JP4871145B2 - Exposure method and exposure apparatus - Google Patents

Description

  The present invention relates to an exposure method for imaging a reference pattern of an object to be exposed while conveying the object to be exposed, generating an exposure pattern by tilting a plurality of micromirrors, and exposing the exposure pattern on the reference pattern. Specifically, the present invention relates to an exposure method and an exposure apparatus that facilitate adjustment of the imaging position and improve the overlay accuracy of the reference pattern and the exposure pattern.

A conventional exposure apparatus conveys an object to be exposed at a predetermined speed by a conveying means, and corresponds to each of a plurality of micromirrors of micromirror devices arranged side by side in a direction orthogonal to the conveying direction of the object to be exposed. The light from the object to be exposed is received through the projection lens by the plurality of light receiving elements of the imaging means arranged in the direction orthogonal to the conveyance direction of the exposure object and arranged in advance in the conveyance direction, and then on the object to be exposed. The front side of the exposure position in the transport direction is imaged, and a plurality of micromirrors of the micromirror device are driven and controlled by the control means based on the image data of the image. The micromirror reflects the exposure light from the light source and The exposure light is emitted after being modulated in intensity, and the projection lens projects the intensity-modulated exposure light onto the object to be exposed, and the exposure pattern is exposed on the reference pattern formed on the object to be exposed. Tsu which was (for example, see Patent Document 1).
JP 2006-330622 A

  However, in such a conventional exposure apparatus, since the surface of the object to be exposed is directly imaged by the imaging means, the adjustment of the imaging position can only be performed by moving the mounting position of the imaging means. It was difficult to adjust. Therefore, when the mounting position of the imaging means is shifted, the distance between the imaging position and the exposure position changes, the exposure timing of the exposure pattern based on the time of imaging shifts, and the exposure pattern is placed on the reference pattern. There was a risk that overlay exposure could not be performed with high accuracy.

  Accordingly, the present invention provides an exposure method and an exposure apparatus that address such problems and improve the overlay accuracy between the reference pattern and the exposure pattern of the exposure object by facilitating adjustment of the imaging position. For the purpose.

  In order to achieve the above object, an exposure method according to a first aspect of the present invention comprises a plurality of micromirrors along a transport direction of the object to be exposed and a direction intersecting the transport direction while transporting the object to be exposed in a predetermined direction. Is tilted so that light incident from a light source is reflected in the direction of the object to be exposed to generate an exposure pattern, and the above-mentioned object is formed on the object to be exposed. An exposure method for projecting and exposing an exposure pattern, wherein a plurality of micromirrors of the micromirror device reflect visible light incident from the direction of the object to be exposed in a direction different from an incident direction of light from the light source. Tilted so that the visible light reflected by the micromirror device is received by the imaging means and images a predetermined reference pattern formed in advance on the object to be exposed, Bitmap data of an image corresponding to the exposure pattern is generated based on the image data of the reference pattern imaged by the imaging means and design data stored in advance in a storage unit, and the micro data is generated based on the bitmap data. A plurality of micromirrors of the mirror device are tilted to generate a predetermined exposure pattern, and the predetermined exposure pattern is exposed on a reference pattern formed on the object to be exposed.

  With such a configuration, the plurality of micromirror devices in which the object to be exposed is transported in a predetermined direction, and a plurality of micromirrors are arranged in a matrix along the transport direction of the object to be exposed and the direction intersecting the transport direction. The micromirror is tilted so that visible light incident from the direction of the object to be exposed is reflected in a direction different from the incident direction of light from the light source, and the visible light reflected by the micromirror device is received by the imaging means. An image bit corresponding to the exposure pattern based on the image data of the reference pattern captured by the imaging unit and the design data stored in advance in the storage unit Map data is generated, and a plurality of micromirrors of the micromirror device are covered with light incident from a light source based on the bitmap data. It is tilted so as to be reflected in the optical member direction to generate a predetermined exposure pattern to expose the predetermined exposure pattern on a reference pattern formed on the object to be exposed.

