JP4884816B2 - Immersion processing equipment - Google Patents

Immersion processing equipment Download PDF

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JP4884816B2
JP4884816B2 JP2006085501A JP2006085501A JP4884816B2 JP 4884816 B2 JP4884816 B2 JP 4884816B2 JP 2006085501 A JP2006085501 A JP 2006085501A JP 2006085501 A JP2006085501 A JP 2006085501A JP 4884816 B2 JP4884816 B2 JP 4884816B2
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transfer
workpiece
level
conveyance
transport
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JP2007230771A (en
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英樹 中田
隆 佐藤
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C.UYEMURA&CO.,LTD.
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本発明は、めっき液等の処理液を貯留してワークを浸漬する浸漬槽のワーク搬送装置に関する。   The present invention relates to a work transfer device for a dipping tank in which a processing liquid such as a plating solution is stored to immerse a work.

従来、ワークを浸漬槽外から浸漬槽内に搬入し、浸漬槽の処理液内で搬送しながら浸漬処理し、浸漬処理後、浸漬槽内から浸漬槽外に搬出するワーク搬送装置の従来例1として、図41に示すようなワーク搬送装置がある(特許文献1)。図41に示す装置は、浸漬槽300外に配置されたローラ式搬送機構301と、浸漬槽300内に配置されたローラ式搬送機構302とを、同一高さに揃え、浸漬槽300のワーク搬送方向Fの後端璧305にワーク入口306を開口し、該ワーク入口306にシールローラ310を配置している。ワーク入口306は処理液面Lよりも低い位置に形成されている。この装置によると、ワークWの搬送高さを変更せずに、浸漬槽300の外側から内側にワークWを搬送することができる。なお、図示しないが浸漬槽300のワーク出口も入口と同様な構造となっている。   Conventionally, the workpiece conveying apparatus which carries in a workpiece | work into the immersion tank from the outside of an immersion tank, is immersed in the processing liquid of an immersion tank, and is carried out from the immersion tank to the exterior of an immersion tank after immersion treatment. There is a workpiece transfer device as shown in FIG. 41 (Patent Document 1). In the apparatus shown in FIG. 41, the roller-type transport mechanism 301 disposed outside the immersion tank 300 and the roller-type transport mechanism 302 disposed in the immersion tank 300 are aligned at the same height so that the workpiece transport of the immersion tank 300 is performed. A work inlet 306 is opened at a rear end wall 305 in the direction F, and a seal roller 310 is disposed at the work inlet 306. The work inlet 306 is formed at a position lower than the processing liquid level L. According to this apparatus, the workpiece W can be conveyed from the outside to the inside of the immersion bath 300 without changing the conveyance height of the workpiece W. Although not shown, the work outlet of the immersion tank 300 has the same structure as the inlet.

別の従来例2としては、図42に示すようなワーク反転式のワーク搬送装置がある(特許文献2)。図42に示す装置は、浸漬槽400外に配置されたローラ式搬送機構401と、該ローラ式搬送機構401よりも低い位置で処理液に浸るように浸漬槽400内に配置されたローラ式搬送機構402とを備えると共に、浸漬槽400内のワーク搬送方向Fの前後端部に、ワーク保持溝410を有する回転自在なドラム状又はディスク状の移載機構411を備えている。この装置によると、浸漬槽400外の搬送機構401により浸漬槽400の入口部の上方位置までワークWを搬送し、該ワークWの前端部を、移載機構411のワーク保持溝410により保持し、移載機構411の回転によりワークWを反転し、処理液内の搬送機構402上に投入するようになっている。また、ワーク出口部では、移載機構411の回転により、浸漬槽400内の搬送機構402から浸漬槽400外の搬送機構401にワークWを反転させながら移載するようになっている。
特開昭58−81997号公報 特公平2−24396号公報
As another conventional example 2, there is a work reversal type work transfer device as shown in FIG. 42 (Patent Document 2). The apparatus shown in FIG. 42 includes a roller-type conveyance mechanism 401 arranged outside the immersion tank 400, and a roller-type conveyance arranged in the immersion tank 400 so as to be immersed in the processing liquid at a position lower than the roller-type conveyance mechanism 401. A mechanism 402 is provided, and a rotatable drum-shaped or disk-shaped transfer mechanism 411 having a work holding groove 410 is provided at the front and rear ends of the work conveyance direction F in the immersion tank 400. According to this apparatus, the workpiece W is conveyed to a position above the inlet portion of the immersion tank 400 by the conveyance mechanism 401 outside the immersion tank 400, and the front end portion of the workpiece W is held by the workpiece holding groove 410 of the transfer mechanism 411. The workpiece W is reversed by the rotation of the transfer mechanism 411 and is put on the transport mechanism 402 in the processing liquid. Further, at the workpiece outlet portion, the transfer mechanism 411 is rotated so that the workpiece W is transferred from the transfer mechanism 402 in the immersion tank 400 to the transfer mechanism 401 outside the immersion tank 400 while being reversed.
JP 58-81997 Japanese Patent Publication No. 2-24396

図41の従来例1の装置では、回路基板等の板状ワークWを搬送する場合、シールローラ310によって板状ワークWを上下から一定の圧力で挟持するため、基板表面に非接触が要求される基板(たとえばガラス表示基板又はウエハ基板等)を、ワークとして搬送処理することはできない。また、ワークWの上下両面を挟持することにより、めっきむらが発生しやすい。すなわち、浸漬槽300へのワークWの搬入速度は、速くとも20mm/secであり、ワークWの先端が浸漬槽300内に侵入してからワーク後端が完全に浸漬槽内へ侵入し終えるまでに、20秒以上かかるためと推測される。また、シールローラ310等のシール機構が必要になると共にメンテナンスにも手間がかかる。   In the apparatus of Conventional Example 1 shown in FIG. 41, when the plate-like workpiece W such as a circuit board is conveyed, the plate-like workpiece W is sandwiched by the seal roller 310 from above and below with a constant pressure, so that the substrate surface is not contacted. A substrate (for example, a glass display substrate or a wafer substrate) cannot be transported as a workpiece. Further, by sandwiching the upper and lower surfaces of the workpiece W, uneven plating tends to occur. That is, the speed at which the workpiece W is carried into the immersion tank 300 is 20 mm / sec at the fastest, and the work W is completely invaded into the immersion tank after the front end of the work W has entered the immersion tank 300. It is estimated that it takes 20 seconds or more. In addition, a seal mechanism such as a seal roller 310 is required, and maintenance is troublesome.

図42の従来例2の装置では、回転式の移載機構411によりワークWを反転させて移載するので、基板等の板状のワークWを反転させるためには広い反転スペースが必要となり、浸漬槽400が大形化し、コンパクト化が困難である。また、基板等のワークWが表裏逆向きに移載されるため、前記従来例1と同様に、表面に非接触が要求される回路基板(たとえばガラス表示基板又はウエハ基板等)を、ワークとして搬送処理することはできない。   In the apparatus of Conventional Example 2 in FIG. 42, since the workpiece W is transferred by being reversed by the rotary transfer mechanism 411, a wide reversing space is required to reverse the plate-like workpiece W such as a substrate. The immersion tank 400 becomes large and difficult to make compact. Further, since the workpiece W such as a substrate is transferred in the opposite direction, a circuit board (for example, a glass display substrate or a wafer substrate) that requires non-contact on the surface is used as the workpiece, as in the conventional example 1. It cannot be transported.

本発明の目的は、ワーク出入部にシール装置を施す必要のないワーク搬送装置であって、回路基板等のように、基板表面に非接触が要求されるワークでも、ワークの搬送姿勢を変更することなく、速やかに、かつ、ワークが擦れることなく、ワークを浸漬槽内に搬入し、あるいは浸漬槽外に搬出し、めっきむらの発生を防止でき、しかもコンパクトな浸漬槽のワーク搬送装置を提供することである。   An object of the present invention is a workpiece transfer device that does not require a sealing device at a workpiece entry / exit portion, and changes the workpiece transfer posture even for a workpiece that requires non-contact on the substrate surface, such as a circuit board. Quickly and without workpiece rubbing, the workpiece can be carried into the immersion bath or taken out of the immersion bath to prevent plating unevenness and provide a compact immersion bath workpiece transfer device. It is to be.

前記課題を解決するため、請求項1記載の発明は、処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送する低位搬送機構と、前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、前記低位搬送機構又は高位搬送機構の一方の搬送機構から、ワークを略水平移動により受け取り、下降又は上昇し、ワークを略水平移動により他方の搬送機構に移載する昇降自在な移載機構と、を備えており、前記移載機構は、ワークを上面に載置して搬送する複数の水平な移載用搬送ローラと、該移載用搬送ローラを支持するフレームと、該フレームを昇降自在に支持する左右一対のシリンダと、を有しており、前記左右のシリンダは、ワーク下降時又はワーク上昇時に前記移載用搬送ローラが左右に傾斜するように、収縮開始タイミング又は伸張開始タイミングが左右で異なるように構成している。 In order to solve the above-mentioned problem, the invention according to claim 1 is an immersion tank work transfer device for storing a treatment liquid and immersing the work, and is disposed in the immersion tank and the work in the treatment liquid. A low-level transport mechanism for transporting, and a high-level transport mechanism that is disposed at a position higher than the low-level transport mechanism on the outside of the immersion tank, extends to a position near the immersion tank or above the immersion tank, and transports a workpiece. A transfer mechanism that can be moved up and down to receive a workpiece from one of the low-level conveyance mechanism and the high-level conveyance mechanism by a substantially horizontal movement, move down and rise, and transfer the work to the other conveyance mechanism by a substantially horizontal movement; , and wherein the transfer mechanism is movable up and down and a plurality of horizontal transfer conveyance roller for conveying and placing the workpiece on the upper surface, a frame for supporting the conveyance roller mounting該移, the frame A pair of left and right cylinders to be supported, and the left and right cylinders have a contraction start timing or an extension start timing so that the transfer transport roller is tilted left and right when the workpiece is lowered or lifted. It is configured differently.

上記構成によると、浸漬槽のワーク出入口部にシール機構を施す必要がなく、メンテナンスが容易になる。また、ワークの姿勢を変化させることなく、すなわち、ワークを反転させることなく、かつ、上下から挟持することなく、速やかに、かつ円滑にワークを移載できるので、基板表面に非接触が要求される回路基板等の板状ワークにも簡単に対応でき、しかも、浸漬槽自体をコンパクトに維持することができる。特に、めっき槽に適用する場合には、めっきむらの発生が防止できる。
また、左右のシリンダの収縮開始タイミング又は伸長開始タイミングをずらすように構成することにより、搬送ローラを左右に傾斜させ、それによりワークを傾斜させるようにしているので、下降時には、めっき液にワークWが浸かる時に、ワークWが浮き上がるのを防止し、それによりワークの姿勢が崩れるのを防止でき、一方、上昇時には、ワークWの表面のめっき液を流し落とすことができる。
According to the said structure, it is not necessary to provide a sealing mechanism in the workpiece entrance / exit part of an immersion tank, and a maintenance becomes easy. In addition, since the workpiece can be transferred quickly and smoothly without changing the posture of the workpiece, that is, without inverting the workpiece and holding it from above and below, non-contact is required on the substrate surface. It is possible to easily cope with plate-like workpieces such as circuit boards, and the immersion bath itself can be kept compact. In particular, when applied to a plating tank, the occurrence of uneven plating can be prevented.
Further, by configuring the left and right cylinders to start contracting or extending, the conveying rollers are tilted to the left and right, thereby tilting the workpiece. It is possible to prevent the workpiece W from being lifted when the workpiece is immersed, thereby preventing the posture of the workpiece from collapsing. On the other hand, when it is lifted, the plating solution on the surface of the workpiece W can be poured off.

請求項2記載の発明は、処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送するローラ式の低位搬送機構と、前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、前記高位搬送機構から前記低位搬送機構へワークを移載する移載機構と、を備えており、前記移載機構は、前記低位搬送機構の各搬送ローラ間に位置して上向きの液噴流を噴流圧制御自在に発生させる複数のノズルを備え、前記各ノズルは前記低位搬送機構の前記搬送ローラの略全幅に亘るように搬送幅方向に細長く形成され、前記液噴流により高位搬送機構からのワークを受け取り、液噴流の噴流圧を低下させることによりワークを低位搬送機構に載せるように構成している。 The invention according to claim 2 is a roller-type low-order conveyance device that stores the treatment liquid and immerses the workpiece in the immersion tank and is disposed in the immersion tank and conveys the workpiece in the treatment liquid. A high-level conveyance mechanism that is disposed at a position higher than the low-level conveyance mechanism on the outside of the immersion tank, extends to a position near the immersion tank or above the immersion tank, and conveys a workpiece; and the high-level conveyance A transfer mechanism for transferring a workpiece from the mechanism to the lower transfer mechanism, and the transfer mechanism is located between the transfer rollers of the lower transfer mechanism and can control the jet pressure of the upward liquid jet. comprising a plurality of nozzles to be generated in the each nozzle is elongate formed in the conveying width direction to span substantially the entire width of the conveying roller of the lower transport mechanism, receiving the workpiece from a higher conveying mechanism by the liquid jet Ri is configured to place the workpiece in the lower transport mechanism by lowering the jet pressure of the liquid jet.

上記構成のように、上向きの液噴流でワークを支持し、噴流圧を制御することにより、高位搬送機構から低位搬送機構へ移載するようにしていると、移載機構の配置スペースがコンパクトになり、また、ワーク移載中に、ワークの表面には固体物が接触しないので、ワークの表面を傷付けるおそれもない。   As in the above configuration, by supporting the workpiece with the upward liquid jet and controlling the jet pressure, it is possible to transfer from the high level transfer mechanism to the low level transfer mechanism. In addition, since the solid object does not contact the surface of the work during the work transfer, there is no possibility of damaging the surface of the work.

請求項3記載の発明は、処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送する低位搬送機構と、前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、
前記高位搬送機構から前記低位搬送機構へワークを移載する移載機構と、を備え、前記移載機構は、搬送幅方向に所定間隔をおいて配置された一対の移載用搬送ローラからなる移載用搬送ローラ対を、搬送方向に所定間隔をおいて複数対配置し、前記複数の移載用搬送ローラ対のうち、最も高位搬送機構側の移載用搬送ローラ対の移載用搬送ローラは略鉛直姿勢に配置し、低位搬送機構側の移載用搬送ローラ対に行くに従い、移載用搬送ローラ間でなす上開きの角度が順次大きくなるように、各移載用搬送ローラを傾斜させている。
The invention according to claim 3 is a work transfer device of a dipping tank for storing a treatment liquid and immersing the work, and a low level conveyance mechanism that is arranged in the dipping tank and conveys the work in the treatment liquid; A high-level transport mechanism that is disposed outside the immersion tank at a position higher than the low-level transport mechanism, extends to a position near the immersion tank or a position above the immersion tank, and transports a workpiece,
A transfer mechanism that transfers a workpiece from the high-level transfer mechanism to the low-level transfer mechanism, and the transfer mechanism includes a pair of transfer transfer rollers arranged at a predetermined interval in the transfer width direction. A plurality of transfer roller pairs for transfer are arranged at a predetermined interval in the transfer direction, and transfer transfer of the transfer roller pair on the highest transfer mechanism side among the plurality of transfer roller pairs for transfer is performed. The rollers are arranged in a substantially vertical posture, and each transfer transport roller is set so that the upward opening angle between the transfer transport rollers gradually increases as going to the transfer transport roller pair on the lower transport mechanism side. It is tilted.

