JP4897224B2 - Method and apparatus for polishing workpiece edge - Google Patents

Method and apparatus for polishing workpiece edge Download PDF

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JP4897224B2
JP4897224B2 JP2005036754A JP2005036754A JP4897224B2 JP 4897224 B2 JP4897224 B2 JP 4897224B2 JP 2005036754 A JP2005036754 A JP 2005036754A JP 2005036754 A JP2005036754 A JP 2005036754A JP 4897224 B2 JP4897224 B2 JP 4897224B2
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workpiece
edge
buff
water
abrasive grains
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JP2006198757A (en
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幸男 石政
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Daito Electron Co Ltd
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Daito Electron Co Ltd
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  • Mechanical Treatment Of Semiconductor (AREA)

Description

本発明は、ワークのエッジの研摩方法及び装置に係り、特にワークの一例たるシリコンウェーハ等の半導体ウェーハを縦方向に、好ましくは水平面に対して60度乃至90度の縦方向の範囲に、最も好ましくは垂直に保持して少くとも3個の回転体で回転駆動し、ワークの最下部にバフを配設し、研摩部には下方から遊離砥粒(スラリー)を噴射してバフ研摩するように構成し、しかも該バフをその厚さ方向の両側から押圧するバフ押圧装置を備えることにより、従来の吸着テーブル方式の問題点を解決し、遊離砥粒の除去の完全化、ワークのエッジの両面及び端面の同時バフ研摩の実現による大幅な省力化、更にはバフ研摩終了後の遊離砥粒の除去の完全化を図ることができる画期的なワークのエッジの研摩方法及び装置に関する。  The present invention relates to a method and apparatus for polishing an edge of a workpiece, and in particular, a semiconductor wafer such as a silicon wafer as an example of a workpiece in a vertical direction, preferably in a vertical range of 60 to 90 degrees with respect to a horizontal plane. Preferably, it is held vertically and is driven to rotate by at least three rotating bodies. A buff is disposed at the lowermost part of the work, and free abrasive grains (slurry) are sprayed from below into the polishing part for buffing. And a buff pressing device that presses the buff from both sides in its thickness direction, thereby solving the problems of the conventional suction table system, complete removal of loose abrasive grains, The present invention relates to an epoch-making method and apparatus for polishing an edge of a workpiece that can achieve significant labor savings by realizing simultaneous buffing of both surfaces and end surfaces, and furthermore, complete removal of loose abrasive grains after completion of buffing.

従来の半導体ウェーハ等のワーク1のエッジ1aの研摩方法及び装置は、図17に示すように、ワーク1を、待機位置から研摩位置まで矢印Aの如く移動させて心出しを行い、該ワークを吸着テーブル(図示せず)で横方向、即ち水平に保持して固定し、矢印B又はC方向に低速度で回転させてスピンドル2の回転軸3に固定されたバフ4を適度な圧力でワーク1のエッジ1aに押圧して該バフを矢印Dの如く高速度で回転させ、更にノズル5から遊離砥粒6(ダイヤモンド砥粒等を含みスラリーとも称される)を研摩部1bに噴射して、ワーク1のエッジ1aの表面、裏面及び端面を夫々スピンドル2をワーク1に対して矢印G,Hの如く及び上下方向にも移動させて、3工程で研摩するようにしたものが一般的であった。  As shown in FIG. 17, a conventional polishing method and apparatus for an edge 1a of a workpiece 1 such as a semiconductor wafer is centered by moving the workpiece 1 from a standby position to a polishing position as indicated by an arrow A. A buff 4 fixed on the rotating shaft 3 of the spindle 2 by holding at a suction table (not shown) in a horizontal direction, that is, horizontally and fixed, and rotating at a low speed in the direction of the arrow B or C with a moderate pressure. 1 is pressed against the edge 1a to rotate the buff at a high speed as indicated by an arrow D, and free abrasive grains 6 (also referred to as slurry including diamond abrasive grains) are sprayed from the nozzle 5 onto the polishing portion 1b. In general, the front surface, back surface and end surface of the edge 1a of the work 1 are polished in three steps by moving the spindle 2 with respect to the work 1 as indicated by arrows G and H and in the vertical direction. there were.

しかしながら、このような従来のワークのエッジの研摩方法及び装置においては、ワーク1が横方向に保持されているため、研摩に用いた遊離砥粒6が周囲に飛散して周囲の機械装置等を汚したり、該遊離砥粒がワーク1に付着した場合、そのままの状態で連れ回られることになり、ワーク1から完全に除去することが困難であり、ワーク1のその後の工程において色々な災いをもたらすおそれがあった。例えばその化学的特性の有害性の故に、ワーク1自体に浸食等の損傷を与えたり、機械装置を腐食させたりするという欠点があった。  However, in such a conventional method and apparatus for polishing an edge of a workpiece, since the workpiece 1 is held in the lateral direction, loose abrasive grains 6 used for polishing are scattered around and the surrounding mechanical device or the like is used. When it is soiled or the loose abrasive particles adhere to the work 1, it will be carried around as it is, and it is difficult to completely remove it from the work 1, and various troubles will be caused in the subsequent processes of the work 1. There was a risk of bringing. For example, due to the harmfulness of the chemical characteristics, there is a drawback that the work 1 itself is damaged such as erosion or the mechanical device is corroded.

またバフ4は単なる布等を重ねただけのものであったので、ワーク1のエッジ1aを研摩するにあたり、その表面、裏面及び端面を研摩するのに、第1工程が表面の研摩、第2工程が端面の研摩、第3工程が裏面の研摩というように、どうしても3工程を費やして研摩する必要があり、このため研摩時間が長くかかり、省力化が困難であるばかりでなく、スピンドル2の駆動装置も複雑高価となる欠点があった。  Further, since the buff 4 is simply a stack of cloths and the like, when polishing the edge 1a of the workpiece 1, the first step is polishing the surface, second polishing to polish the front surface, back surface and end surface. It is necessary to spend 3 steps of polishing, such as polishing of the end face and polishing of the back face of the third step. Therefore, it takes a long polishing time, and it is difficult to save labor. The drive device also has a drawback of being complicated and expensive.

更には、ワーク1を常に吸着テーブルにより吸着するため、ワーク1の裏面にはある程度の吸着痕が残るという欠点を避けることができなかった。
なお、図17において、ワーク1にはオリエンテーションフラット(OF)1f及びノッチ1dの両方が形成されているように図示してあるが、これは参考のための図示であり、実際にはこの両方が1枚のワーク1に形成されることはない。
Furthermore, since the work 1 is always sucked by the suction table, the disadvantage that a certain amount of suction marks remain on the back surface of the work 1 cannot be avoided.
In FIG. 17, the workpiece 1 is illustrated as having both an orientation flat (OF) 1 f and a notch 1 d, but this is an illustration for reference, and both are actually shown. It is not formed on one piece of work 1.

なお、本願発明者及び出願人は、本願発明に関する公知特許文献及び公知非特許文献を知らないので、その記載を省略する。  In addition, since this inventor and an applicant do not know the well-known patent document and well-known nonpatent literature regarding this invention, the description is abbreviate | omitted.

本発明は、上記した従来技術の欠点を除くためになされたものであって、その目的とするところは、ワークを縦方向に保持して回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを縦方向に保持して駆動装置により回転駆動し、バフをワークの最下部付近に接触させると共に研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩することによって、遊離砥粒がワークの最下部から下には滴下するが、上方には飛散したりしないようにすることであり、またこれによって遊離砥粒のワークへの飛散や付着を最小限とし、また周囲の機械装置への遊離砥粒の飛散や付着を極力防止し、残渣遊離砥粒による諸々の弊害を防止することである。  The present invention has been made in order to eliminate the above-described drawbacks of the prior art, and the object of the present invention is to provide a drive device that holds a workpiece in a vertical direction and rotationally drives it, and the vicinity of the lowermost part of the edge of the workpiece. Provided with a buff configured to be able to approach or leave the edge, and a free abrasive spray nozzle for spraying free abrasive grains to the polishing portion of the work, and holding the work in the vertical direction. Driven by a drive device, the buff is brought into contact with the vicinity of the lowermost part of the work and free abrasive grains are sprayed toward the polishing part to buff the edges of the work so that the free abrasive grains are lowered from the lowermost part of the work. In this way, it is intended to prevent dripping but adhering to the workpiece of the free abrasive grains, and to disperse the free abrasive grains to the surrounding machinery. And prevent adhesion as much as possible It is to prevent the various adverse effects due to residual 渣遊 Hanaretogi grains.

また他の目的は、ワークを水平面に対して60度乃至90度の範囲の縦方向に保持して回転駆動する駆動装置と、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを水平面に対して60度乃至90度の範囲の縦方向に保持して駆動装置により回転駆動し、ワークのエッジの最下部付近に回転するバフを配置して該バフをワークの最下部付近に接触させると共に研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩することによって、ワークに付着した遊離砥粒をワークの表面に沿って滑落させる力がほぼ最大値に保たれなが、遊離砥粒とワークとの間の摩擦力が急激にかつ一直線状に減少する範囲の縦方向にワークを保持することであり、またこれによって最も効率的に遊離砥粒が下方に流れて該遊離砥粒がその自重により極めて効率よく除去されるようにすることである。  Another object is to hold a work in a vertical direction in the range of 60 degrees to 90 degrees with respect to a horizontal plane, to drive the rotation, a buff configured to approach or leave the edge, A free abrasive grain spray nozzle for spraying free abrasive grains to the polishing part, and the workpiece is held in the vertical direction in the range of 60 degrees to 90 degrees with respect to the horizontal plane and rotated by a driving device, and the workpiece edge A buff that rotates in the vicinity of the lowermost part of the workpiece was placed, the buff was brought into contact with the vicinity of the lowermost part of the work, and free abrasive grains were sprayed toward the polishing part to buff the edge of the work, thereby adhering to the work. Although the force to slide loose abrasive grains along the surface of the workpiece is not maintained at the maximum value, the workpiece is placed in the longitudinal direction within a range where the frictional force between the loose abrasive grains and the workpiece decreases rapidly and in a straight line. Is to hold and also The most efficient free abrasive grains is to allow the free Hanaretogi grain flows downwardly is very efficiently removed by its own weight by Les.

また他の目的は、ワークを垂直方向に保持して該ワークを水平軸回りに回転駆動する駆動装置と、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを垂直方向に保持して駆動装置により水平軸回りに回転駆動し、ワークのエッジの最下部付近に回転するバフを配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩することによって、遊離砥粒とワークの面との間の遊離砥粒の自重による摩擦力を0とし、遊離砥粒の自重による滴下力を最大にして、遊離砥粒が最大の効率でワークから滴下、除去されるようにすることであり、またこれによって遊離砥粒が残渣としてワークに残ったり、周囲の機械装置等に飛散して付着したりすることによる遊離砥粒の諸々の弊害を防止することである。  Another object of the present invention is to provide a driving device that holds a workpiece in a vertical direction and rotationally drives the workpiece around a horizontal axis, a buff configured to approach or detach from the edge, and a polishing portion of the workpiece. A free abrasive spray nozzle that sprays free abrasive grains, holds the workpiece in a vertical direction, and is driven to rotate around a horizontal axis by a driving device, and a buff that rotates near the lowermost part of the edge of the work is disposed. Free abrasive grains between the free abrasive grains and the surface of the workpiece are brought into contact with the bottom of the workpiece and sprayed with free abrasive grains toward the polishing portion of the workpiece to buff the edges of the workpiece. The frictional force due to its own weight is set to 0, the dripping force due to its own weight is maximized, and the free abrasive grains are dripped and removed from the workpiece with the maximum efficiency. To work as residue Or Tsu is to prevent various harmful effects of free abrasive grains due to or adhering scattered around the machinery and equipment.

更に他の目的は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩することによって、ワークを回転駆動するための吸着テーブルを不要とすることであり、またこれによって吸着によって必然的にワークに生ずる吸着痕を皆無とし、また吸着によるワークの汚染のおそれを完全になくすことである。また吸着テーブルによらなくとも、少なくとも3個の回転体をワークの半径方向に移動させることで、簡単にワークの芯出しを行うことができるようにすることである。  Still another object is that the workpiece is held in the vertical direction and the outer peripheral portion of the workpiece is driven to rotate by at least three rotating bodies, and is disposed near the lowermost part of the edge of the workpiece. A buff configured to be able to approach or leave, and a free abrasive spray nozzle that sprays free abrasive grains to the polishing portion of the workpiece, and holds the workpiece in the vertical direction to provide at least three outer peripheral portions of the workpiece The buff is rotated by the rotating body of the workpiece, and a buff rotating in the vicinity of the lowermost part of the edge of the work is disposed so as to be able to approach or leave the work, and the buff is brought into contact with the vicinity of the lowermost part of the work. This eliminates the need for a suction table for rotationally driving the workpiece by spraying loose abrasive grains toward the workpiece and buffing the workpiece edge. And none cheat adsorption mark, also is to completely eliminate the risk of contamination of the workpiece by suction. In addition, it is possible to easily center the workpiece by moving at least three rotating bodies in the radial direction of the workpiece without using the suction table.

また他の目的は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、研摩部の直後の工程に配設されワークのエッジに接触させて該エッジに付着した遊離砥粒を除去するブラシとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩し、研摩部の直後の工程においてブラシをワークのエッジに接触させて該エッジに付着した遊離砥粒を掻き取ることによって、バフ研摩によってワークに付着した遊離砥粒をその直後の工程においてほぼ完全に除去できるようにすることであり、またこれによって遊離砥粒を下方に完全に滴下させてワークから遊離砥粒が最もきれいに除去できるようにすることである。  Another object is to provide a driving device that holds the workpiece in the vertical direction and rotationally drives the outer periphery of the workpiece by at least three rotating bodies, and is disposed near the lowermost portion of the edge of the workpiece. A buff configured to be able to approach or leave, a free abrasive spray nozzle for spraying free abrasive grains to the polishing part of the work, and an edge disposed in contact with the edge of the work disposed in a process immediately after the polishing part. And a brush for removing loose abrasive particles adhering to the workpiece, holding the workpiece in the vertical direction, rotating the outer periphery of the workpiece by at least three rotating bodies, and rotating near the bottom of the workpiece edge. Is placed so as to be close to or disengageable from the workpiece, the buff is brought into contact with the vicinity of the lowermost part of the workpiece, and free abrasive grains are sprayed toward the polishing portion of the workpiece to buff the edge of the workpiece, In the process immediately after The brush is brought into contact with the edge of the workpiece and the free abrasive grains adhering to the edge are scraped off, so that the free abrasive particles adhering to the workpiece by buffing can be almost completely removed in the immediately following process. It is also possible to completely drop the free abrasive grains downward so that the free abrasive grains can be removed most cleanly from the workpiece.

また他の目的は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより遊離砥粒をワークから除去するように構成された水用ノズルとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩しつつ、ワークの上方から下方に向けて該ワークの回転中心の両側に分けて水を噴射し、該水の流れにより遊離砥粒をワークから除去することによって、従来避けることのできなかった吸着テーブルによる吸着痕の発生を皆無としつつ、バフ研摩によってワークに付着した遊離砥粒を垂直方向の水の流れによって下方に流下させて極めて効率的に除去できるようにすることである。  Another object is to provide a driving device that holds the workpiece in the vertical direction and rotationally drives the outer periphery of the workpiece by at least three rotating bodies, and is disposed near the lowermost portion of the edge of the workpiece. A buff configured to be able to approach or detach, a free abrasive spray nozzle for spraying free abrasive grains to the polishing part of the work, and arranged separately on both sides of the rotation center of the work, from above to below the work A water nozzle configured to spray water toward and remove free abrasive grains from the workpiece by the flow of the water, and hold the workpiece in the vertical direction to rotate the outer periphery of the workpiece at least three times A buff that is driven to rotate by the body and rotates near the lowermost part of the edge of the work is disposed so as to be able to approach or leave the work, and the buff is brought into contact with the vicinity of the lowermost part of the work and directed toward the polishing part of the work Free abrasive grains By buffing the edge of the workpiece and spraying water separately on both sides of the rotation center of the workpiece from the top to the bottom of the workpiece, and removing the free abrasive grains from the workpiece by the flow of water, While eliminating the generation of suction marks by the suction table that could not be avoided, the free abrasive grains adhering to the workpiece by buffing can flow down downward by the vertical water flow so that they can be removed very efficiently. That is.

