JP4939304B2 - Method and apparatus for measuring film thickness of transparent film - Google Patents

Method and apparatus for measuring film thickness of transparent film Download PDF

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JP4939304B2
JP4939304B2 JP2007137967A JP2007137967A JP4939304B2 JP 4939304 B2 JP4939304 B2 JP 4939304B2 JP 2007137967 A JP2007137967 A JP 2007137967A JP 2007137967 A JP2007137967 A JP 2007137967A JP 4939304 B2 JP4939304 B2 JP 4939304B2
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measurement
light
transparent film
optical
film thickness
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JP2008292296A (en
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克一 北川
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東レエンジニアリング株式会社
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  The present invention relates to a transparent film thickness measurement method and apparatus for measuring a film thickness of a measurement object such as a plastic film or a glass substrate covered with a transparent film, and in particular, partially on the surface of the measurement object. The present invention also relates to a technique for accurately obtaining the thickness of a transparent film formed at a non-uniform height in a short time.

  As a conventional means of this type, an apparatus that uses an interferometer to determine the film thickness of a multilayer film having transparency that is an object to be measured has been proposed. Specifically, in order to transmit and receive light back and forth through the film, a film is disposed between the irradiation device and the non-transparent rearview mirror, the light reflected by the mirror and transmitted and received through the film, and the reference mirror side. The reflected light reflected and returned is combined to cause interference. The envelope of the interference fringe waveform at this time is obtained, the peak position is detected, and the peak position information and the peak interval time are counted to measure the individual film thicknesses of the multilayer film.

JP 59-131106 A

However, the conventional means has the following problems.
That is, the conventional means needs to acquire in advance a predetermined condition such as the surface height of the rearview mirror in order to obtain the film thickness of the film. That is, it is necessary to perform preliminary measurement of only the rearview mirror and actual measurement after setting the film before setting and measuring the film, and there is a problem that the measurement becomes complicated and processing time is required. In addition, the position variation of the rearview mirror that occurs between the two measurements becomes a measurement error, making accurate measurement difficult.

  The present invention has been made in view of such circumstances, and uses an interferometer to accurately measure the thickness of a transparent film partially formed on the surface of a transparent optical member in a short time. The main object of the present invention is to provide a method and apparatus for measuring the thickness of a transparent film.

In order to achieve such an object, the present invention has the following configuration.
That is, the first invention is a transparent film thickness measuring method for measuring the thickness of a transparent film formed on the surface of an object to be measured using an interferometer,
The measurement object is an object in which a transparent film is partially formed on the surface of a transparent optical member,
A process of predetermining a scanning range in which a peak of an interference fringe waveform generated by light reflected from the back surface and the reference surface of the optical member when irradiating light to the measurement surface and the reference surface of the measurement object;
Irradiate light to the measurement surface and the reference surface of the measurement object, and change the interference fringes by reflected light reflected from both surfaces and returning from the same optical path while relatively changing the distance between the measurement surface and the reference surface. A process of acquiring an image of the measurement surface while generating
A process of obtaining a change in the intensity value group of interference light at each pixel of the acquired plurality of images,
The process of obtaining the position information of the peak of the interference fringe waveform generated on the back surface of the optical member from the obtained intensity value group of the interference light,
The process of obtaining the distribution of the back surface height of the optical member from the position information;
The process of obtaining the deviation of the back surface height of the coating part and the exposed part of the transparent film,
A process of obtaining a film thickness of the transparent film based on a predetermined refractive index of the transparent film and a deviation of the height of the back surface;
It is provided with.

  (Function / Effect) According to this method, the scanning range in which the peak of the interference fringe waveform is determined in advance by both reflected light reflected and returned from the back surface of the optical member and the reference surface, and an image of the measurement surface is obtained in the scanning range. By acquiring, the peak position information of the back surface is obtained for each pixel. By using the peak position information and the sample point interval that is the imaging interval, the height of the back surface of the optical member that is the measurement surface can be obtained.

  In addition, in a predetermined region of the measurement object, a deviation between the back surface height of the covered portion and the exposed portion of the transparent film is obtained, and the deviation is converted into the surface height of the transparent film. That is, since the coated portion has an optical path length longer than that of the exposed portion due to the influence of the refractive index of the transparent film, the back surface height of the coated portion appears lower than that of the exposed portion. Therefore, based on this phenomenon, the deviation from the covering portion is obtained with the exposed portion as a reference. By obtaining the absolute value of this deviation, it can be converted into the surface height of the convex portion which is the covering portion with the exposed portion as a reference.

