JP4973820B2 - Electro-optical device and electronic apparatus - Google Patents

Description

  The present invention relates to a technical field of an electro-optical device such as a liquid crystal panel, and an electronic apparatus such as a liquid crystal projector including the electro-optical device.

  In a liquid crystal device that is an example of this type of electro-optical device, for example, an element substrate on which a pixel electrode or a pixel switching element is formed and a counter substrate on which a counter electrode is formed are, for example, ultraviolet rays through a predetermined gap. The liquid crystal is sealed between these substrates by being bonded together by a sealing material such as a cured resin. For example, when a liquid crystal device is used as a light valve in a liquid crystal projector, if dust or dust (hereinafter simply referred to as “dust”) adheres to the surface of the light valve, the image of the dust is also projected on the projection screen. As a result, the image quality may be reduced. For this reason, a dustproof substrate is often provided on the outer surface of the substrate constituting the liquid crystal device.

  Further, the counter substrate is generally provided with a frame light-shielding film that defines a frame of a display area (that is, an outer frame of display) in the liquid crystal device. In addition, a light-shielding film different from the frame light-shielding film may be formed outside the frame light-shielding film in order to shield light incident on the element substrate from the outside of the frame light-shielding film on the dust-proof substrate (patent) Reference 1). Such a light shielding film is provided to prevent the image of the pattern of terminals, wiring, various circuits, etc. formed on the surface of the element substrate or inside the element light shielding film outside the frame light shielding film from being projected onto the projection screen. It has been.

Japanese Patent Laid-Open No. 11-295683

  However, when the light reflected by the frame light-shielding film is reflected on the element substrate side, and the reflected light is reflected again by the light-shielding film provided on the dustproof substrate, the element substrate is re-reflected by the reflected light. The pattern image of the circuit section or terminal provided in the projector is projected onto the projection screen, which causes a problem of degrading the display quality of a liquid crystal projector or the like. In addition, as disclosed in Patent Document 1, when a light shielding film is provided on a dustproof substrate, the manufacturing cost of an electro-optical device such as a liquid crystal panel and an electronic device such as a liquid crystal projector is increased. There is also.

  Therefore, the present invention has been made in view of the above-described problems, for example, and includes an electro-optical device that can improve the light shielding performance outside the display region without increasing the manufacturing cost, and the same. It is an object to provide an electronic device.

In order to solve the above-described problems, an electro-optical device according to a first aspect of the present invention includes a sealing material for bonding an element substrate and a counter substrate, and a frame provided on the counter substrate so as to surround a display area. A light-shielding film, a data line driving circuit provided on the element substrate, outside the frame light-shielding film and inside the outer edge of the sealing material, and provided between the data line driving circuit and the display region And a light shielding film that overlaps the sampling circuit and extends to the data line driving circuit side .
The light shielding film is provided so as to cover a space between the sampling circuit and the data line driving circuit.
The light shielding film is provided so as not to overlap the sealing material.

  In the electro-optical device according to the first aspect of the present invention, an electro-optical material such as liquid crystal is sandwiched between the element substrate and the counter substrate. The display area on the element substrate is composed of a plurality of pixel portions arranged in a matrix. Such a pixel portion includes, for example, a semiconductor element such as a TFT, and is electrically connected to a wiring extending to the display region. The element substrate may be a transparent substrate such as a glass substrate or a quartz substrate and a multilayer structure including an insulating film formed on the transparent substrate.

  For example, the light-shielding conductive film constitutes at least one of a part of an element such as a TFT which is a part of the pixel portion and a wiring electrically connected to the element such as the TFT.

  The light shielding film is formed in the same layer as the light shielding conductive film, for example, by the same process as the process of forming the light shielding conductive film. Such a light shielding film is formed on the element substrate so as to overlap a peripheral region extending outside the display region.

  Therefore, the light shielding film can block light incident on the peripheral region on the element substrate, and can improve the display quality of the electro-optical device. According to such a light shielding film, it is possible to reduce the projection of a pattern image of a terminal or the like provided on the surface of the element substrate or inside in the peripheral region. More specifically, according to the light shielding film, for example, even when the reflected light reflected by the light shielding film provided on the dustproof substrate enters the peripheral region, the reflected light enters the element substrate from the peripheral region. It is possible to reduce the projection of the pattern image described above onto the projection film.

  In addition, since the light shielding film is formed in the same layer as the light shielding conductive film constituting at least one of the pixel portion and the electrically connected wiring, a light shielding film is separately formed on the dustproof substrate. Compared to the case, it can be formed without increasing the number of steps. In particular, by forming the same film as the light-shielding conductive film in the same process as the process of forming the light-shielding conductive film, two films of the light-shielding conductive film and the light-shielding film can be formed in one process, and dustproof The cost required for manufacturing the electro-optical device can be reduced as compared with the case where the light shielding film is formed on the substrate.

  Therefore, according to the electro-optical device according to the first aspect of the present invention, the display quality of the electro-optical device can be improved, and the cost required for manufacturing the electro-optical device can be reduced.

  In an aspect of the electro-optical device according to the first aspect of the present invention, the counter substrate disposed to face the element substrate, the counter substrate disposed on the counter substrate, and disposed to face the pixel electrode of the pixel portion. The light shielding film may have the same potential as that of the counter electrode.

  In this aspect, for example, the display quality of the electro-optical device can be improved by maintaining the counter electrode potential of the counter electrode set to a constant potential and the potential of the light shielding film at the same potential. More specifically, the light shielding film is electrically connected to, for example, a power source that supplies a constant potential to the counter electrode, or a fixed potential line that supplies a constant potential to the plurality of counter electrodes. According to the light-shielding film having the same potential as the counter electrode, even when the light-shielding film is in contact with the wiring or the like provided on the counter substrate, it is applied to an electro-optical material such as a liquid crystal during the operation of the electro-optical device. Application of a direct current component to the voltage can be reduced, and predetermined alignment control of the liquid crystal or the like is performed according to the potential difference between the pixel electrode and the counter electrode provided in the pixel portion. By such orientation control, a predetermined image can be displayed in the display area.

  In another aspect of the electro-optical device according to the first aspect of the present invention, the light shielding film may be electrically connected to the counter electrode.

  According to this aspect, the counter electrode and the pixel unit can be electrically connected to each other via the light shielding film without providing a vertical conduction terminal that electrically connects the counter electrode and the pixel unit. According to this aspect, the step of forming the vertical conduction terminal in the electro-optical device is not necessary, and the manufacturing cost of the electro-optical device can be reduced.

  In another aspect of the electro-optical device according to the first aspect of the present invention, the electro-optical device is formed outside the region where the light-shielding film is formed in the peripheral region on the element substrate. The light shielding film may be electrically connected to the light shielding conductive film.

  According to this aspect, the input terminal, the light shielding film, and the light shielding conductive film are electrically connected, and a potential can be supplied to the pixel portion or the wiring from the outside of the apparatus via the input terminal.

  In another aspect of the electro-optical device according to the first aspect of the present invention, the light shielding film may be formed so as to surround the display region in a frame region that defines the display region in the peripheral region. Good.

  According to this aspect, since the display area can be defined by the light shielding film, it is not necessary to separately provide a frame light shielding film. Therefore, the manufacturing cost of the electro-optical device can be reduced by the amount that the frame light shielding film is not provided.

  In another aspect of the electro-optical device according to the first aspect of the present invention, the electro-optical device includes a frame light-shielding film that is provided on the counter substrate and defines the display area, and the light-shielding film is formed on the peripheral area. Of these, the frame light shielding film may be formed outside the frame region.

