JP2019162748A - Plate washing device and plate washing method - Google Patents

Abstract

To excellently wash a plate having a main surface of dispersively sticking a metal nanoparticle.SOLUTION: A plate washing device comprises a tank for storing wash water, a washing tank having a washing space for washing a plate, a first washing part for forming a metal aggregate by aggregating a metal nanoparticle by supplying the wash water in the tank to a main surface of the plate in the washing space and removing the metal aggregate from the plate together with the wash water flowing along the main surface, a pipe for circulating the wash water and the metal aggregate toward the tank from the washing tank by connecting the washing tank and the first washing part and a filter inserted into the pipe and passing the wash water toward the tank while trapping the metal aggregate flowing in the pipe.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a plate cleaning apparatus and a plate cleaning method for cleaning a main surface of a plate on which metal nanoparticles are dispersed and adhered.

  Electronics such as semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for plasma displays, glass or ceramic substrates for magnetic or optical disks, glass substrates for organic EL, glass substrates or silicon substrates for solar cells, other flexible substrates and printed boards In order to form a pattern layer on a substrate for equipment, a printing technique using a plate and a blanket has been proposed (for example, Patent Document 1).

  In this printing technology, the coating layer on the blanket is patterned by pressing and contacting a blanket coated with the coating layer with a pattern opposite to the pattern to be formed on the substrate, that is, a plate having a reverse pattern. A pattern layer having the reverse pattern is formed on the blanket (patterning process). Then, the pattern layer is transferred to the substrate by pressing the blanket against the substrate and bringing it into contact (transfer process).

JP 2013-184382 A

  In the printing technique, in order to reduce the running cost by reusing the plate, a plate cleaning technology for supplying an organic solvent to the used plate and cleaning it has been proposed. When the coating layer is made of a resist material or the like, it was possible to clean the plate satisfactorily by the proposed technique. However, as studied in recent years, when the above printing technique is diverted to the printing of wiring patterns, cleaning of the plate is a big problem. In the printing of the wiring pattern, a coating material containing metal nanoparticles typified by silver (Ag) is used, and the main surface in contact with the coating layer of the plate after the patterning treatment is in a dry state or Semi-dried metal nanoparticles are dispersed and attached. Even if an organic solvent was supplied to the main surface as in the proposed technique, it was impossible to remove the metal nanoparticles.

  This invention is made in view of the said subject, and aims at providing the plate washing | cleaning apparatus and plate washing | cleaning method which can wash | clean well the plate | version | printing which has the main surface to which a metal nanoparticle disperse | distributes and adheres. .

  One aspect of the present invention is a plate cleaning apparatus for cleaning a plate having a main surface on which metal nanoparticles are dispersed and adhered, and a cleaning tank having a tank for storing cleaning water and a cleaning space for cleaning the plate In the cleaning space, the cleaning water in the tank is supplied to the main surface of the plate to agglomerate the metal nanoparticles to form a metal aggregate, and the metal coagulation is performed together with the cleaning water flowing along the main surface. A first cleaning section that removes the aggregate from the plate, a pipe that connects the cleaning tank and the first cleaning section to distribute cleaning water and metal aggregates from the cleaning tank toward the tank, and a pipe that is inserted into the pipe, It is characterized by comprising a filter that traps flowing metal agglomerates while allowing cleaning water to pass toward the tank.

  Another aspect of the present invention is a plate cleaning method for cleaning a plate having a main surface to which metal nanoparticles are dispersed and adhered, and the cleaning water stored in the tank in the cleaning tank is washed with the main surface of the plate. The metal nanoparticles are agglomerated by the washing water to form metal aggregates, and the metal agglomerates are removed from the plate together with the washing water that flows along the main surface. A step of collecting cleaning water containing aggregates in the cleaning tank, and a step of removing the metal aggregates from the cleaning water collected in the cleaning tank by a filter and then returning the cleaning water to the tank. Yes.

