JP4916068B2 - Method for manufacturing composite semiconductor device - Google Patents

Method for manufacturing composite semiconductor device Download PDF

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Publication number
JP4916068B2
JP4916068B2 JP2001286643A JP2001286643A JP4916068B2 JP 4916068 B2 JP4916068 B2 JP 4916068B2 JP 2001286643 A JP2001286643 A JP 2001286643A JP 2001286643 A JP2001286643 A JP 2001286643A JP 4916068 B2 JP4916068 B2 JP 4916068B2
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base plate
metal base
semiconductor device
composite semiconductor
insulating substrate
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JP2003100964A (en
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金子  保
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日本インター株式会社
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、複合半導体装置に関し、特に電気回路構成部品を、半田等の接合部材を介して搭載・固着させる金属ベース板に関するものである。
【0002】
【従来の技術】
【0003】
この種の複合半導体装置の内部構成を図4に示す。
図は、複合半導体装置を完成させる前の絶縁ケースを取り除いた組立体の状態を示している。
図において、1は銅などの材料により形成された金属ベース板であり、放熱フィン等の外部部材に取り付けるための複数のネジ取付け穴2を有している。
この金属ベース板1上に、両面に金属層3を有するアルミナ等の材料により形成された絶縁基板4が半田などの接合部材(図示せず)を介して搭載・固着され、該絶縁基板4上に、第1外部電極5、該第1外部電極5上に、ダイオード、サイリスタ等の半導体素子6、該半導体素子6上に、モリブデン(Mo)等の熱緩衝板7を介して第2電極8が搭載・固着されている。
なお、上記のように構成のものが金属ベース板1上に複数個(図示では一対)形成されている。
【0004】
上記のものを、25℃〜250℃程度の温度プロファイルのリフロー炉に入れ半田付けすると図5のようになる。
すなわち、上記の場合、熱膨張係数がアルミナ材の絶縁基板4と銅材の金属ベース板1とでそれぞれ7.1×10↑−6,16.5×10↑−6と相違し、金属ベース板1の熱膨張係数の方が大きいため、該金属ベース板1は上方に向かって凸状に湾曲した反りを生じる。
【0005】
図6は、図5のように半田付けされた組立体を絶縁ケース9に収めて、該絶縁ケース9内エポキシ樹脂等の充填材10を充填し、樹脂封止したものである。
また、図7は、エポキシ樹脂等の充填材10を充填後150℃程度でキュアし、複合半導体装置11を完成させた状態を示す。
上記の場合、熱膨張係数が銅材の金属ベース板1と充填材10としてのエポキシ樹脂とでは、それぞれ16.5×10↑−6,25×10↑−6とエポキシ樹脂の熱膨張係数の方が大きいことや、金属ベース板1の周囲が絶縁ケース9で取り囲まれていることに起因し、上方に向かって凸状に湾曲した反りを有する金属ベース板1がエポキシ樹脂により下方に押圧され、図示のように下方に向かって凹状に湾曲した反りへと変化する。
【0006】
図8は、上記のようにして完成された複合半導体装置11を放熱フィン12に金属ベース板1のネジ取付け穴(図示せず)を利用して取り付けた状態を示す。この場合、金属ベース板1の湾曲した凹状の反りにより放熱フィン12との間に隙間Dが生じ、熱抵抗が悪くなる。また、放熱フィン12にネジ止めする際に、金属ベース板1が平坦になるように矯正され、該金属ベース板1上の半導体素子6(図示省略)に機械的ストレスを与え、電気的特性を劣化させることになり好ましくない。
【0007】
そこで、従来では図9に示すように、図7に示した金属ベース板1の湾曲した凹状の反りに対応させ、逆向きの上方に向かって凸状に湾曲する反りを予め施す補正手段を講じている。この場合、凸状の湾曲した反りを有する金属ベース板1を使用することにより、半田固着工程で熱膨張により発生する逆向きの反りが相殺され、最終的に平坦な金属ベース板1となる。
