JP4570622B2 - Lubricant for recording medium and magnetic disk - Google Patents
Lubricant for recording medium and magnetic disk Download PDFInfo
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- JP4570622B2 JP4570622B2 JP2006529111A JP2006529111A JP4570622B2 JP 4570622 B2 JP4570622 B2 JP 4570622B2 JP 2006529111 A JP2006529111 A JP 2006529111A JP 2006529111 A JP2006529111 A JP 2006529111A JP 4570622 B2 JP4570622 B2 JP 4570622B2
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- 239000000314 lubricant Substances 0.000 title claims description 55
- 230000005291 magnetic effect Effects 0.000 title claims description 32
- 150000001875 compounds Chemical class 0.000 claims description 44
- 239000010702 perfluoropolyether Substances 0.000 claims description 28
- 239000010410 layer Substances 0.000 claims description 18
- 239000011241 protective layer Substances 0.000 claims description 10
- 230000001050 lubricating effect Effects 0.000 claims description 8
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 claims description 3
- 239000007788 liquid Substances 0.000 description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 8
- 238000000354 decomposition reaction Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 6
- 238000005160 1H NMR spectroscopy Methods 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- DZKXDEWNLDOXQH-UHFFFAOYSA-N 1,3,5,2,4,6-triazatriphosphinine Chemical group N1=PN=PN=P1 DZKXDEWNLDOXQH-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 4
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical group CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000013558 reference substance Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 description 1
- DJMUYABFXCIYSC-UHFFFAOYSA-N 1H-phosphole Chemical compound C=1C=CPC=1 DJMUYABFXCIYSC-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- -1 Si 3 N 4 Chemical compound 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229960004624 perflexane Drugs 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 238000005583 trifluoroacetylation reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M169/00—Lubricating compositions characterised by containing as components a mixture of at least two types of ingredient selected from base-materials, thickeners or additives, covered by the preceding groups, each of these compounds being essential
- C10M169/04—Mixtures of base-materials and additives
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M169/00—Lubricating compositions characterised by containing as components a mixture of at least two types of ingredient selected from base-materials, thickeners or additives, covered by the preceding groups, each of these compounds being essential
- C10M169/04—Mixtures of base-materials and additives
- C10M169/041—Mixtures of base-materials and additives the additives being macromolecular compounds only
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
- G11B5/7253—Fluorocarbon lubricant
- G11B5/7257—Perfluoropolyether lubricant
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2213/00—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2213/04—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2213/00—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2213/04—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
- C10M2213/043—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2225/00—Organic macromolecular compounds containing phosphorus as ingredients in lubricant compositions
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2225/00—Organic macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2225/003—Organic macromolecular compounds containing phosphorus as ingredients in lubricant compositions used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/14—Electric or magnetic purposes
- C10N2040/18—Electric or magnetic purposes in connection with recordings on magnetic tape or disc
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
Description
本発明は、磁気ディスク、磁気テープなどの記録媒体用の潤滑剤および該潤滑剤を用いて潤滑層を形成した磁気ディスクに関する。 The present invention relates to a lubricant for a recording medium such as a magnetic disk and a magnetic tape, and a magnetic disk having a lubricant layer formed using the lubricant.
磁気ディスク用潤滑剤としては、一般的にパーフルオロポリエーテル化合物が用いられ、中でも低表面エネルギーかつ低摩擦力を有するソルベイ社製のフォンブリン(Fomblin)系化合物が主流となっている。フォンブリン系化合物は、主鎖の基本骨格が(CF2CF2O)m(CF2O)nのパーフルオロポリエーテル化合物である。As a lubricant for a magnetic disk, a perfluoropolyether compound is generally used. Among them, a Fomblin-based compound manufactured by Solvay, which has a low surface energy and a low frictional force, is mainly used. Fomblin compounds are perfluoropolyether compounds whose basic skeleton of the main chain is (CF 2 CF 2 O) m (CF 2 O) n .
しかしながら、フォンブリン系化合物は、ヘッド部材に含まれているアルミナ(Al2O3)と反応して主鎖の切断が起こることが知られている(Macromolecules,1992年,25巻,p.6791−6799)。この切断が進行すると、パーフルオロポリエーテルが低分子化し、最終的には磁気ディスク上から揮発するという欠点を有している。However, it is known that fomblin compounds react with alumina (Al 2 O 3 ) contained in the head member to cause the main chain to break (Macromolecules, 1992, Vol. 25, p. 6791). -6799). As this cutting proceeds, the perfluoropolyether has a low molecular weight and eventually has the disadvantage of volatilizing from the magnetic disk.
一方、磁気ディスクドライブの駆動方式には、装置の起動/停止の際にヘッドとディスクが接触するコンタクト・スタート・ストップ(CSS)方式と、停止時にヘッドがディスク面外に退避するランプ・ロード・アンロード(L/UL)方式があり、方式の違いによって潤滑剤への要求特性も異なる。 On the other hand, the magnetic disk drive drive system includes a contact start / stop (CSS) system in which the head and the disk come into contact with each other when the apparatus is started / stopped, and ramp / load / There is an unload (L / UL) system, and the required characteristics for the lubricant differ depending on the system.
