JP4588222B2 - レチクル検査中にグローバルデータを収集するための装置および方法 - Google Patents

レチクル検査中にグローバルデータを収集するための装置および方法 Download PDF

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Publication number
JP4588222B2
JP4588222B2 JP2000615380A JP2000615380A JP4588222B2 JP 4588222 B2 JP4588222 B2 JP 4588222B2 JP 2000615380 A JP2000615380 A JP 2000615380A JP 2000615380 A JP2000615380 A JP 2000615380A JP 4588222 B2 JP4588222 B2 JP 4588222B2
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Prior art keywords
reticle
value
test
statistical information
baseline
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Japanese (ja)
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JP2002543463A (ja
JP2002543463A5 (https=
Inventor
ウィリー・ジェイムス・エヌ．
イエ・ジュン
ジュアング・シャウ−テ
アレス・デイビッド・エス．
ルー・イェン−ウェン
カオ・ユー
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KLA Corp
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KLA Corp
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2000615380A 1999-05-03 2000-04-28 レチクル検査中にグローバルデータを収集するための装置および方法 Expired - Fee Related JP4588222B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/304,437 US6516085B1 (en) 1999-05-03 1999-05-03 Apparatus and methods for collecting global data during a reticle inspection
US09/304,437 1999-05-03
PCT/US2000/011768 WO2000066549A2 (en) 1999-05-03 2000-04-28 Apparatus and methods for collecting global data during a reticle inspection

Publications (3)

Publication Number Publication Date
JP2002543463A JP2002543463A (ja) 2002-12-17
JP2002543463A5 JP2002543463A5 (https=) 2007-06-21
JP4588222B2 true JP4588222B2 (ja) 2010-11-24

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JP2000615380A Expired - Fee Related JP4588222B2 (ja) 1999-05-03 2000-04-28 レチクル検査中にグローバルデータを収集するための装置および方法

Country Status (4)

Country Link
US (2) US6516085B1 (https=)
EP (1) EP1178961B1 (https=)
JP (1) JP4588222B2 (https=)
WO (1) WO2000066549A2 (https=)

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US9448343B2 (en) 2013-03-15 2016-09-20 Kla-Tencor Corporation Segmented mirror apparatus for imaging and method of using the same
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US9875534B2 (en) 2015-09-04 2018-01-23 Kla-Tencor Corporation Techniques and systems for model-based critical dimension measurements
US10451563B2 (en) 2017-02-21 2019-10-22 Kla-Tencor Corporation Inspection of photomasks by comparing two photomasks
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Also Published As

Publication number Publication date
US6516085B1 (en) 2003-02-04
US6654489B2 (en) 2003-11-25
WO2000066549A2 (en) 2000-11-09
US20030091224A1 (en) 2003-05-15
JP2002543463A (ja) 2002-12-17
EP1178961B1 (en) 2016-07-06
EP1178961A2 (en) 2002-02-13
WO2000066549A3 (en) 2001-01-11

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