JP4531078B2 - Photopolymerizable composition - Google Patents

Description

  The present invention relates to a photopolymerizable material that can be used for image forming materials such as three-dimensional stereolithography, holography, lithographic printing plate materials, color proofs, photoresists and color filters, and photocurable resin materials such as inks, paints, and adhesives. . In particular, the present invention relates to a photopolymerizable composition that can be directly made using various lasers from a digital signal from a computer or the like, and is suitably used as a lithographic printing plate material capable of direct plate making.

Solid-state lasers, semiconductor lasers, and gas lasers that emit ultraviolet light, visible light, and infrared light having a wavelength of 300 nm to 1200 nm are easily available as high-power and small-sized lasers. It is very useful as a recording light source when making a plate directly from data.
Various research has been conducted on recording materials sensitive to these various laser beams.
First, as materials that can be recorded with an infrared laser having a photosensitive wavelength of 760 nm or more, there are a positive recording material described in Patent Document 1 and an acid-catalyst cross-linked negative recording material described in Patent Document 2.
Secondly, there are a large number of radical polymerization type negative recording materials described in Patent Document 3 and Patent Document 4 as a recording material compatible with ultraviolet light or visible light laser of 300 nm to 700 nm.

  On the other hand, short wavelength light of 300 nm or less and an electron beam are particularly important as a photoresist material. In recent years, integrated circuits have become more and more integrated, and in the manufacture of semiconductor substrates such as VLSI, processing of ultra-fine patterns with a line width of less than half a micron is required, and photolithography is used to meet that need. The wavelength used for the exposure apparatus used in the field is increasingly shortened, far ultraviolet light and excimer laser light (XeCl, KrF, ArF, etc.) have been studied, and the formation of ultrafine patterns by electron beams has been studied. In particular, electron beams are promising as a light source for next-generation pattern formation technology.

The problem common to all these image forming materials is how to enlarge the ON / OFF of the image in the above-mentioned various energy irradiated portions and unexposed portions, that is, the high sensitivity and storage stability of the image forming materials. It is compatible.
In order to achieve the above-mentioned problems, there are many examples using a highly sensitive photo radical polymerizable composition, and radical polymerizable cross-linking agents and polymer binders are used as the main components of the photo radical polymerizable composition. . As the radical polymerizable crosslinking agent, a polyfunctional crosslinking agent having two or more polymerizable groups in the molecule is usually used in order to increase the crosslinking efficiency. However, although the photo-radically polymerizable composition is certainly highly sensitive, if it is left under high temperature and high humidity, it will crystallize if the cross-linking agent is a solid, or it will stick to the surface if it is a liquid. A phenomenon has been observed, and a technique for further improving the storage stability has been desired.
On the other hand, when applying the photo-radically polymerizable composition to a printing plate, it is necessary that the polymerized and cured product after exposure has high strength (high printing durability). Conventionally, for the purpose of increasing strength, urethane resin, etc. The hydrogen bond interaction of has been utilized. However, the use of such hydrogen bond interaction has been problematic in that the film flexibility is lowered and the sensitivity is lowered in order to inhibit radical transfer during polymerization.
U.S. Pat. No. 4,708,925 JP-A-8-276558 U.S. Pat. No. 2,850,445 Japanese Patent Publication No. 44-20189

  Accordingly, an object of the present invention is to provide a photopolymerizable composition that can satisfy high sensitivity, excellent storage stability, and high printing durability in a photoradical polymerization composition that is most promising and promising among image forming technologies. Is to provide things. In particular, a photopolymerizable composition suitable as a plate material for lithographic printing that can be directly made from digital data such as a computer by recording using solid-state laser and semiconductor laser light emitting ultraviolet light, visible light and infrared light. It is to provide.

As a result of intensive studies to achieve the above object, the present inventor has found that the photo-radical polymerizable composition containing a bifunctional crosslinking agent having a specific structure has all of high sensitivity, storage stability, and high printing durability. We found that we can be satisfied.
That is, the present invention is as follows.

(1)
A compound represented by the following general formula (I), an alkali-soluble urethane resin and a photopolymerization initiator are contained, and the compound represented by the following general formula (I) and the urethane resin are 3/7 to 5 by weight ratio. / 5, a photopolymerizable composition,
_{^{(Q 1) k -R- (Q}} 2) m Formula (I)
(In the formula, Q ¹ and Q ² each independently represent a group represented by the following general formula (a) or (b), R represents an n-valent hydrocarbon linking group, n is k + m, 6 represents an integer, k represents an integer of 0 to 6, and m represents an integer of 0 to 6.)

Wherein Z is H, CH ₃ or CHR ^b X ¹ , X ¹ and X ² are each independently a substituted oxy group, a substituted amino group or a substituted thio group, and R ¹ and R ² are aliphatic hydrocarbons In the linking group, R ^a and R ^b represent a hydrogen atom or a hydrocarbon group.)
(2)
The compound represented by the general formula (I) is a polyfunctional compound in which either Q ¹ or Q ² represents a group represented by the following general formula (a), and n represents an integer of 3 to 6 (1) The photopolymerizable composition according to (1).

(In the formula, Z represents CH ₃ and R ¹ represents an aliphatic hydrocarbon linking group.)
(3)
The photopolymerizable composition according to (1) or (2), wherein the compound represented by the general formula (I) has two or more ester groups in the R portion.
(4)
Furthermore, a sensitizing dye is contained, The photopolymerizable composition in any one of (1) -(3) characterized by the above-mentioned.
( 5 )
The photopolymerization initiator includes (a) aromatic ketones, (b) aromatic onium salt compounds, (c) organic peroxides, (d) thio compounds, (e) hexaarylbiimidazole compounds, (f) keto It is at least one selected from oxime ester compounds, (g) borate compounds, (h) azinium compounds, (i) metallocene compounds, (j) active ester compounds, and (k) compounds having a carbon halogen bond. (1)-The photopolymerizable composition in any one of ( 4 ).
( 6 )
It has a photosensitive layer containing the photopolymerizable composition according to any one of (1) to ( 5 ) on a hydrophilic support, and exposure with a laser light source having a wavelength of 350 nm to 450 nm is possible. An original for a lithographic printing plate.
( 7 )
It has a photosensitive layer containing the photopolymerizable composition according to any one of (1) to ( 5 ) on a hydrophilic support, and exposure with a laser light source having a wavelength of 450 nm to 700 nm is possible. An original for a lithographic printing plate.

  The photopolymerizable composition of the present invention is a photo-radical polymerization composition which is considered to be the most sensitive and promising among image forming techniques, and a polyfunctional type crosslinking agent represented by the general formula (I) of the present invention. By containing it, it is possible to satisfy all of high sensitivity, excellent storage stability and printing durability. In particular, a photopolymerizable composition suitable as a plate material for lithographic printing that can be directly made from digital data such as a computer by recording using solid-state laser and semiconductor laser light emitting ultraviolet light, visible light and infrared light. Can be provided.

Although the mechanism by which the photopolymerizable composition containing the compound represented by the above general formula (I) of the present invention as a crosslinking agent can satisfy all of high sensitivity, storage stability, and high printing durability is not clear. It is considered that the high compatibility with the resin resulting from the specific structure of the crosslinking agent molecule and the self-aggregation property of the crosslinking agent itself are acting. That is, because of high compatibility with the resin and high self-aggregation property, it is presumed that the crosslinking agent forms ultrafine domains by the crosslinking agent in the resin, and the ultrafine domains are compatible with the resin. As a result, storage stability is improved, and the disadvantage of radical transfer due to hydrogen bond interaction with urethane resin is made advantageous by reducing the spatial distance of the polymerizable group, and the tradeoff between high sensitivity and high printing durability is achieved. It is estimated that it has been solved.
Further, as one of the storage stability improvements of the present invention, it is presumed that there is an effect of preventing precipitation of low molecular weight compounds such as metal-containing initiators and pigments which are usually incompatible with urethane resins.
In particular, a photopolymerizable composition suitable as a plate material for lithographic printing that can be directly made from digital data such as a computer by recording using solid-state laser and semiconductor laser light emitting ultraviolet light, visible light and infrared light. Can be provided.

The photopolymerizable composition of the present invention will be described in detail below.
The photopolymerizable composition of the present invention contains a compound represented by the following general formula (I), an alkali-soluble urethane resin and a photopolymerization initiator, and a compound represented by the following general formula (I): The urethane resin is characterized by having a weight ratio of 3/7 to 5/5. In this specification, other matters are also described for reference.
<Crosslinking agent represented by general formula (I) in the present invention>
The photopolymerizable composition of the present invention contains a polyfunctional crosslinking agent having a structure represented by the following general formula (I) and having a plurality of ethylenic polymerizable groups in one molecule.

_{^{(Q 1) k -R- (Q}} 2) m Formula (I)

Wherein Q ¹ and Q ² are each independently a group represented by the following general formula (a) or (b), and R is an n-valent hydrocarbon linking group, provided that the hydrocarbon linking group Are an oxygen atom (—O—), a sulfur atom (—S—), an ester linking group (—OC (═O) —), a carbonate ester linking group (—OC (═O) O—), and a carbonyl linking group. (-C (= O)-) may be included. N is k + m and represents an integer of 2 to 6, k represents an integer of 0 to 6, and m represents an integer of 0 to 6.)

(In the formula, Z is H, CH ₃ or CHR ^b X ¹ , X ¹ and X ² are each independently a substituted oxy group, a substituted amino group or a substituted thio group, and R ¹ and R ² are connected with oxygen. An aliphatic hydrocarbon linking group that may be present, R ^a and R ^b each represents a hydrogen atom or a hydrocarbon group.)

Examples of the substituents in the aliphatic hydrocarbon linking groups of X ¹ , X ² , R ¹ , and R ² in general formulas (a) and (b), and the hydrocarbon groups of R ^a and R ^b are shown.
X ¹ and X ² are a substituted oxy group, a substituted amino group, and a substituted thio group.
The aliphatic hydrocarbon linking group for R ¹ and R ² is a divalent linking group obtained by removing one hydrogen from an alkyl group and a substituted alkyl group.
The hydrocarbon group for R ^a and R ^{b is} a hydrocarbon group which may have a substituent and may contain an unsaturated bond.

