JP4923784B2 - Color filter drawing method - Google Patents

Description

  The present invention relates to a color filter drawing method, and more particularly to correction of a second layer pattern after formation of a black matrix in manufacturing a color filter used in a large color liquid crystal display device.

  Conventionally, in the manufacture of large color filters used in large color liquid crystal display devices, as a problem in the photolithography process, the cost for producing a large exposure mask is large in a batch exposure method using an original large exposure mask. There is. In order to solve this problem, an exposure method that does not require a large exposure mask has been developed, in which an exposure machine equipped with a plurality of exposure heads is used and scanning exposure is performed using a small exposure mask paired with each exposure head. ing. Such an exposure method is described in Patent Document 1 and Patent Document 2, for example.

However, the black matrix (first layer) formed by the step-and-repeat exposure method has a problem that pattern distortion occurs every shot exposure. For example, when the pattern for the second and subsequent layers is formed by a scanning exposure (drawing) apparatus having a plurality of heads, as shown in FIG. 8, four alignment marks M are added on the substrate 31 to correct the pitch. However, it is not possible to perform accurate exposure for forming the second and subsequent layers in accordance with the distortion of the black matrix pattern 32. For example, when a six-shot black matrix pattern 32 is formed on the substrate 31, the upper and lower four black matrix patterns 32 are present in the second and subsequent layers in consideration of distortion because of the presence of four alignment marks M. However, since the alignment mark M does not exist for the two black matrix patterns 32 in the central portion, the distortion of the black matrix pattern 32 is not considered at all.
JP 2000-347020 A JP 2005-331542 A

  The present invention is a color filter which is made under the circumstances as described above and can form the second and subsequent patterns with high alignment accuracy following the distortion of the black matrix pattern formed by step exposure. An object of the present invention is to provide a drawing method.

In order to solve the above-mentioned problem, the first aspect of the present invention is to form a black matrix pattern by step-exposure of a black matrix pattern on a substrate and to form a plurality of alignment marks on the outside of the black matrix pattern of each shot. Forming, reading alignment marks on the substrate to obtain distortion data indicating the degree of distortion of the black matrix pattern of each shot, and exposure moving in the scanning direction using a scanning exposure apparatus having a plurality of exposure heads In the color filter drawing method comprising the step of performing scan exposure for forming the second and subsequent patterns on the substrate on the stage, the exposure for forming the second and subsequent patterns is performed by Shot black matrix pattern distortion data Depending on the data, by performing while slightly moved in the direction perpendicular to the exposure stage in the scanning direction, the second and subsequent layers of the pattern, in a direction perpendicular to the scanning direction is corrected by dividing each distortion data A color filter drawing method is provided.

According to a second aspect of the present invention, the black matrix pattern is step-exposed on the substrate to form the black matrix pattern, and a plurality of alignment marks are formed outside the black matrix pattern of each shot. On the substrate on the stage moving in the scanning direction using a scanning exposure apparatus having a plurality of exposure heads, and obtaining distortion data indicating the degree of distortion of the black matrix pattern of each shot. In a color filter drawing method including a step of performing scan exposure for forming a pattern after the layer, exposure for forming the pattern after the second layer is performed by using distortion data of the black matrix pattern of each shot. In accordance with the plurality of exposure steps. By performing the entire head while slightly moved in a direction perpendicular to the scanning direction, the second and subsequent layers of the pattern, in a direction perpendicular to the scanning direction, and correcting by dividing into each strain data A method for drawing a color filter is provided.

According to a third aspect of the present invention, a step of stepwise exposing a black matrix pattern on a substrate to form a black matrix pattern, and forming a plurality of alignment marks outside the black matrix pattern of each shot, On the substrate on the stage that moves in the scanning direction using a scanning exposure apparatus that includes a step of obtaining the distortion data indicating the degree of distortion of the black matrix pattern of each shot, and a scanning exposure apparatus including a plurality of exposure heads. In the color filter drawing method including the step of performing scan exposure for forming the pattern after the layer, the position of the stage in the scanning direction is set before the exposure for forming the pattern after the second layer. Black matrix pattern for each shot Corrected based on the data of the strain of over emissions, the exposure for forming the second layer and subsequent pattern, in response to said strain data of the black matrix pattern in each shot, while changing the moving speed of the exposure stage By performing this, there is provided a color filter drawing method characterized in that the second and subsequent layers of the pattern are divided and corrected for each distortion data in the scanning direction.

