JP4879454B2 - 光学応答の均一性が改良された撮像センサ - Google Patents
光学応答の均一性が改良された撮像センサ Download PDFInfo
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- JP4879454B2 JP4879454B2 JP2003379855A JP2003379855A JP4879454B2 JP 4879454 B2 JP4879454 B2 JP 4879454B2 JP 2003379855 A JP2003379855 A JP 2003379855A JP 2003379855 A JP2003379855 A JP 2003379855A JP 4879454 B2 JP4879454 B2 JP 4879454B2
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- 238000003384 imaging method Methods 0.000 title claims description 9
- 230000004044 response Effects 0.000 title claims description 8
- 230000003287 optical effect Effects 0.000 title description 3
- 230000003595 spectral effect Effects 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 12
- 230000000295 complement effect Effects 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 239000012780 transparent material Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 38
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 4
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000004298 light response Effects 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14806—Structural or functional details thereof
- H01L27/14812—Special geometry or disposition of pixel-elements, address lines or gate-electrodes
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Description
Claims (2)
- 撮像センサであって、
a)半導体基板と、
b)ピクセルであって、
i)前記基板を覆う透明材料からなる2層以上の層で構成された第1のスタックを含む第1感光領域であって、前記2層以上の層で構成された第1のスタックが第1のゲート電極を覆う誘電体層を含み、前記第1感光領域が、光の波長の関数としての最小値群と最大値群を有する分光応答性を持つ第1感光領域と、
ii)前記基板を覆う透明材料からなる2層以上の層で構成された第2のスタックを含む第2感光領域であって、前記2層以上の層で構成された第2のスタックが第2のゲート電極を覆う誘電体層を含み、前記第2感光領域が、光の波長の関数としての最大値群と最小値群を有する分光応答性を持つ第2感光領域と、
iii)前記第1および第2感光領域における誘電体層の一部を通して2つのさらなる領域を前記第1および第2感光領域それぞれに形成するエッチング抜きであって、それぞれの前記さらなる領域が光の波長の関数としての最大値群と最小値群を有する分光応答性を持つエッチング抜きと、を含むピクセルと、
を含み、
光の波長の関数としての前記第1感光領域のさらなる領域における伝播の最小干渉と最大干渉が相補的であり、光の波長の関数としての前記第2感光領域のさらなる領域における伝播の最小干渉と最大干渉が相補的であること、
を特徴とする撮像センサ。 - 請求項1に記載の撮像センサであって、個別の前記感光領域内の前記層の数および材料が同一で、1層以上の層において厚さが異なることを特徴とする撮像センサ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/292,344 | 2002-11-12 | ||
US10/292,344 US6924472B2 (en) | 2002-11-12 | 2002-11-12 | Image sensor with improved optical response uniformity |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004165662A JP2004165662A (ja) | 2004-06-10 |
JP2004165662A5 JP2004165662A5 (ja) | 2006-12-21 |
JP4879454B2 true JP4879454B2 (ja) | 2012-02-22 |
Family
ID=32176156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003379855A Expired - Lifetime JP4879454B2 (ja) | 2002-11-12 | 2003-11-10 | 光学応答の均一性が改良された撮像センサ |
Country Status (4)
Country | Link |
---|---|
US (1) | US6924472B2 (ja) |
EP (1) | EP1420455B1 (ja) |
JP (1) | JP4879454B2 (ja) |
DE (1) | DE60328954D1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6940097B2 (en) * | 2003-08-19 | 2005-09-06 | Hewlett-Packard Development Company, L.P. | Optical property normalization for a transparent electrical device |
JP5704811B2 (ja) * | 2009-12-11 | 2015-04-22 | キヤノン株式会社 | 固体撮像装置の製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4024562A (en) * | 1975-05-02 | 1977-05-17 | General Electric Company | Radiation sensing and charge storage devices |
US4394675A (en) * | 1981-03-16 | 1983-07-19 | Eastman Kodak Company | Transparent asymmetric electrode structure for charge coupled device image sensor |
JPH0671096B2 (ja) * | 1985-03-13 | 1994-09-07 | 松下電器産業株式会社 | 受光素子 |
US5081421A (en) * | 1990-05-01 | 1992-01-14 | At&T Bell Laboratories | In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection |
KR920013735A (ko) * | 1990-12-31 | 1992-07-29 | 김광호 | 칼라필터 및 그 제조방법 |
US5483090A (en) * | 1993-04-09 | 1996-01-09 | Sanyo Electric Co., Ltd. | Solid-state image pickup device and method for manufacturing such device |
JP2621767B2 (ja) * | 1993-07-30 | 1997-06-18 | 日本電気株式会社 | 固体撮像素子 |
KR960015271B1 (ko) * | 1993-08-18 | 1996-11-07 | 엘지반도체 주식회사 | 전하전송장치의 제조방법 |
US5804845A (en) * | 1996-10-08 | 1998-09-08 | Eastman Kodak Company | Image sensor having ITO electrodes with an ONO layer |
US5798542A (en) * | 1996-10-08 | 1998-08-25 | Eastman Kodak Company | Image sensor having ITO electrodes with overlapping color filters for increased sensitivity |
US6525356B1 (en) * | 1998-12-15 | 2003-02-25 | Nec Corporation | Solid imaging device |
US6403993B1 (en) * | 1999-11-18 | 2002-06-11 | Eastman Kodak Company | Charge coupled image sensor with u-shaped gates |
US6300160B1 (en) * | 1999-11-18 | 2001-10-09 | Eastman Kodak Company | Process for charge coupled image sensor with U-shaped gates |
US6489642B1 (en) * | 2000-09-28 | 2002-12-03 | Eastman Kodak Company | Image sensor having improved spectral response uniformity |
-
2002
- 2002-11-12 US US10/292,344 patent/US6924472B2/en not_active Expired - Lifetime
-
2003
- 2003-11-03 EP EP03078442A patent/EP1420455B1/en not_active Expired - Fee Related
- 2003-11-03 DE DE60328954T patent/DE60328954D1/de not_active Expired - Lifetime
- 2003-11-10 JP JP2003379855A patent/JP4879454B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2004165662A (ja) | 2004-06-10 |
US6924472B2 (en) | 2005-08-02 |
DE60328954D1 (de) | 2009-10-08 |
EP1420455B1 (en) | 2009-08-26 |
EP1420455A2 (en) | 2004-05-19 |
US20040089789A1 (en) | 2004-05-13 |
EP1420455A3 (en) | 2005-04-20 |
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