面を、接着剤3の表面3cに対して密着するように加圧することが好ましい。
図1(d)の二点鎖線に示される例では、第一基板1に塗布された接着剤3に対し、前記昇降駆動部により第二基板2を、その内面2aが接着剤3の表面3cに圧接するように接近移動させ押圧している。
Furthermore, it is preferable to pressurize so that the inner surface of the other one of the 1st board | substrate 1 or the 2nd board | substrate 2 may contact | adhere with respect to the surface 3c of the adhesive agent 3 in a bonding process.
In the example shown by the two-dot chain line in FIG. 1 (d), the second substrate 2 is applied to the adhesive 3 applied to the first substrate 1 by the elevating drive unit, and the inner surface 2 a is the surface 3 c of the adhesive 3. It is moved and pressed so as to come into pressure contact.

このような本発明の実施例に係る貼合デバイスAの製造方法によると、真空雰囲気で第一基板1及び第二基板2が接着剤3の表面3cとの間に空気を残留させずに合着されると同時に、周縁部3a及び中心部3bが半硬化(ゲル化)に伴って、内部の硬化制御材が真空雰囲気と接触しないためにガス化せず気泡が発生しない。
それにより、基板1,2同士を無気泡で合着することができる。したがって、無気泡の品質を確保できるという利点がある。
According to the manufacturing method of the bonding device A according to the embodiment of the present invention, air is not left between the first substrate 1 and the second substrate 2 and the surface 3c of the adhesive 3 in a vacuum atmosphere. At the same time, the peripheral edge portion 3a and the central portion 3b are semi-cured (gelled), and the internal curing control material does not come into contact with the vacuum atmosphere, so that it is not gasified and bubbles are not generated.
Thereby, the substrates 1 and 2 can be bonded together without bubbles. Therefore, there is an advantage that the bubble-free quality can be ensured.

さらに、合着工程において、第一基板1又は第二基板2のいずれか他方の内面を、接着剤3の表面3cに対して密着するように加圧させる場合には、接着剤3の表面3aに生ずる凹凸が平滑に変形して密着する。
それにより、基板1,2同士の合着時における気泡の残留を更に減少させることができる。したがって、無気泡の品質を更に向上させることができるという利点もある。
Furthermore, in the bonding step, when the other inner surface of the first substrate 1 or the second substrate 2 is pressed against the surface 3c of the adhesive 3, the surface 3a of the adhesive 3 is used. Concavities and convexities generated in the film are smoothly deformed and adhered.
Thereby, the bubble remaining at the time of joining the substrates 1 and 2 can be further reduced. Therefore, there is also an advantage that the bubble-free quality can be further improved.

なお、前示実施例では、接着剤3が真空雰囲気においてガス化する硬化制御材を含み、合着工程が真空雰囲気において半硬化状態の周縁部3a及び中心部3bを含む接着剤3の全体が挟まれるように第一基板1と第二基板2を合着させたが、これに限定されず、硬化制御材を含まない接着剤3を用いたり、合着工程が大気中において第一基板1と第二基板2を合着させたり、しても良い。   In the previous embodiment, the adhesive 3 includes a curing control material that is gasified in a vacuum atmosphere, and the entire adhesive 3 including the peripheral edge portion 3a and the center portion 3b in which the bonding process is semi-cured in the vacuum atmosphere. Although the 1st board | substrate 1 and the 2nd board | substrate 2 were joined so that it might be pinched | interposed, it is not limited to this, The adhesive agent 3 which does not contain a hardening control material is used, or the 1st board | substrate 1 is used in the atmosphere in the joining process And the second substrate 2 may be bonded together.