  According to this aspect, even when the incident light that could not be shielded by the frame light shielding film and the light reflected by the light shielding film are reflected again by the frame light shielding film, Can block light. Therefore, light incident on the element substrate from the outside of the frame region in the peripheral region can be blocked, and the projection of the pattern image such as the terminal on the projection screen can be reduced.

  In another aspect of the electro-optical device according to the first aspect of the present invention, a part of the pixel is one electrode of a pair of electrodes of a storage capacitor that holds an image signal supplied to the pixel portion. There may be.

  According to this aspect, the light-shielding film is formed as the same film as one electrode of the pair of electrodes included in the storage capacitor built in the element substrate, the capacitor wiring, or the data line. Such an electrode, a capacitor wiring, and a data line are elements included in a circuit that is essential for operating the electro-optical device. Therefore, by forming the light-shielding film as the same film as these elements, it is not necessary to form the light-shielding film by a process different from these elements. Therefore, the display quality of the electro-optical device can be improved without increasing the number of processes. It becomes possible to raise.

In another aspect of the electro-optical device according to the first aspect of the present invention,
The wiring is a capacitor wiring electrically connected to one of a pair of electrodes of a storage capacitor that holds an image signal supplied to the pixel portion, or a data line that supplies the image signal. Also good.

  According to this aspect, the layout of the wiring on the element substrate can be simplified.

  In another aspect of the electro-optical device according to the first aspect of the present invention, the light-shielding conductive film is formed on the uppermost layer among a plurality of metal films formed on different layers on the element substrate. The light shielding film may be the same film as the one metal film.

  According to this aspect, it is possible to block the light irradiated to the portion formed on the lower layer side of the one metal film. Therefore, it is possible to surely prevent the wiring formed on the lower layer side of one metal film among the various wirings and elements formed on the element substrate from being projected onto the projection screen. The “metal film” in this embodiment is not limited to a metal film having a single layer or a multi-layer structure, and a light-shielding film made of a metal film and a nitride or oxide laminated on the metal film. The multilayer film containing is also meant.

  In this aspect, the peripheral region includes a peripheral circuit portion including a metal film formed in the same layer as another metal film formed on the lower layer side of the one metal film among the plurality of metal films. Also good.

  According to this aspect, for example, a light-shielding film that can share a metal film formed in the same layer as another metal film as a part of a peripheral circuit unit such as a data line driving circuit and is the same film as one metal film Thus, the light leakage current generated in the transistors included in the data line driving circuit or the like can be reduced.

  In another aspect of the electro-optical device according to the first aspect of the present invention, the peripheral circuit includes a semiconductor film formed in the same layer as the semiconductor film formed on the lower layer side of the one metal film in the peripheral region. May be provided.

  According to this aspect, the peripheral circuit portion such as the data line driving circuit including the semiconductor film formed in the same layer as the semiconductor film formed on the lower layer side of the one metal film can be shielded by the light shielding film. Therefore, it is possible to reduce light leakage current generated in a transistor that constitutes a part of the data line driving circuit or the like.

In order to solve the above problems, an electro-optical device according to the reference invention of the present invention includes a plurality of pixel portions constituting a display area on an element substrate, and a frame shading that defines an outer frame of the display area on the element substrate. In addition to a film, the light-shielding film is also provided as a wiring to which a predetermined potential is supplied.

According to the electro-optical device according to the present reference invention, similarly to the electro-optical device according to the first aspect of the present invention, it is possible to increase the display quality of the electro-optical device, the wiring on the element substrate There is no need to form a light-shielding film by a process different from the process, and therefore the manufacturing cost of the electro-optical device can be reduced.

In another aspect of the electro-optical device according to the first aspect of the present invention, the light shielding film may include a light reflection preventing film.

  According to this aspect, the reflected light reflected by the light shielding film can be reduced as compared with the case where the light shielding film is formed by only the metal film, for example. Therefore, light incident on the element substrate due to the reflected light reflected by the light shielding film can be reduced.

In another aspect of the electro-optical device according to the first aspect of the present invention, the light shielding film may have an OD value of 4 or more.

  According to this aspect, the reflected light reflected by the light shielding film can be sufficiently reduced, and the light incident on the element substrate can be reduced.

  In order to solve the above problems, an electronic apparatus according to the present invention includes the above-described electro-optical device of the present invention.

  According to the electronic apparatus according to the present invention, since the electro-optical device according to the present invention described above is included, a projection display device such as a liquid crystal projector capable of high-quality display, a mobile phone, an electronic notebook, and a word processor. Various electronic devices such as a viewfinder type or a monitor direct view type video tape recorder, a workstation, a videophone, a POS terminal, and a touch panel can be realized. In addition, as an electronic apparatus according to the present invention, for example, an electrophoretic device such as electronic paper can be realized.

  Such an operation and other advantages of the present invention will become apparent from the embodiments described below.

1 is a plan view illustrating a configuration of an electro-optical device according to a first embodiment. It is the II-II 'sectional view taken on the line of FIG. FIG. 3 is an equivalent circuit diagram of various elements, wirings, and the like in the pixel portion formed in the image display area of the electro-optical device according to the first embodiment. It is a figure which shows a lower layer part among the laminated structure of the electro-optical apparatus which concerns on 1st Embodiment. It is a figure which shows the upper layer part among the laminated structure of the electro-optical apparatus which concerns on 1st Embodiment. FIG. 6 is an enlarged view in which FIGS. 4 and 5 are superimposed. FIG. 7 is a cross-sectional view taken along line VII-VII ′ in each of FIGS. 4 and 5. FIG. 6 is a plan view illustrating a configuration of a liquid crystal device according to a modification of the electro-optical device according to the first embodiment. It is the IX-IX 'sectional view taken on the line of FIG. FIG. 10 is a plan view illustrating a configuration of a liquid crystal device according to another modification of the electro-optical device according to the first embodiment. It is the XI-XI 'sectional view taken on the line of FIG. FIG. 6 is a plan view illustrating a configuration of an electro-optical device according to a second embodiment. FIG. 6 is a partial plan view (part 1) illustrating a specific configuration of an electro-optical device according to a second embodiment. FIG. 6 is a partial plan view (part 2) illustrating a specific configuration of an electro-optical device according to a second embodiment. It is the XV-XV 'sectional view taken on the line of FIG.13 and FIG.14. FIG. 10 is a plan view illustrating a configuration of an electro-optical device according to a third embodiment. It is sectional drawing showing the structure of the liquid crystal projector which concerns on one Embodiment of the electronic device which concerns on this invention.

<First Embodiment>
<1-1: Overall Configuration of Electro-Optical Device>
First, an overall configuration of a liquid crystal device which is an example of an electro-optical device according to the present embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view showing the configuration of the liquid crystal device according to this embodiment, and FIG. 2 is a cross-sectional view taken along the line II-II ′ of FIG. The liquid crystal device 1 according to the present embodiment is formed on the TFT array substrate 10 in the same layer as a part of the pixel unit 72 and a wiring electrically connected to the pixel unit 72 which will be described in detail later. The present invention is characterized in that a light shielding film 54 which is an example of the “light shielding film” according to the first invention is provided.

  1 and 2, in the liquid crystal device 1 according to this embodiment, a TFT array substrate 10 and an opposite substrate 20 which are examples of the “element substrate” according to the first invention of the present invention are arranged to face each other. A liquid crystal layer 50 is sealed between the TFT array substrate 10 and the counter substrate 20, and the TFT array substrate 10 and the counter substrate 20 are an example of the “display region” according to the first invention of the present invention. They are bonded to each other by a sealing material 52 provided in a sealing area located around the display area 10a. A dustproof substrate 120b made of a transparent material such as glass is disposed on the lower surface of the TFT array substrate 10, and a dustproof material made of the same material as the dustproof substrate 120b is placed on the upper surface of the counter substrate 20. A substrate 120a is disposed.