また他の目的は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより遊離砥粒をワークから除去するように構成された水用ノズルと、研摩部の直下に配設され遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され水を遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩しつつ、ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより遊離砥粒をワークから除去し、更に遊離砥粒を研摩部の直下の遊離砥粒用ダクトに、水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて遊離砥粒と水とを分別除去することによって、遊離砥粒の濃度が最も濃い廃液と、該濃度が薄くほとんど水である廃液とを分別できるようにすることであり、またこれによって装置からの廃液処理の合理化を図ると共に、環境汚染を極力防止することである。  Another object is to provide a driving device that holds the workpiece in the vertical direction and rotationally drives the outer periphery of the workpiece by at least three rotating bodies, and is disposed near the lowermost portion of the edge of the workpiece. A buff configured to be able to approach or detach, a free abrasive spray nozzle for spraying free abrasive grains to the polishing part of the work, and arranged separately on both sides of the rotation center of the work, from above to below the work A water nozzle configured to spray water toward and remove free abrasive grains from the workpiece by the flow of the water, and a free abrasive configured to discharge the free abrasive grains disposed directly under the polishing portion A duct for grains, and a water duct arranged on both sides of the loose abrasive duct and configured to guide and discharge water to both sides of the loose abrasive duct respectively, Hold the outer periphery of the workpiece at least three times A buff that is driven to rotate by the body and rotates near the lowermost part of the edge of the work is disposed so as to be able to approach or leave the work, and the buff is brought into contact with the vicinity of the lowermost part of the work and directed toward the polishing part of the work While spraying loose abrasive grains and buffing the edges of the workpiece, water is sprayed from the water nozzles arranged separately on both sides of the rotation center of the workpiece from the upper side to the lower side of the workpiece, The free abrasive grains are removed from the workpiece by the flow of water, and the free abrasive grains are further supplied to the free abrasive duct directly under the polishing section, and the water is supplied to the water ducts disposed on both sides of the free abrasive duct. By separating and removing the free abrasive grains and water, the waste liquid with the highest concentration of free abrasive grains can be separated from the waste liquid with a thin concentration and almost water, and thereby the apparatus. Streamlining waste liquid treatment from Together, and to prevent environmental pollution as much as possible.

また他の目的は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより遊離砥粒をワークから除去するように構成された水用ノズルと、研摩部の直下に配設され遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され水を前記遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトと、水用ノズルの更に外側に配設されエアを上方から下方に向けて噴射してワークの両側にエアカーテンを形成し遊離砥粒の周囲への飛散を防止するように構成されたエア用ノズルとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩しつつ、ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより遊離砥粒をワークから除去し、更に遊離砥粒を研摩部の直下の遊離砥粒用ダクトに、水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて遊離砥粒と水とを分別除去すると共に、水用ノズルの更に外側のエア用ノズルからエアを上方から下方に向けて噴射してワークの両側にエアカーテンを形成し、遊離砥粒の周囲への飛散を防止することによって、ワークへの吸着痕の防止、遊離砥粒と水の分別回収の実現を図りつつ、バフ研摩による遊離砥粒の周囲の機械装置への飛散を防止し、装置の汚染を最小限に抑制して装置の耐久性の向上を図ることである。  Another object is to provide a driving device that holds the workpiece in the vertical direction and rotationally drives the outer periphery of the workpiece by at least three rotating bodies, and is disposed near the lowermost portion of the edge of the workpiece. A buff configured to be able to approach or detach, a free abrasive spray nozzle for spraying free abrasive grains to the polishing part of the work, and arranged separately on both sides of the rotation center of the work, from above to below the work A water nozzle configured to spray water toward and remove free abrasive grains from the workpiece by the flow of the water, and a free abrasive configured to discharge the free abrasive grains disposed directly under the polishing portion A duct for grains, a water duct arranged on both sides of the loose abrasive duct and configured to guide and discharge water to both sides of the loose abrasive duct, and further outside the water nozzle The air is sprayed from above to below. An air nozzle configured to form air curtains on both sides of the work and prevent the loose abrasive grains from scattering around the work, and hold the work in the vertical direction so that the outer periphery of the work is at least three pieces. Driven by a rotating body, a buff that rotates near the lowermost part of the edge of the work is disposed so as to be able to approach or leave the work, and the buff is brought into contact with the vicinity of the lowermost part of the work. While spraying loose abrasive grains and buffing the edges of the workpiece, water is sprayed from the water nozzles arranged separately on both sides of the rotation center of the workpiece from the top to the bottom of the workpiece, The free abrasive grains are removed from the workpiece by the flow of the water, and the free abrasive grains are further supplied to the free abrasive duct directly under the polishing section, and the water is supplied to the water ducts disposed on both sides of the free abrasive duct. Guide and remove free abrasive grains and water, respectively In addition, air is sprayed from the air nozzle further outward from the water nozzle toward the lower side to form air curtains on both sides of the work, thereby preventing the loose abrasive grains from scattering around the work. This prevents the adhering trace to the surface and separates and collects the free abrasive grains and water, prevents the free abrasive grains from scattering to the surrounding machinery and equipment by buffing, and minimizes contamination of the equipment. This is to improve the durability.

更に他の目的は、ワークを垂直方向に保持して該ワークを水平軸回りに回転駆動する駆動装置と、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、駆動装置を、吸着テーブルとし、ワークを縦方向に保持して該ワークを吸着テーブルにより回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩することによって、従来の吸着テーブルの機構をそのまま利用しつつ、ワークを垂直方向に保持することで、バフ研摩によってワークに付着した遊離砥粒のワークの面に対する遊離砥粒の自重による摩擦力を0として、遊離砥粒が最も効率よく下方に滴下するようにして、最も効率的な遊離砥粒の除去を達成することである。  Still another object is to a drive device that holds the workpiece in a vertical direction and rotationally drives the workpiece around a horizontal axis, a buff configured to be able to approach or leave the edge, and a polishing portion of the workpiece. It is equipped with a loose abrasive spray nozzle that sprays loose abrasive grains, the drive device is a suction table, the work is held in the vertical direction, the work is rotated by the suction table, and it rotates near the bottom of the edge of the work The buff to be moved is arranged so as to be close to or detachable from the workpiece, the buff is brought into contact with the vicinity of the lowermost portion of the workpiece, and free abrasive grains are sprayed toward the polishing portion of the workpiece to buff the edge of the workpiece. By holding the workpiece in the vertical direction while using the mechanism of the conventional suction table as it is, the free weight of the free abrasive grains with respect to the work surface of the free abrasive grains adhered to the workpiece by buffing The frictional force by a 0, as free abrasive grains are added dropwise most efficiently downward, it is to achieve the elimination of the most efficient free abrasive grains.

また他の目的は、ワークのエッジに対して接近又は離脱可能なバフを該エッジに接触させ、該ワークの研摩部に遊離砥粒を噴射して該ワークのエッジをバフ研摩するワークのエッジの研摩方法及び装置において、バフがワークのエッジに接触したときに該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩するように構成されたバフ押圧装置を備え、バフがワークのエッジに接触したときに、該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩することによって、バフをあたかも総形研摩具のように使用できるようにすることであり、またこれによってわずか1工程で従来の3工程のバフ研摩を行うことができるようにして、研摩時間の大幅な短縮と、省力化を達成することである。  Another object of the present invention is to bring a buff that can approach or leave the workpiece edge into contact with the edge, and spray free abrasive grains on the polishing portion of the workpiece to buff the workpiece edge. In the polishing method and apparatus, when the buff comes into contact with the workpiece edge, both sides of the edge and the end surface are simultaneously polished by pressing both sides of the buff in the thickness direction with a pressing member and sandwiching both surfaces of the workpiece with the buff. A buff pressing device configured to perform buffing is provided, and when the buff contacts the edge of the workpiece, both sides of the buff in the thickness direction are pressed by a pressing member and polished so that both surfaces of the workpiece are sandwiched by the buff. By simultaneously buffing both sides and end faces of the edge, it is possible to use the buff as if it were a general abrasive. As it is possible to perform buffing conventional 3 step in just one step Te, and significant reduction in polishing time, it is to achieve labor saving.

また他の目的は、ワークのエッジに対して接近又は離脱可能なバフを該エッジに接触させ、該ワークの研摩部に遊離砥粒を噴射して該ワークのエッジをバフ研摩するワークのエッジの研摩方法及び装置において、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、バフがワークのエッジに接触したときに該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩するように構成されたバフ押圧装置とを備え、ワークを縦方向に保持して駆動装置により回転駆動し、ワークのエッジの最下部付近に回転するバフを配置して該バフをワークの最下部付近に接触させると共に、バフがワークのエッジに接触したときに、該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩することによって、遊離砥粒の自重による滴下の効率を最大とし、また吸着テーブルを用いないことにより吸着痕の発生を皆無としつつ、芯出しの容易化を図り、更にわずか1工程で従来の3工程のバフ研摩を行うことができるようにして、研摩時間の大幅な短縮と、省力化を達成することである。  Another object of the present invention is to bring a buff that can approach or leave the workpiece edge into contact with the edge, and spray free abrasive grains on the polishing portion of the workpiece to buff the workpiece edge. In the polishing method and apparatus, a work apparatus is provided in the vicinity of the lowermost part of the edge of the work, wherein the work is held in the vertical direction and the outer peripheral part of the work is rotationally driven by at least three rotating bodies. A buff configured to be able to approach or detach, a free abrasive spray nozzle for spraying free abrasive grains to the polishing part of the workpiece, and both sides of the buff in the thickness direction when the buff contacts the workpiece edge. A buff pressing device configured to buff both sides and end faces of the edge at the same time by polishing by pressing with a pressing member and sandwiching both sides of the workpiece with a buff, holding the workpiece in the vertical direction Is rotated by a driving device, and a buff that rotates near the lowermost part of the workpiece edge is arranged so that the buff is brought into contact with the lowermost part of the workpiece, and when the buff comes into contact with the edge of the workpiece, By buffing both sides and end surfaces of the edge simultaneously by pressing both sides in the thickness direction with a pressing member and polishing both sides of the work with a buff, the efficiency of dripping due to the free weight of the free abrasive grains is maximized, In addition, by eliminating the use of a suction table, there is no generation of suction marks, facilitating centering, and the conventional three-step buff polishing can be performed in just one step, greatly increasing the polishing time. To shorten the power and save labor.

要するに本発明方法(請求項)は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、前記ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフを前記ワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射して前記ワークのエッジをバフ研摩しつつ、前記ワークの上方から下方に向けて該ワークの回転中心の両側に分けて水を噴射し、該水の流れにより前記遊離砥粒を前記ワークから除去することを特徴とするものである。 In short, the method of the present invention (Claim 1 ) holds the workpiece in the vertical direction, rotationally drives the outer peripheral portion of the workpiece by at least three rotating bodies, and rotates the buff rotating near the lowermost portion of the edge of the workpiece. While placing the buff in proximity to or away from the workpiece and bringing the buff into contact with the vicinity of the lowermost part of the workpiece and buffing the edge of the workpiece by spraying loose abrasive grains toward the polishing portion of the workpiece, Water is sprayed separately on both sides of the center of rotation of the workpiece from above to below the workpiece, and the free abrasive grains are removed from the workpiece by the flow of the water.

また本発明方法(請求項)は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、前記ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフを前記ワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射して前記ワークのエッジをバフ研摩しつつ、前記ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより前記遊離砥粒を前記ワークから除去し、更に前記遊離砥粒を前記研摩部の直下の遊離砥粒用ダクトに、前記水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて前記遊離砥粒と前記水とを分別除去することを特徴とするものである。In the method of the present invention (claim 2 ), the work is held in the vertical direction, the outer periphery of the work is rotationally driven by at least three rotating bodies, and the buff that rotates near the lowermost part of the edge of the work is While placing the buff in proximity to or away from the workpiece and bringing the buff into contact with the vicinity of the lowermost part of the workpiece and buffing the edge of the workpiece by spraying loose abrasive grains toward the polishing portion of the workpiece, Water is sprayed from water nozzles arranged separately on both sides of the rotation center of the workpiece from above to below the workpiece, and the free abrasive grains are removed from the workpiece by the flow of the water. The loose abrasive grains and the water are introduced by introducing the loose abrasive grains into the loose abrasive ducts directly below the polishing portion, and the water to water ducts disposed on both sides of the loose abrasive duct. It is characterized by separating and removing .

また本発明方法(請求項)は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、前記ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフを前記ワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射して前記ワークのエッジをバフ研摩しつつ、前記ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより前記遊離砥粒を前記ワークから除去し、更に前記遊離砥粒を前記研摩部の直下の遊離砥粒用ダクトに、前記水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて前記遊離砥粒と前記水とを分別除去すると共に、前記水用ノズルの更に外側に配設されたエア用ノズルからエアを上方から下方に向けて噴射して前記ワークの両側にエアカーテンを形成し、前記遊離砥粒の周囲への飛散を防止することを特徴とするものである。In the method of the present invention (claim 3 ), the work is held in the vertical direction, the outer periphery of the work is rotationally driven by at least three rotating bodies, and a buff that rotates near the lowermost part of the edge of the work is provided. While placing the buff in proximity to or away from the workpiece and bringing the buff into contact with the vicinity of the lowermost part of the workpiece and buffing the edge of the workpiece by spraying loose abrasive grains toward the polishing portion of the workpiece, Water is sprayed from water nozzles arranged separately on both sides of the rotation center of the workpiece from above to below the workpiece, and the free abrasive grains are removed from the workpiece by the flow of the water. The loose abrasive grains and the water are introduced by introducing the loose abrasive grains into the loose abrasive ducts directly below the polishing portion, and the water to water ducts disposed on both sides of the loose abrasive duct. Separate and remove the water nozzle. An air curtain is formed on both sides of the work by injecting air from the air nozzle arranged on the outside to the lower side to prevent the loose abrasive grains from being scattered around. Is.

また本発明方法(請求項)は、ワークを縦方向に保持してにより該ワークの外周部を少なくとも3個の回転体により回転駆動し、請求項ワークのエッジの最下部付近に回転する総形刃具形のバフを配置して該バフを前記ワークの最下部付近に接触させると共に、前記バフが前記ワークの前記エッジに接触したときに、該バフの厚さ方向の両側を押圧部材により押圧して前記ワークの両面をバフで総形刃具のような形に挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩することを特徴とするものである。The present invention method (Claim 4), the total of rotating the workpiece held in the vertical direction and rotationally driven by at least three of the rotating body an outer peripheral portion of the work by, the near the bottom edge of claims workpiece A blade with a blade shape is arranged to bring the buff into contact with the vicinity of the lowermost part of the workpiece, and when the buff contacts the edge of the workpiece, both sides in the thickness direction of the buff are pressed by pressing members. Then, the both surfaces and end surfaces of the edge are simultaneously buffed by polishing so that both surfaces of the workpiece are sandwiched by a buff in a shape like a general cutting tool .

また本発明装置(請求項)は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離脱可能に構成されたバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより前記遊離砥粒を前記ワークから除去するように構成された水用ノズルとを備えたことを特徴とするものである。Further, the device of the present invention (Claim 5 ) is provided in the vicinity of the lowermost part of the edge of the workpiece, and a driving device for holding the workpiece in the vertical direction and rotating the outer periphery of the workpiece by at least three rotating bodies. And arranged separately on both sides of the rotation center of the workpiece, a buff configured to be able to approach or leave the edge, a loose abrasive spray nozzle for spraying loose abrasive grains to the polishing portion of the workpiece, and And a water nozzle configured to spray water from above the workpiece downward and to remove the loose abrasive grains from the workpiece by the flow of the water. .