近年、ディスク装置の高記録密度化や高速処理化が要望されており、これに対応してヘッドとディスクとの距離(浮上量)を小さくしたり、ディスクの回転を高速化する必要がある。基本的にはヘッドとディスクが接触しないL/UL方式においても、低浮上量化や高速化に伴ってヘッドとディスクの接触頻度が増大し、潤滑剤がディスク表面からヘッドに移行したり、ディスク面外へ飛散したりする。その結果、ディスクの損傷に至ることがあるため、潤滑剤としては、ディスク表面との付着性の強いものが望ましい。このような潤滑剤として、分子内に極性基を複数個有するフォンブリン系パーフルオロポリエーテル化合物(例えば、ソルベイ社製「Z−Tetraol」)があるが、この潤滑剤は、アルミナによって分解反応が起きるという問題を解決できていない。 In recent years, there has been a demand for higher recording density and higher speed processing of disk devices. Correspondingly, it is necessary to reduce the distance (flying height) between the head and the disk and to increase the rotation speed of the disk. Basically, even in the L / UL system where the head and the disk do not contact each other, the contact frequency between the head and the disk increases as the flying height decreases and the speed increases, and the lubricant moves from the disk surface to the head. Or scatter outside. As a result, the disc may be damaged, so that the lubricant having a strong adhesion to the disc surface is desirable. As such a lubricant, there is a fomblin perfluoropolyether compound (for example, “Z-Tetraol” manufactured by Solvay) having a plurality of polar groups in the molecule. This lubricant is decomposed by alumina. The problem of getting up has not been solved.
一方、分子内にパーフルオロポリエーテル鎖を有しているにも関わらず、アルミナによる分解反応が抑制される化合物として、パーフルオロポリエーテル骨格の末端をホスファゼン官能基で修飾した化合物が知られている(米国特許第6608009号明細書、米国特許第6605335号明細書)。これらの化合物は、修飾したホスファゼン官能基の効果によって、アルミナによる分解が抑制される。また、他のパーフルオロポリエーテル化合物との相溶性も高く、優れたCSS耐性を有する。しかしながら、ディスク表面との付着力は低く、L/UL方式用の潤滑剤としてはあまり好ましくない。 On the other hand, a compound in which the end of the perfluoropolyether skeleton is modified with a phosphazene functional group is known as a compound that suppresses the decomposition reaction by alumina despite having a perfluoropolyether chain in the molecule. (US Pat. No. 6,608,009, US Pat. No. 6,605,335). These compounds are inhibited from being decomposed by alumina due to the effect of the modified phosphazene functional group. In addition, it has high compatibility with other perfluoropolyether compounds and has excellent CSS resistance. However, the adhesive force with the disk surface is low, which is not preferable as a lubricant for the L / UL system.
情報の記録/再生の高速化を図るために、磁気ディスクの回転数は、近い将来15,000rpm以上になると予想される。磁気ディスクの回転数が大きくなるに伴い、潤滑剤の飛散量も大きくなる傾向がある。また、高速回転させながら長期摺動を行うと、分解によって潤滑層が薄くなり、最終的には磁気ディスクの破壊に至る。磁気ディスクドライブの信頼性を確保する上では、磁気ディスクとの付着力が強く、且つ分解しにくい潤滑剤が必要である。 In order to increase the speed of recording / reproducing information, the rotational speed of the magnetic disk is expected to be 15,000 rpm or more in the near future. As the rotational speed of the magnetic disk increases, the amount of lubricant scattered tends to increase. In addition, if the sliding is performed for a long time while rotating at a high speed, the lubricating layer becomes thin due to the decomposition, and eventually the magnetic disk is destroyed. In order to ensure the reliability of the magnetic disk drive, a lubricant that has strong adhesion to the magnetic disk and is difficult to disassemble is required.
本発明の課題は、記録媒体との付着力が強く、且つ分解しにくい記録媒体用潤滑剤を提供することにある。 An object of the present invention is to provide a lubricant for a recording medium that has a strong adhesion to the recording medium and is difficult to decompose.
本発明は、下記に示すとおりの記録媒体用潤滑剤および磁気ディスクを提供するものである。 The present invention provides a lubricant for a recording medium and a magnetic disk as described below.
1.式(1);
R1-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2-R2 (1)
〔式中、R1は1. Formula (1);
R 1 —CH 2 CF 2 O— (CF 2 CF 2 O) m — (CF 2 O) n —CF 2 CH 2 —R 2 (1)
[Wherein R 1 is
(RはC1−4のハロアルキル基を示す。)を示し、R2は-OCH2CH(OH)CH2OHを示し、mおよびnはそれぞれ1〜30を示す。〕で表されるパーフルオロポリエーテル化合物および式(2);
R1-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2-R3 (2)
〔式中、R1、mおよびnは前記と同様であり、R3は-OCH2CH(OH)CH2OCH2CH(OH)CH2OHを示す。〕で表されるパーフルオロポリエーテル化合物を含有する記録媒体用潤滑剤。(R represents a C 1-4 haloalkyl group), R 2 represents —OCH 2 CH (OH) CH 2 OH, and m and n each represent 1 to 30. A perfluoropolyether compound represented by the formula (2);
R 1 —CH 2 CF 2 O— (CF 2 CF 2 O) m — (CF 2 O) n —CF 2 CH 2 —R 3 (2)
[Wherein, R 1 , m and n are the same as defined above, and R 3 represents —OCH 2 CH (OH) CH 2 OCH 2 CH (OH) CH 2 OH]. ] The lubricant for recording media containing the perfluoropolyether compound represented by this.