  Furthermore, the film thickness can be obtained from the obtained surface height and the known refractive index of the transparent film. As described above, the surface height and film thickness of the transparent film formed on the surface of the optical member can be determined accurately and at high speed by one measurement.

According to a second invention, in the first method invention,
A compensation plate made of the same sample as the optical member is disposed on the reciprocating optical path of the light on the reference surface side, and the influence of the refractive index and thickness of the optical member is corrected.

  (Operation / Effect) According to this method, the reflected light from the measurement surface and the reflected light from the reference surface are affected by the refractive index and thickness of the same optical member. That is, since the measurement conditions are the same, the influence of the refractive index and thickness of the optical member can be canceled. That is, the measurement accuracy can be improved.

According to a third aspect of the invention, illumination means for irradiating light to a measurement surface and a reference surface of a measurement object covered with a transparent film, variation means for changing the distance between the measurement surface and the reference surface, and light irradiation Reflection light reflected from both surfaces as the distance between the measurement surface and the reference surface changes, and interference fringes are changed by reflected light returning from the same optical path, and imaging means for imaging the measurement surface, and on the imaged measurement surface Sampling means for capturing the intensity values of interference light at a plurality of locations, storage means for storing a group of interference light intensity values that are a plurality of intensity values for each location captured by the sampling means, and each of the storage means stored in the storage means A film thickness measuring device for a transparent film, comprising a calculation means for obtaining the film thickness of the transparent film at a specific location based on the interference light intensity value group,
The measurement object is an object in which a transparent film is partially formed on the surface of a transparent optical member,
When the measurement surface and the reference surface of the measurement object are irradiated with light, the scanning range in which the peak of the interference fringe waveform generated by the reflected light from the back surface and the reference surface of the optical member is determined in advance,
The sampling means reflects interference light in the scanning range in accordance with a change in interference fringes caused by reflected light that is reflected from both surfaces and returns on the same optical path as the distance between the measurement surface and the reference surface is changed by the changing means. Intensity values are taken sequentially at sampling intervals,
The storage means stores an interference light intensity value group that is a plurality of captured intensity values,
The calculation means obtains the film thickness of the transparent film on the measurement surface according to the following process: (1) Obtains a change in the intensity value group of the interference light in each pixel of the obtained plurality of images,
(2) Find the position information of the peak of the interference fringe waveform generated on the back surface of the optical member from the obtained intensity value group of the interference light,
(3) Obtaining the distribution of the back surface height of the optical member from the position information,
(4) Find the deviation of the back surface height of the coating portion and the exposed portion of the transparent film,
(5) The thickness of the transparent film is obtained based on a predetermined refractive index of the transparent film and the deviation.

  (Operation and Effect) According to this configuration, the first method invention can be suitably realized.

The fourth invention is the apparatus invention according to the third aspect,
A compensator made of the same sample as the optical member is disposed on the reciprocal optical path of the light on the reference surface side.

  (Operation / Effect) According to this configuration, the second method invention can be suitably realized.

  According to the transparent film thickness measuring method and apparatus therefor according to the present invention, the surface height and film thickness of the transparent film formed on the surface of the optical member are obtained by a single measurement using an interferometer. be able to.

  Embodiments of the present invention will be described below with reference to the drawings.

  FIG. 1 is a diagram showing a schematic configuration of a surface shape measuring apparatus capable of measuring the film thickness of a transparent film in which a transparent film is partially formed on the surface of the optical member of the present invention.

  This surface shape measuring apparatus is an optical system that irradiates, for example, white light in a specific frequency band onto a surface of a measuring object 30 having transparency, such as a plastic film or a glass substrate, partially covered with a transparent film 31. A unit 1 and a control system unit 2 for controlling the optical system unit 1 are provided.