また本発明装置(請求項)は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離脱可能に構成されたバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより前記遊離砥粒を前記ワークから除去するように構成された水用ノズルと、前記研摩部の直下に配設され前記遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され前記水を前記遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトとを備え、前記遊離砥粒を前記遊離砥粒用ダクトに、前記水を前記水用ダクトに夫々導いて前記遊離砥粒と前記水とを分別除去するように構成したことを特徴とするものである。The apparatus of the present invention (Claim 6 ) is provided near the lowermost part of the edge of the workpiece, and a drive device for holding the workpiece in the vertical direction and rotating the outer periphery of the workpiece by at least three rotating bodies. And arranged separately on both sides of the rotation center of the workpiece, a buff configured to be able to approach or leave the edge, a loose abrasive spray nozzle for spraying loose abrasive grains to the polishing portion of the workpiece, and A water nozzle configured to jet water from above the workpiece downward and remove the loose abrasive grains from the workpiece by the flow of the water; and disposed immediately below the polishing portion; A loose abrasive duct configured to discharge loose abrasive grains, and the water disposed on both sides of the loose abrasive duct so as to be guided and discharged to both sides of the loose abrasive duct. A water duct configured, and The release abrasive grains are guided to the loose abrasive duct and the water is led to the water duct to separate and remove the free abrasive grains and the water.

また本発明装置(請求項)は、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離脱可能に構成されたバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより前記遊離砥粒を前記ワークから除去するように構成された水用ノズルと、前記研摩部の直下に配設され前記遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され前記水を前記遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトと、前記水用ノズルの更に外側に配設されエアを上方から下方に向けて噴射して前記ワークの両側にエアカーテンを形成し前記遊離砥粒の周囲への飛散を防止するように構成されたエア用ノズルとを備えたことを特徴とするものである。Further, the device of the present invention (Claim 7 ) is provided in the vicinity of the lowermost part of the edge of the workpiece, and a driving device for holding the workpiece in the vertical direction and rotating the outer periphery of the workpiece by at least three rotating bodies. And arranged separately on both sides of the rotation center of the workpiece, a buff configured to be able to approach or leave the edge, a loose abrasive spray nozzle for spraying loose abrasive grains to the polishing portion of the workpiece, and A water nozzle configured to jet water from above the workpiece downward and remove the loose abrasive grains from the workpiece by the flow of the water; and disposed immediately below the polishing portion; A loose abrasive duct configured to discharge loose abrasive grains, and the water disposed on both sides of the loose abrasive duct so as to be guided and discharged to both sides of the loose abrasive duct. A configured water duct and the water nose An air nozzle arranged on the outer side of the nozzle and configured to inject air from above to below to form air curtains on both sides of the workpiece to prevent scattering of the loose abrasive grains. It is characterized by comprising.

また本発明装置(請求項)は、ワークのエッジに対して接近又は離脱可能なバフを該エッジに接触させ、該ワークの研摩部に遊離砥粒を噴射して該ワークのエッジをバフ研摩するワークのエッジの研摩装置において、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離脱可能に構成された総形刃具形のバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記バフが前記ワークの前記エッジに接触したときに該バフの厚さ方向の両側を押圧部材により押圧して前記ワークの両面を前記バフで総形刃具のような形に挟むようにして研摩することにより前記エッジの両面及び端面を同時にバフ研摩するように構成されたバフ押圧装置とを備えたことを特徴とするものである。Further, the apparatus of the present invention (Claim 8 ) makes a buff that can approach or leave the workpiece edge contact the edge, and sprays free abrasive grains on the polishing portion of the workpiece to buff the workpiece edge. In the polishing apparatus for the edge of the workpiece, the driving device that holds the workpiece in the vertical direction and rotationally drives the outer peripheral portion of the workpiece by at least three rotating bodies, and disposed near the lowermost portion of the edge of the workpiece, A buff having a general blade shape configured to be able to approach or detach from the edge, a free abrasive spray nozzle for spraying free abrasive grains to the polishing portion of the work, and the buff serving as the edge of the work When both sides of the edge of the buff are pressed against each other by a pressing member and both surfaces of the workpiece are polished in a shape like a general cutting tool with the buff, the both surfaces and end surfaces of the edge are made the same. And a buff pressing device configured to be buffed sometimes.

本発明は、上記のように、ワークを縦方向に保持して回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを縦方向に保持して駆動装置により回転駆動し、バフをワークの最下部付近に接触させると共に研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩するようにしたので、遊離砥粒がワークの最下部から下には滴下するが、上方には飛散したりしないようにすることができ、またこの結果遊離砥粒のワークへの飛散や付着を最小限とし得、また周囲の機械装置への遊離砥粒の飛散や付着を極力防止でき、残渣遊離砥粒による諸々の弊害を防止することができる効果がある。  The present invention, as described above, includes a drive device that holds and rotates a workpiece in a vertical direction, and a buff that is disposed near the lowermost portion of the edge of the workpiece and is configured to approach or leave the edge. A loose abrasive spray nozzle for spraying loose abrasive grains to the polishing part of the workpiece, holding the workpiece in the vertical direction and rotating it with a driving device to bring the buff into contact with the vicinity of the bottom of the workpiece and polishing Since the abrasive grains are sprayed toward the part and the edges of the workpiece are buffed, the loose abrasive grains will drop from the bottom of the workpiece but should not be scattered upward. As a result, it is possible to minimize the scattering and adhesion of loose abrasive grains to the workpiece, and to prevent the loose abrasive grains from spreading to and adhere to surrounding machinery as much as possible. There is an effect that can be prevented.

またワークを水平面に対して60度乃至90度の範囲の縦方向に保持して回転駆動する駆動装置と、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを水平面に対して60度乃至90度の範囲の縦方向に保持して駆動装置により回転駆動し、ワークのエッジの最下部付近に回転するバフを配置して該バフをワークの最下部付近に接触させると共に研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩するようにしたので、ワークに付着した遊離砥粒をワークの表面に沿って滑落させる力がほぼ最大値に保たれながら、遊離砥粒とワークとの間の摩擦力が急激にかつ一直線状に減少する範囲の縦方向にワークを保持することができ、またこの結果最も効率的に遊離砥粒が下方に流れて該遊離砥粒がその自重により極めて効率よく除去されるという効果がある。  Also, a drive device that holds and rotates the workpiece in a vertical direction in the range of 60 degrees to 90 degrees with respect to the horizontal plane, a buff configured to approach or leave the edge, and a polishing portion of the workpiece A free abrasive grain spray nozzle for spraying free abrasive grains, hold the work in a vertical direction in the range of 60 to 90 degrees with respect to the horizontal plane, and rotate by a driving device, near the bottom of the edge of the work Since a rotating buff is arranged to bring the buff into contact with the vicinity of the lowermost part of the work and free abrasive grains are sprayed toward the polishing part to buff the edges of the work. The workpiece can be held in the longitudinal direction within a range where the frictional force between the loose abrasive grains and the workpiece decreases rapidly and in a straight line while the force to slide the workpiece along the surface of the workpiece is maintained at a maximum value. And also this result There is an effect that also efficiently free abrasive grains is the free Hanaretogi grain flows downwardly is very efficiently removed by its own weight.

またワークを垂直方向に保持して該ワークを水平軸回りに回転駆動する駆動装置と、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを垂直方向に保持して駆動装置により水平軸回りに回転駆動し、ワークのエッジの最下部付近に回転するバフを配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩するようにしたので、遊離砥粒とワークの面との間の遊離砥粒の自重による摩擦力を0とし得、遊離砥粒の自重による滴下力が最大となり、遊離砥粒が最大の効率でワークから滴下、除去されるという効果があり、またこの結果遊離砥粒が残渣としてワークに残ったり、周囲の機械装置等に飛散して付着したりすることによる遊離砥粒の諸々の弊害を防止することができる効果が得られる。  In addition, a drive device that holds the workpiece in a vertical direction and rotationally drives the workpiece around a horizontal axis, a buff configured to be close to or disengageable from the edge, and free abrasive grains are sprayed to the polishing portion of the workpiece A loose abrasive spray nozzle that holds the workpiece in a vertical direction and is driven to rotate around a horizontal axis by a driving device, and a buff that rotates near the lowermost part of the edge of the workpiece is disposed to place the buff at the top of the workpiece. Since the free abrasive grains are sprayed toward the polishing portion of the workpiece and buffed to the edge of the workpiece, the workpiece is buffed by the weight of the free abrasive grains between the free abrasive grains and the surface of the workpiece. The frictional force can be reduced to 0, the dripping force due to the free weight of the free abrasive grains is maximized, and the free abrasive grains are dripped and removed from the work with maximum efficiency. As a result, the free abrasive grains are left as residues on the work. Left or around Effect capable of preventing various bad effects of the loose abrasive grains caused by or adhered to scatter 械 device such as can be obtained.

更には、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩するようにしたので、ワークを回転駆動するための吸着テーブルを不要とすることができ、またこの結果吸着によって必然的にワークに生ずる吸着痕を皆無とし得、また吸着によるワークの汚染のおそれを完全になくすことができる効果がある。また吸着テーブルによらなくとも、少なくとも3個の回転体をワークの半径方向に移動させることで、簡単にワークの芯出しを行うことができるという効果がある。  Furthermore, a drive device that holds the workpiece in the vertical direction and drives the outer periphery of the workpiece to rotate by at least three rotating bodies, and is disposed near the bottom of the edge of the workpiece, approaching or leaving the edge A buff configured to be possible and a free abrasive spray nozzle for injecting free abrasive grains to the polishing portion of the workpiece, holding the workpiece in the vertical direction, and at least three rotating bodies around the outer periphery of the workpiece The buff rotating near the lowermost part of the workpiece edge is disposed so as to be able to approach or detach from the workpiece, and the buff is brought into contact with the lowermost part of the workpiece and directed toward the polishing portion of the workpiece. Since the free abrasive grains are sprayed to buff the edges of the workpiece, a suction table for rotating the workpiece can be dispensed with. There is an effect that can be completely eliminated the risk of contamination of the workpiece by none and to obtain, also adsorb. Further, there is an effect that the workpiece can be easily centered by moving at least three rotating bodies in the radial direction of the workpiece without using the suction table.

またワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、研摩部の直後の工程に配設されワークのエッジに接触させて該エッジに付着した遊離砥粒を除去するブラシとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩し、研摩部の直後の工程においてブラシをワークのエッジに接触させて該エッジに付着した遊離砥粒を掻き取るようにしたので、バフ研摩によってワークに付着した遊離砥粒をその直後の工程においてほぼ完全に除去できるという効果があり、またこの結果遊離砥粒を下方に完全に滴下させてワークから遊離砥粒が最もきれいに除去できるという効果がある。  In addition, the workpiece is held in the vertical direction and the outer periphery of the workpiece is driven to rotate by at least three rotating bodies. The configured buff, the free abrasive spray nozzle that sprays free abrasive grains to the polishing part of the workpiece, and the free abrasive that is disposed in the process immediately after the polishing part and contacts the edge of the work. A brush for removing particles, holding the workpiece in a vertical direction, rotating the outer periphery of the workpiece by at least three rotating bodies, and rotating a buff rotating near the lowermost part of the edge of the workpiece against the workpiece The buff is brought into contact with or near the lowermost part of the work, and the edge of the work is buffed by spraying loose abrasive grains toward the work's polishing part. In brush Since the free abrasive grains adhering to the edge are scraped off by contacting with the edge of the work, there is an effect that the free abrasive grains adhering to the work can be almost completely removed by buffing in the process immediately after that. As a result, there is an effect that the free abrasive grains can be completely dropped downward and the free abrasive grains can be removed most cleanly from the workpiece.

またワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより遊離砥粒をワークから除去するように構成された水用ノズルとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩しつつ、ワークの上方から下方に向けて該ワークの回転中心の両側に分けて水を噴射し、該水の流れにより遊離砥粒をワークから除去するようにしたので、従来避けることのできなかった吸着テーブルによる吸着痕の発生を皆無としつつ、バフ研摩によってワークに付着した遊離砥粒を垂直方向の水の流れによって下方に流下させて極めて効率的に除去できるという効果がある。  In addition, the workpiece is held in the vertical direction and the outer periphery of the workpiece is driven to rotate by at least three rotating bodies. The buff that is configured, the loose abrasive spray nozzle that sprays loose abrasive grains to the polishing part of the workpiece, and the water is sprayed from the top to the bottom of the workpiece, arranged separately on both sides of the rotation center of the workpiece. And a water nozzle configured to remove loose abrasive grains from the workpiece by the flow of the water, holding the workpiece in the vertical direction, and rotating the outer periphery of the workpiece by at least three rotating bodies. The buff that rotates near the bottom of the workpiece edge is disposed so as to be close to or disengageable from the workpiece, the buff is brought into contact with the vicinity of the bottom of the workpiece, and loose abrasive grains are directed toward the polishing portion of the workpiece. Inject and work While buffing the wedge, spraying water on both sides of the rotation center of the workpiece from the top to the bottom of the workpiece, and removing the free abrasive grains from the workpiece by the flow of the water, While eliminating the generation of suction marks by the suction table that could not be avoided, the free abrasive grains adhering to the workpiece by buffing can be flowed down by the vertical water flow and removed extremely efficiently. is there.

またワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより遊離砥粒をワークから除去するように構成された水用ノズルと、研摩部の直下に配設され遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され水を遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩しつつ、ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより遊離砥粒をワークから除去し、更に遊離砥粒を研摩部の直下の遊離砥粒用ダクトに、水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて遊離砥粒と水とを分別除去するようにしたので、遊離砥粒の濃度が最も濃い廃液と、該濃度が薄くほとんど水である廃液とを分別できる効果があり、またこの結果装置からの廃液処理の合理化を図ることができると共に、環境汚染を極力防止することができる効果がある。  In addition, the workpiece is held in the vertical direction and the outer periphery of the workpiece is driven to rotate by at least three rotating bodies. The buff that is configured, the loose abrasive spray nozzle that sprays loose abrasive grains to the polishing part of the workpiece, and the water is sprayed from the top to the bottom of the workpiece, arranged separately on both sides of the rotation center of the workpiece. A water nozzle configured to remove free abrasive grains from the workpiece by the flow of water, a duct for free abrasive grains arranged immediately below the polishing portion and configured to discharge the free abrasive grains, And a water duct arranged on both sides of the loose abrasive duct and configured to guide and discharge water to both sides of the loose abrasive duct, respectively. Rotate the outer periphery of the A buff that is driven and rotated near the lowermost part of the edge of the work is arranged so as to be close to or disengageable from the work, and the buff is brought into contact with the vicinity of the lowermost part of the work and loose abrasive toward the polishing part of the work While spraying the grains and buffing the edges of the work, water is sprayed from the water nozzles arranged separately on both sides of the center of rotation of the work from the top to the bottom of the work. The free abrasive grains are removed from the workpiece by the above, and the free abrasive grains are further led to the free abrasive duct directly under the polishing section, and the water is led to the water ducts disposed on both sides of the free abrasive duct to release the free abrasive grains. Since the abrasive grains and water are separated and removed, there is an effect of separating the waste liquid having the highest concentration of free abrasive grains and the waste liquid having a thin concentration and almost water, and as a result, the waste liquid treatment from the apparatus. Can be streamlined and There is an effect that it is possible to prevent contamination as much as possible.

またワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより遊離砥粒をワークから除去するように構成された水用ノズルと、研摩部の直下に配設され遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され水を前記遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトと、水用ノズルの更に外側に配設されエアを上方から下方に向けて噴射してワークの両側にエアカーテンを形成し遊離砥粒の周囲への飛散を防止するように構成されたエア用ノズルとを備え、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩しつつ、ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより遊離砥粒をワークから除去し、更に遊離砥粒を研摩部の直下の遊離砥粒用ダクトに、水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて遊離砥粒と水とを分別除去すると共に、水用ノズルの更に外側のエア用ノズルからエアを上方から下方に向けて噴射してワークの両側にエアカーテンを形成し、遊離砥粒の周囲への飛散を防止するようにしたので、ワークへの吸着痕の防止、遊離砥粒と水の分別回収の実現を図りつつ、バフ研摩による遊離砥粒の周囲の機械装置への飛散を防止でき、装置の汚染を最小限に抑制して装置の耐久性の向上を図ることができる効果が得られる。  In addition, the workpiece is held in the vertical direction and the outer periphery of the workpiece is driven to rotate by at least three rotating bodies. The buff that is configured, the loose abrasive spray nozzle that sprays loose abrasive grains to the polishing part of the workpiece, and the water is sprayed from the top to the bottom of the workpiece, arranged separately on both sides of the rotation center of the workpiece. A water nozzle configured to remove free abrasive grains from the workpiece by the flow of water, a duct for free abrasive grains arranged immediately below the polishing portion and configured to discharge the free abrasive grains, A water duct disposed on both sides of the loose abrasive duct and configured to guide and discharge water to both sides of the loose abrasive duct, and an air disposed further outside the water nozzle. Are sprayed from above to below both parts of the workpiece. And an air nozzle configured to prevent the loose abrasive grains from being scattered around, and the work is held in the vertical direction so that the outer periphery of the work is formed by at least three rotating bodies. A buff that is driven to rotate and rotates near the bottom of the workpiece edge is arranged so as to be close to or disengageable from the workpiece, and the buff is brought into contact with the vicinity of the bottom of the workpiece and released toward the polishing portion of the workpiece. While spraying abrasive grains to buff the edges of the workpiece, water is sprayed from the water nozzles arranged separately on both sides of the center of rotation of the workpiece from the top to the bottom of the workpiece. The free abrasive grains are removed from the workpiece by the flow, and the free abrasive grains are further guided to the free abrasive duct directly under the polishing section, and the water is guided to the water ducts disposed on both sides of the free abrasive duct. While separating and removing loose abrasive and water Air curtain is formed on both sides of the work by spraying air from the air nozzle further outward from the water nozzle to prevent the loose abrasive grains from scattering around the work. Adhesion traces and separation and recovery of loose abrasive grains and water can be achieved, while buffing can prevent loose abrasive grains from splashing around machinery and equipment, minimizing contamination of the equipment. The effect which can aim at the improvement of durability is acquired.

更には、ワークを垂直方向に保持して該ワークを水平軸回りに回転駆動する駆動装置と、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルとを備え、駆動装置を、吸着テーブルとし、ワークを縦方向に保持して該ワークを吸着テーブルにより回転駆動し、ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフをワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射してワークのエッジをバフ研摩するようにしたので、従来の吸着テーブルの機構をそのまま利用しつつ、ワークを垂直方向に保持することで、バフ研摩によってワークに付着した遊離砥粒のワークの面に対する遊離砥粒の自重による摩擦力を0として、遊離砥粒が最も効率よく下方に滴下することとなり、最も効率的な遊離砥粒の除去を達成することができる効果がある。  Furthermore, a drive device that holds the workpiece in a vertical direction and rotationally drives the workpiece around a horizontal axis, a buff configured to be close to or disengageable from the edge, and loose abrasive grains to the polishing portion of the workpiece A free abrasive grain injection nozzle that injects, and the drive device is a suction table, the work is held in the vertical direction, the work is rotated by the suction table, and a buff that rotates near the bottom of the edge of the work The buff is brought into contact with or disengaged from the workpiece and the buff is brought into contact with the vicinity of the lowermost portion of the workpiece, and free abrasive grains are sprayed toward the polishing portion of the workpiece to buff the edge of the workpiece. Therefore, by using the conventional suction table mechanism as it is, by holding the workpiece in the vertical direction, the free abrasive grains are attached to the workpiece by buffing by the weight of the free abrasive grains with respect to the work surface. The friction force as 0, becomes the free abrasive grains are added dropwise most efficiently downward, there is an effect that it is possible to effect removal of most efficient free abrasive grains.

またワークのエッジに対して接近又は離脱可能なバフを該エッジに接触させ、該ワークの研摩部に遊離砥粒を噴射して該ワークのエッジをバフ研摩するワークのエッジの研摩方法及び装置において、バフがワークのエッジに接触したときに該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩するように構成されたバフ押圧装置を備え、バフがワークのエッジに接触したときに、該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩するようにしたので、バフをあたかも総形研摩具のように使用できるという効果があり、またこの結果わずか1工程で従来の3工程のバフ研摩を行うことができることになり、研摩時間の大幅な短縮と、省力化を達成することができる効果がある。  Further, in a workpiece edge polishing method and apparatus in which a buff capable of approaching or detaching from a workpiece edge is brought into contact with the edge, and free abrasive grains are sprayed onto the polishing portion of the workpiece to buff the workpiece edge. When the buff comes into contact with the workpiece edge, both sides in the thickness direction of the buff are pressed by a pressing member and polished so that both surfaces of the workpiece are sandwiched by the buff so that both sides and the end surface of the edge are buffed simultaneously. When the buff comes into contact with the edge of the workpiece, the both sides of the edge are polished by pressing the both sides in the thickness direction of the buff with a pressing member and sandwiching both sides of the workpiece with the buff. And buffing the end faces at the same time has the effect that the buff can be used as if it were a general-purpose polishing tool. Will be able to perform the buffing of come in three steps, and significant reduction in grinding time, there is an effect that can be achieved labor saving.

またワークのエッジに対して接近又は離脱可能なバフを該エッジに接触させ、該ワークの研摩部に遊離砥粒を噴射して該ワークのエッジをバフ研摩するワークのエッジの研摩方法及び装置において、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、ワークのエッジの最下部付近に配設され、エッジに対して接近又は離脱可能に構成されたバフと、ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、バフがワークのエッジに接触したときに該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩するように構成されたバフ押圧装置とを備え、ワークを縦方向に保持して駆動装置により回転駆動し、ワークのエッジの最下部付近に回転するバフを配置して該バフをワークの最下部付近に接触させると共に、バフがワークのエッジに接触したときに、該バフの厚さ方向の両側を押圧部材により押圧してワークの両面をバフで挟むようにして研摩することによりエッジの両面及び端面を同時にバフ研摩するようにしたので、遊離砥粒の自重による滴下の効率を最大とし得、また吸着テーブルを用いないことにより吸着痕の発生を皆無としつつ、芯出しの容易化を図ることができ、更にわずか1工程で従来の3工程のバフ研摩を行うことができるようになり、研摩時間の大幅な短縮と、省力化を達成することができる効果がある。  Further, in a workpiece edge polishing method and apparatus in which a buff capable of approaching or detaching from a workpiece edge is brought into contact with the edge, and free abrasive grains are sprayed onto the polishing portion of the workpiece to buff the workpiece edge. A driving device that holds the workpiece in the vertical direction and drives the outer periphery of the workpiece to rotate by at least three rotating bodies, and is arranged near the lowermost part of the edge of the workpiece so that the workpiece can approach or leave the edge. The configured buff, the loose abrasive spray nozzle for spraying loose abrasive grains to the polishing part of the workpiece, and the buff in the thickness direction are pressed by the pressing members when the buff contacts the workpiece edge. And a buff pressing device configured to buff both sides and end surfaces of the edge at the same time by polishing so that both surfaces of the workpiece are sandwiched between buffs, and a drive device that holds the workpiece in the vertical direction. Rotate the buff and place a buff that rotates near the bottom of the workpiece edge so that the buff contacts the bottom of the workpiece, and when the buff contacts the workpiece edge, the thickness direction of the buff Since both sides of the edge and the end face are simultaneously buffed by pressing both sides of the workpiece with a pressing member and polishing so that both sides of the work are sandwiched between buffs, the efficiency of dripping due to the free weight of the free abrasive grains can be maximized, Further, by eliminating the use of a suction table, it is possible to facilitate centering while eliminating the generation of suction marks, and it is possible to perform the conventional three-step buff polishing in only one step. This has the effect of significantly reducing time and achieving labor savings.

以下本発明を図面に示す実施例に基づいて説明する。本発明の第1実施例に係るワークのエッジの研摩装置8は、図1から図11に示すように、駆動装置9と、バフ10と、遊離砥粒噴射ノズル11と、水用ノズル12と、遊離砥粒用ダクト13と、水用ダクト14と、エア用ノズル15と、ブラシ16と、バフ押圧装置18とを備えている。  Hereinafter, the present invention will be described based on embodiments shown in the drawings. The workpiece edge polishing apparatus 8 according to the first embodiment of the present invention includes, as shown in FIGS. 1 to 11, a drive device 9, a buff 10, a free abrasive spray nozzle 11, and a water nozzle 12. , A loose abrasive duct 13, a water duct 14, an air nozzle 15, a brush 16, and a buff pressing device 18.

駆動装置9は、ワーク1(半導体ウェーハ、特にシリコン単結晶からなるシリコンウェーハが主体である。)を縦方向に保持して回転駆動するようにしたものであって、ワーク1の外周部1aを少なくとも3個の回転体20(20A,20B,20C)により回転駆動するようになっている。該回転体20の個数は、ノッチ1d付のワーク1の場合には、3個で十分である(オリエンテーションフラット1f付のワーク1では、図12に示すように、最低5個が必要である。これについては、後述する。)  The drive device 9 is configured to rotate and drive the workpiece 1 (mainly a semiconductor wafer, particularly a silicon wafer made of silicon single crystal) in the vertical direction. At least three rotating bodies 20 (20A, 20B, 20C) are rotationally driven. In the case of the workpiece 1 with the notch 1d, three rotating bodies 20 are sufficient (the workpiece 1 with the orientation flat 1f requires at least five as shown in FIG. 12). This will be described later.)

なお、ここに「縦方向」とは、従来のワーク1の水平保持状態に代表される「横方向」に対するもので、最良の状態は垂直方向であり、好ましくは水平面に対する傾斜角度が60度乃至90度の範囲の縦方向であ。
ここで図10及び図11を参照して、ワーク1の水平面に対する傾斜角度θが60度乃至90度の範囲が理想的であり、60度未満が実用は可能であるがあまり好ましくない理由(数値限定のための境界条件)について説明する。
Here, the “longitudinal direction” refers to the “lateral direction” typified by the horizontal holding state of the conventional workpiece 1, the best state is the vertical direction, and preferably the inclination angle with respect to the horizontal plane is 60 degrees to The vertical direction is in the range of 90 degrees.
Here, referring to FIG. 10 and FIG. 11, it is ideal that the inclination angle θ of the workpiece 1 with respect to the horizontal plane is 60 to 90 degrees. (Boundary conditions for limitation) will be described.

図10において、遊離砥粒6の粒子6aの質量をm、重力の加速度をg、粒子6aのワーク1の表面1eに対する直角方向の自重による分力、即ちワーク1の表面1eとの間で摩擦力fを発生させる力をF、粒子6aとワーク1の表面1eとの間の摩擦係数をμ、該表面に沿う摩擦力をfとすると、力Fは、F=mg・cosθであり、摩擦力fはf=μF=μmg・cosθとなる。
一方ワーク1の表面1eに沿う方向の分力、即ち粒子6aをワーク1の表面に沿って滑落させる力FPは、FP=mg・sinθである。
ワーク1の傾斜角度θの余弦値(cosθ)に比例して摩擦力fは変化し、ワーク1が水平、即ち傾斜角度θが0度の場合にこの余弦値が1で最大で、垂直の場合、即ち傾斜角度θが90度の場合がこの余弦値が0で最小となるから、傾斜角度θは90度に近い程有利なことは明らかである。
In FIG. 10, the mass of the particles 6 a of the loose abrasive grains 6 is m, the acceleration of gravity is g, and the component force due to the self-weight of the particles 6 a with respect to the surface 1 e of the workpiece 1, that is, friction with the surface 1 e of the workpiece 1. The force F is F = mg · cos θ, where F is the force that generates the force f, μ is the coefficient of friction between the particle 6a and the surface 1e of the workpiece 1, and f is the friction force along the surface. The force f is f = μF = μmg · cos θ.
On the other hand, the component force in the direction along the surface 1e of the workpiece 1, that is, the force FP for sliding the particles 6a along the surface of the workpiece 1 is FP = mg · sin θ.
The frictional force f changes in proportion to the cosine value (cos θ) of the tilt angle θ of the workpiece 1, and when the workpiece 1 is horizontal, that is, when the tilt angle θ is 0 degree, the cosine value is 1 and maximum, and the vertical case That is, when the inclination angle θ is 90 degrees, the cosine value is 0 and the minimum, so it is clear that the inclination angle θ is closer to 90 degrees, which is more advantageous.

しかし、傾斜角度θが60度の場合、この余弦値(cosθ)は0.5で、正弦値(sinθ)は0.866であり、ワーク1の表面に摩擦力を発生させる力Fよりも表面1eに沿って遊離砥粒6の粒子6a(又は水23の粒子)を滑落させる力FPの方が、1.73倍(73%)も大きく、非常に有利な傾斜角度であることが分かる。
またワーク1の表面1eに発生する粒子6aの摩擦力f=0.5μmgとなり、非常に小さい段階に入るばかりでなく、この傾斜角度を超えて90度までの余弦値は急激に減少し、摩擦力fの値も急激に減少し、非常に有利な範囲であることが分かる。
一方、正弦値(sinθ)は、傾斜角度θが60度で、0.866とほぼ飽和状態に達し、それ以上大きな増大はしないから、図11に示すように、傾斜角度θが60度まではかなり変化が大きいが、傾斜角度θが60度でほぼ飽和状態に達し、その後は余り大きく変化せず最大値を保つ。
このことは、傾斜角度θが60度以上では、粒子6aを滑落させる力FPは、傾斜角度θの正弦値に比例し、FP=mg・sinθであるから、力FPがほとんど最大値に近い飽和状態に達することを意味する。
However, when the inclination angle θ is 60 degrees, the cosine value (cos θ) is 0.5 and the sine value (sin θ) is 0.866, which is more than the force F that generates a frictional force on the surface of the workpiece 1. It can be seen that the force FP for sliding the particles 6a of the free abrasive grains 6 (or the particles of water 23) along 1e is 1.73 times (73%), which is a very advantageous inclination angle.
Further, the frictional force f of the particles 6a generated on the surface 1e of the work 1 becomes 0.5 μmg, which not only enters a very small stage, but also the cosine value up to 90 degrees beyond this inclination angle decreases rapidly, and the friction It can be seen that the value of the force f also decreases rapidly and is in a very advantageous range.
On the other hand, the sine value (sin θ) reaches a saturation state of 0.866 at an inclination angle θ of 60 degrees, and does not increase any further. Therefore, as shown in FIG. Although the change is quite large, it reaches a nearly saturated state at an inclination angle θ of 60 degrees, and thereafter does not change so much and maintains the maximum value.
This is because when the inclination angle θ is 60 degrees or more, the force FP for sliding the particles 6a is proportional to the sine value of the inclination angle θ, and FP = mg · sin θ, so that the force FP is almost close to the maximum value. It means reaching the state.

さて、図11から明らかなように、傾斜角度θが60度未満では、この力FPは大幅な減少に転じ、傾斜角度θ=0度で0になるまで急激に小さくなる。
これに対して傾斜角度θが60度未満の範囲の摩擦力fは、傾斜角度θが60度以上の場合と差ほど変わらずに増大して行く。
換言すれば、傾斜角度θが60度乃至90度の範囲では、粒子6aを滑落させる力FPはほとんど最大値に保たれていながら、摩擦力fは、60度ですでに非常に小さくなっているのに加えて急激に小さくなる範囲であることを意味する。
よって、この遊離砥粒6の粒子6aのワーク1の表面1eに対する自重による摩擦力fが急激に小さくなり、かつ粒子6aを滑落させる力FPが最大でほぼ一定となり、この力FPが最大値に保たれて余り変わらなくなる範囲が傾斜角度θが60度乃至90度の範囲である。
このことは、換言すれば、粒子6aをワーク1の表面1eに沿って滑落させる力FPがほとんど最大値に保たれていながら、ワーク1の表面1eと粒子6aとの間の摩擦力fを発生させる力Fは急激に小さくなる範囲、即ち好ましい範囲であることを意味する。
As is apparent from FIG. 11, when the inclination angle θ is less than 60 degrees, the force FP starts to decrease significantly, and rapidly decreases until the inclination angle θ becomes 0 at 0 degrees.
On the other hand, the frictional force f in the range where the inclination angle θ is less than 60 degrees increases as much as the difference from the case where the inclination angle θ is 60 degrees or more.
In other words, when the inclination angle θ is in the range of 60 degrees to 90 degrees, the force FP for sliding the particles 6a is kept at the maximum value, but the frictional force f is already very small at 60 degrees. In addition to the above, it means a range that rapidly decreases.
Therefore, the frictional force f due to the weight of the particles 6a of the free abrasive grains 6 on the surface 1e of the work 1 is abruptly reduced, and the force FP for sliding the particles 6a is maximally constant, and the force FP is maximized. The range in which the inclination angle θ is maintained and does not change so much is the range in which the inclination angle θ is 60 degrees to 90 degrees.
In other words, the friction force f between the surface 1e of the workpiece 1 and the particles 6a is generated while the force FP for sliding the particles 6a along the surface 1e of the workpiece 1 is kept at a maximum value. It means that the force F to be applied is in a rapidly decreasing range, that is, a preferable range.

