JP4853828B2 - Resist stripping / collecting system, resist separator and resist collecting tank used in the system - Google Patents

Description

  The present invention relates to a resist layer peeling / recovering apparatus, a resist separator used in the system, and a resist recovery tank used in the manufacture of semiconductor mounting components such as TAB tapes and lead frames, and more specifically, the resist layer. The present invention relates to a maintenance-free stripping / collecting system (apparatus) that can be easily recovered in a strip-like manner in a stripping process and can be easily recovered, and a resist separator and a resist recovery tank used in the system.

  Semiconductor device mounting components include TAB tapes and lead frames. These are mainly provided with a resist layer on the surface of the substrate, patterning the resist layer to create an etching mask, etching the exposed conductor layer portion to create a desired wiring portion, and then the remaining resist layer Is removed, and if necessary, plating is performed on a desired portion.

  By the way, in the process of peeling off the resist layer remaining after the etching, a method of spraying a peeling solution with a spray or the like is common. When the stripping solution is sprayed onto the resist layer, the resist layer swells, and the resist layer peels off from the substrate surface due to the stress generated at this time. At the same time, the swollen resist layer is crushed into fine fragments by the striking force of the spray. As a result, there is a problem in that finely broken pieces of the resist layer adhere to fine portions of the lead frame pattern and cause defects as foreign matter adhesion.

  In order to solve such problems, it has been studied to add an additive that makes the resist layer easily peeled off to the stripping solution, or to use a resist layer with a property that the stripped piece of the resist layer itself does not become small. Cost increases and not a realistic solution.

  On the other hand, components for mounting semiconductor elements such as printed wiring boards and lead films have been required to be finer in recent years as the density and size of semiconductor devices have increased, and the resist layer used has higher resolution. It is coming. For this reason, reduction of the cause of defects due to the finely crushed resist layer fragments has become more important.

  Under such circumstances, Japanese Patent Application Laid-Open No. 11-204917 discloses a main part of the immersion tank for the purpose of improving the resist stripping process, which has greatly reduced the yield of product yield, and improving the product yield. An infinite belt conveyor provided in the immersion tank; a supply roller provided at the entrance of the immersion tank for supplying the object to be processed onto the infinite belt conveyor; and an object discharge of the infinite belt conveyor. The workpiece passes from the upper surface of the belt conveyor to the upper side of the belt conveyor between the conveyor roller for conveying the workpiece on the upper surface of the infinite belt conveyor near the edge and the entrance end of the belt conveyor and the conveyor roller. A baffle plate provided so as to discharge the peeled resist layer in a direction that is approximately 90 degrees with respect to the traveling direction of the object to be processed, and a processing object discharge end side A receiving tank for receiving the stripping liquid discharged from the immersion tank in the discharge direction of the object to be processed, a pump for returning the stripping liquid of the receiving layer to the peeling liquid tank through the filter, and the immersion tank from the stripping liquid tank A supply pump for supplying the release liquid to the pipe, a pipe provided between the supply pump and the release liquid supply nozzle at the lower part of the immersion tank, and the belt conveyor, the transport roller, and the baffle plate from the supply pump. There is disclosed a resist stripping apparatus mainly composed of a pipe provided between a part and a supply pipe provided so that a stripping solution flows substantially perpendicular to the transport direction.

When stripping the resist, the apparatus carries the object to be processed on a belt conveyor and transports the resist in the stripping solution, bringing the resist tank of the object to be processed into contact with the stripping liquid without finely crushing the resist layer. The upper hand of the object to be processed is peeled off by the flow of the peeling liquid that is peeled off from the base material and is substantially perpendicular to the transporting direction formed by the part constituted by the belt conveyor, the transporting roller, and the baffle plate. The resist layer is discharged out of the system, and under the transfer surface, a flow of stripping solution that substantially matches the transport direction is created, and the resist layer on the lower side of the workpiece is received and the stripping solution in the layer is returned to the stripping solution tank It is going to discharge out of the system by the filter provided in front of the pump. The peeled upper resist layer is solid-liquid separated using a metal net, and the stripping solution is returned to the stripping solution tank.
JP 11-204917 A