【0008】
【発明が解決しようとする課題】
従来の複合半導体装置は、上記のように構成したので、金属ベース板1の反りの問題は解決することができたが、新たな問題があることが分かった。
すなわち、図10に示すように、上方に向かって凸状に湾曲した金属ベース板1に対し、その上面側に複合半導体装置の構成部品、特にその上面と直接接触する絶縁基板4が半田等の接合部材13により固着される場合、金属ベース板1の上面が湾曲しているために、絶縁基板4の中心部よりも外周部の隙間が相対的に大きくなり、該外周部の半田の塗布量が少なくなり半田のぬれ性が悪くなる。このため、金属ベース板1への熱抵抗が大きくなり、複合半導体装置の電気的特性に悪影響を与えることとなる。また、上記の組立体を絶縁ケース9(図6参照)に収めた後、エポキシ樹脂を充填して樹脂封止する際、あるいはキュア時の応力により絶縁基板4の端部に機械的ストレスが加わり、端部が半田により十分保護されていないので、クラックが発生するおそれがあるなどの解決すべき課題があった。
【0009】
【発明の目的】
本発明は上記のような課題を解決するためになされたもので、上方に湾曲した凸状の反りを有する金属ベース板を使用した場合、該金属ベース板との半田接触が良好で熱抵抗が小さく、かつ、エポキシ樹脂の封入時、あるいはキュア時の応力により絶縁基板の端部にストレスが加わってもクラックが発生しないようにした複合半導体装置を提供することを目的とするものである。
【0010】
【課題を解決するための手段】
金属ベース板上に、絶縁基板、外部電極、半導体素子、熱緩衝板を含む電気回路構成部品を、半田等の加熱接合部材を介して搭載・固着させて成る複合半導体装置の製造方法において、前記金属ベース板を加熱による反りを相殺するよう予め上方に向かって凸状になるように折り曲げ形成し、前記電気回路構成部品を搭載・固着させる金属ベース板の上面は湾曲面とすることなく、平坦面とした複合半導体装置の製造方法としたことを特徴とするものである。
【0011】
また、本発明の複合半導体装置の製造方法は、金属ベース板を上方に向かって湾曲させることなく、少なくとも一つの「へ」の字状曲折部を有することを特徴とするものである。
【0012】
【作用】
本発明では電気回路構成部品が搭載・固着される金属ベース板の上面を平坦面としたので、特に絶縁基板の外周部に、その中心部よりも相対的に大きな隙間が形成されることがない。このため、半田のぬれ性に悪影響を与えることなく、また、予め定めた半田の塗布量に不足分が生じることがない。これにより半田の表面張力によって絶縁基板の外周部を過不足なく覆うことができ、従来の半田接合部に比べ、全体として接触面積の広い接合部とすることができる。その結果、金属ベース板への熱抵抗を小さくすることができると共に、絶縁基板の端部が接合部材により完全に保護されるため、絶縁ケースへのエポキシ樹脂の封入時、あるいはキュア時の応力が絶縁基板の外周部に加わってもクラックの発生を効果的に防止することができる。
【0013】
また、本発明では、金属ベース板を上方に向かって湾曲させることなく、少なくとも一つの「へ」の字状曲折部を有するようにしたので、必要とする電流容量や必要とする電気回路等に応じて「へ」の字状曲折部の数を増加させ、上記の効果を実現した最適な複合半導体装置を設計することができる。
【0014】
【実施例】
以下に本発明の実施例を、図を参照して説明する。
図1は、本発明の複合半導体装置に使用する金属ベース板を示し、図1(a)はその正面図、図1(b)はその平面図である。
本発明では、図示のように上方に向かって凸状に湾曲させることなく、電気回路構成部品が搭載・固着される上面を平坦面とする「へ」の字状曲折部を有する金属ベース板1を使用する。
【0015】
すなわち、金属ベース板1は中央部1aで「へ」の字状に折り曲げられ、該中央部の下面から両端部1b間を結ぶ一点鎖線Lまでの距離Hを、上方に向かって凸状に湾曲させた従来の金属ベース板1の曲率半径に対応させた寸法とする。
例えば、本発明の実施例の場合、H=350〜450μmとする。
なお、ネジ取付け穴2は従来と同様に複数個設けてある。
上記の金属ベース板1を使用し、該金属ベース板1の上面に従来と同様に電気回路構成部品を搭載・固着させた図を図2(a)に示す。
【0016】
すなわち、上記金属ベース板1上には、両面に金属層3を有する絶縁基板4、該絶縁基板4上に第1外部電極5、該第1外部電極5上に半導体素子6、該半導体素子6の上に熱緩衝板7、該熱緩衝板7上に第2外部電極8が図示を省略した治具等を介して順次載置された後、リフロー炉等により各構成部品間が半田付けされる。
【0017】