1 第一基板 1a 内面
2 第二基板 2a 内面
3 接着剤 3a 周縁部
3b 中心部 3c 表面
DESCRIPTION OF SYMBOLS 1 1st board | substrate 1a Inner surface 2 2nd board | substrate 2a Inner surface 3 Adhesive 3a Peripheral part 3b Center part 3c Surface

Claims (4)

対向する第一基板と第二基板を、その間に塗布された液状の接着剤が挟み込まれるように合着する貼合デバイスの製造方法であって、
前記第一基板又は前記第二基板のいずれか一方の内面に前記接着剤を当初から硬化時の外形状と同形状に塗布する工程と、
前記接着剤の周縁部をその粘度が接着性を保持したまま他の部位の粘度よりも高くなるように部分的に半硬化させる工程と、
前記周縁部を含む前記接着剤の全体が挟まれるように前記第一基板と前記第二基板を合着させる工程とを含むことを特徴とする貼合デバイスの製造方法。
A method of manufacturing a bonding device, wherein a first substrate and a second substrate facing each other are bonded so that a liquid adhesive applied therebetween is sandwiched,
Applying the adhesive on the inner surface of either the first substrate or the second substrate from the beginning in the same shape as the outer shape at the time of curing;
A step of partially semi-curing the peripheral edge of the adhesive such that the viscosity is higher than the viscosity of other parts while maintaining the adhesiveness;
And a step of bonding the first substrate and the second substrate so that the entire adhesive including the peripheral portion is sandwiched.
前記接着剤の周縁部を部分的に半硬化させる工程の後に、前記周縁部で囲まれた前記接着剤の中心部をその粘度が接着性を保持したまま高くなるように半硬化させる工程と、前記周縁部及び前記中心部を含む前記接着剤の全体が挟まれるように前記第一基板と前記第二基板を合着させる工程とを含むことを特徴とする請求項1記載の貼合デバイスの製造方法。   After the step of partially semi-curing the peripheral portion of the adhesive, the step of semi-curing the central portion of the adhesive surrounded by the peripheral portion so that the viscosity is increased while maintaining adhesiveness; The bonding device according to claim 1, further comprising a step of bonding the first substrate and the second substrate so that the entire adhesive including the peripheral portion and the center portion is sandwiched. Production method. 前記接着剤が真空雰囲気においてガス化する硬化制御材を含み、
真空雰囲気において半硬化状態の前記周縁部及び中心部を含む前記接着剤の全体が挟まれるように前記第一基板と前記第二基板を合着させる工程とを含むことを特徴とする請求項2記載の貼合デバイスの製造方法。
The adhesive includes a curing control material that gasifies in a vacuum atmosphere,
3. The step of bonding the first substrate and the second substrate so that the whole of the adhesive including the peripheral portion and the center portion in a semi-cured state is sandwiched in a vacuum atmosphere. The manufacturing method of the bonding device of description.
前記第一基板と前記第二基板を合着させる工程において、前記第一基板又は前記第二基板のいずれか他方の内面を、前記接着剤の表面に対して密着するように加圧させることを特徴とする請求項3記載の貼合デバイスの製造方法。   In the step of bonding the first substrate and the second substrate, pressurizing the inner surface of either the first substrate or the second substrate so as to be in close contact with the surface of the adhesive. The manufacturing method of the bonding device of Claim 3 characterized by the above-mentioned.
JP2011269229A 2011-12-08 2011-12-08 Manufacturing method of bonding device Expired - Fee Related JP4981190B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011269229A JP4981190B1 (en) 2011-12-08 2011-12-08 Manufacturing method of bonding device
TW101145326A TWI541562B (en) 2011-12-08 2012-12-03 The manufacturing method of the bonding element
KR1020120141049A KR101969597B1 (en) 2011-12-08 2012-12-06 Method of bonded device
CN201210524707.3A CN103160214B (en) 2011-12-08 2012-12-07 The manufacture method of laminating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011269229A JP4981190B1 (en) 2011-12-08 2011-12-08 Manufacturing method of bonding device

Publications (2)

Publication Number Publication Date
JP4981190B1 true JP4981190B1 (en) 2012-07-18
JP2013120352A JP2013120352A (en) 2013-06-17

Family

ID=46678922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011269229A Expired - Fee Related JP4981190B1 (en) 2011-12-08 2011-12-08 Manufacturing method of bonding device

Country Status (4)