  In the image display area 10a on the TFT array substrate 10, a plurality of pixel portions 72 arranged in a matrix are formed as will be described in detail later. Such a pixel portion 72 includes, for example, a semiconductor element such as a TFT as a switching element, and is electrically connected to a scanning line and a data line extending to the image display region 10a. The TFT array substrate 10 is a substrate in which a transparent substrate such as a glass substrate or a quartz substrate and a multilayer structure including an insulating film are formed on the transparent substrate. Similarly to the TFT array substrate 10, the counter substrate 20 also has a transparent substrate such as a glass substrate and a multilayer structure formed on the transparent substrate.

  In FIG. 1, a light-shielding frame light-shielding film 53 that defines the frame area of the image display area 10a among the peripheral areas extending around the image display area 10a in parallel with the inside of the seal area where the seal material 52 is disposed. Are provided on the counter substrate 20 side. On the TFT array substrate 10, the sampling circuit 7 and the scanning line driving circuit 104 are formed in a region overlapping the frame region where the frame light shielding film 53 is formed. Therefore, the sampling circuit 7 and the scanning line driving circuit 104 are shielded from light by the frame light shielding film 53.

  Of the peripheral region extending around the periphery of the image display region 10a, the external circuit connection terminal 102, which is an example of the “input terminal” of the present invention, is provided in the region located outside the seal region where the sealing material 52 is disposed. It is provided along one side of the array substrate 10. The sampling circuit 7 is provided so as to overlap the frame region extending inward from the seal region along one side. The scanning line driving circuit 104 is provided in a frame region extending inside the seal region along two sides adjacent to the one side. On the TFT array substrate 10, vertical conduction terminals 106 for connecting the two substrates with the vertical conduction material 107 are arranged in regions facing the four corner portions of the counter substrate 20. With these vertical conduction terminals 106, electrical conduction can be established between the TFT array substrate 10 and the counter substrate 20.

  1 and 2, the light shielding film 54 is formed on the TFT array substrate 10 outside the frame area where the frame light shielding film 53 is formed in the peripheral area extending outside the image display area 10a. The data line driving circuit 101 and the lead wiring 90 are covered with the light shielding film 54. The lead wiring 90 electrically connects the external connection terminal 102 to the data line driving circuit 101, the scanning line driving circuit 104, the vertical conduction terminal 106, and the like. In FIG. 2, the light shielding film 54 and the data line driving circuit 101 are electrically insulated from each other by an insulating film (not shown). Such an insulating film is similarly provided in each modified example and each embodiment described later.

  The light shielding film 54 reflects the incident light that has not been shielded by the frame light shielding film 53 and the light reflected by the light shielding film 54 by the frame light shielding film 53 and enters the TFT array substrate 10 from the outside of the frame region. Block out light. Accordingly, it is possible to reduce the projection of a pattern image of a circuit portion, an element, a wiring, a terminal, or the like built in the TFT array substrate 10 on the projection screen in the peripheral area of the image display area 10a. For example, since the light irradiated to the data line driving circuit 101 and the routing wiring 90 is blocked by the light shielding film 54, the pattern image of the data line driving circuit 101 and the routing wiring 90 is prevented from being projected onto the projection screen. it can.

  In addition, when the light-shielding film 54 is provided on the dust-proof substrate 120a, the light-shielding film 54 is reflected even if the reflected light reflected by the light-shielding film provided on the dust-proof substrate 120a enters the peripheral region. It is possible to reduce the incidence of light on the TFT array substrate 10 from the peripheral area, and it is possible to reduce the projection of the pattern image described above onto the projection film.

  The light shielding film 54 is a light shielding conductive material constituting at least one of a part of a pixel portion provided in the image display region 10a and a wiring formed on a TFT array substrate including a wiring electrically connected to the pixel part. Since it is formed in the same layer as the film, it can be easily formed as compared with the case where the light shielding film is separately formed on the dustproof substrate. In particular, since the light-shielding film 54 is formed as the same film as the light-shielding conductive film by the same process as the process of forming such a light-shielding conductive film, the light-shielding conductive film and the light-shielding film 54 are formed in one process. One film can be formed, and the cost required for manufacturing the liquid crystal device 1 can be reduced as compared with the case where a light shielding film is separately formed on the dustproof substrate 120a.

  The light shielding film 54 may be a single layer made of a metal film having a light shielding property or a film having a multilayer structure in which a plurality of metal films are laminated to each other, and includes a light reflection preventing film in addition to the metal film. You may go out. When the light shielding film 54 includes the light reflection film preventing film, the reflected light reflected by the light shielding film 54 can be reduced as compared with the case where the light shielding film 54 is formed only by the metal film. Therefore, the ratio of stray light incident on the TFT array substrate 10 out of the reflected light reflected by the light shielding film can be reduced. In particular, in order to practically sufficiently reduce the reflected light reflected by the light shielding film 54, it is preferable to set the OD (Optical Density) value of the light shielding film 54 to 4 or more.

  The light shielding film 54 and the counter electrode 21 are electrically connected to each other via the counter electrode potential line 99 and the vertical conduction terminal 106. The vertical conduction terminal 106 is electrically connected via the counter electrode potential line 99 to the external connection terminal 102 that is electrically connected to the power source that supplies the counter electrode potential (LCCOM) among the external connection terminals 102. Therefore, the light shielding film 54 and the counter electrode 21 have the same potential. Therefore, the liquid crystal in the frame region (liquid crystal molecules that are between the light shielding film 54 and the counter electrode and do not contribute to display) is always in a no-voltage applied state, and is not applied to the liquid crystal in the image display region 10a (particularly the region along the frame). Since no extra voltage is applied, the display is not adversely affected.

  In addition, since no direct current component is applied to the frame liquid crystal, the liquid crystal is not deteriorated. This is because when the liquid crystal in the frame area deteriorates, the deterioration also propagates to the liquid crystal in the image display area 10a.

  In FIG. 2, on the TFT array substrate 10, there is a laminated structure in which pixel switching TFTs (Thin Film Transistors), which are driving elements for controlling the alignment of liquid crystals, and wiring such as scanning lines and data lines are formed. It is formed. In the image display area 10a, a pixel electrode 9a is provided in an upper layer of wiring such as a pixel switching TFT, a scanning line, and a data line. On the other hand, on the surface of the counter substrate 20 facing the TFT array substrate 10, a light shielding film (not shown) that defines the opening area of each pixel in the image display area 10a, that is, the area through which light is substantially transmitted in the pixel. ing. A counter electrode 21 made of a transparent material such as ITO is formed on the surface of the counter substrate 20 facing the TFT array substrate 10 so as to face the plurality of pixel electrodes 9a. The alignment films 16 and 22 are respectively formed on the TFT array substrate 10 and the counter substrate 20.

  The alignment state of the liquid crystal layer 50 is controlled according to the potential difference between the pixel electrode 9a and the counter electrode 21, that is, the applied voltage applied to the liquid crystal, and a predetermined image is displayed in the image display region 10a. On the TFT array substrate 10, in addition to the data line driving circuit 101 and the scanning line driving circuit 104, an inspection circuit for inspecting quality, defects, etc. of the liquid crystal device during manufacturing or at the time of shipment, and an inspection pattern Etc. may be formed.

<1-2: Electrical Connection Configuration and Operation Principle of Pixel Unit>
Next, the electrical connection configuration and operation principle of the pixel unit 72 formed in the image display region 10a on the TFT array substrate 10 will be described with reference to FIG. FIG. 3 is an equivalent circuit diagram of various elements and wirings in the pixel portion 72 formed in the image display area 10a of the liquid crystal device 1.

