JP4673215B2 - Stage equipment - Google Patents

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JP4673215B2
JP4673215B2 JP2005379495A JP2005379495A JP4673215B2 JP 4673215 B2 JP4673215 B2 JP 4673215B2 JP 2005379495 A JP2005379495 A JP 2005379495A JP 2005379495 A JP2005379495 A JP 2005379495A JP 4673215 B2 JP4673215 B2 JP 4673215B2
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transport
frame
workpiece
stage apparatus
support
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JP2007175841A (en
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俊一 川地
史紀 牧野
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Sumitomo Heavy Industries Ltd
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Sumitomo Heavy Industries Ltd
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本発明はステージ装置に係り、特にワークを一定速度で搬送するよう構成されたステージ装置に関する。   The present invention relates to a stage apparatus, and more particularly to a stage apparatus configured to convey a workpiece at a constant speed.

例えば、液晶用ガラス基板のような平面精度が要求されるワークの加工工程あるいは検査工程に用いられるステージ装置では、石定盤の剛性により平板状のワークの平面精度を確保するため、石定盤上にワークを吸着する吸着盤を設けると共に、石定盤の下側には架台と除振ユニットが配置されるように構成されている(例えば、特許文献1参照)。   For example, in a stage device used for processing or inspection processes for workpieces that require flatness accuracy, such as glass substrates for liquid crystals, the stone surface plate is used to ensure the flatness of flat workpieces due to the rigidity of the stone surface plate. A suction plate for sucking the workpiece is provided on the top, and a gantry and a vibration isolation unit are arranged below the stone surface plate (see, for example, Patent Document 1).

このようなステージ装置に用いられる石定盤は、ワークの大きさに応じて切り出された原石を所定形状に切削加工する工程と、ワークが搭載されるワーク載置面の平面精度、及び可動部をガイドするガイド面を高精度に研磨加工する工程が行なわれる。
特開2005−52823号公報
The stone surface plate used in such a stage device includes a step of cutting a rough cut according to the size of the workpiece into a predetermined shape, a plane accuracy of a workpiece mounting surface on which the workpiece is mounted, and a movable part A step of polishing the guide surface that guides with high accuracy is performed.
JP 2005-52823 A

上記のような構成とされたステージ装置においては、ワークの大型化(液晶用ガラス基板の大面積化)に対応することが要望されている。しかしながら、ワークの大型化に伴って石定盤を大型化すると、石定盤の荷重が増大するため、石定盤を支持する架台をより剛性の高い構造にすることになり、石定盤及び架台の重量増大によって装置の大型化にも限界がある。   In the stage apparatus configured as described above, it is desired to cope with an increase in the size of the workpiece (an increase in the area of the glass substrate for liquid crystal). However, if the stone surface plate is enlarged along with the increase in the size of the workpiece, the load of the stone surface plate increases. Therefore, the frame supporting the stone surface plate has a more rigid structure. There is a limit to increasing the size of the device due to the increased weight of the gantry.

そこで、本発明は上記事情に鑑み、課題を解決したステージ装置を提供することを目的とする。   In view of the above circumstances, an object of the present invention is to provide a stage apparatus that solves the problem.

上記課題を解決するため、本発明は以下のような手段を有する。   In order to solve the above problems, the present invention has the following means.

請求項1記載の発明は、ワークを搬送する搬送機構と、
該搬送機構を支持する搬送架台と、
前記ワークに対して所定の処理を行う処理領域で前記搬送架台上に設けられ、前記処理領域の下側から前記搬送架台を支持する支持架台と、を備え、
前記支持架台は、
前記搬送架台を支持するように床面に固定された固定部と、
該固定部の両端より上方に起立する一対の支柱と、
該支柱間に横架された横架部と、を有し、
前記横架部には、前記搬送機構により搬送される前記ワークが前記処理領域を通過する過程で所定の処理を行う処理部が設けられていることを特徴とする。
The invention according to claim 1 is a transport mechanism for transporting a workpiece;
A transport gantry that supports the transport mechanism;
A support frame that is provided on the transfer frame in a processing region that performs a predetermined process on the workpiece, and that supports the transfer frame from below the processing region ;
The support frame is
A fixed portion fixed to the floor surface to support the transport cradle;
A pair of struts standing above both ends of the fixed portion;
A horizontal portion that is horizontally placed between the columns,
Wherein the lateral bridging portion, the workpiece conveyed by the conveying mechanism is characterized that you have processing unit is provided for performing predetermined processing in the process of passing through the processing area.