  The hydrocarbon group which may have a substituent and may contain an unsaturated bond includes an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an alkenyl group, a substituted alkenyl group, and an alkynyl group. And substituted alkynyl groups.

  Examples of the alkyl group include linear, branched, or cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, and pentyl. Group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group, eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group , Isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group, and 2-norbornyl group. Of these, linear alkyl groups having 1 to 12 carbon atoms, branched alkyl groups having 3 to 12 carbon atoms, and cyclic alkyl groups having 5 to 10 carbon atoms are more preferable.

The substituted alkyl group is composed of a bond between a substituent and an alkylene group, and as the substituent, a monovalent nonmetallic atomic group excluding hydrogen is used. Preferred examples include halogen atoms (—F, —Br, -Cl, -I), hydroxyl group, alkoxy group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkyl Carbamoyloxy group, N, N-diarylcarbamoyloxy group, N-alkyl-N-ali Rucarbamoyloxy group, alkylsulfoxy group, arylsulfoxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N'-alkylureido group, N ', N'- Dialkylureido group, N'-arylureido group, N ', N'-diarylureido group, N'-alkyl-N'-arylureido group, N-alkylureido group, N-arylureido group, N'-alkyl- N-alkylureido group, N'-alkyl-N-arylureido group, N ', N'-dialkyl-N-alkylureido group, N', N'-dialkyl-N-arylureido group, N'-aryl- N-alkylureido group, N′-aryl-N-arylureido group, N ′, N′-diaryl-N-al Ruureido group, N ', N'-diaryl-N-arylureido group, N'-alkyl-N'-aryl-N-alkylureido group, N'-alkyl-N'-aryl-N-arylureido group, alkoxy Carbonylamino group, aryloxycarbonylamino group, N-alkyl-N-alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N- Aryloxycarbonylamino group, formyl group, acyl group, carboxyl group and its conjugate base group (hereinafter referred to as carboxylate), alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N- Dialkylcarbamoyl group, N-arylcarba Moyl group, N, N-diarylcarbamoyl group, N-alkyl-N-arylcarbamoyl group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, sulfosulfonyl group (—SO ₃ H) and its conjugate base group (Hereinafter referred to as sulfonate group), alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N -Diarylsulfinamoyl group, N-alkyl-N-arylsulfinamoyl group, sulfamoyl group, N-alkylsulfamoyl group, N, N-dialkylsulfamoyl group, N-arylsulfamoyl group, N, N-diarylsulfamoyl group, N-alkyl N- arylsulfamoyl group, N- acylsulfamoyl group and a conjugate base group, N- alkylsulfonylsulfamoyl group _{(-SO 2 NHSO 2 (alkyl)} ) and its conjugated base group, N- aryl sulfonylsulfamoyl Le Famoyl group (—SO ₂ NHSO ₂ (allyl)) and its conjugate base group, N-alkylsulfonylcarbamoyl group (—CONHSO ₂ (alkyl)) and its conjugate base group, N-arylsulfonylcarbamoyl group (—CONHSO ₂ ( allyl)) and its conjugated base group, alkoxysilyl group (—Si (Oalkyl) ₃ ), aryloxysilyl group (—Si (Oallyl) ₃ ), hydroxysilyl group (—Si (OH) ₃ ) and its conjugated base group , phosphono group (-PO ₃ H ₂₎ and its conjugated base group (hereinafter, phosphonato group Referred), a dialkyl phosphono group _{(-PO 3 (alkyl) 2)} , diaryl phosphono group _{(-PO 3 (aryl) 2)} , alkyl aryl phosphono group _{(-PO 3 (alkyl) (aryl} )), monoalkyl A phosphono group (—PO ₃ H (alkyl)) and its conjugated base group (hereinafter referred to as alkylphosphonate group), a monoarylphosphono group (—PO ₃ H (aryl)) and its conjugated base group (hereinafter, Arylphosphonate group), phosphonooxy group (—OPO ₃ H ₂ ) and its conjugate base group (hereinafter referred to as phosphonatoxy group), dialkylphosphonooxy group (—OPO ₃ (alkyl) ₂ ), diarylphosphonooxy Group (—OPO ₃ (aryl) ₂ ), alkylarylphosphonooxy group (—OPO ₃ (alkyl) (aryl)), monoal Kill phosphonooxy group (—OPO ₃ H (alkyl)) and its conjugate base group (hereinafter referred to as alkylphosphonatoxy group), monoarylphosphonooxy group (—OPO ₃ H (aryl)) and its conjugate base Group (hereinafter referred to as arylphosphonatoxy group), cyano group, nitro group, aryl group, alkenyl group and alkynyl group.

  Specific examples of the alkyl group in these substituents include the above-described alkyl groups, and specific examples of the aryl group include a phenyl group, a biphenyl group, a naphthyl group, a tolyl group, a xylyl group, a mesityl group, and a cumenyl group. , Fluorophenyl group, chlorophenyl group, bromophenyl group, chloromethylphenyl group, hydroxyphenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, phenylthiophenyl Group, methylaminophenyl group, dimethylaminophenyl group, acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, phenoxycarbonylphenyl group, N-phenylcarbamoyl group Group, a phenyl group, nitrophenyl group, cyanophenyl group, sulfophenyl group, sulfonatophenyl group, phosphonophenyl group, and the like phosphonium Hona preparative phenyl group. Examples of alkenyl groups include vinyl group, 1-propenyl group, 1-butenyl group, cinnamyl group, 2-chloro-1-ethenyl group, and the like. Examples of alkynyl groups include ethynyl group, 1 -Propynyl group, 1-butynyl group, trimethylsilylethynyl group, phenylethynyl group and the like.

Examples of the acyl group (R4CO-) include a hydrogen atom and the above alkyl group, aryl group, alkenyl group and alkynyl group.
On the other hand, examples of the alkylene group in the substituted alkyl group include a divalent organic residue obtained by removing any one of the hydrogen atoms on the alkyl group having 1 to 20 carbon atoms. Can include linear alkylene groups having 1 to 12 carbon atoms, branched alkylene groups having 3 to 12 carbon atoms, and cyclic alkylene groups having 5 to 10 carbon atoms. Specific examples of preferred substituted alkyl groups include chloromethyl, bromomethyl, 2-chloroethyl, trifluoromethyl, methoxymethyl, methoxyethoxyethyl, allyloxymethyl, phenoxymethyl, methylthiomethyl, Ruthiomethyl group, ethylaminoethyl group, diethylaminopropyl group, morpholinopropyl group, acetyloxymethyl group, benzoyloxymethyl group, N-cyclohexylcarbamoyloxyethyl group, N-phenylcarbamoyloxyethyl group, acetylaminoethyl group, N- Methylbenzoylaminopropyl group, 2-oxoethyl group, 2-oxopropyl group, carboxypropyl group, methoxycarbonylethyl group, methoxycarbonylmethyl group, methoxycarbonylbutyl group, ethoxycarbonyl Bonylmethyl group, butoxycarbonylmethyl group, allyloxycarbonylmethyl group, benzyloxycarbonylmethyl group, methoxycarbonylphenylmethyl group, trichloromethylcarbonylmethyl group, allyloxycarbonylbutyl group, chlorophenoxycarbonylmethyl group, carbamoylmethyl group, N- Methylcarbamoylethyl group, N, N-dipropylcarbamoylmethyl group, N- (methoxyphenyl) carbamoylethyl group, N-methyl-N- (sulfophenyl) carbamoylmethyl group, sulfopropyl group, sulfobutyl group, sulfonatobutyl group, sulfur Famoylbutyl group, N-ethylsulfamoylmethyl group, N, N-dipropylsulfamoylpropyl group, N-tolylsulfamoylpropyl group, N-methyl-N- (phosphono Eniru) sulfamoyl-octyl group,

Phosphonobutyl group, phosphonatohexyl group, diethylphosphonobutyl group, diphenylphosphonopropyl group, methylphosphonobutyl group, methylphosphonatobutyl group, tolylphosphonohexyl group, tolylphosphonatohexyl group, phosphonooxypropyl group, Phosphonatooxybutyl group, benzyl group, phenethyl group, α-methylbenzyl group, 1-methyl-1-phenylethyl group, p-methylbenzyl group, cinnamyl group, allyl group, 1-propenylmethyl group, 2-butenyl group 2-methylallyl group, 2-methylpropenylmethyl group, 2-propynyl group, 2-butynyl group, 3-butynyl group, and the like.

  Examples of the aryl group include those in which 1 to 3 benzene rings form a condensed ring, and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring. Specific examples include a phenyl group, naphthyl Group, anthryl group, phenanthryl group, indenyl group, acenaphthenyl group, and fluorenyl group. Among these, a phenyl group and a naphthyl group are more preferable.

