JP4728242B2 - Torsional resonator and filter using the same - Google Patents

Torsional resonator and filter using the same Download PDF

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JP4728242B2
JP4728242B2 JP2006531388A JP2006531388A JP4728242B2 JP 4728242 B2 JP4728242 B2 JP 4728242B2 JP 2006531388 A JP2006531388 A JP 2006531388A JP 2006531388 A JP2006531388 A JP 2006531388A JP 4728242 B2 JP4728242 B2 JP 4728242B2
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torsional
resonator
torsional resonator
vibrator
vibration
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JPWO2006013741A1 (en
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英樹 川勝
邦彦 中村
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Panasonic Corp
Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • H03H3/0076Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks for obtaining desired frequency or temperature coefficients
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H9/02259Driving or detection means
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H9/02433Means for compensation or elimination of undesired effects
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H03H9/2447Beam resonators
    • H03H9/2463Clamped-clamped beam resonators
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H2009/02488Vibration modes
    • H03H2009/02519Torsional

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Micromachines (AREA)

Description

【技術分野】
【0001】
本発明は、捩り共振器およびこれを用いたフィルタに係り、特に高密度に集積化された電気回路内において、捩り共振を用いて高性能のフィルタ回路を実現するものに関する。
【背景技術】
【0002】
従来の機械共振器について図18を参照して説明する。図18は非特許文献1に紹介されている「たわみ振動を用いた機械振動フィルタ」の構成を簡略化して示した図である。
このフィルタは、シリコン基板上に薄膜プロセスを用いてパターン形成を行うことで形成され、入力線路104と、出力線路105と、それぞれの線路に対して1ミクロン以下の空隙をもって配置された両持ち梁101、102と、その2つの梁を結合する結合梁103とで構成されている。入力線路104から入力した信号は、梁101と容量的に結合し、梁101に静電力を発生させる。信号の周波数が、梁101、102および結合梁103からなる弾性構造体の共振周波数近傍と一致したときのみ、機械振動が励振され、この機械振動をさらに出力線路105と梁102との間の静電容量の変化として検出することで、入力信号のフィルタリング出力を取り出すようにしたものである。
【0003】
矩形断面の両持ち梁の場合、弾性率E、密度ρ、厚みh、長さLとすると、たわみ振動の共振周波数fは、次式となる。
【数1】

Figure 0004728242
【0004】
材料をポリシリコンとするとE=160GPa、ρ=2.2×103kg/m3、また寸法をL=40μm、h=1.5μmとするとf=8.2MHzとなり、約8MHz帯のフィルタを構成することが可能である。コンデンサやコイルなどの受動回路で構成したフィルタに比べて、機械共振を用いることで、Q値の高い急峻な周波数選択特性を得ることができる。
【0005】
しかしながら、上記構成では、さらに高周波帯のフィルタを構成するには、以下のような制約がある。すなわち、(数1)から明らかなように、第1に材料を変更してE/ρを大きくすることが望ましいことがわかるが、Eを大きくすると、梁をたわませる力が同じであっても梁の変位量は小さくなってしまい、梁の変位を検知することが難しくなる。また、梁の曲がりやすさをあらわす指標を、両持ち梁の梁表面に静荷重を加えたときの梁中心部のたわみ量dと梁の長さLの比d/Lとすると、d/Lは、次式の比例関係で表される。
【数2】
Figure 0004728242
【0006】
これらから、d/Lの値を保ちながら共振周波数を上げるには、少なくともEは変更できず、密度ρの低い材料を求める必要があるが、ポリシリコンと同等のヤング率で密度が低い材料としてはCFRP(Carbon Fiber Reinforced Plastics)等の複合材料を用いる必要がある。この場合、半導体プロセスで微小機械振動フィルタを構成することは難しくなる。
【0007】
そこで、このような複合材料を用いない第2の方法としては、(数1)において梁の寸法を変更して、h・L-2を大きくすることがある。しかし、梁の厚みhを大きくすることと、梁の長さLを小さくすることは、たわみやすさの指標である(数2)のd/Lを小さくしてしまい、梁のたわみを検出することが困難となる。
【0008】
(数1)および(数2)について、log(L)とlog(h)の関係を図19に示すと、直線191は(数1)から求まる関係であり、直線192は(数2)から求まる関係である。この図19において、現寸法A点を起点に傾き「2」の直線より上の範囲(領域A)のLとhを選ぶとfは大きくなり、傾き「1」の直線より下の範囲(領域B)のLとhを選ぶとd/Lは大きくなる。従って、図中のハッチング部分(領域C)が梁のたわみ量も確保しつつ、共振周波数を上げることができるLとhの範囲である。
【0009】
図19より明らかなことは、機械振動フィルタの高周波化には、梁の長さLおよび梁の厚みh双方の寸法の微小化が必要条件であり、Lおよびhを同じスケーリングで小型化すること、すなわち傾き1の直線に乗りながらLとhを小さくすることは、図19のハッチング部分の十分条件である。
【0010】
このように、従来の機械共振器では機械振動体の寸法を小型化することで、共振周波数は高周波化される。しかし、概して寸法を小型化することで、たわみ振動の機械的Q値が低下するという課題を有していた。この現象については例えば非特許文献2において、単結晶シリコン片持ち梁を用いて、梁の長さ、厚みおよびたわみ共振のQ値の関係を測定した結果が示されている。この非特許文献2では、梁の長さを短く、かつ梁の厚さを薄くすることでQ値は低下していることが示されている。従って、従来のたわみ振動を用いた共振器を小型化してフィルタに適用すると、望ましい周波数選択特性を得るために必要なQ値が得られない場合も生じるという課題を有していた。
【0011】
そこで、Q値のすぐれた共振器として捩り振動子を利用した捩り共振器が考えられる。例えば図21に示すように、この捩り共振器は、両持ち梁中央部にパドル202を有する振動子201を用いて、入力線路204とパドル202との間の静電力で振動子を励振し、出力線路205とパドル202間の静電容量の変化を電気信号に変換する。この捩り共振器においては、パドルと入力線路間電圧Vi、パドル202と出力線路205間電圧Vo各々の大きさや位相差によって励起されるモードが異なる。今、|Vi|>|Vo|とし、Voによる静電力の梁の振動への関与が極めて少ないとすると、振動子にはたわみ振動と捩り振動が励起される。
【0012】
このように、捩り振動子を利用した捩り共振器には捩り振動以外、すなわち捩り振動を励起する電極でたわみ振動も励起してしまうことになり、このような捩り共振器をフィルタに応用した場合は、通過帯域以外にも意図しない通過帯域を有することになる。
【0013】
また、特定の振動モードを選択的に励起する方法として、特許文献1に記載された作動シグナリングがある。これは、複数個の腹を有する高次のたわみ振動に対する励振方法であり、交流信号vと180度位相の異なる−vの信号のうち、一方を腹に近づく電極に印加し、他方を腹と遠ざかる電極に印加する。交流信号vから交流信号−vを作製するには、vを分波して180度移相器に通すのが一般的である。
【0014】
【非特許文献1】
Frank D.Bannon III, John R.Clark, and Clark T.-C.Nguyen, "High-Q HF Microelectromechanical Filters," IEEE Journal of Solid-State Circuits, Vol. 35, No.4, pp.512-526, April 2000.
【非特許文献2】
K. Y. Yasumura et al., "Quality Factors in Micron-and Submicron-Thick Cantilevers", IEEE Journal of Microelectromechanical Systems, Vol. 9, No.1, March 2000.