According to a fourth aspect of the present invention, a step of stepwise exposing a black matrix pattern on a substrate to form a black matrix pattern, and forming a plurality of alignment marks outside the black matrix pattern of each shot, On the substrate on the stage that moves in the scanning direction using a scanning exposure apparatus that includes a step of obtaining the distortion data indicating the degree of distortion of the black matrix pattern of each shot, and a scanning exposure apparatus including a plurality of exposure heads. In a color filter drawing method including a step of performing scan exposure with a laser shot pulse for forming a pattern after a layer, before exposure for forming a pattern after the second layer, a stage in a scanning direction is formed. The position is Corrected based on the distortion of the data collected by the black matrix pattern, the exposure for forming the second and subsequent layers of patterns, depending the on strain data of the black matrix pattern in each shot, the laser shot pulse off time The color filter drawing method is characterized in that the pattern in the second and subsequent layers is corrected for each distortion data in the scanning direction by performing the process while changing the value.

According to a fifth aspect of the present invention, a step of stepwise exposing a black matrix pattern on a substrate to form a black matrix pattern, and forming a plurality of alignment marks outside the black matrix pattern of each shot, On the substrate on the stage that moves in the scanning direction using a scanning exposure apparatus that includes a step of obtaining the distortion data indicating the degree of distortion of the black matrix pattern of each shot, and a scanning exposure apparatus including a plurality of exposure heads. in the process of drawing a color filter comprising a step of performing the scanning exposure for forming a layer subsequent pattern during scanning of the stage, on the basis of the position of the stage in the scanning direction the data in distortion of the black matrix pattern in each shot Correct, the exposure for forming the second and subsequent layers of pattern, in response to said strain data of the black matrix pattern in each shot, by performing the whole of the plurality of exposure heads while slightly moved in the scanning direction, There is provided a color filter drawing method characterized in that the second and subsequent layers are corrected by dividing each pattern in the scanning direction for each distortion data.

  In the color filter drawing method according to the first to fifth aspects of the present invention described above, a plurality of portions of the black matrix pattern itself of each shot are aligned instead of the plurality of alignment marks outside the black matrix pattern. It can be used as a mark.

  According to the present invention, when a black matrix pattern formed by step exposure is subjected to scanning exposure by an exposure apparatus including a plurality of exposure heads to form a pattern for the second and subsequent layers, the black matrix pattern of each shot is formed. Even if there is distortion, the exposure stage or exposure head is moved in a direction perpendicular to the scanning direction according to the distortion, or the exposure stage moving speed or the laser shot pulse off time is changed to scan the exposure head. By making a slight movement in the direction, it is possible to follow the distortion of the black matrix pattern of each shot, correct the second and subsequent layers, and form a predetermined pattern with high alignment accuracy.

  The best mode for carrying out the invention will be described below with reference to the drawings.

  FIG. 9 is a perspective view showing an exposure apparatus used in a color filter drawing method according to an embodiment of the present invention. In FIG. 9, a plurality of exposure heads 3 are juxtaposed in parallel in a certain direction via a small mask 22 on an exposed region of a substrate 1 arranged on a stage 21. Under these exposure heads 3, the substrate scans in the Y direction, and laser light 42 sent from a laser oscillator 41 is irradiated to an exposed area on the substrate 1 through the exposure head 3 and the small mask 22, and exposure is performed. Done.

  In this exposure apparatus, alignment marks M attached to the substrate 1 are formed only at the four corners of the substrate for illustration, but in reality, two are formed for each black matrix pattern of each shot. ) And a stage-head calibration camera 15 for reading the alignment mark 17 formed on the stage 21 are disposed.

