JP4922186B2 - 小さい光学的層厚さ、狭い滞留時間分布および多い処理量で光化学プロセスを連続的に実施するためのデバイス - Google Patents
小さい光学的層厚さ、狭い滞留時間分布および多い処理量で光化学プロセスを連続的に実施するためのデバイス Download PDFInfo
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- JP4922186B2 JP4922186B2 JP2007552554A JP2007552554A JP4922186B2 JP 4922186 B2 JP4922186 B2 JP 4922186B2 JP 2007552554 A JP2007552554 A JP 2007552554A JP 2007552554 A JP2007552554 A JP 2007552554A JP 4922186 B2 JP4922186 B2 JP 4922186B2
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- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00783—Laminate assemblies, i.e. the reactor comprising a stack of plates
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
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- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00851—Additional features
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- B01J2219/0086—Dimensions of the flow channels
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
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Description
d90%=1/(εc)
(ε=吸光係数、c=濃度)
(i)流体側とは反対の側部からガラス・プレートを支持し、対抗圧力を加え、それゆえ、ガラス・プレートが撓む(又は曲がる)ことを防止すると共に、
(ii)照射線が入射されるための開口部を備えている。
2:O−リング
3:石英ガラス・プレート
4:石英ガラス・プレートのためのフランジ部品
5:支持要素(ゴムマット)
6:支持要素に設けられた照射用開口部
7:照射源用支持プレート
8:照射源
9:ネジ穴
10:ネジ
11:反応媒質の供給口および排出口
12:金属またはプラスチック・シートから成るスペーサー
13:基礎部を備えた円錐形状のステンレス鋼シリンダー
14:基礎部を備えた円錐形状の石英チューブ
15:O−リング
16:反応媒質を供給するための周縁溝
17:反応媒質を排出するための周縁溝
18:反応媒質を供給するための内側ボア
19:反応媒質
20:反応媒質を排出するための内側ボア
21:反応媒質の排出
Claims (2)
- 照射方向における反応媒質の層厚さが流体圧力に拘わらず一定に維持されるマイクロチャンネルを備えた照射可能な反応ゾーンを有して成る、化学反応を実施するためのデバイスであって、
反応媒質の流体圧力に抗する対抗圧力が形成されるように少なくとも1つの支持要素によって張力が加えられる透明材料プレートによって反応ゾーンがカバーされており、
前記支持要素は前記透明材料プレートを押圧することができるゴムマットであって、該ゴムマットが光照射のための開口部を備えている、ことを特徴とするデバイス。 - 請求項1に記載のデバイスにおいて光化学反応を実施することを特徴とする方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005003966A DE102005003966A1 (de) | 2005-01-27 | 2005-01-27 | Vorrichtung zur kontinuierlichen Durchführung photochemischer Prozesse mit geringen optischen Schichtdicken, enger Verweilzeitverteilung und hohen Durchsätzen |
DE102005003966.9 | 2005-01-27 | ||
PCT/EP2006/000388 WO2006079470A1 (de) | 2005-01-27 | 2006-01-18 | Vorrichtung, verfahren und verwendung zur kontinuierlichen durchführung photochemischer prozesse mit geringen optischen schichtdicken, enger verweilzeitverteilung und hohen durchsätzen |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008528264A JP2008528264A (ja) | 2008-07-31 |
JP4922186B2 true JP4922186B2 (ja) | 2012-04-25 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2007552554A Expired - Fee Related JP4922186B2 (ja) | 2005-01-27 | 2006-01-18 | 小さい光学的層厚さ、狭い滞留時間分布および多い処理量で光化学プロセスを連続的に実施するためのデバイス |
Country Status (7)
Country | Link |
---|---|
US (1) | US20080135397A1 (ja) |
EP (1) | EP1855796B1 (ja) |
JP (1) | JP4922186B2 (ja) |
CN (1) | CN101146605B (ja) |
AT (1) | ATE476251T1 (ja) |
DE (2) | DE102005003966A1 (ja) |
WO (1) | WO2006079470A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4818971B2 (ja) * | 2007-03-29 | 2011-11-16 | 三菱電機株式会社 | 温度検出回路 |
FR2931478B1 (fr) * | 2008-05-26 | 2012-08-03 | Arkema France | Prodece de preparation de lactames comprenant une etape de photonitrosation suivie d'une etape de transposition de beckmann |
US8475738B2 (en) * | 2010-05-04 | 2013-07-02 | Electronics And Telecommunications Research Institute | Photocatalytic apparatus and method for injecting microfluidic volumes |
DE102010025366A1 (de) | 2010-06-28 | 2011-12-29 | Umex Gmbh Dresden | Fotoreaktor |
CN103517758A (zh) * | 2011-05-13 | 2014-01-15 | 株式会社日立制作所 | 光反应微反应器 |
CN103553993B (zh) * | 2013-11-12 | 2015-05-20 | 中国科学院理化技术研究所 | 利用微流光反应技术合成树脂状维生素d3的方法及微流光化学反应器 |