【特許文献1】
特表2002−535865号公報(第20−21頁、図8)
【発明の開示】
【発明が解決しようとする課題】
【0015】
しかしながら、特許文献1の方法では、移相器には通常、波長オーダの線路長が必要となるためフィルタの小型化の妨げとなる。また、180度の位相を精度良く作るための調整が必要となる。さらに目的とする周波数1点以外では目的とする移相量からのずれが生じるため、この交流信号を用いて適応的に共振周波数が可変な共振器を励振しようとすると、ある共振周波数ではvと−vで励振できても、異なる共振周波数に切り替えた場合は、−vの信号を確保するのが困難となる。
本発明は、前記実情に鑑みてなされたもので、簡易な方法で捩り共振器の捩り振動以外の振動モードを極力抑制することができ、高周波での使用が可能な捩り共振器を提供することを目的とする。
特に、本発明は、適応的に共振周波数が切替可能な共振器に対しても、簡易な方法で捩り振動以外の振動モードを極力抑制できる共振器を提供することも目的とする。
【課題を解決するための手段】
【0016】
前記課題を解決するため、本発明の捩り共振器は、振動体が梁構造、または梁構造上にパドル状の突起構造を付加したものであり、電極と振動体間の電位差により生ずる静電力が、振動体の梁の軸を中心軸としたモーメントを加えるもので、かつ梁にたわみを生ずる力を加えないものであることを特徴とする。
本構成によって、簡易な方法で捩り共振器の捩り振動以外の振動モードを極力抑制することが可能となる。
【0017】
すなわち、本発明の捩り共振器は、梁構造体で構成され、捩り振動を行う振動体と、前記振動体の前記梁構造体の軸に対し対称な部分に近接し、前記振動体との間の電位差により生ずる静電力が、前記梁構造体の軸を中心軸としたモーメントを生起し、前記振動体の捩り振動に伴い、一方の電極と前記振動体との距離が遠ざかるとき、他方の電極と前記振動体との距離が近づく位置にそれぞれ配置された電極対と、前記電極対のそれぞれに、前記振動体の電位を基準として、同一交流信号と、互いに極性の異なる直流バイアス電圧を印加するように構成された駆動手段と、を具備したことを特徴とする。
上記構成によれば、簡単な構成で捩り振動を生起することができ、望ましいQ値をもつ共振特性を得ることができる。また、この構成によれば、簡単な構成で、捩り振動のみを生起することができる。
【0018】
また、本発明の捩り共振器は、前記梁構造体が、軸対称となる位置に突出部を具備した梁を備えたものを含む。
この構成によれば、電極と梁構造体との間で静電力を生起しやすく、効率よく捩り振動を生起することができる。またこの梁は両持ち梁であれば、より安定であるが、片持ち梁であってもよい。
【0019】
また、本発明の捩り共振器は、前記梁構造体が、パドル状の突出部を具備したものを含む。
【0020】
また、本発明の捩り共振器は、2対以上の電極対を有し、前記駆動手段は、前記電極対の少なくとも一部の電極に印加される直流バイアス電圧の極性を切り替えることで、捩り共振の低次モードと高次モードとを切り替えるようにしたものを含む。
【0021】
また、本発明の参考例の捩り共振器は、前記電極が、前記振動体の捩り振動に伴い、前記振動体との距離が等しくなるように、前記振動体に対し捩れの方向に配置されて電極対を構成しており、前記駆動手段は、前記振動体の捩り振動に伴い、前記電極対には、同一交流信号と、同一の直流バイアス電圧を印加するように構成されたことを特徴とする。
この構成によれば、各電極に同一電圧を印加すればよいため、駆動手段を簡略化することができる。
【0022】
また、本発明の捩り共振器は、異なる捩り共振周波数を有する前記複数の捩り共振器と、前記捩り共振器の少なくとも1つを選択するスイッチ素子とを備えたものを含む。
【0023】
また、本発明の捩り共振器は、電気的に並列に配置された複数個捩り共振器を備えたものを含む。
【0024】
また、本発明の捩り共振器は、前記捩り共振器が、雰囲気を真空に封止したケース内に収納されたものを含む。
また、本発明のフィルタは、上記捩り共振器を用いたものを含む。
【発明の効果】
【0025】
本発明の捩り共振器の構成によれば、Q値が高く、数百MHz〜数GHz帯で使用可能なフィルタを提供することができる。
【発明を実施するための最良の形態】
【0026】
以下、本発明の実施の形態について、図面を参照しつつ詳細に説明する。
(実施の形態1)
図1は、本発明の実施の形態1における捩り共振器の斜視図である。本実施の形態1の捩り共振器は、軸対称位置にパドル状突起3a、3b、3c、3dを有する機械的振動を行う振動体1と、各パドル状突起3a、3b、3c、3dに近接して配置された電極4a、4b、4c、4dとを有し、各パドル状突起3a、3b、3c、3dとこれらにそれぞれ対応する電極4a、4b、4c、4dとの間の電圧変化を、前記振動体の振動に変換する電気機械変換機能を有する電気機械共振器であり、前記電極4a、4b、4c、4dと前記振動体との間の電位差により生ずる静電力が、前記振動体1の梁構造体の軸を中心軸としたモーメントを生起するように構成された駆動手段とを具備したことを特徴とする。
【0027】
ここで、振動体1は両端を固定された両持ち梁である。振動体1には、4つのパドル3a〜3dが配置されている。各パドル3に対向して基板2上には電極4a〜4dがギャップgを介して配置されている。梁の材料はヤング率約160GPaの単結晶シリコンであり、長さLは1.0μm、厚さtは100nm、幅Wは100nm、パドル長Lpは100nmとした。
【0028】
振動体1は電気的に接地されており、駆動手段10は、電極4a乃至4dへの通電を以下のように制御している。すなわち電極4aと4dにはバイアス電圧Vpが印加されており、電極4bと4cにはバイアス電圧−Vpが印加され、各電極4a〜4dには交流信号が印加された状態を形成している。交流電圧の電位のピークにおいては、パドル3aと3dには最大の静電力が基板方向に向かって印加されている。また、そのときパドル3bと3cには、最小の静電力が基板方向に向かって印加されている。これは、動作点(交流電圧の電位が0のとき)からみると、パドル3aと3dには基板方向へ向かう力が、パドル3bと3cには基板2の上方へ向かう力が作用していることと等価となる。この結果、振動体1は軸まわりのモーメントを受けることになり、ねじり振動が励起される。図1の状態で、振動体1への励振を行った時のパドル先端の変位量を、周波数軸上で示した結果が図2である。図3に示したような共振波形を有する1.8GHzの捩り2次共振に、スペクトルのピークを持つ共振器が実現されている。ここで、共振波形とは、「振動子の軸がねじれている形」を意味し、軸がねじれることによってパドルは変位するが、パドル自身の変形するものではない。」
【0029】
なお、図4に示すように、対角線上にある電極4aと4dのみに、バイアス電圧Vpと交流信号を印加したときの変位量のスペクトルは図5のようになり、1.8GHzのねじり2次共振以外にも0.70GHzのたわみ1次共振(基板垂直方向)、2.9GHzのたわみ3次共振(基板垂直方向)も励起されてしまい、本捩り共振器をフィルタ回路に適用する場合には、目的以外の周波数帯域にも通過域を持ってしまうことになり好ましくない。