  FIG. 10 shows the optical path of the exposure head. A laser beam 42 sent from a laser oscillator (not shown) is split by a beam splitter 43 with a laser beam sent to another exposure head, and the first mirror / lens system 44, the small mask 22, the second mask The region to be exposed on the substrate 1 is irradiated through the mirror / lens system 45 and the seal glass 46.

  In the present invention, exposure for forming the second and subsequent layers is performed following the distortion of the black matrix pattern of each shot. The second and subsequent patterns include an RGB coloring pattern, MVA, a photo spacer, and the like. In the following embodiments, a case where an RGB coloring pattern is formed will be described.

  FIG. 1 is a diagram for explaining a color filter drawing method according to the first embodiment of the present invention. In this embodiment, following the distortion of the black matrix pattern of each shot, the second and subsequent layers in the direction orthogonal to the scanning direction are corrected.

  As shown in FIG. 1, six black matrix patterns 2 are formed by six shots on a large glass substrate 1 placed on an exposure stage using a step exposure method. At that time, two or more (two in the figure) alignment marks M1 and M2 are formed outside the black matrix pattern 2 for each shot. In the figure, reference numeral 3 denotes an exposure head.

  Next, an RGB pattern is formed on the black matrix pattern 2 thus formed using an exposure apparatus including a head gantry (not shown) in which a plurality of exposure heads 3 are arranged in a horizontal row. The exposure for forming the RGB pattern is performed by dividing and exposing the exposure stage on which the glass substrate 1 is placed under the head gantry into three for every two alignment marks.

  At that time, the alignment marks M1 and M2 are read by a camera (not shown) attached to the head gantry to grasp the degree of distortion of the black matrix pattern 2 for each shot, and the RGB pattern is followed accordingly. Form.

  That is, the exposure stage on which the substrate 1 is placed is orthogonal to the scanning direction corresponding to the distortion data of the black matrix pattern 2 obtained by reading the alignment marks M1 and M2 for the exposure for forming the RGB pattern. This is performed while moving slightly in the direction of movement (in the direction of the arrow in the figure). As a result, it is possible to perform exposure for forming an RGB pattern that is corrected following the distortion of the black matrix pattern 2 in the direction orthogonal to the scanning direction. In FIG. 1, reference numeral 4 indicates an RGB pattern region.

  In FIG. 1, two alignment marks are used for each shot, and the RGB pattern is divided into three to perform correction. However, the number of alignment marks can be further increased, and further division correction can be performed. Further, the number of alignment marks can be increased for each shot, and correction can be made with a value averaged between them.

  FIG. 2 is a diagram for explaining a color filter drawing method according to the second embodiment of the present invention. In the present embodiment, as in the first embodiment, following the distortion of the black matrix pattern of each shot, the second and subsequent patterns in the direction orthogonal to the scanning direction are corrected.

  As shown in FIG. 2, six black matrix patterns 2 are formed by six shots using a step exposure method on a large glass substrate 1 placed on an exposure stage. The formation of two or more (two in the drawing) alignment marks M1, M2 outside the matrix pattern 2 is the same as in the first embodiment.

  Next, on the black matrix pattern 2 formed in this way, an RGB pattern is formed by dividing and exposing three in every two alignment marks. At this time, by reading the alignment marks M1 and M2, After grasping the degree of distortion of the black matrix pattern 2 for each shot, divided exposure is performed to form an RGB pattern.

  That is, the exposure for forming the RGB pattern corresponds to the distortion data of the black matrix pattern 2 obtained by reading the alignment marks M1 and M2, and the entire exposure head, that is, the head gantry 5 is orthogonal to the scanning direction. It is performed while moving slightly in the direction (the direction of the arrow in the figure). As a result, it is possible to perform exposure for forming an RGB pattern that is corrected following the distortion of the black matrix pattern 2 in the direction orthogonal to the scanning direction.

  In FIG. 2, two alignment marks are used for each shot, and the RGB pattern is divided into three for correction. However, the number of alignment marks can be further increased and finer division correction can be performed. Further, the number of alignment marks can be increased for each shot, and correction can be made with a value averaged between them.

