JP4541791B2 - Manufacturing method of cutting wheel - Google Patents

Manufacturing method of cutting wheel Download PDF

Info

Publication number
JP4541791B2
JP4541791B2 JP2004212911A JP2004212911A JP4541791B2 JP 4541791 B2 JP4541791 B2 JP 4541791B2 JP 2004212911 A JP2004212911 A JP 2004212911A JP 2004212911 A JP2004212911 A JP 2004212911A JP 4541791 B2 JP4541791 B2 JP 4541791B2
Authority
JP
Japan
Prior art keywords
base
blade
cutting
outer peripheral
ring surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2004212911A
Other languages
Japanese (ja)
Other versions
JP2006026868A (en
Inventor
豊 狛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Priority to JP2004212911A priority Critical patent/JP4541791B2/en
Publication of JP2006026868A publication Critical patent/JP2006026868A/en
Application granted granted Critical
Publication of JP4541791B2 publication Critical patent/JP4541791B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Dicing (AREA)

Description

本発明は、電鋳ブレードを備えた切削砥石の製造方法に関するものである。   The present invention relates to a method for manufacturing a cutting grindstone provided with an electroformed blade.

半導体ウェーハ等の被切削物を切削して個々のデバイス等に分割する際には、スピンドルに装着された切削砥石が高速回転しながら被切削物に切り込む構成の切削装置が通常用いられる。そして、切削砥石としては、スピンドルに対する着脱が容易なことから、基台の片面に電鋳ブレードが固着され、基台の外周側から電鋳ブレードの外周部が突出した構成のハブブレードが一般的に用いられている(例えば特許文献1、特許文献2参照)。   When a workpiece such as a semiconductor wafer is cut and divided into individual devices or the like, a cutting apparatus configured to cut a cutting grindstone mounted on a spindle into the workpiece while rotating at high speed is usually used. As a cutting grindstone, a hub blade having a configuration in which an electroformed blade is fixed to one surface of a base and the outer peripheral portion of the electroformed blade protrudes from the outer peripheral side of the base because it can be easily attached to and detached from the spindle. (See, for example, Patent Document 1 and Patent Document 2).

特開平09−314465号公報JP 09-314465 A 特開平05−345281号公報JP 05-345281 A

しかしながら、上述のように、ハブブレードは基台の片面に電鋳ブレードが固着された構造であるため、切削時に例えば20000rpm〜40000rpmの回転速度で高速回転すると、遠心力によって電鋳ブレードが基台側に傾き、これが原因となって電鋳ブレードが被切削物に斜めに切り込み、高精度な切削ができないという問題がある。   However, as described above, the hub blade has a structure in which the electroformed blade is fixed to one side of the base. Therefore, when the blade is rotated at a high speed of, for example, 20000 rpm to 40000 rpm during cutting, the electroformed blade is There is a problem that the electroformed blade is obliquely cut into the workpiece due to the inclination to the side, and high-precision cutting cannot be performed.

また、切削砥石が装着されるスピンドルに超音波振動子を装着し、スピンドルに超音波振動を与えて基台において超音波による振動の方向を変換して電鋳ブレードの直径方向に振動を伝達することにより、被切削物を効率良く切削する技術を用いる場合には、超音波の伝達方向の変換点が電鋳ブレードの回転中心に合致しないために、超音波振動が電鋳ブレードに充分に伝達されないという問題がある。   In addition, an ultrasonic vibrator is mounted on the spindle on which the cutting wheel is mounted, and the vibration is transmitted to the diameter direction of the electroformed blade by applying ultrasonic vibration to the spindle and changing the direction of vibration by the ultrasonic wave at the base. Therefore, when using the technology to cut the work efficiently, the ultrasonic vibration is sufficiently transmitted to the electroforming blade because the conversion point of the ultrasonic transmission direction does not match the rotation center of the electroforming blade. There is a problem that it is not.

そこで、本発明が解決しようとする課題は、切削砥石において、高速回転時に電鋳ブレードが傾くことがないようにすると共に、超音波振動を用いた切削を行う場合には超音波振動を電鋳ブレードに十分に伝達できるようにすることである。   Therefore, the problem to be solved by the present invention is to prevent the electroforming blade from tilting during high-speed rotation in the cutting grindstone, and to perform ultrasonic vibration when performing cutting using ultrasonic vibration. It is to be able to fully communicate to the blade.