  The micromirror device is divided into a micromirror group on the front side in the transport direction and a micromirror group on the back side in the transport direction with a direction intersecting the transport direction of the object to be exposed as a boundary. A predetermined micromirror in the group of micromirrors is tilted to generate the exposure pattern, and at least one row of micromirrors in the micromirror group on the back side in the transport direction is tilted to view visible light from the direction of the object to be exposed. Is reflected to the imaging means. As a result, an exposure pattern is generated by tilting a predetermined micromirror in the micromirror group on the front side in the transport direction divided with the direction intersecting the transport direction of the object to be exposed as a boundary. At least one row of micromirrors in the mirror group is tilted to reflect visible light from the direction of the exposed object to the imaging means.

  An exposure apparatus according to a second aspect of the invention includes a transport unit that mounts an object to be exposed on a mounting surface and transports it in a predetermined direction, and is disposed above the transport unit, and light incident from a light source is received by the light source. A plurality of tilts so that the visible light incident from the direction of the object to be exposed is reflected in a direction different from the incident direction of light from the light source while being tilted so as to be reflected in the direction of the exposed body. Micromirror devices in which the micromirrors are arranged in a matrix along the transport direction of the object to be exposed and the direction intersecting the transport direction, and an exposure pattern generated by the micromirror device on the object to be exposed A projection lens that projects, and an imaging unit that is disposed in a direction in which visible light incident from the direction of the object to be exposed is reflected by the micromirror device, and that images the surface of the object to be exposed; Serial in which and a control means for controlling each component.

  With such a configuration, each control element is controlled by the control means, and the object to be exposed is placed on the placement surface by the conveying means and conveyed in a predetermined direction. A direction different from the incident direction of the light incident from the light source by tilting the plurality of micromirrors of the micromirror device arranged in a matrix along the direction intersecting the transport direction so that the visible light incident from the direction of the exposure object is incident The surface of the object to be exposed is imaged by an imaging means arranged in a direction in which visible light incident from the direction of the object to be exposed is reflected by the micromirror device, and the plurality of micromirrors of the micromirror device are light sources The exposure pattern is generated by tilting so that the exposure light incident from the head is reflected toward the object to be exposed, and the exposure pattern generated by the micromirror device is projected. It is projected onto the object to be exposed in the lens.

  Further, the micromirror device is divided into a micromirror group on the front side in the transport direction and a micromirror group on the back side in the transport direction with a direction intersecting the transport direction of the object to be exposed as a boundary. A predetermined micromirror in the group of micromirrors is tilted to generate the exposure pattern, and at least one row of micromirrors in the micromirror group on the back side in the transport direction is tilted to view visible light from the direction of the object to be exposed. Is reflected to the imaging means. As a result, an exposure pattern is generated by tilting a predetermined micromirror in the micromirror group on the front side in the transport direction divided with the direction intersecting the transport direction of the object to be exposed as a boundary. At least one row of micromirrors in the mirror group is tilted to reflect visible light from the direction of the exposed object to the imaging means.

  Still further, the imaging means includes a plurality of light receiving elements arranged in a straight line in a direction intersecting with the transport direction of the object to be exposed. The surface of the object to be exposed is imaged by an imaging means in which a plurality of light receiving elements are arranged in a straight line in a direction crossing the conveying direction of the object to be exposed.

  The image pickup means includes a plurality of light receiving elements in a matrix along the transport direction of the object to be exposed and the direction intersecting the transport direction. As a result, the surface of the object to be exposed is imaged by the image pickup means provided with a plurality of light receiving elements in a matrix along the conveying direction of the object to be exposed and the direction intersecting the conveying direction.