【0030】
さらに、図6に示すたように、1つの電極4aのみに、バイアス電圧Vpと交流信号を印加したときの変位量のスペクトルは図7となり、さらに1.2GHzのねじり共振1次と1.5GHzのたわみ2次共振(基板垂直方向)も励起されてしまう。
【0031】
以上、図2を図5、7と比較して明らかなように、図1の構成による各パドル3a乃至3dに対応する電極4a乃至4dにそれぞれ電力供給し、互いにねじれ方向の力を各パドルに生起する静電力を印加するようにした励振により、最も優れたフィルタ特性を提供できるものであることがわかる。
【0032】
なお、図1の励振に用いる駆動手段10を構成する駆動回路は例えば図8のように、交流信号を分配する分配器11と、分配器11の出力を、コンデンサ12a、12bで直流カットしたあとに、インダクタンス13a、13bを介して一方をバイアス電圧Vpでプルアップしたもの、もう一方をバイアス電圧−Vpでプルアップしたものを、それぞれ図1の捩り共振器の電極4a、4dと、4b、4cに供給することで実現できる。
電気的に位相を変える一般的な移相器は、波長オーダの線路長が必要となり共振器の励振回路の小型化に難があり、また正確に180度の移相調整が必要となるが、本実施例のように極性の異なるバイアス電圧とインダクタで同一交流信号をプルアップすることで、位相が正確に180度異なる梁への励振力を得ることができる。
【0033】
また、図1の捩り共振器は、振動体1の共振点付近で電気的インピーダンスが最小になり、最も大きな電流が捩り共振器に流れ込む。例えば図9に示したように、バイアス電圧Vpでプルアップした側の端子電極の一方である、例えば電極4dに電流−電圧変換回路15を設け、この電流−電圧変換回路15の出力を出力端子とすることで、入出力電圧端子を備えたフィルタを構成することができる。
【0034】
なお、図9に示したフィルタの電流−電圧変換回路は、図10のようなトランジスタ回路で構成できる。ここでは、極性の異なるバイアス電圧Vpと−Vpとが印加された2つの交流信号ラインに、それぞれ相補的なトランジスタ対を設けて、ベース共通型の増幅器を構成している。捩り共振器は、ベースと接地間に挿入した。各トランジスタのコレクタからは、位相の異なる2系統のフィルタ出力が得られる。
【0035】
次に本発明の実施の形態1における捩り共振器の製造方法について説明する。図11(a)乃至(c)は、梁の一部分を拡大したものであり、その製造工程を示している。
この工程では、SOI(Silicon on Insulator )基板を用いている。この場合、SOI基板の上部の単結晶シリコン層が梁構造となる。
この図では、ベース層としてのシリコン基板を省略しているが、シリコン基板表面に酸化シリコン膜からなる酸化膜31を介して、デバイス形成層としての所望のキャリア濃度の単結晶シリコン層32を貼着したSOI(Silicon-On-Insulator)基板を用いる。
【0036】
まず単結晶シリコン層32上にレジストを塗布してパターニングする(図11(a))。このレジストをマスクとして、RIE(反応性イオンエッチング)を用いてシリコンを垂直方向に加工する(図11(b))。単結晶シリコン層32の壁面には(100)面が露出している。次にKOHで単結晶シリコン層32の異方性エッチングを行い、マスクのパターン幅よりも細いシリコンの構造体を形成する(図11(c))。
【0037】
上記構成によれば、たわみ振動を含む共振器に比べて、Q値が高い捩り共振器を提供することができる。
本発明者らは、たわみ振動と捩り振動のQ値の差異を実証するために、厚さ約2μm、長さ約10、20、30μmのアルミニウムスパッタ薄膜を用いて構成された両持ち梁を励振し、Q値の値を測定した。図20の横軸は真空度、縦軸はQ値である。長さ約30μmのたわみ共振3次、長さ約20μmのたわみ共振2次、長さ約10μmのたわみ共振1次のQ値が200〜400であるのに対して、長さ20μmの捩り共振1次のQ値は2000であり、Q値に関して、捩り振動は、たわみ振動に対して優位性を持つことを示している。
【0038】
このように、共振器を小型化して共振の高周波化を図る上で、捩り振動を用いた共振器を用いることで、たわみ振動に比べてQ値の高い共振器を構成することが可能と考えられる。
【0039】
なお、非特許文献3においては、両持ち梁を静電力で励振し、同一共振器のたわみ共振と捩り共振を観察している。非特許文献3によれば、たわみ共振スペクトルと捩り共振スペクトルが示されており、たわみ共振ではスペクトルから非線形性が見られる。これは励振する静電力の大きさによって顕著であり、フィルタ回路に利用するには好ましくない特性である。しかし、捩り共振スペクトルからは非線形性は観察されず、フィルタ回路に捩り共振器を利用することにより良好な特性を得ることができることがわかる。
【0040】
【非特許文献3】
S. Evoy et al., "Nanofabrication and electrostatic operation of single-crystal silicon paddle oscillators", Journal of Applied Physics, Vol. 86, No.11, 1 December 1999, pp.6072-6077.
【0041】
次に、シリコンの異方性エッチングを用いた別の方法として、非特許文献4に紹介されている量子細線の生成方法も利用できる。図12はその基本的なプロセス図である。
まず、単結晶シリコン基板30をベース層とし、酸化シリコン層31を介してシリコン層32貼着したSOI基板上に窒化シリコン膜33を形成して、これをパターニングする(図12(a))。このパターンのエッジがシリコン層32の(110)に沿うように形成する。
【0042】
次にKOHを用いて、シリコン層32の異方性エッチングを行う。(111)面のエッチング速度は他の面よりも極めて遅いため、結果として図12(b)に示すように、(111)面が露出するようにエッチングが進行する。
【0043】
そして、上面を、この窒化シリコン膜33で覆われた状態で酸化を行い、この(111)面を局所的に酸化シリコン膜35で保護し、マスクとした窒化シリコン膜33を再度パターニングする。
【0044】
そして、再びKOHを用いてシリコン層32の異方性エッチングを行うことで、図12(c)に示すように、三角形断面のシリコン梁構造体を得ることができる。この構造体は、局所的なSiO保護膜とSOI基板の中間層の酸化シリコン層31とをフッ酸で除去することで、可動体となる。
【0045】
最終的に捩り共振器の振動子は図12(d)に示すように、軸対称構造の振動子を構成するように形状加工がなされる。
【0046】
【非特許文献4】
G. Hashiguchi and H. Mimura, “Fabrication of Silicon Quantum Wires Using Separation by Implanted Oxygen Wafer”, Jpn. J. Appl. Phys. Vol. 33(1994), pp. L1649-1650.
