JP4578532B2 - ガスバリアフィルムおよびこれを用いたデバイスならびに光学部材、ガスバリアフィルムの製造方法 - Google Patents
ガスバリアフィルムおよびこれを用いたデバイスならびに光学部材、ガスバリアフィルムの製造方法 Download PDFInfo
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- JP4578532B2 JP4578532B2 JP2008049576A JP2008049576A JP4578532B2 JP 4578532 B2 JP4578532 B2 JP 4578532B2 JP 2008049576 A JP2008049576 A JP 2008049576A JP 2008049576 A JP2008049576 A JP 2008049576A JP 4578532 B2 JP4578532 B2 JP 4578532B2
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Landscapes
- Polymerization Catalysts (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Electroluminescent Light Sources (AREA)
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008049576A JP4578532B2 (ja) | 2007-12-27 | 2008-02-29 | ガスバリアフィルムおよびこれを用いたデバイスならびに光学部材、ガスバリアフィルムの製造方法 |
| US12/343,895 US8431233B2 (en) | 2007-12-27 | 2008-12-24 | Gas-barrier film, device and optical component comprising same, and method for producing gas-barrier film |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007337413 | 2007-12-27 | ||
| JP2008049576A JP4578532B2 (ja) | 2007-12-27 | 2008-02-29 | ガスバリアフィルムおよびこれを用いたデバイスならびに光学部材、ガスバリアフィルムの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009172993A JP2009172993A (ja) | 2009-08-06 |
| JP2009172993A5 JP2009172993A5 (ru) | 2010-05-20 |
| JP4578532B2 true JP4578532B2 (ja) | 2010-11-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2008049576A Expired - Fee Related JP4578532B2 (ja) | 2007-12-27 | 2008-02-29 | ガスバリアフィルムおよびこれを用いたデバイスならびに光学部材、ガスバリアフィルムの製造方法 |
Country Status (1)
| Country | Link |
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| JP (1) | JP4578532B2 (ru) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011046060A (ja) * | 2009-08-26 | 2011-03-10 | Fujifilm Corp | ガスバリアフィルムおよびガスバリアフィルムの製造方法 |
| JP5216724B2 (ja) | 2009-09-01 | 2013-06-19 | 富士フイルム株式会社 | ガスバリアフィルムおよびデバイス |
| JP5414639B2 (ja) | 2009-09-08 | 2014-02-12 | 富士フイルム株式会社 | ガスバリアフィルムの巻き癖を直す方法、ガスバリアフィルムの製造方法および電子素子の製造方法 |
| JP5247641B2 (ja) | 2009-09-18 | 2013-07-24 | 富士フイルム株式会社 | ガスバリアフィルムと電子素子の貼り合わせ方法、電子素子およびその製造方法 |
| JP5523382B2 (ja) | 2010-03-19 | 2014-06-18 | 富士フイルム株式会社 | ガスバリアフィルムの製造方法及びガスバリアフィルム |
| JP5788825B2 (ja) * | 2012-03-30 | 2015-10-07 | 富士フイルム株式会社 | 機能性フィルムの製造方法 |
| WO2014024602A1 (ja) * | 2012-08-10 | 2014-02-13 | 富士フイルム株式会社 | 包装材に熱溶着される包装材料 |
| CN106715121A (zh) | 2015-07-17 | 2017-05-24 | 大日本印刷株式会社 | 光学部件用层积体以及图像显示装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003335820A (ja) * | 2002-02-25 | 2003-11-28 | Sumitomo Bakelite Co Ltd | 蒸着膜用樹脂及びこれを用いたガスバリア性プラスチックフィルム |
| JP2005254795A (ja) * | 2003-09-30 | 2005-09-22 | Fuji Photo Film Co Ltd | ガスバリアフィルム及びその製造方法 |
| JP2007290369A (ja) * | 2006-03-29 | 2007-11-08 | Fujifilm Corp | ガスバリア性積層フィルムとその製造方法、および画像表示素子 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003335820A (ja) * | 2002-02-25 | 2003-11-28 | Sumitomo Bakelite Co Ltd | 蒸着膜用樹脂及びこれを用いたガスバリア性プラスチックフィルム |
| JP2005254795A (ja) * | 2003-09-30 | 2005-09-22 | Fuji Photo Film Co Ltd | ガスバリアフィルム及びその製造方法 |
| JP2007290369A (ja) * | 2006-03-29 | 2007-11-08 | Fujifilm Corp | ガスバリア性積層フィルムとその製造方法、および画像表示素子 |
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