傾斜角度θが61度では余弦値cosθは0.485で60度の場合の3%減、62度では0.469で同じく6.2%減、63度では0.454で同じく9.2%減、64度では0.438で同じく12.4%減、65度では0.423で同じく15.4%減、66度では0.407で同じく18.6%減、67度では0.391で同じく21.8%減、68度では0.375で同じく25.0%減、69度では0.358で同じく28.4%減、70度では0.342で同じく31.6%減という具合に小さくなるので、摩擦力fもこの余弦値に比例して小さくなる。  When the tilt angle θ is 61 degrees, the cosine value cos θ is 0.485, which is 3% decrease at 60 degrees, at 62 degrees it is also decreased by 6.2% at 0.469, and at 63 degrees it is 0.454 and is also 9.2%. Decline, 0.438 at 64 °, same 12.4% decrease at 65 °, 1543% decrease at 0.423 at 65 °, 18.7% decrease at 0.407 at 66 °, 0.391 at 67 ° It is also reduced by 21.8%, at 68 degrees it is 0.375 and is also reduced by 25.0%, at 69 degrees it is 0.358 and it is also reduced by 28.4%, and at 70 degrees it is 0.342 and it is also reduced by 31.6% Since it becomes smaller, the frictional force f also becomes smaller in proportion to this cosine value.

そして逆に、傾斜角度θが60度未満の場合を検討して見ると、傾斜角度θが59度では余弦値cosθは0.515で60度の場合の3%増、58度では0.530で同じく6%増、57度では0.545で同じく9%増、56度では0.559で同じく12%増、55度では0.574で同じく15%増、54度では0.588で同じく17.6%増、53度では0.602で同じく20.4%増、52度では0.616で同じく23.2%増、51度では0.629で同じく25.8%増、50度では0.643で同じく28.6%増という具合に大きくなるので、摩擦力fもこの余弦値に比例して大きくなる。  Conversely, when the case where the inclination angle θ is less than 60 degrees is examined, the cosine value cos θ is 0.515 when the inclination angle θ is 59 degrees, an increase of 3% when the inclination angle is 60 degrees, and 0.530 when the inclination angle θ is 58 degrees. It is also increased by 6%, and at 57 ° it is 0.545, it is also increased by 9%, at 56 ° it is also increased by 12%, at 55 ° it is increased by 0.574, it is also increased by 15%, and at 54 ° it is also increased by 0.588. 17.6% increase, 53 ° is 0.602, 20.4% increase, 52 ° is 0.616, 23.2% increase, 51 ° is 0.629, 25.8% increase, 50 ° Then, 0.643 also increases by 28.6%, so the frictional force f increases in proportion to this cosine value.

次に、傾斜角度θが60度を境にして、プラスマイナス10度の範囲を検討してみると、70度での余弦値cosθ、即ち摩擦力fの60度の場合に対する減少率が31.6%であるから、この範囲の1度当たりの摩擦力fの平均減少率は3.16%であるのに対して、50度での摩擦力fの60度の場合に対する減少率が28.6%であるから、この範囲の1度当たりの摩擦力fの平均減少率は2.86%であり、差ほど大きな差異はないが、60度以上の方が有利であることは明らかである。  Next, considering the range of plus or minus 10 degrees with respect to the inclination angle θ of 60 degrees, the cosine value cos θ at 70 degrees, that is, the reduction rate with respect to the friction force f of 60 degrees is 31. Since the average reduction rate of the frictional force f per degree in this range is 3.16%, the reduction rate of the frictional force f at 50 degrees with respect to the case of 60 degrees is 28. Since this is 6%, the average reduction rate of the frictional force f per degree in this range is 2.86%, which is not as great as the difference, but it is clear that 60 degrees or more is more advantageous. .

また傾斜角度θが60度を境にして、プラスマイナス20度の範囲では、80度での摩擦力fの60度の場合に対する減少率が65.2%であるから、この範囲の1度当たりの平均減少率が6.52%であるのに対して、40度での摩擦力fの60度の場合に対する増加率が53.2%であるから、この範囲の1度当たりの平均増加率が5.32%であり、差ほど大きな差異はないが、やはり60度以上の方が有利であることが分かる。  Also, in the range of plus or minus 20 degrees with the tilt angle θ as the boundary, the rate of decrease of the frictional force f at 80 degrees with respect to 60 degrees is 65.2%. The average rate of decrease in the range is 6.52%, whereas the rate of increase in the friction force f at 40 degrees is 60. 3%, so the average rate of increase per degree in this range is 53.2%. It is 5.32%, which is not as great as the difference, but it can be seen that 60 ° or more is more advantageous.

一方、粒子6aを滑落させる力FPは、上記のように傾斜角度θの正弦値sinθに比例するから、傾斜角度θが60度を中心にしてプラスマイナス10度の範囲でこの力FPを比較してみると、傾斜角度70度では、正弦値は0.939であるから60度の場合に比べて8.4%(1度当たり0.84%)の増大であるのに対して、傾斜角度50度では、正弦値は0.766であるから、11.5%(1度当たり1.15%)の減少となり、60度以上の場合に比べて60度未満の場合には力FPが大幅に減少してしまうことが分かる。
また60度を中心にしてプラスマイナス20度の範囲では、この力FPは、傾斜角度80度では正弦値は0.985であるから60度の場合に比べて13.7%(1度当たり1.37%)の小さな増大であるのに対して、傾斜角度40度では、正弦値は0.643であるから、25.8%(1度当たり2.58%)の大幅な減少となる。
これによって、傾斜角度θは60度乃至90度の範囲では、粒子6aを滑落させる力FPはほぼ最大値に保たれながら、摩擦力fは急激に減少して、非常に有利であり、傾斜角度θが60度未満では、摩擦力fが60度以上の場合と大差なく増大するのに加えて、遊離砥粒6をワーク1の表面1eに沿って滑落させる力FPが急激に小さくなって、水23によって遊離砥粒6の粒子6aを流そうとしても、ワーク1に付着してしまう可能性が大きくなる。
On the other hand, the force FP for sliding the particles 6a is proportional to the sine value sin θ of the inclination angle θ as described above. Therefore, the force FP is compared within a range of plus or minus 10 degrees around the inclination angle θ of 60 degrees. When the inclination angle is 70 degrees, the sine value is 0.939, so it is an increase of 8.4% (0.84% per degree) compared to the case of 60 degrees. At 50 degrees, the sine value is 0.766, so the reduction is 11.5% (1.15% per degree), and the force FP is significantly greater when the angle is less than 60 degrees compared to when the angle is 60 degrees or more. It can be seen that the number decreases.
Further, in the range of plus or minus 20 degrees centering on 60 degrees, the force FP is 13.7% (1 per degree because the sine value is 0.985 at an inclination angle of 80 degrees compared to the case of 60 degrees. .37%), while the sine value is 0.643 at a tilt angle of 40 degrees, this is a significant decrease of 25.8% (2.58% per degree).
As a result, when the inclination angle θ is in the range of 60 to 90 degrees, the force FP for sliding the particles 6a is maintained at a substantially maximum value, while the frictional force f decreases rapidly, which is very advantageous. When θ is less than 60 degrees, in addition to the friction force f increasing greatly compared to 60 degrees or more, the force FP for sliding the free abrasive grains 6 along the surface 1e of the workpiece 1 is drastically reduced. Even if the particles 6 a of the free abrasive grains 6 are caused to flow by the water 23, the possibility of adhering to the work 1 increases.

よって、この摩擦力fが急激に小さくなり、しかも遊離砥粒6の粒子6aをワーク1の表面1eに沿って滑落させる力FPがほぼ一定の最大値に保たれる範囲が傾斜角度θが60度乃至90度の範囲であり、この範囲であれば、遊離砥粒6はその自重によって滑落して除去され易い。
しかし、傾斜角度θが60度未満では、傾斜角度θの余弦値が0.5を超えることにより摩擦力fが大きくなり、しかも60度以上の場合と大差なく増加するのに対して、粒子6aを滑落させる力FPが急激に小さくなって、これらがあいまって相乗的に遊離砥粒6の粒子6aの自重による滑落の可能性が小さくなり、ワーク1の表面1eに付着し易くなるのである。
Accordingly, the frictional force f is drastically reduced, and the range in which the force FP for sliding the particles 6a of the loose abrasive grains 6 along the surface 1e of the work 1 is maintained at a substantially constant maximum value is 60. In this range, the loose abrasive grains 6 are easily slid off due to their own weight.
However, when the tilt angle θ is less than 60 degrees, the frictional force f increases when the cosine value of the tilt angle θ exceeds 0.5, and increases with no significant difference from the case where the tilt angle θ is 60 degrees or more. As a result, the force FP for sliding off the abruptly decreases, and these combine to synergistically reduce the possibility of sliding off due to the weight of the particles 6a of the free abrasive grains 6, and easily adhere to the surface 1e of the workpiece 1.

なお、傾斜角度θが90度を超える範囲は、ワーク1を垂直方向から逆方向へ傾斜させたと同じことであるから、全く意味のない範囲であるので、検討を要しない無意味の範囲として除いたものである。  The range in which the tilt angle θ exceeds 90 degrees is the same as when the workpiece 1 is tilted from the vertical direction to the reverse direction. It is a thing.

以上の検討結果から、ワーク1の水平面に対する傾斜角度θは、60度乃至90度の範囲が好ましく、60度未満では、縦方向であれば、実用状可能ではあるが、あまり好ましくないのである。  From the above examination results, the inclination angle θ of the workpiece 1 with respect to the horizontal plane is preferably in the range of 60 degrees to 90 degrees, and if it is less than 60 degrees, it can be practically used in the vertical direction, but it is not very preferable.

なお、遊離砥粒6の粒子6aをワーク1の表面1eに沿って滑落させようとする力FPと、これを阻止しようとする粒子6aとワーク1の表面1eとの間の摩擦力fが等しくなったとき、即ちFP=f、従ってmg・sinθ=μmg・cosθ、よってsinθ=μcosθのときに粒子6aに作用する下向きと上向きの力が釣合い、粒子6aの滑落は停止する。
ここで摩擦係数μを0.3と仮定すると、実用的にはこの条件を満足させる傾斜角度θは約17度であり(sinθ=0.29、μ・cosθ=0.3×0.96=0.29)、この角度を超える傾斜角度、即ち傾斜角度θ=18度以上であれば、ワーク1の本願発明でいうところの「縦方向」には該当する。
The force FP that tries to slide the particles 6a of the loose abrasive grains 6 along the surface 1e of the workpiece 1 is equal to the frictional force f between the particles 6a and the surface 1e of the workpiece 1 that are trying to prevent this. Thus, that is, when FP = f, and therefore mg · sin θ = μmg · cos θ, and thus sin θ = μcos θ, the downward and upward forces acting on the particle 6a are balanced, and the sliding of the particle 6a stops.
Assuming that the friction coefficient μ is 0.3, the inclination angle θ that satisfies this condition is practically about 17 degrees (sin θ = 0.29, μ · cos θ = 0.3 × 0.96 = 0.29), an inclination angle exceeding this angle, that is, an inclination angle θ = 18 degrees or more, corresponds to the “longitudinal direction” in the present invention of the workpiece 1.

次に、回転体20について説明すると、3個の回転体20は、例えばテフロン(「テフロン」はデュポン社の登録商標)系の合成樹脂で製作され、120度間隔で垂直方向に配設されており、夫々水平軸回りに回動自在に構成されている。そして夫々芯出し機構(図示せず)を有し、ワーク1の半径方向に矢印I,Jの如く移動可能に構成され、ワーク1の外周部1cに接触して該ワークの芯出しを行うことができるようになっている。
回転体20の外周部20cには、ワーク1の外周部1cが入り込める程度のV字形の溝20aが形成され、該溝によって回転体20とワーク1の外周部1cとの間の摩擦力によってワーク1を回転駆動するようになっており、回転体20はねじ27によりホルダ7に固定され、該ホルダはスピンドル17の回転軸21に固着されている。スピンドル17は、電動モータ(図示せず)により低速度で回転駆動され、各回転体20が矢印K方向に低速度で回転するようになっている。
Referring next to the rotating body 20, three rotating body 20, for example, Teflon ( "Teflon" is registered trademark of Du Pont) of fabricated in synthetic resin, is disposed vertically 120 degree intervals Each of them is configured to be rotatable about a horizontal axis. Each has a centering mechanism (not shown), is configured to move in the radial direction of the workpiece 1 as indicated by arrows I and J, and contacts the outer peripheral portion 1c of the workpiece 1 to center the workpiece. Can be done.
A V-shaped groove 20a is formed on the outer peripheral portion 20c of the rotating body 20 so that the outer peripheral portion 1c of the work 1 can enter, and the work piece is caused by the frictional force between the rotating body 20 and the outer peripheral portion 1c of the work 1 by the groove. The rotating body 20 is fixed to the holder 7 by screws 27, and the holder is fixed to the rotating shaft 21 of the spindle 17. The spindle 17 is rotationally driven at a low speed by an electric motor (not shown), and each rotating body 20 is rotated in the direction of arrow K at a low speed.

バフ10は、ワーク1のエッジ1aに対して矢印L,Mの如く接近又は離脱可能に構成され、多数の柔らかな布を重ねた一般的なバフであり、該バフはねじ37によりホルダ43に固定され、該ホルダはスピンドル47の回転軸22に固着されている。スピンドル47は、電動モータ(図示せず)により高速度で回転駆動され、バフ10は矢印N方向に高速度で回転するように構成されている。なお、バフ10はねじ37によりホルダ43に対して着脱自在であり、交換容易に構成されている。  The buff 10 is configured to be capable of approaching or detaching as shown by arrows L and M with respect to the edge 1 a of the workpiece 1, and is a general buff in which a large number of soft cloths are stacked. The holder is fixed to the rotating shaft 22 of the spindle 47. The spindle 47 is driven to rotate at a high speed by an electric motor (not shown), and the buff 10 is configured to rotate at a high speed in the arrow N direction. The buff 10 is detachably attached to the holder 43 with a screw 37 and is configured to be easily exchanged.

遊離砥粒噴射ノズル11は、ワーク1の研摩部1bに対して遊離砥粒6を研摩中連続して矢印Pの如く噴射するものであって、研摩部1bに対して、図中斜め左上に傾斜して設けられている。遊離砥粒6は、ダイヤモンド砥粒等を含む液状の研摩剤であり、一種の薬液で、通常「スラリー」と称されているものである。  The loose abrasive spray nozzle 11 sprays loose abrasive grains 6 continuously to the polished portion 1b of the workpiece 1 as shown by the arrow P during polishing. Inclined. The loose abrasive grains 6 are liquid abrasives containing diamond abrasive grains and the like, and are a kind of chemical solution and are usually referred to as “slurry”.