上記構成によると、移載機構自体を昇降させる必要がなく、昇降用の駆動機構も必要無くなるので、構造が簡単になると共に、コストも低減できる。また、移載用搬送ローラにより、ワークの両側端を支持するので、ワークの表面を傷付けるおそれもない。   According to the above configuration, the transfer mechanism itself does not need to be raised and lowered, and the drive mechanism for raising and lowering is also unnecessary, so that the structure is simplified and the cost can be reduced. Further, since both side ends of the workpiece are supported by the transfer conveyance roller, there is no possibility of damaging the surface of the workpiece.

請求項4記載のワーク搬送装置は、処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送する低位搬送機構と、前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、前記高位搬送機構から前記低位搬送機構へワークを移載する移載機構と、を備え、前記移載機構は、複数の移載用搬送ローラにより構成されると共に、高位搬送機構の搬送面と低位搬送機構の搬送面との間で、高さの異なる複数の移載面を有しており、前記複数の移載面は、高位搬送機構側から低位搬送機構側に行くに従い、階段状に順次低位置になるように配置されており、前記各移載面は、高位搬送機構側に配置された複数の移載用搬送ローラが複数の短いローラ部分に分割されると共に、搬送方向に隣り合う前記移載用搬送ローラの各ローラ部分が千鳥状に配列され、かつ、搬送方向にオーバーラップするように配列されているThe workpiece transfer apparatus according to claim 4, wherein the workpiece transfer apparatus is a dipping tank that stores the processing liquid and immerses the workpiece, and is disposed in the dipping tank and transfers the workpiece in the processing liquid. A high-level transport mechanism that is disposed outside the immersion tank at a position higher than the low-level transport mechanism, extends to a position near the immersion tank or above the immersion tank, and transports a workpiece; and the high-level transport mechanism A transfer mechanism for transferring the workpiece from the low-level transfer mechanism to the low-level transfer mechanism, and the transfer mechanism includes a plurality of transfer transfer rollers, and the transfer surface of the high-level transfer mechanism and the transfer of the low-level transfer mechanism A plurality of transfer surfaces having different heights from each other, and the plurality of transfer surfaces are sequentially lowered to a lower position in a stepwise manner from the high-level transfer mechanism side to the low-level transfer mechanism side. It is arranged so, before Each transfer surface is divided into a plurality of transfer conveyance rollers arranged on the high-level conveyance mechanism side into a plurality of short roller portions, and each roller portion of the transfer conveyance rollers adjacent in the conveyance direction is staggered. And are arranged so as to overlap in the transport direction .

上記構成によると、移載機構自体を昇降させる必要がなく、昇降用の駆動機構も必要無くなるので、構造が簡単になると共に、コストも低減できる。また、高位搬送機構から移載面への受け渡し時、ワークを確実に移載面上で受け取ることができ、移載用搬送ローラ間にワークが挟まるようなことはない。 According to the above configuration, the transfer mechanism itself does not need to be raised and lowered, and the drive mechanism for raising and lowering is also unnecessary, so that the structure is simplified and the cost can be reduced. Further, when transferring from the high-level transport mechanism to the transfer surface, the work can be reliably received on the transfer surface, and the work is not sandwiched between the transfer transport rollers.

請求項5記載の発明は、請求項1乃至4のいずれか一つに記載の浸漬槽のワーク搬送装置において、前記高位搬送機構の搬送速度が変更可能となっている。 According to a fifth aspect of the present invention, in the work conveying apparatus for an immersion tank according to any one of the first to fourth aspects, the conveying speed of the high-level conveying mechanism can be changed.

上記構成によると、高位搬送機構と移載機構の間でワークを移載する時に、高位搬送機構の搬送速度を移載機構の搬送速度に合わせることができ、それにより、ワークを、速やかに、かつ、搬送面上で変形したり、擦れたりすることなく、移載することができ、ワークの品質を維持することができる。   According to the above configuration, when transferring the workpiece between the high-level conveyance mechanism and the transfer mechanism, the conveyance speed of the high-level conveyance mechanism can be matched with the conveyance speed of the transfer mechanism, thereby quickly accelerating the workpiece, And it can transfer, without deform | transforming on a conveyance surface or rubbing, and the quality of a workpiece | work can be maintained.

請求項6記載の発明は、請求項1、3、4及び5のいずれか一つに記載の浸漬槽のワーク搬送装置において、前記移載機構の搬送速度が変更可能となっている。 According to a sixth aspect of the present invention, in the work conveyance device for an immersion tank according to any one of the first , third, fourth, and fifth aspects, the conveyance speed of the transfer mechanism can be changed.

上記構成によると、高位搬送機構と移載機構の間でワークを移載する時には、移載機構の搬送速度を高位搬送機構の搬送速度に合わせ、低位搬送機構と移載機構の間でワークを移載する時には、移載機構の搬送速度を低位搬送機構の搬送速度に合わせることができ、それにより、ワークを、速やかに、かつ、搬送面上で変形したり、擦れたりすることなく、移載することができ、ワークの品質を維持することができる。   According to the above configuration, when a workpiece is transferred between the high-level transfer mechanism and the transfer mechanism, the transfer speed of the transfer mechanism is adjusted to the transfer speed of the high-level transfer mechanism, and the workpiece is transferred between the low-level transfer mechanism and the transfer mechanism. When transferring, the transfer speed of the transfer mechanism can be adjusted to the transfer speed of the lower transfer mechanism, so that the workpiece can be transferred quickly and without being deformed or rubbed on the transfer surface. The quality of the workpiece can be maintained.

請求項7記載の発明は、請求項1、3、4及び5のいずれか一つに記載の浸漬槽のワーク搬送装置において、前記低位搬送機構、高位搬送機構及び移載機構は、複数の搬送ローラからなると共に搬送面上にワークを載置して搬送するように構成されている。
A seventh aspect of the present invention is the immersion tank work transfer device according to any one of the first , third, fourth, and fifth aspects, wherein the low level transfer mechanism, the high level transfer mechanism, and the transfer mechanism include a plurality of transfers. It consists of a roller and is configured to carry the work by placing it on the carrying surface.

上記構成のように、搬送機構として、搬送ローラ上にワークを載置して搬送する搬送機構及び移載機構を備えていると、薄板状のワークを搬送する場合に、ワークにかかる曲げ応力等を軽減することができる。たとえば、1mm以下の薄板の基板でも、基板自体に無理な曲げ応力をかけることなく、安定した平面状態で移載でき、これによってもワークの品質を維持することができる。   As in the above configuration, when the transport mechanism is equipped with a transport mechanism and a transfer mechanism that transports the work placed on the transport rollers, bending stress applied to the work when a thin plate-shaped work is transported, etc. Can be reduced. For example, even a thin substrate having a thickness of 1 mm or less can be transferred in a stable plane state without applying an excessive bending stress to the substrate itself, thereby maintaining the quality of the workpiece.

[第1の実施の形態]
図1〜図16は、本発明にかかるワーク搬送装置を備えた浸漬処理装置の一例を示し、めっき処理装置に適用した例である。
[First Embodiment]
FIGS. 1-16 shows an example of the immersion processing apparatus provided with the workpiece conveyance apparatus concerning this invention, and is the example applied to the plating processing apparatus.

(めっき装置全体の概略)
図1はめっき処理装置全体の側面略図であり、紙面のスペース的な制限からめっき処理ラインを上下2段に分けて表示しているが、実際の装置は、搬送始端(上段の左端)Psから搬送終端(下段の右端)Peに至るまで、搬送方向Fに沿って一つのライン上に揃えられている。なお、説明の都合上、搬送方向Fを基準として、搬送方向F側(搬送終端Pe)側を「前側」とし、搬送方向Fと反対側(搬送始端端Ps側)を「後側」とし、また、搬送方向Fと直交する水平方向(搬送幅方向)を左右方向として、以下説明する。
(Outline of overall plating equipment)
FIG. 1 is a schematic side view of the entire plating apparatus, and the plating line is divided into two upper and lower stages due to space limitations on the paper surface, but the actual apparatus starts from the conveyance start end (upper left end) Ps. It is aligned on one line along the conveyance direction F until it reaches the conveyance end (lower right end) Pe. For convenience of explanation, the transport direction F side (the transport end Pe) side is referred to as “front side”, and the opposite side of the transport direction F (the transport start end Ps side) is referred to as “rear side” with reference to the transport direction F. The horizontal direction (conveying width direction) orthogonal to the conveying direction F will be described below as the left-right direction.

めっき処理ライン上には、搬送始端Psに配置されたローディング装置1から搬送終端Peに配置されたアンロード装置2の間に、浸漬槽として、搬送始端Ps側から順に、脱脂用浸漬槽4、無電解Cuめっき用浸漬槽5、無電解Coめっき用浸漬槽6及び無電解Ni−Bめっき用浸漬槽7が配置されている。   On the plating processing line, a degreasing dipping bath 4 is disposed between the loading device 1 arranged at the conveyance start end Ps and the unloading device 2 arranged at the conveyance end Pe as a dipping tank in order from the conveyance start end Ps side. An immersion tank 5 for electroless Cu plating, an immersion tank 6 for electroless Co plating, and an immersion tank 7 for electroless Ni-B plating are arranged.

脱脂用浸漬槽4と無電解Cuめっき用浸漬槽5との間には、温水洗槽11、水洗槽12、酸活性槽13、水洗槽14、温水洗槽15及び早送り中継槽16が前から順に配置され、無電解Cuめっき用浸漬槽5と無電解Coめっき用浸漬槽6の間には、早送り水洗槽21、水洗槽22及び温水洗槽23が前から順に配置され、無電解Coめっき用浸漬槽6と無電解Ni−Bめっき用浸漬槽7の間には、水洗槽25及び温水洗槽26が前から順に配置され、無電解Ni−Bめっき用浸漬槽7とアンロード装置2の間には、水洗槽28、温水洗槽29及び熱風乾燥槽30が配置されている。   Between the degreasing immersion tank 4 and the electroless Cu plating immersion tank 5, there are a warm water washing tank 11, a water washing tank 12, an acid activation tank 13, a water washing tank 14, a warm water washing tank 15, and a fast-forward relay tank 16 from the front. Between the immersion bath 5 for electroless Cu plating and the immersion bath 6 for electroless Co plating, a fast-feed water washing tank 21, a water washing tank 22, and a warm water washing tank 23 are arranged in order from the front, and the electroless Co plating is performed. Between the immersion tank 6 and the electroless Ni-B plating immersion tank 7, a water washing tank 25 and a warm water washing tank 26 are arranged in order from the front, and the electroless Ni-B plating immersion tank 7 and the unloading device 2 are arranged. Between them, a water washing tank 28, a hot water washing tank 29 and a hot air drying tank 30 are arranged.

各浸漬槽4、5、6、7内には、貯留されているめっき液(処理液)の液面より低い位置に、ローラ式の低位搬送機構34、35、36、37がそれぞれ配置され、各水洗槽12、14、22、25、28、各温水洗槽11、15、23、26、29、早送り水洗槽21、早送り中継槽16及び熱風乾燥槽30には、前記低位搬送機構34、35、36、37よりも高い位置に、ローラ式の高位搬送機構51、52、53、54、55、56、57、58、59、60、61、62、63、64がそれぞれ配置され、そして、各浸漬槽4、5、6、7内の前後端部には、高位搬送機構51等と略同じ上昇位置と、低位搬送機構34等と略同じ下降位置の間で昇降するローラ式の移載機構70、71、72、73、74、75、76、77が、昇降自在に配置されている。   In each of the immersion tanks 4, 5, 6, and 7, roller-type low-level transport mechanisms 34, 35, 36, and 37 are arranged at positions lower than the liquid surface of the stored plating solution (processing solution), respectively. Each washing tank 12, 14, 22, 25, 28, each warm water washing tank 11, 15, 23, 26, 29, fast-forward washing tank 21, fast-forward relay tank 16, and hot air drying tank 30, the low-level transport mechanism 34, 35, 36, and 37, roller-type high-level transport mechanisms 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, and 64 are disposed, respectively. At the front and rear ends of each of the immersion tanks 4, 5, 6, and 7, a roller-type transfer that moves up and down between approximately the same raised position as the high-order transport mechanism 51 and the like and approximately the same lower position as the low-order transport mechanism 34 and the like. Loading mechanism 70, 71, 72, 73, 74, 75, 76, 77, It is freely arranged later.

ローディング装置1の搬送速度は150mm/secに設定されている。その後ろの脱脂用浸漬槽4内の低位搬送機構34の搬送速度は9mm/secに設定されている。その後ろの温水洗槽11、水洗槽12、酸活性槽13、水洗槽14及び温水洗槽15内の各高位搬送機構51、52、53、54、55の搬送速度は9mm/secに設定されている。その後ろの早送り中継槽16の高位搬送機構56の搬送速度は、9mm/secと150mm/secとの間で切り換え可能に設定されている。その後ろの無電解Cuめっき用浸漬槽5の低位搬送機構35の搬送速度は10mm/secに設定されている。その後ろの早送り水洗槽21内の高位搬送機構57の搬送速度は150mm/secと9mm/secとの間で切り換え可能に設定されている。その後ろの水洗槽22及び温水洗槽23内の高位搬送機構58、59の搬送速度は9mm/secに設定されている。その後ろの無電解Coめっき用浸漬槽6内の低位搬送機構36の搬送速度は15mm/secに設定されている。その後ろの水洗槽25及び温水洗槽26内の高位搬送機構60、61の搬送速度は9mm/secに設定されている。その後ろの無電解Ni−Bめっき用浸漬槽7内の低位搬送機構37の搬送速度は6.5mm/secに設定されている。その後ろの水洗槽28及び温水洗槽29内の高位搬送機構62、63の搬送速度は9mm/secに設定されている。   The conveying speed of the loading device 1 is set to 150 mm / sec. The conveyance speed of the low-order conveyance mechanism 34 in the degreasing immersion tank 4 behind it is set to 9 mm / sec. The transport speed of each of the high-level transport mechanisms 51, 52, 53, 54, and 55 in the hot water washing tank 11, the water washing tank 12, the acid activating tank 13, the water washing tank 14 and the hot water washing tank 15 behind that is set to 9 mm / sec. ing. The transport speed of the high-order transport mechanism 56 of the fast-forward relay tank 16 behind it is set to be switchable between 9 mm / sec and 150 mm / sec. The conveyance speed of the low-order conveyance mechanism 35 of the immersion tank 5 for electroless Cu plating behind it is set to 10 mm / sec. The conveyance speed of the high-level conveyance mechanism 57 in the fast-feed water washing tank 21 behind is set so as to be switchable between 150 mm / sec and 9 mm / sec. The conveyance speeds of the high-level conveyance mechanisms 58 and 59 in the water washing tank 22 and the warm water washing tank 23 behind the tank are set to 9 mm / sec. The conveyance speed of the low-order conveyance mechanism 36 in the immersion tank 6 for electroless Co plating behind it is set to 15 mm / sec. The conveyance speed of the high-level conveyance mechanisms 60 and 61 in the water washing tank 25 and the warm water washing tank 26 behind it is set to 9 mm / sec. The conveyance speed of the low-order conveyance mechanism 37 in the immersion tank 7 for electroless Ni-B plating behind it is set to 6.5 mm / sec. The conveyance speeds of the high-level conveyance mechanisms 62 and 63 in the water washing tank 28 and the warm water washing tank 29 behind it are set to 9 mm / sec.