  FIG. 3 is a diagram for explaining a color filter drawing method according to the third embodiment of the present invention. In the present embodiment, following the distortion of the black matrix pattern of each shot, the second and subsequent layers in the scanning direction are corrected.

  As shown in FIG. 3, six black matrix patterns 2 are formed in six shots using a step exposure method on a large glass substrate 1 placed on an exposure stage. The formation of two or more (two in the drawing) alignment marks M1, M2 outside the matrix pattern 2 is the same as in the first embodiment.

  Next, an RGB pattern is formed on the black matrix pattern 2 formed in this manner. At this time, the degree of distortion of the black matrix pattern 2 for each shot is grasped by reading the alignment marks M1 and M2. After that, each of the two alignment marks is divided and exposed in three to form an RGB pattern.

  That is, before the exposure for forming the RGB pattern, the position of the exposure stage in the scanning direction is corrected based on the distortion data of the black matrix pattern 2 obtained by reading the alignment marks M1 and M2, and at the same time the exposure time is constant. An exposure start position and a completion position are calculated for each of the divided exposures, and the scanning speed of the exposure stage is corrected.

  For example, in the example shown in FIG. 3, of the six black matrix patterns, the two black matrix patterns in the scanning direction front (upper part in the figure) are black matrix patterns that are ideal lattices, and the two black matrix patterns in the center portion. Are two large black matrix patterns, and the two black matrix patterns behind the scanning direction (lower part in the figure) are small black matrix patterns.

  In such a black matrix pattern, when the exposure start position and the completion position, that is, the interval between the two alignment marks is wide (the size of the black matrix pattern 2 is large-the central black matrix pattern), the exposure stage is scanned. When the speed is increased and the distance between the two alignment marks is narrow (the size of the black matrix pattern 2 is small—the rear black matrix pattern), correction is performed so as to decrease the scanning speed of the exposure stage.

  As a result, it is possible to perform exposure for forming an RGB pattern corrected following the distortion of the black matrix pattern 2 in the scanning direction.

  FIG. 4 is a diagram for explaining a color filter drawing method according to the fourth embodiment of the present invention. In the present embodiment, similar to the third embodiment, correction of the second and subsequent layers in the scanning direction is performed following the distortion of the black matrix pattern of each shot.

  As shown in FIG. 4, six black matrix patterns 2 are formed in six shots using a step exposure method on a large glass substrate 1 placed on an exposure stage. The formation of two or more (two in the drawing) alignment marks M1, M2 outside the matrix pattern 2 is the same as in the first embodiment.

  Next, an RGB pattern is formed on the black matrix pattern 2 formed in this manner. At this time, the degree of distortion of the black matrix pattern 2 for each shot is grasped by reading the alignment marks M1 and M2. After that, each of the two alignment marks is divided and exposed in three to form an RGB pattern.

  That is, before the exposure for forming the RGB pattern, the position of the exposure stage in the scanning direction is corrected based on the distortion data of the black matrix pattern 2 obtained by reading the alignment marks M1 and M2, and at the same time for each divided exposure. The exposure start position and the completion position are calculated, and the OFF time of the laser shot pulse is corrected.

  For example, when the interval between two alignment marks is wide, that is, when the black matrix pattern is larger than the ideal lattice (the central black matrix pattern), the off-time of the laser shot pulse is increased and the two alignment marks are aligned. When the interval between marks is narrow, that is, when the black matrix pattern is small with respect to the ideal lattice (rear black matrix pattern), the off time of the laser shot pulse is shortened. Note that the speed of the exposure stage is constant.

  As a result, it is possible to perform exposure for forming an RGB pattern corrected following the distortion of the black matrix pattern 2 in the scanning direction.

  FIG. 5 is a diagram for explaining a color filter drawing method according to the fifth embodiment of the present invention. In the present embodiment, similar to the third embodiment, correction of the second and subsequent layers in the scanning direction is performed following the distortion of the black matrix pattern of each shot.

  As shown in FIG. 5, six black matrix patterns 2 are formed in six shots using a step exposure method on a large glass substrate 1 placed on an exposure stage. The formation of two or more (two in the drawing) alignment marks M1, M2 outside the matrix pattern 2 is the same as in the first embodiment.