2.支持体上に記録層および保護層をこの順に形成し、該保護層の表面に上記項1に記載の潤滑剤からなる潤滑層を形成した磁気ディスク。
2. A magnetic disk in which a recording layer and a protective layer are formed in this order on a support, and a lubricating layer made of the lubricant according to
以下、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.
本発明の記録媒体用潤滑剤に含まれるパーフルオロポリエーテル化合物は、パーフルオロポリエーテル鎖の一方の末端にシクロトリホスファゼン官能基を有し、もう一方の末端にグリコール骨格からなる複数個の水酸基を有する。 The perfluoropolyether compound contained in the recording medium lubricant of the present invention comprises a plurality of hydroxyl groups having a cyclotriphosphazene functional group at one end of a perfluoropolyether chain and a glycol skeleton at the other end. Have
本発明の記録媒体用潤滑剤は、例えば、以下のようにして製造する。 The lubricant for recording media of the present invention is produced, for example, as follows.
主鎖が-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2-で〔式中、mおよびnはそれぞれ1〜30を示す。〕、一方の末端にシクロトリホスファゼン官能基を有し、もう一方の末端に1個の水酸基を有するパーフルオロポリエーテル化合物と、ポタシウム−t−ブトキシドと、t−ブタノールとを混合し、70℃で30分撹拌する。ポタシウム−t−ブトキシドが溶解した後に、0.5〜2.0当量の2,3−エポキシ−1−プロパノールを、70℃で撹拌しながら2時間かけてゆっくり滴下する。滴下終了後、70℃でさらに2時間撹拌する。反応終了後、パーフルオロカーボン系の溶剤で抽出し、蒸留により溶剤を留去して、粘ちょう液体を得る。得られた粘ちょう液体は、上記式(1)で表されるパーフルオロポリエーテル化合物、上記式(2)で表されるパーフルオロポリエーテル化合物、および式(3);
R1-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2-OH (3)
〔式中、R1はThe main chain is —CH 2 CF 2 O— (CF 2 CF 2 O) m — (CF 2 O) n —CF 2 CH 2 —, wherein m and n each represent 1 to 30. ], A perfluoropolyether compound having a cyclotriphosphazene functional group at one end and one hydroxyl group at the other end, potassium t-butoxide, and t-butanol are mixed, For 30 minutes. After potassium-t-butoxide is dissolved, 0.5-2.0 equivalents of 2,3-epoxy-1-propanol are slowly added dropwise over 2 hours with stirring at 70 ° C. After completion of dropping, the mixture is further stirred at 70 ° C. for 2 hours. After completion of the reaction, extraction is performed with a perfluorocarbon solvent, and the solvent is distilled off by distillation to obtain a viscous liquid. The resulting viscous liquid is a perfluoropolyether compound represented by the above formula (1), a perfluoropolyether compound represented by the above formula (2), and a formula (3);
R 1 —CH 2 CF 2 O— (CF 2 CF 2 O) m — (CF 2 O) n —CF 2 CH 2 —OH (3)
[Wherein R 1 is
(RはC1−4のハロアルキル基を示す。)を示し、mおよびnはそれぞれ1〜30を示す。〕で表されるパーフルオロポリエーテル化合物を含有する。(R represents a C 1-4 haloalkyl group), and m and n each represent 1 to 30. ] The perfluoro polyether compound represented by this is contained.
この3成分系の混合物をそのまま、本発明の記録媒体用潤滑剤として用いることもできるが、カラムクロマトグラフィーや超臨界炭酸抽出法などの精製法で精製して用いることもできる。 This three-component mixture can be used as it is as a lubricant for recording media of the present invention, but it can also be used after being purified by a purification method such as column chromatography or supercritical carbonic acid extraction.
記録媒体用潤滑剤としては、上記式(1)で表されるパーフルオロポリエーテル化合物および上記式(2)で表されるパーフルオロポリエーテル化合物の合計含有率が50重量%以上で、且つ上記式(1)で表されるパーフルオロポリエーテル化合物の含有率が30重量%以上のものが好ましく、上記式(1)で表されるパーフルオロポリエーテル化合物および上記式(2)で表されるパーフルオロポリエーテル化合物の合計含有率が70重量%以上で、且つ上記式(1)で表されるパーフルオロポリエーテル化合物の含有率が40重量%以上のものがより好ましい。 As the recording medium lubricant, the total content of the perfluoropolyether compound represented by the above formula (1) and the perfluoropolyether compound represented by the above formula (2) is 50% by weight or more, and The content of the perfluoropolyether compound represented by the formula (1) is preferably 30% by weight or more, and is represented by the perfluoropolyether compound represented by the above formula (1) and the above formula (2). More preferably, the total content of the perfluoropolyether compound is 70% by weight or more and the content of the perfluoropolyether compound represented by the above formula (1) is 40% by weight or more.