【0047】
これら図11、12のプロセスは、半導体プロセスにおけるパターニング幅の限界を越えた細さの構造物を形成できるので、数百MHz〜数GHzの微細な共振器を作製するのに有用なプロセスである。
【0048】
(実施の形態2)
次に本発明の実施の形態2について説明する。
図13は、本発明の実施の形態2における捩り共振器を励振する回路のブロック図である。振動子および電極の配置は、実施の形態1で示した図1と同様であるが、入力信号は分配器11で4つの信号に分配され、電極4a〜4dに加えられる、それぞれのバイアス電圧が−VpからVpまで設定可能であることを特徴とする。電極4aと4dにバイアス電圧Vpを、電極4bと4cにバイアス電圧−Vpを印加した時の振動子の振幅スペクトルは、図2に示したように、捩り2次共振のみを持つ。しかし、電極4aと4cのバイアス電圧をVpに、4b、4dのバイアス電圧を−Vpに切り替えることで、振動子1の振幅スペクトルは、図14に示すように、捩り1次共振のみを持つものに変更することができる。すなわち、バイアス電圧を切り替えることで、異なる捩り共振周波数を有する捩り共振器を形成することができる。
【0049】
図15(a)は本実施の形態2のそれぞれ異なる捩り共振周波数を有する捩り共振器をN個並列に並べて、そのうちの1つをスイッチ素子30にて選択するものとした構成である。バイアス電圧の切替えと、スイッチの選択により、2×N通りの異なる共振周波数を有する捩り共振器24を構成することができる。i番目の共振器の捩り共振周波数を、fi1、fi2の2通りに切り替えられるものとすると、スペクトルを図15(b)のように周波数軸上に等間隔に2N個並べることができ、周波数選択型のフィルタとして利用可能となる。
電気的に位相を変える一般的な移相器では、ある特定の周波数一点での移相量を設定できるが、その他の帯域では移相量が異なってくる。しかし、本実施例のように極性の異なるバイアス電圧とインダクタで同一交流信号をプルアップすることで、共振器の励振モードの高次と低次を適応的に切り替えても、切り替え可能な周波数帯域内でインダクタが十分高インピーダンスとみなすことができれば、位相が正確に180度異なる梁への励振力を得ることができる。
【0050】
かかる構成によれば、電極と振動体間の電位差により生ずる静電力が、振動体の梁の軸を中心軸としたモーメントを加えるもので、かつ梁にたわみ振動を生ずる力を加えないので、簡易な方法で捩り共振器の捩り振動以外の振動モードを極力抑制することが可能となり、本捩り共振器を用いたQ値の高い、数百MHz〜数GHz帯で使用可能なフィルタを提供することができる。
【0051】
なお、本発明の実施の形態1、2において、バイアス電圧として正の電圧Vpと負の電圧−Vpの2系統を用いたが、0VとVpの2系統を用いても良い。このとき図1中の振動子1には、Vp/2のバイアス電位を加えておけばよい。
【0052】
参考例1
次に参考例1について説明する。
前記実施の形態1乃至2では、各電極に印加する電圧の位相をずらすように分配器を用いて調整したが、本参考例1では、図16(a)および(b)に示すように、各電極4a乃至4dに印加する直流バイアス電圧の大きさは同一とし、梁1に対して軸対称方向に電極を配置し、振動体である梁1の捩れ方向に静電力が印加されるように構成したことを特徴とするものである。すなわち、これら電極は、振動体である梁1の捩り振動に伴い、振動体との距離が等しくなるように、振動体に対し、捩れの方向に配置されて電極対を構成している。そして、駆動手段は、振動体の捩り振動に伴い、電極対には、同一交流信号と、同一の直流バイアス電圧を印加するように構成される。他は前記実施の形態1と同様である。なお、同一部位には同一符号を付した。
【0053】
また本参考例1では梁1はパドル状ではなく、断面長方形の棒状体で構成した。図16(b)は、図16(a)のA−A断面図である。
参考例1の共振器によれば、突出部がないため、振動子に付加される質量が低減され、共振周波数の高周波数化が可能となる。また同一位相交流信号と同一の直流バイアス電圧を各電極に印加すればよいため、駆動手段を構成する駆動回路が極めて簡略化される。
【0054】
参考例2
次に本発明の参考例2について説明する。
前記参考例1では、梁1は棒状体としたが、本参考例2では、図17(a)に示すように、各電極4a乃至4dに対向する部分に、切り欠き1Sを形成したものである。本実施の形態においても実施の形態3と同様に、印加する交流信号の位相および直流バイアス電圧の大きさは同一とし、梁1に対して軸対称方向に電極を配置し、梁の捩れ方向に静電力が印加されるように構成すればよい。他は前記実施の形態1と同様である。なお、同一部位には同一符号を付した。
形状加工は若干複雑となるが、MEMS技術を用いて容易に形成可能である。
また図17(b)に変形例を示すように電極4a乃至4dと振動体とは相対向していればよい。
【0055】
なお、本発明の実施の形態における共振器を真空封止することで、振動子の振動が空気の粘性の影響を受けない高いQ値の共振器を得ることができる。
【0056】
また、実施の形態では両持ち梁を捩り振動子に用いているが、両持ち梁に限定するものではなく、片持ち梁を使用してもよい。
また、本発明の実施の形態で示した共振器は容量性の高インピーダンスを有するので、適宜複数個の共振器を電気的に並列接続し、インピーダンスを下げ、入力電気エネルギーを効率よく共振器に伝達させるように構成してもよい。
【産業上の利用可能性】
【0057】
本発明にかかる捩り共振器は、半導体プロセスで作製可能な極めて微細な構造体が主に静電力で励振されるようにしたものであって、Q値が高い捩り共振を利用し、かつ捩り以外のたわみ振動が励振されない共振周波数の単一性を実現するものであるため、携帯型無線端末に積載される高密度に集積化された高周波フィルタ回路等として有用である。また、音声帯域や超音波帯域におけるスペクトル解析や、機械共振による質量分析等の医療用や環境分野等の用途にも適用できる。
【0058】
【図面の簡単な説明】
【図1】本発明の実施の形態1における捩り共振器の斜視図
【図2】本発明の実施の形態1における捩り共振器の振幅スペクトル
【図3】本発明の実施の形態1における捩り2次共振波形を示す図
【図4】たわみ振動も励起する捩り共振器の斜視図
【図5】図4の構成における捩り共振器の振幅スペクトル
【図6】たわみ振動も励起する捩り共振器の斜視図
【図7】図6の構成における捩り共振器の振幅スペクトル
【図8】本発明の実施の形態1における捩り共振器励振回路のブロック図
【図9】本発明の実施の形態1において出力電圧信号端子を設けた捩り共振器励振回路を示す図ブロック図
【図10】本発明の実施の形態1において出力電圧信号端子を設けた捩り共振器励振回の装置説明図
【図11】本発明の実施の形態1における捩り共振器の製造方法の説明図
【図12】本発明の実施の形態1における捩り共振器の変形例を示す説明図
【図13】本発明の実施の形態2における捩り共振器励振回路のブロック図
【図14】本発明の実施の形態2において捩り1次振動のみを励振させたときの振動子の振幅スペクトル図
【図15】本発明の実施の形態2における捩り共振器をN個並列配置した構成図および振幅スペクトル図
【図16】本発明の参考例1の捩り共振器を示す図であり、(a)は斜視図、(b)は(a)のA−A断面図
【図17】本発明の参考例2の捩り共振器を示す図であり、(a)は断面図、(b)は(a)の変形例を示す図
【図18】従来の機械共振器を用いたフィルタを示す概略図
【図19】従来例における、機械共振器の寸法と高周波化の関係を示す特性図
【図20】たわみ振動と捩り振動のQ値を比較した実験結果を示す図
【図21】たわみ振動と捩り振動の双方が励起される共振器を示す図
【符号の説明】
【0059】
1 振動子
2 基板
3 パドル
4 電極
11 分配器
12a、12b コンデンサ
13a、13b インダクタンス
14 捩り共振器
15 電流−電圧変換回路
31 酸化シリコン層
32 単結晶シリコン層
R レジスト
101、102 両持ち梁型振動子
103 結合梁
104 入力線路
105 出力線路
191 同一周波数を有する長さLと厚さhの関係を示す直線
192 同じたわみやすさの指標を有する長さLと厚さhの関係を示す直線
201 振動子
202 パドル
204 入力線路
205 出力線路【Technical field】
[0001]
The present invention relates to a torsional resonator and a filter using the torsional resonator, and more particularly, to a high-performance filter circuit using torsional resonance in an electric circuit integrated with high density.
[Background]
[0002]
A conventional mechanical resonator will be described with reference to FIG. FIG. 18 is a diagram showing a simplified configuration of the “mechanical vibration filter using flexural vibration” introduced in Non-Patent Document 1.
This filter is formed by patterning on a silicon substrate using a thin film process. The input line 104, the output line 105, and a doubly supported beam disposed with a gap of 1 micron or less with respect to each line. 101 and 102, and a coupling beam 103 that couples the two beams. A signal input from the input line 104 is capacitively coupled to the beam 101 and generates an electrostatic force in the beam 101. Only when the frequency of the signal coincides with the vicinity of the resonance frequency of the elastic structure including the beams 101 and 102 and the coupling beam 103, mechanical vibration is excited, and this mechanical vibration is further reduced between the output line 105 and the beam 102. The filtering output of the input signal is taken out by detecting it as a change in electric capacity.
[0003]
In the case of a doubly supported beam having a rectangular cross section, assuming that the elastic modulus E, the density ρ, the thickness h, and the length L, the resonance frequency f of the flexural vibration is expressed by the following equation.
[Expression 1]
Figure 0004728242
[0004]
If the material is polysilicon, E = 160 GPa, ρ = 2.2 × 10 3 kg / m 3 , and if the dimensions are L = 40 μm and h = 1.5 μm, f = 8.2 MHz, and a filter of about 8 MHz band is obtained. It is possible to configure. Compared to a filter configured with a passive circuit such as a capacitor or a coil, a sharp frequency selection characteristic having a high Q value can be obtained by using mechanical resonance.
