JP4824425B2 - Spin cleaning device - Google Patents

Description

The present invention relates to a spin cleaning apparatus, and in particular, includes a substrate information reading unit that reads substrate size information from a substrate holding member, and a control unit that controls a predetermined control target based on the read substrate size information. The present invention relates to a spin cleaning apparatus that can prevent mistakes in manual input of substrate size information and improve productivity by automatically inputting

Photomasks such as LSI photomasks and LCD large photomasks are exposed to various contaminations during the manufacturing process, and are therefore washed during the manufacturing process or in the final product. As this cleaning method, a dip-type cleaning method is generally used.
The dip type cleaning method is a method in which a photomask substrate supported in a vertical direction is sequentially immersed in a cleaning liquid tank, a rinsing tank, and a drying tank arranged in parallel. Various types of chemical solutions used in these tanks, rinses, and drying methods can be used.

  The above-described dip cleaning method is suitable for high throughput because a plurality of substrates can be processed at a time for a substrate having a small mask size such as an LSI photomask. For large substrates such as photomasks, each tank has a large size and a large amount of chemical solution is required. Furthermore, in recent years, the substrate size of display panels such as liquid crystal display panels and photomasks for manufacturing them has been increasing. That is, for example, in the manufacture of a liquid crystal panel, the liquid crystal panel substrate has become larger due to the trend toward multi-cavity and a larger screen, and accordingly, the photomask for producing the liquid crystal panel has also become larger. As the substrate becomes larger and more accurate, it is necessary to perform a dip cleaning because a large amount of chemical is required when cleaning with a large cleaning solution in a large chemical bath. The reality is that has become difficult.

  As a technique for solving the above situation, a single wafer spin cleaning method has been noticed and developed. This single wafer spin cleaning method is a method in which a photomask substrate or the like is held on a rotating substrate holding member, and cleaning, rinsing, and drying are continuously performed while rotating. That is, first of all, a substrate held horizontally in a processing chamber is rotated, and cleaning is performed on the substrate by jetting a cleaning solution as a processing solution, scrub cleaning with a brush or the like (contact cleaning), and a supplied processing solution After performing cleaning such as ultrasonic cleaning that applies ultrasonic waves to ultra pure water, rinsing is performed with ultra pure water or the like, and then drying is performed by rotating the substrate at a high speed for a predetermined time. According to this method, compared to the above-described dip method, a series of processes can be performed in the same processing chamber, so that the apparatus can be miniaturized, less cleaning liquid is required, and cleaning time is shorter (for example, , See Patent Document 1).

In addition, the substrate is enlarged as described above, and the substrate size (in the case of a general rectangular substrate, the vertical dimension, horizontal dimension and thickness) are diversified, and various sizes of substrates are used. Has been. For this reason, cleaning apparatuses have come to perform cleaning according to the substrate size in order to effectively or efficiently clean substrates of various sizes.
For example, the substrate cleaning apparatus disclosed in Patent Document 2 includes an input unit that inputs the size of a substrate to be processed, and is a cleaning liquid that is determined from data according to the input size of the substrate and the frequency of the ultrasonic wave. The cleaning liquid is sprayed onto the substrate at an incident angle of.

By the way, the present inventor has developed a cleaning apparatus capable of cleaning large substrates of various sizes efficiently and with excellent cleaning quality. In this cleaning apparatus, by connecting a plurality of spin cleaning apparatuses, high-quality cleaning can be performed on a large substrate, and production efficiency can be improved. Each spin cleaning apparatus includes a roll brush, a back surface shower unit, and a processing liquid jet unit for the surface.
The roll brush has a brush longer than ½ of the diagonal length of the rectangular substrate, and abuts from the outer peripheral portion of the rotating substrate to the portion beyond the rotation center of the substrate, thereby cleaning the surface of the substrate in contact. To do. The back surface shower means includes a plurality of back surface nozzles provided at different distances from the center of rotation of the substrate, a processing liquid supply means for supplying a processing liquid to the back surface nozzle, and a plurality of back surface nozzles. Among these, a back surface shower control means for supplying a processing liquid to a back surface nozzle provided at a position corresponding to the size of the substrate is provided. Further, the processing liquid ejection means has a spot ejection hole for spraying the processing liquid in a spot shape at the central portion of the substrate and a plurality of line ejection holes for spraying the processing liquid in a line shape on the outer peripheral side from the central portion of the substrate. Yes.
JP 2004-290934 A Japanese Patent Laid-Open No. 11-300301