請求項2記載の発明は、前記搬送架台が、前記処理領域で前記ワークに空気圧により浮上させるエアユニットを有することを特徴とする。   The invention described in claim 2 is characterized in that the transport platform includes an air unit that floats on the workpiece by air pressure in the processing region.

請求項3記載の発明は、前記支持架台が、前記搬送架台の中央下側に配置され、前記搬送方向と直交する方向に延在形成されたことを特徴とする。   The invention according to claim 3 is characterized in that the support frame is disposed on the lower center side of the transfer frame and extends in a direction perpendicular to the transfer direction.

請求項記載の発明は、前記搬送架台が、前記支持架台よりも低剛性であることを特徴とする。 The invention described in claim 4 is characterized in that the transport frame is lower in rigidity than the support frame.

請求項記載の発明は、前記搬送架台が、中空部材を格子状に組み合わせた低剛性構造であることを特徴とする。 The invention described in claim 5 is characterized in that the transport platform has a low-rigidity structure in which hollow members are combined in a lattice shape.

請求項記載の発明は、前記固定部が、前記搬送架台が載置される上板と前記床面に対向する下板との間に複数の板状部材を所定間隔で平行に起立させた高剛性構造であることを特徴とする。 According to a sixth aspect of the present invention, the fixing unit has a plurality of plate-like members erected in parallel at a predetermined interval between an upper plate on which the conveyance platform is placed and a lower plate facing the floor surface. It is characterized by a highly rigid structure.

本発明によれば、支持架台の横架部に設けられた処理部が搬送機構により搬送されるワークへの所定の処理を行う処理領域支持架台が搬送架台を支持することにより、装置の軽量化を図り、装置の剛性を下げて固有振動数を上げることにより、例えば、ステージ装置を用いてワークに塗布する場合には、塗布ムラを抑えることができる。

According to the present invention, the weight of the apparatus is reduced by the support frame supporting the transfer frame in the processing region in which the processing unit provided in the horizontal frame of the support frame performs a predetermined process on the workpiece transferred by the transfer mechanism. By reducing the rigidity of the apparatus and increasing the natural frequency, application unevenness can be suppressed, for example, when applying to a workpiece using a stage apparatus.

また、処理領域でワークを空気圧により浮上させるエアユニットを設けたため、搬送機構によりワークを搬送させる搬送工程において、軽量化を保ったままワークの平面精度を確保することができ、例えば、ガラス基板のように薄い板材でも搬送しながら精密な処理を行うことが可能になる。   In addition, since the air unit that floats the workpiece by air pressure in the processing area is provided, the plane accuracy of the workpiece can be ensured while maintaining the weight reduction in the transfer step of transferring the workpiece by the transfer mechanism. Thus, it is possible to perform precise processing while conveying even a thin plate material.

以下、図面を参照して本発明を実施するための最良の形態について説明する。   The best mode for carrying out the present invention will be described below with reference to the drawings.

図1は本発明によるステージ装置の一実施例を示す斜視図である。図1に示されるように、ステージ装置10は、ガラス基板等からなるワーク(図示せず)を搬送する搬送機構20と、搬送機構20を支持する搬送架台30と、搬送架台30を下側から支持し、ワークに対する所定の処理を行なう処理部(図示せず)を搬送架台30の上方に支持する支持架台40とを有する。ステージ装置10では、搬送架台30と支持架台40とを組み合わせることで架台が組立られ、搬送機構20が搬送架台30上に設けられる構成である。   FIG. 1 is a perspective view showing an embodiment of a stage apparatus according to the present invention. As shown in FIG. 1, the stage apparatus 10 includes a transport mechanism 20 that transports a workpiece (not shown) made of a glass substrate, a transport base 30 that supports the transport mechanism 20, and a transport base 30 from below. A support frame 40 that supports a processing unit (not shown) that supports and performs a predetermined process on the workpiece is supported above the conveyance frame 30. In the stage apparatus 10, the gantry is assembled by combining the transport gantry 30 and the support gantry 40, and the transport mechanism 20 is provided on the transport gantry 30.