製造原料の、主鎖が-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2-で〔式中、mおよびnはそれぞれ1〜30を示す。〕、一方の末端にシクロトリホスファゼン官能基を有し、もう一方の末端に1個の水酸基を有するパーフルオロポリエーテル化合物としては、例えば、(株)松村石油研究所製「モレスコホスファロール A20H」が挙げられる。このものの化学構造は、(CF3C6H4O)5-P3N3-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2OH〔式中、-P3N3-はシクロトリホスファゼン環を示し、mおよびnはそれぞれ1〜30を示す。〕であり、数平均分子量は約1300〜8000である。The main chain of the production raw material is —CH 2 CF 2 O— (CF 2 CF 2 O) m — (CF 2 O) n —CF 2 CH 2 —, wherein m and n each represent 1 to 30 . ] As a perfluoropolyether compound having a cyclotriphosphazene functional group at one end and one hydroxyl group at the other end, for example, "Molescophospharol manufactured by Matsumura Oil Research Co., Ltd." A20H ". The chemical structure of this compound, (CF 3 C 6 H 4 O) 5 -P 3 N 3 -
本発明の記録媒体用潤滑剤の用途としては、磁気ディスク装置内における磁気ディスクの摺動特性を向上させるための潤滑剤としての用途が挙げられる。これは、磁気ディスクとヘッドとの摩擦係数の低減が目的であるので、磁気ディスク以外にも磁気テープなどの記録媒体とヘッドとの間に摺動が伴う他の記録装置における潤滑剤としての用途も挙げられる。また、記録装置に限らず、摺動を伴う部分を有する機器の潤滑剤としての用途も考えられる。なお、本発明の潤滑剤は、フォンブリン系パーフルオロポリエーテル化合物の分解抑制効果も発揮するので、フォンブリン系の潤滑剤と併用することもできる。また、フォンブリン系以外の潤滑剤(例えば、ダイキン工業(株)製「デムナムSA」、ソルベイ社製「クライトックス」など)と併用することもできる。 The use of the recording medium lubricant of the present invention includes use as a lubricant for improving the sliding characteristics of the magnetic disk in the magnetic disk apparatus. The purpose of this is to reduce the coefficient of friction between the magnetic disk and the head, so that it can be used as a lubricant in other recording devices that involve sliding between the recording medium such as magnetic tape and the head in addition to the magnetic disk. Also mentioned. In addition, the present invention is not limited to a recording apparatus, and may be used as a lubricant for equipment having a sliding part. In addition, since the lubricant of the present invention also exhibits an effect of suppressing the decomposition of the fomblin perfluoropolyether compound, it can be used in combination with a fomblin lubricant. Further, it can be used in combination with a lubricant other than Fomblin (for example, “Demnam SA” manufactured by Daikin Industries, Ltd., “Crytox” manufactured by Solvay).
本発明の磁気ディスクは、支持体上に記録層および保護層をこの順に形成し、該保護層の表面に上記記録媒体用潤滑剤からなる潤滑層を形成してなる。 The magnetic disk of the present invention is formed by forming a recording layer and a protective layer in this order on a support, and forming a lubricating layer made of the recording medium lubricant on the surface of the protective layer.
本発明の磁気ディスクの一例の構成(断面)の概略を、図1に示す。 FIG. 1 shows an outline of the configuration (cross section) of an example of the magnetic disk of the present invention.
図1において、本発明の磁気ディスクは、支持体1の上に記録層2を有し、その上に保護層3を有し、さらにその上に上記記録媒体用潤滑剤からなる潤滑層4を最外層として有する。
In FIG. 1, the magnetic disk of the present invention has a
支持体1の材質としては、アルミニウム合金、ガラス、ポリカーボネート等が挙げられる。記録層2の材質としては、鉄、コバルト、ニッケル等の強磁性体を形成可能な元素にクロム、白金、タンタル等を加えた合金、またはそれらの酸化物が挙げられる。これらは、メッキ法、スパッタ法等で形成される。保護層3の材質としては、ダイアモンドライクカーボン、Si3N4、SiC、SiO2等が挙げられる。これらは、スパッタ法、CVD法等で形成される。Examples of the material for the
潤滑層4は、本発明の記録媒体用潤滑剤を溶剤に溶解し、この溶液を用いて、通常、ディップ法により形成する。溶剤としては、本発明の記録媒体用潤滑剤を溶解するものを使用する。具体的には、フルオロカーボン系の溶剤(例えば、住友スリーエム社製の「PF−5060」、「PF−5080」、「HFE−7100」、「HFE−7200」、デュポン社製の「バートレルXF」)等が挙げられる。 The lubricating layer 4 is usually formed by a dipping method using the recording medium lubricant of the present invention dissolved in a solvent and using this solution. As the solvent, a solvent capable of dissolving the recording medium lubricant of the present invention is used. Specifically, fluorocarbon solvents (for example, “PF-5060”, “PF-5080”, “HFE-7100”, “HFE-7200” manufactured by Sumitomo 3M, “Bertrel XF” manufactured by DuPont) Etc.
本発明の記録媒体用潤滑剤は、記録媒体との付着力が強いので飛散が低減でき、且つ分解しにくい。該潤滑剤を用いて形成された潤滑層を有する磁気ディスクは、高速回転下での連続摺動にも耐えることができ、該磁気ディスクを装着した磁気ディスクドライブは高速での記録/再生が可能になる。 Since the recording medium lubricant of the present invention has a strong adhesion to the recording medium, scattering can be reduced and it is difficult to decompose. A magnetic disk having a lubricating layer formed using the lubricant can withstand continuous sliding under high-speed rotation, and a magnetic disk drive equipped with the magnetic disk can record / reproduce at high speed. become.