[0005]
However, in the above configuration, there are the following restrictions to configure a filter in a higher frequency band. That is, as is clear from (Equation 1), it can be seen that it is desirable to increase E / ρ first by changing the material. However, if E is increased, the force for bending the beam is the same. However, the amount of displacement of the beam becomes small, and it becomes difficult to detect the displacement of the beam. Further, if the index representing the bendability of the beam is the ratio d / L of the deflection amount d of the center of the beam when a static load is applied to the beam surface of the dual-supported beam and the length L of the beam, d / L Is expressed by the proportional relationship of the following equation.
[Expression 2]
Figure 0004728242
[0006]
From these, in order to increase the resonance frequency while maintaining the value of d / L, at least E cannot be changed and it is necessary to obtain a material having a low density ρ. However, as a material having a low Young's modulus equivalent to polysilicon and a low density It is necessary to use a composite material such as CFRP (Carbon Fiber Reinforced Plastics). In this case, it is difficult to configure a micro mechanical vibration filter by a semiconductor process.
[0007]
Therefore, as a second method not using such a composite material, there is a case where h · L −2 is increased by changing the beam dimensions in (Equation 1). However, increasing the thickness h of the beam and reducing the length L of the beam reduce the d / L of (Equation 2), which is an index of flexibility, and detect the deflection of the beam. It becomes difficult.
[0008]
Regarding (Equation 1) and (Equation 2), when the relationship between log (L) and log (h) is shown in FIG. 19, the straight line 191 is obtained from (Equation 1), and the straight line 192 is derived from (Equation 2). It is a desired relationship. In FIG. 19, when L and h in the range (region A) above the straight line with the slope “2” are selected starting from the current dimension A, f increases and the range (region) below the straight line with the slope “1”. When L and h in B) are selected, d / L increases. Therefore, the hatched portion (region C) in the figure is a range of L and h in which the resonance frequency can be increased while securing the deflection amount of the beam.
[0009]
As is clear from FIG. 19, in order to increase the frequency of the mechanical vibration filter, it is necessary to reduce both the length L of the beam and the thickness h of the beam, and it is necessary to reduce L and h by the same scaling. That is, it is a sufficient condition for the hatched portion in FIG.
[0010]
Thus, in the conventional mechanical resonator, the resonance frequency is increased by reducing the size of the mechanical vibrator. However, there is a problem that the mechanical Q value of the flexural vibration is lowered by reducing the size in general. Regarding this phenomenon, for example, Non-Patent Document 2 shows the result of measuring the relationship between the length and thickness of a beam and the Q value of deflection resonance using a single crystal silicon cantilever. This Non-Patent Document 2 shows that the Q value is lowered by reducing the length of the beam and reducing the thickness of the beam. Therefore, when a conventional resonator using flexural vibration is reduced in size and applied to a filter, there is a problem that a Q value necessary for obtaining a desired frequency selection characteristic may not be obtained.
[0011]
Therefore, a torsional resonator using a torsional vibrator can be considered as a resonator having an excellent Q value. For example, as shown in FIG. 21, this torsional resonator uses a vibrator 201 having a paddle 202 at the center of both ends of the beam to excite the vibrator with an electrostatic force between the input line 204 and the paddle 202, A change in capacitance between the output line 205 and the paddle 202 is converted into an electric signal. In this torsional resonator, the mode excited by the magnitude and phase difference of the paddle and the input line voltage Vi and the paddle 202 and the output line 205 voltage Vo are different. Now, assuming that | Vi |> | Vo | and assuming that the contribution of electrostatic force to the vibration of the beam due to Vo is very small, flexural vibration and torsional vibration are excited in the vibrator.
[0012]
In this way, torsional resonators using torsional vibrators also excite flexural vibrations other than torsional vibrations, that is, flexural vibrations at the electrodes that excite torsional vibrations. When such torsional resonators are applied to filters Has an unintended pass band other than the pass band.
[0013]
Further, there is an operation signaling described in Patent Document 1 as a method for selectively exciting a specific vibration mode. This is an excitation method for high-order flexural vibration having a plurality of antinodes, and one of -v signals having a phase difference of 180 degrees from the AC signal v is applied to an electrode approaching the antinode and the other is antinode. Apply to the electrode that moves away. In order to produce the AC signal -v from the AC signal v, it is common to demultiplex v and pass it through a 180-degree phase shifter.
[0014]
[Non-Patent Document 1]
Frank D. Bannon III, John R. Clark, and Clark T.-C. Nguyen, "High-Q HF Microelectromechanical Filters," IEEE Journal of Solid-State Circuits, Vol. 35, No. 4, pp. 512-526 , April 2000.
[Non-Patent Document 2]
KY Yasumura et al., "Quality Factors in Micron-and Submicron-Thick Cantilevers", IEEE Journal of Microelectromechanical Systems, Vol. 9, No.1, March 2000.
[Patent Document 1]
JP-T-2002-535865 (page 20-21, FIG. 8)
DISCLOSURE OF THE INVENTION
[Problems to be solved by the invention]
[0015]
However, in the method of Patent Document 1, a phase shifter usually requires a line length in the wavelength order, which hinders downsizing of the filter. In addition, adjustments are required to accurately produce a 180 degree phase. Further, since the deviation from the target phase shift amount occurs at a point other than the target frequency, if an AC signal is used to excite a resonator having a variable resonant frequency adaptively, at a certain resonant frequency, v and Even if excitation can be performed at −v, it is difficult to ensure a −v signal when switching to a different resonance frequency.
The present invention has been made in view of the above circumstances, and provides a torsional resonator that can suppress vibration modes other than torsional vibration of the torsional resonator as much as possible by a simple method and can be used at a high frequency. With the goal.
In particular, an object of the present invention is to provide a resonator that can suppress vibration modes other than torsional vibrations as much as possible by a simple method even for a resonator whose resonance frequency can be switched adaptively.
[Means for Solving the Problems]
[0016]
In order to solve the above-described problem, the torsional resonator according to the present invention has a vibrating body with a beam structure or a paddle-like protruding structure on the beam structure, and an electrostatic force generated by a potential difference between the electrode and the vibrating body is generated. The present invention is characterized in that a moment with the beam axis of the vibrating body as a central axis is applied and a force that causes deflection of the beam is not applied.
With this configuration, it is possible to suppress vibration modes other than the torsional vibration of the torsional resonator as much as possible by a simple method.
[0017]
That is, the torsional resonator of the present invention is constituted by the beam structure, a vibrating body which performs torsional vibrations, proximate the symmetrical parts with respect to the axis of the beam structure of the vibrator, the front Symbol vibrator electrostatic force generated by a potential difference between the said to rise to the moment the central axis the axis of the beam structure, with the torsional vibration of the vibrator, when the distance between the one electrode and the vibrator moves away, the other respectively arranged electrode pairs distance approaches a position between the vibrating body and the electrode, each of said electrode pairs, based on the potential of the vibrator, the same AC signal, and a polarity different DC bias voltages to each other a driving unit configured to apply a characterized by comprising a.
According to the above configuration, torsional vibration can be generated with a simple configuration, and a resonance characteristic having a desirable Q value can be obtained. Further, according to this configuration, only torsional vibration can be generated with a simple configuration.
[0018]
In addition, the torsional resonator of the present invention includes the torsional resonator in which the beam structure includes a beam provided with a protruding portion at an axially symmetric position.
According to this configuration, an electrostatic force is easily generated between the electrode and the beam structure, and torsional vibration can be efficiently generated. The beam is more stable if it is a double-sided beam, but it may be a cantilever beam.
[0019]
In the torsional resonator of the present invention, the beam structure includes a paddle-like protrusion.
[0020]
The torsional resonator of the present invention has two or more electrode pairs, and the driving means switches torsional resonance by switching the polarity of a DC bias voltage applied to at least a part of the electrodes of the electrode pair. In which the low-order mode and the high-order mode are switched.