  According to the exposure method of the first aspect, since the surface of the object to be exposed is imaged by the imaging means via the micromirror device having a plurality of micromirrors in a matrix, the micromirror array intersecting the transport direction Among them, the imaging position can be easily adjusted by switching at least one micromirror array tilted so that visible light incident from the direction of the object to be exposed is reflected to the imaging means to another micromirror array. it can. Accordingly, it is possible to improve the overlay accuracy of the exposure pattern with respect to the reference pattern of the object to be exposed by appropriately adjusting the exposure timing based on the time of imaging.

  According to the exposure apparatus of the third aspect, since the surface of the object to be exposed is imaged by the imaging means via the micromirror device having a plurality of micromirrors in a matrix, a micro that intersects the transport direction. Of the mirror rows, the imaging position is easily adjusted by switching at least one micro mirror row tilted so as to reflect visible light incident from the direction of the exposure object to the imaging means to another micro mirror row. be able to. Accordingly, it is possible to improve the overlay accuracy of the exposure pattern with respect to the reference pattern of the object to be exposed by appropriately adjusting the exposure timing based on the time of imaging. In addition, since the image is taken through the micromirror device, the diameter of the projection lens is smaller than that of the conventional exposure apparatus in which the imaging means is arranged in parallel with the micromirror device prior to the conveying direction of the object to be exposed. The projection optical system can be reduced in size.

  Furthermore, according to the invention which concerns on Claim 2 or Claim 4, while conveying a to-be-exposed body, the surface of to-be-exposed body can always be imaged. Therefore, there is no possibility that a missing portion is generated in the captured image on the surface of the object to be exposed, and a pattern having no defect can be exposed.

  Furthermore, according to the fifth aspect of the present invention, since the image pickup means has a plurality of light receiving elements arranged in a straight line, the component cost of the image pickup means can be reduced.

  According to the invention of claim 6, the acquisition of the two-dimensional image of the surface of the object to be exposed and the exposure of the exposure pattern generated based on the two-dimensional image can be executed in substantially real time. The overlay accuracy between the pattern and the exposure pattern can be further improved. In addition, even if the correspondence between the micromirror of the micromirror device and the light receiving element of the imaging means is shifted due to the problem of mounting accuracy, the reflected light in the micromirror can be received by another light receiving element, The allowable range of the accuracy of attaching the imaging means to the micromirror device can be increased. This facilitates assembly of the device.

  Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a schematic view showing an embodiment of an exposure apparatus according to the present invention. This exposure apparatus generates and exposes a predetermined exposure pattern with a micromirror device in which a plurality of micromirrors are arranged in a matrix while transporting an object to be exposed in a predetermined direction. And a micromirror device 3, a projection lens 4, an imaging unit 5, an illumination unit 6, and a control unit 7. In the following description, the case where the object to be exposed 8 is made of a transparent glass substrate coated with a photosensitive material will be described.

  The transport means 1 is configured to place the object to be exposed 8 on the upper surface of the stage 9 as a placement surface and transport it in the direction of arrow A. A transport motor (not shown) is controlled by the control means 7 described later. The stage 9 is moved. The transport means 1 is provided with a position detection sensor and a speed sensor (not shown) such as an encoder and a linear sensor, and the output is fed back to the control means 7 to enable position detection and speed control. Yes. The stage 9 is provided with an opening corresponding to the entire exposure area of the object 8 to be exposed, and the object 8 is moved from below by the illumination means 6 provided below the stage 9. It can be illuminated.

A light source 2 is provided above the conveying means 1. The light source 2, ultraviolet is intended to emit (UV light) L _1, for example, a xenon lamp or ultraviolet laser light source or the like. Then, the reflected UV light L ₁ emitted mirrors 13a, adapted to illuminate the micro-mirror device 3 below the obliquely downwardly reflected by 13b.