図2(b)に、図2(a)のA部拡大図を示す。この図から明らかなように、上面が平坦面の金属ベース板1を使用することにより、半田等の接合部材13の外周部は、その塗布量に過不足が生じることがなく、接合部材13自体の表面張力によって形状が整えられ、絶縁基板4と金属ベース板1間の十分な接触面積を取ることができる。このため、金属ベース板1への熱抵抗が改善されると共に、絶縁基板4の外周部が接合部材13で十分保護されているため、上記組立体を絶縁ケース9に収めてエポキシ樹脂を充填し樹脂封止する際、あるいはキュア時の応力が加わった際に絶縁基板の外周部にクラックが発生する等の問題が生じることがない。
【0018】
図3(a),(b)は、本発明の複合半導体装置に使用する他の金属ベース板の変形例を示す図である。
図3(a)は金属ベース板1に、「へ」の字状曲折部1cを左右一対形成したものであり、また、図3(b)は、「へ」の字状曲折部1cを、全体で3箇所形成するようにしたものである。
【0019】
なお、この「へ」の字状曲折部1cは、上面平坦面1d上に搭載・固着される電気回路構成部品の組数や必要とする電気回路の構成等に応じて増減させ、設計の自由度を確保する。
要は、金属ベース板1の両端部から最初の「へ」の字状曲折部1cの間、ないしは「へ」の字状曲折部1c同士の間に上面平坦面1dが形成されていれば良い。
【0020】
上記の変形例においても、電気回路構成部品が搭載・固着される面が湾曲面ではなく平坦面であるため、絶縁基板4と金属ベース板1の間隙が均一となり、特に外周部での接合部材13の十分な接触面積を確保することができる。このため、前記同様にエポキシ樹脂の封入時、あるいはキュア時の絶縁基板4の端部に加わる機械的ストレスに十分耐えることができ、クラック等の発生を防止することができる。
【0021】
【発明の効果】
以上のように本発明によれば、電気回路構成部品が搭載・固着される金属ベース板の上面を平坦面としたので、特に絶縁基板の外周部に中心部よりも相対的に大きな隙間が形成されることがない。このため、半田のぬれ性に悪影響を与えることなく、また、予め定めた半田の塗布量に不足分が生じることがない。これにより半田の表面張力によって絶縁基板の外周部を過不足なく覆うことができ、従来の半田接合部に比べ、全体として接触面積の広い接合部とすることができる。その結果、金属ベース板への熱抵抗を小さくすることができると共に、該金属ベース板の端部が接合部材により完全に保護されるため、絶縁ケースへのエポキシ樹脂の封入時、あるいはキュア時の応力が絶縁基板の外周部に加わってもクラックが発生することがないなどの優れた効果がある。
【図面の簡単な説明】
【図1】本発明の複合半導体装置に使用する金属ベース板を示し、(a)はその正面図、(b)はその平面図である。
【図2】上記の金属ベース板上に電気回路構成部品を搭載した状態を示し、(a)はその正面図、(b)は図2(a)のA部拡大図である。
【図3】本発明の複合半導体装置に使用する金属ベース板を示し、(a),(b)はそれぞれ他の変形例を示す正面図である。
【図4】従来の金属ベース板を使用して組み立てる複合半導体装置の途中工程を示す正面図である。
【図5】図4の組立体をリフロー炉等で加熱し、各構成部品間を半田付けし、金属ベース板が湾曲した状態を示す正面図である。
【図6】図5の組立体を絶縁ケースに収めて、エポキシ樹脂を充填し、樹脂封止した状態を示す断面図である。
【図7】上記の各工程を経て完成した従来の複合半導体装置の外観を示す正面図である。
【図8】上記従来の複合半導体装置を放熱フィン等の外部部材にネジ止めした状態の正面図である。
【図9】従来の複合半導体装置における不都合を解消するために予め逆方向の反りを付与した金属ベース板の正面図である。
【図10】上記従来の金属ベース板を使用して絶縁基板と半田付けした状態の部分拡大図である。
【符号の説明】
1 金属ベース板
1a 中央部
1b 端部
1c 「へ」の字状曲折部
1d 上面平坦面
2 ネジ取付け穴
3 金属層
4 絶縁基板
5 第1外部電極
6 半導体素子
7 熱緩衝板
8 第2外部電極
9 絶縁ケース
10 充填材
11 複合半導体装置
12 放熱フィン
13 接合部材
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a composite semiconductor device, and more particularly to a metal base plate on which electric circuit components are mounted and fixed via a joining member such as solder.
[0002]
[Prior art]
[0003]
FIG. 4 shows the internal configuration of this type of composite semiconductor device.
The figure shows the state of the assembly with the insulating case removed before the composite semiconductor device is completed.
