JP4800820B2 - Semiconductor wafer processing method - Google Patents

Description

  The present invention supports the surface of a semiconductor wafer with a protective tape when performing back surface grinding of the semiconductor wafer, and after the back surface grinding of the semiconductor wafer, the protective tape is peeled off from the surface of the semiconductor wafer. It relates to a processing method.

  Conventionally, a method of supporting the surface of a semiconductor wafer (t = 20 to 100 μm) with a protective tape made of a rigid tape material when performing a thinning process for grinding the back surface of the semiconductor wafer has been used. When such a construction method is used, the support performance largely depends on the rigidity of the protective tape.

  For this reason, as a conventional protective tape, a base material having a thickness of about 300 μm and high rigidity such as PET resin (polyethylene terephthalate) is used.

  However, if this substrate is hard and thick, it becomes very difficult to bend the protective tape itself, and when the protective tape is peeled off from the surface of the semiconductor wafer after thinning, it induces cracks and cracks in the semiconductor wafer. This leads to a decrease in yield.

  Hereinafter, the process of peeling the conventional protective tape from the surface of a semiconductor wafer is demonstrated. FIG. 5A is a side view showing a state before the conventional protective tape 2 is peeled from the surface of the semiconductor wafer 1. FIG. 5B is a side view showing a state when the conventional protective tape 2 is peeled from the surface of the semiconductor wafer 1.

  As shown in FIG. 5A, a protective tape 2 having a three-layer structure of a base layer 3, an intermediate layer 4, and an adhesive layer 5 is attached to the surface of the semiconductor wafer 1. Further, a tape (not shown) for holding on the suction stage 7 is affixed to the back surface of the semiconductor wafer 1, and the semiconductor wafer 1 is held on the suction stage 7 via this tape.

  As shown in FIG.5 (b), the peeling tape 6 is affixed on the surface of the protective tape 2 affixed on the surface of the semiconductor wafer 1 toward the center part from the outermost peripheral part 1a. By pulling the peeling tape 6 in the peeling direction in the direction from the outermost peripheral portion 1a of the semiconductor wafer 1 toward the central portion, the protective tape 2 is peeled from the surface of the semiconductor wafer 1 while being bent 180 °. .

However, in such a configuration, since the PET resin material (polyethylene terephthalate) which is the main material constituting the base layer 3 of the protective tape 2 is a highly rigid material, the elastic modulus of the entire protective tape 2 is high (specifically, Is about 5 × 10 ⁹ N / cm), when pulling the peeling tape 6 and peeling the protective tape 2, a force in the vertical direction is generated on the surface of the semiconductor wafer 1, and bending stress due to rigidity or adsorption failure during peeling There is a problem that cracks and cracks occur in 40% or more of the semiconductor wafer 1 due to damage caused by the above.

Therefore, an adhesive layer that adheres to the semiconductor wafer by forming a slit in advance on the surface of the protective tape attached to the semiconductor wafer and forming an adhesive layer on the protrusion formed by forming the slit. There has been proposed one that makes it possible to reduce the area of the protective tape and easily peel the protective tape from the semiconductor wafer (see, for example, Patent Document 1).
JP 2003-218191 A

  However, when using a protective tape having slits formed from the beginning as described above, the following problems occur.

  The original role of the protective tape is to suppress the surface protection and warpage of the semiconductor wafer when performing the thinning process, but with the protective tape formed with slits in this way, the support performance is weakened and the thickness of the semiconductor wafer is reduced. When the thickness is reduced to 20 to 50 μm, there is a problem that a load is applied to the slit groove portion during polishing and there is a concern that cracks or cracks may occur. This is because the thickness of the semiconductor wafer varies due to the intrusion of bubbles between the protective tape and the semiconductor wafer, and a large load is applied to the protruding portion, so that cracks and cracks are likely to occur.

  Also, with the protective tape having the slits formed in this way, when the protective tape is applied to the surface of the semiconductor wafer, it is applied so that the boundary line of the semiconductor wafer and the slit of the protective tape form a predetermined angle (approximately 45 degrees). Since it needs to be attached, there arises a problem that high positional accuracy is required. In this way, it is required to stick at a predetermined angle because the stress applied to the surface of the semiconductor wafer is almost constant in order to prevent damage to the semiconductor wafer when the protective tape is peeled off from the surface of the semiconductor wafer. Because it is necessary to do.