The radial direction in front of the UV light L ₁ emitted from the light source 2 at above the conveying means 1, micro-mirror device 3 is arranged. The micromirror device 3 is tilted so as to reflect the UV light L ₁ incident from the light source 2 in the direction of the object to be exposed 8 to generate a two-dimensional exposure pattern, and visible light incident from the direction of the object to be exposed 8. the L ₂ along a direction in which the plurality of micro-mirrors 10 are perpendicular to the conveying direction and the conveying direction of the subject to be exposed 8 is tilted so as to reflect in a direction different from the incident direction of UV light L ₁ from the light source 2 As shown in FIG. 2, the micromirror group 11a on the front side in the transport direction and the micromirror group 11b on the back side in the transport direction with the direction intersecting the transport direction of the object 8 as a boundary. is divided into bets, it tilts the predetermined micro mirror 10 of the micro-mirrors 11a in the transport direction front side to generate an exposure pattern, exposure to UV light L ₁ incident from the light source 2 pattern Reflected toward the subject to be exposed 8 as the exposure light L ₃ containing over emissions information, visible from the tilted micromirrors 10 of at least one row exposed object 8 directions of the micromirrors group 11b in the transport direction rear side The light L ₂ is reflected to the imaging means 5. A state in which the micromirror 10 is tilted so as to reflect the UV light L ₁ incident from the light source 2 in the direction of the object to be exposed 8 is hereinafter referred to as an “on state”, and the visible light L from the object to be exposed 8 is expressed. _The state in which 2 is tilted so as to be reflected in the direction of the imaging means 8 is hereinafter referred to as an “off state”.

  For the micromirror device 3, for example, a general-purpose digital micromirror device (DMD: trademark of Texas Instruments Inc., USA) can be used as a display device. Hereinafter, a case where the micromirror device 3 is a DMD will be described.

  A projection lens 4 is disposed between the conveying means 1 and the DMD 3. The projection lens 4 projects the exposure pattern generated by the DMD 3 onto the object 8 to be exposed, and constitutes a telecentric optical system by combining a plurality of lenses.

In the DMD 3, the imaging means 5 is arranged in a direction in which the visible light L ₂ incident from the direction of the object to be exposed 8 is reflected by the micromirror group 11 b on the back side in the transport direction shown in FIG. The image pickup means 5 picks up an image of a reference pattern formed on the surface of the object to be exposed 8, and a plurality of light receiving elements corresponding to a direction orthogonal to the conveying direction indicated by an arrow A in FIG. For example, a line camera having the elements arranged in a straight line. As shown in the figure, a reference pattern on the object to be exposed 8 is imaged on the light receiving surface of the imaging means 5 by the projection lens 4 and the imaging lens 12. In FIG. 1, reference numeral 13c denotes a reflecting mirror.

  As described above, according to the present invention, the surface of the object to be exposed 8 is imaged through the micromirror 10 of the DMD 3, so that the micromirror array to be turned off in the micromirror group 11b on the back side in the transport direction. By switching, the imaging position can be changed. That is, as shown in FIG. 3, for example, the row of the micromirrors 10a of the DMD 3 is turned off, and the position P on the object to be exposed 8 is imaged through the row of the micromirrors 10a. When the line of micromirrors 10a is turned on and the row of micromirrors 10b is switched to the off state, the surface of the object 8 is exposed via the row of micromirrors 10b. Is picked up, and the image pickup position moves from position P to position P ′. As a result, for example, even when the imaging position is shifted due to the influence of the assembly accuracy of the apparatus, by switching the micromirror array to be turned off, the imaging position is adjusted and the exposure timing is appropriately adjusted to The overlay accuracy of the exposure pattern can be improved.

An illumination unit 6 is disposed below the stage 9 of the transport unit 1 so as to face the projection lens 4. The illuminating means 6 emits illumination light composed of visible light L ₂ , illuminates the reference pattern formed on the surface of the object to be exposed 8 through the object to be exposed 8 placed on the stage 9. For example, a halogen lamp or the like. Then, in the radial direction in front of the illumination light of the illumination unit 6, and the ultraviolet cut filter (not shown) is provided, the photosensitive material of the object to be exposed 8 by ultraviolet rays contained in the visible light L ₂ emitted from the lighting means 6 Is prevented from being exposed.