ステージ装置10においては、搬送機構20を搬送架台30上に設け、処理領域において支持架台を設けることにより、装置全体に剛性の高い架台が不要になり、大幅な軽量化が実現できると共に、搬送架台30の剛性を低くして製造コストの低減及び輸送時の労力低減も図ることが可能になる。   In the stage apparatus 10, the transport mechanism 20 is provided on the transport base 30, and the support base is provided in the processing area, so that a highly rigid base is not necessary for the entire apparatus, and the weight can be significantly reduced. The rigidity of 30 can be lowered to reduce the manufacturing cost and labor during transportation.

搬送機構20は、搬送架台30のX方向の両側に一対設けられており、平板状のワークの両側を把持する把持部21を有するスライダ22と、スライダ22を搬送方向(Y方向)にガイドするガイドレール24と、スライダ22をY方向に移動させるリニアモータ26とを有する。そして、搬送機構20は、スライダ22をガイドレール24に沿って搬送架台30の延在方向(Y方向)に移動することで、ワークを一定の速度で搬送する。また、スライダ22は、ガイドレール24に対してエアパッド(図示せず)による空気層を介して浮上した低摩擦状態で移動することができる。   A pair of transport mechanisms 20 are provided on both sides of the transport base 30 in the X direction, and a slider 22 having a gripping portion 21 that grips both sides of a plate-shaped workpiece, and guides the slider 22 in the transport direction (Y direction). It has a guide rail 24 and a linear motor 26 that moves the slider 22 in the Y direction. The transport mechanism 20 transports the workpiece at a constant speed by moving the slider 22 along the guide rail 24 in the extending direction (Y direction) of the transport base 30. Further, the slider 22 can move with respect to the guide rail 24 in a low friction state where the slider 22 floats through an air layer formed by an air pad (not shown).

また、搬送架台30は、Y方向(搬送方向)に延在形成されており、その延在方向の中央部分にワークを空気圧により浮上させるエアユニット50が設けられている。このエアユニット50は、上面に空気を噴出する噴射孔と空気を吸い込む吸気孔とが多数設けられており、ワークに向けて空気を吐出する共に、吸気を行なって一定圧力の空気層を形成することでワークの平面精度を確保する。   Moreover, the conveyance mount 30 is formed to extend in the Y direction (conveyance direction), and an air unit 50 is provided in the central portion of the extension direction to lift the workpiece by air pressure. The air unit 50 is provided with a plurality of injection holes for injecting air and intake holes for inhaling air on the upper surface, and discharges air toward the work and performs intake to form an air layer of constant pressure. This ensures the plane accuracy of the workpiece.

ここで、Y方向(搬送方向)のエアユニット50の前後に、上面に空気を吐出するエアユニットを設置してワークを浮上させると、ガラス基板サイズの大型化にも対応可能である。   Here, if an air unit for discharging air is installed on the upper surface before and after the air unit 50 in the Y direction (conveyance direction) and the workpiece is floated, it is possible to cope with an increase in the size of the glass substrate.

図2は搬送架台30を示す斜視図である。図2に示されるように、搬送架台30は、断面が四角形の角パイプからなるX方向フレーム32とY方向フレーム34とを交差するように格子状に組み合せて溶接により一体化した低剛性構造である。また、搬送架台30の四隅には、搬送架台30の重量を支える4本の支柱36が設けられている。各支柱36は、除振ユニット38を介して床面に結合される。   FIG. 2 is a perspective view showing the transport stand 30. As shown in FIG. 2, the transport gantry 30 has a low-rigidity structure in which an X-direction frame 32 and a Y-direction frame 34 that are square pipes having a square cross section are combined in a lattice shape so as to intersect and integrated by welding. is there. In addition, four support columns 36 that support the weight of the transportation platform 30 are provided at the four corners of the transportation platform 30. Each column 36 is coupled to the floor surface via a vibration isolation unit 38.

また、搬送架台30は、従来のように石定盤を支持する構成ではないので、石定盤の重量を支えるのに必要な剛性を持たず、搬送機構20がY方向に水平移動するのに必要な剛性があれば良い。さらに、搬送架台30には、ワークを空気圧で保持するエアユニット50が設けられているので、石定盤を用いない構造であってもワーク搬送時の平面精度を確保することができる。これにより、搬送架台30の製作が容易に行なえるばかりか、搬送架台30自体の重量も軽減されて輸送用トラック等の運搬車両による輸送作業も容易となる。   Further, since the transport gantry 30 is not configured to support the stone surface plate as in the prior art, it does not have the rigidity necessary to support the weight of the stone surface plate, and the transport mechanism 20 moves horizontally in the Y direction. It only needs to have the necessary rigidity. Furthermore, since the air carrier 50 that holds the workpiece with air pressure is provided in the carrier base 30, it is possible to ensure planar accuracy during workpiece conveyance even in a structure that does not use a stone surface plate. Thereby, not only can the transport gantry 30 be easily manufactured, but the weight of the transport gantry 30 itself is reduced, and transport work by a transport vehicle such as a transport truck is facilitated.