  In the apparatus described in Japanese Patent Laid-Open No. 11-204917, the peeled upper-hand resist layer is in a block shape and is not necessarily discharged uniformly out of the system. An apparatus having an excessive capacity must be used as an apparatus for separation. In addition, the resist layer on the lower hand side is to be discharged out of the system by a check filter or the like provided in front of the pump for receiving the resist layer on the lower hand side of the object to be processed and returning the stripping solution to the stripping solution tank. There is a problem that the filter must be changed frequently.

  In addition, since the apparatus uses an infinite belt conveyor system, the apparatus becomes large-scale and requires a large investment, and the clogging of the belt makes it difficult for the stripping solution to enter the lower surface of the workpiece. However, there is a problem that the resist layer is not sufficiently swelled and a peeling failure is liable to occur, and that the entire apparatus must be stopped when the belt is replaced to prevent this.

  The present invention provides a resist stripping / collecting system capable of solving the above problems, a resist separator and a resist collecting tank used in the resist stripping / collecting system.

In order to solve the above problems, the resist stripping / collecting system of the present invention is configured such that a stripping solution is injected to separate the resist from the strip-shaped product being transported, and the product is immersed in the stripping solution. In order to separate the resist from the stripping solution tank or the individual product being transported, the stripping solution is injected, an externally driven roller conveyor that transports the individual product is placed inside, and the product is immersed in the stripping solution. A stripping solution tank configured so that the resist and stripping solution mixture separated from the product in the stripping solution tank flows in, and a resist separator that separates the resist and stripping solution that flows in, and the resist separator A resist recovery tank that separates the resist with some stripping solution from the flowed-in, separates the stripping solution from the flowed resist, and collects the resist;
It is characterized by having.

  Moreover, the resist separator used in the resist stripping / collecting system of the present invention is a reverse truncated square shape composed of mesh-like members that are separation plates, and the angle between each mesh-like member and the horizontal plane is 50- It is characterized by being 60 °.

  Further, it is preferable that a cleaning liquid nozzle pipe for injecting a cleaning liquid upward is disposed below the mesh-shaped member of the resist separator.

  Further, the resist recovery tank used in the resist stripping / collecting system of the present invention includes a resist slide provided with an inclined separating plate for separating the resist from the stripping solution, and a resist separated and disposed below the resist slide. And a resist collection net for collecting the resist.

  The resist collection tank is provided with a deceleration / decompression area having a liquid ejection port above the resist slide, which decelerates and depressurizes the resist and stripping solution flowing into the resist slide, and exits from the liquid ejection port. A rectifying plate for directing the resist and stripping solution flowing into the resist slide downward, and an upper L-shaped primary drain plate and a lower secondary solution disposed below the separation plate of the resist slide and deflecting the stripping solution It is preferable to further have a cutting plate.

  Furthermore, the angle between the separation plate and the vertical plane is 35 to 45 °, the angle between the separation plate and the arrangement plate is 20 to 30 °, and the separation plate and the primary liquid draining plate The angle formed is 20 to 30 °, and the angle formed between the separation plate and the secondary liquid draining plate is preferably 90 °.

  In the resist stripping / collecting system of the present invention, when the resist is separated from the strip-shaped product, by using a stripping solution tank for injecting the stripping solution and immersing the product being transported in the stripping solution, Since the endless belt conveyor is not used in the stripping solution tank, the endless belt conveyor can be easily configured and the endless belt conveyor is not corroded. Or when separating resist from individual products, an externally driven roller conveyor that conveys the individual products is placed inside, and peeling is performed to inject the stripping solution into the stripping solution. By using the liquid tank, it can be easily configured, and the problem of endless belt conveyor corrosion does not occur.

