JP4741507B2 - コンパクトな設計の高度繰り返しレーザーシステム - Google Patents
コンパクトな設計の高度繰り返しレーザーシステム Download PDFInfo
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- JP4741507B2 JP4741507B2 JP2006540379A JP2006540379A JP4741507B2 JP 4741507 B2 JP4741507 B2 JP 4741507B2 JP 2006540379 A JP2006540379 A JP 2006540379A JP 2006540379 A JP2006540379 A JP 2006540379A JP 4741507 B2 JP4741507 B2 JP 4741507B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/235—Regenerative amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/08—Generation of pulses with special temporal shape or frequency spectrum
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/0615—Shape of end-face
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S372/00—Coherent light generators
- Y10S372/70—Optical delay
Description
6’ レーザー媒質
9 回折格子
10 反射器
11 ミラー
12 パルス遅延発生器とポッケルスセル用高電圧供給器
13 フェムト秒パルス発振器 150フェムト秒, 80メガHz, 250ミリワット出力,1040ナノメートル波長
14 ミラー
14’ ミラー
PD フォトダイオード
PC ポッケルスセル
PBS 偏光子
TFP 薄膜偏光子
M1 曲面ミラー
M2 曲面ミラー
M3 曲面ミラー
DM ダイクロイックミラー
L1 モードマッチングレンズ
L2 モードマッチングレンズ
Lc 回折格子反射間の光路長
FR ファラデー回転子
λ/2 1/2波長板
λ/4 1/4波長板
Claims (18)
- 少なくとも、
レーザー増幅媒質(6)と、
少なくとも一つの共振器ミラー(5)を有するレーザー共振器と、少なくとも一つの変調器(3)と、
前記レーザー増幅媒質(6)をポンプするためのレーザーポンプ源とからなり、
前記レーザー共振器が、特別に設計された部材としての、構造及び材料の少なくとも一方に関連した分散効果を有するパルス幅延長回路(7、8a、8b)を有し、前記構造及び材料の少なくとも一方は、前記パルス幅延長回路(7、8a、8b)が最大2次の分散と共に最低3次の分散を有するように最適化されていることを特徴とする、
再生増幅器の原理に従う繰り返し率が50kHz以上のレーザーシステム。 - 前記レーザーポンプ源は、レーザダイオードからなることを特徴とする請求項1に記載のレーザーシステム。
- 前記パルス幅延長回路(7)が、高度分散材料のブロックを有することを特徴とする請求項1又は2に記載のレーザーシステム。
- 前記高度分散材料は、SF57ガラス、SF10ガラス、又はBK7ガラスであることを特徴とする請求項3に記載のレーザーシステム。
- 前記ブロック内で、多重反射が発生することを特徴とする請求項3又は4に記載のレーザーシステム。
- 前記多重反射は、界面での反射により発生するものであることを特徴とする請求項5に記載のレーザーシステム。
- 前記パルス幅延長回路(8a、8b)が、折り返しミラーを有することを特徴とする請求項1ないし6のいずれか一項に記載のレーザーシステム。
- 前記折り返しミラーは、Gires−Tournois干渉計又は分散的層構造であることを特徴とする請求項7に記載のレーザーシステム。
- 前記パルス幅延長回路(8a、8b)が少なくとも2つの対向して開き角を有する反射面を備え、レーザービームが前記表面の少なくとも一つで少なくとも2回反射されることを特徴とする請求項7又は8に記載のレーザーシステム。
- 前記開き角は、調整可能であることを特徴とする請求項9に記載のレーザーシステム。
- 前記レーザー増幅媒質(6)は、1ミリ秒以上の反転ライフタイムを有することを特徴とする請求項1ないし10のいずれか一項に記載のレーザーシステム。
- 前記レーザー増幅媒質(6)は、イッテルビウムガラス又はイッテルビウム結晶からなることを特徴とする請求項11に記載のレーザーシステム。
- シードパルスをフェムト秒パルス又はピコ秒パルスとしてレーザー共振器に入力するように形成され配置された、シードパルスを入力するためのフェムト秒発振器(13)を特徴とする請求項1ないし12のいずれか一項に記載のレーザーシステム。
- 前記変調器(3)としての電気光学的スイッチング素子を特徴とする請求項1ないし13のいずれか一項に記載のレーザーシステム。
- レーザー共振器の外側にあるパルス圧縮器を特徴とする請求項1ないし14のいずれか一項に記載のレーザーシステム。
- 前記パルス圧縮器は、Treacy設計によるものであることを特徴とする請求項15に記載のレーザーシステム。
- 前記パルス圧縮器が1700ライン/mm以下の分散型の回折格子を有することを特徴とする請求項15又は16に記載のレーザーシステム。
- 前記パルス圧縮器が1200ライン/mm以下の分散型の回折格子を有することを特徴とする請求項17に記載のレーザーシステム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US52517803P | 2003-11-28 | 2003-11-28 | |
US60/525,178 | 2003-11-28 | ||
PCT/EP2004/013375 WO2005053118A1 (de) | 2003-11-28 | 2004-11-25 | Hochrepetierendes lasersystem mit kompaktem aufbau |
Publications (3)
Publication Number | Publication Date |
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JP2007512693A JP2007512693A (ja) | 2007-05-17 |
JP2007512693A5 JP2007512693A5 (ja) | 2010-09-09 |
JP4741507B2 true JP4741507B2 (ja) | 2011-08-03 |
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Application Number | Title | Priority Date | Filing Date |
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JP2006540379A Active JP4741507B2 (ja) | 2003-11-28 | 2004-11-25 | コンパクトな設計の高度繰り返しレーザーシステム |
Country Status (5)
Country | Link |
---|---|
US (1) | US7924902B2 (ja) |
EP (1) | EP1687876B1 (ja) |
JP (1) | JP4741507B2 (ja) |
DE (1) | DE502004008293D1 (ja) |
WO (1) | WO2005053118A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4452803B2 (ja) * | 2004-12-17 | 2010-04-21 | 独立行政法人産業技術総合研究所 | 非平行平面鏡対を用いた超短パルスレーザー発振器 |
