JP4951271B2 - 基板検査装置 - Google Patents

基板検査装置 Download PDF

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Publication number
JP4951271B2
JP4951271B2 JP2006132778A JP2006132778A JP4951271B2 JP 4951271 B2 JP4951271 B2 JP 4951271B2 JP 2006132778 A JP2006132778 A JP 2006132778A JP 2006132778 A JP2006132778 A JP 2006132778A JP 4951271 B2 JP4951271 B2 JP 4951271B2
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JP
Japan
Prior art keywords
illumination light
substrate
levitation stage
stage
scattering plate
Prior art date
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Expired - Fee Related
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JP2006132778A
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English (en)
Japanese (ja)
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JP2006343327A (ja
JP2006343327A5 (https=
Inventor
修哉 城ヶ崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
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Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP2006132778A priority Critical patent/JP4951271B2/ja
Publication of JP2006343327A publication Critical patent/JP2006343327A/ja
Publication of JP2006343327A5 publication Critical patent/JP2006343327A5/ja
Application granted granted Critical
Publication of JP4951271B2 publication Critical patent/JP4951271B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2006132778A 2005-05-12 2006-05-11 基板検査装置 Expired - Fee Related JP4951271B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006132778A JP4951271B2 (ja) 2005-05-12 2006-05-11 基板検査装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005139515 2005-05-12
JP2005139515 2005-05-12
JP2006132778A JP4951271B2 (ja) 2005-05-12 2006-05-11 基板検査装置

Publications (3)

Publication Number Publication Date
JP2006343327A JP2006343327A (ja) 2006-12-21
JP2006343327A5 JP2006343327A5 (https=) 2009-06-25
JP4951271B2 true JP4951271B2 (ja) 2012-06-13

Family

ID=37640371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006132778A Expired - Fee Related JP4951271B2 (ja) 2005-05-12 2006-05-11 基板検査装置

Country Status (1)

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JP (1) JP4951271B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100903530B1 (ko) * 2007-02-09 2009-06-23 주식회사 탑 엔지니어링 어레이 테스트 장비
KR100890282B1 (ko) * 2007-02-09 2009-03-24 주식회사 탑 엔지니어링 어레이 테스트 장비
CN101936916A (zh) * 2009-07-02 2011-01-05 法国圣-戈班玻璃公司 检测分离的低刚度的透明或半透明体的缺陷的设备和方法
JP2011075401A (ja) * 2009-09-30 2011-04-14 Hitachi High-Technologies Corp インライン基板検査装置の光学系校正方法及びインライン基板検査装置
TWI458587B (zh) * 2012-01-17 2014-11-01 Chin Yen Wang 位置校正裝置
JP6199585B2 (ja) * 2013-03-21 2017-09-20 住友化学株式会社 レーザー光照射装置及び光学部材貼合体の製造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002181714A (ja) * 2000-12-19 2002-06-26 Ishikawajima Harima Heavy Ind Co Ltd 薄板検査装置
JP3669323B2 (ja) * 2001-11-20 2005-07-06 Ｊｆｅスチール株式会社 表面検査装置
JP2003270155A (ja) * 2002-03-15 2003-09-25 Olympus Optical Co Ltd 基板保持装置及び検査装置
JP4307872B2 (ja) * 2003-03-18 2009-08-05 オリンパス株式会社 基板検査装置

Also Published As

Publication number Publication date
JP2006343327A (ja) 2006-12-21

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