本発明に係る切削砥石の製造方法は、電着ブレードを基台に固着して切削砥石とする切削砥石の製造方法であって、底面の外径が異なる2つの円錐台形の底面同士が対面し、対面部位から外径が大きい方の底面が外周側に突出してリング面が形成された形状を少なくとも有する基台のリング面以外の面にマスキングを施すマスキング工程と、マスキング工程後の基台をめっき液槽に浸漬し、リング面に砥粒を電着させて電鋳ブレードを形成する電着工程と、基台をめっき浴槽から取り出しリング面を除去して基台が同型の2つの円錐台形の底面同士が対面し、対面部位の外周部に突出外周部が形成された形状を少なくとも有するように電着ブレードを露出させるリング面除去工程とから少なくとも構成されることを特徴とする。 The method for producing a cutting grindstone according to the present invention is a method for producing a cutting grindstone in which an electrodeposition blade is fixed to a base to form a cutting grindstone, wherein two frustoconical bottoms having different bottom diameters face each other. The masking step of masking the surface other than the ring surface of the base having at least the shape in which the bottom surface with the larger outer diameter protrudes from the facing part to the outer peripheral side and the ring surface is formed, and the base after the masking step was immersed in a plating solution tank, two frustoconical and electrodeposition step of forming the electroformed blade by electrodepositing abrasive grains to the ring plane, the base to remove the ring face removed base from the plating bath is isomorphic And a ring surface removing step of exposing the electrodeposition blade so as to have at least a shape in which a protruding outer peripheral portion is formed on the outer peripheral portion of the facing portion .

本発明に係る切削砥石の製造方法は、底面の外径が異なる2つの円錐台形の底面同士が対面し、対面部位から外径が大きい方の底面が外周側に突出してリング面が形成された形状を少なくとも有する基台のリング面に電鋳ブレードを固着した後に電鋳ブレードを露出させるため、同型の2つの円錐台形の底面同士が対面し、対面部位の外周部に突出外周部が形成された形状を少なくとも有し、回転時の遠心力のバランスが良く、高速回転時にも傾斜することがない切削砥石の製造に好適であIn the method for manufacturing a cutting grindstone according to the present invention, two frustoconical bottom surfaces having different bottom surface diameters face each other, and a bottom surface having a larger outer diameter projects from the facing part to the outer peripheral side to form a ring surface. In order to expose the electroformed blade after fixing the electroformed blade to the ring surface of the base having at least the shape, the two bottom surfaces of the same truncated cone face each other, and a protruding outer peripheral portion is formed on the outer peripheral portion of the facing portion. shape having at least a good balance of the centrifugal force during rotation, Ru preferably der for the manufacture of the cutting grindstone is not inclined even during high-speed rotation.

図1及び図2に示す基台1においては、底面の外径が異なる2つの円錐台形の底面同士が対面し、対面部位から外径が大きい方の底面が外周側に突出した部分にリング面10が形成されている。ここにいう底面とは、円錐台形を構成する2つの平面である上面及び下面のうち、外径が大きい方の面を意味する。また、2つの円錐台形の高さ(厚さ)は同一であることが好ましいが、高さが異なっていても、エッチング等によって最終的に高さが同一になるようにすればよい。   In the base 1 shown in FIGS. 1 and 2, two frustoconical bottoms having different bottom surface diameters face each other, and a ring surface is formed at a portion where the bottom surface having a larger outer diameter projects from the facing part to the outer peripheral side. 10 is formed. The term “bottom surface” as used herein means a surface having a larger outer diameter among the upper surface and the lower surface, which are two planes constituting a truncated cone. The two frustoconical shapes preferably have the same height (thickness), but even if the heights are different, the heights may be finally made equal by etching or the like.