  According to the present invention, a step of attaching a protective tape having a three-layer structure, which is laminated in the order of a base layer, an intermediate layer, and an adhesive layer, to the surface of a semiconductor wafer via the adhesive layer, and the step of attaching the protective tape The step of grinding the back surface of the semiconductor wafer, and after grinding the back surface of the semiconductor wafer, the base layer of the protective tape affixed to the surface of the semiconductor wafer, at least in a region including the outermost peripheral portion, The step of forming slit grooves at a predetermined interval from the outermost peripheral portion serving as a starting point toward the central portion, and the protective tape having the slit grooves formed in the base layer, the outermost peripheral portion serving as the starting point of the base layer And a step of peeling from the surface of the semiconductor wafer from the surface toward the central portion.

  According to the present invention, the slit groove is formed in the base layer (hereinafter referred to as the base material) after performing the back surface grinding (hereinafter referred to as the thinning process) of the semiconductor wafer. In addition to being able to properly suppress the surface protection and warpage of the semiconductor wafer due to the support effect due to the high rigidity of the base material on which the slit groove has not yet been formed, when the protective tape is peeled off, the slit groove is Since the material rigidity of the protective tape is already softened because it is already formed on the base material, the bending stress applied when the protective tape is peeled off can be reduced, reducing the damage to fragile semiconductor wafers. The cracking and chipping of the semiconductor wafer can be suppressed.

  According to the present invention, in the thinning process of the semiconductor wafer, in addition to being able to properly suppress the surface protection and warpage of the semiconductor wafer, the protective tape is peeled off without damaging the fragile semiconductor wafer. Therefore, the yield can be improved by suppressing cracking and chipping of the semiconductor wafer.

  Hereinafter, an embodiment of a semiconductor wafer processing method according to the present invention will be described with reference to the drawings. In all the drawings, the same reference numerals are given to the same components, and the description will be omitted as appropriate.

  In the semiconductor wafer processing method according to the present embodiment, a protective tape having a three-layer structure in which a base layer, an intermediate layer, and an adhesive layer are laminated in this order is attached to the surface of the semiconductor wafer via the adhesive layer. After forming the slit groove at a predetermined interval from the outermost peripheral part to the center part on the base layer of the protective tape, the protective tape is in a direction substantially orthogonal to the slit groove, And it peels in the direction which goes to the center part from the outermost periphery part.

  First, the structure of the protective tape will be described. FIG. 1A is a side view showing a state in which the protective tape 2 before the slit grooves are formed in the base layer (hereinafter referred to as a base material) 3 is attached to the surface of the semiconductor wafer 1.

  As shown in FIG. 1A, the protective tape 2 has a three-layer structure in which a base material 3, an intermediate layer 4, and an adhesive layer (hereinafter referred to as an adhesive material) 5 are laminated in this order. It is the base material 3 mainly made of a PET resin material (polyethylene terephthalate) that exhibits a support effect. Note that the outer shape of the protective tape 2 matches the outer shape of the semiconductor wafer 1.

  Next, the thinning process of the semiconductor wafer 1 will be described. When performing the thinning process, the protective tape 2 is attached to the surface of the semiconductor wafer 1. This is because the protective tape 2 protects the surface of the semiconductor wafer 1 and suppresses warping of the semiconductor wafer 1 by its support effect.

  With the protective tape 2 attached to the front surface of the semiconductor wafer 1 as described above, a thinning process for grinding the back surface of the semiconductor wafer 1 is performed. In this thinning process, the semiconductor wafer 1 is thinned to a thickness t = 20 to 100 μm, but the semiconductor wafer 1 is covered with a highly rigid protective tape 2 on which a slit groove is not yet formed on the base material 3. Since it will be hold | maintained, the surface will be protected appropriately and curvature will be controlled appropriately.