However, although the substrate cleaning apparatus of Patent Document 2 includes an input unit for inputting a substrate size, the specific configuration of the input unit is not particularly described. In addition, since this substrate cleaning apparatus has only to input information on the thickness of the substrate, no particular problem has occurred with respect to the input of the substrate size.
On the other hand, the present inventor has developed the above-described cleaning apparatus for the purpose of efficiently cleaning large-sized substrates of various sizes with excellent cleaning quality. Since this cleaning apparatus performs a plurality of controls based on the substrate size information, it is necessary to input the substrate size information reliably and easily. In addition, when the large substrate is a photomask substrate, the worker is under great pressure because the substrate is very expensive. For this reason, in order to perform cleaning with an efficient and excellent cleaning quality, it is necessary to release workers from unnecessary pressure and to prevent troubles caused by mistakes in manual input of board size information. there were.

The present invention has been made to solve the above problem, and by automatically reading board size information obtained in advance, it is possible to prevent mistakes in manual entry of board size information and improve productivity. An object of the present invention is to provide a spin cleaning apparatus that can be used.

To achieve the above object, a substrate spin cleaning apparatus of the present invention is a spin cleaning apparatus for performing a predetermined cleaning process on the photomask substrate a plurality of different sizes, and cleaning tank, holding the photomask substrate and dosing means for dosing the holding member to the cleaning tank, the provided the closing means, and the board information reading means for reading the size information of the photomask substrate, the photomask read by the board information reading means Based on the size information of the substrate , a control unit for controlling a predetermined control target, a back surface shower means for spraying a processing liquid on the back surface of the photomask substrate, provided in the cleaning tank, and the back surface shower means includes a plurality of back surface nozzles, each connected to the three-way valve, wherein the substrate holding member size information of the photomask substrate is attached The substrate information reading unit reads the size information of the photomask substrate by being input to the input unit, and the control unit opens and closes the three-way valve based on the read size information of the photomask substrate. Thus, the back nozzle for ejecting the processing liquid is selected.
As described above, by using the substrate holding member having the substrate size information, it is not necessary to perform a process of giving the substrate size information to the substrate, causing damage to the substrate or adhesion of foreign matters. You can eliminate worry. This is particularly effective when the substrate to be cleaned is a photomask substrate.

Further, the spin washing apparatus of the present invention, the size information of the photomask substrate is a coded information, the board information reading means is a code reader, further wherein the code reader is provided on the closing means As a configuration.
In this way, when the substrate holding member is loaded into the loading means, the code reader automatically reads the coded substrate size information, so it is possible to reliably eliminate problems such as input errors caused by manual input. .

Further, the spin washing apparatus of the present invention, the a predetermined control object to be controlled by the control unit, in order to convey the substrate holding member, sandwiching the position of the chuck for holding the substrate holding member, for contacting the cleaning The height position of the roll brush, the opening and closing of the electromagnetic valve provided in the supply path for supplying the processing liquid of the processing liquid ejecting means , and the holding arm of the substrate reversing means for reversing the photomask substrate It is configured to include at least one clamping position for clamping.
In this way, it is possible to prevent degradation in cleaning quality and substrate transport errors.

In the spin cleaning apparatus of the present invention, the photomask substrate is a photomask substrate for a display panel.
In this way, it is possible to effectively cope with photomask substrates for display panels of various sizes.
Here, the photomask substrate includes a glass substrate for photomask, a photomask blank, and a photomask.

According to the spin cleaning apparatus of the present invention, since the substrate size information is automatically input, an error in manual input of the substrate size information can be prevented and productivity can be improved.

FIG. 1a shows a schematic plan view of a spin cleaning apparatus according to an embodiment of the present invention.
FIG. 1b shows a schematic front view of a spin cleaning apparatus according to an embodiment of the present invention.
1a and 1b, the cleaning apparatus 1 includes a first cleaning tank 2, a second cleaning tank 3, a first input recovery means 4, a second input recovery means 5, a connecting transport section 6 and a control section 7. From left to right, the first input / recovery means 4, the first cleaning tank 2, the connecting transport unit 6, the second cleaning tank 3 and the second input / recovery means 5 are arranged in a straight line. is there. Further, the cleaning apparatus 1 includes a barcode reader 101 in the first input / recovery means 4 and the second input / recovery means 5 as substrate information reading means.