  A control means 7 is provided in connection with the conveying means 1, light source 2, DMD 3, and imaging means 5. The control means 7 controls the tilting of the plurality of micromirrors 10 of the DMD 3 to generate the exposure pattern and enable the imaging means 5 to image the surface of the object 8 to be exposed. Bitmap data of an image corresponding to the exposure pattern is generated based on the image data of the reference pattern of the exposure object 8 imaged in step 1 and design (CAD) data stored in advance in a memory as a storage unit, Based on the map data, the plurality of micromirrors 10 of the DMD 3 are tilted to the on state to generate a predetermined exposure pattern. And as shown in FIG. 4, the memory 14, the calculating part 15, the image process part 16, the DMD drive controller 17, the light source drive controller 18, the illumination means drive controller 19, the conveyance means drive controller 20, And a control unit 21.

  The memory 14 stores exposure pattern design data, calculation results, and the like. The computing unit 15 computes the imaging time of a predetermined area, the elapsed time from the end of imaging to the execution of exposure, and the like. Further, the image processing unit 16 generates and outputs two-dimensional image data based on the one-dimensional image of the surface of the object 8 to be exposed imaged by the imaging unit 5, and is output from the imaging unit 5. An A / D converter for A / D converting an analog signal to be output at predetermined time intervals, and a buffer for temporarily storing one-dimensional image data output from the A / D converter at predetermined time intervals I have. The DMD drive controller 17 generates bitmap data based on the two-dimensional image data of the surface of the object 8 generated by the image processing unit 16 and the design data stored in the memory 14, Based on the bitmap data, the predetermined micromirror 10 of the micromirror group 11a on the front side in the transport direction of the DMD 3 is tilted to the ON state, and at least one column of the micromirror group 11b on the back side in the transport direction The micromirror 10 is tilted to the off state. The light source drive controller 18 drives the light source 2 on and off. Furthermore, the illumination means drive controller 19 drives the illumination means 6 on and off. Furthermore, the transfer means drive controller 20 moves the stage 9 in the direction of arrow A at a predetermined speed. And the said control part 21 integrates and controls the whole apparatus.

Next, an exposure method performed using the thus configured exposure apparatus will be described with reference to FIG.
First, the moving speed V of the object to be exposed 8, the total moving distance of the object to be exposed 8, the exposure time, the output power of the light source 2, etc. are initially set by operating means (not shown) and stored in the memory 14 of the control means 7. The The moving speed V of the object to be exposed 8 is appropriately set based on the output power of the light source 2, the exposure time, and the allowable values of the resolution at both edges in the conveyance direction of the exposure pattern.

  Next, a predetermined micromirror array in the micromirror group 11b on the back side in the transport direction of the DMD 3 is set to an OFF state, and the object to be exposed 8 coated with a predetermined photosensitive material is placed on the stage 9 of the transport means 1. Then, test exposure is performed. Then, the deviation amount of the imaging position is measured from the deviation amount between the reference pattern and the exposure pattern, and the deviation of the imaging position is corrected by switching the micromirror row to be turned off in the micromirror group 11b on the back side in the transport direction. The Thereafter, the main exposure is performed according to the following steps.

  First, in step S <b> 1, the object to be exposed 8 coated with a predetermined photosensitive material is placed on the stage 9 of the transport unit 1. Subsequently, a start switch (not shown) of the exposure apparatus is turned on, and the object to be exposed 8 is continuously conveyed at a predetermined speed in the direction of arrow A shown in FIG.