1 支持体
2 記録層
3 保護層
4 潤滑層DESCRIPTION OF
以下、実施例によって本発明をより詳細に説明する。 Hereinafter, the present invention will be described in more detail with reference to examples.
実施例1
アルゴン雰囲気下、(株)松村石油研究所製「モレスコホスファロール A20H−2000」22.0g(7.11mmol)、ポタシウム−t−ブトキシド0.1g(0.71mmol)およびt−ブタノール13.0mlを混合し、70℃で30分撹拌した。ポタシウム−t−ブトキシドが溶解した後に、2,3−エポキシ−1−プロパノール0.6g(7.11mmol)を、70℃で撹拌しながら2時間かけて滴下した。滴下終了後、70℃でさらに2時間撹拌した。反応終了後、反応混合液にデュポン社製「バートレルXF」を加えて抽出し、1規定の塩酸とメタノールを混合した水溶液を用いて洗浄した。蒸留により「バートレルXF」を留去して、粘ちょう液体14.0gを得た。Example 1
Under an argon atmosphere, 22.0 g (7.11 mmol) of “Molescophosphalol A20H-2000” manufactured by Matsumura Oil Research Co., Ltd., 0.1 g (0.71 mmol) of potassium-t-butoxide and t-butanol 13. 0 ml was mixed and stirred at 70 ° C. for 30 minutes. After the dissolution of potassium-t-butoxide, 0.6 g (7.11 mmol) of 2,3-epoxy-1-propanol was added dropwise over 2 hours with stirring at 70 ° C. After completion of dropping, the mixture was further stirred at 70 ° C. for 2 hours. After completion of the reaction, the reaction mixture was extracted by adding “Bertrel XF” manufactured by DuPont, and washed with an aqueous solution obtained by mixing 1N hydrochloric acid and methanol. “Bertrel XF” was distilled off by distillation to obtain 14.0 g of a viscous liquid.
得られた粘ちょう液体について、19F−NMR分析と1H−NMR分析を実施し、数平均分子量と組成(重量%)を算出した。数平均分子量は、2929であった。組成を表1に示す。表1において、式(1)の化合物とは、Rがトリフルオロメチル基である上記式(1)で表されるパーフルオロポリエーテル化合物である。式(2)の化合物とは、Rがトリフルオロメチル基である上記式(2)で表されるパーフルオロポリエーテル化合物である。式(3)の化合物とは、Rがトリフルオロメチル基である上記式(3)で表されるパーフルオロポリエーテル化合物である。The obtained viscous liquid was subjected to 19 F-NMR analysis and 1 H-NMR analysis, and the number average molecular weight and composition (% by weight) were calculated. The number average molecular weight was 2929. The composition is shown in Table 1. In Table 1, the compound of the formula (1) is a perfluoropolyether compound represented by the above formula (1) in which R is a trifluoromethyl group. The compound of the formula (2) is a perfluoropolyether compound represented by the above formula (2) in which R is a trifluoromethyl group. The compound of the formula (3) is a perfluoropolyether compound represented by the above formula (3) in which R is a trifluoromethyl group.
以下、19F−NMR分析結果を示す。
19F−NMR(溶媒:なし。基準物質:生成物中のOCF2 CF 2 CF 2CF2Oを−125.8ppmとした。):
δ=−78.6ppm,−80.6ppm
〔2F,Rf-[CF 2CH2-O-P3N3-(OC6H4CF3)5]〕,
δ=−77.8ppm,−79.9ppm
〔2F,Rf-[CF 2CH2-O-CH2CH(OH)CH2OH]〕。Hereafter, a < 19 > F-NMR analysis result is shown.
19 F-NMR (solvent: none. Reference substance: OCF 2 CF 2 CF 2 CF 2 O in the product was set to −125.8 ppm):
δ = −78.6 ppm, −80.6 ppm
[2F, Rf- [CF 2 CH 2 -O-P 3 N 3 - (OC 6 H 4 CF 3) 5] ],
δ = -77.8 ppm, -79.9 ppm
[2F, Rf- [CF 2 CH 2 -O-
1H−NMR分析の前処理として、トリフルオロアセチル化を実施した。手順としては、粘ちょう液体0.2gに10倍量のトリフルオロ無水酢酸2.0gを加え、室温で12時間撹拌した。撹拌終了後、過剰のトリフルオロ無水酢酸を留去してトリフルオロアセチル化体を得た。Trifluoroacetylation was performed as a pretreatment for 1 H-NMR analysis. As a procedure, 2.0 g of 10-fold amount of trifluoroacetic anhydride was added to 0.2 g of viscous liquid, and the mixture was stirred at room temperature for 12 hours. After completion of the stirring, excess trifluoroacetic anhydride was distilled off to obtain a trifluoroacetylated product.