  In FIG. 3, a pixel electrode 9a and a TFT 30 for controlling the switching of the pixel electrode 9a are formed in each of the plurality of pixel portions 72 formed in a matrix that forms the image display region 10a of the liquid crystal device 1. The data line 6 a to which the image signal is supplied is electrically connected to the source of the TFT 30. The image signals S1, S2,..., Sn to be written to the data lines 6a may be supplied line-sequentially in this order, or may be supplied for each group to a plurality of adjacent data lines 6a. May be.

  The scanning line 11a is electrically connected to the gate of the TFT 30, and the scanning signals G1, G2,..., Gm are applied to the scanning line 11a in a pulse-sequential manner in this order at a predetermined timing. It is configured. The pixel electrode 9a is electrically connected to the drain of the TFT 30, and the image signal S1, S2,... Supplied from the data line 6a is closed by closing the switch of the TFT 30 serving as a switching element for a certain period. Sn is written at a predetermined timing.

  A predetermined level of image signals S1, S2,..., Sn written on the liquid crystal, which is an example of an electro-optical material, via the pixel electrode 9a is between the counter electrode 21 formed on the counter substrate 20 for a certain period. Retained. The liquid crystal 50 modulates light and enables gradation display by changing the orientation and order of the molecular assembly according to the applied voltage level. In the normally white mode, the transmittance for incident light is reduced according to the voltage applied in units of each pixel, and in the normally black mode, the light is incident according to the voltage applied in units of each pixel. The light transmittance is increased, and light having a contrast corresponding to the image signal is emitted from the liquid crystal device 1 as a whole.

  In order to prevent the image signal held here from leaking, a holding capacitor 70 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 9a and the counter electrode. One electrode of the storage capacitor 70 is connected to the drain of the TFT 30 in parallel with the pixel electrode 9a, and the other electrode is connected to a capacitor wiring 400 to which a fixed potential is supplied so as to have a constant potential.

<1-3: Specific Configuration of Pixel Unit>
Next, a specific configuration of the pixel portion of the liquid crystal device 1 will be described with reference to FIGS. 4 to 6 are plan views showing a partial configuration related to the pixel portion on the TFT array substrate 10. 4 and 5 correspond to a lower layer portion (FIG. 4) and an upper layer portion (FIG. 5), respectively, of a laminated structure described later. FIG. 6 is an enlarged plan view of the laminated structure, in which FIGS. 4 and 5 are superimposed. FIG. 7 is a cross-sectional view taken along line VII-VII ′ when FIGS. 4 and 5 are overlapped. In FIG. 7, the scale of each layer / member is different for each layer / member so that each layer / member can be recognized on the drawing.

  4 to 7, each circuit element of the pixel portion 72 described above is structured on the TFT array substrate 10 as a patterned conductive film. Each circuit element includes, in order from the bottom, the first layer including the scanning line 11a, the second layer including the TFT 30 and the like, the third layer including the data line 6a and the like, the fourth layer including the storage capacitor 70 and the like, the pixel electrode 9a and the like. It consists of the 5th layer containing. Further, the base insulating film 12 is provided between the first layer and the second layer, the first interlayer insulating film 41 is provided between the second layer and the third layer, the second interlayer insulating film 42 is provided between the third layer and the fourth layer, and the fourth layer. A third interlayer insulating film 43 is provided between the layer and the fifth layer, respectively, to prevent a short circuit between the aforementioned elements. Of these, the first to third layers are shown in FIG. 4 as lower layer portions, and the fourth to fifth layers are shown in FIG. 5 as upper layer portions.

(Structure of the first layer-scanning lines, etc.)
The first layer is composed of scanning lines 11a. The scanning line 11a is patterned into a shape including a main line portion extending along the X direction of FIG. 4 and a protruding portion extending in the Y direction of FIG. 4 where the data line 6a extends. The scanning line 11a is made of, for example, conductive polysilicon, and at least one of refractory metals such as titanium (Ti), chromium (Cr), tungsten (W), tantalum (Ta), and molybdenum (Mo). It is possible to form a single metal containing one metal, an alloy, metal silicide, polysilicide, or a laminate thereof. In the present embodiment, in particular, the scanning line 11a is a conductive film arranged on the lower layer side of the TFT 30 so as to include a region facing the channel region 1a. For this reason, when a double-plate type projector is constructed using a back surface reflection on the TFT array substrate 10 or a liquid crystal device as a light valve, light emitted from other liquid crystal devices and penetrating through a synthetic optical system such as a prism is used. As for return light, the channel region 1a can be shielded from the lower layer side by the scanning line 11a.

(Second layer configuration-TFT, etc.)
The second layer is composed of the TFT 30. The TFT 30 has an LDD (Lightly Doped Drain) structure, for example, and includes a gate electrode 3a, a semiconductor layer 1a, and an insulating film 2 including a gate insulating film that insulates the gate electrode 3a from the semiconductor layer 1a. The gate electrode 3a is made of, for example, conductive polysilicon. The semiconductor layer 1a is made of, for example, polysilicon, and includes a channel region 1a ′, a low concentration source region 1b and a low concentration drain region 1c, and a high concentration source region 1d and a high concentration drain region 1e. The TFT 30 preferably has an LDD structure. However, the TFT 30 may have an offset structure in which no impurity is implanted into the low concentration source region 1b and the low concentration drain region 1c. It may be a self-aligned type in which a high concentration source region and a high concentration drain region are formed by implanting the film.

  The gate electrode 3a of the TFT 30 is electrically connected to the scanning line 11a through a contact hole 12cv formed in the base insulating film 12 in a part 3b thereof. The base insulating film 12 is made of, for example, a silicon oxide film, and is formed on the entire surface of the TFT array substrate 10 in addition to the interlayer insulating function between the first layer and the second layer. Has a function of preventing changes in the element characteristics of the TFT 30 caused by the above. The TFT 30 according to the present embodiment is a top gate type, but may be a bottom gate type.

(3rd layer configuration-data lines, etc.)
The third layer is composed of a data line 6a and a relay layer 600.

  The data line 6a is formed as a three-layer film of aluminum, titanium nitride, and silicon nitride in order from the bottom. The data line 6 a is formed so as to partially cover the channel region 1 a ′ of the TFT 30. For this reason, the channel region 1a ′ of the TFT 30 can be shielded against incident light from the upper layer side by the data line 6a that can be disposed close to the channel region 1a ′. The data line 6 a is electrically connected to the high concentration source region 1 d of the TFT 30 through a contact hole 81 that penetrates the first interlayer insulating film 41.

  The relay layer 600 is formed as the same film as the data line 6a. As shown in FIG. 4, the relay layer 600 and the data line 6a are formed so as to be separated from each other. The relay layer 600 is electrically connected to the high-concentration drain region 1 e of the TFT 30 through a contact hole 83 that penetrates the first interlayer insulating film 41.

  The first interlayer insulating film 41 is made of, for example, NSG (non-silicate glass). In addition, for the first interlayer insulating film 41, silicate glass such as PSG (phosphorus silicate glass), BSG (boron silicate glass), BPSG (boron phosphorus silicate glass), silicon nitride, silicon oxide, or the like can be used.

(Fourth layer configuration-holding capacity, etc.)
The fourth layer is composed of a storage capacitor 70. The storage capacitor 70 has a configuration in which a capacitor electrode 300 and a lower electrode 71 are disposed to face each other with a dielectric film 75 interposed therebetween. The capacitor electrode 300 and the lower electrode 71 are an example of the “pair of electrodes” according to the first aspect of the present invention. The extending portion of the capacitor electrode 300 is electrically connected to the relay layer 600 through a contact hole 84 that penetrates the second interlayer insulating film 42.