基台1においては、2つの円錐台形の上面から、それぞれが互いに離れる方向に円筒状に延伸させた外径の等しい2つの円筒部11、12が形成され、リング面10の内周と円筒部11の外周面とは第一のテーパ面13によって連結され、リング面10の外周と円筒部12の外周面とは第二のテーパ面14によって連結されている。また、基台1には、円筒部11、12及び2つの円錐台形の内部を貫通し、後述するスピンドルに装着するための被装着孔15が形成されており、全体として一体に形成されている。なお、円筒部11、12は必ずしも本発明に必須のものではない。   In the base 1, two cylindrical portions 11 and 12 having the same outer diameter are formed by extending cylindrically in directions away from each other from the upper surfaces of the two truncated cones, and the inner periphery and the cylindrical portion of the ring surface 10. 11 is connected by a first taper surface 13, and the outer periphery of the ring surface 10 and the outer periphery of the cylindrical portion 12 are connected by a second taper surface 14. Further, the base 1 is formed with a mounting hole 15 that passes through the inside of the cylindrical portions 11 and 12 and the two truncated cones and is mounted on a spindle described later, and is integrally formed as a whole. . The cylindrical portions 11 and 12 are not necessarily essential to the present invention.

図3及び図4に示すように、この基台1のリング面10以外の面にマスキング16を施す(マスキング工程)。なお、図示の例のように、第一のテーパ面13の上端にもマスキングを施さない領域を設けることが望ましい。   As shown in FIGS. 3 and 4, masking 16 is applied to a surface other than the ring surface 10 of the base 1 (masking process). It should be noted that it is desirable to provide a region where no masking is performed on the upper end of the first tapered surface 13 as in the illustrated example.

次に、図5に示すように、マスキング16を施した基台1を、リング面10が上を向いた状態でめっき液槽20に浸漬する。めっき液槽20には、硫酸ニッケル等のめっき液21が収容されており、めっき液21には例えばダイヤモンド砥粒22が混入されている。   Next, as shown in FIG. 5, the base 1 to which the masking 16 is applied is immersed in the plating solution tank 20 with the ring surface 10 facing upward. A plating solution 21 such as nickel sulfate is accommodated in the plating solution tank 20, and diamond abrasive grains 22 are mixed in the plating solution 21, for example.

めっき液21にはめっき金属、例えばニッケル棒23が浸漬している。ニッケル棒23には直流電源24のプラス電極が接続されており、直流電源24のマイナス電極は、スイッチ25を介してめっき液21に浸漬した基台1に接続されている。また、めっき液槽20には、めっき液21を撹拌する撹拌器26を備えている。   A plating metal such as a nickel rod 23 is immersed in the plating solution 21. A positive electrode of a DC power supply 24 is connected to the nickel rod 23, and a negative electrode of the DC power supply 24 is connected to the base 1 immersed in the plating solution 21 through a switch 25. The plating solution tank 20 is provided with a stirrer 26 for stirring the plating solution 21.

リング面10が上を向いた状態で基台1を浸漬させ、スイッチ25をオフにした状態で撹拌器26によってめっき液21を撹拌させる。そして、撹拌を中止してダイヤモンド砥粒22を沈降させると共に、スイッチ25をオンにする。そうすると、沈降したダイヤモンド砥粒22がリング面10において受け止められて堆積すると共に、直流電源24から供給される電圧により成長するニッケルめっき層によって、堆積したダイヤモンド砥粒22が電着固定され、図6に示すように、所定厚さの電鋳ブレード17が形成される(電着工程)。   The base 1 is immersed with the ring surface 10 facing upward, and the plating solution 21 is stirred by the stirrer 26 with the switch 25 turned off. Then, the stirring is stopped and the diamond abrasive grains 22 are allowed to settle, and the switch 25 is turned on. Then, the settled diamond abrasive grains 22 are received and deposited on the ring surface 10, and the deposited diamond abrasive grains 22 are electrodeposited and fixed by the nickel plating layer grown by the voltage supplied from the DC power source 24. FIG. As shown in FIG. 2, an electroformed blade 17 having a predetermined thickness is formed (electrodeposition process).

