JP4851670B2 - Substrate processing method, substrate processing apparatus, semiconductor device manufacturing method, and substrate transfer method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a method for processing a substrate using a plurality of boats in which the processing quality is stabilized and enhanced by eliminating the difference of processing quality based on the individual difference of the boats. SOLUTION: The method for processing a substrate comprises a reaction furnace 11, a plurality of boats 21a and 21b, and a means for identifying the boat wherein a substrate is processed by specifying a boat depending on the content of processing.

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate processing method for manufacturing a semiconductor device by performing various processes such as film formation, annealing, and diffusion on a substrate to be processed such as a silicon wafer and a glass substrate, and in particular, two or more boats are used. The present invention relates to a processing method in a substrate processing apparatus.
[0002]
[Prior art]
As a processing apparatus for processing a substrate, a vertical type reactor is provided, and a batch-type reactor that processes a predetermined number of substrates to be processed (hereinafter referred to as wafers) in a horizontal posture on a boat in multiple stages in the reactor. There is a substrate processing apparatus.
[0003]
Furthermore, there are some equipped with a plurality of boats for the purpose of improving the throughput.
[0004]
For example, there is an apparatus of this type described in Japanese Patent No. 2681055.
[0005]
In the apparatus described in Japanese Patent No. 2681055, a boat exchange device is disposed between the wafer transfer device and the space directly below the reaction furnace, and two units are provided on the rotary table of the boat exchange device. The two boats are rotated by 180 degrees around the rotary table so that the boat holding the unprocessed wafer and the boat holding the processed wafer are exchanged. .
[0006]
In such a substrate processing apparatus, while processing is being executed for one boat, the processed wafer is discharged by the wafer transfer device and the unprocessed wafer is transferred to the other boat. Preparation for the next processing step is performed, and the processing time is shortened as a whole.
[0007]
[Problems to be solved by the invention]
When multiple boats are used, each boat is identical in design, but the purity of the materials that make up the boat, and because the boats are used repeatedly, the adhesion state of impurities is different between boats. There are individual differences. For this reason, compatibility between the contents of the substrate processing and the boat occurs, and when a substrate is processed, the processing result may differ slightly depending on the boat.
[0008]
Conventionally, the individual difference of boats and the contents of processing are not considered, and there is a problem that processing quality is uneven depending on the boat used.
[0009]
In view of such circumstances, the present invention eliminates differences in processing quality based on individual differences between boats, and stabilizes and improves processing quality.
[0010]
[Means for Solving the Problems]
The present invention includes a reaction furnace, a plurality of boats for holding a substrate in the reaction furnace, and a boat identification unit, and a substrate for performing substrate processing by designating a boat according to the contents of the substrate processing This relates to the processing method.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0012]
A substrate processing apparatus 1 according to the present embodiment is a vertical diffusion / CVD apparatus (hereinafter referred to as a CVD apparatus) having a vertical reaction furnace 11 inside a housing 2 as shown in FIG. A transfer stage 8 for transferring a substrate storage container 50 (for example, a pod 50 such as a wafer cassette or a FOUP (front opening unified pod)) is provided on the front surface of the housing 2. The substrate transfer machine 41 is provided on the side (right side as viewed from the front) so as to face the transfer stage 8, and the boat elevator 20 is provided on the right side in the housing behind the substrate transfer machine 41. A heat treatment stage 4 is provided immediately below the vertical reaction furnace 11, and the boat elevator 20 loads the boat 21 into the vertical reaction furnace 11 from the position of the heat treatment stage 4, and from the vertical reaction furnace 11. The heat treatment stage 4 is drawn out. A boat transfer device 30 is provided opposite to the boat elevator 20. The boat transfer device 30 includes a standby stage 5 and a cooling stage 6 at the front and rear, and transfers the boat 21 between the standby stage 5, the cooling stage 6, and the heat treatment stage 4.