水用ノズル12は、図1及び図2に示すように、ワーク1の上方から下方に向けて矢印Qの如く水23を噴射し、該水の流れにより遊離砥粒6をワーク1から除去するように構成されており、ワーク1の回転中心の両側に分けて配設され、図示の実施例では、その断面は長方形状に形成され、例えばステンレス鋼板等で製作されている。  As shown in FIGS. 1 and 2, the water nozzle 12 injects water 23 as indicated by an arrow Q from above to below the workpiece 1, and removes the free abrasive grains 6 from the workpiece 1 by the flow of the water. In the embodiment shown in the drawing, the cross section is formed in a rectangular shape, and is made of, for example, a stainless steel plate or the like.

遊離砥粒用ダクト13は、図1、図2及び図7に示すように、なるべく水23を混ぜないで使用済の遊離砥粒6のみを排出するように構成されたもので、ワーク1の研摩部1bの直下に配設されており、例えば断面正方形状に形成され、前後の壁面には、バフ10の形状に合わせた半円形の凹部13aが夫々形成され、例えばステンレス鋼板又は耐薬品性の非常に高いチタン合金等で製作されている。  As shown in FIGS. 1, 2 and 7, the loose abrasive duct 13 is configured to discharge only the used free abrasive 6 without mixing the water 23 as much as possible. It is disposed directly under the polishing portion 1b, and is formed in, for example, a square cross section. On the front and back wall surfaces, semicircular recesses 13a that match the shape of the buff 10 are formed, for example, stainless steel plate or chemical resistance. It is made of a very high titanium alloy.

水用ダクト14は、図1、図2及び図7に示すように、使用済の水23を遊離砥粒用ダクト13の両側に夫々誘導して排出するように構成されており、遊離砥粒用ダクト13に夫々隣接して配設され、断面長方形状に形成され、図中左右の両側には傾斜板14aが夫々形成され、なるべく広い範囲の水23をダクト内に誘導できるようになっている。  As shown in FIGS. 1, 2 and 7, the water duct 14 is configured to guide and discharge the used water 23 to both sides of the free abrasive duct 13, respectively. Are arranged adjacent to the duct 13 and are formed in a rectangular cross section, and inclined plates 14a are formed on both the left and right sides in the figure, respectively, so that a wide range of water 23 can be guided into the duct. Yes.

エア用ノズル15は、図1、図2及び図7に示すように、エア24を矢印Rの如く上方から下方に向けて噴射してワーク1の両側にエアカーテン25を形成し、遊離砥粒6の周囲への飛散を防止するように構成されており、断面長方形状に形成されている。  As shown in FIGS. 1, 2 and 7, the air nozzle 15 injects air 24 from the upper side to the lower side as shown by an arrow R to form air curtains 25 on both sides of the work 1, and loose abrasive grains. It is comprised so that scattering to the circumference | surroundings of 6 may be prevented, and it is formed in the cross-sectional rectangle shape.

ブラシ16は、図1、図2及び図6に示すように、ワーク1のエッジ1aに接触させて該エッジに付着した遊離砥粒6を除去するようにしたものであって、ワーク1の研摩部1bの直後の工程に配設されており、図示の実施例では、一例として回転ブラシを採用している。ブラシ16は、回転軸28に固定され、該回転軸は電動モータ(図示せず)により回転駆動されるようになっており、ブラシ16は矢印S,Tの如くワーク1の半径方向に移動可能に構成され、矢印Uの方向に回転するようになっている。
なお、ブラシ16は、回転ブラシに限定されず、固定式のブラシでもよい。
As shown in FIGS. 1, 2, and 6, the brush 16 is in contact with the edge 1 a of the workpiece 1 to remove loose abrasive grains 6 attached to the edge 1. The rotating brush is used as an example in the illustrated embodiment. The brush 16 is fixed to a rotary shaft 28, and the rotary shaft is rotationally driven by an electric motor (not shown). The brush 16 can move in the radial direction of the workpiece 1 as indicated by arrows S and T. And is configured to rotate in the direction of arrow U.
The brush 16 is not limited to a rotating brush, and may be a fixed brush.

バフ押圧装置18は、図4、図8及び図9に示すように、バフ10がワーク1のエッジ1aに接触したときに該バフの厚さ方向の両側を一対の押圧部材29により押圧してワーク1の両面をバフ10で挟むようにして研摩することにより、エッジ1aの両面及び端面を同時にバフ研摩するように構成されており、図8及び図9に示すように、押圧部材29が矢印V,Wの如く移動可能に構成され、矢印Vのように移動することでバフ10を挟むようになっている。  As shown in FIGS. 4, 8, and 9, the buff pressing device 18 presses both sides in the thickness direction of the buff by a pair of pressing members 29 when the buff 10 contacts the edge 1 a of the workpiece 1. By polishing so that both surfaces of the work 1 are sandwiched between buffs 10, both surfaces and end surfaces of the edge 1 a are simultaneously buffed. As shown in FIGS. 8 and 9, the pressing member 29 has arrows V, It is configured to be movable as indicated by W, and the buff 10 is sandwiched by moving as indicated by an arrow V.

次に、図12及び図13に示す本発明の第1実施例の別の形態について説明すると、ワークのエッジの研摩装置8は、オリエンテーションフラット1cを形成したワーク1を対象としたもので、ワーク1を縦方向に保持して回転駆動する駆動装置9の回転体20(20A,20B,20C,20D,20E)を、5個とし、例えばそのうちの1個の回転体20Bがオリエンテーションフラット1cに対向して回転駆動ができない場合でも、他の4個の回転体20A,20C,20D,20Eがワーク1を支障なく回転駆動できるようにしたものであり、その他の構成は、上記図7までに示す実施例と同様であるので、同一の部分には、図面に同一の符号を付してその説明を省略する。  Next, another embodiment of the first embodiment of the present invention shown in FIGS. 12 and 13 will be described. The workpiece edge polishing apparatus 8 is intended for the workpiece 1 on which the orientation flat 1c is formed. The number of rotating bodies 20 (20A, 20B, 20C, 20D, 20E) of the driving device 9 that rotates and holds 1 in the vertical direction is five, for example, one of the rotating bodies 20B faces the orientation flat 1c. Even when the rotation cannot be performed, the other four rotating bodies 20A, 20C, 20D, and 20E can rotate the workpiece 1 without any trouble. The other configurations are shown in FIG. Since it is the same as that of an Example, the same code | symbol is attached | subjected to drawing and the description is abbreviate | omitted to the same part.

次に、図14から図16に示す本発明の第2実施例に係るワークのエッジの研摩装置8について説明すると、これはワーク1の駆動装置9を、水平軸回りに回転する吸着テーブル30としたものであり、吸着テーブル30は、縦方向に保持されたワーク1の裏面1gを吸着するように構成されている。その他の構成は、上記第1実施例と同様であるので、同一の部分には図面に同一の符号を付してその説明を省略する。  Next, a workpiece edge polishing device 8 according to a second embodiment of the present invention shown in FIGS. 14 to 16 will be described. This is a workpiece 1 drive device 9 that is provided with a suction table 30 that rotates around a horizontal axis. The suction table 30 is configured to suck the back surface 1g of the workpiece 1 held in the vertical direction. Since other configurations are the same as those of the first embodiment, the same portions are denoted by the same reference numerals in the drawings, and the description thereof is omitted.

そして本発明方法(請求項)は、ワーク1を縦方向に保持して該ワークの外周部1cを少なくとも3個の回転体20(20A,20B,20C)により回転駆動し、ワーク1のエッジ1aの最下部付近に回転するバフ10を該ワークに対して接近又は離脱可能に配置して該バフをワーク1の最下部付近に接触させると共に該ワークの研摩部1bに向けて遊離砥粒6を噴射してワーク1のエッジ1aをバフ研摩しつつ、ワーク1の上方から下方に向けて該ワークの回転中心の両側に分けて水23を噴射し、該水の流れにより遊離砥粒6をワーク1から除去する方法である。 In the method of the present invention (Claim 1 ), the workpiece 1 is held in the vertical direction, and the outer peripheral portion 1c of the workpiece is rotationally driven by at least three rotating bodies 20 (20A, 20B, 20C). A buff 10 rotating in the vicinity of the lowermost part of 1a is arranged so as to be able to approach or leave the work, and the buff is brought into contact with the vicinity of the lowermost part of the work 1 and loose abrasive grains 6 toward the polishing part 1b of the work. , And buffing the edge 1a of the work 1 while spraying water 23 on both sides of the rotation center of the work from the upper side to the lower side of the work 1, and the free abrasive grains 6 are formed by the water flow. This is a method of removing from the work 1.

また本発明方法(請求項)は、ワーク1を縦方向に保持して該ワークの外周部1cを少なくとも3個の回転体20(20A,20B,20C)により回転駆動し、ワーク1のエッジ1aの最下部付近に回転するバフ10を該ワークに対して接近又は離脱可能に配置して該バフをワーク1の最下部付近に接触させると共に該ワークの研摩部1bに向けて遊離砥粒6を噴射してワーク1のエッジ1aをバフ研摩しつつ、ワーク1の上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズル12から夫々水23を噴射し、該水の流れにより遊離砥粒6をワーク1から除去し、更に遊離砥粒6を研摩部1bの直下の遊離砥粒用ダクト13に、水23を該遊離砥粒用ダクトの両側に配設された水用ダクト14に夫々導いて遊離砥粒6と水23とを分別除去する方法である。In the method of the present invention (claim 2 ), the workpiece 1 is held in the vertical direction, and the outer peripheral portion 1c of the workpiece is rotationally driven by at least three rotary bodies 20 (20A, 20B, 20C). A buff 10 rotating in the vicinity of the lowermost part of 1a is arranged so as to be able to approach or leave the work, and the buff is brought into contact with the vicinity of the lowermost part of the work 1 and loose abrasive grains 6 toward the polishing part 1b of the work. , And buffing the edge 1a of the work 1, while spraying water 23 from the water nozzles 12 arranged separately on both sides of the rotation center of the work from the upper side to the lower side of the work 1, The free abrasive grains 6 are removed from the work 1 by the flow of water, and the free abrasive grains 6 are disposed in the free abrasive duct 13 immediately below the polishing portion 1b, and the water 23 is disposed on both sides of the free abrasive duct. Led to each of the water ducts 14 and loosen In this method, the grains 6 and the water 23 are separated and removed.

また本発明方法(請求項)は、ワーク1を縦方向に保持して該ワークの外周部1cを少なくとも3個の回転体20(20A,20B,20C)により回転駆動し、ワーク1のエッジ1aの最下部付近に回転するバフ10を該ワークに対して接近又は離脱可能に配置して該バフをワーク1の最下部付近に接触させると共に該ワークの研摩部1bに向けて遊離砥粒6を噴射してワーク1のエッジ1aをバフ研摩しつつ、ワーク1の上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズル12から夫々水23を噴射し、該水の流れにより遊離砥粒6をワーク1から除去し、更に遊離砥粒6を研摩部1bの直下の遊離砥粒用ダクト13に、水23を該遊離砥粒用ダクトの両側に配設された水用ダクト14に夫々導いて遊離砥粒6と水23とを分別除去すると共に、水用ノズル12の更に外側に配設されたエア用ノズル15からエア24を上方から下方に向けて噴射してワーク1の両側にエアカーテン25を形成し、遊離砥粒6の周囲への飛散を防止する方法である。In the method of the present invention (claim 3 ), the workpiece 1 is held in the vertical direction, and the outer peripheral portion 1c of the workpiece is rotationally driven by at least three rotating bodies 20 (20A, 20B, 20C). A buff 10 rotating in the vicinity of the lowermost part of 1a is arranged so as to be able to approach or leave the work, and the buff is brought into contact with the vicinity of the lowermost part of the work 1 and loose abrasive grains 6 toward the polishing part 1b of the work. , And buffing the edge 1a of the work 1, while spraying water 23 from the water nozzles 12 arranged separately on both sides of the rotation center of the work from the upper side to the lower side of the work 1, The free abrasive grains 6 are removed from the work 1 by the flow of water, and the free abrasive grains 6 are disposed in the free abrasive duct 13 immediately below the polishing portion 1b, and the water 23 is disposed on both sides of the free abrasive duct. Led to each of the water ducts 14 and loosen The particles 6 and the water 23 are separated and removed, and air 24 is sprayed from the air nozzle 15 disposed further outside the water nozzle 12 downward from above, and air curtains 25 are formed on both sides of the work 1. This is a method of forming and preventing scattering around the loose abrasive grains 6.

また本発明方法(請求項)は、ワーク1のエッジ1aに対して接近又は離脱可能なバフ10を該エッジに接触させ、該ワークの研摩部1bに遊離砥粒6を噴射して該ワークのエッジ1をバフ研摩する方法において、ワーク1を縦方向に保持して該ワークの外周部1cを少なくとも3個の回転体20(20A,20B,20C)により回転駆動し、ワーク1のエッジ1aの最下部付近に回転する総形刃具形のバフ10を配置して該バフをワーク1の最下部付近に接触させると共に、バフ10がワーク1のエッジ1aに接触したときに、該バフの厚さ方向の両側を押圧部材29により押圧してワーク1の両面を前記バフで総形刃具のような形に挟むようにして研摩することによりエッジ1aの両面及び端面を同時にバフ研摩する方法である。In the method of the present invention (Claim 4 ), a buff 10 that can approach or leave the edge 1a of the workpiece 1 is brought into contact with the edge, and free abrasive grains 6 are sprayed onto the polishing portion 1b of the workpiece, thereby causing the workpiece 1 to move. In the method of buffing the edge 1 of the workpiece 1, the workpiece 1 is held in the vertical direction, and the outer peripheral portion 1c of the workpiece is rotationally driven by at least three rotating bodies 20 (20A, 20B, 20C). A buff 10 having a general blade shape rotating around the lowermost part of the workpiece 1 is disposed so that the buff is brought into contact with the lowermost part of the work 1, and when the buff 10 contacts the edge 1 a of the work 1, the thickness of the buff This is a method in which both sides and end faces of the edge 1a are simultaneously buffed by pressing both sides in the vertical direction with a pressing member 29 and polishing both sides of the work 1 with the buff sandwiched in a shape like a general cutting tool .

本発明は、上記のように構成されており、以下その作用について説明する。まず図5から図7により本発明の第1実施例の作用について説明すると、図5において、ノッチ1dを有するワーク1を3個の回転体20A,20B,20Cの間にセットすると、芯出し機構が作動し、各回転体20が夫々矢印Iの方向に移動してワーク1の芯出しを行う。  The present invention is configured as described above, and the operation thereof will be described below. First, the operation of the first embodiment of the present invention will be described with reference to FIGS. 5 to 7. In FIG. 5, when the work 1 having the notch 1d is set between the three rotating bodies 20A, 20B, and 20C, a centering mechanism is provided. , Each rotating body 20 moves in the direction of arrow I to center the workpiece 1.

この芯出しが完了すると、ワーク1の中心はその回転中心に一致し、偏心がなくなり、各回転体20は電動モータ等により矢印K方向に回転を開始し、ワーク1は各回転体20A,20B,20Cの溝20aとワーク1の外周部1cとの間の摩擦力により矢印B方向に低速度で回転を開始する。
このように、吸着テーブルによらず、ワーク1の外周部1cを3個の回転体20A,20B,20Cで回転駆動することにより、従来必ず避けることのできなかった吸着テーブルによる吸着痕を完全に防止することができ、バフ研摩終了後のワーク1の損傷をその分だけ小さくすることができる。
When this centering is completed, the center of the workpiece 1 coincides with the center of rotation, and the eccentricity is eliminated. Each rotating body 20 starts to rotate in the direction of arrow K by an electric motor or the like, and the workpiece 1 is rotated by each rotating body 20A, 20B. , 20C and the outer peripheral portion 1c of the workpiece 1 are rotated at a low speed in the direction of arrow B by the frictional force between the groove 20a and the outer peripheral portion 1c of the workpiece 1.
As described above, the outer peripheral portion 1c of the work 1 is rotationally driven by the three rotating bodies 20A, 20B, and 20C irrespective of the suction table, thereby completely removing the suction marks by the suction table that could not be avoided in the past. It is possible to prevent the damage of the work 1 after the buffing is finished, and the damage can be reduced accordingly.