  The substituted aryl group is a group in which the substituent is bonded to the aryl group, and those having a monovalent non-metallic atomic group excluding hydrogen as a substituent on the ring-forming carbon atom of the aryl group described above are used. Examples of preferred substituents include the above-described alkyl groups, substituted alkyl groups, and those previously shown as substituents in the substituted alkyl group. Preferred examples of these substituted aryl groups include biphenyl group, tolyl group, xylyl group, mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, fluorophenyl group, chloromethylphenyl group, trifluoromethylphenyl group, Hydroxyphenyl, methoxyphenyl, methoxyethoxyphenyl, allyloxyphenyl, phenoxyphenyl, methylthiophenyl, tolylthiophenyl, phenylthiophenyl, ethylaminophenyl, diethylaminophenyl, morpholinophenyl, acetyl Oxyphenyl group, benzoyloxyphenyl group, N-cyclohexylcarbamoyloxyphenyl group, N-phenylcarbamoyloxyphenyl group, acetylaminophenyl group, N-methylbenzoyl Minophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, allyloxycarbonylphenyl group, chlorophenoxycarbonylphenyl group, carbamoylphenyl group, N-methylcarbamoylphenyl group, N, N-dipropylcarbamoylphenyl group, N- (methoxyphenyl) ) Carbamoylphenyl group, N-methyl-N- (sulfophenyl) carbamoylphenyl group, sulfophenyl group, sulfonatophenyl group, sulfamoylphenyl group, N-ethylsulfamoylphenyl group, N, N-dipropylsulfa Moylphenyl group, N-tolylsulfamoylphenyl group, N-methyl-N- (phosphonophenyl) sulfamoylphenyl group, phosphonophenyl group, phosphonatophenyl group, diethylphosphonophenyl group, diph Nylphosphonophenyl group, methylphosphonophenyl group, methylphosphonatophenyl group, tolylphosphonophenyl group, tolylphosphonophenyl group, allyl group, 1-propenylmethyl group, 2-butenyl group, 2-methylallylphenyl group 2-methylpropenylphenyl group, 2-propynylphenyl group, 2-butynylphenyl group, 3-butynylphenyl group, and the like.

  Examples of the alkenyl group include those described above. The substituted alkenyl group is a group in which the substituent is replaced and bonded to a hydrogen atom of the alkenyl group, and as the substituent, the substituent in the above-mentioned substituted alkyl group is used, while the alkenyl group uses the above-mentioned alkenyl group. Can do. Examples of preferred substituted alkenyl groups include

Etc.
Examples of the alkynyl group include those described above. The substituted alkynyl group is a group in which the substituent is replaced with a hydrogen atom of the alkynyl group, and the substituent in the above-described substituted alkyl group is used as this substituent, while the alkynyl group uses the above-described alkynyl group. be able to.

  The heterocyclic group is a monovalent group obtained by removing one hydrogen on the heterocyclic ring and a group formed by bonding one substituent to the above-mentioned substituted alkyl group by further removing one hydrogen from the monovalent group. It is a valent group (substituted heterocyclic group). Examples of preferred heterocycles include

Etc.

  As the substituted oxy group (R5O-), those in which R5 is a monovalent nonmetallic atomic group excluding hydrogen can be used. Preferred substituted oxy groups include alkoxy groups, aryloxy groups, acyloxy groups, carbamoyloxy groups, N-alkylcarbamoyloxy groups, N-arylcarbamoyloxy groups, N, N-dialkylcarbamoyloxy groups, N, N-diarylcarbamoyloxy groups. Group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy group, arylsulfoxy group, phosphonooxy group, phosphonatoxy group. Examples of the alkyl group and aryl group in these include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group. Examples of the acyl group (R6CO-) in the acyloxy group include those in which R6 is the above-mentioned alkyl group, substituted alkyl group, aryl group, and substituted aryl group. Among these substituents, an alkoxy group, an aryloxy group, an acyloxy group, and an arylsulfoxy group are more preferable. Specific examples of preferred substituted oxy groups include methoxy, ethoxy, propyloxy, isopropyloxy, butyloxy, pentyloxy, hexyloxy, dodecyloxy, benzyloxy, allyloxy, phenethyloxy, Carboxyethyloxy group, methoxycarbonylethyloxy group, ethoxycarbonylethyloxy group, methoxyethoxy group, phenoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, morpholinoethoxy group, morpholinopropyloxy group, allyloxyethoxyethoxy group, Phenoxy, tolyloxy, xylyloxy, mesityloxy, cumenyloxy, methoxyphenyloxy, ethoxyphenyloxy, chlorophenyloxy, bromo Niruokishi group, acetyloxy group, benzoyloxy group, naphthyloxy group, a phenylsulfonyloxy group, a phosphonooxy group, phosphonatoxy and the like.

  As the substituted thio group (R7S-), those in which R7 is a monovalent nonmetallic atomic group excluding hydrogen can be used. Examples of preferred substituted thio groups include alkylthio groups, arylthio groups, alkyldithio groups, aryldithio groups, and acylthio groups. Examples of the alkyl group and aryl group in these groups include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group. R6 of the acyl group (R6CO-) in the acylthio group is as described above. It is. Among these, an alkylthio group and an arylthio group are more preferable. Specific examples of preferred substituted thio groups include a methylthio group, an ethylthio group, a phenylthio group, an ethoxyethylthio group, a carboxyethylthio group, and a methoxycarbonylthio group.

As the substituted amino group (R8NH-, (R9) (R10) N-), those in which R8, R9 and R10 are monovalent nonmetallic atomic groups excluding hydrogen can be used. Preferred examples of the substituted amino group include an N-alkylamino group, an N, N-dialkylamino group, an N-arylamino group, an N, N-diarylamino group, an N-alkyl-N-arylamino group, an acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkylureido group, N′-arylureido group, N ′, N′-diarylureido group N'-alkyl-N'-arylureido group, N-alkylureido group, N-arylureido group, N'-alkyl-N-alkylureido group, N'-alkyl-N-arylureido group, N ', N′-dialkyl-N-alkylureido group, N ′, N′-dialkyl-N-arylureido group, N′-aryl-N-alkyl Ureido group, N′-aryl-N-arylureido group, N ′, N′-diaryl-N-alkylureido group, N ′, N′-diaryl-N-arylureido group, N′-alkyl-N′- Aryl-N-alkylureido group, N′-alkyl-N′-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonylamino group, N-alkyl-N-alkoxycarbonylamino group, N-alkyl- Examples thereof include N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, and N-aryl-N-aryloxycarbonylamino group.
Examples of these alkyl groups and aryl groups include the alkyl groups, substituted alkyl groups, aryl groups, and substituted aryl groups described above, such as acylamino groups, N-alkylacylamino groups, and N-arylacylamino groups. R6 of the acyl group (R6CO-) in the group is as described above. Among these, more preferred are N-alkylamino group, N, N-dialkylamino group, N-arylamino group, acylamino group and the like. Specific examples of preferred substituted amino groups include methylamino group, ethylamino group, diethylamino group, morpholino group, piperidino group, pyrrolidino group, phenylamino group, benzoylamino group, acetylamino group and the like.

R in the general formula (I) is not particularly limited as long as it is a divalent to hexavalent hydrocarbon linking group, and examples thereof include an aliphatic hydrocarbon linking group and an aromatic hydrocarbon linking group.
The aliphatic hydrocarbon linking group is a polyvalent linking group obtained by removing one or more hydrogens from an alkyl group and a substituted alkyl group.
The aromatic hydrocarbon linking group is a polyvalent linking group obtained by removing one or more hydrogens from an aryl group and a substituted aryl group.
R in the general formula (I) includes an oxygen atom (—O—), a sulfur atom (—S—), an ester linking group (—OC (═O) —), and a carbonate ester linkage in the structure. It may contain a group (—OC (═O) O—) and a carbonyl linking group (—C (═O) —).

  Next, specific examples of the compound (crosslinking agent) having the structure represented by the general formula (I) are shown.

As the polyfunctional crosslinking agent represented by the general formula (I) of the present invention, Q ¹ and Q ² are preferably a polymerizable group terminal of the general formula (a). More preferably, the R moiety of the general formula (I) has two or more ester groups. Most preferably, one of the radical polymerizable group terminals Q ¹ and Q ² is methacrylate (Z = CH _{3 in} the general formula (a)), and n is a polyfunctional compound having 3 to 6. These are particularly excellent in terms of reactivity and compatibility.

In the photopolymerizable composition of the present invention, as a crosslinking agent having two addition polymerizable ethylenic polymerizable groups, the crosslinking agent represented by the above general formula (I) alone and a mixture of two or more thereof, or The following mixtures with conventionally known compounds having addition-polymerizable ethylenically unsaturated bonds are used.
Examples of conventionally known addition-polymerizable compounds having an ethylenically unsaturated bond include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) and aliphatic polyvalent acids. Examples thereof include esters with polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyvalent amine compounds, and the like.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol di Acrylate, Tetraethylene glycol diacrylate, Pentaerythritol diacrylate, Pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (acryloxyethoxy) phenyl] dimethylmethane. Itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate And sorbitol tetritaconate.

  Examples of crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate. Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate. Furthermore, the mixture of the above-mentioned ester monomer can also be mention | raise | lifted. Specific examples of an amide monomer of an aliphatic polyvalent amine compound and an unsaturated carboxylic acid include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, 1,6-hexa. Examples include methylene bis-methacrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, and xylylene bismethacrylamide.

Other examples include vinyls containing a hydroxyl group represented by the following general formula (A) in a polyisocyanate compound having two or more isocyanate groups per molecule described in JP-B-48-41708. Examples thereof include a vinylurethane compound containing two or more polymerizable vinyl groups in one molecule to which a monomer is added.
_{CH 2 = C (R) COOCH} 2 CH (R ') OH (C)
(However, R and R ′ represent H or CH _3. )

  Further, urethane acrylates as described in JP-A-51-37193, as described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490, etc. Polyfunctional acrylates and methacrylates such as polyester acrylates and epoxy acrylates obtained by reacting an epoxy resin with (meth) acrylic acid can be used. Furthermore, Journal of Japan Adhesion Association vol.20, No. 7, pages 300 to 308 (1984) as photocurable monomers and oligomers can also be used. In the present invention, these monomers can be used in a chemical form such as a prepolymer, that is, a dimer, a trimer and an oligomer, or a mixture thereof and a copolymer thereof.

The amount of all polymerizable group-containing crosslinking agents including the crosslinking agent represented by the general formula (I) and other crosslinking agents is usually 1 to 99.99% based on the weight of all components of the photopolymerizable composition. An amount of 5 to 90.0%, preferably 10 to 70% is used. (The% mentioned here is weight%).
However, the content of the compound of the general formula (I) of the present invention contained in all the polymerizable group-containing compounds is 5 to 100% by weight, preferably 10 to 90% by weight, more preferably 30 to 70%. If the amount is less than 5%, the effects of the present invention may not be exhibited.