In the figure, reference numeral 1 denotes a metal base plate made of a material such as copper, and has a plurality of screw attachment holes 2 for attachment to an external member such as a heat radiating fin.
An insulating substrate 4 formed of a material such as alumina having a metal layer 3 on both surfaces is mounted and fixed on the metal base plate 1 via a bonding member (not shown) such as solder. In addition, the first external electrode 5, a semiconductor element 6 such as a diode or a thyristor on the first external electrode 5, and a second electrode 8 on the semiconductor element 6 via a thermal buffer plate 7 such as molybdenum (Mo). Is mounted and fixed.
Note that a plurality (in the figure, a pair) of the above-described configuration are formed on the metal base plate 1.
[0004]
When the above is placed in a reflow furnace having a temperature profile of about 25 ° C. to 250 ° C. and soldered, the result is as shown in FIG.
That is, in the above case, the thermal expansion coefficients of the insulating substrate 4 made of alumina and the metal base plate 1 made of copper are different from 7.1 × 10 ↑ -6 and 16.5 × 10 ↑ -6, respectively. Since the plate 1 has a larger thermal expansion coefficient, the metal base plate 1 warps upwardly in a convex shape.
[0005]
FIG. 6 shows an assembly in which the soldered assembly as shown in FIG. 5 is housed in an insulating case 9, filled with a filler 10 such as an epoxy resin in the insulating case 9, and sealed with resin.
FIG. 7 shows a state in which the composite semiconductor device 11 is completed by filling with a filler 10 such as an epoxy resin and curing at about 150 ° C.
In the above case, the thermal expansion coefficient of the metal base plate 1 made of copper and the epoxy resin as the filler 10 are 16.5 × 10 ↑ -6 and 25 × 10 ↑ -6, respectively, and the thermal expansion coefficient of the epoxy resin. Due to the fact that the metal base plate 1 is larger and the periphery of the metal base plate 1 is surrounded by the insulating case 9, the metal base plate 1 having a warp curved upward is pressed downward by the epoxy resin. As shown in the figure, the warpage is changed to a concave curve downward.