  For example, the capacitor electrode 300 and the lower electrode 71 are formed by laminating a single metal containing at least one of metals such as Al, Ti, Cr, W, Ta, and Mo, an alloy, a metal silicide, a polysilicide, and a nitride. Consists of things. For this reason, the channel region 1a ′ of the TFT 30 can be more reliably shielded from incident light from the upper layer side by the storage capacitor 70 that can be disposed close to the data line 6a via the interlayer insulating film 42.

  In addition, as shown in FIG. 5, the capacitor electrode 300 is formed in a region smaller than the lower electrode 71 when viewed in plan on the TFT array substrate 10. That is, since the capacitor electrode 300 is not formed near the edge of the lower electrode 71 through the dielectric film 75, a short circuit may occur due to a manufacturing failure near the edge, or a defect may occur due to electric field concentration. The possibility can be reduced.

As shown in FIG. 5, the dielectric film 75 is formed in a non-opening region located in the gap between the opening regions for each pixel when viewed in plan on the TFT array substrate 10. That is, the dielectric film 75 is hardly formed in the opening region. Therefore, even if the dielectric film 75 is an opaque film, it is not necessary to reduce the transmittance in the opening region. Therefore, the dielectric film 75 is formed of a silicon nitride film or the like having a high dielectric constant without considering the transmittance. For this reason, the dielectric film 75 can also function as a film for preventing moisture and moisture, and can also improve water resistance and moisture resistance. In addition to the silicon nitride film, for example, a single layer film or a multilayer film such as hafnium oxide (HfO ₂ ), alumina (Al ₂ O ₃ ), tantalum oxide (Ta ₂ O ₅ ) or the like is used as the dielectric film. Also good.

(Fifth layer configuration-pixel electrode, etc.)
A third interlayer insulating film 43 is formed on the entire surface of the fourth layer, and a pixel electrode 9a is formed thereon as a fifth layer. The third interlayer insulating film 43 is made of, for example, NSG. In addition, the third interlayer insulating film 43 can be made of silicate glass such as PSG, BSG, or BPSG, silicon nitride, silicon oxide, or the like. The surface of the third interlayer insulating film 43 is subjected to a planarization process such as CMP similarly to the second interlayer insulating film 42.

  The pixel electrode 9a (the outline is indicated by a broken line 9a 'in FIG. 5) is arranged in each of the pixel areas that are partitioned and arranged vertically and horizontally, and the data lines 6a and the scanning lines 11a are arranged in a grid pattern at the boundaries. (See FIGS. 4 and 5). The pixel electrode 9a is made of a transparent conductive film such as ITO (Indium Tin Oxide).

  The pixel electrode 9a is electrically connected to the extending portion of the capacitor electrode 300 through a contact hole 85 that penetrates the interlayer insulating film 43 (see FIG. 7). Therefore, the potential of the capacitor electrode 300 which is the conductive film directly below the pixel electrode 9a is the pixel potential. Therefore, the pixel potential is not adversely affected by the parasitic capacitance between the pixel electrode 9a and the underlying conductive film during the operation of the liquid crystal device.

  Further, as described above, the extended portion of the capacitor electrode 300 and the relay layer 600 are electrically connected to the relay layer 600 and the high-concentration drain region 1e of the TFT 30 through the contact holes 84 and 83, respectively. . That is, the pixel electrode 9a and the high-concentration drain region 1e of the TFT 30 are relay-connected through the relay layer 600 and the extended portion of the capacitor electrode 300. Accordingly, it is possible to avoid a situation in which it is difficult to connect the pixel electrode and the drain with a single contact hole due to a long interlayer distance. In addition, the laminated structure and the manufacturing process are not complicated. An alignment film 16 that has been subjected to a predetermined alignment process such as a rubbing process is provided above the pixel electrode 9a. The above is the configuration of the pixel portion on the TFT array substrate 10 side.

  On the other hand, the counter substrate 20 is provided with a counter electrode 21 on the entire surface of the counter substrate 20, and an alignment film 22 is further provided thereon (under the counter electrode 21 in FIG. 7). As with the pixel electrode 9a, the counter electrode 21 is made of a transparent conductive film such as an ITO film. A light-shielding film 23 is provided between the counter substrate 20 and the counter electrode 21 so as to cover at least a region facing the TFT 30 in order to prevent generation of light leakage current in the TFT 30.

  A liquid crystal layer 50 is provided between the TFT array substrate 10 thus configured and the counter substrate 20. The liquid crystal layer 50 is formed by sealing liquid crystal in a space formed by sealing the peripheral portions of the substrates 10 and 20 with a sealing material. The liquid crystal layer 50 takes a predetermined alignment state by the alignment film 16 and the alignment film 22 that have been subjected to an alignment process such as a rubbing process in a state where an electric field is not applied between the pixel electrode 9 a and the counter electrode 21. It is like that.

  The configuration of the pixel portion described above is common to each pixel portion as shown in FIGS. Such pixel portions are periodically formed in the image display region 10a (see FIG. 1). On the other hand, in such a liquid crystal device 1, as described with reference to FIGS. 1 and 2, the scanning line driving circuit 104, the data line driving circuit 101, and the like are provided in the peripheral area located around the image display area 10 a. A drive circuit is formed.

  In the liquid crystal device 1 having such a pixel portion 72, the capacitor electrode 300, the lower electrode 71, and the data line 6a are an example of “a plurality of metal films” according to the first invention of the present invention. The capacitor electrode 300, the lower electrode 71 and the data line 6a are formed in different layers on the TFT array substrate 10, and the capacitor electrode 300 formed in the uppermost layer among the capacitor electrode 300, the lower electrode 71 and the data line 6a. Is an example of “one metal film” according to the first aspect of the present invention. In the present embodiment, the capacitor electrode 300 is selected as an example of the “light-shielding conductive film” according to the first invention of the present invention.

  The light shielding film 54 shown in FIGS. 1 and 2 is formed as the same film in the same layer as the capacitor electrode 300 on the TFT array substrate 10. Therefore, according to the light shielding film 54, in the peripheral region extending around the image display region 10a, the wiring composed of the metal film formed as the same film in the same layer as the lower electrode 71 and the data line 6a or the metal It is possible to block light applied to various elements including a film. Therefore, the light shielding film 54 can reduce the projection of the pattern image of these wirings or various elements onto the projection screen.

  The light shielding film 54 may not be formed in the same layer as the capacitor electrode 300 formed in the uppermost layer among the plurality of metal films formed on the TFT array substrate 10, for example, around the image display region 10 a. In the extended peripheral region, it may be formed as the same film in the same layer as the lower electrode 71 or the data line 6a, or may be the same film formed in the same layer as the capacitor wiring 400 shown in FIG. Even if the light shielding film 54 is a film formed in the same layer as the metal film formed on the lower layer side of the metal film formed in the uppermost layer among the plurality of metal films, The effect of reducing the projection of the pattern image of the element or the like on the projection screen can be obtained accordingly.

  In addition, since the light shielding film 54 is electrically connected to the vertical conduction terminal 106 via a wiring (not shown), the light shielding film 54 is fixed via the external connection terminal 102 that is electrically connected to a power source that supplies a fixed potential. A potential is supplied. Therefore, when the light shielding film 54 is formed in the same layer as the lower electrode 71, the light shielding film 54 is shared as a wiring for supplying a fixed potential by electrically connecting the lower electrode 71 and the light shielding film 54. It is also possible to supply a fixed potential to the lower electrode 71.