図3はステージ装置10の側面図である。図4はステージ装置10の平面図である。図5は支持架台40の斜視図である。図3乃至図5に示されるように、支持架台40は、搬送架台30の中央に設けられており、搬送架台30を支持するように床面に固定された固定部42と、固定部42の両端より上方に起立する一対の支柱44と、支柱44間にX方向に横架されたガントリ部(横架部)46とを有する。また、固定部42は、Y方向からみるとU字状に形成されており、底部が除振ユニット38を介して床面に結合される。ガントリ部46には、ワークを加工するための加工ユニットや、ワーク表面を検査する検査ユニットなどの所定の処理を行なう処理部が取り付けられている。   FIG. 3 is a side view of the stage apparatus 10. FIG. 4 is a plan view of the stage apparatus 10. FIG. 5 is a perspective view of the support base 40. As shown in FIGS. 3 to 5, the support base 40 is provided in the center of the transport base 30. The support base 40 is fixed to the floor so as to support the transport base 30. It has a pair of support | pillars 44 which stand up from both ends, and the gantry part (horizontal support part) 46 horizontally laid between the support | pillars 44 in the X direction. The fixed portion 42 is formed in a U shape when viewed from the Y direction, and the bottom portion is coupled to the floor surface via the vibration isolation unit 38. The gantry unit 46 is provided with a processing unit for performing a predetermined process such as a processing unit for processing the workpiece and an inspection unit for inspecting the workpiece surface.

固定部42は、搬送架台30の中央部分が載置固定される上板42aと床面に対向する下板42bとの間に複数の板状部材48を所定間隔で垂直方向に起立させた構成であり、搬送方向の撓み(θy方向の応力)とねじり(θx方向の応力)に対する高剛性構造とされている。さらに、板状部材48は高さ方向の寸法を大きく設定されているので、剛性が高くなる。   The fixing unit 42 is configured by standing a plurality of plate-like members 48 in a vertical direction at a predetermined interval between an upper plate 42a on which the central portion of the transport frame 30 is placed and fixed and a lower plate 42b facing the floor surface. And has a highly rigid structure against bending in the conveying direction (stress in the θy direction) and torsion (stress in the θx direction). Furthermore, since the plate-shaped member 48 is set to have a large dimension in the height direction, the rigidity is increased.

図6は支持架台40をY方向から見た図である。図6に示されるように、固定部42は、搬送架台30よりも高い剛性を有する構成であるので、搬送架台30の中央部分が載置固定された状態で組み付けられると、搬送架台30を上板42a全体で安定的に支持することができる。   FIG. 6 is a view of the support frame 40 as viewed from the Y direction. As shown in FIG. 6, the fixing portion 42 is configured to have higher rigidity than that of the transport gantry 30, and therefore when the central portion of the transport cradle 30 is mounted and fixed, the transport cradle 30 is moved upward. The entire plate 42a can be supported stably.

このように、ステージ装置10においては、支持架台40を高剛性構造とし、且つ搬送架台30を低剛性構造とすることにより、ワークへの作業を行なう処理領域での剛性を確保してワークに対する処理精度を維持することができると共に、装置全体の軽量化を図ることができる。また、ステージ装置10の剛性を下げて固有振動数を上げることにより、例えば、ステージ装置10を用いてワークに塗布する場合には、塗布ムラを抑えることができる。   As described above, in the stage apparatus 10, the support base 40 has a high rigidity structure and the transport base 30 has a low rigidity structure, thereby ensuring rigidity in a processing region where work is performed on the work and processing the work. The accuracy can be maintained and the weight of the entire apparatus can be reduced. In addition, by reducing the rigidity of the stage device 10 and increasing the natural frequency, for example, when coating the workpiece using the stage device 10, uneven coating can be suppressed.