  Next, the photopolymerization initiator used in the photopolymerizable composition of the present invention will be described. Preferred photopolymerization initiators include (a) aromatic ketones, (b) aromatic onium salt compounds, (c) organic peroxides, (d) thio compounds, (e) hexaarylbiimidazole compounds, (f) Examples thereof include ketoxime ester compounds, (g) borate compounds, (h) azinium compounds, (i) metallocene compounds, (j) active ester compounds, and (k) compounds having a carbon halogen bond. (A) Preferred examples of aromatic ketones include compounds having a benzophenone skeleton or a thioxanthone skeleton described in “RADIATION CURING IN POLYMER SCIENCE AND TECHNOLOGY” J.P.FOUASSIER J.F.RABEK (1993), p77-117, for example,

Etc. More preferable examples of (a) aromatic ketones include α-thiobenzophenone compounds described in JP-B-47-6416, benzoin ether compounds described in JP-B-47-3981, for example,

Α-substituted benzoin compounds described in JP-B-47-22326, such as

Benzoin derivatives described in JP-B-47-23664, aroylphosphonic acid esters described in JP-A-57-30704, dialkoxybenzophenones described in JP-B-60-26483, for example,

Benzoin ethers described in JP-B-60-26403 and JP-A-62-81345, for example,

Α-aminobenzophenones described in JP-B-1-34242, US Pat. No. 4,318,791, and European Patent 0284561A1, for example,

P-di (dimethylaminobenzoyl) benzene described in JP-A-2-211522, such as

A thio-substituted aromatic ketone described in JP-A-61-194062, for example,

An acylphosphine sulfide described in JP-B-2-9597, for example,

Acylphosphine described in JP-B-2-9596, for example,

Examples thereof include thioxanthones described in JP-B 63-61950, and coumarins described in JP-B 59-42864.
Another example of the (b) aromatic onium salt is a group V, VI or VII element of the periodic table, specifically N, P, As, Sb, Bi, O, S, Se. , Te, or I aromatic onium salts. Examples of such aromatic onium salts include compounds shown in JP-B 52-14277, JP-B 52-14278, and JP-B 52-14279. In particular,

Can give.
Furthermore, the following diazonium salts can also be mentioned.

  Another example of the photopolymerization initiator used in the present invention (c) “organic peroxide” includes almost all organic compounds having one or more oxygen-oxygen bonds in the molecule. Examples include methyl ethyl ketone peroxide, cyclohexanone peroxide, 3,3,5-trimethylcyclohexanone peroxide, methylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tertiarybutylperoxy) -3,3,5. -Trimethylcyclohexane, 1,1-bis (tertiarybutylperoxy) cyclohexane, 2,2-bis (tertiarybutylperoxy) butane, tertiarybutyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide , Parameter hydroperoxide, 2,5-dimethylhexane-2,5-dihydroperoxide, 1,1,3,3-tetramethylbutyl hydroperoxide, ditertiary butyl peroxide, tertiary butyl cumyl peroxide , Dicumyl peroxide, bis (tertiarybutylperoxyisopropyl) benzene, 2,5-dimethyl-2,5-di (tertiarybutylperoxy) hexane, 2,5-xanoyl peroxide, peroxysuccinic acid Benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, meta-toluoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate, dimethyl ester Xyisopropyl peroxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tertiary butyl peroxyacetate, tertiary butyl peroxypivalate, tertiary butyl peroxyneodecanoate, tertiary butyl Peroxyoctanoate, tertiary butyl peroxy-3,5,5-trimethylhexanoate, tertiary butyl peroxylaurate, tertiary carbonate, 3,3'4,4'-tetra- (t-butyl Peroxycarbonyl) benzophenone, 3,3′4,4′-tetra- (t-amylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (t-hexylperoxycarbonyl) benzophenone, 3, 3'4,4'-tetra- (t -Octylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (cumylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyl Examples include di (t-butylperoxydihydrogen diphthalate), carbonyldi (t-hexylperoxydihydrogen diphthalate), and the like.

  Among these, 3,3'4,4'-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (t-amylperoxycarbonyl) benzophenone, 3,3 '4,4'-tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (t-octylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- Peroxide esters such as (cumylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, di-t-butyldiperoxyisophthalate are preferred.

  The (d) thio compound as a photopolymerization initiator used in the present invention is represented by the following general formula [II].

(Wherein R ²⁰ represents an alkyl group, an aryl group or a substituted aryl group, R ²¹ represents a hydrogen atom or an alkyl group, and R ²⁰ and R ²¹ are bonded to each other to form an oxygen, sulfur and nitrogen atom. (A group of nonmetallic atoms necessary to form a 5-membered to 7-membered ring which may contain a selected heteroatom.)
The alkyl group in the general formula [II] is preferably an alkyl group having 1 to 4 carbon atoms. As the aryl group, those having 6 to 10 carbon atoms such as phenyl and naphthyl are preferable, and as the substituted aryl group, a halogen atom such as a chlorine atom and an alkyl such as a methyl group as described above. And those substituted with an alkoxy group such as a group, a methoxy group, and an ethoxy group. R ²¹ is preferably an alkyl group having 1 to 4 carbon atoms. Specific examples of the thio compound represented by the general formula [II] include the following compounds.

  Other examples of the photopolymerization initiator used in the present invention include (e) hexaarylbiimidazole, which are lophine dimers described in JP-B Nos. 45-37377 and 44-86516, such as 2,2 ′. -Bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-bromophenyl) -4,4', 5,5'-tetraphenylbiimidazole 2,2'-bis (o, p-dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl) -4,4', 5,5 '-Tetra (m-methoxyphenyl) biimidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o -Nitro Enyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-methylphenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2 ' -Bis (o-trifluorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole and the like.

Other examples of the photopolymerization initiator used in the present invention include (f) ketoxime esters such as 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, and 3-propionyloxy. Iminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-p -Toluenesulfonyloxyiminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one and the like can be mentioned.
As an example of the (g) borate salt which is another example of the photopolymerization initiator in the present invention, a compound represented by the following general formula [III] can be mentioned.

(Wherein R ²² , R ²³ , R ²⁴ and R ²⁵ may be the same or different from each other, and each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkenyl group, A substituted or unsubstituted alkynyl group or a substituted or unsubstituted heterocyclic group, R ²² , R ²³ , R ²⁴ and R ²⁵ may be combined with each other to form a cyclic structure; Provided that at least one of R ²² , R ²³ , R ²⁴ and R ²⁵ is a substituted or unsubstituted alkyl group, and Z ⁺ represents an alkali metal cation or a quaternary ammonium cation). Examples of the alkyl group for R ^{22 to} R ²⁵ include linear, branched, and cyclic groups, and those having 1 to 18 carbon atoms are preferable. Specifically, methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl, octyl, stearyl, cyclobutyl, cyclopentyl, cyclohexyl and the like are included. Examples of the substituted alkyl group include the above alkyl groups, halogen atoms (for example, —Cl, —Br, etc.), cyano groups, nitro groups, aryl groups (preferably phenyl groups), hydroxy groups,

(Wherein R ²⁶ and R ^{27 each} independently represents a hydrogen atom, an alkyl group having 1 to 14 carbon atoms, or an aryl group), —COOR ²⁸ (where R ²⁸ is a hydrogen atom, having 1 to 14 carbon atoms) An alkyl group or an aryl group), -OCOR ²⁹ or -OR ³⁰ (wherein R ²⁹ and R ³⁰ represent an alkyl group having 1 to 14 carbon atoms or an aryl group) as a substituent. included. The aryl groups of R ^{22 to} R ²⁵ include 1 to 3 ring aryl groups such as a phenyl group and a naphthyl group, and the substituted aryl group is a substitution of the above substituted alkyl group with the above aryl group. Those having a group or an alkyl group having 1 to 14 carbon atoms are included. Examples of the alkenyl group for R ^{22 to} R ²⁵ include linear, branched and cyclic groups having 2 to 18 carbon atoms. Examples of the substituent of the substituted alkenyl group include those exemplified as the substituent of the substituted alkyl group. Examples of the alkynyl group of R ^{22 to} R ²⁵ include linear or branched groups having 2 to 28 carbon atoms, and examples of the substituent of the substituted alkynyl group include those listed as the substituents of the substituted alkyl group. included. In addition, examples of the heterocyclic group of R ^{22 to} R ²⁵ include a 5-membered or more, preferably 5 to 7-membered heterocyclic group containing at least one of N, S, and O. May contain a condensed ring. Furthermore, you may have what was mentioned as a substituent of the above-mentioned substituted aryl group as a substituent. Specific examples of the compound represented by the general formula [III] are described in U.S. Pat. Nos. 3,567,453 and 4,343,891 and European Patents 109,772 and 109,773. Examples include compounds and those shown below.

  Examples of the (h) azinium salt compound, which is another example of the photopolymerization initiator of the present invention, include JP-A 63-138345, JP-A 63-142345, JP-A 63-142346, JP Examples include compounds having an N—O bond described in JP-A-63-143537 and JP-B-46-42363.

  Examples of (i) metallocene compounds which are other examples of photopolymerization initiators include JP-A 59-152396, JP-A 61-151197, JP-A 63-41484, and JP-A 2-249. And titanocene compounds described in JP-A-2-4705, and iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109.