  The liquid crystal device 1 has a metal film formed as the same film in the same layer as the lower electrode 71 and the data line 6a on the TFT array substrate 10 in a peripheral area extending around the image display area 10a. Such a metal film is used as a component of the data line driving circuit 101 or the sampling circuit 7 which is an example of the “peripheral circuit portion” according to the first invention of the present invention shown in FIGS. It is included in the drive circuit 101 or the sampling circuit 7.

  Therefore, according to the liquid crystal device 1, wiring is performed in the peripheral region using a metal film formed in the same layer as that of the light shielding film 54, such as the lower electrode 71 or the data line 6a. Alternatively, various elements, terminals, or the like can be formed, and the pixel portion and the peripheral circuit portion can be formed by the same process while improving the display quality of the liquid crystal device 1. According to such a liquid crystal device 1, the manufacturing cost of the liquid crystal device 1 can be reduced while improving the display quality by simplifying the manufacturing process. In addition, the TFT array substrate 10 can be shielded from light in the peripheral region described above without forming a light shielding film on the dustproof substrate 120a shown in FIG. Therefore, the process of forming the light shielding film on the dustproof substrate 120a can be eliminated, and the manufacturing cost required for manufacturing the liquid crystal device 1 can be reduced.

  Further, according to the light shielding film 54, it is possible to reduce irradiation of light to a transistor such as a TFT included in the data line driving circuit 101 or the sampling circuit 7, and it is also possible to reduce light leakage current generated in the transistor. is there.

  As described above, according to the electro-optical device according to the present embodiment, the display quality of the electro-optical device can be improved, and the cost required for manufacturing the electro-optical device can be reduced.

(Modification 1)
Next, a modification of the electro-optical device according to the present embodiment will be described with reference to FIGS. 8 and 9. In addition, in the liquid crystal device according to each modification and embodiment described below, common reference numerals are assigned to portions common to the liquid crystal device 1, and detailed description thereof is omitted. FIG. 8 is a plan view showing the configuration of the liquid crystal device 1A according to this example, and FIG. 9 is a cross-sectional view taken along the line IX-IX ′ of FIG.

  In FIG. 8, a liquid crystal device 1A according to this example includes a light shielding film 54a formed in a frame region that defines an image display region 10a, and a TFT array substrate is formed by a sealing material 52 disposed outside the light shielding film 54a. 10 and the counter substrate 20 are bonded to each other. The light shielding film 54a is formed in the same layer as the metal film of any one of the capacitor electrode 300, the lower electrode 71, and the data line 6a in the same manner as the light shielding film 54 described above. In order to more effectively reduce the reflection on the projection screen of the data line driving circuit 101 and the like formed in the peripheral area of the image display area 10a, the light shielding film 54a is formed as the same film in the same layer as the capacitor electrode 300. Is preferred.

  Further, as shown in FIG. 8, since the light shielding film 54a is formed so as to cover the scanning line driving circuit 104, the data line driving circuit 101, and the sampling circuit 7, an image of a pattern of each of these circuits is displayed on the projection screen. It can reduce the reflection.

  As shown in FIGS. 8 and 9, the light shielding film 54 a is formed so as not to overlap the sealing material 52. Therefore, when an ultraviolet curable resin is used as the sealing material 52, the ultraviolet light applied to the sealing material 52 in a state where the TFT array substrate 10 and the counter substrate 20 are overlapped with each other is not blocked by the light shielding film 54a. The TFT array substrate 10 and the counter substrate 20 can be bonded to each other with the light shielding film 54 a formed on the array substrate 10. In addition, since the image display region 10a can be defined by the light shielding film 54a, it is not necessary to separately provide a frame light shielding film, and the manufacturing cost of the electro-optical device can be reduced.

(Modification 2)
Next, another modification of the electro-optical device according to the present embodiment will be described with reference to FIGS. 10 and 11. FIG. 10 is a plan view showing the configuration of the liquid crystal device 1B according to this example, and FIG. 11 is a cross-sectional view taken along the line XI-XI ′ of FIG.

  As shown in FIGS. 10 and 11, in the liquid crystal device 1B according to this example, the light shielding film is not formed on the counter substrate 20 in the peripheral region extending around the image display region 10a, and on the TFT array substrate 10 side. It is characterized in that it has a light shielding film 54 b that overlaps with the sealing material 52.

  10 and 11, the light shielding film 54b extends over the entire outside of the image display amount region 10a in which the pixel electrodes 9a are arranged in the region where the TFT array substrate 10 and the counter substrate 20 overlap each other, and The seal member 52 is extended below. The light shielding film 54 b covers the data line driving circuit 101, the sampling circuit 7, the scanning line driving circuit 104, and the lead wiring 90 formed on the TFT array substrate 10. Therefore, according to the liquid crystal device 1B, in the peripheral region of the image display region 10a, the circuit portion such as the data line driving circuit 101 excluding the external circuit connection terminal 102 and the entire lead wiring 90 are covered with the light shielding film 54b. Therefore, even if a light shielding film is not provided on the counter substrate 20 side in the peripheral region, the light incident on the TFT array substrate 10 can be reduced, and the data line driving circuit 101 and the like can be reduced from being projected onto the projection screen. is there. Furthermore, according to this modification, the light-shielding film 54a also serves as the counter electrode potential line 99 in FIG. 1, and the number of wirings can be reduced.

Second Embodiment
Next, an embodiment of the electro-optical device according to the second invention of the present invention will be described with reference to FIGS. The electro-optical device according to the present embodiment is different from the electro-optical device according to the first embodiment in the configuration of the pixel unit, and thus the configuration of the pixel unit will be described in detail. FIG. 12 is a plan view of a liquid crystal device 1 </ b> C that is an example of the electro-optical device according to the present embodiment. 13 and 14 are partial plan views illustrating a specific configuration of the electro-optical device according to the present embodiment. FIG. 15 is a cross-sectional view taken along the line XV-XV ′ of FIGS. 13 and 14.

<2-1: Overall configuration of electro-optical device>
In FIG. 12, the liquid crystal device 1C includes a light shielding film 54c that overlaps with a peripheral region extending around the image display region 10a, similarly to the light shielding film 54 shown in FIG. As will be described later, the light-shielding film 54c is a light-shielding conductive film formed as the same film in the same layer as the capacitor wiring 400 formed on the TFT array substrate 10, and extends from the image display region 10a to the peripheral region. Be present. Therefore, according to the light shielding film 54c, similarly to the light shielding films 54, 54a and 54b described in the first embodiment, light incident on the TFT array substrate 10 can be shielded in the peripheral area of the image display area 10a. It is possible to reduce the pattern image of the wiring, various elements, and circuit portions formed on the projection screen.

<2-2: Specific Configuration of Pixel Unit>
13 to 15, the pixel electrode 9 a is formed on the TFT array substrate 10. The circuit elements included in the electro-optical device according to the present embodiment are provided to drive the pixel electrode 9a. Here, the scanning line is stacked in a range from directly above the TFT array substrate 10 to immediately below the pixel electrode 9a. 11a to the fourth interlayer insulating film 44 (see FIG. 15). A pixel electrode 9a (indicated by a broken line 9a 'in the figure) is arranged in each of the pixel areas partitioned vertically and horizontally, and the data lines 6a and the scanning lines 11a are arranged in a grid at the boundaries. (See FIGS. 13 and 14).

  The patterned conductive film constituting each circuit element includes a first layer including the scanning line 11a, a second layer including the gate electrode 3a, a third layer including the fixed potential side capacitor electrode of the storage capacitor 70, and data from the bottom. The fourth layer includes the line 6a and the like, and the fifth layer includes the capacitor wiring 400 and the like which are an example of the “light-shielding conductive film” of the present invention. Further, the base insulating film 12 is provided between the first layer and the second layer, the first interlayer insulating film 41 is provided between the second layer and the third layer, the second interlayer insulating film 42 is provided between the third layer and the fourth layer, and the fourth layer. A third interlayer insulating film 43 is provided between the layer and the fifth layer, and a fourth interlayer insulating film 44 is provided between the fifth layer and the pixel electrode 9a to prevent the above-described elements from being short-circuited. . Of these, the first to third layers are shown in FIG. 13 as lower layer portions, and the fourth, fifth, and pixel electrodes 9a are shown in FIG. 14 as upper layer portions.