[0013]
The vertical reaction furnace 11 has a celestial cylindrical heater unit 18 and a quartz reaction tube 13 concentric with the heater unit 18, and the reaction tube 13 defines a reaction chamber 12. The reaction tube 13 is supported by the housing 2 via a furnace port flange 14, and the reaction tube 13 is provided with a gas introduction tube 17 that opens above the reaction chamber 12. An exhaust pipe 16 is provided. The gas introduction pipe 17 is connected to a gas supply source (not shown) for supplying a gas such as a raw material gas or nitrogen gas, and the exhaust pipe 16 is a vacuum for maintaining the reaction chamber 12 at a predetermined pressure. It is connected to an exhaust device (not shown).
[0014]
The pod 50 is a hermetic transport container that is transported in a state where a predetermined number (for example, 25) of wafers as processing substrates are accommodated, and has a lid that can be opened and closed.
[0015]
When the pod 50 is used as a wafer transfer container, since the wafer is transferred in a sealed state, the cleanliness of the wafer is maintained even if particles are present in the surrounding atmosphere. can do. Accordingly, since it is not necessary to set the cleanliness in the clean room where the CVD apparatus is installed, the cost required for the clean room can be reduced.
[0016]
As shown in FIG. 3, the boat 21 has a lower end plate 22 and an upper end plate 23 supported by a plurality of (three in this embodiment) support columns 24 erected on the lower end plate 22. The support 24 is formed with substrate holding grooves 25 at a required pitch, and the wafer 7 is inserted into the substrate holding grooves 25 so that the wafer 7 is held in the horizontal position on the boat 21. A heat insulating cap portion 26 is formed below the lower end plate 22 of the boat 21, and a base 29 is provided below the heat insulating cap portion 26 via a leg column 27. An arm of a boat transfer device 30 (to be described later) can be fitted in a gap between the base 29 and the heat insulating cap portion 26 formed by the pedestal 27.
[0017]
The transfer stage 8 is for transferring the pod 50 to the outside of the substrate processing apparatus 1 and includes a door opening / closing device (not shown) for opening and closing a lid (not shown) of the pod 50. is doing.
[0018]
The substrate transfer machine 41 has an elevator 42 having a feed screw mechanism, a lift base 43 that is lifted and lowered by the elevator 42, a rotary table 44 that is rotatably provided on the lift base 43, and can be moved back and forth to the rotary table 44. The substrate transfer head 46 is provided with a substrate transfer plate 47 for holding the wafer 7 in a vertical direction (five steps in the present embodiment). It has been. Thus, the substrate transfer machine 41 can transfer the wafer 7 between the pod 50 of the transfer stage 8 and the boat 21 in the lowered state positioned on the heat treatment stage 4 by the cooperation of raising, lowering, rotating, and retreating. It has become.
[0019]
The boat elevator 20 can move the cap 19 up and down by a feed screw mechanism, and the boat 21 is placed on the cap 19. The boat 21 is moved up and down to the boat elevator 20 through the cap 19, and the heat treatment is performed. The vertical reaction furnace 11 is charged from the position of the stage 4 and drawn out from the vertical reaction furnace 11 to the heat treatment stage 4. Further, the cap 19 hermetically closes the furnace port of the vertical reaction furnace 11 in a state where the boat 21 is loaded in the vertical reaction furnace 11.
[0020]
The boat transfer device 30 is shown in detail in FIG.
[0021]
A vertical guide shaft 36 is provided on a frame 35 having a U-shape and standing along the wall surface of the housing 2, and a lower slider 37 and an upper slider 38 are slidably provided on the guide shaft 36. ing. The upper slider 38 is connected to a feed screw mechanism 39 in which a screw rod is rotated by a motor, and the upper slider 38 can be moved up and down by the feed screw mechanism 39. The upper slider 38 is provided with an upper arm 32 bent in a crank shape via a rotary actuator 40 such as a rotary air cylinder or a rotary solenoid, and the upper arm 32 can be rotated at least 180 ° by the rotary actuator 40. ing.
[0022]
Also, the lower slider 37 has the same configuration, and the feed screw mechanism 39 is connected, and the lower arm 31 is provided on the lower slider 37 in a crank shape via the rotary actuator 40. The lower arm 31 and the upper arm 32 are shaped so as not to interfere with each other when rotated.