  Furthermore, in the resist stripping / collecting system of the present invention, resist separation is performed in two stages using a resist separator and a resist collection tank, so that the processing burden at the time of one-stage resist collection is reduced as in the prior art. Can be reduced.

  In the resist separator used in the resist stripping / collecting system of the present invention, the separation plate (mesh-like member) is configured with an optimum inclination angle (50 to 60 °) with respect to the horizontal plane, so that resist separation is efficiently performed. Can be done.

  The resist recovery apparatus used in the resist stripping / collecting system of the present invention uses a resist slide provided with an inclined separating plate, so that the resist can be separated efficiently, and further, an organizing plate, a primary liquid draining plate, a secondary liquid When the cut plate is provided, the efficiency can be improved, and further, the optimum efficiency can be obtained by appropriately selecting the inclination angle of these members.

  In the resist stripping / collecting system according to the present invention, a stripping solution is injected in order to separate the resist from the strip-shaped product being transported and the product is immersed in the stripping solution, or during transport The stripping solution is injected into the stripping solution to separate the resist from the individual product, and an externally driven roller conveyor for transporting the individual product is disposed therein, and the stripping solution is configured so that the product is immersed in the stripping solution. A resist separator that separates the resist and stripping solution separated from the product in the tank, a resist separator that separates the resist and stripping solution that has flowed in, and a slight strip that is separated from the resist separator. A resist collection tank is provided, in which a resist with a liquid is introduced, and the resist is collected by separating the stripping solution from the introduced resist.

  Moreover, the resist separator used in the resist stripping / collecting system of the present invention is a reverse truncated square shape composed of mesh-like members that are separation plates, and the angle between each mesh-like member and the horizontal plane is 50-60. °.

  In addition, the resist collection tank used in the resist stripping / collecting system of the present invention includes a resist slide having an inclined separating plate for separating the resist from the stripping solution, and a resist slide disposed below the resist slide and separated. A resist collection net for collection is provided.

Next, a resist stripping / collecting system according to an embodiment of the present invention, a resist separator used in the system, and a resist collecting tank will be described with reference to the drawings.
Example 1
FIG. 1 is a schematic block diagram showing the entire resist stripping / collecting system according to an embodiment of the present invention. 2A and 2B are views showing a product transport unit and a resist separator in the resist stripping / collecting system according to the first embodiment of the present invention, FIG. 2A is a top view thereof, and FIG. 2B is a front view thereof. FIG. 3 is a plan view showing details of the resist separator, and a front view and a side view thereof. 4 is a view showing a resist collection tank, FIG. 4a is a side view thereof, and FIG. 4b is a front view thereof. FIG. 5 is an enlarged side view showing only the main part of the resist collection tank.

  In FIG. 1, the stripping solution is supplied from the stripping tank 60 to the product conveying / stripping portion 10 using the stripping jet pump 84. A hoop-shaped (strip-shaped) lead frame (not shown), for example, is transported to the product transporting / peeling portion 10, and the resist (for example, dry film resist) is stripped from the product being transported by a stripping solution and stripped. The applied resist flows into the resist separator 20 together with the stripping solution.

  The resist separator 20 roughly separates the stripping solution and the resist. By roughly separating, the burden on the processing of the resist collection tank 40 described later can be reduced. The roughly separated resist is transferred to the resist collection tank 40 by the resist collection pump 82 together with a small amount of stripping solution. On the other hand, the separated stripping solution is returned to the stripping tank 60.

  In the resist collection tank 40, the resist and the stripping solution are almost completely separated. The separated resist is collected in a resist collection net (not shown in FIG. 1) in the resist collection tank. At that time, the slightly removed stripping solution is drained, and the separated stripping solution is Returned to the peeling tank 60.

  In addition, the arrow in FIG. 1 shows the direction of the flow of stripping solution or the mixture of a resist and stripping solution.