すなわち、各浸漬槽4、5、6、7内に配置された低位搬送機構34、35、36、37は、9mm/sec又は150mm/secの速度一定型であり、各浸漬槽4、5、6、7内の通過時間(浸漬時間)は、脱脂用浸漬槽4内が300秒、無電解Cuめっき用浸漬槽5内が400秒、無電解Coめっき用浸漬槽6内が120秒、無電解Ni−Bめっき用浸漬槽7内が270秒となっている。   That is, the low-level transport mechanisms 34, 35, 36, and 37 disposed in the immersion tanks 4, 5, 6, and 7 are constant speed types of 9 mm / sec or 150 mm / sec. The passage time (immersion time) in 6 and 7 is 300 seconds in the degreasing immersion tank 4, 400 seconds in the electroless Cu plating immersion tank 5, 120 seconds in the electroless Co plating immersion tank 6, and no. The inside of the immersion bath 7 for electrolytic Ni-B plating is 270 seconds.

また、各水洗槽12、14、22、25、28、温水洗槽11、15、23、26、29、酸活性槽13及び熱風乾燥槽30の各搬送機構51、52、53、54、55、58、59、60、61、62、63、64も速度一定型であり、各槽内の通過時間は、脱脂用浸漬槽4と無電解Cuめっき用浸漬槽5との間の各水洗槽22、25、28、温水洗槽23、26、29内がそれぞれ2秒である。なお、早送り中継槽16及び早送り水洗槽21内の搬送時間(通過時間)は、それぞれ6秒である。   Moreover, each conveyance mechanism 51, 52, 53, 54, 55 of each water washing tank 12, 14, 22, 25, 28, warm water washing tank 11, 15, 23, 26, 29, the acid activation tank 13, and the hot air drying tank 30 , 58, 59, 60, 61, 62, 63, 64 are also of a constant speed type, and the passing time in each tank is a water washing tank between the degreasing immersion tank 4 and the electroless Cu plating immersion tank 5. 22, 25, 28, and warm water washing tanks 23, 26, 29 are each 2 seconds. In addition, the conveyance time (passing time) in the fast-forwarding relay tank 16 and the fast-forward washing tank 21 is 6 seconds, respectively.

脱脂用浸漬槽4の前端出口部に配置されたローラ式の移載機構71も速度一定型であるが、その他の移載機構70、72、73、74、75、76、77は、前記早送り中継槽16及び早送り水洗槽21の高位搬送機構56、57と同様に、搬送速度が切り換え自在となっている。具体的には、移載機構70、72、73、74、75、76、77は、それらの前後の搬送機構の搬送速度にそれぞれ同調できるように、切り換え自在となっている。   The roller-type transfer mechanism 71 disposed at the front end outlet of the degreasing immersion tank 4 is also of a constant speed, but the other transfer mechanisms 70, 72, 73, 74, 75, 76, 77 Similarly to the high level transport mechanisms 56 and 57 of the relay tank 16 and the fast-forward water washing tank 21, the transport speed can be switched. Specifically, the transfer mechanisms 70, 72, 73, 74, 75, 76, 77 are switchable so that they can be synchronized with the transport speeds of the front and rear transport mechanisms.

すなわち、脱脂用浸漬槽4の後端入口部の移載機構70は150mm/secと9mm/secとの間で切り換え可能であり、無電解Cuめっき用浸漬槽5の後端入口部の移載機構72は150mm/secと10mm/secとの間で切り換え可能であり、無電解Cuめっき用浸漬槽5の前端出口部の移載機構73は10mm/secと15mm/secとの間で切り換え可能であり、無電解Coめっき用浸漬槽6の後端入口部の移載機構74は9mm/secと15mm/secとの間で切り換え可能であり、無電解Coめっき用浸漬槽6の前端出口部の移載機構75は15mm/secと9mm/secとの間で切り換え可能であり、無電解Ni−Bめっき用浸漬槽7の後端入口部の移載機構76は9mm/secと6.5mm/secとの間で切り換え可能であり、無電解Ni−Bめっき用浸漬槽7の後端出口部の移載機構77は6.5mm/secと9mm/secとの間で切り換え可能である。   That is, the transfer mechanism 70 at the rear end inlet of the degreasing bath 4 can be switched between 150 mm / sec and 9 mm / sec, and the rear end inlet of the electroless Cu plating bath 5 is transferred. The mechanism 72 can be switched between 150 mm / sec and 10 mm / sec, and the transfer mechanism 73 at the front end outlet of the electroless Cu plating immersion bath 5 can be switched between 10 mm / sec and 15 mm / sec. The transfer mechanism 74 at the rear end inlet portion of the electroless Co plating immersion bath 6 can be switched between 9 mm / sec and 15 mm / sec, and the front end outlet portion of the electroless Co plating immersion bath 6. The transfer mechanism 75 can be switched between 15 mm / sec and 9 mm / sec, and the transfer mechanism 76 at the rear end inlet of the immersion bath 7 for electroless Ni—B plating is 9 mm / sec and 6.5 mm. The transfer mechanism 77 at the rear end exit of the immersion bath 7 for electroless Ni—B plating is 6.5 mm / s. Switching between ec and 9mm / sec is possible.

各水洗槽12、14、22、25、28、温水洗槽11、15、23、26、29及び早送り水洗槽21には、各槽内の高位搬送機構51等の搬送面よりも高い位置にそれぞれシャワーノズル80がそれぞれ備えられ、無電解Coめっき用浸漬槽6の後側の温水洗槽23の前端部と、無電解Ni−Bめっき用浸漬槽7の後側の温水洗槽26の前端部には、それぞれワーク表面に付着した処理液を風圧で吹き飛ばすエアナイフ81が設けられている。なお、エアナイフ81は、ワーク搬送面の上方位置と下方位置とに配置されている。シャワーノズル80等によりワークの上方から吹き付けられた処理液は、高位搬送機構51等の搬送ローラ間の隙間を通って各槽の底部に溜まり、ポンプによって再びシャワーノズル80に循環される。   Each flush tank 12, 14, 22, 25, 28, warm flush tank 11, 15, 23, 26, 29 and fast-feed flush tank 21 are positioned higher than the transport surface of the high-level transport mechanism 51 and the like in each tank. A shower nozzle 80 is provided, and the front end of the hot water washing tank 23 on the rear side of the electroless Co plating immersion tank 6 and the front end of the hot water washing tank 26 on the rear side of the electroless Ni-B plating immersion tank 7 are provided. Each part is provided with an air knife 81 for blowing off the processing liquid adhering to the surface of the work by wind pressure. Note that the air knife 81 is disposed at an upper position and a lower position on the workpiece transfer surface. The processing liquid sprayed from above the workpiece by the shower nozzle 80 or the like accumulates at the bottom of each tank through the gap between the conveyance rollers of the high-level conveyance mechanism 51 and is circulated again to the shower nozzle 80 by a pump.

(浸漬槽の基本的構造)
図4は、図1のIV-IV断面拡大図であり、無電解Cuめっき用浸漬槽5の縦断面図である。この図4において、箱形の浸漬槽5は、装置本体101内に設けられた外槽102の底壁部分の上方に、複数の支柱103を介して支持されており、浸漬槽5内には複数の水平な搬送ローラ105からなる前記低位搬送機構35が収納され、各搬送ローラ105の回転軸105aは、浸漬槽5の左側の側壁107の外側に形成された隔壁110の外側まで延び、ギヤ111及びチェーン112を介して定速モータ113に連動連結している。搬送ローラ105の搬送面上に、回路基板等の板状のワークWが水平姿勢に載置され、めっき液内を水平に搬送するようになっている。
(Basic structure of immersion tank)
4 is an enlarged cross-sectional view taken along the line IV-IV in FIG. 1, and is a vertical cross-sectional view of the immersion bath 5 for electroless Cu plating. In FIG. 4, the box-shaped immersion tank 5 is supported above the bottom wall portion of the outer tank 102 provided in the apparatus main body 101 via a plurality of support columns 103. The lower transfer mechanism 35 composed of a plurality of horizontal transfer rollers 105 is accommodated, and the rotation shaft 105a of each transfer roller 105 extends to the outside of the partition wall 110 formed outside the left side wall 107 of the dipping tank 5, and the gears. 111 and a chain 112 are linked to a constant speed motor 113. A plate-like workpiece W such as a circuit board is placed in a horizontal posture on the conveyance surface of the conveyance roller 105 and is conveyed horizontally in the plating solution.

浸漬槽5の底板115には補強部材116が設けられている。前記外槽102の底壁部分は、前記ギヤ111等の配置側とは反対側の右側が低くなるように傾斜しており、該右側に、浸漬槽5からオーバーフローしためっき液を貯留する第1液受け部121が設けられている。該第1液受け部121には、フィルター122及び液排出用ポンプ123が接続され、該液排出用ポンプ123は予備槽124内に液を排出するようになっている。該予備槽124は、フィルター125a、液循環ポンプ125及び液吐出管126を介して、浸漬槽5内にめっき液を戻すようになっている。   A reinforcing member 116 is provided on the bottom plate 115 of the immersion tank 5. The bottom wall portion of the outer tank 102 is inclined so that the right side opposite to the arrangement side of the gear 111 and the like is lowered, and the first side for storing the plating solution overflowed from the immersion tank 5 is stored on the right side. A liquid receiver 121 is provided. A filter 122 and a liquid discharge pump 123 are connected to the first liquid receiving portion 121, and the liquid discharge pump 123 discharges the liquid into the preliminary tank 124. The preliminary tank 124 returns the plating solution into the immersion tank 5 through the filter 125a, the liquid circulation pump 125, and the liquid discharge pipe 126.

図6は、無電解Cuめっき用浸漬槽5の後端入口部を左側から見た縦断面拡大側面図(図3のVI-VI断面拡大図)であり、前記液吐出管126は、低位搬送機構35の搬送面よりも高い位置で浸漬槽5内に開口しており、該液吐出管126から前述のように浸漬槽5内にめっき液を吐出する。低位搬送機構35の搬送ローラ105は、縦長の軸受け部材128の下端部に支持されており、該軸受け部材128は、浸漬槽5の側壁107に形成された上下方向に長い長孔130に上方から差し込まれている。   FIG. 6 is an enlarged vertical side view of the rear end inlet portion of the immersion bath 5 for electroless Cu plating as viewed from the left side (an enlarged VI-VI cross section in FIG. 3). It opens into the immersion tank 5 at a position higher than the transport surface of the mechanism 35, and the plating solution is discharged into the immersion tank 5 from the liquid discharge pipe 126 as described above. The conveyance roller 105 of the low-level conveyance mechanism 35 is supported by the lower end portion of the vertically long bearing member 128, and the bearing member 128 is inserted into the elongated hole 130 formed in the side wall 107 of the dipping tank 5 from above. Plugged in.

図7は前記軸受け部材128の斜視図であり、軸受け部材128の前後面及び下端面には、浸漬槽5の側壁107の長孔130に嵌合するための溝131が形成されており、また、下端部には搬送ローラ105の回転軸105aを支持するための軸受孔132が形成されている。   FIG. 7 is a perspective view of the bearing member 128. Grooves 131 for fitting into the long holes 130 of the side wall 107 of the immersion bath 5 are formed on the front and rear surfaces and the lower end surface of the bearing member 128. A bearing hole 132 for supporting the rotating shaft 105a of the transport roller 105 is formed at the lower end.

図2は、図1のII-II断面拡大図であり、無電解Cuめっき用浸漬槽5の後端入口部の端壁5aには、ワークWが水平載置姿勢で通過可能なワークで入口133が形成されている。   2 is an enlarged cross-sectional view taken along the line II-II of FIG. 1, and the work wall W can be passed through the end wall 5a of the rear end entrance portion of the electroless Cu plating immersion bath 5 with a work that allows the work W to pass in a horizontal mounting posture. 133 is formed.

(移載機構の構成)
図3は図1のIII-III断面拡大図であり、この図3において、無電解Cuめっき用浸漬槽5の後端入口部に配置されているローラ式の移載機構72は、ワークWを上面に載置して搬送する複数の水平な搬送ローラ140と、該搬送ローラ140を支持するフレーム142と、該フレーム142を昇降自在に支持する左右一対のシリンダ143、144と、前記搬送ローラ140を駆動するために各搬送ローラ140の回転軸140aに固着されたギヤ145等からなるギヤ列と、変速モータ146により構成されている。前記フレーム142の右端部は、装置本体101の右側壁に形成された貫通孔148を通って装置本体101外部に突出し、装置本体101の右側壁に固定された右側シリンダ144に支持され、フレーム142の左端部は、装置本体101内の前記隔壁110に形成された貫通孔149を通り、装置本体101の左側壁と隔壁110との空間部内に突出し、隔壁110に固定された左側シリンダ143に支持されている。前記ギヤ145のギヤ列は、浸漬槽5の左側の側壁107と隔壁110との間の空間部に配置されており、該空間部の下側には、前記外槽102の底壁部分よりも下方に突出する第2液受け部151が形成されている。該第2液受け部151の底壁には、フィルター152を介して液排出ポンプ153が接続されており、該液排出ポンプ153は前記予備槽124に液を排出するようになっている。前記各ギヤ145は、図8及び図13に示すように、それぞれ中間ギヤ155を介して噛み合うことにおり、同一方向に回転するように構成されており、ギヤ145と中間ギヤ155とのギヤ列は、オーバーフローした処理液が外槽102の開口部から飛び散るのを防止する液飛散防止壁としての役目も果たしている。
(Configuration of transfer mechanism)
3 is an enlarged cross-sectional view taken along the line III-III of FIG. 1. In FIG. 3, a roller-type transfer mechanism 72 disposed at the rear end inlet of the electroless Cu plating immersion bath 5 A plurality of horizontal transport rollers 140 mounted on the upper surface and transported, a frame 142 that supports the transport roller 140, a pair of left and right cylinders 143 and 144 that support the frame 142 so as to be movable up and down, and the transport roller 140 In order to drive the motor, a gear train including a gear 145 and the like fixed to the rotation shaft 140a of each transport roller 140 and a transmission motor 146 are included. The right end of the frame 142 protrudes outside the apparatus main body 101 through a through hole 148 formed in the right side wall of the apparatus main body 101, and is supported by the right cylinder 144 fixed to the right side wall of the apparatus main body 101. The left end of the device passes through a through-hole 149 formed in the partition wall 110 in the apparatus body 101, protrudes into the space between the left side wall of the apparatus body 101 and the partition wall 110, and is supported by the left cylinder 143 fixed to the partition wall 110. Has been. The gear train of the gear 145 is disposed in a space part between the left side wall 107 and the partition wall 110 of the immersion tank 5, and below the space part than the bottom wall part of the outer tank 102. A second liquid receiving portion 151 protruding downward is formed. A liquid discharge pump 153 is connected to the bottom wall of the second liquid receiving portion 151 via a filter 152, and the liquid discharge pump 153 discharges the liquid to the preliminary tank 124. As shown in FIGS. 8 and 13, the gears 145 are in mesh with each other via intermediate gears 155, and are configured to rotate in the same direction, and a gear train of the gears 145 and the intermediate gears 155. Also serves as a liquid splash prevention wall that prevents the overflowed processing liquid from splashing from the opening of the outer tank 102.