[0006]
FIG. 8 shows a state where the composite semiconductor device 11 completed as described above is attached to the heat radiating fins 12 using screw attachment holes (not shown) of the metal base plate 1. In this case, a gap D is formed between the metal base plate 1 and the radiating fin 12 due to the curved concave warp, and the thermal resistance is deteriorated. Further, when screwing to the heat radiating fins 12, the metal base plate 1 is corrected so as to be flat, and mechanical stress is applied to the semiconductor element 6 (not shown) on the metal base plate 1 to improve electrical characteristics. It will deteriorate, which is not preferable.
[0007]
Therefore, conventionally, as shown in FIG. 9, a correction means is provided which preliminarily curves in a convex shape toward the upper side in the opposite direction, corresponding to the curved concave warp of the metal base plate 1 shown in FIG. ing. In this case, by using the metal base plate 1 having a convex curved warp, the reverse warp caused by thermal expansion in the solder fixing process is canceled out, and the flat metal base plate 1 is finally obtained.
[0008]
[Problems to be solved by the invention]
Since the conventional composite semiconductor device is configured as described above, the problem of warping of the metal base plate 1 could be solved, but it has been found that there is a new problem.
That is, as shown in FIG. 10, with respect to the metal base plate 1 that is convexly convex upward, the component parts of the composite semiconductor device, particularly the insulating substrate 4 that is in direct contact with the upper surface is provided on the upper surface side, such as solder. When fixed by the bonding member 13, since the upper surface of the metal base plate 1 is curved, the outer peripheral gap is relatively larger than the central portion of the insulating substrate 4, and the amount of solder applied to the outer peripheral portion is large. Decreases and the wettability of solder deteriorates. For this reason, the thermal resistance to the metal base plate 1 increases, which adversely affects the electrical characteristics of the composite semiconductor device. Further, after the assembly is placed in the insulating case 9 (see FIG. 6), mechanical stress is applied to the end portion of the insulating substrate 4 when the resin is sealed by filling with epoxy resin or by curing stress. However, since the end portion is not sufficiently protected by the solder, there is a problem to be solved such as a possibility that a crack may occur.
[0009]
OBJECT OF THE INVENTION
The present invention has been made to solve the above problems. When a metal base plate having a convex warp curved upward is used, the solder contact with the metal base plate is good and the thermal resistance is low. It is an object of the present invention to provide a composite semiconductor device that is small and prevents cracks from occurring even when stress is applied to an end portion of an insulating substrate due to stress during encapsulation of an epoxy resin or curing.
[0010]
[Means for Solving the Problems]
In the method of manufacturing a composite semiconductor device, wherein an electric circuit component including an insulating substrate, an external electrode, a semiconductor element, and a heat buffer plate is mounted and fixed on a metal base plate via a heat bonding member such as solder. The metal base plate is bent in advance so as to be convex upward so as to offset the warp caused by heating, and the upper surface of the metal base plate on which the electric circuit components are mounted and fixed is flat without being curved. The present invention is characterized in that the method of manufacturing a composite semiconductor device is a surface.
[0011]
Also, the method for manufacturing a composite semiconductor device of the present invention is characterized in that the metal base plate has at least one “f” -shaped bent portion without bending upward.
[0012]
[Action]
In the present invention, since the upper surface of the metal base plate on which the electric circuit components are mounted and fixed is a flat surface, a gap that is relatively larger than the center portion is not formed particularly in the outer peripheral portion of the insulating substrate. . For this reason, the wettability of the solder is not adversely affected, and the predetermined amount of solder applied does not become insufficient. As a result, the outer peripheral portion of the insulating substrate can be covered with the surface tension of the solder without excess or deficiency, and a joint portion having a wide contact area as a whole can be obtained as compared with the conventional solder joint portion. As a result, the thermal resistance to the metal base plate can be reduced, and the end of the insulating substrate is completely protected by the joining member, so that the stress when the epoxy resin is sealed in the insulating case or during curing is reduced. Even if it adds to the outer peripheral part of an insulated substrate, generation | occurrence | production of a crack can be prevented effectively.
