JP4783564B2 - 磁気共鳴イメージング・システム向けの極片を製作するためのシステム及び方法 - Google Patents

磁気共鳴イメージング・システム向けの極片を製作するためのシステム及び方法 Download PDF

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Publication number
JP4783564B2
JP4783564B2 JP2004315280A JP2004315280A JP4783564B2 JP 4783564 B2 JP4783564 B2 JP 4783564B2 JP 2004315280 A JP2004315280 A JP 2004315280A JP 2004315280 A JP2004315280 A JP 2004315280A JP 4783564 B2 JP4783564 B2 JP 4783564B2
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Japan
Prior art keywords
sheet
directional
magnetization direction
easy magnetization
sheets
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JP2004315280A
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Japanese (ja)
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JP2005131410A5 (enExample
JP2005131410A (ja
Inventor
ウィリアム・ダニエル・バーバー
ブレント・アクセル
ピーター・ジョージ・フリッシュマン
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GE Medical Systems Global Technology Co LLC
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GE Medical Systems Global Technology Co LLC
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
    • G01R33/28—Details of apparatus provided for in groups G01R33/44 - G01R33/64
    • G01R33/38—Systems for generation, homogenisation or stabilisation of the main or gradient magnetic field
    • G01R33/3806—Open magnet assemblies for improved access to the sample, e.g. C-type or U-type magnets

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
JP2004315280A 2003-10-31 2004-10-29 磁気共鳴イメージング・システム向けの極片を製作するためのシステム及び方法 Expired - Fee Related JP4783564B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/699,185 2003-10-31
US10/699,185 US6937018B2 (en) 2003-10-31 2003-10-31 Systems and methods for fabricating pole pieces for magnetic resonance imaging systems

Publications (3)

Publication Number Publication Date
JP2005131410A JP2005131410A (ja) 2005-05-26
JP2005131410A5 JP2005131410A5 (enExample) 2009-12-03
JP4783564B2 true JP4783564B2 (ja) 2011-09-28

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ID=34550878

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JP2004315280A Expired - Fee Related JP4783564B2 (ja) 2003-10-31 2004-10-29 磁気共鳴イメージング・システム向けの極片を製作するためのシステム及び方法

Country Status (4)

Country Link
US (1) US6937018B2 (enExample)
JP (1) JP4783564B2 (enExample)
CN (1) CN1611961B (enExample)
IT (1) ITMI20041983A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4051301B2 (ja) * 2003-02-12 2008-02-20 ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー 円形ポールピースおよびｍｒｉ装置
US20070132386A1 (en) * 2005-12-12 2007-06-14 Lg Electronics Inc. Plasma display device
MX384149B (es) * 2014-09-05 2025-03-14 Hyperfine Inc Aumento ferromagnético para formación de imagenes por resonancia magnética.
US10104816B2 (en) * 2016-02-05 2018-10-16 Taiwan Semiconductor Manufacturing Co., Ltd. Board, semiconductor fabrication plant (FAB) and fabrication facility

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2875114A (en) * 1957-04-12 1959-02-24 Westinghouse Electric Corp Iron-aluminum materials for magnetic applications
US3248781A (en) * 1961-02-27 1966-05-03 Gen Electric Method of making reactive transformers
US3078198A (en) * 1961-06-07 1963-02-19 Westinghouse Electric Corp Process for producing oriented silicon steel
JP2808198B2 (ja) * 1990-07-02 1998-10-08 住友特殊金属株式会社 Ｍｒｉ用磁界発生装置とその製法
EP0479514B1 (en) * 1990-09-29 1998-07-01 Sumitomo Special Metals Co., Ltd. Magnetic field generating device used for MRI
JP2561591B2 (ja) * 1991-12-27 1996-12-11 住友特殊金属株式会社 Ｍｒｉ用磁界発生装置
MY119423A (en) * 1993-01-15 2005-05-31 Hitachi Global Storage Tech Nl Layered magnetic structure for use in a magnetic head
JPH0831635A (ja) * 1994-07-08 1996-02-02 Sumitomo Special Metals Co Ltd Ｍｒｉ用磁界発生装置
JP3016544B2 (ja) * 1995-06-08 2000-03-06 信越化学工業株式会社 永久磁石磁気回路
JP3073933B2 (ja) * 1996-08-05 2000-08-07 住友特殊金属株式会社 Ｍｒｉ用磁界発生装置
DE69706388T2 (de) * 1996-10-21 2002-02-14 Kawasaki Steel Corp., Kobe Kornorientiertes elektromagnetisches Stahlblech
WO1999046417A1 (fr) * 1998-03-12 1999-09-16 Nkk Corporation Tole d'acier au silicium et son procede de fabrication
US6794973B1 (en) * 1998-04-14 2004-09-21 Sumitomo Special Metals Co., Ltd. Magnetic field generating device for MRI
KR19990088437A (ko) * 1998-05-21 1999-12-27 에모또 간지 철손이매우낮은고자속밀도방향성전자강판및그제조방법
JP2000030932A (ja) * 1998-07-09 2000-01-28 Shin Etsu Chem Co Ltd 永久磁石対向型磁気回路
US6150818A (en) * 1998-08-31 2000-11-21 General Electric Company Low eddy current and low hysteresis magnet pole faces in MR imaging
US6259252B1 (en) * 1998-11-24 2001-07-10 General Electric Company Laminate tile pole piece for an MRI, a method manufacturing the pole piece and a mold bonding pole piece tiles
US6150819A (en) * 1998-11-24 2000-11-21 General Electric Company Laminate tiles for an MRI system and method and apparatus for manufacturing the laminate tiles
JP2000164429A (ja) * 1998-11-26 2000-06-16 Nippon Jiseizai Kogyo Kk 磁性コア
JP2001358377A (ja) * 2000-02-10 2001-12-26 Toshiba Corp 超磁歪材料とその製造方法、およびそれを用いた磁歪アクチュエータと磁歪センサ
JP2002220642A (ja) * 2001-01-29 2002-08-09 Kawasaki Steel Corp 鉄損の低い方向性電磁鋼板およびその製造方法

Also Published As

Publication number Publication date
CN1611961A (zh) 2005-05-04
CN1611961B (zh) 2010-06-16
US20050093542A1 (en) 2005-05-05
US6937018B2 (en) 2005-08-30
ITMI20041983A1 (it) 2005-01-19
JP2005131410A (ja) 2005-05-26

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