図6において、移載機構72が配置されている浸漬槽5の側壁107にも、上下方向に長い長孔160が前後方向に所定間隔を置いて複数形成されており、各長孔160内に、移載機構72の各搬送ローラ140の回転軸140aが上下方向移動可能に挿通されている。また、装置本体101の後端部には、フリーローラ161が回転自在に支持されている。   In FIG. 6, a plurality of long holes 160 that are long in the vertical direction are also formed at predetermined intervals in the front-rear direction on the side wall 107 of the immersion tank 5 in which the transfer mechanism 72 is disposed. The rotation shaft 140a of each conveyance roller 140 of the transfer mechanism 72 is inserted so as to be movable in the vertical direction. A free roller 161 is rotatably supported at the rear end of the apparatus main body 101.

図16は、上昇時の移載機構72を示す側面図であり、上昇時の移載機構72の前方位置には、移載機構72の搬送ローラ140上を前方に搬送されるワークWが所定の前進位置で停止させられるストッパー162が配設されている。   FIG. 16 is a side view showing the transfer mechanism 72 at the time of ascent, and a workpiece W conveyed forward on the conveyance roller 140 of the transfer mechanism 72 is predetermined at the front position of the transfer mechanism 72 at the time of ascent. A stopper 162 that is stopped at the forward movement position is provided.

図8は図1の無電解Cuめっき用浸漬槽5の後端入口部に配置された移載機構72の平面図(図6の平面図)であり、フレーム142は左右に長い矩形状に形成されると共に、下側に前後方向に延びる左右一対にローラ支持片165が固着され、該ローラ支持片165に前記搬送ローラ140の回転軸140aの左右端部が回転自在に支持されている。各搬送ローラ140の材質は、ポリプロピレン、PEEK(ポリエーテルエーテルケトン)又はPPS(ポリフェニレンスルフィド)等の樹脂であり、また、ギヤ145、155の材質も同じである。フレーム142の材質は、ポリプロピレンもしくはPEEK、PPS等の樹脂又はステンレス鋼等の耐腐食性の金属である。   8 is a plan view (a plan view of FIG. 6) of the transfer mechanism 72 arranged at the rear end inlet of the electroless Cu plating immersion bath 5 of FIG. 1, and the frame 142 is formed in a rectangular shape that is long to the left and right. In addition, a pair of left and right roller support pieces 165 extending in the front-rear direction are fixed to the lower side, and the left and right end portions of the rotation shaft 140a of the transport roller 140 are rotatably supported by the roller support pieces 165. The material of each conveying roller 140 is a resin such as polypropylene, PEEK (polyetheretherketone) or PPS (polyphenylene sulfide), and the materials of the gears 145 and 155 are the same. The material of the frame 142 is polypropylene, a resin such as PEEK or PPS, or a corrosion-resistant metal such as stainless steel.

図11は、移載機構72のフレーム142と左右のシリンダ143(144)との連結構造を示す側面略図であり、フレーム142の左右端部の下面には前後一対の支持ブラケット168が形成されており、該支持ブラケット168間には、前後方向に延びる支持バー169が架設され、該支持バー169に、前記シリンダ143(144)のロッド部に連結された二股状の連結部材170の前後端部が枢着連結されている。   FIG. 11 is a schematic side view showing a connection structure between the frame 142 of the transfer mechanism 72 and the left and right cylinders 143 (144). A pair of front and rear support brackets 168 are formed on the lower surfaces of the left and right ends of the frame 142. A support bar 169 extending in the front-rear direction is installed between the support brackets 168, and front and rear end portions of a bifurcated connecting member 170 connected to the rod portion of the cylinder 143 (144). Are pivotally connected.

図12は図11のXII矢視図、図13は図12の左側のシリンダ143の連結部材170の拡大図、図14は図12の右側のシリンダ144の連結部材170の拡大図である。図13において、左側のシリンダ143の連結部材170の上端枢着部は、支持バー169に対応する円形の嵌合170a孔が形成されているが、図14に示すように、右側のシリンダ144の連結部材170の上端枢着部には、左右方向に長い長孔170bが形成され、該長孔170bに支持バー169が左右方向相対移動可能に嵌合している。このように右側のシリンダ144の連結部材170を、長孔170bにより支持バー169に嵌合している理由は、後述するように、移載機構72の昇降時に、搬送ローラ140を左右に傾斜させた状態で昇降させるためである。   12 is an enlarged view of the connecting member 170 of the left cylinder 143 in FIG. 12, and FIG. 14 is an enlarged view of the connecting member 170 of the right cylinder 144 in FIG. In FIG. 13, a circular fitting 170a hole corresponding to the support bar 169 is formed at the upper end pivoting portion of the connecting member 170 of the left cylinder 143. As shown in FIG. A long hole 170b that is long in the left-right direction is formed in the upper end pivoting portion of the connecting member 170, and a support bar 169 is fitted in the long hole 170b so as to be relatively movable in the left-right direction. The reason why the connecting member 170 of the right cylinder 144 is fitted to the support bar 169 through the long hole 170b is that the transport roller 140 is tilted left and right when the transfer mechanism 72 is raised and lowered, as will be described later. It is for raising and lowering in the state.

図15は、移載機構72の搬送ローラ一140の拡大図であり、左右端部につば部140bが形成され、ワークWの左右方向に移動を規制している。   FIG. 15 is an enlarged view of the conveying roller 140 of the transfer mechanism 72, and a collar portion 140 b is formed at the left and right end portions to restrict the movement of the workpiece W in the left and right direction.

(作動)
図9の(a)〜(e)は、移載動作の一例として、図1の無電解Cuめっき用浸漬槽5の後後端入口部において、早送り中継槽16の高位搬送機構56から無電解Cuめっき用浸漬槽5内の低位搬送機構35へ、移載機構72によりワークを移載する場合の作動を段階的に示している。
(Operation)
9A to 9E show, as an example of the transfer operation, the electroless Cu plating immersion tank 5 shown in FIG. The operation | movement in the case of transferring a workpiece | work by the transfer mechanism 72 to the low level conveyance mechanism 35 in the immersion tank 5 for Cu plating is shown in steps.

(1)図9の(a)において、ワークWは高位搬送機構56の搬送面上に載置され、搬送ローラ105の回転により高速の搬送速度(150mm/sec)でもって前方(搬送F方向)に搬送されており、一方、浸漬槽5の後端部に配置された移載機構72は、高位搬送機構56と略同一高さの上昇位置まで上昇した状態で待機すると共に、前記高位搬送機構56の搬送速度と同じ搬送速度(150mm/sec)で搬送ローラ140が駆動している。 (1) In FIG. 9A, the workpiece W is placed on the transfer surface of the high-level transfer mechanism 56, and is moved forward (in the transfer F direction) at a high transfer speed (150 mm / sec) by the rotation of the transfer roller 105. On the other hand, the transfer mechanism 72 disposed at the rear end portion of the dipping bath 5 stands by in a state where it is raised to a rising position that is substantially the same height as the high level transfer mechanism 56 and the high level transfer mechanism. The transport roller 140 is driven at the same transport speed (150 mm / sec) as the transport speed of 56.

(2)次の段階の図9の(b)において、ワークWは、高位搬送機構56の搬送面上から、上下方向に変位することなく、略水平移動により移載機構72の搬送面上に前記高速の搬送速度で移載される。この時、移載機構72の搬送速度と高位搬送機構56の搬送速度とが同一であるので、ワークWは、いずれの搬送ローラ105、140とも擦れることなく、円滑に高位搬送機構56から移載機構72に移載される。ワークWが移載機構72上の所定位置まで前進すると、ワークWはストッパー162により係止されると共に、移載機構72の搬送ローラ140は回転を停止する。 (2) In FIG. 9B in the next stage, the workpiece W is not displaced in the vertical direction from the transfer surface of the high-level transfer mechanism 56, but on the transfer surface of the transfer mechanism 72 by a substantially horizontal movement. Transfer is performed at the high transfer speed. At this time, since the transfer speed of the transfer mechanism 72 and the transfer speed of the high-order transfer mechanism 56 are the same, the workpiece W is smoothly transferred from the high-order transfer mechanism 56 without rubbing against any of the transfer rollers 105 and 140. It is transferred to the mechanism 72. When the workpiece W advances to a predetermined position on the transfer mechanism 72, the workpiece W is locked by the stopper 162, and the conveyance roller 140 of the transfer mechanism 72 stops rotating.

(3)次の段階の図9の(c)において、移載機構72は、浸漬槽5内の低位搬送機構35と略同一高さの下降位置まで下降し、今度は、低位搬送機構35の搬送速度(10mm/sec)と同じ搬送速度で搬送ローラ140が駆動し、低位搬送機構35の搬送面上にワークWを水平に送り出す。この時は、移載機構72の搬送ローラ140の搬送速度は低位搬送機構35の搬送速度と同一の速度(10mm/sec)に切り換えられており、ワークWは、搬送ローラ105、140と擦れることなく、円滑に移載機構72の搬送面上から低位搬送機構35の搬送面上に移載される。ワークWが完全に低位搬送機構35の搬送面上に移載された時点で、移載機構72の搬送ローラ140は回転を停止する。 (3) In FIG. 9C of the next stage, the transfer mechanism 72 is lowered to the lowered position that is substantially the same height as the low level transport mechanism 35 in the immersion tank 5, and this time, the low level transport mechanism 35 The transport roller 140 is driven at the same transport speed as the transport speed (10 mm / sec), and the work W is sent horizontally onto the transport surface of the low-order transport mechanism 35. At this time, the transport speed of the transport roller 140 of the transfer mechanism 72 is switched to the same speed (10 mm / sec) as the transport speed of the low-order transport mechanism 35, and the workpiece W rubs against the transport rollers 105 and 140. Instead, it is smoothly transferred from the transfer surface of the transfer mechanism 72 to the transfer surface of the low-order transfer mechanism 35. When the workpiece W is completely transferred onto the transfer surface of the lower transfer mechanism 35, the transfer roller 140 of the transfer mechanism 72 stops rotating.

(4)次の段階の図9の(d)において、ワークWが完全に低位搬送機構35に移載された後、移載機構72の搬送ローラ140の回転は停止し、そして次の段階の図9の(e)に示すように、移載機構72は上昇位置まで上昇し、高位搬送機構56と同一の搬送速度で移載機構72の搬送ローラ140が駆動し、次のワークWを受け取る。 (4) In FIG. 9D of the next stage, after the workpiece W has been completely transferred to the lower transfer mechanism 35, the rotation of the transfer roller 140 of the transfer mechanism 72 stops, and the next stage As shown in FIG. 9E, the transfer mechanism 72 moves up to the ascending position, and the transport roller 140 of the transfer mechanism 72 is driven at the same transport speed as that of the high-order transport mechanism 56 to receive the next workpiece W. .

移載機構72の昇降動作並びに各搬送ローラ140、105の駆動及び停止の制御は、移載機構72、高位搬送機構56及び低位搬送機構35に配置された各種センサー(図示せず)により、コントローラを介して行われる。   The lifting / lowering operation of the transfer mechanism 72 and the control of driving and stopping of the transport rollers 140 and 105 are controlled by various sensors (not shown) arranged in the transfer mechanism 72, the high level transport mechanism 56 and the low level transport mechanism 35. Is done through.

前記各種センサーとしては、たとえば、高位搬送機構56の搬送面上にワークWが供給されたことを検出するセンサーと、移載機構72の搬送面上でワークWが所定位置まで前進した状態(ストッパー162に当接した状態)を検出するセンサーと、移載機構72が上昇位置まで上昇した状態(又はシリンダ143等が伸長した状態)を検出するセンサーと、移載機構72が下降位置まで下降した状態(又はシリンダ143等が収縮した状態)を検出するセンサーと、移載機構72からワークWが完全に排出されたことを検出するセンサー等を備えることができる。   Examples of the various sensors include a sensor that detects that the workpiece W has been supplied onto the conveyance surface of the high-level conveyance mechanism 56, and a state in which the workpiece W has advanced to a predetermined position on the conveyance surface of the transfer mechanism 72 (stopper). 162, a sensor that detects a state in which the transfer mechanism 72 is moved up to a raised position (or a state in which the cylinder 143 and the like is extended), and a transfer mechanism 72 that is lowered to a lowered position. A sensor for detecting a state (or a state in which the cylinder 143 or the like is contracted), a sensor for detecting that the workpiece W is completely discharged from the transfer mechanism 72, and the like can be provided.

すなわち、早送り中継槽16の高位搬送機構56にワークWの先端が載置されたことをセンサーにより検知すると、早送り中継槽16の高位搬送機構56の搬送ローラ105と、移載機構72の搬送ローラ140とが、同一の搬送速度(150mm/sec)で駆動し、これにより高位搬送機構56の搬送面上から移載機構72の搬送面上に上記搬送速度でワークWを移載する(図9の(a))。   That is, when the sensor detects that the tip of the workpiece W is placed on the high-level transfer mechanism 56 of the fast-forward relay tank 16, the transfer roller 105 of the high-level transfer mechanism 56 of the fast-forward relay tank 16 and the transfer roller of the transfer mechanism 72. 140 are driven at the same conveyance speed (150 mm / sec), and thereby the workpiece W is transferred from the conveyance surface of the high-level conveyance mechanism 56 onto the conveyance surface of the transfer mechanism 72 at the above conveyance speed (FIG. 9). (A)).