そして、工場から設置現場に輸送した後の組立作業も容易となり、組立後の調整作業も支持架台40付近での精度が高精度であれば良いので、調整作業も容易に行なえる。また、ステージ装置10を輸送する際は、搬送架台30と支持架台40とを分割して運ぶことができるので、ワークの大型化に対応して搬送架台30及び支持架台40が大型化してもトラック等の運搬用車両を用いて輸送することが可能であり、可搬性が高められている。   Assembling work after transportation from the factory to the installation site is facilitated, and adjustment work after assembling can be performed easily because the precision in the vicinity of the support base 40 is high. Further, when the stage apparatus 10 is transported, since the transport frame 30 and the support frame 40 can be transported separately, the truck can be used even if the transport frame 30 and the support frame 40 are increased in size in response to an increase in the size of the workpiece. It can be transported using a transporting vehicle such as, and the portability is enhanced.

また、ステージ装置10は、搬送架台30と支持架台40とを組み合わせて架台が完成する分割可能な構成であるので、例えば、支持架台40を共通にして搬送架台30の全長をワークの大きさに応じて変更することも可能である。この場合、ステージ装置10を設置した後に全長の異なる搬送架台30と交換することが可能になり、ワークが大型化しても搬送架台30を交換することで対応することもできる。   Further, since the stage device 10 has a severable configuration in which the carrier frame 30 and the support frame 40 are combined to complete the frame, for example, the support frame 40 is shared and the entire length of the conveyance frame 30 is set to the size of the workpiece. It can be changed accordingly. In this case, after the stage device 10 is installed, it can be exchanged with the conveyance platform 30 having a different overall length, and even if the workpiece becomes large, it can be dealt with by exchanging the conveyance platform 30.

図7はステージ装置の変形例を示す斜視図である。図7に示されるように、小さいサイズのワークを加工する場合には、ステージ装置60は、搬送架台30の搬送方向(Y方向)の全長が短くなり、支柱36が外れた構成となる。ステージ装置60の支持架台40は、上記実施例と同様であり、搬送架台30が固定部42の上板42aに載置固定された状態で搬送架台30の全荷重を支える。   FIG. 7 is a perspective view showing a modification of the stage apparatus. As shown in FIG. 7, when processing a small-sized workpiece, the stage device 60 has a configuration in which the entire length of the transport frame 30 in the transport direction (Y direction) is shortened and the support column 36 is removed. The support frame 40 of the stage device 60 is the same as in the above embodiment, and supports the entire load of the transfer frame 30 in a state where the transfer frame 30 is placed and fixed on the upper plate 42a of the fixing unit 42.

また、ステージ装置60では、搬送架台30が支持架台40に搭載される構成であるので、搬送架台30を支持架台40から分割することにより、例えば、入口が狭い場所でも容易に搬入して設置作業を行なうことが可能である。   Further, in the stage device 60, since the transport gantry 30 is mounted on the support gantry 40, for example, by dividing the transport gantry 30 from the support gantry 40, for example, the entrance can be easily carried in even in a narrow entrance. Can be performed.

この変形例のステージ装置60では、支持架台40からY方向に突出する搬送架台30の突出部分が短くて済み、搬送架台30と支持架台40とのY方向長さの差が小さいので、搬送機構20の移動動作による搬送架台30の撓みが生じない構成になっている。   In the stage device 60 of this modified example, the protruding portion of the conveyance frame 30 protruding in the Y direction from the support frame 40 can be short, and the difference in length in the Y direction between the conveyance frame 30 and the support frame 40 is small. The configuration is such that the carrier base 30 does not bend due to the 20 movement operations.

上記実施例において、ガントリ部46をZ方向に昇降させる高さ調整機構を設ける構成としても良いには勿論である。   In the above-described embodiment, it is needless to say that a height adjusting mechanism for raising and lowering the gantry portion 46 in the Z direction may be provided.

本発明によるステージ装置の一実施例を示す斜視図である。It is a perspective view which shows one Example of the stage apparatus by this invention. 搬送架台30を示す斜視図である。FIG. 4 is a perspective view showing a transport stand 30. ステージ装置10の側面図である。2 is a side view of the stage device 10. FIG. ステージ装置10の平面図である。2 is a plan view of the stage device 10. FIG. 支持架台40の斜視図である。FIG. 4 is a perspective view of a support frame 40. 支持架台40をY方向から見た図である。It is the figure which looked at the support stand 40 from the Y direction. ステージ装置の変形例を示す斜視図である。It is a perspective view which shows the modification of a stage apparatus.

