JP4590213B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4590213B2
JP4590213B2 JP2004165878A JP2004165878A JP4590213B2 JP 4590213 B2 JP4590213 B2 JP 4590213B2 JP 2004165878 A JP2004165878 A JP 2004165878A JP 2004165878 A JP2004165878 A JP 2004165878A JP 4590213 B2 JP4590213 B2 JP 4590213B2
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JP
Japan
Prior art keywords
reticle
wafer
reference mark
alignment
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004165878A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005347544A (ja
JP2005347544A5 (enExample
Inventor
信明 大串
光陽 雨宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004165878A priority Critical patent/JP4590213B2/ja
Priority to US11/144,319 priority patent/US20050270509A1/en
Publication of JP2005347544A publication Critical patent/JP2005347544A/ja
Publication of JP2005347544A5 publication Critical patent/JP2005347544A5/ja
Application granted granted Critical
Publication of JP4590213B2 publication Critical patent/JP4590213B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004165878A 2004-06-03 2004-06-03 露光装置及びデバイス製造方法 Expired - Fee Related JP4590213B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004165878A JP4590213B2 (ja) 2004-06-03 2004-06-03 露光装置及びデバイス製造方法
US11/144,319 US20050270509A1 (en) 2004-06-03 2005-06-03 Measuring apparatus, exposure apparatus having the same, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004165878A JP4590213B2 (ja) 2004-06-03 2004-06-03 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005347544A JP2005347544A (ja) 2005-12-15
JP2005347544A5 JP2005347544A5 (enExample) 2007-07-26
JP4590213B2 true JP4590213B2 (ja) 2010-12-01

Family

ID=35448514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004165878A Expired - Fee Related JP4590213B2 (ja) 2004-06-03 2004-06-03 露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US20050270509A1 (enExample)
JP (1) JP4590213B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置
US7583359B2 (en) * 2006-05-05 2009-09-01 Asml Netherlands B.V. Reduction of fit error due to non-uniform sample distribution
US11342184B2 (en) * 2019-11-25 2022-05-24 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Method of forming multiple patterned layers on wafer and exposure apparatus thereof
NL2026937B1 (en) * 2020-11-20 2022-07-01 Nearfield Instr B V Alignment system and method for aligning an object having an alignment mark

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54118779A (en) * 1978-03-08 1979-09-14 Nippon Chemical Ind Device for matching position using random pattern
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
DE59305801D1 (de) * 1993-12-08 1997-04-17 Heidenhain Gmbh Dr Johannes Längenmesssystem
JPH102717A (ja) * 1996-06-14 1998-01-06 Mitsutoyo Corp 原点検出装置および原点検出方法
JPH10254123A (ja) * 1997-03-10 1998-09-25 Nikon Corp テストパターンが形成されたレチクル
US6344698B2 (en) * 1999-02-22 2002-02-05 International Business Machines Corporation More robust alignment mark design
DE50009018D1 (de) * 1999-11-18 2005-01-27 Hera Rotterdam Bv Positionssensor
DE19962278A1 (de) * 1999-12-23 2001-08-02 Heidenhain Gmbh Dr Johannes Positionsmeßeinrichtung
AU2002222596A1 (en) * 2000-12-11 2002-06-24 Nikon Corporation Position measuring method, exposure method and system thereof, device productionmethod
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置

Also Published As

Publication number Publication date
JP2005347544A (ja) 2005-12-15
US20050270509A1 (en) 2005-12-08

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