次に、移載機構72の搬送面上でワークWが所定位置まで前進したことをセンサーにより検知すると、移載機構72の搬送ローラ140が停止し、シリンダ143、144(図10)が収縮して搬送ローラ140が下降位置まで下降する(図9の(b)及び(c))。   Next, when the sensor detects that the workpiece W has advanced to a predetermined position on the transfer surface of the transfer mechanism 72, the transfer roller 140 of the transfer mechanism 72 stops and the cylinders 143 and 144 (FIG. 10) contract. Thus, the conveying roller 140 is lowered to the lowered position ((b) and (c) in FIG. 9).

次に、シリンダ143、144が収縮して搬送ローラ140が下降位置まで下降したことをセンサーにより検知すると、移載機構72の搬送ローラ140が、低位搬送機構35の搬送ローラ105と同一の速度(10mm/sec)で駆動し、ワークWを低位搬送機構35の搬送面上に移載する(図9の(c)及び(d))。   Next, when the sensors detect that the cylinders 143 and 144 are contracted and the transport roller 140 is lowered to the lowered position, the transport roller 140 of the transfer mechanism 72 has the same speed as the transport roller 105 of the low-order transport mechanism 35 ( 10 mm / sec) and the workpiece W is transferred onto the conveyance surface of the low-level conveyance mechanism 35 ((c) and (d) in FIG. 9).

そして、移載機構72のからワークWが完全に搬出されたことをセンサーにより検知すると、移載機構72の搬送ローラ140が停止し、搬送ローラ140を上昇位置まで上昇させるのである(図9の(d)(e))。   When the sensor detects that the workpiece W has been completely unloaded from the transfer mechanism 72, the transport roller 140 of the transfer mechanism 72 stops and the transport roller 140 is raised to the raised position (see FIG. 9). (D) (e)).

図10の(a)(b)(c)は、移載機構72の昇降時の動作を示した図であり、移載機構を下降させる場合には、左右のシリンダ143、144の収縮開始タイミング(上昇時には伸長開始タイミング)をずらすことにより、図10の(b)のように、たとえば搬送ローラ140を右下がり状に傾斜させ、それによりワークWを傾斜させる。これにより、ワークWが、めっき液内に浸漬する時に浮かび上がるのを防止することができる。   FIGS. 10A, 10B, and 10C are diagrams showing the operation when the transfer mechanism 72 is moved up and down. When the transfer mechanism is lowered, the contraction start timing of the left and right cylinders 143 and 144 is shown. By shifting the (elongation start timing at the time of ascent), for example, the conveying roller 140 is inclined downwardly as shown in FIG. 10B, and thereby the workpiece W is inclined. Thereby, it can prevent that the workpiece | work W floats up when immersed in a plating solution.

なお、図1の無電解Cuめっき用浸漬槽5の前端出口部において、前側の早送り水洗槽21の高位搬送機構57にワークWを移載する際の作動も、前述の後端入口部の作動と順序が逆になるだけで、基本的には後端入口部における作動と同様である。   In addition, the operation | movement at the time of transferring the workpiece | work W to the high level conveyance mechanism 57 of the rapid feed water washing tank 21 of the front side in the front-end exit part of the immersion tank 5 for electroless Cu plating of FIG. The operation is basically the same as the operation at the rear end inlet portion, except that the order is reversed.

また、図1の他の浸漬槽4、6、7の各前端出口部及び後端入口部におけるワークWの移載作動も、前記無電解Cuめっき用浸漬槽5の場合と同様である。   Moreover, the transfer operation | work of the workpiece | work W in each front-end exit part and rear-end inlet part of the other immersion tanks 4, 6, and 7 of FIG. 1 is the same as that of the said immersion tank 5 for electroless Cu plating.

(実施の形態の効果)
(1)図9の(a)〜(e)で説明したように、水平姿勢で送られて来るワークWを、反転させたり、上下から挟持したりすることなく、一方の搬送機構56から他方の搬送機構35に略水平移動により、速やかに、かつ円滑に移載するので、基板表面に非接触が要求される回路基板等のワークにも簡単に対応でき、しかも、浸漬槽自体をコンパクトに維持することができる。特に、めっき槽に適用する場合には、めっきむらの発生を防止できる。
(Effect of embodiment)
(1) As described with reference to FIGS. 9A to 9E, the workpiece W sent in a horizontal posture is turned from one conveying mechanism 56 to the other without being reversed or sandwiched from above and below. Since the transfer mechanism 35 is transferred to the transfer mechanism 35 quickly and smoothly by a substantially horizontal movement, it can easily cope with a work such as a circuit board that requires non-contact on the substrate surface, and the immersion tank itself can be made compact. Can be maintained. In particular, when applied to a plating tank, the occurrence of uneven plating can be prevented.

(2)図9の(a)〜(e)で説明したように、高位搬送機構56と移載機構72との間でワークを移載する時には、移載機構72の搬送速度を高位搬送機構56の搬送速度に合わせ、低位搬送機構35と移載機構72の間でワークWを移載する時には、移載機構72の搬送速度を低位搬送機構35の搬送速度に合わせているので、ワークを、速やかに、かつ、搬送面上で変形したり、擦れたりすることなく、移載することができる。 (2) As described with reference to FIGS. 9A to 9E, when transferring a workpiece between the high-level transfer mechanism 56 and the transfer mechanism 72, the transfer speed of the transfer mechanism 72 is set to the high-level transfer mechanism. When the work W is transferred between the lower transfer mechanism 35 and the transfer mechanism 72 in accordance with the transfer speed of 56, the transfer speed of the transfer mechanism 72 is adjusted to the transfer speed of the lower transfer mechanism 35. It can be transferred quickly and without deformation or rubbing on the transport surface.

(3)図10の(a)(b)(c)で説明したように、移載機構72を下降させる場合(又は上昇させる場合)には、左右のシリンダ143、144の収縮開始タイミング(上昇時には伸長開始タイミング)をずらすことにより、図10の(b)のように、搬送ローラ140を左右に傾斜させ、それによりワークWを傾斜させるようにしていることにより、次のような利点が有る。 (3) As described in FIGS. 10A, 10B, and 10C, when the transfer mechanism 72 is lowered (or raised), the contraction start timing (rise) of the left and right cylinders 143 and 144 is increased. By shifting the sometimes expansion start timing), as shown in FIG. 10B, the conveyance roller 140 is tilted to the left and right, thereby tilting the workpiece W, thereby providing the following advantages. .

すなわち、下降時には、めっき液にワークWが浸かる時に、ワークWが浮き上がるのを防止し、それによりワークの姿勢が崩れるのを防止でき、一方、上昇時には、ワークWの表面のめっき液を流し落とすことができる。   That is, when the workpiece W is dipped in the plating solution, the workpiece W can be prevented from being lifted, thereby preventing the posture of the workpiece from collapsing. On the other hand, when the workpiece W is raised, the plating solution on the surface of the workpiece W is poured off. be able to.

(4)移載機構72の搬送ローラ140による搬送速度を変更可能とすることにより、速度変換手段としての機能を持たせているので、浸漬槽5の搬送方向長さをコンパクトにしつつ、所定処理時間を保てるように、浸漬槽5内の搬送速度を遅くすることができる。このように、浸漬槽5内での搬送速度を遅くすることにより、移載機構72の作動サイクル(ワーク受け入れ→上昇→ワーク排出→下降、又は、ワーク受け入れ→下降→ワーク排出→上昇)が長くなり、次のワークWが来るまでの時間を移載機構72で調節することで、様々な搬送速度に対応可能としているのである。 (4) Since the transfer speed by the transfer roller 140 of the transfer mechanism 72 can be changed, a function as a speed conversion means is provided, so that the predetermined length of the immersion tank 5 in the transfer direction is reduced, while the predetermined process is performed. The conveyance speed in the immersion tank 5 can be slowed so that time can be maintained. Thus, by slowing the conveying speed in the dipping tank 5, the operation cycle of the transfer mechanism 72 (work acceptance → lift → work discharge → fall or work acceptance → fall → work discharge → rise) becomes long. Thus, by adjusting the time until the next workpiece W comes by the transfer mechanism 72, it is possible to cope with various transport speeds.

[第2の実施の形態]
図17〜図20は本発明の第2の実施の形態であり、図17は移載機構72の平面図、図18は移載機構72の側面図、図19は図18のXIX矢視図、図20は移載機構72の昇降動作を示す側面図である。図17において、移載機構72の搬送ローラ140は、フリーローラとして構成されており、図20に示すように、移載機構72の下降時に、移送機構72の搬送ローラ140が、低位搬送機構35の搬送ローラ105間を下方に通過し、所定量h1だけ下方位置で停止するように構成されている。なお、第2の実施の形態において、第1の実施の形態と同じ部品には、同じ符号を付している。
[Second Embodiment]
17 to 20 show a second embodiment of the present invention. FIG. 17 is a plan view of the transfer mechanism 72, FIG. 18 is a side view of the transfer mechanism 72, and FIG. FIG. 20 is a side view showing the lifting / lowering operation of the transfer mechanism 72. In FIG. 17, the transport roller 140 of the transfer mechanism 72 is configured as a free roller. As shown in FIG. 20, the transport roller 140 of the transfer mechanism 72 is moved to the lower transport mechanism 35 when the transfer mechanism 72 is lowered. It passes through between the conveying rollers 105 and stops at a lower position by a predetermined amount h1. In the second embodiment, the same components as those in the first embodiment are denoted by the same reference numerals.

図20において、移載機構72が下降した時には、前述のように、移載機構72の各搬送ローラ140は、浸漬槽5内の低位搬送機構35の搬送ローラ105間を下方に通過し、それにより移載機構72上のワークWが自動的に低位搬送機構25の搬送面上に移載される。このように移載された後、図20の実線の状態から、低位搬送機構35の搬送ローラ105の駆動により、ワークWは前方に搬送される。   In FIG. 20, when the transfer mechanism 72 is lowered, the transfer rollers 140 of the transfer mechanism 72 pass downward between the transfer rollers 105 of the lower transfer mechanism 35 in the immersion tank 5 as described above. As a result, the workpiece W on the transfer mechanism 72 is automatically transferred onto the transfer surface of the lower transfer mechanism 25. After being transferred in this manner, the workpiece W is conveyed forward from the state of the solid line in FIG. 20 by driving the conveyance roller 105 of the low-level conveyance mechanism 35.

一方、仮想線で示すように、移載機構72の上昇時には、後方の高位搬送機構56の駆動のみにより、高位搬送機構56から移載機構72の搬送面上にワークWが移載される。   On the other hand, as indicated by the phantom line, when the transfer mechanism 72 is lifted, the workpiece W is transferred from the high level transfer mechanism 56 onto the transfer surface of the transfer mechanism 72 only by driving the high level transfer mechanism 56 behind.

該実施の形態によると、移載機構72の搬送ローラ140を駆動するための変速モータは不要となり、部品コストを低減できる。   According to this embodiment, the speed change motor for driving the transport roller 140 of the transfer mechanism 72 is not necessary, and the component cost can be reduced.

ただし、この実施の形態は、浸漬槽5等の後端入口部に配置される移載機構のみに適用可能であり、前端出口部に配置される移載機構には適用できない。   However, this embodiment can be applied only to the transfer mechanism disposed at the rear end inlet portion of the immersion tank 5 or the like, and cannot be applied to the transfer mechanism disposed at the front end outlet portion.

[第3の実施の形態]
図21及び図22は本発明の第3の実施の形態であり、図21は移載機構72の平面図、図22は図21のXXII-XXII断面図を示しており、移載機構72の搬送ローラ200として、縦向きの回転軸200aを有すると共に、外周に断面V形溝200bを有するローラを用いている。各搬送ローラ200は、左右方向に所定間隔をおいて2列に対向配置されており、水平姿勢のワークWの左右端部を、搬送ローラ200のV形溝200bで保持し、搬送ローラ200の回転により搬送するように構成されている
[Third Embodiment]
21 and 22 show a third embodiment of the present invention. FIG. 21 is a plan view of the transfer mechanism 72. FIG. 22 is a sectional view taken along the line XXII-XXII of FIG. As the conveying roller 200, a roller having a vertical rotation shaft 200a and a V-shaped groove 200b in the outer periphery is used. The transport rollers 200 are arranged in two rows facing each other at a predetermined interval in the left-right direction, and the left and right ends of the workpiece W in a horizontal posture are held by the V-shaped grooves 200b of the transport rollers 200. It is configured to convey by rotation

各搬送ローラ200の回転軸200aの上端には、それぞれギヤ201が設けられ、各ギヤ201は中間伝達ギヤ202を介して互いに噛み合うことにより、同一方向に回転するようになっており、変速モータ203に連動連結している。   Gears 201 are provided at the upper ends of the rotation shafts 200a of the conveying rollers 200, and the gears 201 are engaged with each other via the intermediate transmission gear 202 so as to rotate in the same direction. It is linked to.

該実施の形態によると、回路基板等の板状ワークWの表面両面共に、非接触状態で移載することができる。   According to the embodiment, both surfaces of the plate-like workpiece W such as a circuit board can be transferred in a non-contact state.

[第4の実施の形態]
図26〜図28は本発明の第4の実施の形態であり、液噴流式の移載機構72を備えており、図26は移載機構72の縦断面図、図27は移載機構72の平面図、図28は図26のXXVIII-XXVIII断面図であり、第1の実施の形態と同じ部品には、同じ符号を付している。
[Fourth Embodiment]
26 to 28 show a fourth embodiment of the present invention, which includes a liquid jet transfer mechanism 72. FIG. 26 is a longitudinal sectional view of the transfer mechanism 72, and FIG. FIG. 28 is a sectional view taken along the line XXVIII-XXVIII in FIG. 26, and the same components as those in the first embodiment are denoted by the same reference numerals.

図26において、移載機構72として、低位搬送機構35の後端部(搬送始端部)に、前後方向(搬送方向)に間隔をおいて複数の上向きノズル205を配置し、これらノズル205は、液管206を介して液圧ポンプ207に接続すると共に、低位搬送機構35の搬送ローラ105間に位置し、搬送ローラ105間から上向きに液噴流を噴出するように構成されている。ポンプ207は吐出液圧が制御可能となっており、吸込口は、図示しないが液タンク又は浸漬槽5内に接続している。   In FIG. 26, as the transfer mechanism 72, a plurality of upward nozzles 205 are arranged at intervals in the front-rear direction (conveyance direction) at the rear end portion (conveyance start end portion) of the low-order conveyance mechanism 35. While being connected to the hydraulic pump 207 via the liquid pipe 206, it is positioned between the transport rollers 105 of the low-level transport mechanism 35, and is configured to eject a liquid jet upward from between the transport rollers 105. The pump 207 can control the discharge hydraulic pressure, and the suction port is connected to the liquid tank or the immersion tank 5 (not shown).