符号の説明Explanation of symbols

10,60 ステージ装置
20 搬送機構
22 スライダ
24 ガイドレール
26 リニアモータ26
30 搬送架台
32 X方向フレーム
34 Y方向フレーム
40 支持架台
50 エアユニット
42 固定部
44 支柱
46 ガントリ部
48 板状部材
10, 60 Stage device 20 Transport mechanism 22 Slider 24 Guide rail 26 Linear motor 26
30 Transport frame 32 X-direction frame 34 Y-direction frame 40 Support frame 50 Air unit 42 Fixing portion 44 Support column 46 Gantry portion 48 Plate member

Claims (6)

ワークを搬送する搬送機構と、
該搬送機構を支持する搬送架台と、
前記ワークに対して所定の処理を行う処理領域で前記搬送架台上に設けられ、前記処理領域の下側から前記搬送架台を支持する支持架台と、を備え、
前記支持架台は、
前記搬送架台を支持するように床面に固定された固定部と、
該固定部の両端より上方に起立する一対の支柱と、
該支柱間に横架された横架部と、を有し、
前記横架部には、前記搬送機構により搬送される前記ワークが前記処理領域を通過する過程で所定の処理を行う処理部が設けられていることを特徴とするステージ装置。
A transport mechanism for transporting workpieces;
A transport gantry that supports the transport mechanism;
A support frame that is provided on the transfer frame in a processing region that performs a predetermined process on the workpiece, and that supports the transfer frame from below the processing region ;
The support frame is
A fixed portion fixed to the floor surface to support the transport cradle;
A pair of struts standing above both ends of the fixed portion;
A horizontal portion that is horizontally placed between the columns,
Wherein the lateral bridging portion, a stage device which is characterized that you have processing unit for performing predetermined processing is provided in the course of the work it passes through the process area conveyed by the conveying mechanism.
前記搬送架台は、前記処理領域で前記ワークを空気圧により浮上させるエアユニットを有することを特徴とする請求項1に記載のステージ装置。   The stage apparatus according to claim 1, wherein the transfer platform includes an air unit that lifts the workpiece by air pressure in the processing region. 前記支持架台は、前記搬送架台の中央下側に配置され、前記搬送方向と直交する方向に延在形成されたことを特徴とする請求項1に記載のステージ装置。   The stage apparatus according to claim 1, wherein the support frame is disposed at a lower center of the transfer frame and extends in a direction orthogonal to the transfer direction. 前記搬送架台は、前記支持架台よりも低剛性であることを特徴とする請求項1に記載のステージ装置。   The stage apparatus according to claim 1, wherein the transport frame has a lower rigidity than the support frame. 前記搬送架台は、中空部材を格子状に組み合わせた低剛性構造であることを特徴とする請求項1に記載のステージ装置。   The stage apparatus according to claim 1, wherein the transport frame has a low-rigidity structure in which hollow members are combined in a lattice shape. 前記固定部は、前記搬送架台が載置される上板と前記床面に対向する下板との間に複数の板状部材を所定間隔で垂直方向に起立させた高剛性構造であることを特徴とする請求項に記載のステージ装置。 The fixing portion has a high-rigidity structure in which a plurality of plate-like members are erected in a vertical direction at a predetermined interval between an upper plate on which the conveyance platform is placed and a lower plate facing the floor surface. The stage apparatus according to claim 1 , characterized in that:
JP2005379495A 2005-12-28 2005-12-28 Stage equipment Expired - Fee Related JP4673215B2 (en)

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JP4881965B2 (en) 2009-02-16 2012-02-22 株式会社日立ハイテクノロジーズ LCD exposure equipment
CN101954345B (en) * 2010-09-09 2013-02-27 无锡吉兴汽车声学部件科技有限公司 Circulatory drive heating and positioning mechanism of oven tray
JP6314913B2 (en) * 2014-08-01 2018-04-25 株式会社ダイフク Car wash machine
KR101814246B1 (en) 2015-06-16 2018-01-04 (주)이즈미디어 In-line handler and testing method using the same
KR101897981B1 (en) * 2017-01-23 2018-09-12 주식회사 에스에프에이 A glass transferring system
CN112676102A (en) * 2020-12-18 2021-04-20 浙江农业商贸职业学院 Automatic oiling device for automobile seat slide rail
WO2023028732A1 (en) * 2021-08-30 2023-03-09 苏州群志机械设备有限公司 Adjustable sliding rail assembly for driving machine tool

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