  Next, a method for peeling the protective tape 2 from the surface of the semiconductor wafer 1 will be described. As shown in FIG. 1A, the thinned semiconductor wafer 1 is attached to the suction stage 7 via the UV tape 8 attached to the back surface thereof. The adsorption stage 7 is provided with a heater (not shown) for heating the semiconductor wafer 1.

  FIG. 1B is a side view showing a state in which the slit grooves 3 a are formed on the base material 3 of the protective tape 2 attached to the surface of the semiconductor wafer 1. As shown in FIG. 1B, first, in a state where the semiconductor wafer 1 is attached to the suction stage 7, slit grooves are formed at predetermined intervals with respect to the base material 3 of the protective tape 2 attached to the surface thereof. 3a is formed. At this time, the slit grooves 3a are formed at a predetermined interval from the outermost peripheral portion 3b of the base material 3 toward the central portion. The slit groove 3 a is processed using a dicing saw (not shown) for cutting the semiconductor wafer 1. In the following, the outermost peripheral portion 3b of the base material 3 refers to the outermost peripheral portion of the base material 3 that is the starting point when the slit groove 3a is formed.

  FIG. 2A is a plan view showing a state in which slit grooves 3 a are partially formed at a predetermined interval with respect to the base material 3 of the protective tape 2 attached to the surface of the semiconductor wafer 1. At this time, the slit groove 3 a may be partially formed with respect to the substrate 3 as shown in FIG. Thus, by forming the slit groove 3a over a predetermined width from the outermost peripheral portion of the base material 3 toward the center portion, the protective tape 2 can be easily bent, and the semiconductor wafer 1 is initially peeled off. Stress applied to the surface can be reduced. In addition, the peeling direction of this protective tape 2 is a direction substantially orthogonal to the slit groove formed in the base material 3, and is the center part from the outermost peripheral part (= outermost peripheral part 3b of the base material 3) of the semiconductor wafer 1 It is the direction to go to.

  Here, the damage to the semiconductor wafer 1 is greatest at the beginning when the protective tape 2 is peeled off, but when the protective tape 2 is peeled off in this way, a slit is formed in the outermost peripheral portion 3b of the base material 3 which becomes the tip portion thereof. By forming the groove 3a and softening the material rigidity of the protective tape 2, the bending stress applied to the surface of the semiconductor wafer 1 at the beginning of peeling of the protective tape 2 can be reduced. 1 can be reduced, and cracking and chipping of the semiconductor wafer 1 can be suppressed.

  FIG. 2B is a plan view showing a state in which slit grooves 3a are formed on the entire surface of the base 3 of the protective tape 2 attached to the surface of the semiconductor wafer 1 at a predetermined interval. As shown in FIG. 2B, the slit groove 3 a may be formed on the entire surface of the base material 3. In this way, by forming the slit groove 3a over the entire surface of the substrate 3, it is possible to reduce the stress applied to the surface of the semiconductor wafer 1 not only at the beginning of peeling off the protective tape 2 but also until the peeling is completed. . In addition, the peeling direction of this protective tape 2 is a direction substantially orthogonal to the slit groove 3a formed in the base material 3, and is the center from the outermost peripheral part of the semiconductor wafer 1 (= the outermost peripheral part 3b of the base material 3). It is the direction toward the part.

  When the protective tape 2 is peeled off, if the slit groove 3a is formed in the outermost peripheral part 3b of the base material 3 which is the tip of the protective tape 2 to soften the material rigidity of the protective tape 2, the protective tape 2 is initially peeled off. As described above, the bending stress that is sometimes required can be reduced, damage to the fragile semiconductor wafer 1 can be reduced, and cracking and chipping of the semiconductor wafer 1 can be suppressed. However, if the slit groove 3a is formed over the entire surface of the substrate 3, the bending stress applied when the protective tape 2 is peeled off can always be reduced, and the damage given to the fragile semiconductor wafer 1 can be reduced. 1 can be further suppressed.