次に、図7に示すように、マスキング16を除去すると共に、第二のテーパ面14を、図7において二点鎖線で示した第三のテーパ面18までNaOH等によってエッチング除去することにより、電鋳ブレード17を露出させる。このようにして電鋳ブレード17が露出した状態を図8及び図9に示す。第三のテーパ面18までエッチングすることによりリング面10が除去され、電着ブレード17の両面が露出した状態となる(リング面除去工程)。   Next, as shown in FIG. 7, the masking 16 is removed, and the second taper surface 14 is etched away to the third taper surface 18 shown by a two-dot chain line in FIG. The electroformed blade 17 is exposed. The state where the electroformed blade 17 is exposed in this manner is shown in FIGS. The ring surface 10 is removed by etching to the third taper surface 18, and both surfaces of the electrodeposition blade 17 are exposed (ring surface removal step).

図9に示すように、第二のテーパ面14を第三のテーパ面18までエッチングすることにより、第一のテーパ面13と第三のテーパ面18とは傾斜角度が等しくなり、第一のテーパ面13と第三のテーパ面18とが連結される部位に突出外周部19が形成される。そして、基台1の形状は、突出外周部19を基準として左右対称となり、基台1と電鋳ブレード17とで切削砥石30が構成される。すなわちこの切削砥石30は、同型の2つの円錐台形の底面同士が対面し、対面部位の外周部に突出外周部19が形成された形状を有する基台1と、突出外周部19から外周側に突出して固着された電鋳ブレード17とを備えている。   As shown in FIG. 9, by etching the second tapered surface 14 up to the third tapered surface 18, the first tapered surface 13 and the third tapered surface 18 have the same inclination angle, A protruding outer peripheral portion 19 is formed at a portion where the tapered surface 13 and the third tapered surface 18 are connected. The shape of the base 1 is symmetric with respect to the projecting outer peripheral portion 19, and the base 1 and the electroformed blade 17 constitute a cutting grindstone 30. That is, this cutting grindstone 30 has two bases of the same truncated cone shape facing each other and a base 1 having a shape in which a protruding outer peripheral portion 19 is formed on the outer peripheral portion of the facing portion, and the protruding outer peripheral portion 19 toward the outer peripheral side. And an electroformed blade 17 fixedly protruding.

このようにして基台1に電鋳ブレード17が固着された構成の切削砥石30は、例えば図10に示すスピンドル41に装着される。このスピンドル41はハウジング42によって回転可能に支持されており、スピンドル41には切削砥石30を受け止めるマウント壁43が形成されている。切削砥石30の被装着孔15をスピンドル41に挿入してマウント壁43に当接させ、フランジ44をスピンドル41の先端部に螺合させて固定すると、切削工具40となる。   Thus, the cutting grindstone 30 having the configuration in which the electroformed blade 17 is fixed to the base 1 is mounted on, for example, the spindle 41 shown in FIG. The spindle 41 is rotatably supported by a housing 42, and a mount wall 43 that receives the cutting grindstone 30 is formed on the spindle 41. When the mounting hole 15 of the cutting grindstone 30 is inserted into the spindle 41 and brought into contact with the mount wall 43, and the flange 44 is screwed and fixed to the tip of the spindle 41, the cutting tool 40 is obtained.

そして、この切削工具40は、例えば図11に示す切削装置50に搭載される。この切削装置50は、カセット51に収容された板状物を仮置き領域52に搬出すると共に仮置き領域52に載置された板状物をカセット51に収容する役割を有する搬出入手段53と、切削対象の板状物を保持するチャックテーブル54と、仮置き領域52に搬出された板状物をチャックテーブル54に搬送する搬送手段55と、板状物の切削すべき位置を検出するアライメント手段56と、その位置を切削する切削工具40とから構成される。なお、図11における切削工具40においては、切削砥石30等がカバー部材により覆われている。   And this cutting tool 40 is mounted in the cutting apparatus 50 shown, for example in FIG. The cutting device 50 includes a loading / unloading means 53 having a role of carrying the plate-like object accommodated in the cassette 51 into the temporary placement area 52 and accommodating the plate-like object placed in the temporary placement area 52 in the cassette 51. , A chuck table 54 that holds a plate-like object to be cut, a conveying means 55 that conveys the plate-like object carried to the temporary placement region 52 to the chuck table 54, and an alignment that detects a position of the plate-like object to be cut. It comprises means 56 and a cutting tool 40 for cutting the position. In addition, in the cutting tool 40 in FIG. 11, the cutting grindstone 30 etc. are covered with the cover member.