以下、1H−NMR分析結果を示す。
1H−NMR〔トリフルオロアセチル化体〕(溶媒:パーフルオロへキサン。基準物質:重水 D2O):
δ=3.70−4.05ppm
〔4H,Rf-[CF2CH2-O-CH 2CH(OAc)CH 2OAc]〕,
δ=3.70−4.05ppm
〔2H,Rf-[CF2 CH 2-O-P3N3-(OC6H4CF3)5]〕,
δ=4.45−4.70ppm
〔2H,Rf-[CF2 CH 2-O-CH2CH(OAc)CH2OAc]〕,
δ=5.25−5.35ppm
〔1H,Rf-[CF2CH2-O-CH2CH(OAc)CH2OCH2 CH(OAc)CH2OAc]〕,
δ=5.37−5.57ppm
〔1H,Rf-[CF2CH2-O-CH2 CH(OAc)CH2OAc]〕。The results of 1 H-NMR analysis are shown below.
1 H-NMR [trifluoroacetylated compound] (solvent: perfluorohexane, reference substance: heavy water D 2 O):
δ = 3.70-4.05 ppm
[4H, Rf- [CF 2 CH 2 -O-
δ = 3.70-4.05 ppm
[2H, Rf- [CF 2 CH 2 -O-P 3 N 3 - (OC 6 H 4 CF 3) 5] ],
δ = 4.45-4.70 ppm
[2H, Rf- [CF 2 CH 2 -O-
δ = 5.25-5.35 ppm
[1H, Rf- [CF 2 CH 2 -O-
δ = 5.37-5.57 ppm
[1H, Rf- [CF 2 CH 2 -O-
実施例2
アルゴン雰囲気下、(株)松村石油研究所製「モレスコホスファロール A20H−2000」67.0g(0.022mol)、ポタシウム−t−ブトキシド0.3g(0.002mol)およびt−ブタノール30.0mlを混合し、70℃で30分撹拌した。ポタシウム−t−ブトキシドが溶解した後に、2,3−エポキシ−1−プロパノール2.0g(0.022mol)を、70℃で撹拌しながら2時間かけて滴下した。滴下終了後、70℃でさらに2時間撹拌した。反応終了後、反応混合液にデュポン社製「バートレルXF」を加えて抽出し、1規定の塩酸とメタノールを混合した水溶液を用いて洗浄した。蒸留により「バートレルXF」を留去した後に、超臨界炭酸抽出法により精製を行い、粘ちょう液体22.3gを得た。Example 2
Under an argon atmosphere, 67.0 g (0.022 mol) of “Molecophospharol A20H-2000” manufactured by Matsumura Oil Research Co., Ltd., 0.3 g (0.002 mol) of potassium-t-butoxide and 30. 0 ml was mixed and stirred at 70 ° C. for 30 minutes. After the dissolution of potassium t-butoxide, 2.0 g (0.022 mol) of 2,3-epoxy-1-propanol was added dropwise over 2 hours with stirring at 70 ° C. After completion of dropping, the mixture was further stirred at 70 ° C. for 2 hours. After completion of the reaction, the reaction mixture was extracted by adding “Bertrel XF” manufactured by DuPont, and washed with an aqueous solution obtained by mixing 1N hydrochloric acid and methanol. After distilling off “Bertrel XF” by distillation, purification was performed by supercritical carbonic acid extraction to obtain 22.3 g of viscous liquid.
得られた粘ちょう液体について、19F−NMR分析と1H−NMR分析を実施し、数平均分子量と組成(重量%)を算出した。数平均分子量は、3130であった。組成を表2に示す。表2において、式(1)の化合物、式(2)の化合物および式(3)の化合物は、それぞれ表1と同様である。The obtained viscous liquid was subjected to 19 F-NMR analysis and 1 H-NMR analysis, and the number average molecular weight and composition (% by weight) were calculated. The number average molecular weight was 3130. The composition is shown in Table 2. In Table 2, the compound of formula (1), the compound of formula (2) and the compound of formula (3) are the same as in Table 1.
NMR分析の化学シフトは、実施例1と同様であった。 The chemical shift of NMR analysis was the same as in Example 1.
実施例1および2で得られた粘ちょう液体(潤滑剤)について、ボンド率の測定およびアルミナに対する耐分解性試験を行った。 About the viscous liquid (lubricant) obtained in Examples 1 and 2, the bond rate was measured and the decomposition resistance test for alumina was performed.
[ボンド率の測定]
実施例1および2で得られた粘ちょう液体(潤滑剤)をデュポン社製「バートレルXF」に溶解させ、各潤滑剤溶液(0.1重量%)を調製した。直径2.5インチのガラスメディア磁気ディスクを潤滑剤溶液に1分間浸漬し、速度2mm/sで引き上げて潤滑剤を塗布した後、100℃の恒温槽にこの磁気ディスクを20分間入れて加熱した。エリプソメーターでディスク上の潤滑剤の膜厚を測定した(この膜厚をeÅとする)。次に、このディスクを「バートレルXF」に10分間浸漬し、速度10mm/sで引き上げて、付着していない潤滑剤を洗浄した。ディスク上に残った潤滑剤の膜厚をエリプソメーターで測定した(この膜厚をfÅとする)。ディスクへの付着性の強弱を、下記式で表されるボンド率を用いて評価した。結果を表3に示す。[Measurement of bond rate]
The viscous liquid (lubricant) obtained in Examples 1 and 2 was dissolved in “Bertrel XF” manufactured by DuPont to prepare each lubricant solution (0.1 wt%). A glass media magnetic disk having a diameter of 2.5 inches was immersed in a lubricant solution for 1 minute, pulled up at a speed of 2 mm / s and coated with a lubricant, and then the magnetic disk was placed in a thermostat at 100 ° C. for 20 minutes and heated. . The film thickness of the lubricant on the disk was measured with an ellipsometer (this film thickness is defined as eÅ). Next, this disk was immersed in “Bertrel XF” for 10 minutes and pulled up at a speed of 10 mm / s to wash away any lubricant that had not adhered. The film thickness of the lubricant remaining on the disk was measured with an ellipsometer (this film thickness is defined as fÅ). The strength of adhesion to the disk was evaluated using the bond rate represented by the following formula. The results are shown in Table 3.