  Note that “cleaning water” in this specification refers to deionized water (hereinafter referred to as “DIW”), pure water, or DIW, which is widely used in the field of manufacturing semiconductor devices and liquid crystal display devices. It is a product obtained by adding a small amount of a surfactant.

  According to the invention configured as described above, when the cleaning water is supplied to the main surface of the plate, the metal nanoparticles dispersed and existing on the main surface are aggregated to form a flake-shaped or flaky metal aggregate. Form a collection. The metal agglomerates are washed away from the plate together with the washing water flowing along the main surface, and then trapped on the filter and separated and removed. On the other hand, the used wash water from which the metal aggregate has been separated and removed is returned to the tank for reuse.

  As described above, by supplying cleaning water to the main surface of the plate on which the metal nanoparticles are dispersed and adhered, the metal nanoparticles are aggregated to form a metal aggregate, and the cleaning water is washed away from the plate together. Therefore, the plate can be washed well. In addition, since only the cleaning water from which the metal aggregates have been separated and removed by the filter from the cleaning water flowing out from the plate is returned to the tank for reuse, the running cost required for cleaning the plate can be reduced.

It is a figure showing a 1st embodiment of a plate washing device concerning this invention. FIG. 2 is a partial plan view of the plate cleaning apparatus in FIG. 1. It is a figure which shows 2nd Embodiment of the plate washing | cleaning apparatus concerning this invention. It is a figure which shows 3rd Embodiment of the plate washing | cleaning apparatus concerning this invention.

  FIG. 1 is a view showing a first embodiment of a plate cleaning apparatus according to the present invention. FIG. 2 is a partial plan view of the plate cleaning apparatus of FIG. In the plate cleaning apparatus 100, the apparatus main body 1 is divided into a cleaning tank 11 and a drying tank 12. The cleaning tank 11 and the drying tank 12 have a cleaning space 11a and a drying space 12a, respectively, and the plate P is transported in the Y direction by the transport unit 2 in these spaces 11a and 12a. In addition, the codes | symbols 13-15 in FIG. 1 are respectively a carrying-in port, a conveyance port, and a carrying-out port, and plate | version | printing P is carried into the washing tank 11 through the carrying-in port 13, and is dried from the washing tank 11 through the conveyance port 14. It is transported to the tank 12 and is further transported out of the drying tank 12 through the outlet 15.

  The transport unit 2 includes a plurality of transport rollers 21 arranged in parallel with each other along the Y direction. The plurality of transport rollers 21 are disposed in the cleaning space 11a and the drying space 12a, respectively. Although not shown, a plurality of transport rollers are also provided on the upstream side of the cleaning tank 11 and the downstream side of the drying tank 12 in the Y direction.

  The conveyance roller 21 has a roller shaft 211 as shown in FIG. 2, and supports the lower surface of the end of the plate P to be conveyed at both ends of the roller shaft 211 and the width direction of the plate P, that is, the X direction in the drawing. A flanged roller 212 is provided for restricting the displacement of the roller. A plurality of disc-shaped intermediate rollers 213 that support the lower surface of the plate P with respect to the roller shaft 211 are provided between the pair of flanged rollers 212 and 212. The roller shaft 211, the flanged roller 212, and the intermediate roller 213 rotate integrally around the axis when a drive mechanism (not shown) is operated in response to an operation command from the control unit 3 that controls the entire apparatus. Driven. As a result, the plate P in the so-called face-up state in which the upper surface Pa on which the metal nanoparticles (in this embodiment, silver nanoparticles) are dispersed and attached is directed vertically upward, is the carry-in port 13, the cleaning tank 11, and the transfer port. 14, the drying tank 12 and the carry-out port 15 are conveyed in this order. The plate P is subjected to a cleaning process by the first cleaning unit 4 while the cleaning tank 11 is moving, and is subjected to a drying process by the drying unit 5 while the drying tank 12 is moving.