In step S2, the position of the surface of the object 8 to be exposed by the image pickup means 5 is shown in FIG. 6A via the micromirror array turned off in the micromirror group 11b on the back side in the transport direction of the DMD 3. Starting from Pa. In this case, since the imaging unit 5 is a line camera, a one-dimensional image orthogonal to the arrow A at the position Pa on the object to be exposed 8 is captured. At this time, the object to be exposed 8 is continuously conveyed in the direction of the arrow A, so that the surface of the object to be exposed 8 continuing in the direction opposite to the arrow A is continuously imaged. The one-dimensional images continuously picked up by the image pickup means 5 in this way are A / D converted at predetermined time intervals by the A / D converter of the image processing unit 16, and each one-dimensional image shifted by a predetermined time. Image data is obtained. Each of these one-dimensional image data is temporarily stored in a buffer. At this time, the conveying direction front side all the micromirrors 10 of micromirror group 11a of the DMD 3, because it is turned off, UV light _{L 1} incident from the light source 2 to the DMD 3 is a broken line in FIG. 2 As shown, the light is reflected in a direction different from the direction of the object to be exposed 8 and absorbed by a light absorber (not shown). Therefore, in this case, the exposure light L ₃ is not irradiated to the subject to be exposed 8.

In step S <b> 3, the control unit 21 determines whether or not imaging of a predetermined area has been completed. In this case, it reaches the position Pb by moving in the direction of arrow A by a distance D ₁ as shown in position Pa is drawing on the object to be exposed 8 (b) shown in FIG. 6 (a), the exposure pattern projected area S if imaging is terminated corresponding region _{S 1} to _0, step S3 advances to step S4 becomes "YES" determination. Here, in the above determination, the calculation unit 15 calculates the time t ₁ (see FIG. 7A) for the object 8 to move by the distance D ₁ based on the moving speed V of the object 8 to be controlled. In step 21, the progress of the time t ₁ is monitored. Further, in step S3, "YES" determination when it comes to the same time, as shown in FIG. 7 (a), the imaging area _{S 2} subsequent to the area _{S 1} is being started. Incidentally, the moving distance D ₁ of the subject to be exposed 8 is intended to match the width D ₁ of the conveying direction of the projection area S ₀ of the exposure pattern, from the end of the area S _1, S 2 _... imaging below Along with the distance D ₂ (see FIG. 6C) by which the object 8 moves before exposure is performed, it is predetermined as the specification of the exposure apparatus and stored in the memory 14.

In step S4, based on the stored design data into a two-dimensional image data and the memory 14 of the area S ₁ of the subject to be exposed 8 generated by the image processing unit 16, an exposure corresponding to the reference pattern of the area S ₁ Pattern bitmap data is created by the DMD drive controller 17.

In step S5, the control unit 21 determines whether or not the object to be exposed 8 has moved by a predetermined distance. Here, first, as shown in FIG. 6 (b), the conveying direction leading end portion of the region S ₁ from the end of the imaging area S ₁ is reached Pc as shown from the position Pb in FIG. (C) The distance D ₂ by which the object to be exposed 8 moves is monitored until the area S ₁ coincides with the projection area S ₀ of the exposure pattern. Specifically, the determination is based on the moving distance D ₂ of the moving speed V and the subject to be exposed 8 of the object to be exposed 8, the time t ₂ to move the subject to be exposed 8 by a distance D ₂ calculating unit calculated in 15, performed to monitor the said time _{t 2} the control unit 21. Then, coincident with the projection area _{S 0} of the region _{S 1} as shown in FIG. (C) the exposure pattern, the process proceeds to step S6 if the "YES" decision in step S5. In the figure (c), are shown by hatching in a portion of the region S _2, the hatched portion indicates that it is a part of the imaging is performed.

In step S6, a predetermined exposure pattern is generated by tilting a predetermined micromirror 10 of the micromirror group 11a on the front side in the transport direction of the DMD 3 based on the bitmap data generated in step S4. as shown in FIG. 6 (c), the exposure light L ₃ including an exposure pattern information is irradiated for a predetermined time in the area S ₁ (see FIG. 7 (b)). Thus, a predetermined exposure pattern onto the reference pattern of the subject to be exposed 8 corresponding to the area S ₁ is made to be exposed.