ボンド率(%)=100×f/e
なお、実施例1および2で得られた粘ちょう液体(潤滑剤)に含まれている式(1)の化合物、式(2)の化合物および式(3)の化合物のうち、式(3)の化合物は上記洗浄により除去される。そのため、ディスク上には付着力の強い式(1)の化合物および式(2)の化合物が残る。Bond rate (%) = 100 × f / e
Of the compound of formula (1), the compound of formula (2) and the compound of formula (3) contained in the viscous liquid (lubricant) obtained in Examples 1 and 2, formula (3) Are removed by the above washing. Therefore, the compound of the formula (1) and the compound of the formula (2) having strong adhesive force remain on the disk.
比較のために、パーフルオロポリーテル化合物として、(株)松村石油研究所製「モレスコホスファロール A20H−2000」、ソルベイ社製「Zdol−4000」および「Z−Tetraol−2000S」について、同様の方法でボンド率を測定した。結果を表3に示す。 For comparison, as perfluoropolyter compounds, the same applies to “Molecophospharol A20H-2000” manufactured by Matsumura Oil Research Co., Ltd., “Zdol-4000” and “Z-Tetraol-2000S” manufactured by Solvay. The bond ratio was measured by the method described above. The results are shown in Table 3.
表3から、実施例1および2で得られた粘ちょう液体(潤滑剤)が、磁気ディスクと強く付着した潤滑層を形成できることが確認された。このことにより潤滑剤の飛散低減効果が期待できる。 From Table 3, it was confirmed that the viscous liquid (lubricant) obtained in Examples 1 and 2 can form a lubricating layer that adheres strongly to the magnetic disk. As a result, an effect of reducing the scattering of the lubricant can be expected.
[アルミナに対する耐分解性試験]
実施例1および2で得られた粘ちょう液体(潤滑剤)、ならびに、(株)松村石油研究所製「モレスコホスファロール A20H−2000」、ソルベイ社製「Zdol−4000」および「Z−Tetraol−2000S」の各々に、アルミナ粉末(平均粒子径100μm)を20重量%となるように添加し、振とう器を用いて15分以上混合した。均一に混合した試料について、加熱による耐分解性試験を熱分析装置(TG/DTA)を用いて実施した。試験は、アルミナを混合した試料と混合しなかった試料をアルミニウム容器に秤量し、窒素雰囲気下、250℃の温度で加熱して行い、試料の重量減少率を計測した。その結果を表4に示す。[Decomposition resistance test for alumina]
The viscous liquid (lubricant) obtained in Examples 1 and 2, and "Moleco Phosphorol A20H-2000" manufactured by Matsumura Oil Research Co., Ltd., "Zdol-4000" and "Z-" manufactured by Solvay To each of “Tetolaol-2000S”, alumina powder (average particle size of 100 μm) was added to 20 wt%, and mixed for 15 minutes or more using a shaker. About the sample mixed uniformly, the decomposition resistance test by heating was implemented using the thermal-analysis apparatus (TG / DTA). In the test, a sample mixed with alumina and a sample not mixed were weighed in an aluminum container and heated at a temperature of 250 ° C. in a nitrogen atmosphere, and the weight reduction rate of the sample was measured. The results are shown in Table 4.
表4から、実施例1および2で得られた粘ちょう液体(潤滑剤)が、アルミナに対する耐分解性に優れていることが確認された。 From Table 4, it was confirmed that the viscous liquid (lubricant) obtained in Examples 1 and 2 was excellent in decomposition resistance against alumina.
実施例3
実施例1で得られた粘ちょう液体(潤滑剤)をデュポン社製「バートレルXF」に溶解させ、潤滑剤溶液(0.1重量%)を調製した。支持体、記録層および保護層からなる直径2.5インチのガラスメディア磁気ディスクを潤滑剤溶液に1分間浸漬し、速度2mm/sで引き上げて潤滑剤を塗布した後に、100℃の恒温槽にこの磁気ディスクを20分間入れて加熱した。次に、このディスクを「バートレルXF」に10分間浸漬し、速度10mm/sで引き上げて、洗浄した。ディスク上に残った潤滑剤の膜厚をエリプソメーターで測定した。潤滑剤の膜厚は4.9Åであった。Example 3
The viscous liquid (lubricant) obtained in Example 1 was dissolved in “Bertrel XF” manufactured by DuPont to prepare a lubricant solution (0.1 wt%). A glass media magnetic disk having a diameter of 2.5 inches composed of a support, a recording layer, and a protective layer is immersed in a lubricant solution for 1 minute, pulled up at a speed of 2 mm / s, applied with a lubricant, and then placed in a constant temperature bath at 100 ° C. The magnetic disk was put in for 20 minutes and heated. Next, this disk was immersed in “Bertrel XF” for 10 minutes, and was pulled up at a speed of 10 mm / s to be cleaned. The film thickness of the lubricant remaining on the disk was measured with an ellipsometer. The film thickness of the lubricant was 4.9 mm.