図27及び図28において、各ノズル205は、低位搬送機構35の搬送ローラ105の略全幅に亘るように左右方向(搬送幅方向)に細長く形成されると共に、噴口205aも低位搬送機構35の略全幅に亘るようにスリット状に形成されており、これにより、低位搬送機構35の左右幅の略全幅に亘る範囲で液噴流を噴出することができるようになっている。   27 and 28, each nozzle 205 is formed to be elongated in the left-right direction (conveyance width direction) so as to extend over substantially the entire width of the conveyance roller 105 of the low-level conveyance mechanism 35, and the nozzle 205 a is also substantially the same as the low-level conveyance mechanism 35. It is formed in a slit shape so as to extend over the entire width, so that the liquid jet can be ejected in a range extending over substantially the entire width of the left and right width of the low-order transport mechanism 35.

(作動)
(1)図26において、高位搬送機構56上を板状のワークWが前方に搬送され、高位搬送機構56の前端部又はその近傍位置まで至ると、液圧ポンプ207を駆動することにより、各ノズル205の上端噴口205aから上向きに液噴流を噴出させる。
(Operation)
(1) In FIG. 26, when the plate-like workpiece W is conveyed forward on the high-level conveyance mechanism 56 and reaches the front end portion of the high-level conveyance mechanism 56 or a position in the vicinity thereof, each hydraulic pump 207 is driven to A liquid jet is ejected upward from the upper end nozzle hole 205 a of the nozzle 205.

(2)ワークWが高位搬送機構56の前端部からさらに前方に搬送されて、浸漬槽5の後端部の上方位置まで至ると、ノズル205からの液噴流により、ワークWは、高位搬送機構56の搬送面と略同一高さに支持される。 (2) When the workpiece W is transported further forward from the front end portion of the high level transport mechanism 56 and reaches a position above the rear end portion of the immersion tank 5, the work W is moved to the high level transport mechanism by the liquid jet from the nozzle 205. It is supported at substantially the same height as the 56 conveying surfaces.

(3)次にポンプ207の吐出圧制御により、ノズル205からの液噴流を停止し、あるいは噴流圧を低下させ、それにより、ワークWを自重により下降させ、浸漬槽5内に浸漬させると共に、常時定速で駆動している低位搬送機構35上に載せる。 (3) Next, by controlling the discharge pressure of the pump 207, the liquid jet from the nozzle 205 is stopped or the jet pressure is lowered, thereby lowering the work W by its own weight and immersing it in the immersion tank 5, It is placed on the low-level transport mechanism 35 that is always driven at a constant speed.

(4)その後、ワークWは、低位搬送機構35によって、浸漬槽35を搬送される。 (4) Thereafter, the workpiece W is transported through the immersion tank 35 by the low-order transport mechanism 35.

このように、上向きの液噴流でワークWを支持し、噴流圧を制御することにより、高位搬送機構56から低位搬送機構35へ移載するようにしていると、移載機構72の配置スペースがコンパクトになり、また、液噴流でワークWを支持するために、移載中にワークWの表面を傷付けるおそれもない。   As described above, when the workpiece W is supported by the upward liquid jet and the jet pressure is controlled so that the workpiece W is transferred from the high-level conveyance mechanism 56 to the low-level conveyance mechanism 35, the arrangement space of the transfer mechanism 72 is reduced. Since it becomes compact and supports the workpiece W with the liquid jet, there is no possibility of damaging the surface of the workpiece W during transfer.

[第5の実施の形態]
図29〜図31は本発明の第5の実施の形態であり、複数の移載用搬送ローラ対211を立設してなる移載機構72を備えており、図29は移載機構72の縦断面図、図30は図29のXXX-XXX断面拡大図、図31は移載用搬送ローラ対の支持箇所の変位を示す概念図(図29のXXX-XXX断面拡大相当図)であり、第1の実施の形態と同じ部品には、同じ符号を付している。
[Fifth Embodiment]
29 to 31 show a fifth embodiment of the present invention, which includes a transfer mechanism 72 in which a plurality of transfer conveyance roller pairs 211 are erected, and FIG. FIG. 30 is an enlarged sectional view taken along the line XXX-XXX of FIG. 29, FIG. 31 is a conceptual diagram showing the displacement of the supporting portion of the transfer roller pair for transfer (equivalent to enlarged sectional view taken along the line XXX-XXX in FIG. 29), The same parts as those in the first embodiment are denoted by the same reference numerals.

図29において、浸漬槽5の後端部には、高位搬送機構56と低位搬送機構35との間に、移載機構72として、前後方向に略等間隔をおいて複数の移載用搬送ローラ対211、212、213、214が配置されている。   In FIG. 29, a plurality of transfer transport rollers are provided at the rear end of the dipping bath 5 as a transfer mechanism 72 between the high-level transfer mechanism 56 and the low-level transfer mechanism 35 at substantially equal intervals in the front-rear direction. Pairs 211, 212, 213, 214 are arranged.

図30において、各移載用搬送ローラ対211、212、213、214は、それぞれ左右方向に所定間隔をおいて配置された1対の移載用搬送ローラ211a、211b、212a、212b、213a、213b、214a、214bから構成されている。各移載用搬送ローラ211a、211b、…214a、214bは、装置本体101の側壁に架設されたフレーム215と浸漬槽5の底壁とにより回転可能に支持されており、表面に弾性圧縮可能なゴム層を有すると共に、上端部にそれぞれ駆動モータ220が連結され、各駆動モータ220により、それぞれ矢印Ya、Yb方向に回転するようになっている。   In FIG. 30, each pair of transfer transport rollers 211, 212, 213, 214 includes a pair of transfer transport rollers 211a, 211b, 212a, 212b, 213a, which are arranged at predetermined intervals in the left-right direction. 213b, 214a, 214b. The transfer rollers 211a, 211b,... 214a, 214b for transfer are rotatably supported by a frame 215 provided on the side wall of the apparatus main body 101 and the bottom wall of the immersion tank 5, and can be elastically compressed on the surface. In addition to having a rubber layer, a driving motor 220 is connected to each of the upper end portions, and each driving motor 220 rotates in the directions of arrows Ya and Yb, respectively.

図31において、最後端に配置された移載用搬送ローラ211a、211bは略鉛直姿勢となっており、左右方向の間隔L1は、たとえばワークWの左右幅と略同じか、あるいは弱冠狭くなっており、表面のゴム層により、ワークWの左右両側端を挟持できるようになっている。したがって、高位搬送機構56から搬送されて来たワークWは、まず、最後端の移載用搬送ローラ211a、211bにより、高位搬送機構56の搬送面と略同じ高さH1のワーク挟持点P1で、両側端が挟持される。   In FIG. 31, the transfer rollers 211a and 211b arranged at the rearmost end are in a substantially vertical posture, and the left-right distance L1 is, for example, substantially the same as the left-right width of the workpiece W or a narrow crown. In addition, the left and right ends of the workpiece W can be clamped by the rubber layer on the surface. Therefore, the workpiece W conveyed from the high-level conveyance mechanism 56 is first moved at a workpiece clamping point P1 having a height H1 substantially the same as the conveyance surface of the high-level conveyance mechanism 56 by the transfer rollers 211a and 211b at the rearmost end. The both ends are clamped.

前記最後端の移載用搬送ローラ211a、211b以外の移載用搬送ローラ212a、212b、213a、213b、214a、214bは、前方に行くに従い、鉛直に対する上開きの角度θ2、θ3、θ4が順次大きくなるように、外向きに倒れるように傾斜している。したがって、各移載用搬送ローラ212a、212b、213a、213b、214a、214bによるワーク挟持点(間隔L1に対応する点)P2、P3、P4は、低位搬送機構35側(前側)に行くに従い順次下方に変位し(H1→H2→H3→H4)、最も低位搬送機構35側(前端側)の移載用搬送ローラ214a、214bのワーク挟持点P4は、低位搬送機構35の搬送面に対して、弱冠高い位置となっている。   The transfer rollers 212a, 212b, 213a, 213b, 214a, and 214b other than the transfer rollers 211a and 211b at the rearmost end have their upward opening angles θ2, θ3, and θ4 sequentially as they go forward. Inclined to fall outward so as to increase. Accordingly, the workpiece clamping points (points corresponding to the interval L1) P2, P3, and P4 by the transfer rollers 212a, 212b, 213a, 213b, 214a, and 214b are sequentially moved toward the low-level conveyance mechanism 35 side (front side). Displaced downward (H1 → H2 → H3 → H4), the workpiece holding point P4 of the transfer rollers 214a and 214b on the side of the lowest level conveyance mechanism 35 (front end side) is relative to the conveyance surface of the low level conveyance mechanism 35. , Has become a weak position high.

(作動)
(1)図31において、移載用搬送ローラ211a、211b、…214a、214bは、矢印Ya、Yb方向に常時回転しており、高位搬送機構56によって前方に搬送されてくる板状のワークWは、まず最後端の移載用搬送ローラ211a、211bにより、高さH1において挟持点P1により挟持され、さらに前方に搬送される。
(Operation)
(1) In FIG. 31, transfer conveyance rollers 211 a, 211 b,... 214 a, 214 b are always rotating in the directions of arrows Ya and Yb, and are plate-shaped workpieces W conveyed forward by the high-level conveyance mechanism 56. First, the transfer rollers 211a and 211b at the rearmost end are nipped by the nipping point P1 at the height H1 and further conveyed forward.

(2)最後端の移載用搬送ローラ211a、211bから前方の次位の移載用搬送ローラ212a、212bに至までの間、板状ワークWは自重により前端部が下降し、次位の移載用搬送ローラ212a、212bの挟持点P2により、高さH2で挟持される。 (2) The front end of the plate-like work W is lowered by its own weight from the rearmost transfer rollers 211a and 211b to the next transfer rollers 212a and 212b in the front, It is clamped at a height H2 by the clamping point P2 of the transfer rollers 212a and 212b.

(3)上記同様に、移載用搬送ローラ212a、212bから次の移載用搬送ローラ213a、213bへ、続いて最前端の移載用搬送ローラ214a、214bへと、挟持高さをH2→H3→H4へと順次下降させながら受け渡され、その間にめっき液中に浸漬されてゆく。 (3) In the same manner as described above, the holding height is changed from H2 → from the transfer rollers 212a and 212b to the next transfer rollers 213a and 213b and then to the transfer rollers 214a and 214b at the foremost end. The material is delivered while being sequentially lowered from H3 to H4, and is immersed in the plating solution during that time.

(4)そして、最前端の移載用搬送ローラ214a、214bから低位搬送機構35へと受け渡され、定速で搬送される。 (4) Then, it is transferred from the transfer rollers 214a and 214b at the foremost end to the low-order transport mechanism 35 and transported at a constant speed.

該実施の形態によると、移載用搬送ローラ211a、211b等は、昇降等により移動しないので、移載機構72の配置スペースがコンパクトになる。また、ワークWの表裏面を支持しないので、ワークWの表裏面を傷付けるおそれもない。   According to this embodiment, the transfer rollers 211a, 211b and the like for transfer do not move due to elevating or the like, so the arrangement space of the transfer mechanism 72 becomes compact. Further, since the front and back surfaces of the workpiece W are not supported, there is no possibility of damaging the front and back surfaces of the workpiece W.

[第6の実施の形態]
図32〜図34は本発明の第6の実施の形態であり、高さの異なる複数の移載面223、224を階段状に配置してなる移載機構72を備えており、図32は移載機構72の縦断面図、図33は移載用搬送ローラの駆動機構を示す縦断面図、図34は平面図であり、第1の実施の形態と同じ部品には、同じ符号を付している。
[Sixth Embodiment]
FIGS. 32 to 34 show a sixth embodiment of the present invention, which includes a transfer mechanism 72 in which a plurality of transfer surfaces 223 and 224 having different heights are arranged stepwise, and FIG. 33 is a longitudinal sectional view showing the transfer mechanism 72, FIG. 33 is a longitudinal sectional view showing the drive mechanism of the transfer transport roller, and FIG. 34 is a plan view. The same components as those in the first embodiment are denoted by the same reference numerals. is doing.

図32において、移載機構72は、多数の移載用搬送ローラ220、221により構成されると共に、後半部(高位搬送機構56側の部分)の第1の移載面223と、第1の移載面223よりも低く配置された前半部(低位搬送機構35側の部分)の第2の移載面224とを、階段状に備えている。   In FIG. 32, the transfer mechanism 72 includes a plurality of transfer transport rollers 220 and 221, and includes a first transfer surface 223 in the rear half (the portion on the high-order transport mechanism 56 side), and a first transfer surface 223. A second transfer surface 224 in a front half portion (a portion on the low-order transport mechanism 35 side) disposed lower than the transfer surface 223 is provided in a step shape.

図34において、第1の移載面223の後半部に配置された複数の移載用搬送ローラ220は、複数の短いローラ部分に分割されており、前後に隣り合う移載用搬送ローラ220の各ローラ部分は千鳥状に配列され、しかも、前後方向にオーバーラップするように配列されている。一方、第1の移載面223の前半部に配置された複数の移載用搬送ローラ221は、左右方向の略幅に亘る長い構造となっており、しかも、前後に一定のすき間を置いて配置されている。   In FIG. 34, the plurality of transfer conveyance rollers 220 arranged in the second half of the first transfer surface 223 are divided into a plurality of short roller portions, and the transfer transfer rollers 220 adjacent to each other in the front and rear directions are separated. The roller portions are arranged in a staggered manner, and are arranged so as to overlap in the front-rear direction. On the other hand, the plurality of transfer conveyance rollers 221 arranged in the first half of the first transfer surface 223 has a long structure extending substantially in the left-right direction, and has a certain gap in the front-rear direction. Has been placed.

第2の移載面224も、第1の移載面223と同様な構造となっており、後半部の分割式の移載用搬送ローラ220と、前半部の細長い移載用搬送ローラ221とから構成されている。   The second transfer surface 224 has the same structure as that of the first transfer surface 223, and the rear half of the divided transfer transfer roller 220 and the first half of the long transfer transfer roller 221. It is composed of

第1の移載面223の前半部の移載用搬送ローラ221の軸端部には、いずれにも伝動ギヤ225が固着され、後半部の移載用搬送ローラ220の軸端部には、一つ置きに伝動ギヤ225が固着されている。   The transmission gear 225 is fixed to the shaft end portion of the transfer conveyance roller 221 in the first half of the first transfer surface 223, and the shaft end portion of the transfer transfer roller 220 in the second half portion is Every other transmission gear 225 is fixed.

図33において、第1の記載面223の各伝動ギヤ225は、それぞれウォーム226を介して共通の第1の駆動軸230に連動連結されており、該第1の駆動軸230は、前後一対の軸受235、236により支持されている。   In FIG. 33, each transmission gear 225 on the first description surface 223 is linked to a common first drive shaft 230 via a worm 226, and the first drive shaft 230 is a pair of front and rear. It is supported by bearings 235 and 236.