DK2923754T3 (da) | 2014-03-26 | 2019-11-11 | Corning Inc | Modulært, fotokemisk strømningsreaktoranlæg |
CN107261996A (zh) * | 2016-04-08 | 2017-10-20 | 中国科学院大连化学物理研究所 | 一种金属与透明塑料复合结构的微反应器及其应用 |
CN109364847A (zh) * | 2018-11-28 | 2019-02-22 | 内蒙古三爱富万豪氟化工有限公司 | 光氯化反应器及制备二氟一氯乙烷的方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10157688A (ja) * | 1996-11-26 | 1998-06-16 | Takeo Morishima | 油回収装置 |
WO2002002227A2 (en) * | 2000-07-03 | 2002-01-10 | Xeotron Corporation | Devices and methods for carrying out chemical reactions using photogenerated reagents |
JP2003511654A (ja) * | 1999-10-06 | 2003-03-25 | エボテック・オーアーイー・アーゲー | 構造化された反応基体およびその製造方法 |
WO2003066212A2 (en) * | 2002-02-01 | 2003-08-14 | Nimblegen Systems Llc | Microarray synthesis instrument and method |
JP2004121998A (ja) * | 2002-10-02 | 2004-04-22 | National Institute Of Advanced Industrial & Technology | マイクロ高圧流体接触装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5543016A (en) * | 1991-07-12 | 1996-08-06 | Inrad | Photoconversion of steroids in microreactors |
US20030118486A1 (en) * | 2000-07-03 | 2003-06-26 | Xeotron Corporation | Fluidic methods and devices for parallel chemical reactions |
ATE288320T1 (de) * | 2000-08-09 | 2005-02-15 | Fraunhofer Ges Forschung | Mikroreaktoranordnung zur festphasengestützten synthese sowie mikroreaktorsystem mit einzelnen mikroreaktoranordnungen |
GB0119543D0 (en) * | 2001-08-10 | 2001-10-03 | Analytical Sciences Ltd | Method of and apparatus for use in the digestion of liquid samples |
US20030042126A1 (en) * | 2001-08-30 | 2003-03-06 | Nguyen Duyen T. | Process and reactor design for the photocatalytic conversion of natural gas to methanol |
FR2830206B1 (fr) * | 2001-09-28 | 2004-07-23 | Corning Inc | Dispositif microfluidique et sa fabrication |
EP1400280A1 (en) * | 2002-09-18 | 2004-03-24 | Corning Incorporated | Apparatus and method for operating a microreactor at high pressure |
EP1415707A1 (en) * | 2002-10-29 | 2004-05-06 | Corning Incorporated | Method and microfluidic reactor for photocatalysis |
-
2005
- 2005-01-27 DE DE102005003966A patent/DE102005003966A1/de not_active Withdrawn
-
2006
- 2006-01-18 EP EP06701010A patent/EP1855796B1/de not_active Not-in-force
- 2006-01-18 AT AT06701010T patent/ATE476251T1/de active
- 2006-01-18 JP JP2007552554A patent/JP4922186B2/ja not_active Expired - Fee Related
- 2006-01-18 WO PCT/EP2006/000388 patent/WO2006079470A1/de active Application Filing
- 2006-01-18 DE DE502006007585T patent/DE502006007585D1/de active Active
- 2006-01-18 US US11/814,299 patent/US20080135397A1/en not_active Abandoned
- 2006-01-18 CN CN2006800093531A patent/CN101146605B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10157688A (ja) * | 1996-11-26 | 1998-06-16 | Takeo Morishima | 油回収装置 |
JP2003511654A (ja) * | 1999-10-06 | 2003-03-25 | エボテック・オーアーイー・アーゲー | 構造化された反応基体およびその製造方法 |
WO2002002227A2 (en) * | 2000-07-03 | 2002-01-10 | Xeotron Corporation | Devices and methods for carrying out chemical reactions using photogenerated reagents |
WO2003066212A2 (en) * | 2002-02-01 | 2003-08-14 | Nimblegen Systems Llc | Microarray synthesis instrument and method |
JP2004121998A (ja) * | 2002-10-02 | 2004-04-22 | National Institute Of Advanced Industrial & Technology | マイクロ高圧流体接触装置 |
Also Published As
Publication number | Publication date |
---|---|
DE102005003966A1 (de) | 2006-08-10 |
CN101146605B (zh) | 2010-06-23 |
CN101146605A (zh) | 2008-03-19 |
JP2008528264A (ja) | 2008-07-31 |
WO2006079470A1 (de) | 2006-08-03 |
EP1855796A1 (de) | 2007-11-21 |
ATE476251T1 (de) | 2010-08-15 |
DE502006007585D1 (de) | 2010-09-16 |
EP1855796B1 (de) | 2010-08-04 |
US20080135397A1 (en) | 2008-06-12 |
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