  Next, referring to FIG. 2, a product transfer / peeling portion and a resist separator are shown. In FIG. 2, the product transport / peeling portion 10 is provided with a stripping solution tank 12 for injecting a stripping solution and stripping the resist from the product. The product is carried in the direction of arrow A, the resist is peeled off in stripping solution tank 12, and is carried out in the direction of arrow B. The stripping solution is injected into the stripping solution tank 12 as indicated by an arrow C, flows in the direction indicated by the arrow D together with the stripped resist, and flows into the resist separator 20.

  As will be described later with reference to FIG. 3, the resist separator 20 is made of mesh stainless steel. Below the resist separator 20 is provided a cleaning shower (resist separator cleaning nozzle pipe) 30 for spraying a cleaning liquid upward in order to prevent clogging of the resist separator due to the resist. The resist separated by the resist separator 20 is transferred to a resist collection tank 40 (see FIG. 1) by a resist collection pump 82 (see FIG. 1) through a pipe 32 provided at the bottom thereof. On the other hand, the stripping solution separated by the resist separator 20 is transferred to the stripping tank 60 (see FIG. 1) through the pipe 34.

  Referring now to FIG. 3, a resist separator is shown. In FIG. 3, the resist separator 20 has a reverse truncated quadrangular pyramid shape composed of separation plates 22, 24, 26 and 28, and each separation plate is made of, for example, 100 mesh stainless steel. And it is very preferable that the angle which each separator plate makes with a horizontal surface is 50-60 degrees. The reason is that if it is 50 ° or less, the flow of the resist is slow and tends to accumulate at the bottom, making it difficult to transfer to the resist collection tank 40 (see FIG. 1). This is because it flows into the bottom without being separated.

  Next, referring to FIGS. 4 and 5, a resist collection tank is shown. 4 and 5, the resist separated from the resist separator 20 (see FIGS. 1 to 3) is accompanied by a resist recovering pump 40 (see FIG. 1). A gentle flow passes through the decompression area 42 and flows out of the liquid ejection port 42a. A resist slide 44 for further separating the resist and the stripping solution is disposed downstream of the liquid ejection port 42a in an inclined state. A separation plate 48 made of, for example, 100 mesh stainless steel is provided at the bottom of the resist slide 44 to separate the resist. The angle formed by the separation plate 48 with respect to the vertical plane is extremely preferably 35 to 45 °. The reason is that if it is 35 ° or less, the flow of the resist becomes too slow, and stagnation or clogging is likely to occur. If it is 45 ° or more, the stripping solution is not sufficiently separated and flows into the resist collection net 54 described later. It is easy.

  A rectifying plate 46 is provided above the separation plate 48 and in front of the liquid ejection port 42a. The angle between the rectifying plate 46 and the resist slide 44 (separation plate 48) is preferably selected from 20 to 30 ° so that the resist is directed downward and slid on the separation plate 48 of the resist slide 44 without stagnation. In addition, an L-shaped primary liquid cutting plate 50 and a secondary liquid cutting plate 52 are provided on the lower side of the separation plate 48 on the lower side and the lower side so that the stripping solution does not flow into the resist collection net. ing. The angle formed by the primary liquid cutting plate 52 and the separation plate 48 is preferably selected from 20 to 30 °, and the angle formed by the secondary liquid cutting plate 54 and the separation plate 48 is preferably selected by 90 °.

A resist collection net 54 is disposed below the lower end of the separation plate 48 of the resist slide 44. The resist collection net can be multiplexed (for example, double) to reduce the amount of unrecovered resist.
(Example 2)
Example 2 is applied when the product from which the resist is peeled is not a belt-like product, but is intended for individual separated products. 6A and 6B are views showing a product transport unit and a resist separator in the resist stripping / collecting system according to the second embodiment of the present invention, FIG. 6A is a top view thereof, and FIG. 6B is a front view thereof.