[0023]
The horizontal portions of the lower arm 31 and the upper arm 32 are both formed in an arc shape, and can be fitted into the gap formed by the pedestal 27. In the fitted state, the heat insulating cap portion 26 is in the lower part. The boat 21 is placed on the arm 31 and the upper arm 32, and the boat 21 is vertically supported by the lower arm 31 and the upper arm 32.
[0024]
The standby stage 5 is provided with a standby table 33 that vertically supports the boat 21, and the lower arm 31 supports the boat 21 with a cap of the standby table 33 and the heat treatment stage 4 by cooperation of rotation and elevation. It is comprised so that it may transfer between. A cooling table 34 is installed on the cooling stage 6, and the upper arm 32 is configured to transfer the boat 21 between the cooling table 34 and the cap 19 of the heat treatment stage 4 by cooperation of rotation and elevation. It is configured.
[0025]
A clean unit 3 provided on a side surface of the housing 2 and an exhaust fan 9 disposed at a position facing the clean unit 3 are placed in the housing 2 from the standby stage 5 and the cooling stage 6 to the heat treatment stage. A one-way flow of clean air 15 flowing through 4 is formed.
[0026]
FIG. 5 is a block diagram showing the control system.
[0027]
The control system 60 shown in FIG. 5 includes a main controller 66 constructed by a computer and a plurality of sub-controllers 61, 62, 63, 64.
[0028]
The sub-controller includes a temperature control sub-controller 61 that controls the temperature of the reaction chamber 12, a pressure control sub-controller 62 that controls the pressure of the reaction chamber 12, and a gas that controls the gas flow rate such as source gas, carrier gas, and purge gas. A control sub-controller 63 and a machine control sub-controller 64 for controlling machines such as various elevators, the boat transfer device 30 and the substrate transfer machine 41 are constructed. These sub-controllers 61, 62, 63, Reference numeral 64 is connected to the main controller 66 through a control network 65.
[0029]
The main controller 66 is connected to a control console 67 as a display means and an input means (user interface) and a storage device 68 such as a hard disk. The storage device 68 includes a control sequence program 86 for performing substrate processing, and various types. A processing condition input program 87 for setting various processing conditions before the start of processing, a display program 88 for displaying the progress of substrate processing and the like on the display 67a, a recipe, and the like are stored.
[0030]
The control console 67 includes the display 67a, a keyboard and a mouse (not shown), and displays the contents of recipes (item names, numerical values of control parameters, etc.), the progress of processing, etc. on the display 67a. In addition, it is configured to transmit an operator's command by a keyboard or a mouse.
[0031]
The main controller 66 is constructed (programmed) with a boat identification unit 71 of boat identification means for identifying each boat, and a boat detection device 72 for boat identification is connected to the boat identification unit 71. The boat identification unit 71 is configured to identify each boat based on the detection result of the boat detection device 72, and the main controller 66 corresponds to each boat based on the identification result of the boat identification unit 71. This command is sent to the sub-controllers 61, 62, 63, 64.
[0032]
The boat detection devices 72 are respectively installed on the standby table 33, the cooling table 34 and the cap 19, and each boat detection device 72 is connected to the boat identification unit 71 of the main controller 66. Since the configurations of the boat detection devices 72 installed on the standby table 33, the cooling table 34, and the cap 19, respectively, are substantially the same, the boat detection device 72 is shown in the standby mode shown in FIGS. What was installed in the stand 33 is demonstrated.
[0033]
On the upper surface of the standby table 33, three alignment grooves 81 having a reverse trapezoidal cross section are radially arranged and engraved in a direction in which the central angle is divided into three equal parts from the center of the upper surface of the standby table 33. Yes. A recess 80 is formed in the standby table 33 from the peripheral surface toward the center, and the cross section of the standby table 33 is shaped like a work. One of the three alignment grooves 81 is provided with a presence / absence detection unit 73 and a detection unit for identification 74, and the presence / absence detection unit 73 and the detection unit for identification 74 form the boat detection device 72. Since the presence / absence detection unit 73 and the identification detection unit 74 have the same structure, the identification detection unit 74 will be described.