  Specific examples of the titanocene compound include di-cyclopentadienyl-Ti-di-chloride, di-cyclopentadienyl-Ti-bis-phenyl, and di-cyclopentadienyl-Ti-bis-2,3. 4,5,6-pentafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti- Bis-2,4,6-trifluorophen-1-yl, di-cyclopentadienyl-Ti-2,6-difluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4 -Difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4,5,6-pentafluorophen-1-yl, di-methylcyclopentadienyl-Ti- -2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4-difluorophen-1-yl, bis (cyclopentadienyl) -bis (2,6-difluoro-3- (pyridin-1-yl) phenyl) titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (methylsulfonamido) phenyl] titanium, bis (cyclopenta Dienyl) bis [2,6-difluoro-3- (N-butylbialoyl-amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethylacetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-methylacetyl) Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethylpropionylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(N-ethyl- (2,2-dimethylbutanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (2,2-dimethylbutane) Noyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-pentyl- (2,2-dimethylbutyl) Noyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl)-(2,2-dimethylbutanoyl) phenyl] titanium, bis (cyclopentadienyl) ) Bis [2,6-difluoro-3- (N-methylbutyrylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-methylpentanoylamino) phenyl] titanium,

  Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethylcyclohexylcarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl) Isobutyrylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethylacetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6- Difluoro-3- (2,2,5,5-tetramethyl-1,2,5-azadisilolidin-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- ( Octylsulfonamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4-tolylsulfonamide) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4-dodecylphenyl sulfonyl) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (4- (1-pentylheptyl) phenylsulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(Ethylsulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-((4-bromophenyl) -sulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-naphthylsulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (hexadecylsulfonylamido) phenyl] titanium, bis (cyclo Pentadienyl) bis [2,6-difluoro-3- (N-methyl- (4-dodecylphenyl)] Ruhoniruamido) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-methyl-4- (1-pentylheptyl) phenyl) sulfonylamide)] titanium, bis (cyclopentadienyl) bis [2,6 -Difluoro-3- (N-hexyl- (4-tolyl) -sulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (pyrrolidine-2,5-dioni-1) -Yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3,4-dimethyl-3-pyrrolidin-2,5-dioni-1-yl) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (phthalimido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 Isobutoxycarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (ethoxycarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro- 3-((2-chloroethoxy) -carbonylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (phenoxycarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-phenylthioureido) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-butylthioureido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- ( 3-phenylureido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-butylureido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro -3- (N, N-diacetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro 3- (3,3-dimethyl-ureido) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (acetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (butyrylamino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (decanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (octadecanoylamino) phenyl] Titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (isobutyrylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-ethyl) Hexanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-methylbuta) Ylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (pivaloylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (2,2-dimethylbutanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2 -Ethyl-2-methylheptanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (cyclohexylcarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2 , 6-Difluoro-3- (2,2-dimethyl-3-chloropropanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-phenylpropanoylamino) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-chloromethyl-2-methyl) 3-chloro-propanoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (3,4-xyloylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4- Ethylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2,4,6-mesitylcarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [ 2,6-difluoro-3- (benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-phenylpropyl) benzoylamino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-ethylheptyl) -2,2-dimethylpentanoylamino ] Phenyl titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- (4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6- Difluoro-3- (N-isobutylbenzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexylmethylpivaloylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N -(Oxolan-2-ylmethyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-ethylheptyl) -2,2-dimethylbutanoylamino ) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-phenylpropyl- (4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (oxolani-2-ylmethyl)-(4-toluyl) amino) phenyl] titanium, bis (si Ropentajieniru) bis [2,6-difluoro -3- (N- (4- Toruirumechiru) benzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (4-toluylmethyl)-(4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6 -Difluoro-3- (N-butylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (4-toluyl) amino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl- (4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- ( N- (2,4-dimethylpentyl) -2,2-dimethylbutanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro- - (2,4-dimethylpentyl) -2,2-dimethyl pentanoylamino] phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3-((4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2,2 -Dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2,2-dimethyl-3-ethoxypropanoylamino) phenyl] titanium, bis (cyclopentadi) Enyl) bis [2,6-difluoro-3- (2,2-dimethyl-3-allyloxypropanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N -Allylacetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-ethylbutanoylamino) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-(N-cyclohexylmethyl-benzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexylmethyl- (4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(N- (2-ethylhexyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isopropylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) ) Bis [2,6-difluoro-3- (N- (3-phenylpropyl) -2,2-dimethylpentanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro- 3- (N-hexylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro -3- (N-cyclohexylmethyl-2,2-dimethylpentanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butylbenzoylamino) phenyl] titanium ,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2-ethylhexyl) -2,2-dimethylpentanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2 , 6-Difluoro-3- (N-hexyl-2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isopropyl-2,2 -Dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-phenylpropyl) pivaloylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl-2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclo Ntajieniru) bis [2,6-difluoro -3- (N- (2- methoxyethyl) benzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-benzylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-benzyl- (4-Toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2-methoxyethyl)-(4-toluyl) amino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (N- (4-methylphenylmethyl) -2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2 , 6-Difluoro-3- (N- (2-methoxyethyl) -2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadiene) Le) bis [2,6-difluoro-3-(N-cyclohexylmethyl - (2-ethyl-2-methyl-heptanoyl) amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(N-hexyl- (2-ethyl-2-methylbutanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexyl-2,2-dimethyl) Pentanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (oxolani-2-ylmethyl) -2,2-dimethylpentanoyl) amino) phenyl] titanium Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexyl- (4-chlorobenzoyl) amino) phenyl Titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexyl- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro -3- (3,3-dimethyl-2-azetidinoni-1-yl) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3-isocyanatophenyl) titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl- (4-tolylsulfonyl) ) Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl- (4-tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [ 2,6-difluoro-3- (N-butyl- (4-tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- (4- Tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (2,2-di) Chill -3 chloropropanoyl) amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-phenylpropanoyl) -2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopenta Dienyl) bis [2,6-difluoro-3- (N-cyclohexylmethyl- (2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6 -Difluoro-3- (N-isobutyl- (2,2-dimethyl-3-chloropropanoyl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- ( 2-chloromethyl-2-methyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 (Butyl thiocarbonyl amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (phenylthio carbonylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3-isocyanatophenyl) titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl- (4-tolylsulfonyl) ) Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl- (4-tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [ 2,6-difluoro-3- (N-butyl- (4-tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- (4- Tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (2,2-di) Til-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-phenylpropanoyl) -2,2-dimethyl-3- Chloropropanoyl) amino] phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexylmethyl- (2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- (2,2-dimethyl-3-chloropropanoyl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N -Butyl- (2-chloromethyl-2-methyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (butylthiocarbonylamino) phenyl] Titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (phenylthiocarbonylamino) phenyl] titanium, bis Methylcyclopentadienyl) bis [2,6-difluoro-3-(N-hexyl-2,2-dimethyl-butanoylamino) amino) phenyl] titanium,

Bis (methylcyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl-2,2-dimethylpentanoylamino) phenyl] titanium, bis (methylcyclopentadienyl) bis [2,6- Difluoro-3- (N-ethylacetylamino) phenyl] titanium, bis (methylcyclopentadienyl) bis [2,6-difluoro-3- (N-ethylpropionylamino) phenyl] titanium, bis (trimethylsilylpentadienyl) ) Bis [2,6-difluoro-3- (N-butyl-2,2-dimethylpropanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- ( 2-methoxyethyl) -trimethylsilylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6- Fluoro-3- (N-butylhexyldimethylsilylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl- (1,1,2, -trimethylpropyl) Dimethylsilylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-ethoxymethyl-3-methyl-2-azethiodinon-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2, 6-difluoro-3- (3-allyloxymethyl-3-methyl-2-azetidinon-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-chloro Methyl-3-methyl-2-azetidinoni-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-benzyl-2,2-dimethylpropanoylamino) phenyl ] Titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (5,5-dimethyl-2-pyrrolidinoni-1-yl) phenyl] tita , Bis (cyclopentadienyl) bis [2,6-difluoro-3- (6,6-diphenyl-2-Piperijinoni-1-yl) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2,3-dihydro-1,2-benzisothiazolo-3-one (1,1-dioxide) -2-yl) phenyl] Titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro -3- (N-hexyl- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isopropyl- (4-chlorobenzoyl) amino) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (4-methylphenylmethyl)-(4-chlorobenzoyl) a Roh) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-(N-(4-methylphenyl methyl) - (2-chlorobenzoyl) amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(N-benzyl-2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2-ethylhexyl) -4-tolyl-sulfonyl] ) Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-oxaheptyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2 , 6-Difluoro-3- (N- (3,6-dioxadecyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bi [2,6-difluoro-3- (trifluoromethylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (trifluoroacetyl) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4-chloro Benzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3,6-dioxadecyl) -2,2-dimethylpentanoylamino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (N- (3,7-dimethyl-7-methoxyoctyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6 -Difluoro-3- (N-cyclohexylbenzoylamino) phenyl] titanium and the like.

  Examples of (j) active ester compounds which are other examples of photopolymerization initiators include imide sulfonate compounds described in JP-B-62-2223, active sulfonates described in JP-B-63-14340, and JP-A-59-174831. Can give.

  Preferable examples of the compound (k) having a carbon halogen bond, which is an example of the photopolymerization initiator, include those represented by the following general formulas [IV] to [X].

(Represented in the formula, X ² is .Y ² represents a halogen atom _{^{-C (X 2) 3, -NH}} 2, -NHR 32, -NR 32, an -OR ^32. Wherein R ³² is an alkyl group, a substituted An alkyl group, an aryl group, and a substituted aryl group, and R ³¹ represents —C (X ² ) ₃ , an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, and a substituted alkenyl group. .

(However, R ³³ is an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aryl group, a substituted aryl group, a halogen atom, an alkoxy group, a substituted alkoxyl group, a nitro group, or a cyano group, and X ³ is a halogen atom. And n is an integer of 1 to 3.)

(However, R ³⁴ is an aryl group or a substituted aryl group, and R ³⁵ is

Or Z ² is —C (═O) —, —C (═S) — or —SO ₂ —, and R ³⁶ and R ³⁷ are alkyl groups, substituted alkyl groups, alkenyl groups, substituted alkenyl groups. , An aryl group or a substituted aryl group, R ³⁸ is the same as R ³² in the general formula [IV], X ³ is a halogen atom, and m is 1 or 2. ) A compound represented by

In the formula, R ³⁹ is an optionally substituted aryl group or heterocyclic group, R ⁴⁰ is a trihaloalkyl group or trihaloalkenyl group having 1 to 3 carbon atoms, and p is 1, 2 Or 3.