In FIG. 6, a roller conveyor 90 for conveying the product is disposed inside the stripping solution tank 12. Each roller of the roller conveyor 90 is provided with a drive unit outside the stripping solution tank 12 to prevent corrosion due to the stripping solution. Since other configurations are the same as those in the first embodiment, detailed description thereof is omitted.
(Evaluation)
As a result of conducting an experiment using the resist stripping / collecting system of Example 1 of the present invention, there was no contamination of the resist piece in the stripping solution after passing through the resist collecting apparatus, and the resist and stripping solution were completely separated. It was found that there was no resist clogging and damage or failure of the main unit.

It is a schematic block diagram which shows the whole resist peeling and collection | recovery system of the Example of this invention. It is a figure which shows the product conveyance part and the resist separator in the resist peeling and collection | recovery system of Example 1 of this invention, FIG. 2a is the top view, FIG. 2b is the front view. It is the top view which shows the detail of a resist separator, the front view, and the side view. It is a figure which shows a resist collection tank, FIG. 4a is the side view, and FIG. 4b is the front view. It is a side view which expands and shows only the principal part of a resist collection tank. It is a figure which shows the product conveyance part and resist separator in the resist peeling and collection | recovery system of Example 2 of this invention, FIG. 6a is the top view, FIG. 6b is the front view.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Resist peeling / recovery system 12 Stripping liquid tank 20 Resist separators 22, 24, 26, 28 Separating plate 30 Cleaning liquid nozzle piping 32 Piping 34 Piping 40 Resist collecting tank 42 Deceleration / decompression area 44 Resist slide 46 Rectification plate 48 Separating plate 50 Primary liquid cutting plate 52 Secondary liquid cutting plate 54 Resist collection net 60 Peeling tank 82 Resist collection pump 84 Stripping liquid injection pump
90 Roller conveyor

Claims (6)

In order to separate the resist from the stripping solution tank that is configured to inject the stripping solution to separate the resist from the strip-shaped product being transported and to be immersed in the stripping solution, or from the individual products being transported A stripping solution tank in which an externally driven roller conveyor for conveying individual products is disposed inside, and the product is immersed in the stripping solution;
A resist separator that separates the resist and the stripping solution into which the mixture of the resist and the stripping solution separated from the product in the stripping solution tank flows;
A resist recovery tank that separates the resist from the resist separator and with a slight amount of stripping solution flows in, separates the stripping solution from the resist that flows in, and collects the resist;
A resist stripping / collecting system comprising: In the resist stripping / collecting system according to claim 1,
The resist separator is in the shape of a reverse truncated square composed of mesh-like members that are separator plates, and the angle between each mesh-like member and the horizontal plane is 50 to 60 °. Collection system. In the resist stripping / collecting system according to claim 2,
A resist stripping / collecting system, wherein a cleaning liquid nozzle pipe is disposed below the mesh-shaped member of the resist separator for spraying a cleaning liquid upward toward the member. In the resist stripping / collecting system according to claim 1,
The resist collection tank has a resist slide having an inclined separating plate for separating the resist from the stripping solution, and a resist collection net disposed under the resist slide and for collecting the separated resist. Features a resist stripping and recovery system. In the resist stripping / collecting system according to claim 4,
The resist collection tank includes a deceleration / decompression area having a liquid ejection port above the resist slide, which decelerates and depressurizes the resist and stripping solution flowing into the resist slide, and a resist slide that exits from the liquid ejection port. A rectifying plate for directing the resist and stripping liquid flowing into the substrate downward, and an upper L-shaped primary liquid cutting plate and a lower secondary liquid cutting plate which are arranged below the separation plate of the resist slide and deflect the stripping liquid And a resist stripping / recovering system. In the resist stripping / collecting system according to claim 5,
The angle between the separation plate and the vertical plane is 35 to 45 °, the angle between the separation plate and the arrangement plate is 20 to 30 °, and the angle between the separation plate and the primary liquid draining plate is A resist stripping / collecting system, characterized in that the angle formed by the separation plate and the secondary liquid cutting plate is 90 °, and is 20-30 °.