JP4919404B2 - Electron microscope, electron beam hologram creating method, and phase reproduction image creating method - Google Patents

Description

  The present invention relates to an electrostatic charge carrying member, an electron emitting member, an organic semiconductor or a conductive member observation / metering apparatus, and a method thereof, and more particularly to an electron microscope equipped with an electron biprism, and an electron beam holography technical field thereof. Belonging to.

  Conventionally, in a transmission electron microscope, a sample is irradiated with an electron beam, and a sample image composed of the electron beam transmitted through the sample is magnified by a magnetic lens and projected onto a screen or the like, so that the sample is observed. It has become. An electron biprism is installed in such a conventional transmission electron microscope to obtain interference fringes (holograms) due to interference between an electron beam that does not pass through the sample and an electron beam that passes through the sample. There is an electron microscope technique for obtaining information such as a thickness distribution of a sample, an electric field, or a magnetic field by taking out information on phase change of an electron beam from a hologram (for example, Patent Document 1).

  In addition, a technique (for example, Patent Document 2) that includes a mechanism that simplifies the exchange work of the line electrode wires that constitute the electron biprism, and a technique that includes a mechanism that stretches the wire electrode wires with appropriate tension (Patent Document 3). In addition, a technique (for example, Patent Document 4) including a mechanism for removing wire dirt is also known.

  Further, with regard to phase reproduction, an optical reproduction system and a digital image processing data processing method for Fourier transforming a hologram using a computer are widely used.

  According to the conventional observation method, an electron beam hologram is created by interfering with an electron beam (reference wave) that does not pass through the sample and an electron beam (object wave) that passes through the sample, and this electron beam hologram is reproduced. Attempts have been made to measure the phase of the regenerated wavefront and indirectly measure the potential distribution of the sample from the measured phase.

  For example, when an electron beam with a uniform wavefront is incident on a sample film sliced so as to include a thin film with a potential difference on both sides almost vertically, electrons with −charges are relatively accelerated in places with + charges. Therefore, there is a technique for measuring the potential difference on both sides of a thin film by measuring the phase of an electron beam transmitted through such a sample by utilizing the delay of the wavefront (for example, Patent Document 5).

  In addition, there are many examples of visualizing the magnetic distribution and magnetic domain distribution of a magnetic thin film sample from a reference wave and an object beam of an electron beam that has passed through the sample, and applying it to magnetic material and magnetic head characteristics evaluation (for example, patent documents) 6).

FIG. 11 is a diagram schematically illustrating a configuration example of an electron microscope including a conventional electron beam biprism. In FIG. 11, 1 is a field emission electron gun, 2 is a condenser lens, 3 is an objective lens, 4 is an objective aperture, 5 is a biprism, 11 is a sample, and 12 is a hologram. Electron beam emitted from the electron gun 1 (electron beam) becomes parallel beam by the condenser lens 2, some of the object wave under the influence of an electric field or a magnetic field of the specimen 11. The object wave affected by the electric field and magnetic field of the sample 11 and the reference wave not affected by the object 11 are focused by the objective lens 3, narrowed by the objective diaphragm 4, and then enter the biprism, and the reference wave and the object wave are separated. Interference fringes (holograms) 12 are obtained by interference.

A wave function indicating changes in the amplitude and phase of incident electrons due to an electric field and a magnetic field inside and outside the sample can be generally described by Equation (1).
q (r) = A (r) exp (iφ (r)) (1)
Here, considering the observation by general-purpose electron microscopy, the intensity of the electron microscope image obtained when the resolution and the magnification of the image are ignored is calculated from the equation (1):
I (r) = | q (r) | ² = A ² (r) (2)
It becomes. From equation (2), in general-purpose electron microscopy, the attenuation of amplitude A (r) due to absorption or diffraction of incident electrons in the sample can be evaluated, but phase information exp (iφ (r) indicating the influence of an electric field or magnetic field ) Can not be obtained.

  In electron holography, an electron wave (object wave) affected by an electric field or a magnetic field and an electron wave (reference wave) propagated in a vacuum are deflected by a biprism, and at angles of -αh / 2 and αh / 2, respectively. The phase information is recorded on this interference fringe (hologram). The intensity distribution Ih of this hologram is given by equation (3).