Moreover, the cleaning apparatus 1 uses the object to be processed as a photomask substrate 8 for a display panel. In recent years, display devices having display panels of various sizes have been commercialized, but the cleaning device 1 can effectively cope with the photomask substrate 8 for display panels of various sizes.
Note that the photomask substrate 8 is generally rectangular, but is not limited to this shape.

(First input recovery means)
The first input / recovery means 4 has a rectangular parallelepiped housing structure and is disposed at the left end of the cleaning apparatus 1. The first input / recovery means 4 is provided adjacent to the first transfer port 21 of the first cleaning tank 2, and transfers the photomask substrate 8, which is an object to be processed, to the first transfer port 21 ( That is, carry-in and / or carry-out). As a result, the photomask substrate 8 is loaded into the first cleaning tank 2 or recovered from the first cleaning tank 2.

As shown in FIG. 2, the substrate holding member 81 includes a circular mounting plate 812, four T-shaped holding plates 813 formed to be orthogonal to the mounting plate 812, A support member 816 that protrudes upward from the holding plate 813 and supports the photomask substrate 8 and a regulation member 817 that positions the photomask substrate 8 are provided.
Note that the support member 816 and the restriction member 817 are cylindrical, but are not limited to this shape.

Further, the substrate holding member 81 has a barcode label 818 describing the substrate size (vertical dimension, horizontal dimension and thickness) of the photomask substrate 8 attached to the back surface of the opposite peripheral edge of the mounting plate 812. ing. That is, as the substrate size information (substrate size information), the vertical dimension, horizontal dimension, and thickness of the photomask substrate 8 are described in the bar code label 818. As described above, by using the substrate holding member 81 to which the substrate size information is attached, there is no need to perform a process of giving the substrate size information to the photomask substrate 8, and the photomask substrate may be damaged or It is possible to eliminate the worry of problems such as sticking.
In addition, since the substrate holding member 81 of the present embodiment has the same size and shape of the plate-like chuck 815 regardless of the size of the photomask substrate 8, the chucks 431 and 531 holding the substrate holding member 81 are used. The position where the substrate holding member 81 is sandwiched does not change. On the other hand, for example, when the size and shape of the substrate holding member 81 are different depending on the size of the photomask substrate 8, the position where the chuck (not shown) holds the substrate holding member 81 is indicated by a bar code label. 818, the control unit 7 controls a chuck driving unit (not shown), and controls a position where the chuck holds the substrate holding member 81.

The first input / recovery means 4 includes a barcode reader 101 at a position directly below the barcode label 818 when the substrate holding member 81 is mounted. In the present embodiment, since two barcode labels 818 are attached to the placement plate 812 so as to be pointed, the barcode reader 101 is positioned above the barcode reader 101 regardless of the orientation of the substrate holding member 81. Either barcode label 818 is located.
As shown in FIG. 3, the bar code reader 101 is connected to the control unit 7 and is controlled by the control unit 7. When the substrate holding member 81 is attached, the bar code reader 101 is attached to the substrate holding member 81. The code label 818 is automatically read and the board information is output to the control unit 7.

The first input / recovery means 4 is provided with a pair of rails 24 facing in the left-right direction on the front side and back side of the upper part, and a crane (not shown) is movable on the upper side of the rails 24 in the left-right direction. )). The first input / recovery means 4 includes first movement means (not shown) for moving the crane. The first movement means is controlled by the control unit 7 and the crane is moved to the first input / recovery means 4. Are moved between a carry-in / carry-out position A, a washing position B of the first washing tank 2, a delivery position C of the connecting transport unit 6, and a washing position D of the second washing tank 3.
Moreover, although not shown in figure, the crane is provided with a pair of opposed chucks on the front side and the back side so as to be movable in the front-rear direction. This chuck is controlled by the control unit 7, and the chucks sandwich the substrate holding member 81.

(First cleaning tank)
The first cleaning tank 2 is a rectangular parallelepiped spin cleaning tank including a first transport port 21, a second transport port 22 and a rail 24, and is disposed on the left side of the cleaning device 1. By using the first cleaning tank 2 as a spin cleaning tank, even when the photomask substrate 8 is a large substrate, the amount of processing liquid such as a chemical solution is reduced. The first cleaning tank 2 performs a plurality of cleaning processes (for example, chemical cleaning, pure water cleaning, scrub cleaning, rinsing, drying, etc.).