JP5177969B2 (ja) * | 2006-07-12 | 2013-04-10 | 浜松ホトニクス株式会社 | 光増幅装置 |
JP5456993B2 (ja) * | 2008-06-20 | 2014-04-02 | 富士フイルム株式会社 | モード同期固体レーザ装置 |
JP5456994B2 (ja) * | 2008-06-20 | 2014-04-02 | 富士フイルム株式会社 | モード同期固体レーザ装置 |
JP5456992B2 (ja) * | 2008-06-20 | 2014-04-02 | 富士フイルム株式会社 | モード同期固体レーザ装置 |
CN102782965B (zh) * | 2010-02-17 | 2016-01-20 | 高质激光有限公司 | 产生可反复调用的激光脉冲的激光放大系统和激光放大方法 |
US9054479B2 (en) * | 2010-02-24 | 2015-06-09 | Alcon Lensx, Inc. | High power femtosecond laser with adjustable repetition rate |
AT510116B1 (de) | 2010-06-22 | 2012-06-15 | High Q Laser Gmbh | Laser |
JP2012219661A (ja) * | 2011-04-05 | 2012-11-12 | National Institute Of Advanced Industrial Science & Technology | レーザ着火装置 |
US9008144B2 (en) * | 2012-01-20 | 2015-04-14 | Henry Yang Pang | Low noise optically pumped laser structures utilizing dispersion elements |
JP6202316B2 (ja) * | 2013-10-17 | 2017-09-27 | 国立研究開発法人産業技術総合研究所 | チャープパルス増幅装置 |
DE102014109681B4 (de) * | 2014-07-10 | 2021-02-25 | Rofin-Baasel Lasertech Gmbh & Co. Kg | Faltungsoptik für einen Laserpulskompressor sowie Laserpulsanordnung mit einer Faltungsoptik |
CN108365513A (zh) * | 2018-04-28 | 2018-08-03 | 哈尔滨工业大学 | 一种激光再生放大器的脉冲稳定性控制装置及方法 |
EP3918677A4 (en) * | 2019-02-02 | 2022-11-30 | MKS Instruments | LOW REPETITION RATE INFRARED TUNABLE FEMTOSECOND LASER SOURCE |
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JPH0223302A (ja) * | 1988-07-12 | 1990-01-25 | Agency Of Ind Science & Technol | 光パルスの周波数チャープ補償が出来る誘電体多層膜 |
JPH08264869A (ja) * | 1995-03-20 | 1996-10-11 | Nippon Telegr & Teleph Corp <Ntt> | 分散補正装置 |
JPH09260762A (ja) * | 1996-03-25 | 1997-10-03 | Hamamatsu Photonics Kk | 超短パルスレーザ装置 |
US6150630A (en) * | 1996-01-11 | 2000-11-21 | The Regents Of The University Of California | Laser machining of explosives |
DE10063976A1 (de) * | 2000-12-21 | 2002-07-04 | Lzh Laserzentrum Hannover Ev | Resonator, regenerativer Verstärker für ultrakurze Laserpulse und mehrschichtiger Spiegel |
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WO2004107513A2 (de) | 2003-05-30 | 2004-12-09 | High Q Laser Production Gmbh | Verfahren und vorrichtungen zum unterdrücken von effekten nichtlinearer dynamik in einem laser |
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2004
- 2004-11-25 JP JP2006540379A patent/JP4741507B2/ja active Active
- 2004-11-25 EP EP04803268A patent/EP1687876B1/de active Active
- 2004-11-25 WO PCT/EP2004/013375 patent/WO2005053118A1/de active Application Filing
- 2004-11-25 US US10/578,508 patent/US7924902B2/en active Active
- 2004-11-25 DE DE502004008293T patent/DE502004008293D1/de active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0223302A (ja) * | 1988-07-12 | 1990-01-25 | Agency Of Ind Science & Technol | 光パルスの周波数チャープ補償が出来る誘電体多層膜 |
JPH08264869A (ja) * | 1995-03-20 | 1996-10-11 | Nippon Telegr & Teleph Corp <Ntt> | 分散補正装置 |
US6150630A (en) * | 1996-01-11 | 2000-11-21 | The Regents Of The University Of California | Laser machining of explosives |
JPH09260762A (ja) * | 1996-03-25 | 1997-10-03 | Hamamatsu Photonics Kk | 超短パルスレーザ装置 |
DE10063976A1 (de) * | 2000-12-21 | 2002-07-04 | Lzh Laserzentrum Hannover Ev | Resonator, regenerativer Verstärker für ultrakurze Laserpulse und mehrschichtiger Spiegel |
Also Published As
Publication number | Publication date |
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WO2005053118A1 (de) | 2005-06-09 |
US20070053401A1 (en) | 2007-03-08 |
US7924902B2 (en) | 2011-04-12 |
JP2007512693A (ja) | 2007-05-17 |
DE502004008293D1 (de) | 2008-11-27 |
EP1687876A1 (de) | 2006-08-09 |
EP1687876B1 (de) | 2008-10-15 |
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