例えば粘着テープTを介してフレームFと一体となったウェーハWがチャックテーブル54において保持されると、チャックテーブル54が+X方向に移動してアライメント手段56の直下に位置付けられ、ウェーハWの表面が撮像されて切削すべき位置が検出された後、更にチャックテーブル54が+X方向に移動し、図12に示すように、切削砥石30の作用を受けて切削が行われる。切削の際には、ノズル45から切削水45aが噴出される。   For example, when the wafer W integrated with the frame F is held on the chuck table 54 via the adhesive tape T, the chuck table 54 moves in the + X direction and is positioned immediately below the alignment means 56, so that the surface of the wafer W is After the image is picked up and the position to be cut is detected, the chuck table 54 is further moved in the + X direction, and cutting is performed under the action of the cutting grindstone 30 as shown in FIG. At the time of cutting, cutting water 45 a is ejected from the nozzle 45.

図13に示すように、切削工具40においては、スピンドル41に超音波振動子46が装着される場合がある。この場合は、超音波振動子46からスピンドル41の軸心方向に伝達された超音波47は、切削砥石30を構成する基台1に伝達され、基台1の中心部1aにおいて伝達方向が垂直方向に変換され、電鋳ブレード17にも伝達される。すなわち、基台1は、超音波の振動方向を変換する振動変換部として機能する。そして、切削砥石30が高速回転しながらウェーハWに切り込むと共に、電鋳ブレード17に伝達される超音波による超音波振動によっても切削が行われる。   As shown in FIG. 13, in the cutting tool 40, an ultrasonic transducer 46 may be attached to the spindle 41. In this case, the ultrasonic wave 47 transmitted from the ultrasonic transducer 46 in the axial direction of the spindle 41 is transmitted to the base 1 constituting the cutting grindstone 30, and the transmission direction is vertical at the central portion 1 a of the base 1. The direction is converted and transmitted to the electroformed blade 17. That is, the base 1 functions as a vibration conversion unit that converts the vibration direction of the ultrasonic waves. Then, the cutting grindstone 30 is cut into the wafer W while rotating at a high speed, and the cutting is also performed by ultrasonic vibration by ultrasonic waves transmitted to the electroformed blade 17.

このようにして行われる切削の際には、基台1が突出外周部19を基準としてスピンドル方向に左右対称に形成されているため、切削砥石30が高速回転する際の遠心力のバランスが良く、電鋳ブレード17が傾斜することがない。したがって、電鋳ブレード17がウェーハWに対して斜めに切り込むことがないため、切削を高精度に行うことができる。   When cutting is performed in this manner, since the base 1 is formed symmetrically in the spindle direction with respect to the protruding outer peripheral portion 19, the balance of centrifugal force when the cutting grindstone 30 rotates at high speed is good. The electroformed blade 17 does not tilt. Therefore, since the electroformed blade 17 does not cut obliquely with respect to the wafer W, cutting can be performed with high accuracy.

また、基台1が対称形に形成されているため、スピンドルに超音波振動が与えられてその超音波の伝達方向が基台において変換される際に、変換点となる中心部1aが電鋳ブレード17の回転中心に合致し、超音波が電鋳ブレード17に十分に伝達され、板状物をより効率良く切削することができる。   In addition, since the base 1 is formed symmetrically, when ultrasonic vibration is applied to the spindle and the transmission direction of the ultrasonic wave is converted in the base, the central portion 1a serving as a conversion point is electroformed. It coincides with the rotation center of the blade 17 and the ultrasonic wave is sufficiently transmitted to the electroformed blade 17, so that the plate-like object can be cut more efficiently.