[0034]
A holding hole 75 is formed in the alignment groove 81 in the vertical direction, and a plug 76 is vertically provided in the holding hole 75, and the plug 76 is urged upward by a spring 77. Further, the plug 76 is pushed downward so that its lower end can project into the recess 80. A limit switch 78 is arranged so as to be concentric with the plug 76, and the actuator of the limit switch 78 is in contact with the lower end of the plug 76. The plug 76 is formed of a material having heat resistance and wear resistance such as fluorine resin.
[0035]
A recess 84 is formed on the lower surface of the base 29, and the inner peripheral surface of the recess 84 has a reverse taper shape so as to engage with the outer peripheral surface of the standby table 33. Further, on the bottom surface of the concave portion 84, three alignment projections 82 project downwardly at three equally divided positions on the same circumference, and the alignment projections 82 are formed in the alignment groove 81. It is formed in a truncated conical shape corresponding to an inverted trapezoid, and the alignment projection 82 and the alignment groove 81 can be fitted in a state where the base 29 and the standby table 33 are fitted.
[0036]
Further, the bottom surface of the recess 84 is covered at a position on the same radius passing through one of the positioning protrusions 82 and at the same distance from the center point as the presence / absence detection unit 73 and the identification detection unit 74. A detector 79 is provided. The detected element 79 is shaped so as to press only the plug 76 without contacting the alignment groove 81 so as not to impair the alignment function of the alignment protrusion 82. The to-be-detected element 79 is screwed onto the lower surface of the base 29 formed of quartz or silicon carbide (SiC) and is detachable.
[0037]
Thus, the limit switch 78 is set only when the boat 21 is placed on the stand 33 in a state where the detected element 79 matches the position of the presence / absence detecting unit 73 and the detecting unit 74 for identification. Operate.
[0038]
An outer detection element 79a corresponding to the identification detection unit 74 is attached to one boat (hereinafter referred to as a first boat) 21a, but the other boat (hereinafter referred to as a second boat) 21b. Is not installed. Therefore, it can be determined that the first boat 21a is detected when the identification detecting unit 74 detects the detected element 79, and the second boat 21b is determined when the identification detecting unit 74 does not detect the detected element 79a. can do.
[0039]
Further, the presence / absence detecting unit 73 can detect whether or not the boat 21 is mounted on the standby table 33 by detecting an inner detection element 79b. Further, the detection element 79b is fitted in the alignment groove 81, and the presence / absence detection unit 73 detects the detection element 79b on the inner side, whereby the standby table 33, the cooling table 34, etc. of the boat 21 are detected. It also has a function for determining the orientation with respect to and a function for determining whether the orientation is correct.
[0040]
Hereinafter, a substrate processing method using the above-described substrate processing apparatus will be described.
[0041]
When the substrate processing in which the individual difference of the boats 21 affects the processing quality is executed, a boat suitable for the processing is selected from the first boat 21a and the second boat 21b as processing conditions.
[0042]
A processing condition input program 87 is activated from the control console 67. The display program 88 is activated simultaneously with the activation of the processing condition input program 87, and the transfer table editing screen 89 shown in FIG. 8 is displayed on the display 67a.
[0043]
In the transfer table edit screen 89, the file name 91 of the table of the transfer table edit screen 89 is shown. Various settings necessary for processing are performed on the transfer table editing screen 89.
[0044]
The wafer charge command input unit 92 sets whether to charge or discharge various wafers such as a dummy wafer, a monitor wafer, and a product wafer. The time input unit 93 sets the cooling time of the processed wafer. The start condition setting unit 94 sets whether the wafer transfer / batch process is started manually or automatically. The boat designation unit 95 sets which of a plurality of boats is designated to execute the substrate processing or whether to execute the processing without designation.
[0045]
Further, although not shown, a recipe corresponding to the substrate processing is designated.
[0046]
When the processing conditions are set, the control sequence program 86 is activated.
[0047]
The designated recipe is read from the storage device 68, developed in the RAM of the main controller 66, and executed by being instructed to the sub-controllers 61, 62, 63, 64.
[0048]
Before the substrate processing is executed, it is determined whether or not a boat is designated on the transfer table editing screen 89, and the substrate processing is performed according to the determination result.