[0021]
Further, the torsional resonator according to the reference example of the present invention is arranged such that the electrode is arranged in a torsional direction with respect to the vibrating body so that the distance from the vibrating body becomes equal with torsional vibration of the vibrating body. An electrode pair is configured, and the driving means is configured to apply the same AC signal and the same DC bias voltage to the electrode pair in accordance with torsional vibration of the vibrating body. To do.
According to this configuration, it is only necessary to apply the same voltage to each electrode, so that the driving means can be simplified.
[0022]
The torsional resonator of the present invention includes the torsional resonator including the plurality of torsional resonators having different torsional resonance frequencies and a switch element for selecting at least one of the torsional resonators.
[0023]
In addition, the torsional resonator of the present invention includes one having a plurality of torsional resonators arranged in parallel electrically.
[0024]
The torsional resonator of the present invention includes the torsional resonator housed in a case whose atmosphere is sealed in a vacuum.
The filter of the present invention includes a filter using the torsional resonator.
【The invention's effect】
[0025]
According to the configuration of the torsional resonator of the present invention, it is possible to provide a filter that has a high Q value and can be used in the band of several hundred MHz to several GHz.
BEST MODE FOR CARRYING OUT THE INVENTION
[0026]
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
(Embodiment 1)
FIG. 1 is a perspective view of a torsional resonator according to Embodiment 1 of the present invention. The torsional resonator according to the first embodiment is close to the vibrator 1 that performs mechanical vibration having the paddle-like protrusions 3a, 3b, 3c, and 3d at axially symmetric positions, and the paddle-like protrusions 3a, 3b, 3c, and 3d. The electrodes 4a, 4b, 4c, and 4d are arranged, and voltage changes between the paddle-like protrusions 3a, 3b, 3c, and 3d and the electrodes 4a, 4b, 4c, and 4d corresponding to the respective paddle-shaped protrusions 3a, 3b, 3c, and 3d , An electromechanical resonator having an electromechanical conversion function for converting into vibration of the vibrating body, and an electrostatic force generated by a potential difference between the electrodes 4a, 4b, 4c, and 4d and the vibrating body is the vibrating body 1 Drive means configured to generate a moment with the axis of the beam structure as a central axis.
[0027]
Here, the vibrating body 1 is a doubly supported beam having both ends fixed. Four paddles 3 a to 3 d are arranged on the vibrating body 1. Electrodes 4 a to 4 d are arranged on the substrate 2 so as to face each paddle 3 with a gap g interposed therebetween. The material of the beam is single crystal silicon having a Young's modulus of about 160 GPa, the length L is 1.0 μm, the thickness t is 100 nm, the width W is 100 nm, and the paddle length Lp is 100 nm.
[0028]
The vibrating body 1 is electrically grounded, and the driving means 10 controls energization to the electrodes 4a to 4d as follows. That is, a bias voltage Vp is applied to the electrodes 4a and 4d, a bias voltage −Vp is applied to the electrodes 4b and 4c, and an AC signal is applied to each of the electrodes 4a to 4d. At the peak of the AC voltage potential, the maximum electrostatic force is applied to the paddles 3a and 3d in the direction of the substrate. At that time, a minimum electrostatic force is applied to the paddles 3b and 3c in the direction of the substrate. This is because, when viewed from the operating point (when the potential of the AC voltage is 0), a force toward the substrate is applied to the paddles 3a and 3d, and a force upward to the substrate 2 is applied to the paddles 3b and 3c. Is equivalent to that. As a result, the vibrating body 1 receives a moment around the axis, and the torsional vibration is excited. FIG. 2 shows a result of the displacement amount of the paddle tip when the vibration body 1 is excited in the state of FIG. 1 on the frequency axis. A resonator having a spectral peak in a torsional secondary resonance of 1.8 GHz having a resonance waveform as shown in FIG. 3 is realized. Here, the resonance waveform means “a shape in which the axis of the vibrator is twisted”, and the paddle is displaced by the twist of the axis, but the paddle itself is not deformed. "
[0029]
As shown in FIG. 4, the spectrum of the displacement when the bias voltage Vp and the AC signal are applied only to the electrodes 4a and 4d on the diagonal line is as shown in FIG. In addition to resonance, a primary resonance at 0.70 GHz (vertical direction in the substrate) and a tertiary resonance at 2.9 GHz (in the vertical direction of the substrate) are also excited, and this torsional resonator is applied to a filter circuit. This is not preferable because it has a pass band in a frequency band other than the intended one.
[0030]
Furthermore, as shown in FIG. 6, the spectrum of the displacement when the bias voltage Vp and the AC signal are applied to only one electrode 4a is as shown in FIG. 7, and further, the torsional resonance primary of 1.2 GHz and 1.5 GHz. The deflection secondary resonance (in the direction perpendicular to the substrate) is also excited.
[0031]
As is apparent from the comparison of FIG. 2 with FIGS. 5 and 7, power is supplied to the electrodes 4 a to 4 d corresponding to the paddles 3 a to 3 d according to the configuration of FIG. It can be seen that the most excellent filter characteristics can be provided by the excitation in which the generated electrostatic force is applied.
[0032]
The drive circuit constituting the drive means 10 used for excitation in FIG. 1 is, for example, as shown in FIG. 8, a distributor 11 that distributes an AC signal, and the output of the distributor 11 is DC-cut by capacitors 12a and 12b. Further, the one pulled up with the bias voltage Vp through the inductances 13a and 13b and the other pulled up with the bias voltage −Vp are respectively connected to the electrodes 4a, 4d and 4b of the torsional resonator of FIG. This can be realized by supplying to 4c.
A general phase shifter that electrically changes the phase requires a line length on the order of wavelengths, which makes it difficult to reduce the size of the excitation circuit of the resonator, and requires an accurate phase shift adjustment of 180 degrees. By pulling up the same AC signal with a bias voltage and an inductor having different polarities as in the present embodiment, it is possible to obtain excitation forces for beams that are exactly 180 degrees out of phase.
[0033]
Further, in the torsional resonator of FIG. 1, the electrical impedance is minimized near the resonance point of the vibrating body 1, and the largest current flows into the torsional resonator. For example, as shown in FIG. 9, a current-voltage conversion circuit 15 is provided on one of the terminal electrodes pulled up with the bias voltage Vp, for example, the electrode 4d, and the output of the current-voltage conversion circuit 15 is output to the output terminal. By doing so, a filter having an input / output voltage terminal can be configured.
[0034]
Note that the current-voltage conversion circuit of the filter shown in FIG. 9 can be composed of a transistor circuit as shown in FIG. Here, a complementary transistor pair is provided on each of two AC signal lines to which bias voltages Vp and -Vp having different polarities are applied, thereby constituting a common base type amplifier. The torsional resonator was inserted between the base and the ground. Two filter outputs with different phases can be obtained from the collectors of the transistors.
[0035]
Next, a manufacturing method of the torsional resonator according to the first embodiment of the present invention will be described. FIGS. 11A to 11C are enlarged views of a part of the beam and show the manufacturing process thereof.
In this step, an SOI (Silicon on Insulator) substrate is used. In this case, the single crystal silicon layer on the top of the SOI substrate has a beam structure.
In this figure, a silicon substrate as a base layer is omitted, but a single crystal silicon layer 32 having a desired carrier concentration as a device formation layer is pasted on the silicon substrate surface via an oxide film 31 made of a silicon oxide film. A worn SOI (Silicon-On-Insulator) substrate is used.
[0036]
First, a resist is applied and patterned on the single crystal silicon layer 32 (FIG. 11A). Using this resist as a mask, silicon is processed in the vertical direction using RIE (reactive ion etching) (FIG. 11B). The (100) plane is exposed on the wall surface of the single crystal silicon layer 32. Next, anisotropic etching of the single crystal silicon layer 32 is performed with KOH to form a silicon structure narrower than the pattern width of the mask (FIG. 11C).
[0037]
According to the above configuration, it is possible to provide a torsional resonator having a higher Q value than a resonator including flexural vibration.