（３）式の右辺下段の第３項に位相変化φ（ｒ）が含まれており、コンピュータ等により、このホログラムにフーリエ変換演算を施すことにより、電場や磁場による入射電子の位相および振幅の変化が数値データとして再生できる。通常再生された位相変化（φ）をｃｏｓφとして記述し、２次元の位相再生像として電場や磁場の情報を得られるようになる。
特開２００５−３３２７７２号公報 特開２００１−３２５９１３号公報 特開平３−１６３４００号公報 特許第３２７６８１６号公報 特許第３１５４４３２号公報 特開２００３−２７０３１２号公報

The phase change φ (r) is included in the third term on the lower right side of the equation (3), and the phase and amplitude of the incident electrons due to the electric field and magnetic field are obtained by performing a Fourier transform operation on this hologram by a computer or the like. Changes can be reproduced as numerical data. Normally reproduced phase change (φ) is described as cos φ, and electric field and magnetic field information can be obtained as a two-dimensional phase reproduction image.
JP 2005-332772 A JP 2001-325913 A JP-A-3-163400 Japanese Patent No. 3276816 Japanese Patent No. 3154432 JP 2003-270312 A

  However, the electron beam holography by the electron microscope equipped with the conventional electron beam biprism described above has an excellent feature that the information of the electric field and magnetic field of the sample can be taken out, but it has an influence on the sample specimen. In some cases, it is not always an effective means.

  In the case of the above-described conventional method, when the specimen specimen is irradiated with an electron beam from an electron gun, if the electron energy is relatively strong, the irradiated electron beam passes through the specimen, but at this time, the electrons inside the specimen are knocked out. When the irradiation electron energy is relatively low, a sample charge-up phenomenon that electrons are trapped inside the sample may occur, and the electric field information inherent to the sample may not be obtained accurately.

  In addition, when obtaining electric field information derived from a sample carrying an electrostatic charge, the electric field of the sample affects the reference wave in vacuum. There exists a subject that the above-mentioned outstanding characteristic which electron beam holography provided with the apparatus has cannot be used effectively.

12, using a color toner developer as the sample to the electron microscope of the prior art shown in FIG. 11, as the phase reproduced image from the hologram image of the sample, shows the results obtained electric field information of toner. On the other hand, as a result of separately measuring the charge amount of the toner using a blow-off method for the developer used for the sample, the toner charge amount was −20 μc / g. From this, it can be seen that the toner of the sample developer carries a negative electrostatic charge in advance. However, as shown in FIG. 12, the electric field information from the phase reproduction image of this sample gives information that the toner side is positively charged. This is presumed that the electron beam from the electron gun affects the sample and the electric field information derived from the sample is not obtained. FIG. 13 is an SEM photographic image of the above-described developer. (A) shows a state where the toner is attached to the carrier with the developer, (b) shows the toner, and (c) shows the carrier. .

  In addition, the developer charge amount measurement by the blow-off method described above is performed by mixing the toner and the carrier, stirring the mixture, blowing the toner away from the electrically neutral developer with an air current, and accumulating the remaining charge in the capacitor. Detect as voltage. The toner's specific charge amount (c / g) is obtained by measuring the weight of the blown toner and determining the ratio of the charge amount accumulated in the capacitor. Although the charge information obtained by this method can grasp the average charge amount of the blown toner group as the specific charge amount of the toner group mass, one toner in the developer or a plurality of toner charge amounts to be grasped I can not get any information.

  The present invention has been made in view of such problems, and its purpose is to obtain electric field information derived from the original electric field of a sample and electric field information of a limited target location, except for the influence of measurement. Another object of the present invention is to provide an electron microscope including an electron biprism that can be produced, and an electron beam hologram creating method and a phase reproduction image creating method.

According to a first aspect of the present invention, there is provided an electron gun that emits an electron beam, a condenser lens that uses the electron beam emitted from the electron gun as a parallel bundle, and an object that focuses the electron beam that is formed into a parallel bundle by the condenser lens. A lens and a sample carrying a charge are held, and a part of an electron beam made parallel by the condenser lens is arranged between the condenser lens and the objective lens so as to be affected by the electric field of the sample. Interference between an electron beam focused by the objective lens and an electron beam affected by the electric field of the sample (hereinafter referred to as an object wave) and an electron beam not affected by the electron beam (hereinafter referred to as a reference wave) In an electron microscope having an electron biprism that generates an electron beam, an electron beam made into a parallel bundle by the condenser lens is irradiated between the condenser lens and the objective lens. An electron beam blocking probes for shielding of, the reference wave side parallel bundle with electron beam in said condenser lens, characterized by comprising an electromagnetic wave shielding probe for shielding from electromagnetic waves from the sample.
The invention according to claim 2 is the electron microscope according to claim 1 , wherein the electron beam shielding probe and the electromagnetic wave shielding probe are provided in the sample holder.