[0049]
As shown in FIG. 1, the first boat 21 a is placed on the standby stage 33 of the standby stage 5, and the second boat 21 b is placed on the cooling stage 34 of the cooling stage 6. To do. Since the detected element 79a is attached to the first boat 21a and the detected element 79a is not attached to the second boat 21b, the limit switch 78 of the boat detecting device 72 of the standby table 33 is operated. However, the limit switch 78 of the boat detection device 72 of the cooling table 34 is not activated. The operation state of each boat detection device 72 is monitored by the boat identification unit 71, and the main controller 66 determines where the first boat 21a and the second boat 21b are located.
[0050]
As shown in FIG. 9, when the processing sequence is started, it is determined whether or not the target wafer can be transferred to the boat 21. That is, it is determined whether the pod 50 in which a predetermined wafer is housed is placed on the transfer stage 8 or whether the lid of the pod 50 is opened and the wafer transfer preparation is completed.
[0051]
Next, it is sequentially judged whether there is an empty boat or whether a boat is designated.
If it is determined that there is an empty boat when no boat is specified, the main controller 66 issues a drive command for the substrate transfer machine 41 to the machine control sub-controller 64 without identifying the boat, Transfer processing of the wafer 7 from the pod 50 to the boat 21 of the standby stage 5 by the substrate transfer machine 41 is started.
[0052]
When a boat is designated, whether or not an empty boat is a designated boat is determined based on the judgment of the boat identification unit 71. When the empty boat is the designated boat, that is, as shown in FIG. 1, when the designated boat is the first boat 21a and the first boat 21a is empty, the substrate transfer is performed as described above. Transfer processing of the wafer 7 from the pod 50 to the first boat 21a of the standby stage 5 by the mounting machine 41 is started.
[0053]
If there is no empty boat, but there is an empty boat but it is not a designated boat, the transfer process of the wafer 7 is not executed, and it is displayed on the display 67a that there is no applicable condition. The operator selects, based on the information displayed on the display 67a, whether to perform other substrate processing that does not require the boat designation, or to continue other substrate processing until the designated boat becomes empty. Do.
[0054]
When the transfer process of the wafer 7 is performed and the transfer of all the scheduled wafers 7 is completed, the state shown in FIG. 1 is obtained. FIG. 1 shows a state where the second boat 21b holding the processed wafer is cooled by the cooling stage 6 for convenience.
[0055]
When the transfer is completed, the next control sequence is sequentially executed.
[0056]
Since the boat detecting device 72 is provided for each stage, it can be easily determined which boat is in which position. The determination result is displayed on the display 67a. That is, the display program 88 is activated in a state where the substrate processing is being performed, and the processing status is displayed on the display 67a.
[0057]
FIG. 10 shows a display screen 96 displayed during substrate processing.
[0058]
Although details are omitted on the display screen 96, for example, the boat display portion 97 shows the state of the boat as an illustration so that it is possible to immediately determine which boat is in which position and which state. In addition, the file name of the recipe being executed, the pressure being processed, the temperature, etc. are displayed.
[0059]
The following describes the substrate processing that is subsequently performed when the first boat 21a is designated.
[0060]
When the designated number of wafers 7 are loaded on the first boat 21 a on the standby stage 5, the first boat 21 a is moved from the standby stage 5 to the heat treatment stage 4 by the lower arm 31 of the boat transfer device 30. It is transferred and transferred onto the cap 19. The lower arm 31 that has transferred the first boat 21 a to the cap 19 returns to the standby stage 5.
[0061]
Since the boat detection device 72 and the alignment groove 81 are also arranged in the cap 19 in the same manner as the standby table 33, the first boat 21a transferred to the cap 19 is accurately aligned, The boat identification unit 71 confirms the presence or absence and identifies the boat. The main controller 66 commands a control condition corresponding to the first boat 21a to the temperature control sub-controller 61, the pressure control sub-controller 62, the gas control sub-controller 63, and the machine control sub-controller 64.
[0062]
The first boat 21 a is raised by the boat elevator 20 and carried into the reaction chamber 12 of the vertical reactor 11. When the first boat 21a is completely charged, the cap 19 closes the reaction chamber 12 in an airtight manner.