(Structure of the first layer-scanning line, etc.)
The first layer is composed of scanning lines 11a. The scanning line 11a is patterned into a shape including a main line portion extending in the X direction in FIG. 13 and a protruding portion extending in the Y direction in FIG. 13 in which the data line 6a or the capacitor wiring 400 extends. Such a scanning line 11a is made of, for example, conductive polysilicon, and in addition, a metal simple substance, an alloy, a metal silicide, a polysilicon containing at least one of refractory metals such as Ti, Cr, W, Ta, and Mo. It can be formed of silicide or a laminate thereof.

(Structure of the second layer-TFT etc.)
The second layer includes the TFT 30 and the relay electrode 719. The TFT 30 has an LDD (Lightly Doped Drain) structure, for example, and includes a gate electrode 3a, a semiconductor layer 1a, and an insulating film 2 including a gate insulating film that insulates the gate electrode 3a from the semiconductor layer 1a. The gate electrode 3a is made of, for example, conductive polysilicon. The semiconductor layer 1a includes a channel region 1a ′, a low concentration source region 1b and a low concentration drain region 1c, and a high concentration source region 1d and a high concentration drain region 1e. The TFT 30 preferably has an LDD structure. However, the TFT 30 may have an offset structure in which no impurity is implanted into the low concentration source region 1b and the low concentration drain region 1c. It may be a self-aligned type in which a high concentration source region and a high concentration drain region are formed by implanting the film. The relay electrode 719 is formed as the same film as the gate electrode 3a, for example.

  The gate electrode 3 a of the TFT 30 is electrically connected to the scanning line 11 a through a contact hole 12 cv formed in the base insulating film 12. The base insulating film 12 is made of, for example, a silicon oxide film, and is formed on the entire surface of the TFT array substrate 10 in addition to the interlayer insulating function between the first layer and the second layer. Has a function of preventing changes in the element characteristics of the TFT 30 caused by the above.

(Structure of third layer-holding capacity, etc.)
The third layer is composed of a storage capacitor 70. The storage capacitor 70 has a configuration in which a capacitor electrode 300 and a lower electrode 71 are arranged to face each other with a dielectric layer 75 interposed therebetween. Among these, the capacitor electrode 300 is electrically connected to the capacitor wiring 400. The lower electrode 71 is electrically connected to each of the high concentration drain region 1e of the TFT 30 and the pixel electrode 9a.

  The lower electrode 71 and the high concentration drain region 1e are connected through a contact hole 83 opened in the first interlayer insulating film 41. Further, the lower electrode 71 and the pixel electrode 9 a are relayed through contact layers 881, 882, 804, the relay electrode 719, the second relay electrode 6 a 2, and the third relay electrode 402, and are electrically connected in the contact hole 89. Has been.

  For example, conductive polysilicon is used for the lower electrode 71, and silicon oxide is used for the dielectric layer. The capacitor electrode 300 has a single layer structure or a multilayer structure including a metal film such as aluminum. Note that the capacitor electrode 300 may have a two-layer structure in which titanium nitride is stacked on a metal film. Further, the capacitor electrode 300 may be made of conductive polysilicon.

  The first interlayer insulating film 41 is made of, for example, NSG (non-silicate glass). In addition, for the first interlayer insulating film 41, silicate glass such as PSG (phosphorus silicate glass), BSG (boron silicate glass), BPSG (boron phosphorus silicate glass), silicon nitride, silicon oxide, or the like can be used.

  As can be seen from the plan view of FIG. 13, the storage capacitor 70 in this case is formed so as not to reach the pixel region substantially corresponding to the formation region of the pixel electrode 9a (so as to be within the light shielding region). Therefore, the aperture ratio of the pixel is kept relatively large.

(Fourth layer configuration-data lines, etc.)
The fourth layer is composed of data lines 6a. The data line 6a has a single layer structure including a metal film such as aluminum or a multilayer structure. The data line 6a may be formed as a three-layer film of aluminum, titanium nitride, and silicon nitride in order from the bottom. The silicon nitride layer is patterned to a slightly larger size so as to cover the lower aluminum layer and titanium nitride layer. In the fourth layer, the capacitor wiring relay layer 6a1 and the second relay electrode 6a2 are formed as the same film as the data line 6a. These are formed so as to be divided as shown in FIG. The data line 6a, the capacitor electrode 300, and the capacitor wiring 400 described later constitute an example of “a plurality of metal films” according to the first invention of the present invention.

  The data line 6 a is electrically connected to the high concentration source region 1 d of the TFT 30 through a contact hole 81 that penetrates the first interlayer insulating film 41 and the second interlayer insulating film 42.

  The capacitor wiring relay layer 6a1 is electrically connected to the capacitor electrode 300 through a contact hole 801 formed in the second interlayer insulating film 42, and relays between the capacitor electrode 300 and the capacitor wiring 400. . As described above, the capacitor wiring relay layer 6 a 2 is electrically connected to the relay electrode 719 through the contact hole 882 that penetrates the first interlayer insulating film 41 and the second interlayer insulating film 42. Such an interlayer insulating film 42 can be formed of, for example, silicate glass such as NSG, PSG, BSG, or BPSG, silicon nitride, silicon oxide, or the like.

(Fifth layer configuration-capacitive wiring, etc.)
The fifth layer includes the capacitor wiring 400 and the third relay electrode 402 selected as an example of the “light-shielding conductive film” according to the first aspect of the present invention. The capacitor wiring 400 is a conductive film formed in the uppermost layer on the TFT array substrate 10 among the data line 6a, the capacitor electrode 300, and the capacitor wiring 400. The capacitor wiring 400 extends on the TFT array substrate 10 from the image display region 10a to the peripheral region of the image display region 10a, and is set to a fixed potential by being electrically connected to a constant potential source. As shown in FIG. 14, the capacitor wiring 400 is formed in a lattice shape extending in the X direction and the Y direction, and in order to secure a formation region of the third relay electrode 402 in a portion extending in the X direction. Notches are provided. The capacitor wiring 400 is formed wider than the structure of these circuit elements so as to cover the data lines 6a, the scanning lines 11a, the TFTs 30 and the like in the lower layer. Thereby, each circuit element is shielded from light, and adverse effects such as reflection of incident light and blurring of pixel outlines in a projected image are prevented.

  Further, the corner portion where the X-direction extending portion and the Y-direction extending portion of the capacitor wiring 400 just intersect each other has a shape such that a substantially triangular collar portion protrudes slightly. With this flange, light can be effectively shielded from the semiconductor layer 1a of the TFT 30. That is, the light entering the semiconductor layer 1a from obliquely above is reflected or absorbed by the collar portion, thereby suppressing the occurrence of light leakage current in the TFT 30 and displaying a high-quality image free from flicker or the like. It becomes possible.

  The capacitor wiring 400 is electrically connected to the capacitor wiring relay layer 6a1 through the contact hole 803 opened in the third interlayer insulating film 43. In the fourth layer, the third relay electrode 402 is formed as the same film as the capacitor wiring 400. As described above, the third relay electrode 402 relays between the second relay electrode 6a2 and the pixel electrode 9a via the contact hole 804 and the contact hole 89. The capacitor wiring 400 and the third relay electrode 402 have a two-layer structure in which, for example, aluminum and titanium nitride are stacked.