  The first cleaning unit 4 supplies the cleaning water pressure-fed from the cleaning water supply unit 6 to the lower surface Pb of the plate P in the cleaning space 11a to perform the lower surface cleaning, and the cleaning water and clean air (filtered by a filter). The mixed fluid with air containing no impurities is supplied to the upper surface Pa of the plate P to perform upper surface cleaning. Nitrogen gas may be used instead of clean air.

  Further, in the first cleaning unit 4, as shown in FIG. 1, a lower surface cleaning nozzle 41 is disposed on the upstream side in the transport direction Y of the plate P, and an upper surface cleaning nozzle 42 is disposed on the downstream side. The cleaning water supply unit 6 is connected to the nozzles 41 and 42. As shown in FIG. 1, the cleaning water supply unit 6 is disposed at a position lower than the cleaning tank 11 in the vertical direction Z, and supplies cleaning water in the tank 61 to the nozzle 41. A lower surface supply system 62, an upper surface supply system 63 that supplies cleaning water in the tank 61 to the nozzle 42, and a recovery system 64 that recovers used cleaning water collected in the cleaning tank 11. . In the tank 61, one end portion of the supply pipe 611 is connected to the lower portion of the side surface, and one end portion of the circulation pipe 612 is connected to the center portion of the side surface. Further, a lower surface supply system 62 and an upper surface supply system 63 are connected to the other ends of the supply pipe 611 and the circulation pipe 612.

  The lower surface supply system 62 includes a pump 621, a pressure reducing valve 622, and a three-way valve 623. In the lower surface supply system 62, three ports provided in the three-way valve 623 are connected to the other end of the supply pipe 611, the other end of the circulation pipe 612, and the nozzle 41 via pipes 624 to 626, respectively. Among these, a pump 621 and a pressure reducing valve 622 are inserted in the pipe 624. For this reason, the destination of the wash water fed by the pump 621 is switched by switching the three-way valve 623 in accordance with a command from the control unit 3. More specifically, by switching the three-way valve 623 so that the pipes 624 and 625 are connected, the circulation path is connected between the tank 61, the pump 621, the pressure reducing valve 622, the three-way valve 623, and the pipes 611, 624, 625, and 612. Is formed. Then, when the pump 621 is operated in accordance with a command from the control unit 3, the cleaning water circulates in the circulation path with the pressure adjusted by the pressure reducing valve 622.

  On the other hand, when the three-way valve 623 is switched so that the pipes 624 and 626 are connected from the state where the cleaning water is circulated as described above, the supply of the cleaning water to the nozzle 41 is started as follows. That is, the supply path is formed by the tank 61, the pump 621, the pressure reducing valve 622, the three-way valve 623, and the pipes 611, 624, 626 by the above switching. Simultaneously with this switching, the circulation of the wash water is stopped and the wash water is immediately sent to the nozzle 41 at the desired pressure along the supply path. As a result, the cleaning water is supplied toward the lower surface Pb of the plate P, and the lower surface cleaning is performed on the lower surface Pb of the conveyed plate P.

  The upper surface supply system 63 is basically configured similarly to the lower surface supply system 62. That is, the upper surface supply system 63 includes a pump 631, a pressure reducing valve 632, and a three-way valve 633. In the upper surface supply system 63, three ports provided in the three-way valve 633 are connected to the other end of the supply pipe 611, the other end of the circulation pipe 612, and the nozzle 42 via pipes 634 to 636, respectively. For this reason, the destination of the wash water sent by the pump 631 is switched by switching the three-way valve 633 according to the command from the control unit 3, and the circulation path and the supply path are the same as the lower surface supply system 62. Are selectively formed. That is, the circulation path is formed by switching the three-way valve 633 so that the pipes 634 and 635 are connected. When the pump 631 is operated in this state, the inside of the circulation path is washed with the pressure adjusted by the pressure reducing valve 622. Water circulates. On the other hand, the supply path is formed by switching the three-way valve 633 so that the pipes 634 and 636 are connected, and the supply of cleaning water to the nozzle 42 is started as follows. That is, the supply path is formed by the tank 61, the pump 631, the pressure reducing valve 632, the three-way valve 633, and the pipes 611, 634, and 636 by the switching. Simultaneously with this switching, the circulation of the wash water is stopped and the wash water is immediately sent to the nozzle 42 at a desired pressure along the supply path. The nozzle 42 is a so-called two-fluid nozzle, and is connected to the clean air supply unit 7 in addition to the cleaning water supply unit 6. In the present embodiment, the five nozzles 42 are arranged in the X direction. However, a so-called slit nozzle in which the discharge ports extend in the X direction in a slit shape may be used.