[0063]
The reaction chamber 12 is evacuated to a predetermined degree of vacuum through the exhaust pipe 16 and is uniformly heated to a predetermined processing temperature (for example, 800 to 1000 ° C.) by the heater unit 18. When the temperature of the reaction chamber 12 is stabilized, a processing gas is supplied to the reaction chamber 12 through the gas introduction pipe 17 at a predetermined flow rate. The supplied processing gas is activated by heating, and a predetermined film forming process is performed on the wafer 7.
[0064]
During the film forming process for the first boat 21a, the second boat 21b is transferred onto the standby stage 33 of the standby stage 5 by the boat transfer device 30, and the wafer 7 of the pod 50 is transferred to the second boat. 21b is transferred by the substrate transfer device 41.
[0065]
At this time, since the three alignment protrusions 82 projecting from the base 29 of the second boat 21b are respectively fitted in the three alignment grooves 81 of the standby table 33, the second boat 21b is in the standby state. The axis is accurately aligned with the table 33, and the direction is in a direction specified in advance. Thus, the transfer operation of the wafer 7 to the second boat 21b by the substrate transfer device 41 is properly executed.
[0066]
Since the detected element 79a corresponding to the detection unit 74 for identification is not attached to the base 29 of the second boat 21b, the boat detecting device 72 detects the detected element 79b. It will not be detected. Thus, the boat identification unit 71 determines that the boat is the second boat 21 b and transmits the determination result to the main controller 66. The main controller 66 confirms that the second boat 21b is present on the standby stand 33, stores it in the storage device 68, and displays the state on the display 67a.
[0067]
When the second boat 21b is empty and is a boat suitable for the next batch processing, when the target wafer is transferred and the processed wafer is held in the above-described procedure, After the processed wafers are discharged from the two boats 21b to the pod 50, the wafers 7 are transferred to the second boat 21b.
[0068]
When the substrate processing on the first boat 21 a is completed, the first boat 21 a is lowered by the boat elevator 20, and the first boat 21 a is pulled out from the reaction chamber 12 of the vertical reaction furnace 11. The first boat 21a after processing (including the group of held wafers 7) is in a high temperature state.
[0069]
The processed first boat 21 a is immediately transferred from the heat treatment stage 4 to the cooling stage 6 by the upper arm 32. Here, since the boat detecting device 72 and the alignment groove 81 are also arranged in the cooling table 34 in the same manner as the standby table 33, the first boat 21a transferred to the cooling table 34 is accurately set. The position is aligned, the presence or absence is confirmed and identified by the boat identification unit 71.
[0070]
The cooling stage 6 is located in the vicinity of the clean unit 3, and the first boat 21 a in a high temperature state is extremely effectively cooled by the clean air 15 blown out from the clean unit 3.
[0071]
The first boat 21 a cooled to, for example, 150 ° C. or less on the cooling table 34 is transferred to the standby stage 5 via the heat treatment stage 4 by the boat transfer device 30. During this time, the transfer of the unprocessed wafers 7 to the second boat 21b is completed, and the charging to the vertical reactor 11 is also completed.
[0072]
When the first boat 21a is returned to the standby table 33, the substrate transfer machine 41 receives the processed wafer 7 from the first boat 21a and transfers it to the pod 50 of the transfer stage 8. Also in this case, both the presence / absence detection unit 73 and the detection unit 74 for identification are in a state where both the detected elements 79a and 79b of the base 29 are detected. The boat 21a is determined and the determination result is transmitted to the main controller 66. The main controller 66 stores the determination result in the storage device 68 and displays it on the display 67a.
[0073]
Thereafter, when the boat 21 corresponding to the process is designated or not designated, the substrate processing by the first boat 21a and the second boat 21b is repeated according to the designated condition.
[0074]
Although the limit switch 78 is used in the boat detection device 72, a detector such as an ultrasonic sensor may be used, and the position where the detected element 79 is provided is not the bottom surface but the peripheral surface of the base 29. May be. Furthermore, in the above embodiment, the boat detection device 72 is provided for each stage on which the boat is placed. However, as described above, the signal from the boat detection device 72 and the identification result of the boat identification unit 71 are time-series. Since the state of the boat can be determined by storing in the storage device 68, the boat detection device 72 may be provided at one location.