底面の外径が異なる2つの円錐台形の底面同士が対面した形状の基台を示す斜視図である。It is a perspective view which shows the base of the shape where the bottom surfaces of two truncated cone shapes from which the outer diameter of a bottom face differs faced each other. 同基台を示す側面図である。It is a side view which shows the base. 同基台にマスキングを施した状態を示す斜視図である。It is a perspective view which shows the state which masked the base. 同基台にマスキングを施した状態を示す断面図である。It is sectional drawing which shows the state which masked the base. 電着工程の一例を示す略示的断面図である。It is a schematic sectional drawing which shows an example of an electrodeposition process. 基台に電鋳ブレードが電着された状態を示す断面図である。It is sectional drawing which shows the state by which the electrocasting blade was electrodeposited to the base. 基台からマスキングを除去した状態を示す断面図である。It is sectional drawing which shows the state which removed the masking from the base. 基台の一部を除去して左右対称とした状態を示す斜視図である。It is a perspective view which shows the state which removed some bases and was made into the left-right symmetry. 基台の一部を除去して左右対称とした状態を示す断面図である。It is sectional drawing which shows the state which removed the base and made it left-right symmetric. 切削工具の構成の一例を示す斜視図である。It is a perspective view which shows an example of a structure of a cutting tool. 切削装置の一例を示す斜視図である。It is a perspective view which shows an example of a cutting device. 切削工具を用いてウェーハを切削する様子を示す斜視図である。It is a perspective view which shows a mode that a wafer is cut using a cutting tool. 切削工具において超音波が伝達される様子を示す説明図である。It is explanatory drawing which shows a mode that an ultrasonic wave is transmitted in a cutting tool.

1:基台
10:基台 11、12:円筒部 13:第一のテーパ面 14:第二のテーパ面
15:被装着孔 16:マスキング 17:電鋳ブレード 18:第三のテーパ面
19:突出外周部
20:めっき浴槽 21:めっき液 22:ダイヤモンド砥粒 23:ニッケル棒
24:直流電源 25:スイッチ 26:撹拌器
30:切削砥石
40:切削工具 41:スピンドル 42:ハウジング 43:マウント壁
44:フランジ 45:ノズル 46:超音波振動子 47:超音波
50:切削装置 51:カセット 52:仮置き領域 53:搬出入手段
54:チャックテーブル 55:搬送手段 56:アライメント手段
1: base 10: base 11, 12: cylindrical portion 13: first tapered surface 14: second tapered surface 15: mounting hole 16: masking 17: electroformed blade 18: third tapered surface 19: Protruding outer peripheral portion 20: Plating bath 21: Plating solution 22: Diamond abrasive grains 23: Nickel rod 24: DC power supply 25: Switch 26: Stirrer 30: Cutting grindstone 40: Cutting tool 41: Spindle 42: Housing 43: Mount wall 44 : Flange 45: Nozzle 46: Ultrasonic vibrator 47: Ultrasonic 50: Cutting device 51: Cassette 52: Temporary placement area 53: Carrying in / out means 54: Chuck table 55: Carrying means 56: Alignment means

Claims (1)

電着ブレードを基台に固着して切削砥石とする切削砥石の製造方法であって、
底面の外径が異なる2つの円錐台形の底面同士が対面し、該対面部位から外径が大きい方の底面が外周側に突出してリング面が形成された形状を少なくとも有する基台の該リング面以外の面にマスキングを施すマスキング工程と、
該マスキング工程後の基台をめっき液槽に浸漬し、該リング面に砥粒を電着させて電鋳ブレードを形成する電着工程と、
該基台をめっき浴槽から取り出し、該リング面を除去して基台が同型の2つの円錐台形の底面同士が対面し、対面部位の外周部に突出外周部が形成された形状を少なくとも有するように該電着ブレードを露出させるリング面除去工程とから少なくとも構成される切削砥石の製造方法。
A method for manufacturing a cutting grindstone, in which an electrodeposition blade is fixed to a base and used as a cutting grindstone,
The ring surface of the base having at least a shape in which two frustoconical bottom surfaces with different outer diameters of the bottom surfaces face each other, and a bottom surface with a larger outer diameter protrudes from the facing portion to the outer peripheral side. A masking process for masking other surfaces,
An electrodeposition step of immersing the base after the masking step in a plating solution tank, and electrodepositing abrasive grains on the ring surface to form an electroformed blade;
The base is removed from the plating bath, and the ring surface is removed so that the bottoms of the two truncated cones of the same type face each other, and the outer peripheral part of the facing part has a protruding outer peripheral part. A method for producing a cutting grindstone comprising at least a ring surface removing step of exposing the electrodeposition blade.
JP2004212911A 2004-07-21 2004-07-21 Manufacturing method of cutting wheel Active JP4541791B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004212911A JP4541791B2 (en) 2004-07-21 2004-07-21 Manufacturing method of cutting wheel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004212911A JP4541791B2 (en) 2004-07-21 2004-07-21 Manufacturing method of cutting wheel

Publications (2)

Publication Number Publication Date
JP2006026868A JP2006026868A (en) 2006-02-02
JP4541791B2 true JP4541791B2 (en) 2010-09-08

Family

ID=35893796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004212911A Active JP4541791B2 (en) 2004-07-21 2004-07-21 Manufacturing method of cutting wheel

Country Status (1)

Country Link
JP (1) JP4541791B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4970188B2 (en) * 2007-08-08 2012-07-04 株式会社ディスコ Hub blade
JP2010017820A (en) * 2008-07-11 2010-01-28 Asahi Diamond Industrial Co Ltd Blade with hub
CH714136A1 (en) * 2017-09-12 2019-03-15 Robert Renaud Sa Motorized device for a machine tool.
TWI739684B (en) * 2020-12-01 2021-09-11 李慧玲 Ultrasonic Conduction Grinding Module

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6362678A (en) * 1986-09-02 1988-03-18 Ube Ind Ltd Rotary grinding wheel
JPH03270880A (en) * 1990-03-20 1991-12-03 Mitsubishi Materials Corp Thin cutting edge grinder wheel with hub and its manufacture
JP2002210665A (en) * 2001-01-19 2002-07-30 Lobtex Co Ltd Ultrathin cut blade
JP2003080442A (en) * 2001-09-06 2003-03-18 Disco Abrasive Syst Ltd Dicing device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6362678A (en) * 1986-09-02 1988-03-18 Ube Ind Ltd Rotary grinding wheel
JPH03270880A (en) * 1990-03-20 1991-12-03 Mitsubishi Materials Corp Thin cutting edge grinder wheel with hub and its manufacture
JP2002210665A (en) * 2001-01-19 2002-07-30 Lobtex Co Ltd Ultrathin cut blade
JP2003080442A (en) * 2001-09-06 2003-03-18 Disco Abrasive Syst Ltd Dicing device

Also Published As

Publication number Publication date
JP2006026868A (en) 2006-02-02

Similar Documents

Publication Publication Date Title
JP4249827B2 (en) Manufacturing method of semiconductor wafer
JPH0639729A (en) Precision grinding wheel and its manufacture
JP3992168B2 (en) Electrodeposition blade manufacturing method
US11511374B2 (en) Silicon wafer forming method
US20070037493A1 (en) Pad conditioner for conditioning a cmp pad and method of making such a pad conditioner
JP5199777B2 (en) Cutting equipment
JP4541791B2 (en) Manufacturing method of cutting wheel
JP4571821B2 (en) Electrodeposition grinding wheel manufacturing method
JP2009119559A (en) Cutting blade
JP2008308709A (en) Method and apparatus for manufacturing semiconductor device
JP4767548B2 (en) Electrodeposition whetstone and method of manufacturing electrodeposition whetstone
JP2011054632A (en) Cutting tool
JP2000144477A (en) Electrodeposition coated blade and its manufacture
JP4019349B2 (en) Waxless mount polishing machine
JP2806674B2 (en) Method and apparatus for manufacturing grinding wheel for grinding machine
JP3140517B2 (en) Manufacturing method of dental bur
JPS61226269A (en) Abrasive grain sticking method
JPS646905B2 (en)
JP2001113446A (en) Substrate grinding method and device
JP2001205178A (en) Coating film removing device for cylindrical electrophotographic photoreceptor
JP2001038631A (en) Manufacture of electrodeposition grinding wheel, and jig for manufacture
TW202307923A (en) Substrate processing apparatus
JP2003285297A (en) Ultrasonically vibrating cutting tool and manufacturing method thereof
JPH05245760A (en) Manufacture of grinding wheel and abrasive grain charger
JP2020188102A (en) Method for manufacturing circular substrate

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070625

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100121

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100121

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100319

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100603

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100624

R150 Certificate of patent or registration of utility model

Ref document number: 4541791

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130702

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130702

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130702

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250