According to a third aspect of the present invention, there is provided an electron beam hologram by using the electron microscope according to the first or second aspect to cause interference between an object wave that does not include a transmission electron beam of a sample and a reference wave that shields electromagnetic waves from the sample. It is characterized by creating.
The invention according to claim 4 is characterized in that the electron beam hologram created by the electron beam hologram creating method according to claim 3 is digital image processed to create a phase reproduction image.
The invention according to claim 5 is the phase reproduction image creation method according to claim 4, wherein the electron beam shielding probe is moved to generate a phase reproduction image of the sample from a state in which the sample is not irradiated with the electron beam to a state in which the sample is irradiated. It is characterized by doing.

According to a sixth aspect of the present invention, there is provided an electron gun that emits an electron beam, a condenser lens that uses the electron beam emitted from the electron gun as a parallel bundle, and an object that focuses the electron beam that is formed into a parallel bundle by the condenser lens. A lens and a sample carrying a charge are held, and a part of an electron beam made parallel by the condenser lens is arranged between the condenser lens and the objective lens so as to be affected by the electric field of the sample. Interference between an electron beam focused by the objective lens and an electron beam affected by the electric field of the sample (hereinafter referred to as an object wave) and an electron beam not affected by the electron beam (hereinafter referred to as a reference wave) In an electron microscope having an electron biprism that generates an electron beam, an electron beam made into a parallel bundle by the condenser lens is irradiated between the condenser lens and the objective lens. And an electromagnetic wave shielding probe for shielding the reference wave side of the electron beam from the electromagnetic wave from the sample, and the electron beam shielding probe and the electromagnetic wave shielding probe are independent of each other. It can be driven in any direction.
The invention according to claim 7 is the electron microscope according to claim 6 , wherein at least one of the electron beam shielding probe and the electromagnetic wave shielding probe includes a mechanism for removing a part of the sample. .
The invention according to claim 8 is the electron microscope according to claim 6 , further comprising a probe that can be driven in an arbitrary direction for removing a part of the sample.

The invention according to claim 9 uses the electron microscope according to claim 7 or 8, and before and after removing a part or all of the sample, the object wave not including the transmission electron beam of the sample and the electromagnetic wave from the sample An electron beam hologram is created by interfering with a reference wave that shields.

According to a tenth aspect of the present invention, the electron beam hologram before and after removal of a part or all of the sample prepared by the electron beam hologram preparing method according to the ninth aspect is converted into a digital image processing and phase-reconstructed image respectively. And a phase reproduction image obtained by subtracting the phase information of the phase reproduction image after removal from the phase reproduction image before removing part or all of the sample is produced.

  According to the present invention, it is possible to provide an electron beam holography apparatus capable of obtaining electric field information derived from an original electric field of a sample, excluding the influence of measurement on the sample. Furthermore, by creating electron beam holograms before and after removing a part of the sample, electric field information on a limited target location can be obtained. As a result, it can be applied to grasp the electric field information of electrostatic charge bearing members, electrostatic latent image forming members, electron emission members, organic semiconductors, conductive members, etc. It can be applied to many industrial fields.

  Embodiments of the present invention will be described below with reference to the drawings.

[Example 1]
FIG. 1 shows a configuration diagram of a first embodiment of an electron microscope of the present invention. In FIG. 1, the configuration and operation of the field emission electron gun 1, the condenser lens 2, the objective lens 3, the objective aperture 4, and the biprism 5 are the same as those of the conventional apparatus shown in FIG. The difference from the conventional apparatus of FIG. 11 is that an electron beam shielding probe (hereinafter referred to as a microprobe) 15 for shielding an electron beam from the sample 11 is provided. The microprobe 15 is configured integrally with a holder (sample holder) that holds the sample 11.

  FIG. 2 shows a configuration example of a sample holder provided with a microprobe. FIG. 2 is a top view of the sample holder. The sample is a color toner developer, and a driving microprobe for shielding the electron beam is provided in the sample holder as a mechanism for preventing the sample toner from being irradiated with the electron beam. An example of the configuration is shown. The sample color toner developer is composed of a mixture of carrier particles 21 and toner particles 22 and is attached to the tape 23 in the sample holder 20 (FIG. 2A). The microprobe 15 is held by a probe holding unit 25, and the probe holding unit 25 is attached to a stage 24 (FIG. 2B). The stage 24 is configured to be movable in the direction of the arrow (actually in any direction of front and rear, left and right, and up and down), and moves as shown in FIG. Can be prevented from being irradiated. As the drive mechanism, for example, a mechanical coarse movement mechanism such as a screw mechanism that can be driven over a wide range of millimeter units, and a piezo mechanism for realizing precise drive from micron to nanoscale units. Both electric fine movement mechanisms are used.