  Next, the slit-like protruding portion (= the remaining portion of the base material 3) of the base material 3 formed by forming the slit groove 3a on the base material 3 of the protective tape 2 is arranged on the outermost periphery along the slit groove 3a. Remove from the part 3b over a predetermined width. Here, in FIG. 2 (a), (b), the protrusion part of this base material 3 is shown by 3c, and the part which removed the protrusion part of the base material 3 is shown by 3d. Specifically, a plurality of slit-like protrusions of the base material 3 are removed over a width of about 5 to 10 mm from the outermost peripheral portion 3b of the base material 3 so as to include a plurality of slit grooves 3a. The processing for removing the protruding portion of the substrate 3 is also performed using a dicing saw (not shown) for cutting the semiconductor wafer 1. The width of the protruding portion of the base material 3 to be removed is larger than that of the slit groove, but such removal processing is performed by adjusting the feed pitch of a dicing saw (not shown) and processing it multiple times. Is possible.

  At this time, as shown in FIG. 1B, the protruding portion 3c of the base material 3 may be completely removed without leaving any thickness. The reason for removing the protruding portion 3c of the base material 3 over a predetermined width in this way is that, when a peeling tape 6 described later is applied to the protective tape 2, it is simply pasted so as to straddle the protruding portion 3c of the base material 3. However, it is better to remove the protruding portion 3c of the base material 3 over a predetermined width, and first apply the peeling tape 6 thereon, and then apply the adhesive tape so as to straddle the protruding portion 3c of the base material 3. (In order to obtain such an effect, it is about 5 to 10 mm from the outermost peripheral portion 3b of the base material 3 so as to include at least a plurality of slit grooves 3a. It is necessary to remove a plurality of slit-like protrusions of the base material 3 over the width).

  FIG. 3 is a side view showing a state in which the protruding portion 3c of the base material 3 is removed and the base material 3 is left by a predetermined thickness. As shown in FIG. 3, at this time, the protrusion 3c of the base material 3 is removed by leaving a predetermined thickness, and after processing, the base material 3 has a predetermined thickness, specifically about 5 to 15 μm. It may be possible to leave only minutes. The reason why the base material 3 is processed so as to leave a predetermined thickness in this way is that the PET resin material (polyethylene terephthalate), which is a raw material of the base material 3, is in close contact with the later-described release tape 6 compared to the intermediate layer 4. Therefore, the adhesive strength is more increased when the release tape 6 is applied to the remaining base material 3 than when the base material 3 is completely removed and the release tape 6 is applied to the intermediate layer 4. Because it can.

  Next, on the surface of the base material 3 including the portion of the base material 3 from which the protruding portion 3c is removed, in the direction substantially perpendicular to the slit groove 3a and from the outermost peripheral part 3b of the base material 3 to the center part A release tape 6 is applied toward the surface. That is, the peeling tape 6 is attached to the surface of the base material 3 so as to straddle the protrusion 3 c of the base material 3 in addition to the portion 3 d from which the protrusion 3 c of the base material 3 is removed. Thereby, compared with the case where the peeling tape 6 is just affixed so that it may straddle the protrusion part 3c of the base material 3, an adhesion area can increase more and adhesive strength can be increased more.

  Next, heat of about 40 to 60 ° C. is applied to the semiconductor wafer 1 attached to the suction stage 7 by a heater (not shown) provided on the suction stage 7. The semiconductor wafer 1 is heated in this way by peeling the protective tape 2 from the semiconductor wafer 1 by raising the temperature of the protective tape 2 attached to the surface of the semiconductor wafer 1 and reducing the adhesive strength of the adhesive material 5. This is to make it easier.

  Next, an operation for peeling the protective tape 2 from the surface of the semiconductor wafer 1 will be described. FIG. 4 is a side view showing a state in which the protective tape 2 is peeled off from the surface of the semiconductor wafer 1.

  As shown in FIG. 4, the protective tape 2 is peeled from the surface of the semiconductor wafer 1 attached to the suction stage 7 in a state where the protective tape 2 is at a high temperature and the adhesive force of the adhesive material 5 is reduced.

  Specifically, by pulling the release tape 6 in the direction from the outermost peripheral portion 1b of the semiconductor wafer 1 (= the outermost peripheral portion of the base material 3) toward the central portion, the protective tape 2 itself is bent in the opposite direction by 180 °. Peel from the surface of the semiconductor wafer 1.