  The optical system unit 1 includes a light source 10 that generates white light that irradiates the measurement target 30 and the reference surface 15 (reference mirror), a collimator lens 11 that converts the white light from the light source 10 into parallel light, and a collimator lens 11. A half mirror 13 that reflects white light in the direction of the measurement object 30 while allowing white light from the direction of the measurement object 30 to pass through, and an objective lens 14 that condenses the white light reflected by the half mirror 13. The white light that has passed through the objective lens 14 is divided into reference light that reflects to the reference surface 15 and measurement light that passes to the transparent film 31, and the reference light reflected on the reference surface 15 and the measurement object 30 side. The measuring beam reflected from the beam is again put together to generate an interference fringe, and the imaging lens 1 forms an image of white light in which the reference beam and the measuring beam are combined. When it is configured by a CCD camera 19 for imaging the surface of the measuring object 30 with the interference fringes.

  The light source 10 is, for example, a white light lamp, and generates white light having a relatively wide frequency band. The white light generated from the light source 10 is converted into parallel light by the collimating lens 11 and reaches the half mirror 13. In addition, as a light source, it is not limited to the light source 10, Monochromatic light may be sufficient. The light source 10 corresponds to the illumination means of the present invention.

  The half mirror 13 reflects the white light that has become the parallel light from the collimator lens 13 toward the direction of the measurement object 30, while allowing the white light that has returned from the direction of the measurement object 30 to pass therethrough. White light reflected by the half mirror 13 enters the objective lens 14.

  The objective lens 14 is a lens that condenses incident white light toward a focal point. The white light condensed by the objective lens 14 passes through the reference surface 15 and reaches the beam splitter 17.

  The beam splitter 17 reflects the white light collected by the objective lens 14 on the reference surface 15, for example, the reference light reflected on the upper surface of the beam splitter 17 and the measurement surface of the measurement object 30. The beam is divided into measurement light that passes through the beam splitter 17. Further, interference fringes are generated by combining the reference light and the measurement light again. The white light reaching the beam splitter 17 is divided into reference light reflected by the upper surface of the beam splitter 17 and measurement light passing through the beam splitter 17. The reference light reaches the reference surface 15 and the measurement light reaches the measurement surface.

  A mirror for reflecting the reference light in the direction of the beam splitter 17 is attached to the reference surface 15, the reference light reflected by the mirror reaches the beam splitter 17, and this reference light is further reflected by the beam splitter. 17 is reflected.

  The measurement light that has passed through the beam splitter 17 is condensed toward the back surface 30A of the optical member 30 that is the measurement surface, and is reflected by the back surface 30A. Each reflected measurement light reaches the beam splitter 17 and passes through the beam splitter 17.

  The beam splitter 17 combines the reference light and the measurement light again. At this time, an optical path difference is generated due to the difference in distance between the distance L1 between the reference surface 15 and the beam splitter 17 and the distance L2 between the beam splitter 17 and the measurement target surface 30A. According to this optical path difference, the reference light and the measurement light interfere with each other, thereby generating interference fringes. The white light in the state where the interference fringes are generated passes through the half mirror 13, is imaged by the imaging lens 18, and enters the CCD camera 19.

  The CCD camera 19 captures an image in the vicinity of the measurement surface projected by the measurement light, together with white light in a state where interference fringes are generated. The captured image data is collected by the control system unit 2. Further, as will be apparent later, for example, the optical system unit 1 is vertically and horizontally changed by the drive unit 24 of the control system unit 2 corresponding to the changing means of the present invention. In particular, the distance between the distance L1 and the distance L2 is changed by driving the optical system unit 1 in the vertical direction. As a result, the interference fringes gradually change according to the difference in distance between the distance L1 and the distance L2. The CCD camera 19 captures an image of the surface along with a change in interference fringe at predetermined sampling intervals described later, and the image data is collected by the control system unit 2. The CCD camera 19 corresponds to the image pickup means in the present invention.

  The control system unit 2 performs overall control of the entire surface shape measuring apparatus and CPU 20 for performing predetermined calculation processing, and various data such as image data sequentially collected by the CPU 20 and calculation results by the CPU 20. A memory 21 to be stored, an input unit 22 such as a mouse or a keyboard for inputting a sampling interval and other setting information, a monitor 23 for displaying an image of a measurement surface, and the optical system unit 1 up and down according to instructions from the CPU 20 For example, the computer system includes a drive unit 24 including a drive mechanism such as a three-axis drive type servo motor that drives right and left. The CPU 20 corresponds to sampling means and arithmetic means in the present invention, the memory 21 corresponds to storage means in the present invention, and the drive unit 25 corresponds to fluctuation means in the present invention.