  Next, an RGB pattern is formed on the black matrix pattern 2 formed in this manner. At this time, the degree of distortion of the black matrix pattern 2 for each shot is grasped by reading the alignment marks M1 and M2. After that, each of the two alignment marks is divided and exposed in three to form an RGB pattern.

  That is, during scanning of the exposure stage, the position of the exposure stage in the scanning direction is corrected based on the distortion data of the black matrix pattern 2 obtained by reading the alignment marks M1 and M2, and at the same time the exposure start position for each divided exposure. The completion position is calculated, and the entire exposure head is finely moved in the scanning direction or in the opposite direction corresponding to the calculated completion position.

  For example, when the interval between two alignment marks is wide, that is, when the black matrix pattern is larger than the ideal lattice (the central black matrix pattern), the entire exposure head is moved slightly in the scanning direction. When the interval between the alignment marks is wide, that is, when the black matrix pattern is small with respect to the ideal lattice (rear black matrix pattern), the entire exposure head is slightly moved in the direction opposite to the scanning direction.

  As a result, it is possible to perform exposure for forming an RGB pattern corrected following the distortion of the black matrix pattern 2 in the scanning direction.

  FIG. 6 shows the exposure area 4 of the RGB pattern, but the area indicated by the broken line is a case where the exposure head is not moved minutely. By moving the exposure head slightly in the direction opposite to the scanning direction, the exposure area is a solid line. Reduce to the area indicated by.

  The case where two alignment marks are formed outside the black matrix pattern of each shot has been described above. However, the present invention is not limited to this. For example, the black matrix pattern is not formed outside the black matrix pattern. It is also possible to use a part of itself as an alignment mark. Such an example is shown in FIG.

  FIG. 7A shows a part of the black matrix pattern 2 having a black lattice shape. As shown in FIG. 7B in which the part A is enlarged, the corner B of the black matrix pattern 2 is used as an alignment mark. Considering this, the distortion of the black matrix pattern can be measured by matching with the reticle pattern P attached to the camera. The portion regarded as the alignment mark is not limited to the corner portion of the black matrix pattern, but a corner portion that is a part that can be easily detected is preferable for grasping the distortion of the black matrix pattern.

FIG. 4 is a diagram for explaining correction of an RGB pattern according to the first embodiment of the present invention. The figure explaining correction | amendment of the RGB pattern which concerns on the 2nd Embodiment of this invention. The figure explaining correction | amendment of the RGB pattern which concerns on the 3rd Embodiment of this invention. The figure explaining correction | amendment of the RGB pattern which concerns on the 4th Embodiment of this invention. The figure explaining correction | amendment of the RGB pattern which concerns on the 5th Embodiment of this invention. The figure which shows the change of the RGB pattern area | region by moving an exposure head minutely. The figure which shows the state match | combined with the pattern of the board | substrate alignment camera, using the corner part of a black matrix pattern as an alignment mark. The top view which shows the state in which the black matrix pattern and the alignment mark were formed on the conventional large sized glass substrate using the step exposure method. FIG. 11 is a perspective view illustrating an exposure apparatus used for a color filter drawing method according to one embodiment of the present invention. The figure which shows the optical path of the exposure head shown in FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1, 31 ... Large glass substrate, 2, 32 ... Black matrix pattern, 3 ... Exposure head, 4 ... Exposure area, 5 ... Head gantry, 13 ... Alignment camera, 15 ... Stage-head calibration camera, 41 ... Laser oscillator , 42 ... laser light, 43 ... beam splitter, 44 ... first mirror / lens system, 45 ... second mirror / lens system, 46 ... seal glass.