Wherein L is a hydrogen atom or a substituent of the formula: CO- (R ⁴¹ ) q (C (X ⁴ ) ₃ ) r, Q is a sulfur, selenium or oxygen atom, a dialkylmethylene group, an alkene-1,2 -Irene group, 1,2-phenylene group or N-R group, M is a substituted or unsubstituted alkylene group or alkenylene group, or 1,2-arylene group, R ⁴² is an alkyl group, An aralkyl group or an alkoxyalkyl group, R ⁴¹ is a carbocyclic or heterocyclic divalent aromatic group, X ⁴ is a chlorine, bromine or iodine atom, and q = 0 and r = 1 Or q = 1 and r = 1 or 2.) A carbonylmethylene heterocyclic compound having a trihalogenomethyl group.

(However, X ⁵ is a halogen atom, t represents an integer of 1 to 3, s is an integer of 1 to 4, R ⁴³ is a hydrogen atom or a CH _3-t X _5t group, R ⁴⁴ is 4-halogeno-5- (halogenomethyl-phenyl) -oxazole derivative represented by s-valent unsaturated organic group which may be substituted.

(However, X ⁶ is a halogen atom, v represents an integer of 1 to 3, u is an integer of 1 to 4, R ⁴⁵ is a hydrogen atom or a CH _3-v X _6v group, R ⁴⁶ is a 2- (halogenomethyl-phenyl) -4-halogeno-oxazole derivative represented by a u-valent unsaturated organic group which may be substituted.

  Specific examples of such a compound having a carbon-halogen bond include, for example, compounds described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), such as 2-phenyl 4,6-bis. (Trichloromethyl) -S-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl)- S-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (2 ', 4'-dichlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2,4,6-tris (trichloromethyl) -S-triazine, 2-methyl-4,6-bis (trichloromethyl) -S-triazine, 2-n-nonyl-4,6- Bis (trichloromethyl) -S-triazine, 2- (α, α, β-trichloroethyl) -4,6-bis (trichloromethyl) -S-triazine and the like can be mentioned. In addition, compounds described in British Patent 1388492, for example, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methylstyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4-amino-6-trichloromethyl-S-triazine, etc. And compounds described in JP-A-53-133428, such as 2- (4-methoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- (4-ethoxy-naphtho) 1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- [4- (2-ethoxyethyl) -naphth-1-yl] -4,6-bis-trick Rumethyl-S-triazine, 2- (4,7-dimethoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine), 2- (acenaphtho-5-yl) -4,6- Bis-trichloromethyl-S-triazine and the like, compounds described in DE 3333724, for example,

Etc. Further, compounds described in J. Org. Chem. 29, 1527 (1964) by FC Schaefer et al., For example, 2-methyl-4,6-bis (tribromomethyl) -S-triazine, 2,4,6-tris ( Tribromomethyl) -S-triazine, 2,4,6-tris (dibromomethyl) -S-triazine, 2-amino-4-methyl-6-tribromomethyl-S-triazine, 2-methoxy-4-methyl- Examples include 6-trichloromethyl-S-triazine. Furthermore, compounds described in JP-A-62-258241, for example,

Etc. Further, compounds described in JP-A-5-281728, for example,

Etc. Alternatively, those skilled in the art can easily synthesize them according to the synthesis method described in MP Hutt, EF Elslager and LM Herbel, “Journal of Heterocyclic chemistry”, Vol. The following compound groups that can

Alternatively, compounds such as those described in German Patent 2,641,100, such as 4- (4-methoxy-styryl) -6- (3,3,3-trichloropropenyl) -2-pyrone and 4- (3 4,5-trimethoxy-styryl) -6-trichloromethyl-2-pyrone, or the compounds described in DE 33333450, for example

In the formula, R ⁴¹ represents a benzene ring, and R ⁴² represents an alkyl group, an aralkyl group or an alkoxyalkyl group.

Or a group of compounds described in German Patent No. 3021590,

Alternatively, a group of compounds described in German Patent No. 3021599, for example,

Can be mentioned.
As a still more preferable example of the photopolymerization initiator in the present invention, the above-mentioned (a) aromatic ketones, (b) aromatic onium salt, (c) organic peroxide, (e) hexaarylbiimidazole, ( i) metallocene compounds, (k) compounds having a carbon halogen bond, and most preferred examples include aromatic iodonium salts, aromatic diazonium salts, titanocene compounds, trihalomethyl represented by the general formula [IV] -S-triazine compounds can be mentioned.
The photopolymerization initiator in the present invention is preferably used alone or in combination of two or more.
Next, examples of the sensitizing dye that can be one component of the photopolymerizable composition of the present invention include a spectral sensitizing dye and a dye or pigment that absorbs light from a light source and interacts with a photopolymerization initiator.
Preferred spectral sensitizing dyes or dyes include polynuclear aromatics (eg, pyrene, perylene, triphenylene) xanthenes (eg, fluorescein, eosin, erythrosine, rhodamine B, rose bengalcyanines (eg, thiacarbocyanine, oxaxene). Carbocyanines) merocyanines (eg merocyanine, carbomerocyanine) thiazines (eg thionine, methylene blue, toluidine blue) acridines (eg acridine orange, chloroflavin, acriflavine) phthalocyanines (eg phthalocyanine, metal phthalocyanine) porphyrins (Eg, tetraphenylporphyrin, central metal substituted porphyrin) chlorophylls (eg, chlorophyll, chlorophyllin, central metal substituted chlorophyll) Metal complex, for example

Anthraquinones, such as (anthraquinone) squalium, such as (squarium), may be mentioned. Examples of more preferable spectral sensitizing dyes or dyes are styryl dyes described in JP-B-37-13034, for example,

Cationic dyes described in JP-A-62-143044, such as

Quinoxalinium salts described in JP-B-59-24147, for example,

New methylene blue compounds described in JP-A No. 64-33104, for example,

Anthraquinones described in JP-A No. 64-56767, for example

Benzoxanthene dyes described in JP-A-2-1714. Acridines described in JP-A-2-226148 and JP-A-2-226149, for example,

Pyrylium salts described in Japanese Patent Publication No. 40-28499, such as

Cyanines described in JP-B-46-42363, for example

Benzofuran dyes described in JP-A-2-63053, for example

Conjugated ketone dyes disclosed in JP-A-2-85858 and JP-A-2-216154, for example,

A dye described in JP-A-57-10605. Azocinnamylidene derivatives described in JP-B-2-30321, for example,

Cyanine dyes described in JP-A-1-287105, for example,

Xanthene dyes described in JP-A-62-31844, JP-A-62-31848, JP-A-62-143043, for example,

Aminostyryl ketones described in JP-B-59-28325, such as

Merocyanine dyes represented by the following general formulas [1] to [8] described in JP-B 61-9621, for example,

In the general formulas [3] to [8], X ⁸ represents a hydrogen atom, an alkyl group, a substituted alkyl group, an alkoxy group, an aryl group, a substituted aryl group, an aryloxy group, an aralkyl group or a halogen atom. In the general formula [2], Ph represents a phenyl group. In the general formulas [1] to [8], R ⁴⁸ , R ⁴⁹ and R ⁵⁰ each represents an alkyl group, a substituted alkyl group, an alkenyl group, an aryl group, a substituted aryl group or an aralkyl group. Good. Dyes represented by the following general formulas [9] to [11] described in JP-A-2-17943, for example,

A: represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, an alkyl or aryl-substituted nitrogen atom or a dialkyl-substituted carbon atom. Y ^{3 represents a} hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, or a substituted alkoxycarbonyl group. R ⁵¹ , R ⁵² : a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, or R ⁵³ O— as a substituent,

_{- (CH 2 CH 2 O)} w-R 53, a substituted alkyl group having 1 to 18 carbon atoms having a halogen atom (F, Cl, Br, I ). R ⁵³ represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and B represents a dialkylamino group, a hydroxyl group, an acyloxy group, a halogen atom, or a nitro group. w represents an integer of 0 to 4, and x represents an integer of 1 to 20. Merocyanine dyes represented by the following general formula [12] described in JP-A-2-244050, for example,

(Wherein R ⁵⁴ and R ⁵⁵ each independently represents a hydrogen atom, an alkyl group, a substituted alkyl group, an alkoxycarbonyl group, an aryl group, a substituted aryl group or an aralkyl group. A ² represents an oxygen atom, a sulfur atom or a selenium atom. Represents a tellurium atom, an alkyl or aryl-substituted nitrogen atom, or a dialkyl-substituted carbon atom, X ⁹ represents a group of non-metallic atoms necessary to form a nitrogen-containing hetero five-membered ring, and Y ⁴ represents a substituted Z ³ represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an alkoxy group, a phenyl group, an unsubstituted or substituted polynuclear aromatic ring, or an unsubstituted or substituted heteroaromatic ring. group, an alkylthio group, an arylthio group, a substituted amino group, an acyl group or an alkoxycarbonyl group, together with Y ⁴ It may be bonded to form a ring.