  The CPU 20 is a so-called central processing unit that controls the CCD camera 19, the memory 21, and the drive unit 24, and based on the image data of the measurement surface including the interference fringes imaged by the CCD camera 19, the back surface of the optical member 30. Various arithmetic processes for obtaining the thickness of 30A, the transparent film 31, and the like are performed. This process will be described later in detail.

  Further, a monitor 23 and an input unit 22 such as a keyboard and a mouse are connected to the CPU 20, and the operator can observe various operation information displayed on the monitor 23 from the input unit 22. Input. On the monitor 23, after the measurement of the transparent film 31, the step (uneven shape) formed on the surface of the optical member 30 is displayed as a numerical value or an image.

  The drive unit 24 has a difference in distance between a fixed distance L1 between the reference surface 15 in the optical system unit 1 and the beam splitter 17 and a variable distance L2 between the beam splitter 17 and the measurement target surface 30A. Is a device that varies the optical system unit 1 in three orthogonal axes, and drives the optical system unit 1 in the X, Y, and Z directions according to instructions from the CPU 20, for example, a three-axis drive type servo motor It is comprised with the drive mechanism provided with. The drive unit 24 corresponds to the changing means in the present invention, and the relative distance in the present invention indicates the distance from the reference surface 15 to the measurement target surface 30A, that is, the distance L1 and the distance L2. In this embodiment, the optical system unit 1 is operated. For example, a table (not shown) on which the measurement object 30 is placed may be varied in the three orthogonal axes.

  Hereinafter, the processing performed by the entire surface shape measuring apparatus of the present embodiment will be specifically described with reference to the flowchart of FIG. In this embodiment, it is assumed that a resist film is formed as the transparent film 31 on the surface of the measurement object 30 which is a glass substrate.

<Step S1> Condition Setting Various conditions such as a scanning speed and a scanning range for moving the optical system unit in the z-axis direction shown in FIG. 1 are set. In this embodiment, for example, the scanning speed, the sampling point interval shown in FIGS. 3 and 4, the scanning range, and the number of images acquired by the CCD camera 19 are set. The scanning range is set to a range in which the peak of the interference fringe waveform generated by the reflected light from the back surface 30A of the optical member 30 can be detected based on the thickness of the optical member 30 and the fluctuation distances L1 and L2.

<Step S <b>2> Acquisition of Measurement Data The optical system unit 1 irradiates the measurement object 30 and the reference surface 15 with white light generated from the light source 10.

  Further, the CPU 20 gives the drive unit 24 a change start instruction for starting movement of the optical system unit 1 that has been moved to a predetermined measurement location in the z-axis direction. The drive unit 24 drives a drive system such as a stepping motor (not shown) to move the optical system unit 1 by a predetermined distance in the z-axis direction. Thereby, the distances L1 and L2 between the reference surface 15 and both surfaces on the measurement object side are changed.

  Each time the optical system unit 1 moves by the sampling interval, the CPU 20 images the measurement surface in a predetermined area including both the surface of the measurement object 30 including the interference fringes imaged by the CCD camera 19 and the surface of the transparent film 31. Data is collected and sequentially stored in the memory 21. By moving the optical system unit 1 by a predetermined operation range, the memory 21 stores a plurality of pieces of image data determined by the moving distance and the sampling interval of the optical system unit 1.

<Step S3> Acquire a group of interference light intensity values at a specific location. For example, while observing the transparent film 31 to be measured displayed on the monitor 23, the operator wants to measure the thickness of the transparent film 31. The part or the entire surface is input and set from the input unit 22. The CPU 20 grasps the plurality of specific locations that have been input and sets the density values of pixels corresponding to the plurality of specific locations, that is, the intensity values of the interference light at the specific locations, as a plurality of image data stored in step S2. From each. Thereby, a plurality of intensity values (interference light intensity value group) at each specific location are obtained.

<Step S4> Obtaining the Peak Position from the Intensity Value As shown in FIG. 3, the CPU 20 obtains the average value of the intensity values of the interference light based on the interference light intensity value group at the specific location obtained discretely. Further, each value (adjustment value group) obtained by subtracting the average value from each intensity value of the interference light intensity value group is obtained.