Country Link
JP (1) JP4981190B1 (en)
KR (1) KR101969597B1 (en)
CN (1) CN103160214B (en)
TW (1) TWI541562B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013161686A1 (en) * 2012-04-26 2013-10-31 シャープ株式会社 Method for manufacturing display device
JP5512061B1 (en) * 2013-06-27 2014-06-04 信越エンジニアリング株式会社 Manufacturing method of bonding device
KR101425744B1 (en) * 2013-02-20 2014-08-04 희성전자 주식회사 Method for manufacturing a display device
KR101475840B1 (en) * 2013-02-22 2014-12-30 주식회사 씨엘디 Display device manufacturing device and display device manufacturing method
JP2021039357A (en) * 2019-03-07 2021-03-11 デクセリアルズ株式会社 Method for manufacturing image display device

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015064431A (en) * 2013-09-24 2015-04-09 シャープ株式会社 Portable terminal and manufacturing method of the same
JP6321366B2 (en) * 2013-12-16 2018-05-09 東京応化工業株式会社 LAMINATE, LAMINATE MANUFACTURING METHOD, AND SUBSTRATE PROCESSING METHOD
US9142807B2 (en) * 2013-12-31 2015-09-22 Shenzhen China Star Optoelectronics Technology Co., Ltd. Method for manufacturing flexible OLED (organic light emitting display) panel
CN103745953A (en) * 2013-12-31 2014-04-23 深圳市华星光电技术有限公司 Manufacturing method of flexible OLED (organic light emitting diode) panel
CN104298399A (en) * 2014-09-26 2015-01-21 深圳市志凌伟业技术有限公司 Touch display module and machining method thereof
CN105629536B (en) * 2016-03-31 2018-12-18 中航华东光电有限公司 Firmly to hard liquid crystal display binding method
CN107526470A (en) * 2017-08-23 2017-12-29 信利光电股份有限公司 The glue fitting precuring fixture and sub-curing process of a kind of touch-screen
CN111303781B (en) * 2020-04-03 2022-03-11 江西欧迈斯微电子有限公司 Bonding module and manufacturing method thereof
CN113103712A (en) * 2021-05-14 2021-07-13 业成科技(成都)有限公司 Bonding method and bonding apparatus

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH112805A (en) * 1997-06-13 1999-01-06 Sharp Corp Liquid crystal display device and its manufacture
WO2007063751A1 (en) * 2005-11-29 2007-06-07 Seiko Instruments Inc. Process for producing display and method of laminating
JP2008209510A (en) * 2007-02-23 2008-09-11 Nichibei Parts Co Ltd Image display device and manufacturing method thereof
JP2009109855A (en) * 2007-10-31 2009-05-21 Casio Comput Co Ltd Method of manufacturing protective plate-integrated display module
JP2011075718A (en) * 2009-09-29 2011-04-14 Seiko Instruments Inc Display device and manufacturing method of the same
JP2011113047A (en) * 2009-11-30 2011-06-09 Casio Computer Co Ltd Protective plate integrated liquid crystal display panel and method for producing the same
JP2011158851A (en) * 2010-02-04 2011-08-18 Hitachi Displays Ltd Display device and manufacturing method thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4814215A (en) * 1986-11-07 1989-03-21 The B. F. Goodrich Company Adhesive composition, process, and product
JPH0836151A (en) 1994-07-22 1996-02-06 Nippon Sheet Glass Co Ltd Laminating method of planer substrate
JP2004151325A (en) * 2002-10-30 2004-05-27 Fujitsu Ltd Method of bonding substrates together
JP2007240914A (en) 2006-03-09 2007-09-20 Seiko Epson Corp Method and apparatus for manufacturing electrooptical device
WO2008038412A1 (en) * 2006-09-28 2008-04-03 Shibaura Mechatronics Corporation Bonding method and bonding apparatus
JP5139736B2 (en) * 2007-06-27 2013-02-06 東レエンジニアリング株式会社 Liquid crystal component manufacturing method and manufacturing apparatus
US9701802B2 (en) * 2009-04-08 2017-07-11 Allnex Ip S.A.R.L. Reinforced UV-A curable composite compositions and methods
CN101957512A (en) * 2009-07-16 2011-01-26 北京京东方光电科技有限公司 Liquid crystal display panel and manufacturing method thereof
CN102667893B (en) * 2009-12-28 2015-02-04 旭硝子株式会社 Method for manufacturing a display device
JP5550357B2 (en) * 2010-01-15 2014-07-16 株式会社ジャパンディスプレイ Display device with front window