  At this time, since the slit groove 3a is already formed in the base material 3 having high rigidity, the protective tape 2 has softened material rigidity, and can reduce the bending stress of the protective tape 2 at the beginning of peeling. it can. Thereby, the protective tape 2 can be peeled without damaging the fragile semiconductor wafer 1. Furthermore, when the slit groove 3a is formed over the entire surface of the substrate 3, the bending stress of the protective tape 2 can always be reduced not only at the beginning of peeling but also until the end of peeling. Thereby, the protective tape 2 can be peeled without damaging the fragile semiconductor wafer 1 at the time of peeling.

  As described above, according to the semiconductor wafer processing method of the present invention, the slit groove is formed in the base layer after the backside grinding of the semiconductor wafer. Therefore, in the semiconductor wafer thinning process, the slit groove is formed. In addition to being able to properly suppress the surface protection and warpage of the semiconductor wafer due to the support effect due to the high rigidity of the base material that has not yet been formed, when removing the protective tape, the slit groove is already on the base material Since the material rigidity of the protective tape is softened and the bending stress applied when the protective tape is peeled off can be reduced, damage to fragile semiconductor wafers is reduced, and the semiconductor wafer Can be prevented from cracking or chipping.

Fig.1 (a) is a side view which shows the state by which the protective tape before the slit groove | channel was formed in the base material was affixed on the surface of the semiconductor wafer. FIG.1 (b) is a side view which shows the state in which the slit groove | channel was formed in the base material of the protective tape affixed on the surface of the semiconductor wafer. FIG. 2A is a plan view showing a state in which slit grooves are partially formed at predetermined intervals with respect to the base material of the protective tape attached to the surface of the semiconductor wafer. FIG. 2B is a plan view showing a state in which slit grooves are entirely formed at predetermined intervals on the base material of the protective tape attached to the surface of the semiconductor wafer. It is a side view which shows the state which removed the protrusion part of the base material and left the base material only for predetermined thickness. It is a side view which shows the state which peels a protective tape from the surface of a semiconductor wafer. Fig.5 (a) is a side view which shows the state before the conventional masking tape peels from the surface of a semiconductor wafer. FIG.5 (b) is a side view which shows the state at the time of the conventional masking tape peeling from the surface of a semiconductor wafer.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Semiconductor wafer 1a Outermost peripheral part 1b Outermost peripheral part 2 Protective tape 3 Base material 3a Slit groove 3b Outermost peripheral part 3c Projection part 4 Intermediate layer 5 Adhesive material 6 Release tape 7 Adsorption stage 8 UV tape

Claims (2)

A step of attaching a protective tape having a three-layer structure, which is laminated in the order of a base layer, an intermediate layer, and an adhesive layer, to the surface of the semiconductor wafer via the adhesive layer;
Grinding the back surface of the semiconductor wafer to which the protective tape is attached;
After grinding the back surface of the semiconductor wafer,
With respect to the base layer of the protective tape affixed to the surface of the semiconductor wafer, at least a part of the area including the outermost peripheral portion, slit grooves at a predetermined interval from the outermost peripheral portion as a starting point toward the central portion. Forming a step;
Peeling the protective tape having the slit groove formed in the base layer from the outermost peripheral portion serving as the starting point of the base layer toward the central portion, from the surface of the semiconductor wafer;
A method for processing a semiconductor wafer, comprising: After forming the slit groove,
Removing the base layer over a predetermined width including the plurality of slit grooves from the outermost peripheral portion serving as the starting point;
A step of attaching a release tape to the surface of the base layer including the region from which the base layer has been removed from the outermost peripheral portion serving as the starting point toward the central portion;
Further including
In the step of peeling off the protective tape, the protective tape is pulled out from the outermost peripheral portion serving as the starting point of the base layer toward the central portion, whereby the protective tape is removed from the outermost peripheral portion serving as the starting point of the base layer. 2. The semiconductor wafer processing method according to claim 1, wherein the semiconductor wafer is peeled from the surface of the semiconductor wafer from a portion toward the center portion.

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