  Using such an apparatus of this example, it was confirmed whether or not a sample (sample toner) carrying a charge in advance was affected by an electron beam. First, the sample was irradiated with an electron beam without shielding the electron beam. Thereafter, the microprobe 15 is driven by the microprobe 15 so that the sample toner is not irradiated with the electron beam (FIG. 2C), and then the sample toner is irradiated with the electron beam again while the microprobe 15 is being driven little by little. Moved to the position. The electric field information of the sample at this time is shown in FIG. The black part at the lower right of the holograms (a), (b), and (c) is the microprobe. In addition, although molybdenum (Mo) which belongs to a transition metal was used for the shielding material of a microprobe, it should just be a nonmagnetic material and is not restricted to Mo.

  (A), (b), (c), and (d) in FIG. 3 gradually drive the microprobe from the state (a) in which the electron beam is not irradiated on the sample toner. The state where the electron beam was irradiated is shown. Information was obtained that the positive potential on the toner side increased as the microprobe moved from (a) to (b) to (c) to (d). The previous FIG. 12 corresponds to (d) in FIG. From this, it was suggested that the electric field information of the charge state carried by the sample toner, that is, the electric field information derived from the sample toner can be obtained by shielding the electron beam. The phase reproduction image is obtained by subjecting the hologram image to digital image processing (Fourier transform processing) using a computer or the like.

  FIG. 4 is a schematic diagram when the microprobe (electron beam shielding probe) at the time of obtaining the electric field information of FIG. 3 is viewed from above, that is, when viewed in a direction perpendicular to the irradiation electron beam.

[Example 2]
When the sample holds a negative electrostatic charge in advance like the toner of the sample phenomenon agent, the charge of the sample 11 affects the reference wave as shown in FIG. In the second embodiment, in an electron microscope equipped with an electron biprism, a reference wave is provided with an electromagnetic wave shielding probe (hereinafter referred to as a shield wall probe) for preventing electromagnetic waves from a sample.

  FIG. 6 shows a block diagram of a second embodiment of the electron microscope of the present invention. In FIG. 6, 16 is a shield wall probe, and other configurations are the same as those in FIG. The shield wall probe 16 is mounted in the sample holder 20 similarly to the microprobe.

FIG. 7 shows a configuration example of the sample holder provided with the shield wall probe. FIG. 7A is a view of the sample holder as seen from above, as in FIG. 2. The probe holder 27 is attached to the stage 26, and the shield wall probe 16 is held by the probe holder 27. FIG. 7B shows an enlarged view of the shield wall probe 16. The tip portion 16 is a portion (electric field shielding portion) that actually contributes to shielding of electromagnetic waves, for example, an extremely thin plate shape having a length of about 20 μm, a thickness of about 0.6 μm, and a width of about 8 μm (when viewed from the side, FIG. Like a needle).
The shield wall probe 16 may be mounted with the microprobe 15 in the sample holder 20 together.

  Using the apparatus of this embodiment, the electric field information of this sample toner was obtained using a color toner developer carrying a negative charge in advance as a sample. The result is shown in FIG. FIG. 8 shows the microprobe driven by mounting the microprobe together with the shield wall shield in the sample holder 20. In addition, although Pt-Ir was used for the raw material of a shield wall shield, it should just be a nonmagnetic material like a microprobe, and is not restricted to Pt-Ir.

  8 (a), 8 (b), 8 (c), and 8 (d), the probe is gradually driven from the state (a) in which the electron beam is not irradiated to the sample toner as in FIG. ) Shows a state in which the sample toner is irradiated with an electron beam for the first time. As the microprobe moves in the order of (a) → (b) → (c) → (d), unlike the conventional case shown in FIG. 12, information is obtained in which the negative potential on the toner side becomes stronger. (C) is a state in which the sample toner exists about 0.1 μm inside from the shield wall probe, and electric field information derived from the sample toner is obtained. On the other hand, in the case (d) in which the sample toner was irradiated with the electron beam, the electric field information derived from the sample toner was not accurately represented unlike the case (c).