Merocyanine dyes represented by the following general formula [13] described in JP-B-59-28326, for example,

In the above formula, R ⁵⁶ and R ⁵⁷ each represent a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group or an aralkyl group, which may be the same or different from each other. X ¹⁰ represents a substituent having a Hammett's sigma (σ) value in the range of −0.9 to +0.5. Merocyanine dyes represented by the following general formula [14] described in JP-A-59-89303, for example,

Wherein R ⁵⁸ and R ⁵⁹ each independently represent a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group or an aralkyl group. X ¹¹ is a Hammett sigma (σ) value of − (Y ⁵ represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, or an alkoxycarbonyl group.) As a preferred specific example,

Merocyanine dyes represented by the following general formula [15] described in JP-A-8-129257, for example

(Wherein R ⁶⁰ , R ⁶¹ , R ⁶² , R ⁶³ , R ⁶⁸ , R ⁶⁹ , R ⁷⁰ , R ⁷¹ are each independently a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted group) Aryl, hydroxyl, substituted oxy, mercapto, substituted thio, amino, substituted amino, substituted carbonyl, sulfo, sulfonate, substituted sulfinyl, substituted sulfonyl, phosphono, substituted phosphono, phosphonate A group, a substituted phosphonate group, a cyano group, a nitro group, or R ⁶⁰ and R ⁶¹ , R ⁶¹ and R ⁶² , R ⁶² and R ⁶³ , R ⁶⁸ and R ⁶⁹ , R ⁶⁹ and R ⁷⁰ , R ⁷⁰ R ⁷¹ may be bonded to each other to form an aliphatic or aromatic ring, R ⁶⁴ represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group, and R ⁶⁵ is substituted, or Unsubstituted arche Ruarukiru group, or a substituted or unsubstituted alkynylalkyl group, independently R ^66, R ⁶⁷ are each a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, a substituted carbonyl group As a preferred specific example,

A benzopyran dye represented by the following general formula [16] described in JP-A-8-334897, for example,

(Wherein R ^{72 to} R ⁷⁵ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group or an amino group. R ^{72 to} R ⁷⁵ are carbons to which they can be bonded respectively. A ring composed of a non-metal atom may be formed together with an atom, R ⁷⁶ represents a hydrogen atom, an alkyl group, an aryl group, a heteroaromatic group, a cyano group, an alkoxy group, a carboxy group or an alkenyl group, and R ⁷⁷ represents A group represented by R ⁷⁶ or —Z—R ⁷⁶ , wherein Z represents a carbonyl group, a sulfonyl group, a sulfinyl group or an arylene carbonyl group, and R ⁷⁶ and R ⁷⁷ together form a ring composed of a nonmetallic atom; A represents an O atom, S atom, NH or an N atom having a substituent, B represents an O atom, or a group of = C (G1) (G2), G1 and G2 may be the same or different. May be A hydrogen atom, a cyano group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyl group, an arylcarbonyl group, an alkylthio group, an arylthio group, an alkylsulfonyl group, an arylsulfonyl group, or a fluorosulfonyl group, provided that G1 and G2 are the same. G1 and G2 may form a ring composed of a nonmetallic atom together with a carbon atom, and a short wave type ketone-based and styryl-based dye described in EP1048982A1, such as the following chemical structure. Etc.

In addition, the following infrared absorbers (dyes or pigments) are also preferably used as sensitizing dyes.
Preferred examples of the dye include cyanine dyes described in JP-A-58-125246, JP-A-59-84356, JP-A-59-202829, JP-A-60-78787, and the like. Examples include cyanine dyes described in Japanese Patent No. 434,875.

  Further, near infrared absorption sensitizers described in US Pat. No. 5,156,938 are also preferably used, and further substituted aryl benzoates described in US Pat. No. 3,881,924 are also used. (Thio) pyrylium salt, trimethine thiapyrylium salt described in JP-A-57-142645 (US Pat. No. 4,327,169), JP-A 58-181051, 58-220143, 59 -41363, 59-84248, 59-84249, 59-146063, 59-146061, pyranyl compounds described in JP-A-59-216146, cyanine dyes described in US The pentamethine thiopyrylium salt described in Japanese Patent No. 4,283,475, and the like described in Japanese Patent Publication Nos. 5-13514 and 5-19702 That pyrylium compounds are also preferably used.

  In addition, near infrared absorbing dyes described as formulas (I) and (II) in US Pat. No. 4,756,993 and phthalocyanine dyes described in EP 916513A2 are also preferable dyes. Can do.

  Furthermore, the anionic infrared absorber described in Japanese Patent Application No. 10-79912 can also be suitably used. An anionic infrared absorbing agent refers to an anionic infrared absorbing agent having an anionic structure without a cationic structure in the mother nucleus of a dye that substantially absorbs infrared rays. Examples include (c1) anionic metal complexes, (c2) anionic carbon black, (c3) anionic phthalocyanine, and (c4) a compound represented by the following general formula 6. The counter cation of these anionic infrared absorbers is a monovalent cation containing a proton or a polyvalent cation.

  Here, the (c1) anionic metal complex refers to a substance that becomes an anion in the central metal and the entire ligand of the complex part that substantially absorbs light.

  Examples of (c2) anionic carbon black include carbon black to which anionic groups such as sulfonic acid, carboxylic acid, and phosphonic acid groups are bonded as substituents. In order to introduce these groups into carbon black, as described in Carbon Black Handbook 3rd Edition (Edited by Carbon Black Association, April 5, 1995, published by Carbon Black Association), page 12, What is necessary is just to take means, such as oxidizing carbon black.

  (C3) Anionic phthalocyanine refers to a phthalocyanine skeleton bonded with the anionic group previously mentioned in the description of (c2) as a substituent to form an anion as a whole.

Next, the compound represented by (c4) general formula 6 will be described in detail. In Formula 6, G _a ^- represents an anionic substituent, G _b represents a neutral substituent. X ^{m +} represents a 1 to m-valent cation containing a proton, and m represents an integer of 1 to 6. M represents a conjugated chain, and this conjugated chain M may have a substituent or a ring structure. The conjugated chain M can be represented by the following formula.

In the above formula, R ¹ , R ² and R ³ are each independently a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, It represents an oxy group or an amino group, and these may be linked to each other to form a ring structure. n represents an integer of 1 to 8.

  Of the anionic infrared absorbers represented by the general formula 6, those of the following A-1 to A-5 are preferably used.

  Moreover, the cationic infrared absorber shown to the following CA-1 to CA-44 can also be used preferably.

In the structural formula, T ⁻ represents a monovalent counter anion, preferably a halogen anion (F ⁻ , Cl ⁻ , Br ⁻ , I ⁻ ), a Lewis acid anion (BF ₄ −, PF ₆ ⁻ , SbCl _6). ⁻ , ClO ₄ ⁻ ), an alkyl sulfonate anion, and an aryl sulfonate anion.

  The alkyl of the alkyl sulfonic acid means a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, a butyl group. , Pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, hexadecyl, octadecyl, eicosyl, isopropyl, isobutyl, s-butyl, t- A butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group, and 2-norbornyl group can be exemplified. Of these, linear alkyl groups having 1 to 12 carbon atoms, branched alkyl groups having 3 to 12 carbon atoms, and cyclic alkyl groups having 5 to 10 carbon atoms are more preferable.

  The aryl of the aryl sulfonic acid includes one consisting of one benzene ring, two or three benzene rings forming a condensed ring, and one having a benzene ring and a 5-membered unsaturated ring forming a condensed ring. Specific examples thereof include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenabutenyl group, and a fluorenyl group. Among these, a phenyl group and a naphthyl group are more preferable.

  Moreover, the nonionic infrared absorber shown to the following NA-1 to NA-12 can also be used preferably.

  Among the exemplified compounds, A-1 is a particularly preferable anionic infrared absorber, and CA-7, CA-30, CA-40, and CA-42 are nonionic infrared absorbers as cationic infrared absorbers. As NA-11.

  As other dyes, commercially available dyes and known dyes described in documents such as “Dye Handbook” (edited by the Society for Synthetic Organic Chemistry, published in 1970) can be used. Specifically, dyes such as azo dyes, metal complex azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, diimmonium dyes, aminium dyes, squarylium dyes, metal thiolate complexes, etc. Is mentioned.

  As other sensitizing dyes, commercially available pigments and color index (CI) manuals, “Latest Pigment Handbook” (edited by the Japan Pigment Technology Association, published in 1977), “Latest Pigment Applied Technology” ( CMC Publishing, published in 1986), “Printing Ink Technology”, published by CMC Publishing, published in 1984) can be used. For example, types of pigments include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and other polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments In addition, quinophthalone pigments, dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, and the like can be used. Among these pigments, carbon black is preferable.

These pigments may be used without surface treatment, or may be used after surface treatment.
The surface treatment method includes a method of surface coating with a resin or wax, a method of attaching a surfactant, a method of bonding a reactive substance (eg, silane coupling agent, epoxy compound, polyisocyanate, etc.) to the pigment surface, etc. Can be considered. The surface treatment methods are described in “Characteristics and Applications of Metal Soap” (Sachibo), “Printing Ink Technology” (CMC Publishing, 1984) and “Latest Pigment Application Technology” (CMC Publishing, 1986). Yes.

  The particle diameter of the pigment is preferably 0.01 μm to 10 μm, more preferably 0.05 μm to 1 μm, and particularly preferably 0.1 μm to 1 μm. When the particle diameter of the pigment is less than 0.01 μm, it is not preferable from the viewpoint of stability of the dispersion in the image recording layer coating solution, and when it exceeds 10 μm, it is not preferable from the viewpoint of uniformity of the image recording layer.

  As a method for dispersing the pigment, a known dispersion technique used in ink production, toner production, or the like can be used. Examples of the disperser include an ultrasonic disperser, a sand mill, an attritor, a pearl mill, a super mill, a ball mill, an impeller, a disperser, a KD mill, a colloid mill, a dynatron, a three-roll mill, and a pressure kneader. Details are described in "Latest Pigment Applied Technology" (CMC Publishing, 1986).

Still more preferred examples of the sensitizing dye in the present invention include the merocyanine dye described in JP-B-61-9621, the merocyanine dye described in JP-A-2-179634, the merocyanine dye described in JP-A-2-244050, and the like. A merocyanine dye described in JP-A-59-28326, a merocyanine dye described in JP-A-59-89303, a merocyanine dye described in JP-A-8-129257, a benzopyran dye described in JP-A-8-334897, and a short wave type described in EP1048982A1 Mention may be made of ketone and styryl dyes.
Furthermore, the infrared absorber described in the above-mentioned JP-A-11-209001 can be mentioned.
The sensitizing dye in the present invention is also preferably used alone or in combination of two or more. Furthermore, the photopolymerizable composition of the present invention may contain a known compound having a function of further improving sensitivity or suppressing inhibition of polymerization by oxygen as a co-sensitizer.