  The adjustment value is further squared to obtain a characteristic value in which the intensity value is emphasized on the plus side as shown in FIG.

<Step S5> Calculation of Back Surface Height Distribution The CPU 20 calculates the back surface height of the optical member 30 from the peak position P shown in FIG. That is, assuming that the back surface height is S, the back surface height S is calculated for each pixel by the equation S = P × sample point interval. The back surface height S calculated in pixel units is created as distribution data in a predetermined range captured by the CCD camera 19.

  For example, when approximately half of the right side is covered with the transparent film 31 as shown in FIG. 5, the profile of the back surface height S shown in FIG. 6 is created. That is, the coated portion S2 of the transparent film 31 has an optical path length that is longer by (n−1) * t than the region of the exposed portion S1 due to the influence of the refractive index n and the film thickness t, and an optical path difference occurs. Therefore, the back surface height S of the covering portion S2 appears lower than the exposed portion S2, as indicated by a two-dot chain line in FIG.

<Step S6> Calculation of Optical Path Difference Distribution When the distribution of the back surface height S is created, a deviation (hereinafter referred to as “step” as appropriate) between the exposed portion S1 and the covered portion S2 is calculated with the exposed portion S1 as a reference. , Find its absolute value. That is, as shown in FIG. 7, it is converted into an optical path difference generated in the covering portion S2 when the exposed portion S1 is used as a reference.

<Step S7> Calculation of Film Thickness Since the calculated optical path difference includes the influence of the refractive index n of the transparent film 31, the optical film thickness is determined using the known refractive index n (n = 1.66). Dividing by −1, the physical film thickness t from which the influence of the refractive index shown in FIG. 8 is removed is calculated.

<Step S8> Display As shown in FIG. 9, the CPU 20 displays information on the physical film thickness of the transparent film 31 to be measured on the monitor 23 as a three-dimensional image. The operator can grasp the film thickness distribution of the transparent film 31 by observing these displays.

  According to the embodiment described above, when the transparent object 31 is partially formed on the measuring object 30 that is an optical member having transparency, the back surface of the optical member is used for each pixel in both regions using an interferometer. By detecting only the position information of the peak of the interference fringe waveform generated at 30A and using the position information, the back surface height S of the optical member can be obtained. Further, the back surface height S of the covering portion S2 of the transparent film 31 appears lower than the exposed portion S1 because the optical path length becomes longer than the exposed portion S1 due to the influence of the refractive index of the transparent film 31. Based on this phenomenon, the optical path difference (deviation) can be obtained from the value of the back surface height S. Further, the physical film thickness obtained by removing the influence of the refractive index of the transparent film 31 from the known refractive index of the transparent film 31 and the obtained optical path difference can be obtained.

  That is, the film thickness of the transparent film 31 formed on the surface of the optical member can be accurately obtained by one measurement.

  The present invention is not limited to the above-described embodiment, and can be modified as follows.

  (1) In the above embodiment, the optical member of the measuring object 30 is placed on the optical path between the beam splitter 17 and the reference surface 15 as shown in FIG. It is preferable to measure by inserting a compensation plate 40 of the same member as in FIG.

  According to this configuration, it is possible to measure the thickness of the transparent film 31 with high accuracy in which the influence of the thickness and refractive index of the optical member on the measurement object side is removed.

  (2) In the above embodiment, the CCD camera 19 is used as the imaging means. However, in view of imaging (detecting) only the intensity value of the interference light at a specific location, for example, the light reception configured in a line or in a planar shape. An imaging means such as an element can also be configured.

  (3) The above embodiment may use a light source capable of outputting monochromatic light as the light source of the optical system unit 1. In this case, when obtaining the back surface height distribution from the interference light intensity value group, it is possible to detect the phase information of the interference waveform and perform the back surface height measurement with higher accuracy.

It is a figure which shows schematic structure of the surface shape measuring apparatus which concerns on a present Example. It is a flowchart which shows the process in a surface shape measuring apparatus. It is explanatory drawing for demonstrating the process which calculates | requires the peak position of a specific function. It is explanatory drawing for demonstrating the process which calculates | requires the peak position of a specific function. It is a cross-sectional view of the measurement region of the measurement object. It is a figure which shows distribution of the back surface height of an optical member. It is a figure which shows distribution of the surface height of the calculated transparent film. It is a figure which shows the film thickness of the calculated transparent film. It is a figure which shows the three-dimensional image of the surface level | step difference of a measuring object. It is a figure which shows schematic structure of a modification apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Optical system unit 2 ... Control system unit 10 ... Light source 11 ... Collimating lens 13 ... Half mirror 14 ... Objective lens 15 ... Reference surface 17 ... Beam splitter 18 ... Imaging lens 19 ... CCD camera 20 ... CPU
21 ... Memory 24 ... Drive unit 30 ... Measurement object (optical member)
31 ... Transparent film

Claims (4)

  1. A method for measuring a film thickness of a transparent film that measures the film thickness of a transparent film formed on the surface of an object to be measured using an interferometer,
    The measurement object is an object in which a transparent film is partially formed on the surface of a transparent optical member,
    A process of predetermining a scanning range in which a peak of an interference fringe waveform generated by light reflected from the back surface and the reference surface of the optical member when irradiating light to the measurement surface and the reference surface of the measurement object;
    Irradiate light to the measurement surface and the reference surface of the measurement object, and change the interference fringes by reflected light reflected from both surfaces and returning from the same optical path while relatively changing the distance between the measurement surface and the reference surface. A process of acquiring an image of the measurement surface while generating
    A process of obtaining a change in the intensity value group of interference light at each pixel of the acquired plurality of images,
    The process of obtaining the position information of the peak of the interference fringe waveform generated on the back surface of the optical member from the obtained intensity value group of the interference light,
    The process of obtaining the distribution of the back surface height of the optical member from the position information;
    The process of obtaining the deviation of the back surface height of the coating part and the exposed part of the transparent film,
    A process of obtaining a film thickness of the transparent film based on a predetermined refractive index of the transparent film and a deviation of the height of the back surface;
    A method for measuring a film thickness of a transparent film, comprising:
  2. In the film thickness measuring method of the transparent film according to claim 1,
    A film thickness measurement of a transparent film, wherein a compensation plate made of the same sample as the optical member is arranged on a reciprocal optical path of light on the reference surface side, and the influence of the refractive index and thickness of the optical member is corrected. Method.
  3. Illumination means for irradiating light to the measurement surface and the reference surface of the measurement object covered with the transparent film, fluctuating means for changing the distance between the measurement surface and the reference surface, and the measurement surface and the reference surface irradiated with light The interference fringe is changed by the reflected light that is reflected from both surfaces and returns on the same optical path as the distance varies, and the imaging means for imaging the measurement surface, and the interference light at multiple locations on the measured measurement surface Sampling means for capturing intensity values, storage means for storing each interference light intensity value group that is a plurality of intensity values for each location captured by the sampling means, and each interference light intensity value group stored in the storage means A film thickness measuring device for a transparent film comprising a calculation means for obtaining the film thickness of the transparent film at a specific location based on
    The measurement object is an object in which a transparent film is partially formed on the surface of a transparent optical member,
    When the measurement surface and the reference surface of the measurement object are irradiated with light, the scanning range in which the peak of the interference fringe waveform generated by the reflected light from the back surface and the reference surface of the optical member is determined in advance,
    The sampling means reflects interference light in the scanning range in accordance with a change in interference fringes caused by reflected light that is reflected from both surfaces and returns on the same optical path as the distance between the measurement surface and the reference surface is changed by the changing means. Intensity values are taken sequentially at sampling intervals,
    The storage means stores an interference light intensity value group that is a plurality of captured intensity values,
    The calculation means obtains the film thickness of the transparent film on the measurement surface according to the following process: (1) Obtains a change in the intensity value group of the interference light in each pixel of the obtained plurality of images,
    (2) Find the position information of the peak of the interference fringe waveform generated on the back surface of the optical member from the obtained intensity value group of the interference light,
    (3) Obtaining the distribution of the back surface height of the optical member from the position information,
    (4) Find the deviation of the back surface height of the coating portion and the exposed portion of the transparent film,
    (5) A transparent film thickness measuring apparatus, wherein the film thickness of the transparent film is obtained based on a predetermined refractive index and the deviation of the transparent film.
  4. In the transparent film thickness measuring apparatus according to claim 3,
    An apparatus for measuring a film thickness of a transparent film, comprising a compensation plate made of the same sample as the optical member on a reciprocal optical path of light on the reference surface side.
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