  The first cleaning tank 2 is provided with a first transfer port 21 and a second transfer port 22 for transferring the photomask substrate 8 at the upper left side and upper right side, respectively, and the front side and the back side of the upper side. In addition, a pair of rails 24 facing in the left-right direction are provided. On the rail 24, the crane moves freely in the left-right direction.

  The first cleaning tank 2 is usually provided with a processing cup 25, a processing liquid ejection means 26, a roll brush 28, and the like, and accommodates the photomask substrate 8 and the substrate holding member 81 conveyed by a crane in the processing cup. In this state, the photomask substrate 8 is subjected to spin cleaning. The treatment liquid ejecting means 26 and the roll brush 28 are supplied with various chemical solutions and pure water, and perform cleaning (cleaning with various chemical solutions or pure water, scrub cleaning, rinsing, etc.) according to the cleaning conditions.

(Roll brush)
FIG. 4: has shown the schematic plan view of the principal part for demonstrating the state which the roll brush of the cleaning tank rotated of the cleaning apparatus concerning one Embodiment of this invention.
As shown in FIG. 4, the roll brush 28 has a length in the longitudinal direction that is longer than ½ of the diagonal length (diagonal length) of the rectangular photomask substrate 8, and is rotated by the rotating plate 23. The surface of the photomask substrate 8 is contacted and cleaned from the outer periphery of the photomask substrate 8 to the portion beyond the rotation center of the rotated photomask substrate 8. That is, the roll brush 28 abuts from the outer peripheral portion of the photomask substrate 8 to a portion that passes through the rotation center of the rotated photomask substrate 8 and passes the rotation center of the photomask substrate 8. In this way, when the photomask substrate 8 is rotated once, the entire surface of the photomask substrate 8 can be contact-cleaned, and problems such as generation of cleaning residue are prevented. In particular, since the contact cleaning is performed also on the central portion (center portion) of the photomask substrate 8, it is possible to effectively prevent a problem that the cleaning residue is generated in the central portion of the photomask substrate 8.

  The roll brush 28 has a longitudinal axis (longitudinal axis) provided at both ends rotatably supported on an arm 281 via a bearing (not shown), and further, a driving means (not shown). ). This drive means is configured to be able to control the rotation direction and the rotation speed, and is controlled by the control unit 7. Thus, the roll brush 28 can be cleaned while rotating in a predetermined direction with the longitudinal axis as the rotation center, or can be cleaned while rotating in the direction opposite to the rotation direction, and is formed on the photomask substrate 8. In addition, contact cleaning performance is greatly improved for a complicated pattern in which foreign matter is difficult to remove.

  The end of the arm 281 opposite to the side on which the roll brush 28 is pivotally supported is connected to the rotation shaft 284 and is supported so as to be movable up and down and rotatable. Although the rotation shaft 284 is not shown, the lower end portion is connected to a rotation means (not shown) for rotating the arm 281 in the horizontal direction. Further, although not shown, this rotating means is raised and lowered by a raising and lowering drive unit (not shown) for raising and lowering the arm 281.

  The raising / lowering drive unit is controlled by the control unit 7, and the optimum contact height of the roll brush 28 with respect to the photomask substrate 8 is determined according to the plate thickness of the photomask substrate 8 and the pressing force of the specified roll brush 28. Position it. At this time, on the basis of the substrate size information read by the barcode reader 101 (in this case, the thickness of the photomask substrate 8), the control unit 7 moves the drive unit for raising and lowering the roll brush 28 connected to the control unit 7. (Refer to FIG. 3), and the roll brush 28 is positioned at the optimum contact height with respect to the photomask substrate 8, so that productivity can be improved and the cleaning quality is deteriorated due to a manual input error. Can be avoided.

(Processing liquid ejection means)
The processing liquid ejection means 26 shown in FIG. 4 includes a spot nozzle, a center shower pipe, an outer shower pipe, a mounting arm, and a rotation shaft, although not shown. When the roll brush 28 moves from above the photomask substrate 8, the processing liquid ejecting means 26 moves above the photomask substrate 8, and various chemicals and pure water are applied to the spot nozzle, the center side shower pipe, and the outer side shower pipe. Water is supplied, and cleaning according to cleaning conditions (cleaning with various chemicals, rinsing, etc.) is performed.

  Further, in the processing liquid ejection means 26, the spot nozzle cleans the central portion of the photomask substrate 8, the central shower pipe cleans the outer peripheral side (annular portion) of the central portion, and the outer peripheral shower pipe Further, the outer peripheral side (the outer peripheral portion of the photomask substrate 8) is cleaned. That is, when the photomask substrate 8 rotates once, the processing liquid ejection means 26 can spray the processing liquid on the entire surface from the central portion to the outer peripheral portion of the photomask substrate 8, so that the photomask substrate can be efficiently used. Wash 8

  Further, the spot nozzle, the center side shower pipe, and the outer periphery side shower pipe are supplied with the processing liquid via independent pipes. As described above, the supply paths for supplying the processing liquid to the spot nozzle, the center side shower pipe, and the outer peripheral side shower pipe are independent of each other. For example, when the photomask substrate 8 is small, only the spot nozzle is processed. When the photomask substrate 8 is a medium size, the processing liquid can be supplied and cleaned only to the spot nozzle and the center side shower pipe, so that the processing liquid can be used effectively. it can.

  In this embodiment, each electromagnetic valve provided in the supply path for supplying the processing liquid to the spot nozzle, the center side shower pipe, and the outer side shower pipe is connected to the control unit 7 (see FIG. 3), and the bar code Based on the substrate size information read by the reader 101 (in this case, the vertical dimension and the horizontal dimension of the photomask substrate 8), the control unit 7 turns each electromagnetic valve on and off so that the center-side shower pipe and the outer-side shower Controls whether or not the processing liquid is supplied to the pipe. Thereby, since the processing liquid is automatically supplied according to the substrate size, productivity can be improved and problems such as deterioration in cleaning quality due to manual input errors can be avoided.

(Backside shower means)
FIG. 5: has shown the schematic plan view of the principal part for demonstrating the back surface shower means of a washing tank of the spin cleaning apparatus concerning one Embodiment of this invention.
FIG. 6 is a schematic block diagram for explaining the configuration of the back shower means.
5 and 6, the back surface shower means 29 includes a back surface nozzle group 2910, a primary ultra pure water tank 294, a pump 295, and an ultra ultra pure water production device 296.

  Each of the back surface nozzle groups 2910 has four back surface nozzles (first row back surface nozzle 2911, second row back surface nozzle 2912, third row back surface nozzle 2913, and fourth row back surface nozzle 2914). Projecting from the bottom of the cup 25. In addition, each of the rear surface nozzles (2911, 2912, 2913, 2914) is used for processing liquid (in this embodiment, ultrapure water is used) inside the protruding position and toward the rear surface of the photomask substrate 8. Erupts.

  The nozzles for the back surface (a total of four nozzles) are sequentially arranged in any one radial direction from the center of the processing cup 2 (that is, the rotation center of the photomask substrate 8). For example, the first row back surface nozzle 2911 is located at a position r1 away from the center of the processing cup 2, the second row back surface nozzle 2912 is located at a position similarly separated by r2, and the third row back surface nozzle 2913 is also located at r3. Similarly, the fourth row rear surface nozzle 2914 is disposed at a position separated by r4 (r4> r3> r2> r1 in this embodiment). Further, the rear surface nozzle ejects the processing liquid toward the upper side of the installed position and the diagonally upper side of the center side of the processing cup 25.

  Further, the back surface shower unit 29 includes a primary pure water tank 294, a pump 295, and an ultrapure water production device 296 as a processing liquid supply unit that supplies ultrapure water to each backside nozzle. The primary pure water tank 294 collects unused ultrapure water from each collection pipe 2933 and supplies water as a deficiency to store these water. The pump 295 supplies water from the primary pure water tank 294 to the ultrapure water production apparatus 296, and pressurizes water pressure for ejecting ultrapure water in a shower form from the nozzles on the back surface.

  Further, the control unit 7 controls the back surface shower means 29, and according to the size of the photomask substrate 8, a back surface nozzle (2911, 2911, provided at a position where the processing liquid is sprayed on the back surface of the rotating photomask substrate 8. 2912, 2913, 2914, etc.). That is, the control unit 7 is connected to a plurality of three-way valves 293 provided between the ultrapure water production apparatus 296 and the nozzle for the back surface, and based on the substrate size information input from the barcode reader 101, By turning on or off the three-way valve 293, it is controlled whether or not the processing liquid is supplied to each of the back surface nozzles (2911, 2912, 2913, 2914, etc.). In this way, the control unit 7 automatically selects the back-side nozzle that ejects ultrapure water based on the substrate size information, and sends a control signal to, for example, a preset back-side nozzle three-way valve 293. Then, ultrapure water is sprayed on the back surface of the photomask substrate 8. Therefore, it is not necessary for the operator to select the nozzle for the back side that ejects ultrapure water and perform direct control (operation of on / off switch, etc.), thus preventing human error and improving the workability of the cleaning work. Can be made.

  The three-way valve 293 is connected to the ultrapure water production apparatus 296 via the supply pipe 2931, connected to the nozzle for the back surface via the ejection pipe 2932, and further receives unused processing liquid via the recovery pipe 2933. It is connected to a primary pure water tank 294 for recovery. Accordingly, each three-way valve 293 is connected to the ultrapure water production apparatus 296 via the supply pipe 2931, and ultrapure water is supplied from the ultrapure water production apparatus 296. For example, when the three-way valve 293 of the first row back surface nozzle 2911 is opened, ultrapure water is supplied to the first row back surface nozzle 2911 via the ejection pipe 2932 and the valve 292, and The nozzle 2911 ejects ultrapure water in a shower shape and sprays it on the back surface of the photomask substrate 8. In addition, when the three-way valve 293 is closed, ultrapure water is collected in the primary pure water tank 294 via the collection pipe 2933.

(Second input recovery means)
The second input / recovery means 5 has a rectangular parallelepiped housing structure and is disposed at the left end of the cleaning apparatus 1. The second input / recovery means 5 is provided adjacent to the first transfer port 31 of the second cleaning tank 3, and transfers the photomask substrate 8, which is the object to be processed, to the first transfer port 31 ( That is, carry-in and / or carry-out). Thereby, the photomask substrate 8 is put into the second cleaning tank 3 or recovered from the second cleaning tank 3.
The second input / recovery means 5 includes a barcode reader 101 at a position directly below the barcode label 818 when the substrate holding member 81 is mounted.

The second input / recovery means 5 is provided with a pair of rails 24 facing in the left-right direction on the front side and the back side of the upper part. )). The second input / recovery means 5 is provided with second moving means (not shown) for moving the crane. This second moving means is controlled by the control unit 7, and the crane is moved to the second input / recovery means 5. Are moved between a carry-in / carry-out position E, a washing position D of the second washing tank 3, a delivery position C of the connecting transport unit 6, and a washing position B of the first washing tank 2. That is, in the cleaning apparatus 1, the first input / recovery means 4 and the second input / recovery means 5 are each provided with a crane.
Moreover, although not shown in figure, the crane is provided with a pair of opposed chucks on the front side and the back side so as to be movable in the front-rear direction. This chuck is controlled by the control unit 7, and the chucks sandwich the substrate holding member 81.
The other configuration of the second input / recovery means 5 is substantially the same as that of the first input / recovery means 4.

(Second cleaning tank)
The second cleaning tank 3 is provided with a first transfer port 31 and a second transfer port 32 for transferring the photomask substrate 8 at the upper part on the left side and the upper part on the right side, respectively. In addition, a pair of rails 24 facing in the left-right direction are provided. On the rail 24, the crane moves freely in the left-right direction.

The second cleaning tank 3 is usually provided with a processing cup 25, a processing liquid ejection means 26, a roll brush 28, and the like, and accommodates the photomask substrate 8 and the substrate holding member 81 conveyed by a crane in the processing cup. In this state, the photomask substrate 8 is subjected to spin cleaning. The treatment liquid ejecting means 26 and the roll brush 28 are supplied with various chemical solutions and pure water, and perform cleaning (cleaning with various chemical solutions or pure water, scrub cleaning, rinsing, etc.) according to the cleaning conditions.
The other configuration of the second cleaning tank 3 is substantially the same as that of the first cleaning tank 2.

(Conveying part for connection)
The connection transport unit 6 has a rectangular parallelepiped housing structure including the rails 24 and the substrate reversing means 63, and is disposed between the first cleaning tank 2 and the second cleaning tank 3. This connection transport unit 6 is a photomask for the second transport port 22 of the first cleaning tank 2 and the second transport port 32 of the second cleaning tank 3 by moving two cranes on the rail 24. The substrate 8 is transferred.

FIG. 7 shows a schematic plan view of the main part of the substrate reversing means of the spin cleaning apparatus according to one embodiment of the present invention.
In the figure, the substrate reversing means 63 includes a mounting plate 61 and a reversing unit 630.
The mounting plate 61 is a disc on which a substrate holding member 81 is provided at a substantially central portion of the connecting transport unit 6 so as to be movable up and down. The connecting conveyance unit 6 includes elevating means (not shown) for elevating the mounting plate 61. This lifting and lowering means is controlled by the control unit 7 and descends when the sandwiching arm 633 of the reversing unit 630 moving in the left-right direction sandwiches the photomask substrate 8, and then the reversing unit 630 reverses and the photomask substrate 8 Is reversed. The inverted photomask substrate 8 is held in an inverted state by the rising substrate holding member 81.
The reversing arm 632 includes a clamping arm drive unit (not shown) such as a linear motor that moves the clamping arm 633 in the center direction or the anti-center direction, or a stepping motor with a ball screw.

  This sandwiching arm drive unit is controlled by the control unit 7 and moves the sandwiching arm 633 in the direction in which the photomask substrate 8 is sandwiched (center direction) and in the direction in which the photomask substrate 8 is released (anti-center direction). That is, as shown in FIG. 3, the control unit 7 is connected to the holding arm driving unit, controls the holding arm driving unit based on the substrate size information input from the barcode reader 101, and is a photomask. The holding arm 633 is moved to a position where the substrate 8 is held. In this way, since the control unit 7 controls the holding position of the holding arm 633 based on the substrate size information, it is possible to reliably prevent problems such as the photomask substrate 8 dropping due to a holding error.

(Control part)
The cleaning device 1 is provided with a control unit 7 at the front right end. The control unit 7 is an information processing device such as a sequencer or a computer, and controls the cleaning device 1 to automatically perform a plurality of cleaning steps (for example, chemical cleaning, scrub cleaning, rinsing, drying, etc.). Further, as described above, the control unit 7 includes the barcode reader 101, the drive unit for raising and lowering the roll brush 28, the electromagnetic valve provided in the supply path for supplying the processing liquid of the processing liquid ejecting means, and the back surface shower means 29. It is connected to the three-way valve 293 and the clamping arm drive unit of the substrate reversing means 63, and controls these based on the substrate size information input from the barcode reader 101.

  Further, the control unit 7 controls the transport path of the photomask substrate 8 according to the cleaning process of the photomask substrate 8. That is, the control unit 7 includes a rotation driving unit, an elevating unit, a first moving unit, and a chuck driving unit of the first input collecting unit 4, and a rotation driving unit, an elevating unit, a second movement of the second input collecting unit 5. The control unit controls the means and the chuck driving unit, the lifting and lowering unit, the reversing unit, and the clamping arm driving unit of the connecting conveyance unit 6. As a result, the cleaning apparatus 1 uses the cleaning tank 2 (3) as a transport path for the photomask substrate 8 from the input / collection means 4 (5) via the first transport port 21 (31). When the cleaning process is completed, the path transported to the input / recovery means 4 (5) via the first transfer port 21 (31) and the object to be processed are transferred from the input / recovery means 4 to the first. When it is transported to the cleaning tank 2 via the transport port 21 and the cleaning process is completed, it is transported to another cleaning tank 5 via the connecting transport part 6, and the cleaning process is completed in the other cleaning tank 5. In addition, it is possible to have a path that is transported to the input / recovery means 5 via the first transport port 31 in the other cleaning tank 5. That is, since the cleaning tanks 2 and 3 can be cleaned in an independent state, or the cleaning tanks 2 and 3 can be connected to each other, the production efficiency can be improved.

  As described above, the cleaning apparatus 1 according to this embodiment can automatically input the substrate size information, thereby preventing errors in manual input of the substrate size information and improving productivity. Further, when the cleaning substrate is a photomask substrate 8 which is a large substrate, the worker is subjected to great pressure because the substrate is very expensive, but the worker is released from unnecessary pressure. At the same time, cleaning can be performed efficiently and with excellent cleaning quality.

The spin cleaning apparatus of the present invention has been described with reference to the preferred embodiment. However, the spin cleaning apparatus according to the present invention is not limited to the above-described embodiment, and various modifications can be made within the scope of the present invention. It goes without saying that implementation is possible.
For example, the barcode obtained by coding the substrate size information may be a two-dimensional barcode. Further, instead of attaching the barcode label 818 to the substrate holding member 81, the barcode may be directly formed on the substrate holding member 81 by cutting or laser processing.

The spin cleaning apparatus of the present invention is not limited to the configuration for cleaning the photomask substrate, and can be used for cleaning apparatuses and cleaning methods for ceramic plates and metal plates.

1 shows a schematic plan view of a spin cleaning apparatus according to an embodiment of the present invention. 1 shows a schematic front view of a spin cleaning apparatus according to an embodiment of the present invention. The schematic enlarged plan view for demonstrating the board | substrate holding member of the spin cleaning apparatus concerning one Embodiment of this invention is shown. The schematic block diagram of the principal part for demonstrating the control state by the board | substrate size information of the spin cleaning apparatus concerning one Embodiment of this invention is shown. The schematic plan view of the principal part for demonstrating the state which the roll brush of the washing tank rotated in the spin washing apparatus concerning one Embodiment of this invention is shown. The schematic plan view of the principal part for demonstrating the back surface shower means of the washing tank of the spin cleaning apparatus concerning one Embodiment of this invention is shown. The schematic block diagram for demonstrating the structure of a back surface shower means is shown. The schematic plan view of the principal part in the board | substrate inversion means of the spin cleaning apparatus concerning one Embodiment of this invention is shown.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Cleaning apparatus 2 1st washing tank 3 2nd washing tank 4 1st input collection | recovery means 5 2nd input collection means 6 Connection conveyance part 7 Control part 8 Photomask board | substrate 21 1st conveyance port 22 2nd conveyance port 23 Rotating plate 24 rail 25 treatment cup 26 treatment liquid ejection means 28 roll brush 29 back shower means 31 first conveyance port 32 second conveyance port 61 mounting plate 63 substrate reversing means 81 substrate holding member 101 bar code reader 281 arm 292 valve 293 three-way valve 294 Primary ultrapure water tank 295 Pump 296 Ultra ultrapure water production apparatus 633 Holding arm 812 Placed plate 813 Holding plate 816 Support member 817 Restriction member 818 Bar code label 2910 Back surface nozzle group 2911 First row back surface nozzle 2912 First Nozzle for back surface of second row 2913 Nozzle for back surface of third row 2914 Nozzle for back surface of fourth row 2931 Supply pipe 2932 Ejection pipe 2933 Recovery pipe

Claims (4)

A spin cleaning apparatus that performs a predetermined cleaning process on photomask substrates of different sizes,
A washing tank;
A loading means for loading a substrate holding member holding the photomask substrate into the cleaning tank ;
Provided in the closing means, and the board information reading means for reading the size information of the photomask substrate,
A control unit that controls a predetermined control target based on the size information of the photomask substrate read by the substrate information reading unit ;
Back surface shower means for spraying a treatment liquid on the back surface of the photomask substrate, provided in the cleaning tank,
A plurality of back nozzles each provided with the back shower means, each connected to a three-way valve ,
The substrate holding member to which the size information of the photomask substrate is attached is loaded into the loading unit,
The substrate information reading means reads size information of the photomask substrate,
Based on the read size information of the photomask substrate, the control unit,
By opening and closing the three-way valve,
A spin cleaning apparatus, wherein the back nozzle for ejecting the processing liquid is selected . Is the information size information of the photomask substrate is coded, the a substrate information reading means code reader, further according to claim 1, characterized in that the code reader is provided on the closing means Spin cleaning device. The predetermined control object to be controlled by the control unit, in order to convey the substrate holding member, sandwiching the position of the chuck for holding the substrate holding member, the height position of the roll brush for contacting the cleaning, treatment liquid Opening / closing of an electromagnetic valve provided in a supply path for supplying the processing liquid of the ejection means , and a holding arm of the substrate reversing means for reversing the photomask substrate include at least one of the holding positions for holding the substrate. The spin cleaning apparatus according to claim 1 or 2, wherein The spin cleaning apparatus according to claim 1, wherein the photomask substrate is a photomask substrate for a display panel.

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