  A fourth interlayer insulating film 44 is formed on the entire surface of the fourth layer. In the fourth interlayer insulating film 44, a contact hole 89 for electrically connecting the pixel electrode 9a and the third relay electrode 402 is opened. The contact hole 89 electrically connects the pixel electrode 9a and the third relay electrode 402 formed on the lower layer side of the pixel electrode 9a.

  In the liquid crystal device 1C having the pixel portion as described above, the light shielding film 54c shields light incident on the TFT array substrate 10 in the peripheral region of the image display region 10a. Therefore, the pattern image of the data line driving circuit 101 can be reduced from being projected onto the projection screen.

  By forming the light shielding film 54c with the same layout pattern as the light shielding films 54a and 54b described in the first and second modifications in the first embodiment, the light irradiated to the sampling circuit 7 and the scanning line driving circuit 104 is also emitted. The light can be shielded, and the pattern image of these circuit portions can be reduced from being projected onto the projection screen. The light shielding film 54c preferably has an antireflection film in order to reduce the reflected light reflected by the light shielding film 54c. For the same reason, the OD value of the light shielding film 54c is preferably 4 or more.

  According to the liquid crystal device 1C, in the peripheral region of the image display region 10a on the TFT array substrate 10, it is formed in the same layer as the semiconductor layer such as the gate electrode 3a formed on the lower layer side of the capacitor wiring 400 or the lower electrode 71. The semiconductor layer can be shared as a part of the peripheral circuit portion such as the data line driving circuit 101, the scanning line driving circuit 104, or the sampling circuit 7. Therefore, the step of forming the pixel portion and the step of forming the peripheral circuit portion such as the data line driving circuit 101 can be shared, and the step of manufacturing the liquid crystal device 1C can be simplified.

<Third Embodiment>
Next, a liquid crystal device 1D which is an example of an electro-optical device according to the second invention of the present invention will be described with reference to FIG. FIG. 16 is a plan view showing the configuration of the liquid crystal device 1D according to this embodiment.

  In FIG. 16, the liquid crystal device 1 </ b> D is not provided with the vertical conduction terminal 106 as compared with the liquid crystal device 1 </ b> B illustrated in FIG. 10, and is a light shield electrically connected to the external circuit connection terminal 102 that supplies the counter electrode potential. The film 54d is characterized in that it also serves as a vertical conduction terminal and a common electrode potential line.

  The light shielding film 54d is formed in the same layer as the capacitor electrode 300 in the first embodiment, and the counter electrode formed on the counter substrate 20 side in a state where the TFT array substrate 10 and the counter substrate 20 are bonded to each other. It contacts and is electrically connected to the counter electrode. Therefore, the TFT array substrate 10 and the counter substrate 20 are electrically connected via the light shielding film 54d, and the light shielding film 54d is shared as the counter electrode potential line in the TFT array substrate 10.

  According to the liquid crystal device 1D, the incidence of light from the peripheral region of the image display region 10a to the circuit portion of the TFT array substrate 10 can be reduced, and the number of wirings formed on the TFT array substrate 10 can be reduced. In addition, since the vertical conduction terminal for electrically connecting the TFT array substrate 10 and the counter substrate 20 becomes unnecessary, the step of forming the vertical conduction terminal can be eliminated, and the manufacturing process of the liquid crystal device 1D can be simplified. . In addition, similarly to the liquid crystal device according to the first embodiment, light incident on the TFT array substrate 10 from the peripheral region of the image display region 10a can be shielded, and a circuit unit or the like formed in the peripheral region of the TFT array substrate 10 is projected. Projection on the curtain can be reduced.

(Electronics)
Next, the case where the above-described liquid crystal device is applied to various electronic devices will be described.

  First, a projector using this liquid crystal device as a light valve will be described. FIG. 17 is a plan view showing a configuration example of the projector. As shown in FIG. 17, a projector 1100 includes a lamp unit 1102 made of a white light source such as a halogen lamp. The projection light emitted from the lamp unit 1102 is separated into three primary colors of RGB by four mirrors 1106 and two dichroic mirrors 1108 arranged in the light guide 1104, and serves as a light valve corresponding to each primary color. The light enters the liquid crystal panels 1110R, 1110B, and 1110G.

  The configurations of the liquid crystal panels 1110R, 1110B, and 1110G have the same configuration as that of the above-described liquid crystal device, and are driven by R, G, and B primary color signals supplied from the image signal processing circuit, respectively. The light modulated by these liquid crystal panels enters the dichroic prism 1112 from three directions. In this dichroic prism 1112, R and B light is refracted at 90 degrees, while G light travels straight. Accordingly, as a result of the synthesis of the images of the respective colors, a color image is projected onto the screen or the like via the projection lens 1114.

  Here, paying attention to the display images by the liquid crystal panels 1110R, 1110B, and 1110G, the display image by the liquid crystal panel 1110G needs to be horizontally reversed with respect to the display images by the liquid crystal panels 1110R, 1110B.

  Note that since light corresponding to the primary colors R, G, and B is incident on the liquid crystal panels 1110R, 1110B, and 1110G by the dichroic mirror 1108, it is not necessary to provide a color filter.

  According to such a projector 1100, it is possible to display a high-quality image because the pattern image of the data line driving circuit and the like formed on the liquid crystal panels 1110R, 1110B and 1110G is reduced. It is.

  DESCRIPTION OF SYMBOLS 1, 1A, 1B, 1C, 1D ... Liquid crystal device, 10 ... TFT array substrate, 20 ... Counter substrate, 72 ... Pixel part, 53 ... Frame light shielding film, 54, 54a, 54b , 54c, 54d...

Claims (12)

A sealing material for bonding the element substrate and the counter substrate;
A frame light-shielding film provided on the counter substrate so as to surround the display area;
On the element substrate, on the outside of the frame light shielding film, a data line driving circuit provided inside the outer edge of the sealing material;
A sampling circuit provided between the data line driving circuit and the display area;
An electro-optical device comprising: a light-shielding film that overlaps with the sampling circuit and extends toward the data line driving circuit side . The electro-optical device according to claim 1, wherein the light shielding film is provided so as to cover a space between the sampling circuit and the data line driving circuit. The electro-optical device according to claim 1, wherein the light shielding film is provided so as not to overlap the sealing material. On the counter substrate , provided with a pixel electrode provided in the display area and a counter electrode disposed to be opposed to the display area ,
The electro-optical device according to claim 1, wherein a potential of the light shielding film is the same as a potential of the counter electrode. The electro-optical device according to claim 4 , wherein the light shielding film is electrically connected to the counter electrode. In the element substrate, the outside from the light-shielding film is formed regions, according to any one of claims 1 to 3, characterized in that it comprises the light shielding film and electrically connected to the input terminal Electro-optic device. On the element substrate , comprising one metal film formed in the uppermost layer among a plurality of metal films formed in different layers ,
The light-shielding film, an electro-optical device according to any one of claims 1 6, wherein a first metal film of the same film. Wherein the data line driving circuit and the sampling circuit, electrical of claim 7, characterized in that it comprises another metal film and a metal film formed in the same layer which is formed on the lower layer side of the first metal film Optical device. Wherein the data line driving circuit and the sampling circuit, an electro-optical device according to claim 7, characterized in that it comprises a semiconductor film and a semiconductor film formed in the same layer which is formed on the lower layer side of the first metal film . The light-shielding film, an electro-optical device according to any one of claims 1, characterized in that it includes a light reflection preventing film 9. The OD value of the light-shielding film, an electro-optical device according to any one of claims 1 to 9, characterized in that 4 or more. An electronic device characterized by being provided with the electro-optical device according to any one of claims 1 to 11.

Images