ここで、図7に示すように、エア用ノズル15からエア24が噴射され、エアカーテン25がワーク1の図中左右両側に形成され、その周囲と該エアカーテンによって遮断される。
すると、図6及び図7に示すように、水用ノズル12から水23が噴射され、ワーク1の表裏両面に水流が形成され、ワーク1は水23によって完全に包まれる。これによってワーク1に付着するすべての物が水23によって下方に洗い流される態勢が整う。
Here, as shown in FIG. 7, air 24 is injected from the air nozzle 15, and air curtains 25 are formed on both the left and right sides of the work 1 in the drawing, and the surroundings are blocked by the air curtain.
Then, as shown in FIGS. 6 and 7, water 23 is jetted from the water nozzle 12, and water flows are formed on both the front and back surfaces of the work 1, so that the work 1 is completely enclosed by the water 23. Thereby, all the things adhering to the workpiece 1 are ready to be washed down by the water 23.

そして、図5から図7に示すように、遊離砥粒噴射ノズル11から遊離砥粒6がワーク1の研摩部1bに向けて噴射され、遊離砥粒6がワーク1のこれからバフ研摩しようとする研摩部1bに付着する。  Then, as shown in FIGS. 5 to 7, the free abrasive grains 6 are sprayed from the free abrasive grain spray nozzle 11 toward the polishing portion 1 b of the work 1, and the free abrasive grains 6 are about to buff the work 1 from now on. It adheres to the polishing part 1b.

ここで、図8及び図9に示すように、バフ押圧装置18の押圧部材29がバフ10の上部の両側から矢印Vの方向に移動し、適宜な圧力でバフ10を押圧する。するとバフ10の上部は明確なコの字形に形成される。
次いで、図5から図7に示すように、バフ10がバフ駆動機構(図示せず)によってかなりの高速度で回転を開始すると共に、矢印Lの如く上昇し、その上部の一部がワーク1のエッジ1aを超えて進み、結果として該エッジがバフ10の中に入り込んだ状態となる。
バフ10の上部は、ワーク1のエッジ1aを包み込むような形、即ちコの字の総形刃具のような形となり、バフ10はワーク1の表裏両面及び端面に同時に接触し、これらのすべての研摩部1bを同時にバフ研摩する。
Here, as shown in FIGS. 8 and 9, the pressing member 29 of the buff pressing device 18 moves from both sides of the upper portion of the buff 10 in the direction of the arrow V and presses the buff 10 with an appropriate pressure. Then, the upper part of the buff 10 is formed in a clear U-shape.
Next, as shown in FIGS. 5 to 7, the buff 10 starts rotating at a considerably high speed by a buff drive mechanism (not shown) and rises as indicated by an arrow L, and a part of the upper part of the buff 10 is a workpiece 1. As a result, the edge enters the buff 10.
The upper part of the buff 10 is shaped to envelop the edge 1a of the work 1, that is, like a U-shaped blade, and the buff 10 contacts both the front and back surfaces and the end face of the work 1 at the same time. The polishing part 1b is buffed simultaneously.

この場合、従来表面、端面、裏面の3工程のバフ研摩が必要であったものが、本発明では、1/3のわずか1工程でこの3つの面のバフ研摩を行うことができる。
この際、バフ押圧装置18により押圧部材29のバフ10に対する押圧力を制御して、バフ10による研摩能力を調節し、最適の状態でバフ研摩を続行することができる。
In this case, the buffing of the three surfaces of the front surface, the end surface, and the back surface is conventionally required, but in the present invention, the buffing of these three surfaces can be performed in only one third of the steps.
At this time, the buff pressing device 18 controls the pressing force of the pressing member 29 against the buff 10 to adjust the polishing ability by the buff 10, and the buff polishing can be continued in an optimum state.

一方ブラシ16は、図6及び図7に示すように、ブラシ駆動機構(図示せず)により回転軸28を介して矢印Uの方向に回転を開始すると同時に、矢印Sの如く移動して、ワーク1のエッジ1aに接触し、ワーク1のエッジ1aに付着した遊離砥粒6をはぎ取り、連続的に除去する。これによってブラシ16を通過した後のワーク1の研摩部1bにはほとんど遊離砥粒6が残留しておらず、これは水23によって洗い流されてしまうので、バフ研摩完了後のワーク1は遊離砥粒6が全く付着しないきれいな状態となる。  On the other hand, as shown in FIGS. 6 and 7, the brush 16 starts to rotate in the direction of the arrow U via the rotation shaft 28 by a brush drive mechanism (not shown), and at the same time, moves as shown by the arrow S. The free abrasive grains 6 coming into contact with the edge 1a of the workpiece 1 and adhering to the edge 1a of the workpiece 1 are peeled off and continuously removed. As a result, almost no free abrasive grains 6 remain in the polishing portion 1b of the work 1 after passing through the brush 16, and this is washed away by the water 23. Therefore, the work 1 after the buffing is completed is free abrasive. It will be in the beautiful state where the grain 6 does not adhere at all.

水23は、バフ研摩中、常時水用ノズル12から矢印Qの如く噴射されて流下しているので、ワーク1の付着したすべての遊離砥粒6や研摩粕を下方に流し去り、主として遊離砥粒6は、中央の遊離砥粒用ダクト13内に流れ込み、分別収集される。  During the buffing, the water 23 is always sprayed and flowing down from the water nozzle 12 as indicated by the arrow Q, so that all the free abrasive grains 6 and the polishing pad to which the workpiece 1 is adhered are flowed down and mainly free abrasive. The grains 6 flow into the central loose abrasive duct 13 and are collected separately.

この場合、図示の実施例では、ワーク1は縦方向のうちで、理想的な垂直の方向に保持されているので、粘性摩擦を無視すれば、ワーク1の面に沿う遊離砥粒6の粒子6aの滑落を阻止する方向の摩擦力fは0であり、遊離砥粒6の粒子6aの自重により滑落する力FPは最大となり、水23の力も借りて極めて順調に下方に流れ去る。  In this case, in the illustrated embodiment, since the workpiece 1 is held in an ideal vertical direction in the longitudinal direction, the particles of the free abrasive grains 6 along the surface of the workpiece 1 if the viscous friction is ignored. The frictional force f in the direction of preventing the sliding of 6a is 0, the force FP sliding down by the weight of the particles 6a of the loose abrasive grains 6 is maximized, and flows down smoothly with the help of the water 23.

また縦方向として、図10に示すように、ワーク1の水平面に対する傾斜角度θを60度乃至90度に保持することにより、90度の場合は上記「垂直」ということで除いたとしても、摩擦力fが相当小さい上に、遊離砥粒6の粒子6aをワーク1の面に沿って滑落させる力FPが非常に大きい範囲であるので、垂直の場合と遜色なくワーク1の遊離砥粒6を含む諸々の付着物を、水23の力も借りて効率よく除去することができる。  Further, as shown in FIG. 10, as shown in FIG. 10, the inclination angle θ of the workpiece 1 with respect to the horizontal plane is maintained at 60 ° to 90 °. The force FP is considerably small, and the force FP for sliding the particles 6a of the loose abrasive grains 6 along the surface of the workpiece 1 is in a very large range, so that the loose abrasive grains 6 of the workpiece 1 are no different from the vertical case. Various deposits can be efficiently removed with the help of the water 23.

また上記傾斜角度θが60度未満の場合であっても、ワーク1を、最低18度位以上の縦方向に保持することにより、遊離砥粒6の粒子6aはその自重により滑落を開始するので、従来の水平保持に比べればかなりよい付着物除去効果を得ることができる。  Even if the tilt angle θ is less than 60 degrees, the particles 6a of the free abrasive grains 6 start to slide down by their own weight by holding the workpiece 1 in the vertical direction of at least about 18 degrees or more. As compared with the conventional horizontal holding, a considerably better deposit removing effect can be obtained.

次に、遊離砥粒6と水23の分別回収について説明すると、図7に示すように、遊離砥粒6はワーク1の直下の研摩部1bから最も多く遊離砥粒用ダクト13内に流入して回収される。これは上方から常時水23が流下しているので、バフ研摩と同時にその直下に流されるためである。従ってこの遊離砥粒用ダクト13で回収された廃液は、ほとんど遊離砥粒6であるので、これに適した後処理を集中的に行うことができる。  Next, the separation and collection of the free abrasive grains 6 and the water 23 will be described. As shown in FIG. 7, the free abrasive grains 6 flow into the free abrasive duct 13 from the polishing portion 1b immediately below the workpiece 1 as the largest amount. Collected. This is because the water 23 always flows down from above, so that it flows immediately under the buffing. Therefore, since the waste liquid collected in the free abrasive duct 13 is almost free abrasive 6, post-processing suitable for this can be concentrated.

また多少ワーク1に残った残渣となる遊離砥粒6は、ブラシ16により除去されると共に、上方からの水23の流れによって洗い流され、この水23と共に水用ダクト14内に流入して回収される。この水23の中の残留遊離砥粒6は非常に希釈であるので、水用ダクト14で回収された水23とわずかの遊離砥粒6の処理は容易であり、このためバフ研摩の後の廃液の処理が容易である。  Further, the loose abrasive grains 6 that remain in the work 1 are removed by the brush 16 and are washed away by the flow of the water 23 from above, and flow into the water duct 14 together with the water 23 and are collected. The Since the remaining free abrasive grains 6 in the water 23 are very diluted, it is easy to treat the water 23 collected in the water duct 14 and a small amount of the free abrasive grains 6. It is easy to treat waste liquid.

このように本発明の第1実施例によれば、バフ研摩中において、いずれにしてもワーク1を縦方向に保持してバフ研摩を行うので、従来の水平保持に比べて格段に優れた遊離砥粒6等のワーク1への付着物をきれいに除去することができ、この結果バフ研摩終了後の残留遊離砥粒6に起因するワーク1のエッチング状の腐食又は浸食を防止することができ、仕上がりの非常に良好な半導体ウェーハ等のワーク1を得ることができる。また吸着テーブルを用いていないので、吸着痕を完全になくすことも可能である。また廃液も分別回収しているため、廃液処理も容易である。  As described above, according to the first embodiment of the present invention, during the buff polishing, the work 1 is held in the vertical direction and the buff polishing is performed anyway. The deposits such as abrasive grains 6 on the work 1 can be removed cleanly. As a result, etching-like corrosion or erosion of the work 1 due to the remaining free abrasive grains 6 after the buffing polishing can be prevented, A workpiece 1 such as a semiconductor wafer having a very good finish can be obtained. Further, since no suction table is used, it is possible to completely eliminate suction marks. In addition, since waste liquid is separately collected, waste liquid treatment is easy.

バフ研摩が終了すると、各機構が上記と反対に作動し、まず遊離砥粒噴射ノズル12からの遊離砥粒6の噴射が停止し、次いでバフ押圧装置18が作動して押圧部材18が矢印W方向に移動して、バフ10を解放し、バフ10がその駆動機構により矢印M方向に移動して後退してその回転が停止する。
その後しばらくして、ブラシ16が矢印Tの方向に移動して、その回転が停止し、水23の噴射が停止し、ワーク1の駆動装置9が各回転体20A,20B,20Cの回転を停止させ、ワーク1の回転が停止する。
その後エア24の噴射が停止して、エアカーテン24が消える。
そこで各回転体20A,20B,20Cが矢印J方向に移動して、ワーク1の外周部1cから離れ、ワーク1が取出し機構(図示せず)によって取り出されて、1個のワーク1のバフ研摩工程が完了する。
以下同様の動作が繰り返されて、次々とワーク1のバフ研摩を効率よく行うことができる。
When the buffing is finished, each mechanism is operated in the opposite direction, firstly the injection of the free abrasive grains 6 from the free abrasive spray nozzle 12 is stopped, and then the buff pressing device 18 is operated and the pressing member 18 is moved to the arrow W. The buff 10 is released by moving in the direction, and the buff 10 is moved in the direction of the arrow M by the drive mechanism and moved backward to stop its rotation.
After a while, the brush 16 moves in the direction of the arrow T, the rotation stops, the injection of the water 23 stops, and the driving device 9 of the work 1 stops the rotation of each rotating body 20A, 20B, 20C. The rotation of the work 1 is stopped.
Thereafter, the injection of the air 24 stops and the air curtain 24 disappears.
Accordingly, each of the rotating bodies 20A, 20B, and 20C moves in the direction of the arrow J and is separated from the outer peripheral portion 1c of the work 1, and the work 1 is taken out by a take-out mechanism (not shown), and buff polishing of one work 1 is performed. The process is complete.
Thereafter, the same operation is repeated, and the buffing of the workpiece 1 can be performed efficiently one after another.

次に、図12及び図13に示す本発明の第1実施例の別の態様の作用について説明する。これはオリエンテーションフラット1fを有するワーク1のバフ研摩を同様に縦方向に保持して行うものであって、ワーク1の駆動装置9の5個の回転体20A,20B,20C,20D,20Eによりワーク1を回転させて、上記第1実施例と全く同様にワーク1のエッジ1aのバフ研摩を行う。  Next, the operation of another aspect of the first embodiment of the present invention shown in FIGS. 12 and 13 will be described. This is performed by holding the buffing of the work 1 having the orientation flat 1f in the vertical direction in the same manner, and the work is driven by the five rotating bodies 20A, 20B, 20C, 20D, and 20E of the driving device 9 of the work 1. 1 is rotated, and the edge 1a of the workpiece 1 is buffed in the same manner as in the first embodiment.

この場合、図12に示すように、例えば回転体20Bのところにオリエンテーションフラット1fが差し掛かった際には、回転体20Bは遊び状態となるが、他の4個の回転体20A,20C,20D,20Eにより回転駆動されるので問題はなく、また図13に示すように、オリエンテーションフラット1fが回転体20Cのところに差し掛かると、回転体20Cは遊び状態となるが、他の4個の回転体20A,20B,20D,20Eにより回転駆動されるので問題がなく、ワーク1は連続して回転駆動される。
その他の作用は、上記第1実施例と全く同様であるので、同一の部分には同一の符号を付して、その作用の説明は省略する。
In this case, as shown in FIG. 12, for example, when the orientation flat 1f reaches the rotating body 20B, the rotating body 20B is in a play state, but the other four rotating bodies 20A, 20C, 20D, There is no problem because it is driven to rotate by 20E, and as shown in FIG. 13, when the orientation flat 1f reaches the rotating body 20C, the rotating body 20C enters a play state, but the other four rotating bodies. Since it is rotationally driven by 20A, 20B, 20D, and 20E, there is no problem and the workpiece 1 is continuously rotationally driven.
Since other operations are the same as those in the first embodiment, the same parts are denoted by the same reference numerals, and description of the operations is omitted.

次に、図14から図16に示す本発明の第2実施例の作用について説明する。この実施例では、ワーク1の駆動装置9を従来と同様の吸着テーブル30としたものであるから、まずワーク1を縦方向、図示の実施例では垂直方向に保持して吸着テーブル30により真空引き等の手段でその裏面1gを吸着し、吸着テーブル30を低速度で回転させてワーク1を低速度で回転させる。
これによって、従来どおりの吸着痕はワーク1の裏面1gに付くが、その他の作用は第1実施例と同様であり、発明としての効果も、吸着痕が除去できない点を除けば、全く同様の効果を得ることができる。これらの作用効果については、第1実施例と全く同様であるので、同一の部分には図面に同一の符号を付して、その作用の説明は省略する。
Next, the operation of the second embodiment of the present invention shown in FIGS. 14 to 16 will be described. In this embodiment, since the drive device 9 for the workpiece 1 is a suction table 30 similar to the conventional one, the workpiece 1 is first held in the vertical direction, and in the illustrated embodiment, it is held in the vertical direction and evacuated by the suction table 30. The back surface 1g is sucked by means such as the above, and the work table 1 is rotated at a low speed by rotating the suction table 30 at a low speed.
As a result, the conventional suction mark is attached to the back surface 1g of the work 1, but the other functions are the same as those of the first embodiment, and the effect of the invention is exactly the same except that the suction mark cannot be removed. An effect can be obtained. Since these functions and effects are exactly the same as those of the first embodiment, the same portions are denoted by the same reference numerals in the drawings, and description of the functions is omitted.