[0013]
In the present invention, since the metal base plate has at least one bent portion without bending upward, the required current capacity, the required electric circuit, etc. Accordingly, the number of “f” -shaped bent portions can be increased, and an optimum composite semiconductor device realizing the above-described effect can be designed.
[0014]
【Example】
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 shows a metal base plate used in the composite semiconductor device of the present invention, FIG. 1 (a) is a front view thereof, and FIG. 1 (b) is a plan view thereof.
In the present invention, a metal base plate 1 having a “f” -shaped bent portion having a flat upper surface on which an electric circuit component is mounted and fixed without being curved upwardly as shown in the figure. Is used.
[0015]
In other words, the metal base plate 1 is bent in a “h” shape at the central portion 1a, and the distance H from the lower surface of the central portion to the alternate long and short dash line L connecting the both end portions 1b is curved convexly upward. The dimension is made to correspond to the radius of curvature of the conventional metal base plate 1 made.
For example, in the embodiment of the present invention, H = 350 to 450 μm.
A plurality of screw mounting holes 2 are provided as in the prior art.
FIG. 2A is a diagram in which the above-described metal base plate 1 is used and electric circuit components are mounted and fixed on the upper surface of the metal base plate 1 as in the conventional case.
[0016]
That is, on the metal base plate 1, an insulating substrate 4 having metal layers 3 on both surfaces, a first external electrode 5 on the insulating substrate 4, a semiconductor element 6 on the first external electrode 5, and the semiconductor element 6 On the heat buffer plate 7 and the second external electrode 8 are sequentially placed on the heat buffer plate 7 through a jig (not shown), and then the components are soldered by a reflow furnace or the like. The
[0017]
FIG. 2B shows an enlarged view of a portion A in FIG. As is clear from this figure, by using the metal base plate 1 having a flat upper surface, the outer peripheral portion of the joining member 13 such as solder does not have an excess or deficiency in the amount of application, and the joining member 13 itself. The surface tension of the insulating substrate 4 and the metal base plate 1 can provide a sufficient contact area. For this reason, the thermal resistance to the metal base plate 1 is improved and the outer peripheral portion of the insulating substrate 4 is sufficiently protected by the bonding member 13, so that the assembly is housed in the insulating case 9 and filled with epoxy resin. When the resin is sealed or when stress during curing is applied, problems such as cracks occurring in the outer peripheral portion of the insulating substrate do not occur.
[0018]
FIGS. 3A and 3B are views showing a modification of another metal base plate used in the composite semiconductor device of the present invention.
FIG. 3A shows the metal base plate 1 having a pair of left and right bent portions 1 c formed on the metal base plate 1, and FIG. Three places are formed in total.
[0019]
The “f” -shaped bent portion 1c can be increased or decreased depending on the number of electric circuit components mounted / fixed on the upper flat surface 1d, the required electric circuit configuration, etc. Ensure the degree.
In short, it is only necessary that the upper flat surface 1d is formed between both ends of the metal base plate 1 or between the first “f” -shaped bent portions 1c or between the “f” -shaped bent portions 1c. .
[0020]
Also in the above modification, the surface on which the electric circuit components are mounted and fixed is not a curved surface but a flat surface, so that the gap between the insulating substrate 4 and the metal base plate 1 is uniform, and in particular, a joining member at the outer periphery. A sufficient contact area of 13 can be ensured. For this reason, similarly to the above, it can sufficiently withstand the mechanical stress applied to the end portion of the insulating substrate 4 when the epoxy resin is sealed or cured, and the occurrence of cracks and the like can be prevented.
