JP4877867B2 - 表示装置の作製方法 - Google Patents

表示装置の作製方法 Download PDF

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Publication number
JP4877867B2
JP4877867B2 JP2004327821A JP2004327821A JP4877867B2 JP 4877867 B2 JP4877867 B2 JP 4877867B2 JP 2004327821 A JP2004327821 A JP 2004327821A JP 2004327821 A JP2004327821 A JP 2004327821A JP 4877867 B2 JP4877867 B2 JP 4877867B2
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Japan
Prior art keywords
layer
electrode
light
conductive
substrate
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Expired - Fee Related
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JP2004327821A
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English (en)
Japanese (ja)
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JP2005167226A5 (enrdf_load_stackoverflow
JP2005167226A (ja
Inventor
舜平 山崎
慎志 前川
理 中村
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2004327821A priority Critical patent/JP4877867B2/ja
Publication of JP2005167226A publication Critical patent/JP2005167226A/ja
Publication of JP2005167226A5 publication Critical patent/JP2005167226A5/ja
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Publication of JP4877867B2 publication Critical patent/JP4877867B2/ja
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
JP2004327821A 2003-11-14 2004-11-11 表示装置の作製方法 Expired - Fee Related JP4877867B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004327821A JP4877867B2 (ja) 2003-11-14 2004-11-11 表示装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003385965 2003-11-14
JP2003385965 2003-11-14
JP2004327821A JP4877867B2 (ja) 2003-11-14 2004-11-11 表示装置の作製方法

Publications (3)

Publication Number Publication Date
JP2005167226A JP2005167226A (ja) 2005-06-23
JP2005167226A5 JP2005167226A5 (enrdf_load_stackoverflow) 2007-12-20
JP4877867B2 true JP4877867B2 (ja) 2012-02-15

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JP2004327821A Expired - Fee Related JP4877867B2 (ja) 2003-11-14 2004-11-11 表示装置の作製方法

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JP (1) JP4877867B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007129007A (ja) * 2005-11-02 2007-05-24 Hitachi Ltd 有機半導体膜を有する半導体装置の製造方法
JP5181587B2 (ja) * 2006-09-29 2013-04-10 大日本印刷株式会社 有機半導体素子およびその製造方法、有機トランジスタアレイ、およびディスプレイ
JP5167685B2 (ja) * 2007-04-25 2013-03-21 セイコーエプソン株式会社 アクティブマトリクス基板の製造方法、及び電気光学装置の製造方法
KR101847656B1 (ko) 2009-10-21 2018-05-24 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제조 방법
KR102148957B1 (ko) * 2013-09-02 2020-08-31 삼성디스플레이 주식회사 표시 기판 및 표시 기판의 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11112002A (ja) * 1997-10-07 1999-04-23 Semiconductor Energy Lab Co Ltd 半導体装置およびその製造方法
JP2003058077A (ja) * 2001-08-08 2003-02-28 Fuji Photo Film Co Ltd ミクロファブリケーション用基板、その製造方法および像状薄膜形成方法
JP2003318401A (ja) * 2002-04-22 2003-11-07 Seiko Epson Corp デバイスの製造方法、デバイス、表示装置、および電子機器
JP3965562B2 (ja) * 2002-04-22 2007-08-29 セイコーエプソン株式会社 デバイスの製造方法、デバイス、電気光学装置及び電子機器

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JP2005167226A (ja) 2005-06-23

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