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH112805A (en) * 1997-06-13 1999-01-06 Sharp Corp Liquid crystal display device and its manufacture
WO2007063751A1 (en) * 2005-11-29 2007-06-07 Seiko Instruments Inc. Process for producing display and method of laminating
JP2008209510A (en) * 2007-02-23 2008-09-11 Nichibei Parts Co Ltd Image display device and manufacturing method thereof
JP2009109855A (en) * 2007-10-31 2009-05-21 Casio Comput Co Ltd Method of manufacturing protective plate-integrated display module
JP2011075718A (en) * 2009-09-29 2011-04-14 Seiko Instruments Inc Display device and manufacturing method of the same
JP2011113047A (en) * 2009-11-30 2011-06-09 Casio Computer Co Ltd Protective plate integrated liquid crystal display panel and method for producing the same
JP2011158851A (en) * 2010-02-04 2011-08-18 Hitachi Displays Ltd Display device and manufacturing method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013161686A1 (en) * 2012-04-26 2013-10-31 シャープ株式会社 Method for manufacturing display device
KR101425744B1 (en) * 2013-02-20 2014-08-04 희성전자 주식회사 Method for manufacturing a display device
KR101475840B1 (en) * 2013-02-22 2014-12-30 주식회사 씨엘디 Display device manufacturing device and display device manufacturing method
JP5512061B1 (en) * 2013-06-27 2014-06-04 信越エンジニアリング株式会社 Manufacturing method of bonding device
WO2014207867A1 (en) * 2013-06-27 2014-12-31 信越エンジニアリング株式会社 Bonded device manufacturing method
JP2021039357A (en) * 2019-03-07 2021-03-11 デクセリアルズ株式会社 Method for manufacturing image display device

Also Published As

Publication number Publication date
KR20130064702A (en) 2013-06-18
JP2013120352A (en) 2013-06-17
CN103160214A (en) 2013-06-19
TWI541562B (en) 2016-07-11
TW201335663A (en) 2013-09-01
KR101969597B1 (en) 2019-04-16
CN103160214B (en) 2016-08-31

Similar Documents

Publication Publication Date Title
JP4981190B1 (en) Manufacturing method of bonding device
TWI431567B (en) Curve-shaped display module, manufacture method thereof, and manufacture apparatus for manufacturing the same
JP6654278B2 (en) Equipment and manufacturing method thereof
CN104309267B (en) A kind of method for bonding substrate, touch display substrate, display device
WO2021012455A1 (en) Touch display device and fabrication method therefor
CN105938267A (en) Display device and manufacturing method thereof
TWI603848B (en) Bonding device manufacturing method
JP5816388B1 (en) Manufacturing method of bonding device and manufacturing device of bonding device
JP2011053308A (en) Display device and method of manufacturing the same
JP5346116B1 (en) Work bonding method and work bonding device
JP5358847B2 (en) Method and apparatus for laminating plate members
JP2015200724A (en) Image display device and method for manufacturing image display device
TWI390293B (en) Method for manufacturing protection board of display
JP2013020162A (en) Liquid crystal display and manufacturing method thereof
JP2016038559A (en) Apparatus and manufacturing method of apparatus
KR101552397B1 (en) Method for attaching panel and apparatus therefor
TWI530396B (en) Panel laminating method, panel assembly and electronic device
JP5815099B2 (en) Bonding apparatus and manufacturing method of bonding substrate
KR101373221B1 (en) Manufacturing method of display
JP7153527B2 (en) Laminate manufacturing method
JP5984483B2 (en) Manufacturing method of display device
TW201341184A (en) Manufacturing method and manufacturing device for optical-use laminate structure
JP2014074935A (en) Display device

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120419

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150427

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4981190

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees