JP4862236B2 - Multi-face mask device for vacuum deposition used in organic EL device manufacturing - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a mask apparatus used for depositing a predetermined pattern on a substrate surface in a vacuum deposition process in the manufacture of an organic EL element.
[0002]
[Prior art]
As shown in FIG. 7, the organic EL element has an anode electrode (ITO) 2, a hole transport layer 3, an organic layer (light emitting layer) 4, an electron transport layer 5, and a cathode electrode 6 on a transparent substrate 1 such as a glass plate. Are stacked in this order, and the sealing can 7 is arranged on the surface. There are two types of organic EL elements: the organic layer 4 includes a high molecular type and a low molecular type, and the element driving method includes a passive type and an active type. In these organic EL device manufacturing processes, vacuum deposition is performed for the formation of passive-type and active-type low-molecular organic layers and the formation of the passive-type cathode electrode 6. Then, for vacuum deposition patterning of the low molecular organic layer and the cathode electrode, as shown in FIG. 8, a metal having a blind portion 8A having a structure in which a large number of fine slits are arranged in parallel at minute intervals in a region to be deposited. Mask 8 was used. Also, the cathode separator method (see JP-A-8-315981) for forming an electrically insulating partition wall is sometimes used for vacuum deposition patterning of the cathode electrode.
[0003]
[Problems to be solved by the invention]
However, all of these conventional techniques have problems. In other words, when a metal mask is used, conventionally, the metal mask is simply placed on the surface of the substrate to be vapor-deposited and held from the back using a magnet. When the metal mask is held on the substrate surface, the slits in the blind portion are likely to be distorted. In particular, when the slit shape is made very fine, the slit accuracy cannot be further maintained and high-definition patterning cannot be performed. In addition, conventionally, since only one interstitial portion 8A is formed on one metal mask 8, there is a problem in that productivity is poor because each deposition operation is performed one by one. On the other hand, the cathode separator method is difficult to manufacture stably because the angle of the slope of the partition wall is adjusted by adjusting the intensity of exposure by photolithography (the taper angle of the slope portion of the partition wall of the inverted trapezoidal cross section is difficult). If it is small, the electrodes cannot be separated, and if it is large, it becomes triangular and falls down).
[0004]
The present invention has been made in view of such a problem, and enables the metal mask to be disposed on the substrate surface in a state in which the slit accuracy of the shading portion is ensured in the vacuum deposition patterning using the metal mask. It is an object of the present invention to provide a multi-sided mask device for vacuum deposition that enables vacuum deposition with good performance.
[0005]
[Means for Solving the Problems]
The present invention provides a mask device used in a vacuum deposition process in the manufacture of an organic EL element, a first metal mask provided with a plurality of windows for regulating the deposition range, and a region formed to cover the plurality of windows. One of a reed screen section, a plurality of fine slits over the entire area of the blind section, the blind portion of the structure which is arranged parallel to a pitch corresponding to the number of pixels of the organic EL device to be formed with the slit of the blind section And a second metal mask provided with holding portions provided at both ends in the longitudinal direction of the first and second metal masks, and the second metal mask can be set in a state of being pulled in the longitudinal direction of the slit. With this configuration, each of the plurality of windows acts as an effective mask. Therefore, it is possible to perform multi-sided by arranging a substrate having a size covering all the windows and performing deposition, thereby improving productivity. it can. In addition, since the second metal mask is pulled in the longitudinal direction of the slit, even in a high-definition mask in which extremely fine slits are arranged at fine intervals, the slits are kept straight and at a predetermined pitch. The desired high-definition pattern can be formed on the substrate.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
The multi-sided mask apparatus for vacuum deposition according to the first embodiment of the present invention includes a base plate that also serves as a first metal mask having a plurality of windows that regulate the deposition range, and a region that covers the plurality of windows. a single blind portion formed in, said interdigital portion of a plurality of fine slits over the entire area of the blind portions and parallel arrangement at a pitch corresponding to the number of pixels the organic EL device to be formed structure, A second metal mask provided with holding portions provided at both ends of the slit in the longitudinal direction of the slit, and the second metal mask, the blind portion being positioned on the window and the length of the slit. And a mask tension holding means that is positioned on the base plate while being pulled in a direction. A substrate to be deposited is placed on the second metal mask of the multi-face mask device having this configuration, and the whole is set in a vapor deposition machine to carry out vapor deposition, thereby forming a high-definition pattern with high productivity by multiple faces. be able to.
[0007]
The multi-face mask device according to the second embodiment includes a first metal mask provided with a plurality of windows for regulating the vapor deposition range, and one interdigital section formed in a region covering the plurality of windows. there are a plurality of fine slits over the entire area of the blind part, and the interdigital portion arranged parallel to the arrangement at a pitch corresponding to the number of pixels the organic EL device to be formed, the longitudinal direction of the slit of the blind section A second metal mask provided with holding portions provided at both ends of the base plate, and a base plate for supporting the first metal mask, wherein at least a region facing each window has an opening larger than the window, The second metal mask is positioned on the window of the first metal mask attached to the base plate, and the longitudinal direction of the slit. Those having a mask tensile holding means is positioned on said base plate in a state of pulling. Also in the multi-face mask apparatus of this configuration, a substrate to be vapor-deposited is placed on the second metal mask, and the whole is set in the vapor deposition machine to perform the vapor deposition, thereby producing a high-definition pattern with multi-face-position with high productivity. Can be formed.
[0008]
As long as the mask tension holding means used in the present invention can hold the second metal mask in a state of being pulled with an appropriate tension, its configuration is arbitrary, but a typical configuration thereof is the second metal mask. a stationary mask clamp secured to the base plate of the holding portion of the end of the the stationary mask clamp respect window arranged on the opposite side, a slider movable in a direction and approaches a direction away from the fixed-side mask clamp A movable side mask clamp that fixes the holding portion at the other end of the second metal mask to the slider, and a desired tension is applied to the second metal mask held by the fixed side mask clamp and the movable side mask clamp. And a moving means for moving the slider in a direction away from the fixed-side mask clamp. In the mask tension holding means of this configuration, the holding portion at one end of the second metal mask is fixed to the base plate by the fixed mask clamp, the other end is fixed to the slider by the moving mask clamp, and the slider is moved to the second by the moving means. By moving the metal mask in the pulling direction, the second metal mask can be held in a pulled state, and a large number of slits in the weave can be kept straight and at a predetermined pitch with a simple operation. it can.
[0009]
Here, the moving means may be configured to move the slider by a desired amount using a screw or the like, but an elastic means for applying a spring force in a direction away from the fixed side mask clamp to the slider is used. It is preferable. With this configuration, it is possible to always apply a constant tensile force to the second metal mask, and there is an advantage that the positional accuracy of the slit can be further improved.
[0010]
【Example】
Hereinafter, preferred embodiments of the present invention shown in the drawings will be described. FIG. 1 (a) is a schematic perspective view showing the disassembled main parts of a multi-face mask device for vacuum deposition according to one embodiment of the present invention, and FIG. 1 (b) shows the multi-face mask device assembled. FIG. 1 (c) is a schematic perspective view, FIG. 1 (c) is a schematic cross-sectional view showing an enlarged portion of a blind portion of a second metal mask used in the multi-face mask device, and FIG. 2 shows the multi-face mask device shown in FIG. FIG. 3 is a schematic plan view showing the apparatus shown in FIG. 2 in the direction of the arrow AA, and FIG. 4 is a schematic view of the multi-face mask device. It is a schematic top view shown in the state which attached. The multi-face mask device generally indicated by reference numeral 11 is roughly divided into a base plate 12 that also serves as a first metal mask, a second metal mask 13, a mask tension holding means 14, a substrate clamping means 15 and the like. . Hereinafter, each component will be described.
[0011]
As will be described later, the base plate 12 is provided with a strength capable of attaching the second metal mask 13 on the base plate 12 in a tensioned state and holding the substrate 17 to be deposited thereon. A plurality of windows (24 in the embodiment of the drawings) for regulating the range are provided. The size of the window 18 is appropriately determined according to the size of the organic EL element to be formed. For example, the window 18 has a length of 60 mm and a width of 40 mm.
[0012]
The second metal mask 13 is formed of a metal plate made of stainless steel or the like having a thickness of about 30 μm to 100 μm , and a large number of fine slits 13a [see FIG. Are provided with one interdigital section 13A and holding sections 13B and 13B provided at both ends in the slit longitudinal direction of the interdigital section 13A . The size of the blind portion 13A is set to a size that can cover the plurality of windows 18 formed in the base plate 12. Further, the width and pitch of the slit formed in the blind portion 13A are appropriately determined according to the desired number of pixels of the organic EL element to be formed. For example, the width w of the slit 13a is 260 μm and the slit 13a is formed. The width d (maximum width) of the metal part 13b is 40 μm. The cross-sectional shape of the metal portion 13b may be a simple rectangle, but in this embodiment, as shown in an enlarged view of the cross section in FIG. 1 (c), a trapezoidal shape is used, and one opening (lower opening in the drawing) is the other. It is larger than the opening. With this configuration, when the substrate 17 is deposited on the second metal mask 13 and vapor deposition is performed, there is an advantage that vapor enters from the wide side opening and is uniformly deposited on the substrate 17. In FIG. 1, support portions 13c and 13c for connecting the holding portions 13B and 13B at both ends are formed on both sides of the blind portion 13A. The support portions 13c and 13c are provided to reinforce the blind portion 13A. That is, the interdigital portion 13A has a large number of metal portions 13b. However, since the metal portion 13b is extremely thin, the rigidity of the interdigital portion 13A is extremely low, and it becomes difficult to handle the interdigital portion 13A alone (they are deformed immediately). Therefore, the support portions 13c and 13c are formed on both sides to be reinforced. The wider the width of the support portion 13c, the greater the reinforcing effect. However, if the width is too large, the tension required to align the slits by pulling the second metal mask 13 must be extremely large, and workability is deteriorated. . In consideration of these, the width of the support portion 13c is preferably about 2 to 10 mm.
[0013]
In FIG. 1 to FIG. 4, the mask tension holding means 14 forms a fixed side mask clamp 20 and a bolt 21 for fixing the holding portion 13 </ b> B of one end of the second metal mask 13 to the base plate 12, and a window 18 of the base plate 12. The slider 23 is arranged on the opposite side of the fixed side mask clamp 20 with respect to the region being located, and is movable in a direction away from and closer to the fixed side mask clamp 20 and a guide fixed to the base plate 12 and holding the slider 23 movably. The second metal held by the rod 24, the moving side mask clamp 25 and the bolt 26 that fix the holding portion 13 </ b> B of the other end of the second metal mask 13 to the slider 23, and the fixed side mask clamp 20 and the moving side mask clamp 25. The slider 23 is fixed to the fixed mask mask so as to apply a desired tension to the mask 13. And a moving means 28 for moving away from the 20. The moving means 28 includes a support rod 29 fixed to the base plate 12, and an elastic means including a compression coil spring 30 held by the support rod 29 and disposed between the base plate 12 and the slider 23. A stopper 32 for preventing the slider 23 from coming off is attached to the tip of the guide rod 24. The substrate clamp means 15 includes a substrate clamp 34 and a bolt 35 that press the substrate 17 against the base plate 12 and fix it.
[0014]
Next, the operation of performing vacuum deposition on the substrate using the multi-face mask device 11 having the above configuration will be described. In a state where the second metal mask 13 is not attached to the base plate 12, the slider 23 is moved and held in a direction in which the compression coil spring 30 is compressed by a vise or the like. Next, the second metal mask 11 is placed on the base plate 12, and the blind portion 13 </ b> A is arranged at a position covering the entire window 18 and aligned with the window 18. In this state, one end of the second metal mask 13 is fixed to the base plate 15 by the fixed mask clamp 20, and the other end is fixed to the slider 23 by the moving mask clamp 25. Thereafter, the vise is released and the slider 23 is made movable. Thereby, the compression coil spring 30 pushes and moves the slider 23 outward, and applies a uniform tension to the second metal mask 13. Thus, the second metal mask 13 is in a state of being pulled with a uniform tension, and is held in a state where a large number of slits of the interleave portion 13A are straight and arranged at a constant pitch. Here, the blind portion 13A is formed in an area covering all the windows 18, and a large number of slits are formed uniformly in the entire area. Therefore, by applying tension to the blind portion 13A by the slider 23, the blind portion 13A is formed. Therefore, it is possible to apply a very uniform tension to each of the metal portions 13b, so that the slit accuracy can be maintained. In order to arrange the blind portion in each window 18 of the base plate 12, as shown in FIG. 9, the second metal mask 40 having the blind portion 40A formed only in the portion corresponding to each window is used as the second metal mask. It is also possible to use it. However, when the second metal mask 40 having this configuration is used, since the low-rigidity blind portion 40A and the high-rigidity partition portion 40B are mixed in one metal mask, a uniform tension is applied to all the blind portions 40A. This makes it difficult to cause distortion in the blind portion, and it is difficult to ensure the slit accuracy. Therefore, in the present invention, this configuration is not adopted, and as shown in the present embodiment, a second metal mask 13 provided with one interstitial portion 13A in a region that covers a plurality of windows is used. The second metal mask 13, since the uniformly formed blind portion 13A in a wide range, to eliminate this drawback, it is possible to easily secure a slit accuracy.
[0015]
As shown in FIG. 4, after attaching the second metal mask 13 to the base plate 12 and applying tension, the substrate 17 to be deposited is aligned on the second metal mask 13 as shown in FIG. Next, the substrate 40 is fixed to the base plate 12 by the substrate clamp 34. As described above, the second metal mask 13 is arranged on the substrate surface in a state where a large number of slits are held in a predetermined shape, and the base plate 12 having a large number of windows 18 is arranged on the surface. Thereafter, with the second metal mask 13 and the substrate 17 attached to the base plate 12, the whole is put into a vapor deposition machine, the window 18 is set toward the evaporation source, and vapor deposition is performed. As described above, vapor deposition is performed on the surface of the substrate 17 corresponding to each window 18 so as to correspond to the slits of the second metal mask 13, and high-definition patterning is performed by multi-cavity.
[0016]
In the above embodiment, a large number of windows 18 for regulating the deposition range are formed on the base plate 12 and the base plate itself is used as the first metal mask. However, the present invention is not limited to this configuration, and the deposition range is regulated. The first metal mask that forms a large number of windows may be formed as a separate part from the base plate and fixed to the base plate by spot welding, screwing, or the like. FIG. 5 is a schematic perspective view showing an embodiment in that case. In this embodiment, apart from the base plate 12A, a first metal mask 12B having a plurality of windows 18 for regulating the deposition range is used. A large opening 45 is formed in the base plate 12A in a region facing all the windows 18 formed in the first metal mask 12B. The first metal mask 12B is overlaid on the base plate 12A, and spot welding is performed. Alternatively, use it by fixing it with screws. The first metal mask 12B used here is formed of a metal plate much thinner than the base plate 12A, for example, a metal plate having a thickness of about 200 to 300 μm. Other configurations are the same as those of the embodiment of FIGS. In this embodiment, since a large number of windows 18 need only be formed in the first metal mask 12B made of a thin metal plate, the manufacturing can be performed in comparison with the case of forming the base plate 12 as in the embodiment of FIGS. The advantage of being easy is obtained.
[0017]
In the embodiment of FIG. 5, one large opening 45 is formed so that the entire window 18 can be exposed in the base plate 12A. However, the opening 45 may be divided into a plurality of openings. FIG. 6 shows an embodiment in that case, and four long openings 46 are formed in the base plate 12 </ b> C, and a partition 47 is left between the openings 46. Other configurations are the same as those of the embodiment of FIG. In this embodiment, since the partition portion 47 of the base plate 12C supports the first metal mask 12B, an advantage that the deflection of the first metal mask 12B can be suppressed is obtained.
[0018]
In each of the embodiments described above, in order to apply an appropriate tension to the second metal mask 13, the slider 23 that fixes one end of the second metal mask 13 is pressed by the compression coil spring 30. Instead of this, a tension spring or a leaf spring may be used. Moreover, in order to move the slider 23, you may use a volt | bolt etc. instead of using a spring. Furthermore, although the second metal mask 13 is fixed to the base plates 12, 12A, 12C, etc. by the fixed mask clamp 20, it may be fixed by spot welding or the like instead.
[0019]
【Effect of the invention】
As described above, the mask device of the present invention includes a first metal mask having a plurality of windows that regulate the deposition range, and one interdigital section formed in a region that covers the plurality of windows. there are a plurality of fine slits over the entire area of the blind section, of the blind portion of the parallel arrangement and configuration at a pitch corresponding to the number of pixels the organic EL device to be formed with the slit of the interdigital portion longitudinal In the production of organic EL elements, a second metal mask provided with holding portions provided at both ends is superposed, and the second metal mask is set in a state of being pulled in the longitudinal direction of the slit. Even in a high-definition mask in which very fine slits are arranged at fine intervals in a vacuum deposition process, the slits are kept straight and at a predetermined pitch. Can be multifaceted arranged on a surface, a high-definition pattern has an effect of high productivity formed in polygonal with on a substrate by vacuum evaporation.
[Brief description of the drawings]
FIG. 1A is a schematic perspective view showing an exploded main part of a multi-face mask device for vacuum deposition according to an embodiment of the present invention. FIG. 1B is a schematic perspective view showing the multi-face mask device in an assembled state. (C) Schematic cross-sectional view showing a part of a blind portion of a second metal mask used in the multi-face mask device in an enlarged manner. FIG. 2 shows the multi-face mask device shown in FIG. FIG. 3 is a schematic plan view showing the device shown in FIG. 2 in the direction of arrow AA. FIG. 4 is a diagram showing the multi-face mask device shown in FIG. FIG. 5 is a schematic perspective view showing the disassembled main parts of a multi-face mask device for vacuum deposition according to another embodiment of the present invention. FIG. 6 is a schematic perspective view according to still another embodiment of the present invention. The main parts of the multi-face mask device for vacuum deposition are disassembled and shown. FIG. 7 is a schematic perspective view showing an enlarged part of an organic EL element. FIG. 8 is a schematic plan view of a conventional metal mask. FIG. 9 is a schematic plan view showing an example of a multi-faced metal mask. Explanation of]
11 Multi-face mask device 12 Base plate (first metal mask)
12A, 12C Base plate 12B First metal mask 13 Second metal mask 13A Sanding portion 13B Holding portion 13a Slit 13b Metal portion 14 Mask tension holding means 15 Substrate clamping means 17 Substrate 20 Fixed side mask clamp 23 Slider 24 Guide rod 25 Moving side mask Clamp 28 Moving means 30 Compression coil spring 34 Substrate clamping means

Claims (4)

A multi-face mask device for vacuum vapor deposition used in a vacuum vapor deposition process in the manufacture of an organic EL element, wherein the base plate also serves as a first metal mask having a plurality of windows for regulating a vapor deposition range, and has a size covering the plurality of windows. a single blind portion formed in the region, and the blind end of a plurality of fine slits over the entire area of the blind portions and parallel arrangement at a pitch corresponding to the number of pixels the organic EL device to be formed structure A second metal mask provided with holding portions provided at both ends in the longitudinal direction of the slit of the blind portion, and the second metal mask with the blind portion positioned on the window and the slit of the slit. A multi-sided mask apparatus for vacuum deposition, comprising mask tension holding means for positioning on the base plate in a state of being pulled in a longitudinal direction. A multi-face mask device for vacuum vapor deposition used in a vacuum vapor deposition process in the manufacture of an organic EL element, which is formed in a first metal mask provided with a plurality of windows for regulating a vapor deposition range and a size covering the plurality of windows. a single blind portion which is, with the blind end of a plurality of fine slits over the entire area of the blind portions and parallel arrangement at a pitch corresponding to the number of pixels the organic EL device to be formed configuration, the blind A second metal mask provided with holding portions provided at both ends in the longitudinal direction of the slit of the part, and a base plate for supporting the first metal mask, wherein at least a region facing each window is more than the window A base plate having a large opening, the second metal mask, and a window of the first metal mask in which a blind portion is mounted on the base plate. Multi with mask device for vacuum evaporation having a mask tensile holding means is positioned on said base plate in a state of pulling in the longitudinal direction of and the slit is located above.   The mask tension holding means is disposed on a side opposite to the fixed side mask clamp with respect to the window, and a fixed side mask clamp that fixes a holding portion at one end of the second metal mask to the base plate, and the fixed side mask clamp Held by a slider movable in a direction away from and in a moving direction, a moving mask clamp for fixing the holding portion at the other end of the second metal mask to the slider, and the fixed mask clamp and the moving mask clamp 3. The multi-sided mask apparatus for vacuum evaporation according to claim 1, further comprising moving means for moving the slider in a direction away from the fixed-side mask clamp so as to apply a desired tension to the second metal mask. .   4. The multi-sided mask apparatus for vacuum evaporation according to claim 3, wherein the moving means is an elastic means for applying a spring force in a direction away from the fixed side mask clamp to the slider.

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