[0021]
【Effect of the invention】
As described above, according to the present invention, since the upper surface of the metal base plate on which the electric circuit components are mounted and fixed is made flat, a relatively larger gap is formed in the outer peripheral portion of the insulating substrate than the central portion. It will not be done. For this reason, the wettability of the solder is not adversely affected, and the predetermined amount of solder applied does not become insufficient. As a result, the outer peripheral portion of the insulating substrate can be covered with the surface tension of the solder without excess or deficiency, and a joint portion having a wide contact area as a whole can be obtained as compared with the conventional solder joint portion. As a result, the thermal resistance to the metal base plate can be reduced, and the end of the metal base plate is completely protected by the joining member. Therefore, when the epoxy resin is sealed in the insulating case or during curing Even if stress is applied to the outer peripheral portion of the insulating substrate, there is an excellent effect such that cracks do not occur.
[Brief description of the drawings]
FIG. 1 shows a metal base plate used in a composite semiconductor device of the present invention, wherein (a) is a front view thereof and (b) is a plan view thereof.
FIGS. 2A and 2B show a state in which electric circuit components are mounted on the metal base plate. FIG. 2A is a front view thereof, and FIG. 2B is an enlarged view of a portion A in FIG.
FIG. 3 shows a metal base plate used in the composite semiconductor device of the present invention, and (a) and (b) are front views showing other modified examples.
FIG. 4 is a front view showing an intermediate step of a composite semiconductor device assembled using a conventional metal base plate.
5 is a front view showing a state in which the assembly shown in FIG. 4 is heated in a reflow furnace or the like and soldered between components, and the metal base plate is curved.
6 is a cross-sectional view showing a state in which the assembly of FIG. 5 is housed in an insulating case, filled with epoxy resin, and sealed with resin. FIG.
FIG. 7 is a front view showing an appearance of a conventional composite semiconductor device completed through the above steps.
FIG. 8 is a front view showing a state in which the conventional composite semiconductor device is screwed to an external member such as a heat radiating fin.
FIG. 9 is a front view of a metal base plate to which a warp in a reverse direction is applied in advance in order to eliminate the inconvenience in a conventional composite semiconductor device.
FIG. 10 is a partially enlarged view showing a state where the conventional metal base plate is soldered to an insulating substrate.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Metal base board 1a Center part 1b End part 1c Characteristic bent part 1d Upper surface flat surface 2 Screw attachment hole 3 Metal layer 4 Insulating substrate 5 1st external electrode 6 Semiconductor element 7 Thermal buffer board 8 2nd external electrode 9 Insulating case 10 Filler 11 Composite semiconductor device 12 Radiating fin 13 Joining member

Claims (2)

金属ベース板上に、絶縁基板、外部電極、半導体素子、熱緩衝板を含む電気回路構成部品を、半田等の加熱接合部材を介して搭載・固着させて成る複合半導体装置の製造方法において、
前記金属ベース板を加熱による反りを相殺するよう予め上方に向かって凸状になるように折り曲げ形成し、
前記電気回路構成部品を搭載・固着させる金属ベース板の上面は湾曲面とすることなく、平坦面としたことを特徴とする複合半導体装置の製造方法。
In a method for manufacturing a composite semiconductor device, in which an electric circuit component including an insulating substrate, external electrodes, a semiconductor element, and a heat buffer plate is mounted and fixed on a metal base plate via a heat bonding member such as solder.
The metal base plate is bent in advance so as to be convex upward so as to cancel the warp due to heating,
A method of manufacturing a composite semiconductor device, wherein an upper surface of a metal base plate on which the electric circuit components are mounted and fixed is not a curved surface but a flat surface.
前記金属ベース板は、上方に向かって湾曲させることなく、少なくとも一つの「へ」の字状曲折部を有することを特徴とする請求項1に記載の複合半導体装置の製造方法2. The method of manufacturing a composite semiconductor device according to claim 1, wherein the metal base plate has at least one “f” -shaped bent portion without being bent upward. 3.
JP2001286643A 2001-09-20 2001-09-20 Method for manufacturing composite semiconductor device Expired - Fee Related JP4916068B2 (en)

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