[0075]
【The invention's effect】
As described above, according to the present invention, a reaction furnace, a plurality of boats for holding a substrate in the reaction furnace, and an identification means for the boat are provided, and the boat is designated according to the contents of the substrate processing. Therefore, the substrate processing is performed, so that the difference in processing quality based on individual differences among boats can be eliminated, and the processing quality can be stabilized and improved.
[Brief description of the drawings]
FIG. 1 is an overall perspective view of a substrate processing apparatus in which the present invention is implemented.
FIG. 2 is a plan sectional view of the substrate processing apparatus.
FIG. 3 is an elevational sectional view of the substrate processing apparatus.
FIG. 4 is a perspective view of a boat transfer device of the substrate processing apparatus.
FIG. 5 is a block diagram showing a control system.
6A and 6B show boat identification means, where FIG. 6A is a plan view of a stand, FIG. 6B is a view taken along the line BB in FIG. 5A, and FIG. 6C is a view taken along the line CC in FIG. (D) is a bottom view of the base of the boat, and (e) is an EE arrow view of (d).
FIGS. 7A and 7B are diagrams for explaining the operation of the boat identification means, where FIG. 7A is a partially cut front view, FIG. 7B is a view taken along the line B-B in FIG. Arrow view, (d) is a DD arrow view of (a).
FIG. 8 is a diagram showing a transfer table editing screen.
FIG. 9 is a flowchart of a transfer operation associated with boat determination.
FIG. 10 is a diagram of a display screen showing a state during processing.
[Explanation of symbols]
1 Substrate processing equipment
5 Standby stage
6 Cooling stage
7 Wafer
8 Transfer stage
11 Vertical reactor
19 cap
20 boat elevator
21 boats
30 Boat transfer device
33 stand
34 Cooling stand
66 Main controller
67 Control console
68 Storage device
71 Boat identification part
72 Boat detector
73 Presence / absence detector
74 Detection unit for identification
81 Alignment groove
86 Control sequence program
87 Processing condition input program
88 display program

Claims (7)

  A reaction furnace, a plurality of boats for holding a substrate in the reaction furnace, and an identification means for the boat; the boat is designated according to the individual difference of the boat and the content of the recipe; A substrate processing method for carrying out substrate processing by carrying a boat specified in the inside.   A plurality of boats for holding the substrate in the reaction furnace, and an identification means for the boat, the boat is designated according to the purity of the material of the boat and the contents of the recipe, and is designated in the reaction furnace. A substrate processing method for carrying out substrate processing by loading a boat.   A plurality of boats for holding the substrate in the reaction furnace, and an identification means for the boat, specify the boat according to the adhesion state of impurities and the content of the recipe when the boat is used repeatedly, A substrate processing method for carrying out substrate processing by loading a designated boat into the reaction furnace.   A reaction furnace, a plurality of boats for holding the substrate in the reaction furnace, an identification means for the boat, and a designation means for designating the boat according to the individual difference of the boat and the content of the recipe A substrate processing apparatus.   A reaction furnace, a plurality of boats for holding a substrate in the reaction furnace, an identification means for the boat, the purity of the material of the boat or the adhesion state of impurities when the boat is repeatedly used, and the recipe A substrate processing apparatus comprising: designation means for designating a boat according to contents.   A transfer step of transferring the substrate to be processed to the boat, a designation step of designating the boat according to the purity of the material of the boat or the adhesion state of impurities when the boat is repeatedly used and the content of the recipe; And a film forming process for carrying out a film forming process by carrying the boat specified in the specifying process into a reaction furnace.   Depending on the transfer process of transferring the substrate to be processed to the boat, the empty boat to which the substrate is transferred, the purity of the material of the empty boat, the adhesion state of impurities when the boat is used repeatedly, and the contents of the recipe A substrate transfer method comprising a step of comparing with a designated boat designated by the method, wherein the substrate transfer is not performed in the transfer step when the empty boat is not a designated boat. Loading method.

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