また、第2移載面224についても第1の移載面223と同様に、図34のように、前半部の移載用搬送ローラ221の軸端部には伝動ギヤ225が固着され、後半部の分割式の移載用搬送ローラ220の軸端部には、一つ置きに伝動ギヤ225が固着され、各伝動ギヤ225は、図33に示すように、それぞれウォーム226を介して共通の第2の駆動軸231に連動連結されており、第2の駆動軸231は、前後一対の軸受23、237により支持されている。
している。
Similarly to the first transfer surface 223, the second transfer surface 224 has a transmission gear 225 fixed to the shaft end of the transfer roller 221 in the first half as shown in FIG. Transmission gears 225 are fixed to every other shaft end portion of the divided transfer transfer roller 220, and each transmission gear 225 is shared by a worm 226 as shown in FIG. The second drive shaft 231 is linked to the second drive shaft 231, and the second drive shaft 231 is supported by a pair of front and rear bearings 23 and 237.
is doing.

前記第1の駆動軸230と第2の駆動軸231は、チェーン伝動機構232を介して連動連結し、第2の駆動軸231の前端部は、チェーン伝動機構233を介して低位搬送機構35の駆動軸238に連動連結している。すなわち、移載機構72の各移載用搬送ローラ220、221は、低位搬送機構35と共に駆動されるようになっている。   The first drive shaft 230 and the second drive shaft 231 are interlocked and connected via a chain transmission mechanism 232, and the front end portion of the second drive shaft 231 is connected to the low-level transport mechanism 35 via a chain transmission mechanism 233. The drive shaft 238 is interlocked and connected. That is, the transfer transport rollers 220 and 221 of the transfer mechanism 72 are driven together with the low-order transport mechanism 35.

また、移載機構72と高位搬送機構56との間には、高位搬送機構56の搬送面と略同一高さの搬送面を有するフリーローラ208が配置されている。   Further, a free roller 208 having a conveyance surface that is substantially the same height as the conveyance surface of the high-level conveyance mechanism 56 is disposed between the transfer mechanism 72 and the high-level conveyance mechanism 56.

(作動)
図32において、高位搬送機構56上を前方に搬送されてくる板状のワークWは、フリーローラ208を介して、まず、移載機構72の第1の移載面223に受け渡され、次に下位の第2の移載面224に受け渡され、該第2の移載面224から低位搬送機構35に受け渡され、定速で搬送される。
(Operation)
In FIG. 32, the plate-like workpiece W conveyed forward on the high-level conveyance mechanism 56 is first transferred to the first transfer surface 223 of the transfer mechanism 72 via the free roller 208, and next. Are transferred to the lower second transfer surface 224, transferred from the second transfer surface 224 to the lower transfer mechanism 35, and transferred at a constant speed.

図32において、高位搬送機構56から第1の移載面223への受け渡し時、第1の移載面223の後半部は、図34のように、前後方向にローラ同士がオーバーラップするように各移載用搬送ローラ220が配置されているので、ワークWを確実に第1の移載面223上で受け取ることができ、移載用搬送ローラ220間にワークWが挟まるようなことはない。第1の移載面223から第2の移載面224への移載時も同様である。   32, at the time of delivery from the high-level transport mechanism 56 to the first transfer surface 223, the second half of the first transfer surface 223 is arranged such that the rollers overlap in the front-rear direction as shown in FIG. Since each transfer conveyance roller 220 is arranged, the workpiece W can be reliably received on the first transfer surface 223, and the workpiece W is not sandwiched between the transfer conveyance rollers 220. . The same applies to the transfer from the first transfer surface 223 to the second transfer surface 224.

なお、図32の実施の形態は、移載面を2段に構成しているが、3段以上の階段状に構成することも可能である。   In the embodiment of FIG. 32, the transfer surface is configured in two steps, but it may be configured in three or more steps.

[第7の実施の形態]
図35〜図40は本発明の第7の実施の形態であり、上下に揺動可能な移載機構72を備えており、図35は移載機構72の縦断面図、図36は移載機構の駆動部を示す縦断面図、図37は図36のXXXVII-XXXVII断面図、図38は平面図、図39はローラ支持部分の拡大図、図40は図39のXXXX矢視図である。第1の実施の形態と同じ部品には、同じ符号を付している。
[Seventh Embodiment]
35 to 40 show a seventh embodiment of the present invention, which includes a transfer mechanism 72 that can swing up and down, FIG. 35 is a longitudinal sectional view of the transfer mechanism 72, and FIG. FIG. 37 is a sectional view of XXXVII-XXXVII in FIG. 36, FIG. 38 is a plan view, FIG. 39 is an enlarged view of a roller support portion, and FIG. 40 is a view in the direction of arrow XXXX in FIG. . The same parts as those in the first embodiment are denoted by the same reference numerals.

図35において、移載機構72として、高位搬送機構56と低位搬送機構35との間に、前後方向に所定間隔置いて複数の移載用搬送ローラ250が配置されており、この移載機構250は、後端部を回動(揺動)支点として上下揺動することにより、前端部が昇降するようになっている。   In FIG. 35, as the transfer mechanism 72, a plurality of transfer transfer rollers 250 are arranged at a predetermined interval in the front-rear direction between the high-level transfer mechanism 56 and the low-level transfer mechanism 35. The front end is moved up and down by swinging up and down using the rear end as a pivot (swing) fulcrum.

図38において、各移載用搬送ローラ250は、左右一対のローラ支持板256により水平軸芯回り回転可能に支持されており、両支持板256は前後の補強板272により連結されている。各移載用搬送ローラ250の軸端部にはそれぞれ伝動ギヤ258が固着されており、各ギヤ258はアイドルギヤ270を介して相互に噛み合い、同時に回転するようになっている。   In FIG. 38, each transfer conveyance roller 250 is supported by a pair of left and right roller support plates 256 so as to be rotatable around a horizontal axis, and both support plates 256 are connected by front and rear reinforcing plates 272. A transmission gear 258 is fixed to the shaft end portion of each transfer conveyance roller 250, and the gears 258 mesh with each other via an idle gear 270 and rotate at the same time.

図37において、最後端部の移載用搬送ローラ250の軸端部には、チェーンスプロケット258が固着され、該チェーンスプロケット258は、チェーン259を介して上方の駆動モータ256のチェーンスプロケット260に連動連結している。   In FIG. 37, a chain sprocket 258 is fixed to the shaft end of the transfer conveying roller 250 at the rearmost end, and the chain sprocket 258 is linked to the chain sprocket 260 of the upper drive motor 256 via a chain 259. It is connected.

装置本体101の側壁間にはフレーム252が架設され、該フレーム252には、下方に延びる一対の支持腕253が固着されると共に、移載機構揺動用のシリンダ254が設けられ、また、前記駆動モータ256が取り付けられている。前記シリンダ254から下方に延びる伸縮ロッド254aの下端部には、下向きコの字状の連結アーム257が固着されており、該連結アーム257の左右両下端部には、下向きコの字形のブラケット255が固着され、該ブラケット255により、両ローラ支持板251の前端部を支持している。   A frame 252 is installed between the side walls of the apparatus main body 101. A pair of support arms 253 extending downward are fixed to the frame 252 and a transfer mechanism swinging cylinder 254 is provided. A motor 256 is attached. A downward U-shaped connecting arm 257 is fixed to a lower end portion of the telescopic rod 254 a extending downward from the cylinder 254, and a downward U-shaped bracket 255 is attached to the lower left and right ends of the connecting arm 257. Are fixed, and the bracket 255 supports the front end portions of both roller support plates 251.

図36において、ローラ支持板251の後端部は、前記支持腕253の下端部に水平なヒンジピン270を介して回動自在に支持されており、ローラ支持板251の前端部は、前述のように、連結アーム257の両ブラケット255により支持されており、伸縮ロッド254aの伸縮により、移載機構72を、後端のヒンジピン270回りに上下に揺動するようになっている。   In FIG. 36, the rear end portion of the roller support plate 251 is rotatably supported by the lower end portion of the support arm 253 via a horizontal hinge pin 270, and the front end portion of the roller support plate 251 is as described above. Further, the transfer arm 72 is supported by both brackets 255 of the connecting arm 257, and the transfer mechanism 72 swings up and down around the hinge pin 270 at the rear end by extension and contraction of the extension rod 254a.

図39において、前記ブラケット255には連結ピン274が固着されており、この連結ピン274は、ローラ支持板251に設けられた長孔273に係合している。   In FIG. 39, a connecting pin 274 is fixed to the bracket 255, and this connecting pin 274 engages with a long hole 273 provided in the roller support plate 251.

図40において、前記長孔273は前後方向に長く形成されており、これにより、ローラ支持板251の揺動時に、ブラケット255に対するローラ支持板251の前後方向の相対的な移動を可能としている。   In FIG. 40, the long hole 273 is formed to be long in the front-rear direction, so that the roller support plate 251 can move relative to the bracket 255 in the front-rear direction when the roller support plate 251 swings.

(作動)
(1)図35において、移載機構72は、高位搬送機構56と略同じ高さで水平姿勢に維持されると共に、各移載用搬送ローラ250が高位搬送機構56の搬送ローラと同じ搬送速度で回転しており、この状態で、高位搬送機構56からの板状ワークWを受け取る。
(Operation)
(1) In FIG. 35, the transfer mechanism 72 is maintained in a horizontal posture at substantially the same height as the high-order transport mechanism 56, and each transfer transport roller 250 has the same transport speed as the transport rollers of the high-order transport mechanism 56. In this state, the plate-like workpiece W from the high-level transport mechanism 56 is received.

(2)移載機構72上にワークWが載せられた時点で、移載機構72の移載用搬送ローラ250の回転は停止し、続いて、図36に仮想線で示すようにシリンダ254の伸縮ロッド254aが伸長することにより、移載機構72は後端ヒンジピン270回りに下方へ揺動し、前端部を下降させる。 (2) When the workpiece W is placed on the transfer mechanism 72, the rotation of the transfer transport roller 250 of the transfer mechanism 72 stops, and then, as shown by the phantom line in FIG. As the telescopic rod 254a extends, the transfer mechanism 72 swings downward around the rear end hinge pin 270 and lowers the front end.

(3)図36の仮想線で示す下降位置にて、シリンダ254の作動を停止し、次に、移載機構72の移載用搬送ローラ250を、低位搬送機構35の搬送速度と同じ速度で回転し、移載機構72から低位搬送機構35へワークWを移載し、定速で浸漬槽5内を搬送する。 (3) At the lowered position indicated by the phantom line in FIG. 36, the operation of the cylinder 254 is stopped, and then the transfer transport roller 250 of the transfer mechanism 72 is moved at the same speed as the transport speed of the low-order transport mechanism 35. It rotates and transfers the workpiece | work W from the transfer mechanism 72 to the low level conveyance mechanism 35, and conveys the inside of the immersion tank 5 at a constant speed.

該実施の形態によると、移載機構72は、後端部を回動支点として上下に揺動するだけであるので、移載機構配置用のスペースを節約することができる。   According to the embodiment, since the transfer mechanism 72 only swings up and down with the rear end portion as a rotation fulcrum, it is possible to save the space for placing the transfer mechanism.

[その他の実施の形態]
(1)請求項1に記載した「略水平移動」とは、前記第1〜第23実施の形態で示したような水平移動だけには限定されないことを意味しており、弱冠傾斜した移動も含むものである。また、図9に示す移載機構72を、前下がりに傾斜した姿勢でワークWを受け取るような構造とすることもできる。
[Other embodiments]
(1) The “substantially horizontal movement” described in claim 1 means that the movement is not limited to the horizontal movement as shown in the first to twenty-third embodiments. Is included. Further, the transfer mechanism 72 shown in FIG. 9 may be configured to receive the workpiece W in a posture inclined forward and downward.

(2)請求項1に記載した「下降又は上昇」は鉛直方向の移動には限定されない。たとえば、図9に示す移載機構72を、前後左右にスライドしながら昇降する構造とすることもできる。 (2) “Descent or rise” described in claim 1 is not limited to vertical movement. For example, the transfer mechanism 72 shown in FIG. 9 can be structured to move up and down while sliding back and forth and left and right.

(3)請求項1並びに請求項4〜請求項7に記載した「高位搬送機構」は、前記各実施の形態のように一様な高さの搬送でなくともよく、たとえば図23のように、高位搬送機構56の途中にスロープ部56aを介在させることにより、搬送高さを変化させる構造とすることもできる。また、高位搬送機構は、必ずしも駆動機構を備えている必要はなく、たとえば、図24のように、フリーローラ56bのみで高位搬送機構を構成することも可能である。 (3) The “high-level transport mechanism” described in claims 1 and 4 to 7 does not have to be transported at a uniform height as in the above-described embodiments. For example, as shown in FIG. In addition, by interposing the slope portion 56 a in the middle of the high-level transport mechanism 56, the transport height can be changed. Further, the high-level transport mechanism does not necessarily include a drive mechanism. For example, as shown in FIG. 24, the high-level transport mechanism can be configured by only the free roller 56b.

(4)前記第1、第2、第3、第5、第6及び第7の実施の形態において、移載機構はローラによりワークWの受取り及び受渡しを行うように構成されているが、ローラを備えた移載機構には限定されない。たとえば、ローラのような回動可能な要素で構成する場合には、タイミングベルトとすることも可能である。回動しない要素による構成としては、たとえば図18及び図19のようにローラ支持片165によりローラを支持する代わりに、図25のように、左右の一対のL字形吊持部材165aにより、ワークWの左右端部を下から抱えて保持する構造とすることも可能である。 (4) In the first, second, third, fifth, sixth and seventh embodiments, the transfer mechanism is configured to receive and deliver the workpiece W by the roller. It is not limited to the transfer mechanism provided with. For example, in the case of a rotatable element such as a roller, a timing belt can be used. For example, instead of supporting the roller by the roller support piece 165 as shown in FIGS. 18 and 19, the work W can be configured by a pair of left and right L-shaped suspension members 165 a as shown in FIG. 25. It is also possible to have a structure in which the left and right ends of the are held from below.