Claims (2)
R1-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2-R2 (1)
〔式中、R1は
R1-CH2CF2O-(CF2CF2O)m-(CF2O)n-CF2CH2-R3 (2)
〔式中、R1、mおよびnは前記と同様であり、R3は-OCH2CH(OH)CH2OCH2CH(OH)CH2OHを示す。〕で表されるパーフルオロポリエーテル化合物を含有する記録媒体用潤滑剤。Formula (1);
R 1 —CH 2 CF 2 O— (CF 2 CF 2 O) m — (CF 2 O) n —CF 2 CH 2 —R 2 (1)
[Wherein R 1 is
R 1 —CH 2 CF 2 O— (CF 2 CF 2 O) m — (CF 2 O) n —CF 2 CH 2 —R 3 (2)
[Wherein, R 1 , m and n are the same as defined above, and R 3 represents —OCH 2 CH (OH) CH 2 OCH 2 CH (OH) CH 2 OH]. ] The lubricant for recording media containing the perfluoropolyether compound represented by this.
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JP2004240118 | 2004-07-23 | ||
JP2004240118 | 2004-07-23 | ||
PCT/JP2005/012997 WO2006009057A1 (en) | 2004-07-23 | 2005-07-14 | Lubricant for recording medium and magnetic disk |
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US (1) | US7670695B2 (en) |
JP (1) | JP4570622B2 (en) |
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Cited By (2)
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WO2015087615A1 (en) | 2013-12-09 | 2015-06-18 | 株式会社Moresco | Fluoropolyether compound, and lubricant and magnetic disc comprising same |
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Families Citing this family (27)
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JP2009542805A (en) * | 2006-07-13 | 2009-12-03 | エージェンシー フォー サイエンス, テクノロジー アンド リサーチ | Phosphazene compounds, lubricants and magnetic recording media having such compounds, preparation methods, and lubrication methods |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000260017A (en) * | 1999-01-07 | 2000-09-22 | Fuji Electric Co Ltd | Magnetic recording medium and production of magnetic recording medium |
JP2003217110A (en) * | 2002-01-22 | 2003-07-31 | Hitachi Ltd | Magnetic disk and magnetic disk device |
JP2003288715A (en) * | 2002-03-28 | 2003-10-10 | Hitachi Ltd | Magnetic disc medium and magnetic disc drive |
JP2004152460A (en) * | 2002-09-03 | 2004-05-27 | Hoya Corp | Magnetic disk and process for manufacturing method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001021630A1 (en) * | 1999-09-21 | 2001-03-29 | Matsumura Oil Research Corp. | Phosphazene compounds and lubricants containing the same |
JP4146605B2 (en) | 2000-05-22 | 2008-09-10 | 株式会社日立グローバルストレージテクノロジーズ | Magnetic recording medium |
WO2004031261A1 (en) | 2002-10-01 | 2004-04-15 | Matsumura Oil Research Corp. | Perfluoropolyether compound and lubricant and magnetic disk using same |
US7579304B2 (en) * | 2005-04-12 | 2009-08-25 | Seagate Technology Llc | Thin film lubricant for advanced tribological performance of storage medium |
-
2005
- 2005-07-14 CN CNA2005800249314A patent/CN1989228A/en active Pending
- 2005-07-14 WO PCT/JP2005/012997 patent/WO2006009057A1/en active Application Filing
- 2005-07-14 JP JP2006529111A patent/JP4570622B2/en not_active Expired - Fee Related
- 2005-07-14 US US11/628,158 patent/US7670695B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000260017A (en) * | 1999-01-07 | 2000-09-22 | Fuji Electric Co Ltd | Magnetic recording medium and production of magnetic recording medium |
JP2003217110A (en) * | 2002-01-22 | 2003-07-31 | Hitachi Ltd | Magnetic disk and magnetic disk device |
JP2003288715A (en) * | 2002-03-28 | 2003-10-10 | Hitachi Ltd | Magnetic disc medium and magnetic disc drive |
JP2004152460A (en) * | 2002-09-03 | 2004-05-27 | Hoya Corp | Magnetic disk and process for manufacturing method |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015087615A1 (en) | 2013-12-09 | 2015-06-18 | 株式会社Moresco | Fluoropolyether compound, and lubricant and magnetic disc comprising same |
WO2015087596A1 (en) | 2013-12-09 | 2015-06-18 | 株式会社Moresco | Fluoropolyether compound, and lubricant and magnetic disc using same |
US9928865B2 (en) | 2013-12-09 | 2018-03-27 | Moresco Corporation | Fluoropolyether compound, and lubricant and magnetic disc using same |
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US20080020171A1 (en) | 2008-01-24 |
JPWO2006009057A1 (en) | 2008-05-01 |
WO2006009057A1 (en) | 2006-01-26 |
US7670695B2 (en) | 2010-03-02 |
CN1989228A (en) | 2007-06-27 |
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