  As shown in FIG. 1, the clean air supply unit 7 includes a pipe 71 that connects a clean air source such as factory power (a nitrogen gas supply source when nitrogen gas is used) and the nozzle 42, and a pipe 71. And an on-off valve 72 inserted therein. As described above, the on-off valve 72 is opened in synchronization with the supply of the cleaning water to the nozzle 42 and the clean air is pumped to the nozzle 42. As a result, a mixed fluid of cleaning water and clean air is discharged from the nozzle 42 toward the upper surface Pa of the plate P, and the upper surface of the plate P is cleaned with the mixed fluid. In this way, the plate P is cleaned with the cleaning water and the mixed fluid in the cleaning space 11a of the cleaning tank 11. The used cleaning water is collected at the inner bottom of the cleaning tank 11. In order to collect the collected cleaning water, a recovery system 64 is provided in the cleaning water supply unit 6.

  The recovery system 64 includes a recovery pipe 641 that connects the cleaning tank 11 and the tank 61, and a filter 642 interposed in the pipe 641. As described above, the filter 642 removes the metal P from the plate P together with the cleaning water flowing along the upper surface Pa of the plate P when the plate P is cleaned with the cleaning water (the metal aggregate 8 described later in detail). And has a function of returning only the cleaning water to the tank 61. In particular, in this embodiment, as will be described in detail later with reference to FIG. 2, in order to remove metal aggregates obtained by aggregating silver nanoparticles dispersed and adhering to the upper surface Pa of the plate P, filtration accuracy ( A filter having a particle diameter of 30 μm to 100 μm is used. Therefore, the recovered material returned to the tank 61 by the recovery system 64 is almost washing water.

  The washing water is thus collected, and the amount of washing water stored in the tank 61 varies with time. Therefore, in order to confirm the storage amount, a lower limit liquid level sensor 613 for detecting that the level of the cleaning water in the tank 61 is at a predetermined lower limit position, and the liquid level is at a predetermined upper limit position. And an upper limit liquid level sensor 614 for detecting that the tank 61 is attached. Further, as shown in FIG. 1, the tank 61 is connected with a washing water replenishment unit 65 to replenish the washing water when the liquid level falls below the lower limit position. Thus, the tank 61 always stores a sufficient amount of cleaning water for the plate P cleaning process. In addition, the code | symbol 615 in the figure has shown the overflow piping connected to the upper part of the side surface of the tank 61, and draining the wash water exceeding the storage capacity of the tank 61 out of the tank.

  A drying tank 12 is disposed adjacent to the cleaning tank 11 having the first cleaning unit 4 configured as described above, and a drying unit 5 is provided in the drying space 12 a of the drying tank 12. The drying unit 5 dries the plate P by performing a so-called liquid draining process in which the cleaning water adhering to the upper surface Pa and the lower surface Pb of the plate P is removed by air. A pair of upper and lower upper air knives 51 and 52 are disposed in the drying space 12a. The upper air knife 51 is disposed above the plate P conveyed by the plurality of conveyance rollers 21. The upper air knife 51 is provided with a slit-like discharge port 511 that faces the upper surface Pa of the plate P and extends in the X direction. A gas flow directed downward and upstream (left hand side in FIG. 1) from the discharge port 511 Supply over the X direction of P. Similarly, the lower air knife 52 is provided with a slit-shaped discharge port 521 that faces the lower surface Pb of the plate P and extends in the X direction. , Supplied over the X direction of the plate P. As a result, the cleaning water adhering to the plate P that has undergone the cleaning process is removed (drying process).

  In the plate cleaning apparatus 100 configured as described above, the control unit 3 controls each part of the apparatus according to a plate cleaning program stored in advance in a storage unit (not shown), so that the plate P is moved in the Y direction in a so-called face-up posture. The water washing process by the first washing unit 4 and the drying process by the drying unit 5 are comprehensively controlled by the control unit 3 and sequentially executed. In particular, at the time when the conveyance of the plate P is started, both the lower surface supply system 62 and the upper surface supply system 63 are switched to the circulation path, and the washing water is circulated as shown by the dotted arrows in FIG. Then, the plate P is transported in the Y direction by the transport unit 2, and from the circulation path only in the lower surface supply system 62 at the timing when the front end portion of the plate P, that is, the (+ Y) direction end portion moves to a position above the nozzle 41. Switching to the supply path (see the alternate long and short dash line in the figure), the supply of cleaning water to the lower surface Pb of the plate P is started. This lower surface cleaning process is continued until the plate P passes the position immediately above the nozzle 41, and the lower surface of the plate P is cleaned. On the other hand, after passing directly above, the washing water path is returned to the circulation path.

  Further, the upper surface cleaning is performed with a slight delay from the lower surface cleaning of the plate P. That is, the path of the washing water circulates by changing the open / close state of the three-way valve 633 in the upper surface supply system 63 at the timing when the leading end of the plate P conveyed by the conveying unit 2 moves to a position below the nozzle 42. The path is switched to the supply path (see the one-dot chain line in the figure), and the cleaning water is fed toward the nozzle 42. Further, the on-off valve 72 is opened, and clean air is pumped to the nozzle 42 by the clean air supply unit 7. As a result, a mixed fluid of cleaning water and clean air is discharged from the nozzle 42 toward the upper surface Pa of the plate P, and the mixed fluid is supplied to the upper surface Pa where the silver nanoparticles are dispersed and adhered.

  Silver nanoparticles are active as conventionally known, and have a property of immediately agglomerating when in contact with pure water or DIW. For this reason, as shown in the enlarged view in FIG. 2, silver nanoparticles (schematically indicated by dots in the drawing) are contained in the washing water contained in the mixed fluid by supplying the mixed fluid to the upper surface Pa of the plate P. ) Aggregate to form a flake-shaped or flaky metal aggregate 8. The metal agglomerates 8 have a particle size of at least 100 μm and are washed away from the plate P together with the mixed fluid flowing along the upper surface Pa. Such top surface cleaning is continued until the rear end portion of the plate P, that is, the (−Y) direction end portion passes the position below the nozzle 42. On the other hand, after passing directly below, the washing water path is returned to the circulation path.

  After the upper surface Pa and the lower surface Pb of the plate P are cleaned with the cleaning water in this way, the plate P is transported from the cleaning tank 11 to the drying tank 12, subjected to a drying process by liquid draining, and carried out of the plate cleaning apparatus 100. Further, during the cleaning process as described above, the used cleaning water and the metal aggregate 8 (FIG. 2) collected at the inner bottom of the cleaning tank 11 are directed toward the tank 61 via the pipe 641. Flowing. At this time, since the metal aggregate 8 has a particle diameter exceeding 100 μm as described above, it is trapped by the filter 642 and only the washing water returns to the tank 61. For this reason, it can prevent reliably that the metal aggregate 8 mixes in the tank 61, and it becomes possible to use for the reuse the wash water collect | recovered as mentioned above.

  As described above, according to the present embodiment, as shown in the enlarged view in FIG. 2, the mixed fluid (= washing water + clean air) is applied to the upper surface Pa of the plate P on which the silver nanoparticles are dispersed and adhered. ) To agglomerate silver nanoparticles to a size that can be trapped by the filter 642 to form a metal aggregate 8. Then, the metal aggregate 8 is removed from the plate P together with the mixed fluid flowing along the upper surface Pa of the plate P. Therefore, the plate P can be cleaned well. Moreover, since the metal agglomerate 8 is removed from the used washing water flowing out from the plate P by the filter 642 and only the washing water is returned to the tank for reuse, the running cost required for washing the plate P is reduced. Can be reduced.

  Further, since the silver nanoparticles are aggregated to form the metal aggregate 8 and removed by the filter 642, the filtration accuracy of the filter 642 is significantly higher than the filter for directly trapping the silver nanoparticles. Can be set. This can not only reduce the cost of the filter 642 but also suppress the frequency of filter replacement. Further, the pressure loss in the filter 642 can be suppressed, and the tank 61 is disposed at a position lower than the cleaning tank 11 in the vertical direction Z as in the present embodiment, and the cleaning water is efficiently recovered using the water head difference. be able to. These are advantageous in reducing the running cost.

  Furthermore, since the cleaning water that has cleaned the upper surface Pa of the plate P to which the silver nanoparticles are adhered is returned to the tank 61, silver ions having an antibacterial effect exist in the cleaning water stored in the tank 61. As a result, even if the cleaning water is used repeatedly for a long time, the frequency of replacement of the cleaning water can be suppressed without generating bacteria or the like in the circulating cleaning water, and the running cost can be reduced.

  Thus, in the first embodiment, the upper surface Pa of the plate P corresponds to an example of the “plate main surface” of the present invention.

  FIG. 3 is a view showing a second embodiment of the plate cleaning apparatus according to the present invention. The second embodiment is greatly different from the first embodiment in that a second cleaning unit 9 is added as a cleaning means for cleaning the upper surface Pa of the plate P in the cleaning space 11a of the cleaning tank 11. Since the other configuration is basically the same as that of the first embodiment, the same configuration is denoted by the same reference numeral, and the description of the configuration is omitted.

  The second cleaning unit 9 is disposed on the downstream side of the first cleaning unit 4 in the transport direction Y of the plate P in the cleaning space 11a, and further brush cleans the upper surface Pa of the plate P spray-washed with the mixed fluid. is there. The second cleaning unit 9 has a roll brush 91 that is rotationally driven by a drive mechanism (not shown). The roll brush 91 is disposed so as to be slidable with respect to the upper surface Pa of the plate P conveyed by the conveying unit 2. For this reason, for example, silver nanoparticles that have been attached to the peripheral edge of the plate P but could not be removed by the first cleaning unit 4 even though a small amount are reliably removed from the upper surface Pa of the plate P by the roll brush 91. be able to. Therefore, according to the second embodiment, the cleaning efficiency can be further increased.

  By the way, in the first embodiment, the upper surface Pa of the plate P is spray cleaned by the mixed fluid discharged from the nozzle 42 in the form of a spray, and in the second embodiment, brush cleaning is further combined. By performing such spray cleaning or brush cleaning, most of the silver nanoparticles can be removed from the plate P as described above, but the silver nanoparticles remain on the upper surface Pa of the plate P even though the amount is small during the cleaning. The formed uneven pattern (symbol PT in FIG. 2) may enter. Therefore, in order to remove the silver nanoparticles that have entered the concavo-convex pattern PT, it is preferable to combine the ultrasonic cleaning unit with the first or second embodiment as the “third cleaning unit” of the present invention. . Here, the plate washing | cleaning apparatus 100 which combined the ultrasonic cleaning part with 2nd Embodiment is demonstrated, referring FIG.

  FIG. 4 is a view showing a third embodiment of the plate cleaning apparatus according to the present invention. In the plate cleaning apparatus 100, the first cleaning unit 4 supplies the mixed fluid (= washing water + clean air) in a spray form to the upper surface Pa of the plate P on which the silver nanoparticles are dispersed and adhered, thereby producing silver nanoparticles. Are agglomerated to form a metal agglomerate 8, which is then washed away with washing water. Then, the second cleaning unit 9 performs brush cleaning on the upper surface Pa of the plate P subjected to the spray cleaning. A small amount of silver nanoparticles may enter the concavo-convex pattern PT (FIG. 2) of the plate P during spray cleaning and brush cleaning, but is efficiently removed from the concavo-convex pattern PT by the next ultrasonic cleaning unit 10. (Ultrasonic cleaning). Then, the washing water is finally removed by the drying unit 5 from the plate P that has been washed in these three different types of washing modes.

  As described above, in the third embodiment, since the silver nanoparticles are aggregated and washed and removed in the form of the metal aggregate 8, and the mode in which the silver nanoparticles are removed by ultrasonic waves are combined, the plate P From this, silver nanoparticles can be removed with high efficiency.

  The present invention is not limited to the above-described embodiment, and various modifications other than those described above can be made without departing from the spirit of the present invention. For example, in the above embodiment, the first cleaning unit 4 discharges the mixed fluid from the nozzle 42 in the form of a spray. However, instead of the mixed fluid, only the cleaning water may be supplied. The cleaning water may be discharged in a spray shape, or a slit nozzle having a discharge port extending in the X direction may be used as the nozzle 42.

  In the third embodiment, spray cleaning, brush cleaning, and ultrasonic cleaning are combined as cleaning means. However, similar effects can be obtained by combining spray cleaning and ultrasonic cleaning.

  The present invention can be applied to all plate cleaning techniques for cleaning the main surface of a plate to which metal nanoparticles are dispersed and adhered.

DESCRIPTION OF SYMBOLS 2 ... Conveyance part 4 ... 1st washing | cleaning part 6 ... Washing water supply part 8 ... Metal aggregate 9 ... 2nd washing | cleaning part 10 ... Ultrasonic washing part (3rd washing | cleaning part)
DESCRIPTION OF SYMBOLS 11 ... Cleaning tank 42 ... Nozzle 61 ... Tank 91 ... Roll brush 100 ... Plate washing apparatus 641 ... Piping 642 ... Filter P ... Plate Pa ... (plate) upper surface

Claims (6)

A plate cleaning apparatus for cleaning a plate having a main surface on which metal nanoparticles are dispersed and adhered,
A tank for storing wash water;
A cleaning tank having a cleaning space for cleaning the plate;
In the cleaning space, the cleaning water in the tank is supplied to the main surface of the plate to agglomerate the metal nanoparticles to form a metal aggregate and flow along the main surface A first cleaning section for removing the metal aggregates from the plate together with water;
A pipe for connecting the cleaning tank and the first cleaning section to distribute the cleaning water and the metal aggregate from the cleaning tank toward the tank;
A plate cleaning apparatus comprising: a filter that is inserted in the pipe and traps the metal agglomerate flowing through the pipe and allows the cleaning water to pass toward the tank. The plate cleaning apparatus according to claim 1,
The plate washing | cleaning apparatus further provided with the 2nd washing | cleaning part which wash | cleans the said main surface of the said plate wash | cleaned by the said 1st washing | cleaning part in the said washing | cleaning space with a brush. The plate cleaning apparatus according to claim 1 or 2,
A plate cleaning apparatus further comprising a third cleaning unit that is provided separately from the cleaning tank and ultrasonically cleans the main surface of the plate cleaned in the cleaning space. The plate cleaning apparatus according to any one of claims 1 to 3,
The plate cleaning apparatus, wherein the filter has a filtration accuracy of 30 μm to 100 μm. The plate cleaning apparatus according to claim 4,
The plate washing | cleaning apparatus with which the said washing tank is arrange | positioned in the vertical direction in the position higher than the said tank. A plate washing method for washing a plate having a main surface on which metal nanoparticles are dispersed and adhered,
In the cleaning tank, the cleaning water stored in the tank is supplied to the main surface of the plate so that the metal nanoparticles are aggregated by the cleaning water to form metal aggregates and flow along the main surface. Removing the metal agglomerates from the plate together with wash water;
Collecting the washing water containing the metal aggregates removed from the plate by the washing tank;
And a step of returning the washing water to the tank after removing the metal aggregates from the washing water collected by the washing tank using a filter.

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