In order to demonstrate the difference in the Q value between flexural vibration and torsional vibration, the present inventors excited a doubly-supported beam composed of an aluminum sputtered thin film having a thickness of about 2 μm and a length of about 10, 20, or 30 μm. Then, the Q value was measured. In FIG. 20, the horizontal axis represents the degree of vacuum and the vertical axis represents the Q value. The flexural resonance tertiary of about 30 μm in length, the secondary of flexural resonance of about 20 μm in length, and the primary Q value of the flexural resonance of about 10 μm in length are 200 to 400, whereas the torsional resonance 1 of 20 μm in length. The next Q value is 2000, which indicates that the torsional vibration is superior to the bending vibration with respect to the Q value.
[0038]
Thus, in order to reduce the size of the resonator and increase the resonance frequency, it is considered that a resonator having a higher Q value than that of flexural vibration can be configured by using a resonator using torsional vibration. It is done.
[0039]
In Non-Patent Document 3, the doubly-supported beam is excited with an electrostatic force, and the flexural resonance and the torsional resonance of the same resonator are observed. According to Non-Patent Document 3, a flexural resonance spectrum and a torsional resonance spectrum are shown. In the flexural resonance, nonlinearity is seen from the spectrum. This is conspicuous depending on the magnitude of the electrostatic force to be excited, and is not preferable for use in a filter circuit. However, the nonlinearity is not observed from the torsional resonance spectrum, and it can be seen that good characteristics can be obtained by using the torsional resonator in the filter circuit.
[0040]
[Non-Patent Document 3]
S. Evoy et al., "Nanofabrication and electrostatic operation of single-crystal silicon paddle oscillators", Journal of Applied Physics, Vol. 86, No. 11, 1 December 1999, pp.6072-6077.
[0041]
Next, as another method using anisotropic etching of silicon, the quantum wire generation method introduced in Non-Patent Document 4 can also be used. FIG. 12 is the basic process diagram.
First, a silicon nitride film 33 is formed on an SOI substrate having a single crystal silicon substrate 30 as a base layer and a silicon layer 32 bonded via a silicon oxide layer 31, and is patterned (FIG. 12A). The edge of this pattern is formed along (110) of the silicon layer 32.
[0042]
Next, anisotropic etching of the silicon layer 32 is performed using KOH. Since the etching rate of the (111) plane is extremely slower than the other planes, as a result, the etching proceeds so that the (111) plane is exposed as shown in FIG.
[0043]
Then, oxidation is performed with the upper surface covered with the silicon nitride film 33, the (111) plane is locally protected by the silicon oxide film 35, and the silicon nitride film 33 using the mask is patterned again.
[0044]
Then, by performing anisotropic etching of the silicon layer 32 again using KOH, a silicon beam structure having a triangular cross section can be obtained as shown in FIG. This structure becomes a movable body by removing the local SiO 2 protective film and the silicon oxide layer 31 as an intermediate layer of the SOI substrate with hydrofluoric acid.
[0045]
Finally, the vibrator of the torsional resonator is processed so as to form an oscillator having an axially symmetric structure, as shown in FIG.
[0046]
[Non-Patent Document 4]
G. Hashiguchi and H. Mimura, “Fabrication of Silicon Quantum Wires Using Separation by Implanted Oxygen Wafer”, Jpn. J. Appl. Phys. Vol. 33 (1994), pp. L1649-1650.
[0047]
These processes shown in FIGS. 11 and 12 can form a fine structure exceeding the limit of the patterning width in a semiconductor process, and thus are useful processes for manufacturing a minute resonator of several hundred MHz to several GHz. .
[0048]
(Embodiment 2)
Next, a second embodiment of the present invention will be described.
FIG. 13 is a block diagram of a circuit for exciting the torsional resonator according to the second embodiment of the present invention. The arrangement of the vibrator and the electrode is the same as that in FIG. 1 shown in the first embodiment, but the input signal is distributed to four signals by the distributor 11 and each bias voltage applied to the electrodes 4a to 4d is It can be set from −Vp to Vp. The amplitude spectrum of the vibrator when the bias voltage Vp is applied to the electrodes 4a and 4d and the bias voltage -Vp is applied to the electrodes 4b and 4c has only torsional secondary resonance as shown in FIG. However, by switching the bias voltages of the electrodes 4a and 4c to Vp and the bias voltages of 4b and 4d to -Vp, the amplitude spectrum of the vibrator 1 has only torsional primary resonance as shown in FIG. Can be changed. That is, by switching the bias voltage, torsional resonators having different torsional resonance frequencies can be formed.
[0049]
FIG. 15A shows a configuration in which N torsional resonators having different torsional resonance frequencies in the second embodiment are arranged in parallel and one of them is selected by the switch element 30. By switching the bias voltage and selecting the switch, the torsional resonator 24 having 2 × N different resonance frequencies can be configured. Assuming that the torsional resonance frequency of the i-th resonator can be switched between f i1 and f i2 , 2N spectra can be arranged at equal intervals on the frequency axis as shown in FIG. It can be used as a frequency selective filter.
In a general phase shifter that electrically changes the phase, the phase shift amount at a specific frequency point can be set, but the phase shift amount differs in other bands. However, by pulling up the same AC signal with a bias voltage and inductor with different polarities as in this embodiment, the frequency band that can be switched even if the higher and lower orders of the excitation mode of the resonator are adaptively switched If the inductor can be regarded as having a sufficiently high impedance, it is possible to obtain an exciting force to a beam whose phase is exactly 180 degrees different.
[0050]
According to such a configuration, the electrostatic force generated by the potential difference between the electrode and the vibrating body applies a moment with the beam axis of the vibrating body as the central axis, and does not apply a force that causes flexural vibration in the beam. It is possible to suppress a vibration mode other than torsional vibration of a torsional resonator as much as possible, and to provide a filter that has a high Q value and can be used in the several hundred MHz to several GHz band using this torsional resonator. Can do.
[0051]
In the first and second embodiments of the present invention, two systems of positive voltage Vp and negative voltage −Vp are used as the bias voltage, but two systems of 0V and Vp may be used. At this time, a bias potential of Vp / 2 may be applied to the vibrator 1 in FIG.
[0052]
( Reference Example 1 )
Next, Reference Example 1 will be described.
In the first and second embodiments, adjustment is performed using a distributor so as to shift the phase of the voltage applied to each electrode. However, in the first reference example , as shown in FIGS. The magnitude of the DC bias voltage applied to each of the electrodes 4a to 4d is the same, the electrodes are arranged in an axially symmetric direction with respect to the beam 1, and an electrostatic force is applied in the torsional direction of the beam 1, which is a vibrating body. It is characterized by comprising. That is, these electrodes are arranged in the direction of torsion with respect to the vibrating body so that the distance from the vibrating body becomes equal with the torsional vibration of the beam 1 that is the vibrating body, thereby constituting an electrode pair. The driving means is configured to apply the same AC signal and the same DC bias voltage to the electrode pair in accordance with the torsional vibration of the vibrating body. The rest is the same as in the first embodiment. In addition, the same code | symbol was attached | subjected to the same site | part.
[0053]
In Reference Example 1 , the beam 1 is not a paddle, but a rod-shaped body having a rectangular cross section. FIG.16 (b) is AA sectional drawing of Fig.16 (a).
According to the resonator of the first reference example, since there is no protrusion, the mass added to the vibrator is reduced, and the resonance frequency can be increased. Further, since the same DC bias voltage and the same DC bias voltage need only be applied to each electrode, the drive circuit constituting the drive means is greatly simplified.
[0054]
( Reference Example 2 )
Next, Reference Example 2 of the present invention will be described.