[Example 3]
In this embodiment, a sample holder is provided with a drive microprobe and a drive shield wall probe that are driven independently. FIG. 9A shows a configuration example of the sample holder of this embodiment. FIG. 9A is a view of the sample holder as viewed from above. A microprobe (electron beam shielding probe) 15 is held by a probe holding part 25 attached to the stage 24, while a shield wall probe (electromagnetic wave shielding probe) 16 is held by a probe holding part 27 attached to the stage 26. Yes. The carrier 21, toner 22, and tape 23 are the same as those in FIG. The stages 24 and 26 can be independently driven up and down, back and forth, and left and right, and thereby the microprobe 15 and the shield wall probe 16 can be independently moved in arbitrary directions. As in the first and second embodiments, Mo is used as the material of the microprobe 15 and Pt—Ir is used as the material of the shield wall probe 16, but any nonmagnetic material may be used, such as Mo or Pt—Ir. It is not limited to. Regarding the driving of the stages 24 and 26, that is, the probes 15 and 16, as in the case of the first embodiment, for example, a mechanical coarse movement mechanism such as a screw mechanism capable of driving the probe over a wide range of millimeter units. And an electric fine movement mechanism such as a piezo mechanism for realizing precise driving from micron to nanoscale units. Basically, it is the same as the drive control of the robot arm and the tip of the hand.

  FIG. 9B shows an enlarged view of the shield wall probe portion. By subjecting the shield wall probe 16 to microfabrication using a focused ion beam, the influence of the electric field of the sample on the reference wave used to create the phase reproduction image can be eliminated. As described above, Pt-Ir is used as the material of the shield wall probe 16 (generally a non-magnetic material), and the tip portion (electric field shielding portion) 17 that actually contributes to shielding of electromagnetic waves is the same as that of the second embodiment. Similarly, for example, it has an extremely thin plate shape having a length of about 20 μm, a thickness of about 0.6 μm, and a width of about 8 μm (when viewed from the side, a needle shape as shown in FIG. 9B). A recess (toner removing portion) 18 for removing the sample toner of the developer is provided in front of the front end portion 17. For this reason, in this embodiment, the shield wall probe 16 can be driven and moved, and the toner can be removed one by one at the peripheral convex portion of the recess 18. For this reason, it is possible to create an electron beam hologram before and after part or all of the sample toner is removed from the developer, and to accurately extract the electric field information relating to the removed sample from the difference between the phase information. Note that the tip of the shield wall probe 16 and the size position of the recess are appropriately set according to the sample. Further, the toner removing unit may be provided on the microprobe 15 side, or a driving probe for removing toner may be provided separately from the driving shield wall probe and the driving microprobe.

  In the configuration example of FIG. 9, the microprobe 15 and the shield wall probe 16 that are independently driven are provided in the sample holder. However, the microprobe 15 and the shield wall probe 16 are not necessarily provided in the sample holder. For example, when necessary, the sample holder is driven by a coarse movement mechanism or the like, and thereafter, fine driving is performed by a fine movement mechanism.

  FIG. 10 shows an example of the observation result according to this embodiment. In FIG. 10A, similarly to FIG. 8 of the second embodiment, the sample toner is not irradiated with the electron beam by the microprobe 15 and the shield wall probe 16 shields the electromagnetic wave from the sample toner from the reference wave. The hologram of the developer obtained in the state and its phase reproduction image are shown. After obtaining this electric field information, one toner was removed from the observed developer by a toner removal mechanism (for example, 18 in FIG. 9B). Next, a developer hologram and its phase reproduction image were created in the same state as before the toner was removed at the same observation position as before the toner was removed. FIG. 10B shows this. FIG. 10C shows a phase reproduction image when the phase information of FIG. 10B is subtracted from FIG. The electric field information shown in FIG. 10A includes electric field information caused by both the toner and the carrier. On the other hand, FIG. 10B shows electric field information obtained by removing one toner in the developer. Therefore, the electric field information (FIG. 10C) obtained from the difference indicates the electric field information of one toner before being removed that was originally in the developer.