図1から図13は本発明の第1実施例に係り、
はワークのエッジの研摩装置の斜視図である。 はワークのエッジの研摩装置の部分縦断面正面図である。 はワークのエッジの研摩装置の要部部分縦断面正面図である。 は側方から見たワークのエッジの研摩装置の縦断面図である。 はワークのエッジの研摩装置の作用を示す部分縦断面正面図である。 はバフ研摩中のワークのエッジの研摩装置の作用を示す要部部分縦断面正面図である。 はバフ研摩中のワークのエッジの研摩装置の作用を示す部分縦断面正面図である。 はバフ研摩中のワークの側方から見たワークのエッジの研摩装置の縦断面図である。 はバフ研摩中のワークの側方から見たワークのエッジの研摩装置の作用を示す要部部分縦断面側面図である。 はワーク1の水平面に対する傾斜角度を60度乃至90度の縦方向に保持した状態の遊離砥粒の粒子に作用するその自重による力の力学的関係を示す説明図である。 はワークの傾斜角度の好ましい範囲を示す余弦曲線、正弦曲線と遊離砥粒の粒子の滑落を阻止する摩擦力と、粒子が自重で滑落する力の変化を示す線図である。 及び図13は本発明の第1実施例の別の態様を示し、図12はバフ研摩中のワークのエッジの研摩装置の部分縦断面正面図である。 はバフ研摩中のワークのエッジの研摩装置の作用を示す要部部分縦断面正面図である。 から図16は本発明の第2実施例に係り、図14はワークのエッジの研摩装置の斜視図である。 はワークのエッジの研摩装置の右側面図である。 はバフ研摩中のワークのエッジの研摩装置の要部右側面図である。 は従来例に係るワークのエッジの研摩装置の作用を示す斜視図である。
1 to 13 relate to a first embodiment of the present invention.
FIG. 2 is a perspective view of a polishing apparatus for a workpiece edge. FIG. 2 is a partial longitudinal sectional front view of a polishing apparatus for a workpiece edge. FIG. 2 is a longitudinal sectional front view of a main part of a polishing apparatus for a workpiece edge. FIG. 3 is a longitudinal sectional view of a polishing apparatus for a workpiece edge as viewed from the side. FIG. 4 is a partial longitudinal sectional front view showing the operation of a polishing apparatus for a workpiece edge. FIG. 3 is a longitudinal sectional front view of a main part showing the operation of a polishing apparatus for a workpiece edge during buff polishing. FIG. 4 is a partial longitudinal sectional front view showing an operation of a polishing apparatus for a workpiece edge during buff polishing. FIG. 3 is a longitudinal sectional view of a polishing apparatus for a workpiece edge as viewed from the side of the workpiece being buffed. FIG. 3 is a side view of a longitudinal section of a main portion showing the operation of a workpiece edge polishing apparatus viewed from the side of a workpiece being buffed. These are explanatory drawings which show the mechanical relationship of the force by the dead weight which acts on the particle | grains of the loose abrasive grain of the state which hold | maintained the inclination angle with respect to the horizontal surface of the workpiece | work 1 in the vertical direction of 60 degree | times to 90 degree | times. FIG. 5 is a diagram showing a change in a cosine curve, a sine curve, a frictional force that prevents the particles of loose abrasive grains from sliding down, and a change in the force by which the particles slide down under their own weight. FIG. 13 shows another aspect of the first embodiment of the present invention, and FIG. 12 is a partial longitudinal sectional front view of a polishing apparatus for a workpiece edge during buff polishing. FIG. 3 is a longitudinal sectional front view of a main part showing the operation of a polishing apparatus for a workpiece edge during buff polishing. FIG. 16 relates to a second embodiment of the present invention, and FIG. 14 is a perspective view of a polishing apparatus for a workpiece edge. FIG. 4 is a right side view of a polishing apparatus for a workpiece edge. FIG. 3 is a right side view of a main part of a polishing apparatus for a workpiece edge during buffing. These are perspective views which show the effect | action of the polishing apparatus of the edge of the workpiece | work which concerns on a prior art example.

符号の説明Explanation of symbols

1 ワーク
1a エッジ
1b 研摩部
1c 外周部
1d ノッチ
1e 表面
1f オリエンテーションフラット
1g 裏面
6 遊離砥粒
6a 粒子
8 ワークのエッジの研摩装置
9 駆動装置
10 バフ
12 水用ノズル
13 遊離砥粒用ダクト
14 水用ダクト
15 エア用ノズル
16 ブラシ
18 バフ押圧装置
20 回転体
20A 回転体
20B 回転体
20C 回転体
20D 回転体
20E 回転体
23 水
24 エア
25 エアカーテン
29 押圧部材
30 吸着テーブル
DESCRIPTION OF SYMBOLS 1 Work 1a Edge 1b Polishing part 1c Peripheral part 1d Notch 1e Surface 1f Orientation flat 1g Back 6 Free abrasive grains 6a Particle 8 Workpiece edge polishing apparatus 9 Drive apparatus 10 Buff 12 Water nozzle 13 Free abrasive duct 14 For water Duct 15 Air nozzle 16 Brush 18 Buff pressing device 20 Rotating body 20A Rotating body 20B Rotating body 20C Rotating body 20D Rotating body 20E Rotating body 23 Water 24 Air 25 Air curtain 29 Pressing member 30 Adsorption table

Claims (8)

ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、前記ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフを前記ワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射して前記ワークのエッジをバフ研摩しつつ、前記ワークの上方から下方に向けて該ワークの回転中心の両側に分けて水を噴射し、該水の流れにより前記遊離砥粒を前記ワークから除去することを特徴とするワークのエッジの研摩方法。The work is held in the vertical direction and the outer periphery of the work is rotationally driven by at least three rotating bodies, and a buff that rotates near the lowermost part of the edge of the work is disposed so as to be able to approach or leave the work. The buff is brought into contact with the vicinity of the lowermost part of the workpiece and free abrasive grains are sprayed toward the polishing portion of the workpiece to buff the edge of the workpiece, and the workpiece is directed downward from above the workpiece. A method for polishing a workpiece edge, wherein water is sprayed separately on both sides of the rotation center, and the loose abrasive grains are removed from the workpiece by the flow of the water. ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、前記ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフを前記ワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射して前記ワークのエッジをバフ研摩しつつ、前記ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより前記遊離砥粒を前記ワークから除去し、更に前記遊離砥粒を前記研摩部の直下の遊離砥粒用ダクトに、前記水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて前記遊離砥粒と前記水とを分別除去することを特徴とするワークのエッジの研摩方法。The work is held in the vertical direction and the outer periphery of the work is rotationally driven by at least three rotating bodies, and a buff that rotates near the lowermost part of the edge of the work is disposed so as to be able to approach or leave the work. The buff is brought into contact with the vicinity of the lowermost part of the workpiece and free abrasive grains are sprayed toward the polishing portion of the workpiece to buff the edge of the workpiece, and the workpiece is directed downward from above the workpiece. Water is sprayed from water nozzles arranged separately on both sides of the center of rotation, and the free abrasive grains are removed from the workpiece by the flow of the water, and the free abrasive grains are directly below the polishing portion. An edge of a workpiece characterized in that the loose abrasive and the water are separated and removed by introducing the water into a duct for loose abrasive and led to the water duct disposed on both sides of the duct for loose abrasive, respectively. Polishing method. ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、前記ワークのエッジの最下部付近に回転するバフを該ワークに対して接近又は離脱可能に配置して該バフを前記ワークの最下部付近に接触させると共に該ワークの研摩部に向けて遊離砥粒を噴射して前記ワークのエッジをバフ研摩しつつ、前記ワークの上方から下方に向けて該ワークの回転中心の両側に分けて配設された水用ノズルから夫々水を噴射し、該水の流れにより前記遊離砥粒を前記ワークから除去し、更に前記遊離砥粒を前記研摩部の直下の遊離砥粒用ダクトに、前記水を該遊離砥粒用ダクトの両側に配設された水用ダクトに夫々導いて前記遊離砥粒と前記水とを分別除去すると共に、前記水用ノズルの更に外側に配設されたエア用ノズルからエアを上方から下方に向けて噴射して前記ワークの両側にエアカーテンを形成し、前記遊離砥粒の周囲への飛散を防止することを特徴とするワークのエッジの研摩方法。The work is held in the vertical direction and the outer periphery of the work is rotationally driven by at least three rotating bodies, and a buff that rotates near the lowermost part of the edge of the work is disposed so as to be able to approach or leave the work. The buff is brought into contact with the vicinity of the lowermost part of the workpiece and free abrasive grains are sprayed toward the polishing portion of the workpiece to buff the edge of the workpiece, and the workpiece is directed downward from above the workpiece. Water is sprayed from water nozzles arranged separately on both sides of the center of rotation, and the free abrasive grains are removed from the workpiece by the flow of the water, and the free abrasive grains are directly below the polishing portion. Into the free abrasive duct, the water is guided to the water ducts disposed on both sides of the free abrasive duct to separate and remove the free abrasive grains and the water, and the water nozzle further Nozzle for air arranged outside Luo air to be injected from above downward to form the air curtain on either side of the workpiece, polishing process of the workpiece edge, characterized in that to prevent splashing to the surroundings of the free abrasive grains. ワークのエッジに対して接近又は離脱可能なバフを該エッジに接触させ、該ワークの研摩部に遊離砥粒を噴射して該ワークのエッジをバフ研摩する方法において、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動し、前記ワークのエッジの最下部付近に回転する総形刃具形のバフを配置して該バフを前記ワークの最下部付近に接触させると共に、前記バフが前記ワークの前記エッジに接触したときに、該バフの厚さ方向の両側を押圧部材により押圧して前記ワークの両面を前記バフで総形刃具のような形に挟むようにして研摩することにより前記エッジの両面及び端面を同時にバフ研摩することを特徴とするワークのエッジの研摩方法。In a method of buffing an edge of the workpiece by bringing a buff that can approach or leave the workpiece edge into contact with the edge and spraying free abrasive grains onto the polishing portion of the workpiece, the workpiece is held in the vertical direction. The outer peripheral part of the workpiece is rotationally driven by at least three rotating bodies, and a buff of a general blade shape rotating near the lowermost part of the edge of the work is arranged to contact the buff near the lowermost part of the work In addition, when the buff contacts the edge of the workpiece, both sides of the buff in the thickness direction are pressed by a pressing member so that both sides of the workpiece are sandwiched between the buffs in a shape like a general cutting tool. A method for polishing an edge of a workpiece, comprising polishing both sides and end faces of the edge simultaneously by polishing. ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離脱可能に構成されたバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより前記遊離砥粒を前記ワークから除去するように構成された水用ノズルとを備えたことを特徴とするワークのエッジの研摩装置。A driving device that holds the workpiece in the vertical direction and rotates the outer periphery of the workpiece by at least three rotating bodies, and is disposed near the lowermost part of the edge of the workpiece, and can approach or leave the edge. A buff configured as above, a free abrasive spray nozzle for spraying free abrasive grains to the polishing portion of the workpiece, and arranged separately on both sides of the center of rotation of the workpiece from above to below the workpiece. An apparatus for polishing an edge of a workpiece, comprising: a water nozzle configured to inject water and remove the free abrasive grains from the workpiece by the flow of the water. ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離脱可能に構成されたバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより前記遊離砥粒を前記ワークから除去するように構成された水用ノズルと、前記研摩部の直下に配設され前記遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され前記水を前記遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトとを備え、前記遊離砥粒を前記遊離砥粒用ダクトに、前記水を前記水用ダクトに夫々導いて前記遊離砥粒と前記水とを分別除去するように構成したことを特徴とするワークのエッジの研摩装置。A driving device that holds the workpiece in the vertical direction and rotates the outer periphery of the workpiece by at least three rotating bodies, and is disposed near the lowermost part of the edge of the workpiece, and can approach or leave the edge. A buff configured as above, a free abrasive spray nozzle for spraying free abrasive grains to the polishing portion of the workpiece, and arranged separately on both sides of the center of rotation of the workpiece from above to below the workpiece. A water nozzle configured to inject water and remove the free abrasive grains from the workpiece by the flow of the water, and arranged to be disposed immediately below the polishing portion and configured to discharge the free abrasive grains. A free abrasive duct, and a water duct arranged on both sides of the free abrasive duct and configured to guide and discharge the water to both sides of the free abrasive duct, Free abrasive grains into the free abrasive duct Polishing apparatus of the workpiece edge, characterized by being configured the water to fractional removal respectively led by the free abrasive grains and the said water to the water duct. ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離説可能に構成されたバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記ワークの回転中心の両側に分けて配設され該ワークの上方から下方に向けて水を噴射し該水の流れにより前記遊離砥粒を前記ワークから除去するように構成された水用ノズルと、前記研摩部の直下に配設され前記遊離砥粒を排出するように構成された遊離砥粒用ダクトと、該遊離砥粒用ダクトの両側に配設され前記水を前記遊離砥粒用ダクトの両側に夫々誘導して排出するように構成された水用ダクトと、前記水用ノズルの更に外側に配設されエアを上方から下方に向けて噴射して前記ワークの両側にエアカーテンを形成し前記遊離砥粒の周囲への飛散を防止するように構成されたエア用ノズルとを備えたことを特徴とするワークのエッジの研摩装置。A drive device that holds a workpiece in a vertical direction and rotationally drives the outer peripheral portion of the workpiece by at least three rotating bodies, and is disposed near the lowermost part of the edge of the workpiece, approaching or separating from the edge A buff configured to be possible, a loose abrasive spray nozzle for spraying loose abrasive grains to the polishing portion of the workpiece, and a separate baffle disposed on both sides of the center of rotation of the workpiece. A water nozzle configured to eject water and remove the free abrasive grains from the workpiece by the flow of the water, and is configured to be disposed immediately below the polishing portion and discharge the free abrasive grains. The loose abrasive duct, the water duct disposed on both sides of the loose abrasive duct and configured to guide and discharge the water to both sides of the loose abrasive duct, and the water Air is disposed further outside the nozzle And an air nozzle configured to form an air curtain on both sides of the work and prevent the loose abrasive particles from scattering around the work. Polishing equipment. ワークのエッジに対して接近又は離脱可能なバフを該エッジに接触させ、該ワークの研摩部に遊離砥粒を噴射して該ワークのエッジをバフ研摩するワークのエッジの研摩装置において、ワークを縦方向に保持して該ワークの外周部を少なくとも3個の回転体により回転駆動する駆動装置と、前記ワークのエッジの最下部付近に配設され、前記エッジに対して接近又は離脱可能に構成された総形刃具形のバフと、前記ワークの研摩部に対して遊離砥粒を噴射する遊離砥粒噴射ノズルと、前記バフが前記ワークの前記エッジに接触したときに該バフの厚さ方向の両側を押圧部材により押圧して前記ワークの両面を前記バフで総形刃具のような形に挟むようにして研摩することにより前記エッジの両面及び端面を同時にバフ研摩するように構成されたバフ押圧装置とを備えたことを特徴とするワークのエッジの研摩装置。In a workpiece edge polishing apparatus, a buff capable of approaching or detaching from a workpiece edge is brought into contact with the edge, and free abrasive grains are sprayed onto the workpiece polishing portion to buff the workpiece edge. A drive device that holds the workpiece in the vertical direction and rotates the outer periphery of the workpiece with at least three rotating bodies, and is arranged near the lowermost part of the edge of the workpiece, and is configured to be able to approach or leave the edge. A buff having a general blade shape, a loose abrasive spray nozzle for spraying loose abrasive grains to the polishing portion of the workpiece, and a thickness direction of the buff when the buff contacts the edge of the workpiece. It consists of pressing the both surfaces of the workpiece by the pressing member on both sides so as to simultaneously buffing both sides and end faces of the edge by polishing so as to sandwich the form such as form-cutting tool in the buff Polishing apparatus of the workpiece edge, characterized in that a buff pressing device.
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