Claims (6)

A step of exposing the black matrix pattern on the substrate to form a black matrix pattern and forming a plurality of alignment marks outside the black matrix pattern of each shot,
Reading the alignment mark on the substrate, obtaining distortion data indicating the degree of distortion of the black matrix pattern of each shot, and using a scanning exposure apparatus having a plurality of exposure heads, the exposure stage moving in the scanning direction In a color filter drawing method comprising a step of performing a scan exposure for forming a pattern for the second and subsequent layers on a substrate,
The exposure for forming the second and subsequent layers is performed while finely moving the exposure stage in a direction perpendicular to the scanning direction according to the distortion data of the black matrix pattern of each shot. A color filter drawing method, wherein a pattern after a layer is divided and corrected for each distortion data in a direction orthogonal to a scanning direction. A step of exposing the black matrix pattern on the substrate to form a black matrix pattern and forming a plurality of alignment marks outside the black matrix pattern of each shot,
Reading the alignment mark on the substrate, obtaining distortion data indicating the degree of distortion of the black matrix pattern of each shot, and using the scanning exposure apparatus comprising a plurality of exposure heads, the substrate on the stage moving in the scanning direction In a color filter drawing method comprising a step of performing a scan exposure for forming a pattern on the second layer and thereafter on the top,
By performing the exposure for forming the second and subsequent patterns while finely moving the entire plurality of exposure heads in a direction perpendicular to the scanning direction according to the distortion data of the black matrix pattern of each shot. A color filter drawing method, wherein the pattern after the second layer is divided and corrected for each distortion data in a direction orthogonal to the scanning direction. A step of exposing the black matrix pattern on the substrate to form a black matrix pattern and forming a plurality of alignment marks outside the black matrix pattern of each shot,
Reading the alignment mark on the substrate, obtaining distortion data indicating the degree of distortion of the black matrix pattern of each shot, and using the scanning exposure apparatus comprising a plurality of exposure heads, the substrate on the stage moving in the scanning direction In a color filter drawing method comprising a step of performing a scan exposure for forming a pattern on the second layer and thereafter on the top,
Before the exposure for forming the second and subsequent layers, the stage position in the scanning direction is corrected based on the distortion data of the black matrix pattern of each shot to form the second and subsequent layers. Exposure is performed while changing the moving speed of the exposure stage according to the distortion data of the black matrix pattern of each shot, so that the pattern on the second layer and thereafter is scanned for each distortion data in the scanning direction. A method of drawing a color filter, characterized by dividing and correcting. A step of exposing the black matrix pattern on the substrate to form a black matrix pattern and forming a plurality of alignment marks outside the black matrix pattern of each shot,
Reading the alignment mark on the substrate, obtaining distortion data indicating the degree of distortion of the black matrix pattern of each shot, and using the scanning exposure apparatus comprising a plurality of exposure heads, the substrate on the stage moving in the scanning direction In a color filter drawing method comprising a step of performing scan exposure with a laser shot pulse for forming a pattern of the second and subsequent layers thereon,
Before the exposure for forming the second and subsequent layers, the stage position in the scanning direction is corrected based on the distortion data of the black matrix pattern of each shot to form the second and subsequent layers. Exposure is performed while changing the off time of the laser shot pulse according to the distortion data of the black matrix pattern of each shot, so that the second and subsequent layers can be subjected to distortion data in the scanning direction. A method of drawing a color filter, wherein the correction is performed by dividing the color filter. A step of exposing the black matrix pattern on the substrate to form a black matrix pattern and forming a plurality of alignment marks outside the black matrix pattern of each shot,
Reading the alignment mark on the substrate, obtaining distortion data indicating the degree of distortion of the black matrix pattern of each shot, and using the scanning exposure apparatus comprising a plurality of exposure heads, the substrate on the stage moving in the scanning direction In a color filter drawing method comprising a step of performing a scan exposure for forming a pattern on the second layer and thereafter on the top,
During scanning of the stage, the stage position in the scanning direction is corrected based on the distortion data of the black matrix pattern of each shot, and exposure for forming the second and subsequent layers is performed using the black matrix pattern of each shot. depending on the strain data, by performing while slightly moved across said plurality of exposure heads scanning direction, characterized in that the second and subsequent layers of the pattern in the scanning direction is corrected by dividing each distortion data Color filter drawing method.   6. The color according to claim 1, wherein a plurality of portions of the black matrix pattern itself of each shot are used as alignment marks in place of the plurality of alignment marks outside the black matrix pattern. How to draw the filter.

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