本発明にかかる搬送装置を備えためっき装置の全体側面図である。It is a whole side view of the plating apparatus provided with the conveying apparatus concerning this invention. 図1のII-II断面拡大図である。It is the II-II cross-sectional enlarged view of FIG. 図1のIII-III断面拡大図である。It is the III-III cross-sectional enlarged view of FIG. 図1のIV-IV断面拡大図である。It is the IV-IV cross-sectional enlarged view of FIG. 図3のV-V断面拡大図である。FIG. 5 is an enlarged VV cross-sectional view of FIG. 3. 図3のVI-VI断面拡大図である。FIG. 4 is an enlarged sectional view taken along line VI-VI in FIG. 3. 図6の軸受部材の斜視図である。It is a perspective view of the bearing member of FIG. 図1の矢印VIII部分の移載機構の平面拡大図である。It is a plane enlarged view of the transfer mechanism of the arrow VIII part of FIG. 図8の移載機構によるワーク移載作業を段階的に示す作業行程図である。FIG. 9 is a work process diagram showing the work transfer operation by the transfer mechanism of FIG. 8 in stages. 図8の移載機構の昇降作動を示す正面略図である。FIG. 9 is a schematic front view showing a lifting operation of the transfer mechanism of FIG. 8. 図8の移載機構のフレーム及びシリンダ等の側面図である。FIG. 9 is a side view of a frame and a cylinder of the transfer mechanism of FIG. 8. 図11のXII矢視図である。It is a XII arrow line view of FIG. 図12の左側のシリンダの連結部材の拡大図である。It is an enlarged view of the connection member of the cylinder of the left side of FIG. 図12の右側のシリンダの連結部材の拡大図である。It is an enlarged view of the connection member of the cylinder of the right side of FIG. 移載機構の搬送ローラの正面図である。It is a front view of the conveyance roller of a transfer mechanism. 移載機構の駆動伝達部の側面図である。It is a side view of the drive transmission part of a transfer mechanism. 第2の実施の形態の移載機構を示す平面図である。It is a top view which shows the transfer mechanism of 2nd Embodiment. 図17の移載機構の側面図である。It is a side view of the transfer mechanism of FIG. 図18のXIX矢視図である。It is a XIX arrow line view of FIG. 昇降作動を示す図18と同じ移載機構の側面図である。It is a side view of the same transfer mechanism as FIG. 18 which shows raising / lowering operation | movement. 第3の実施の形態の移載機構示す平面図である。It is a top view which shows the transfer mechanism of 3rd Embodiment. 図21のXXII-XXII矢視図である。It is the XXII-XXII arrow line view of FIG. その他の実施の形態を示す側面図である。It is a side view which shows other embodiment. その他の実施の形態を示す側面図である。It is a side view which shows other embodiment. 移載機構の変形例を示す正面図。The front view which shows the modification of a transfer mechanism. 第4の実施の形態の移載機構を示す縦断面図である。It is a longitudinal cross-sectional view which shows the transfer mechanism of 4th Embodiment. 図26の移載機構の平面図である。It is a top view of the transfer mechanism of FIG. 図26のXXVIII-XXVIII断面図である。It is XXVIII-XXVIII sectional drawing of FIG. 第5の実施の形態の移載機構を示す縦断面図である。It is a longitudinal cross-sectional view which shows the transfer mechanism of 5th Embodiment. 図29の移載機構のXXX-XXX断面図である。FIG. 30 is a sectional view taken along the line XXX-XXX of the transfer mechanism in FIG. 29. 図29の移載機構の移載用搬送ローラ対の支持箇所の変位を示す概念図である。It is a conceptual diagram which shows the displacement of the support location of the conveyance roller pair for transfer of the transfer mechanism of FIG. 第6の実施の形態の移載機構示す縦断面図である。It is a longitudinal cross-sectional view which shows the transfer mechanism of 6th Embodiment. 図32の移載用搬送ローラの駆動機構を示す縦断面図である。It is a longitudinal cross-sectional view which shows the drive mechanism of the transfer conveyance roller of FIG. 図32の移載機構の平面図である。It is a top view of the transfer mechanism of FIG. 第7の実施の形態の移載機構示す縦断面図である。It is a longitudinal cross-sectional view which shows the transfer mechanism of 7th Embodiment. 図35の移載機構の駆動部を示す縦断面図である。FIG. 36 is a longitudinal sectional view showing a drive unit of the transfer mechanism of FIG. 35. 図36のXXXVII-XXXVII断面図である。It is XXXVII-XXXVII sectional drawing of FIG. 図35の移載機構の平面図である。It is a top view of the transfer mechanism of FIG. 図35のローラ支持部分の拡大図である。It is an enlarged view of the roller support part of FIG. 図39のXXXX矢視図である。FIG. 40 is a view on arrow XXXX in FIG. 39. 従来例1の縦断側面図である。It is a vertical side view of the prior art example 1. 従来例2の縦断側面図である。It is a vertical side view of the prior art example 2.

符号の説明Explanation of symbols

4、5、6、7 浸漬槽
34、35、36、37 低位搬送機構
51、52、53、…、62、63、64 高位搬送機構
70、71、72、73、74、75、76、77 移載機構
105 高位及び低位搬送機構の搬送ローラ
140 移載機構の搬送ローラ
143、144 移載機構昇降用のシリンダ
200 移載機構の搬送ローラ
205 ノズル
W ワーク
4, 5, 6, 7 Immersion tank 34, 35, 36, 37 Low level transport mechanism 51, 52, 53, ..., 62, 63, 64 High level transport mechanism 70, 71, 72, 73, 74, 75, 76, 77 Transfer mechanism 105 Transfer rollers for high and low transfer mechanisms 140 Transfer rollers for transfer mechanism 143, 144 Transfer mechanism lifting cylinder 200 Transfer mechanism transfer roller 205 Nozzle W Workpiece

Claims (7)

処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、
前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送する低位搬送機構と、
前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、
前記低位搬送機構又は高位搬送機構の一方の搬送機構から、ワークを略水平移動により受け取り、下降又は上昇し、ワークを略水平移動により他方の搬送機構に移載する昇降自在な移載機構と、を備え、
前記移載機構は、ワークを上面に載置して搬送する複数の水平な移載用搬送ローラと、該移載用搬送ローラを支持するフレームと、該フレームを昇降自在に支持する左右一対のシリンダと、を有しており、前記左右のシリンダは、ワーク下降時又はワーク上昇時に前記移載用搬送ローラが左右に傾斜するように、収縮開始タイミング又は伸張開始タイミングが左右で異なるように構成していることを特徴とする、浸漬槽のワーク搬送装置。
In the workpiece transfer device of the immersion tank that stores the treatment liquid and immerses the workpiece,
A low-level transport mechanism that is disposed in the immersion bath and transports the workpiece in a processing liquid;
A high-level transport mechanism that is disposed outside the immersion tank at a position higher than the low-level transport mechanism, extends to a position near the immersion tank or a position above the immersion tank, and transports a workpiece,
A transfer mechanism that can be moved up and down to receive a workpiece from one of the low-level conveyance mechanism and the high-level conveyance mechanism by a substantially horizontal movement, and descend or rise, and transfer the workpiece to the other conveyance mechanism by a substantially horizontal movement; With
The transfer mechanism includes a plurality of horizontal transfer transfer rollers for mounting and transferring a work on an upper surface, a frame for supporting the transfer transfer roller, and a pair of left and right supporting the frame so as to be movable up and down. The left and right cylinders are configured such that the contraction start timing or the extension start timing differs between the left and right so that the transfer transport roller is tilted left and right when the workpiece is lowered or raised. and wherein the are, the work conveying apparatus of the immersion bath.
処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、
前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送するローラ式の低位搬送機構と、
前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、
前記高位搬送機構から前記低位搬送機構へワークを移載する移載機構と、を備え、
前記移載機構は、前記低位搬送機構の各搬送ローラ間に位置して上向きの液噴流を噴流圧制御自在に発生させる複数のノズルを備え、前記各ノズルは前記低位搬送機構の前記搬送ローラの略全幅に亘るように搬送幅方向に細長く形成され、前記液噴流により高位搬送機構からのワークを受け取り、液噴流の噴流圧を低下させることによりワークを低位搬送機構に載せるように構成していることを特徴とする、浸漬槽のワーク搬送装置。
In the workpiece transfer device of the immersion tank that stores the treatment liquid and immerses the workpiece,
A roller-type low-level transport mechanism that is disposed in the immersion tank and transports the workpiece in a processing liquid;
A high-level transport mechanism that is disposed outside the immersion tank at a position higher than the low-level transport mechanism, extends to a position near the immersion tank or a position above the immersion tank, and transports a workpiece,
A transfer mechanism for transferring a workpiece from the high-level transfer mechanism to the low-level transfer mechanism,
The transfer mechanism includes a plurality of nozzles that are positioned between the conveyance rollers of the low-level conveyance mechanism and generate an upward liquid jet in a freely controllable manner, and each of the nozzles corresponds to the conveyance roller of the low-level conveyance mechanism. It is formed to be elongated in the conveyance width direction so as to extend over substantially the entire width, and is configured to receive the workpiece from the high-level conveyance mechanism by the liquid jet and to place the workpiece on the low-level conveyance mechanism by reducing the jet pressure of the liquid jet. A workpiece transfer device for an immersion bath, characterized in that.
処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、
前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送する低位搬送機構と、
前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、
前記高位搬送機構から前記低位搬送機構へワークを移載する移載機構と、を備え、
前記移載機構は、搬送幅方向に所定間隔をおいて配置された一対の移載用搬送ローラからなる移載用搬送ローラ対を、搬送方向に所定間隔をおいて複数対配置し、
前記複数の移載用搬送ローラ対のうち、最も高位搬送機構側の移載用搬送ローラ対の移載用搬送ローラは略鉛直姿勢に配置し、低位搬送機構側の移載用搬送ローラ対に行くに従い、移載用搬送ローラ間でなす上開きの角度が順次大きくなるように、各移載用搬送ローラを傾斜させていることを特徴とする、浸漬槽のワーク搬送装置。
In the workpiece transfer device of the immersion tank that stores the treatment liquid and immerses the workpiece,
A low-level transport mechanism that is disposed in the immersion bath and transports the workpiece in a processing liquid;
A high-level transport mechanism that is disposed outside the immersion tank at a position higher than the low-level transport mechanism, extends to a position near the immersion tank or a position above the immersion tank, and transports a workpiece,
A transfer mechanism for transferring a workpiece from the high-level transfer mechanism to the low-level transfer mechanism,
The transfer mechanism is configured to arrange a plurality of transfer conveyance roller pairs each including a pair of transfer conveyance rollers arranged at a predetermined interval in the conveyance width direction at predetermined intervals in the conveyance direction,
Among the plurality of transfer transport roller pairs, the transfer transport roller pair of the transfer transport roller pair on the highest transport mechanism side is arranged in a substantially vertical posture, and the transfer transport roller pair on the low transport mechanism side is A workpiece transfer device for a dipping bath, wherein each transfer roller is inclined so that the upward opening angle between the transfer roller is sequentially increased as the transfer proceeds.
処理液を貯留してワークを浸漬処理する浸漬槽のワーク搬送装置において、
前記浸漬槽内に配置されると共に前記ワークを処理液内で搬送する低位搬送機構と、
前記浸漬槽の外側で前記低位搬送機構よりも高い位置に配置されると共に、前記浸漬槽の近傍位置又は浸漬槽の上方位置まで延び、ワークを搬送する高位搬送機構と、
前記高位搬送機構から前記低位搬送機構へワークを移載する移載機構と、を備え、
前記移載機構は、複数の移載用搬送ローラにより構成されると共に、高位搬送機構の搬送面と低位搬送機構の搬送面との間で、高さの異なる複数の移載面を有しており、
前記複数の移載面は、高位搬送機構側から低位搬送機構側に行くに従い、階段状に順次低位置になるように配置されており、前記各移載面は、高位搬送機構側に配置された複数の移載用搬送ローラが複数の短いローラ部分に分割されると共に、搬送方向に隣り合う前記移載用搬送ローラの各ローラ部分が千鳥状に配列され、かつ、搬送方向にオーバーラップするように配列されていることを特徴とする、浸漬槽のワーク搬送装置。
In the workpiece transfer device of the immersion tank that stores the treatment liquid and immerses the workpiece,
A low-level transport mechanism that is disposed in the immersion bath and transports the workpiece in a processing liquid;
A high-level transport mechanism that is disposed outside the immersion tank at a position higher than the low-level transport mechanism, extends to a position near the immersion tank or a position above the immersion tank, and transports a workpiece,
A transfer mechanism for transferring a workpiece from the high-level transfer mechanism to the low-level transfer mechanism,
The transfer mechanism includes a plurality of transfer transfer rollers, and has a plurality of transfer surfaces having different heights between the transfer surface of the high-level transfer mechanism and the transfer surface of the low-level transfer mechanism. And
The plurality of transfer surfaces are arranged so as to be sequentially lowered to a lower position as they go from the high-level conveyance mechanism side to the low-level conveyance mechanism side, and each of the transfer surfaces is arranged on the high-level conveyance mechanism side. In addition, the plurality of transfer transport rollers are divided into a plurality of short roller portions, and the roller portions of the transfer transport rollers adjacent in the transport direction are arranged in a staggered manner and overlap in the transport direction. It is arranged like this, The workpiece conveyance apparatus of an immersion tank characterized by the above-mentioned .
請求項1乃至4のいずれか一つに記載の浸漬槽のワーク搬送装置において、前記高位搬送機構の搬送速度が変更可能となっていることを特徴とする浸漬槽のワーク搬送装置。 5. The work transfer device for an immersion tank according to claim 1, wherein the transfer speed of the high-order transfer mechanism can be changed . 請求項1、3、4及び5のいずれか一つに記載の浸漬槽のワーク搬送装置において、前記移載機構の搬送速度が変更可能となっていることを特徴とする浸漬槽のワーク搬送装置。 The work conveyance device for an immersion tank according to any one of claims 1, 3, 4, and 5, wherein the transfer speed of the transfer mechanism is changeable. . 請求項1、3、4及び5のいずれか一つに記載の浸漬槽のワーク搬送装置において、前記低位搬送機構、高位搬送機構及び移載機構は、複数の搬送ローラからなると共に搬送面上にワークを載置して搬送するように構成されていることを特徴とする、浸漬槽のワーク搬送装置。 6. The work conveying apparatus for an immersion tank according to claim 1, wherein the low-level conveyance mechanism, the high-level conveyance mechanism, and the transfer mechanism are formed of a plurality of conveyance rollers and on a conveyance surface. A work conveying device for an immersion tank, characterized in that the work is placed and conveyed.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104797513A (en) * 2012-12-18 2015-07-22 日本电气硝子株式会社 Workpiece conveyance device, and workpiece conveyance method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113636442B (en) * 2021-08-03 2022-05-24 山东松竹铝业股份有限公司 Horizontal suspension aluminum profile mounting and conveying system
CN114411160A (en) * 2022-01-05 2022-04-29 国工恒昌新材料沧州有限公司 Automatic high-temperature alloy welding wire production equipment

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5699117A (en) * 1979-12-29 1981-08-10 Nippon Cement Co Ltd Extractor
JPS6225496A (en) * 1985-07-26 1987-02-03 株式会社 アズマ Method and apparatus for continuous chemical plating of printed wiring board conduction hole
JPH06102542B2 (en) * 1990-06-11 1994-12-14 矢橋工業株式会社 Method for producing spherical particle calcium carbonate
JPH0569940A (en) * 1991-09-06 1993-03-23 Masashi Kobayashi Article accumulation device
JPH08282831A (en) * 1995-04-18 1996-10-29 Kobe Steel Ltd Slab conveying device
JP3625611B2 (en) * 1997-05-07 2005-03-02 東芝キヤリア株式会社 Packing equipment
JP4517595B2 (en) * 2003-06-26 2010-08-04 東京エレクトロン株式会社 Method for transporting workpieces

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104797513A (en) * 2012-12-18 2015-07-22 日本电气硝子株式会社 Workpiece conveyance device, and workpiece conveyance method
CN104797513B (en) * 2012-12-18 2016-10-05 日本电气硝子株式会社 Work transfer device and work carrying method

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