In step S <b> 7, the control unit 21 determines whether or not all exposure to the exposure object 8 has been completed. This determination is performed by detecting whether or not the object to be exposed 8 has moved by the entire movement distance set in advance by the position detection sensor provided in the conveying means 1. Here, "NO" I Am returning to decision when it comes to the step S3, whether or not imaging of the next area S ₂ shown in FIG. 7 (a) has been finished is determined. Thereafter, in step S7, steps S3 to S7 are executed until all exposure to the object 8 to be exposed is completed and “YES” is determined.

In the above embodiment, the case where the exposure is performed intermittently has been described. However, the present invention is not limited to this, and the exposure may be performed continuously. For this purpose, for example, as shown in FIG. 8, exposure is started after a predetermined time t ₂ has elapsed since the imaging of the predetermined region S ₁ has been completed, and thereafter changes with time as the object to be exposed 8 moves. What is necessary is just to perform exposure continuously, changing an exposure pattern based on the two-dimensional image data of the to-be-exposed body 8 to be exposed. In this case, the exposure light amount can be reduced because the exposure pattern is overexposed. Or if the exposure light quantity is maintained, the moving speed of the to-be-exposed body 8 can be raised, and the time of an exposure process can be shortened.

Further, in the above embodiment, the DMD 3 is divided into the micromirror group 11a on the front side in the transport direction and the micromirror group 11b on the back side in the transport direction with the direction intersecting the transport direction of the object 8 as a boundary. An exposure pattern is generated by tilting a predetermined micromirror 10 in the front side micromirror group 11a to an on state, and at least one row of micromirrors 10 in the transport direction back side micromirror group 11b is in an off state. tilting to the case has been described where the reflecting visible light L ₂ from the subject to be exposed 8 direction to the imaging unit 5, the present invention is not limited thereto, without dividing the DMD3 two micro mirrors 11a, 11b, In use, all micromirrors 10 are tilted to the OFF state during imaging to enable reference pattern imaging, and all micromirrors are exposed during exposure. An exposure pattern may be generated by tilting a predetermined micromirror 10 of the mirror 10 to an ON state. In this case, imaging and exposure are performed alternately.

  Furthermore, in the above-described embodiment, the case where the imaging unit 5 is a line camera that includes a plurality of light receiving elements arranged in a straight line in a direction intersecting the conveyance direction of the object to be exposed 8 has been described. Without being limited thereto, the imaging means 5 may be provided with a plurality of light receiving elements in a matrix form along the transport direction of the object to be exposed 8 and the direction intersecting the transport direction.

  Furthermore, in the above-described embodiment, the case where the illumination unit 6 is disposed below the stage 9 has been described. However, the present invention is not limited to this, and the illumination unit 6 is disposed above the stage 9 to perform epi-illumination. It is good.

  In the above description, the case where the control unit 7 controls the driving of the conveying unit 1 so as to continuously convey the object to be exposed 8 has been described. However, the present invention is not limited to this, and the control unit 7 includes: The driving of the conveying means 1 may be controlled so that the object to be exposed 8 is intermittently conveyed. In this case, when the image pickup means 5 is a line camera, the predetermined area is imaged while the object to be exposed 8 is conveyed at a constant speed, and then the conveyance of the object to be exposed 8 is temporarily stopped to the imaged area. It is advisable to perform exposure on the image. If the imaging means 5 is a two-dimensional camera, all the micromirrors of the DMD 3 are tilted to the off state while the object to be exposed 8 is temporarily stopped, and then a predetermined area is imaged. It is preferable that the exposure pattern is generated and exposure is performed on the imaging region, and then the object to be exposed 8 is stepped by a predetermined distance to perform imaging and exposure in the same manner as described above.