The block diagram of the 1st Example of the electron microscope of this invention. The figure which shows the structural example of the sample holder provided with the drive-type microprobe. The figure which shows an example of the hologram and phase reproduction image by the electron microscope of a 1st Example. The figure which shows the relationship between a microprobe and an electron beam irradiation direction. The figure which shows the electric field image of a sample. The block diagram of the 2nd Example of the electron microscope of this invention. The figure which shows the structural example of the sample holder provided with the shield wall probe. The figure which shows an example of the hologram and phase reproduction image by the electron microscope of 2nd Example. The figure which shows the structural example of the sample holder provided with the drive type microprobe and drive type shield wall probe of 3rd Example. The figure which shows an example of the hologram and phase reproduction image of a 3rd Example. The block diagram of the conventional electron microscope. The figure which shows an example of the hologram and phase reproduction image by the conventional electron microscope. The figure which shows the SEM photograph image of a developing agent.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Field emission type electron gun 2 Condenser lens 3 Objective lens 4 Objective diaphragm 5 Biprism 11 Sample 12 Hologram 15 Microprobe (electron beam shielding probe)
16 Shield wall probe (electromagnetic wave shielding probe)
17 Tip (electric field shielding part)
18 Indentation (toner removal part)
20 Sample holder 21 Carrier 22 Toner 23 Tape 24, 26 Moving stage 25, 27 Probe support

Claims (10)

An electron gun that emits an electron beam;
A condenser lens having a parallel bundle of electron beams emitted from the electron gun;
An objective lens for focusing an electron beam that is made into a parallel bundle by the condenser lens;
A sample holding a charge-carrying sample, and arranged between the condenser lens and the objective lens so that a part of the electron beam made into a parallel bundle by the condenser lens is affected by the electric field of the sample A holder,
For the electron beam focused by the objective lens, an electron beam beam that causes interference between an electron beam affected by the electric field of the sample (hereinafter referred to as an object wave) and an electron beam that is not affected (hereinafter referred to as a reference wave). In an electron microscope having a prism,
Between the condenser lens and the objective lens, an electron beam shielding probe that shields the electron beam made parallel by the condenser lens from irradiating the sample, and electrons made parallel by the condenser lens An electron microscope comprising: an electromagnetic wave shielding probe for shielding a reference wave side of a line from electromagnetic waves from the sample . The electron microscope according to claim 1, wherein the electron beam shielding probe and the electromagnetic wave shielding probe are provided in the sample holder. An electron beam hologram is created by causing an object wave that does not include a transmission electron beam of a sample and a reference wave that shields an electromagnetic wave from the sample to interfere with each other using the electron microscope according to claim 1. Electron hologram production method. A phase reconstructed image creating method, comprising: converting an electron beam hologram created by the electron beam hologram creating method according to claim 3 to digital image processing to create a phase reconstructed image. 5. The phase reproduction image generating method according to claim 4, wherein the phase reproduction image of the sample from the state in which the sample is not irradiated with the electron beam to the state in which the sample is irradiated is generated by moving the electron beam shielding probe. Image creation method. An electron gun that emits an electron beam;
A condenser lens having a parallel bundle of electron beams emitted from the electron gun;
An objective lens for focusing an electron beam that is made into a parallel bundle by the condenser lens;
A sample holding a charge-carrying sample, and arranged between the condenser lens and the objective lens so that a part of the electron beam made into a parallel bundle by the condenser lens is affected by the electric field of the sample A holder,
For the electron beam focused by the objective lens, an electron beam beam that causes interference between an electron beam affected by the electric field of the sample (hereinafter referred to as an object wave) and an electron beam that is not affected (hereinafter referred to as a reference wave). In an electron microscope having a prism,
Between the condenser lens and the objective lens, an electron beam shielding probe that shields the electron beam collimated by the condenser lens from irradiating the sample, and a reference wave side of the electron beam, An electromagnetic shielding probe that shields electromagnetic waves from the sample,
The electron microscope characterized in that the electron beam shielding probe and the electromagnetic wave shielding probe can be independently driven in arbitrary directions. The electron microscope according to claim 6, wherein at least one of the electron beam shielding probe and the electromagnetic wave shielding probe includes a mechanism for removing a part of the sample. 7. The electron microscope according to claim 6, further comprising a probe that can be driven in an arbitrary direction for removing a part of the sample. Using the electron microscope according to claim 7 or 8, the object wave that does not include the transmission electron beam of the sample and the reference wave that shields the electromagnetic wave from the sample are interfered before and after part or all of the sample is removed. And producing an electron beam hologram. A phase reproduction image is created by converting each of the electron beam holograms produced by the electron beam hologram production method according to claim 9 before and after removal of the electron beam holograms by digital image processing. Alternatively, a phase reproduction image creating method is characterized in that a phase reproduction image is created by subtracting phase information of a phase reproduction image after removal from a phase reproduction image before removal of all.

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