In the reference example 1 , the beam 1 is a rod-shaped body. However, in the present reference example 2 , as shown in FIG. 17A, a notch 1S is formed in a portion facing each of the electrodes 4a to 4d. is there. Also in this embodiment, as in the third embodiment, the phase of the AC signal to be applied and the magnitude of the DC bias voltage are the same, electrodes are arranged in the axially symmetric direction with respect to the beam 1, and the beam is twisted. What is necessary is just to comprise so that an electrostatic force may be applied. The rest is the same as in the first embodiment. In addition, the same code | symbol was attached | subjected to the same site | part.
Although the shape processing is slightly complicated, it can be easily formed using the MEMS technology.
Further, as shown in a modified example in FIG. 17B, the electrodes 4a to 4d and the vibrating body only need to face each other.
[0055]
Note that by resonator-sealing the resonator according to the embodiment of the present invention, a resonator having a high Q value in which the vibration of the vibrator is not affected by the viscosity of air can be obtained.
[0056]
In the embodiment, the doubly supported beam is used for the torsional vibrator. However, the invention is not limited to the cantilever beam, and a cantilever beam may be used.
In addition, since the resonator shown in the embodiment of the present invention has a capacitive high impedance, a plurality of resonators are appropriately electrically connected in parallel, the impedance is lowered, and the input electric energy is efficiently converted into the resonator. You may comprise so that it may be transmitted.
[Industrial applicability]
[0057]
The torsional resonator according to the present invention is such that an extremely fine structure that can be manufactured by a semiconductor process is excited mainly by an electrostatic force, uses a torsional resonance having a high Q value, and other than torsion. Therefore, it is useful as a high-frequency filter circuit or the like integrated at a high density mounted on a portable wireless terminal. Further, the present invention can be applied to medical and environmental applications such as spectrum analysis in the voice band and ultrasonic band, and mass analysis by mechanical resonance.
[0058]
[Brief description of the drawings]
FIG. 1 is a perspective view of a torsional resonator according to the first embodiment of the present invention. FIG. 2 is an amplitude spectrum of the torsional resonator according to the first embodiment of the present invention. FIG. 4 is a perspective view of a torsional resonator that also excites flexural vibrations. FIG. 5 is an amplitude spectrum of the torsional resonator in the configuration of FIG. 4. FIG. 6 is a perspective view of a torsional resonator that also excites flexural vibrations. FIG. 7 is an amplitude spectrum of a torsional resonator in the configuration of FIG. 6. FIG. 8 is a block diagram of a torsional resonator excitation circuit according to the first embodiment of the present invention. FIG. 10 is a block diagram showing a torsional resonator excitation circuit provided with a signal terminal. FIG. 10 is a device explanatory diagram of a torsional resonator excitation circuit provided with an output voltage signal terminal in the first embodiment of the present invention. Torsion in the first embodiment FIG. 12 is an explanatory diagram showing a modification of the torsional resonator according to the first embodiment of the present invention. FIG. 13 is a block diagram of a torsional resonator excitation circuit according to the second embodiment of the present invention. FIG. 14 is an amplitude spectrum diagram of a vibrator when only torsional primary vibration is excited in the second embodiment of the present invention. FIG. 15 shows N torsional resonators arranged in parallel in the second embodiment of the present invention. FIG. 16 is a diagram showing a torsional resonator according to Reference Example 1 of the present invention, (a) is a perspective view, and (b) is a cross-sectional view taken along line AA of (a). It is a figure which shows the torsional resonator of the reference example 2 of this invention, (a) is sectional drawing, (b) is a figure which shows the modification of (a). FIG. 18 shows the filter using the conventional mechanical resonator. FIG. 19 shows the relationship between the dimensions of the mechanical resonator and the increase in frequency in the conventional example. Figure [EXPLANATION OF SYMBOLS] indicating the gender view Figure 20 flexural vibration and Figure [21] showing the results of an experiment comparing the Q value of the torsional vibration resonator in which both the flexural vibration and torsional vibration is excited
[0059]
DESCRIPTION OF SYMBOLS 1 Oscillator 2 Substrate 3 Paddle 4 Electrode 11 Divider 12a, 12b Capacitor 13a, 13b Inductor 14 Torsional resonator 15 Current-voltage conversion circuit 31 Silicon oxide layer 32 Single crystal silicon layer R Resist 101, 102 Dual-supported beam type vibrator DESCRIPTION OF SYMBOLS 103 Connection beam 104 Input line 105 Output line 191 The straight line which shows the relationship between the length L and the thickness h which has the same frequency 192 The straight line which shows the relationship between the length L and the thickness h which has the same parameter | index of flexibility 202 Paddle 204 Input line 205 Output line

Claims (8)

梁構造体で構成され、捩り振動を行う振動体と、
前記振動体の前記梁構造体の軸に対し対称な部分に近接し、前記振動体との間の電位差により生ずる静電力が、前記梁構造体の軸を中心軸としたモーメントを生起し、前記振動体の捩り振動に伴い、一方の電極と前記振動体との距離が遠ざかるとき、他方の電極と前記振動体との距離が近づく位置にそれぞれ配置された電極対と、
前記電極対のそれぞれに、前記振動体の電位を基準として、同一交流信号と、互いに極性の異なる直流バイアス電圧を印加するように構成された駆動手段と、
を具備した捩り共振器。
A vibrating body composed of a beam structure and performing torsional vibration;
Wherein the axis of the beam structure of the vibrating body close to the symmetric part, the electrostatic force generated by a potential difference between the previous SL vibrating body, to rise to moment about axis the axis of the beam structure, as the torsional vibration of the vibrator, when the distance between one electrode and the vibrator moves away, a pair of electrodes respectively disposed at a distance approaches the position of the other electrode and the vibrator,
Each of the electrode pairs, on the basis of the potential of the vibrator, the same AC signal, driving means configured to apply a polarity different DC bias voltages to each other,
A torsional resonator comprising:
請求項1に記載の捩り共振器であって、
前記梁構造体は、軸対称となる位置に突出部を具備した梁を備えた捩り共振器。
The torsional resonator according to claim 1,
The beam structure is a torsional resonator including a beam having a protruding portion at a position that is axially symmetric.
請求項1または2に記載の捩り共振器であって、
前記梁構造体は、パドル状の突出部を具備した捩り共振器。
The torsional resonator according to claim 1 or 2,
The beam structure is a torsional resonator having a paddle-like protrusion.
請求項1乃至3のいずれか1項に記載の捩り共振器であって、
2対以上の電極対を有し、
前記駆動手段は、前記電極対の少なくとも一部の電極に印加される直流バイアス電圧の極性を切り替えることで、捩り共振の低次モードと高次モードとを切り替えるようにした捩り共振器。
A torsional resonator according to any one of claims 1 to 3,
Having two or more pairs of electrodes;
A torsional resonator in which the driving means switches between a low-order mode and a high-order mode of torsional resonance by switching the polarity of a DC bias voltage applied to at least some of the electrodes of the electrode pair.
請求項1乃至4のいずれか1項に記載の捩り共振器であって、
異なる捩り共振周波数を有する前記複数の捩り共振器と、前記捩り共振器の少なくとも1つを選択するスイッチ素子とを備えた捩り共振器。
A torsional resonator according to any one of claims 1 to 4,
A torsional resonator comprising the plurality of torsional resonators having different torsional resonance frequencies and a switch element for selecting at least one of the torsional resonators.
請求項1乃至のいずれか1項に記載の捩り共振器であって、
電気的に並列に配置された複数個捩り共振器を備えた捩り共振器。
A torsional resonator according to any one of claims 1 to 5,
A torsional resonator comprising a plurality of torsional resonators arranged electrically in parallel.
請求項1乃至のいずれか1項に記載の捩り共振器であって、
前記捩り共振器が、雰囲気を真空に封止したケース内に収納された捩り共振器。
A torsional resonator according to any one of claims 1 to 6,
A torsional resonator in which the torsional resonator is housed in a case whose atmosphere is sealed in a vacuum.
請求項1乃至のいずれか1項に記載の捩り共振器を用いたフィルタ。Filter using a torsional resonator according to any one of claims 1 to 7.
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