It is a schematic diagram which shows embodiment of the exposure apparatus by this invention. It is explanatory drawing which shows tilting of the several micromirror of DMD used for the said exposure apparatus. It is explanatory drawing shown about adjustment of the imaging position in the said exposure apparatus. It is a block diagram which shows the example of 1 structure of the control means of the said exposure apparatus. It is a flowchart explaining the exposure method performed using the said exposure apparatus. It is explanatory drawing which shows operation | movement from the imaging start of the said exposure apparatus to exposure implementation. It is an imaging and exposure timing chart explaining the intermittent exposure operation by the exposure apparatus. It is an imaging and exposure timing chart explaining the continuous exposure operation by the exposure apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Conveyance means 2 ... Light source 3 ... DMD (micromirror device)
4 ... projection lens 5 ... imaging unit 7 ... control unit 8 ... object to be exposed 10 ... micromirror 11a, 11b ... optical L 2 _... visible light L 3 _... exposure light from the micromirror group L 1 _... light source

Claims (6)

While transporting the object to be exposed in a predetermined direction, a predetermined micromirror of a micromirror device in which a plurality of micromirrors are arranged in a matrix along the transport direction of the object to be exposed and the direction intersecting the transport direction, An exposure method that generates an exposure pattern by tilting so that light incident from a light source is reflected toward the object to be exposed, and projects and exposes the exposure pattern on the object to be exposed.
The plurality of micromirrors of the micromirror device are tilted so that visible light incident from the direction of the object to be exposed is reflected in a direction different from the incident direction of light from the light source, and reflected by the micromirror device. The visible light is received by the imaging means, and a predetermined reference pattern previously formed on the object to be exposed is imaged.
Generating bitmap data of an image corresponding to the exposure pattern based on image data of the reference pattern imaged by the imaging means and design data stored in advance in a storage unit;
A predetermined exposure pattern is generated by tilting a plurality of micromirrors of the micromirror device based on the bitmap data,
Exposing the predetermined exposure pattern on a reference pattern formed on the object to be exposed;
An exposure method characterized by the above.   The micromirror device is divided into a micromirror group on the front side in the transport direction and a micromirror group on the back side in the transport direction with a direction intersecting the transport direction of the object to be exposed as a boundary, and the micromirror on the front side in the transport direction Tilt a predetermined micromirror of the group to generate the exposure pattern, tilt at least one row of micromirrors of the micromirror group on the back side in the transport direction to emit visible light from the direction of the object to be exposed 2. The exposure method according to claim 1, wherein the exposure is reflected to the image pickup means. A conveying means for placing the object to be exposed on the placement surface and conveying it in a predetermined direction;
An exposure pattern is generated by being tilted so that light incident from the light source is reflected in the direction of the object to be exposed, and visible light incident from the direction of the object to be exposed is the light source. A micromirror device in which a plurality of micromirrors tilted so as to be reflected in a direction different from the light incident direction are arranged in a matrix along the transport direction of the object to be exposed and the direction intersecting the transport direction; ,
A projection lens that projects an exposure pattern generated by the micromirror device onto the object to be exposed;
An imaging means that is arranged in a direction in which visible light incident from the direction of the object to be exposed is reflected by the micromirror device, and images the surface of the object to be exposed;
Control means for controlling each of the components;
An exposure apparatus comprising:   The micromirror device is divided into a micromirror group on the front side in the transport direction and a micromirror group on the back side in the transport direction with a direction intersecting the transport direction of the object to be exposed as a boundary, and the micromirror on the front side in the transport direction Tilt a predetermined micromirror of the group to generate the exposure pattern, tilt at least one row of micromirrors of the micromirror group on the back side in the transport direction to emit visible light from the direction of the object to be exposed 4. An exposure apparatus according to claim 3, wherein the exposure apparatus reflects the image pickup means.   5. The exposure apparatus according to claim 3, wherein the image pickup unit includes a plurality of light receiving elements arranged in a straight line in a direction intersecting a transport direction of the object to be exposed.   5. The exposure apparatus according to claim 3, wherein the imaging unit includes a plurality of light receiving elements in a matrix shape along a transport direction of the object to be exposed and a direction intersecting the transport direction.

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