  Examples of such co-sensitizers include amines such as MR Sander et al., “Journal of Polymer Society”, Vol. 10, page 3173 (1972), Japanese Patent Publication No. 44-20189, Japanese Patent Laid-Open No. 51-82102, Compounds described in JP-A-52-134692, JP-A-59-138205, JP-A-60-84305, JP-A-62-18537, JP-A-64-33104, Research Disclosure 33825, etc. Specific examples include triethanolamine, p-dimethylaminobenzoic acid ethyl ester, p-formyldimethylaniline, p-methylthiodimethylaniline, and the like.

  Other examples of co-sensitizers include thiols and sulfides such as thiol compounds described in JP-A-53-702, JP-B-55-500806, JP-A-5-142773, and JP-A-56-75643. Specific examples include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-4 (3H) -quinazoline, β-mercaptonaphthalene, and the like. .

  Other examples include amino acid compounds (eg, N-phenylglycine), organometallic compounds described in Japanese Patent Publication No. 48-42965 (eg, tributyltin acetate), and hydrogen donors described in Japanese Patent Publication No. 55-34414. Sulfur compounds described in JP-A-6-308727 (eg, trithiane), phosphorus compounds described in JP-A-6-250387 (diethyl phosphite, etc.), Si—H, Ge— described in Japanese Patent Application No. 6-191605 H compound and the like.

The usage-amount of the photoinitiator in the composition in this invention is 0.01-60 weight% with respect to the weight of all the components of a photopolymerizable composition, More preferably, it is 0.05-30 weight%.
Moreover, when using a sensitizing dye in this invention, the molar ratio of the photoinitiator in a photopolymerizable composition and a sensitizing dye is 100: 0 to 1:99, More preferably, it is 90: 10-10. : 90, and most preferably 80:20 to 20:80.
When using the above-mentioned co-sensitizer, it is appropriate to use 0.01 to 50 parts by weight with respect to 1 part by weight of the photopolymerization initiator.

[Linear organic polymer]
The photopolymerizable composition of the present invention preferably contains a linear organic polymer as a binder. As such “linear organic polymer”, any linear organic polymer having compatibility with a photopolymerizable ethylenically unsaturated compound may be used. Absent. Preferably, a linear organic high molecular weight polymer that is soluble in water or weakly alkaline water or swellable that enables water development or weak alkaline water development is selected. The linear organic polymer is appropriately selected and used depending on whether water, weak alkaline water or an organic solvent is used as a developer as well as a film forming agent of the composition. For example, when a water-soluble organic polymer is used, water development is possible. Examples of such linear organic high molecular polymers include addition polymers having a carboxylic acid group in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, and JP-B-sho. 54-25957, JP-A-54-92723, JP-A-59-53836, JP-A-59-71048, ie, methacrylic acid copolymer, acrylic acid copolymer, itacon Examples include acid copolymers, crotonic acid copolymers, maleic acid copolymers, and partially esterified maleic acid copolymers. Similarly, there is an acidic cellulose derivative having a carboxylic acid group in the side chain. In addition, those obtained by adding a cyclic acid anhydride to an addition polymer having a hydroxyl group are useful. Among these, [benzyl (meth) acrylate / (meth) acrylic acid / other addition-polymerizable vinyl monomers as required] copolymer and [allyl (meth) acrylate / (meth) acrylic acid / as required Other addition-polymerizable vinyl monomers] copolymers are preferred. In addition, polyvinyl pyrrolidone, polyethylene oxide, and the like are useful as the water-soluble linear organic polymer. In order to increase the strength of the cured film, alcohol-soluble polyamide, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin are also useful.

In particular, as the linear organic polymer, an alkali-soluble polyurethane resin described in JP-A No. 11-352691 is preferable from the viewpoints of reactivity and compatibility.
The molecular weight of the polyurethane resin used in the photopolymerizable composition of the present invention is preferably 1000 or more, more preferably 5000 to 500,000 in terms of weight average.
These polymer compounds may be used alone or in combination.
Specific examples of the polyurethane resin include the following compounds, but are not limited thereto. Most of the specific examples are shown by combinations of the diisocyanate compound and the diol compound used. Moreover, carboxyl group content is shown as an acid value.

  These linear organic high molecular polymers can be mixed in an arbitrary amount in the entire composition. However, when it exceeds 90% by weight with respect to the weight of all the components of the composition, it does not give favorable results in terms of the image strength to be formed. Preferably it is 30 to 85%. The photopolymerizable ethylenically unsaturated compound and the linear organic polymer are preferably in the range of 1/9 to 7/3 by weight. A more preferable range is 3/7 to 5/5.

In addition, in the present invention, in order to prevent unnecessary thermal polymerization of a compound having an ethylenically unsaturated double bond that can be polymerized during production or storage of the photopolymerizable composition in addition to the basic components described above. It is desirable to add a small amount of thermal polymerization inhibitor. Suitable thermal polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol ), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like. The addition amount of the thermal polymerization inhibitor is preferably about 0.01% by weight to about 5% by weight with respect to the weight of the total composition. If necessary, higher fatty acid derivatives such as behenic acid and behenic acid amide may be added to prevent polymerization inhibition due to oxygen and unevenly distributed on the surface of the photosensitive layer during the drying process after coating. Good. The amount of the higher fatty acid derivative added is preferably from about 0.5% to about 10% by weight of the total composition.

Further, a dye or a pigment may be added for the purpose of coloring the photosensitive layer. Thereby, so-called plate inspection properties such as visibility after plate making and suitability for an image density measuring machine as a printing plate can be improved. As the colorant, many dyes cause a decrease in the sensitivity of the photopolymerization type photosensitive layer. Therefore, it is particularly preferable to use a pigment as the colorant. Specific examples include pigments such as phthalocyanine pigments, azo pigments, carbon black and titanium oxide, and dyes such as ethyl violet, crystal violet, azo dyes, anthraquinone dyes, and cyanine dyes. The amount of dye and pigment added is preferably about 0.5% to about 5% by weight of the total composition.

Other Additives In addition, known additives such as inorganic fillers, other plasticizers, and oil sensitizers that can improve the ink inking property on the surface of the photosensitive layer may be added to improve the physical properties of the cured film. Good.

  Examples of plasticizers include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. 10% by weight or less based on the total weight of the compound having a polymerizable unsaturated double bond and the binder can be added.

  Further, for the purpose of improving the film strength (printing durability), which will be described later, a UV initiator, a thermal crosslinking agent, or the like can be added to enhance the effect of heating and exposure after development.

  In addition, it is possible to provide an additive and an intermediate layer for improving the adhesion between the photosensitive layer and the support, and improving the development removability of the unexposed photosensitive layer. For example, by adding or undercoating a compound having a relatively strong interaction with the substrate, such as a compound having a diazonium structure or a phosphone compound, adhesion can be improved and printing durability can be increased. By adding or undercoating a hydrophilic polymer such as acid or polysulfonic acid, the developability of the non-image area is improved, and the stain resistance can be improved.

  When the photopolymerizable composition of the present invention is applied on a support, it is dissolved in various organic solvents and used. Solvents used here include acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, Acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 3-methoxypropanol, methoxymethoxyethanol, diethylene glycol monomethyl ether, Ethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N, N-dimethylformamide, dimethyl sulfoxide, γ-butyrolactone, methyl lactate, lactic acid There are ethyl and the like. These solvents can be used alone or in combination. The solid content in the coating solution is suitably 2 to 50% by weight.

The coating amount of the support for the photosensitive layer mainly affects the sensitivity of the photosensitive layer, the developability, the strength of the exposed film, and the printing durability, and is preferably selected as appropriate according to the application. When the coating amount is too small, the printing durability is not sufficient. On the other hand, if the amount is too large, the sensitivity is lowered, it takes time for exposure, and a longer time is required for development processing, which is not preferable. As is the principal object lithographic printing plate for scan exposure of the present invention, the coating amount in the range of about 0.1 g / m ² ~ about 10 g / m ² in weight after drying is suitable. More preferably from 0.5 to 5 g / m ^2.

"Support"
In order to obtain a lithographic printing plate, which is one of the main objects of the present invention, it is desirable to provide the photosensitive layer on a support having a hydrophilic surface. As the hydrophilic support, a conventionally known hydrophilic support used in a lithographic printing plate can be used without limitation. The support used is preferably a dimensionally stable plate, for example, paper, paper laminated with plastic (eg, polyethylene, polypropylene, polystyrene, etc.), metal plate (eg, aluminum, zinc). , Copper, etc.), plastic films (for example, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.) Such as paper or plastic film laminated or vapor-deposited with metal, and known physical and chemical treatments suitable for the purpose of imparting hydrophilicity and improving the strength as necessary. May be applied.

  In particular, preferred supports include paper, polyester film or aluminum plate, among which dimensional stability is good, relatively inexpensive, and a surface with excellent hydrophilicity and strength is provided by surface treatment as required. An aluminum plate which can be used is particularly preferred. A composite sheet in which an aluminum sheet is bonded on a polyethylene terephthalate film as described in Japanese Patent Publication No. 48-18327 is also preferable.

  A suitable aluminum plate is a pure aluminum plate or an alloy plate containing aluminum as a main component and containing a trace amount of foreign elements, and may also be a plastic film on which aluminum is laminated or vapor-deposited. Examples of foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, and titanium. The content of foreign elements in the alloy is at most 10% by weight. Particularly suitable aluminum in the present invention is pure aluminum, but completely pure aluminum is difficult to produce in the refining technique, and may contain slightly different elements. Thus, the composition of the aluminum plate applied to the present invention is not specified, and conventionally known and used aluminum plates can be appropriately used. The thickness of the aluminum plate used in the present invention is about 0.1 mm to 0.6 mm, preferably 0.15 mm to 0.4 mm, and particularly preferably 0.2 mm to 0.3 mm.

  In the case of a support having a surface of metal, particularly aluminum, roughening (graining) treatment, immersion treatment in an aqueous solution of sodium silicate, potassium fluoride zirconate, phosphate, etc., or anodic oxidation treatment, etc. It is preferable that surface treatment is performed.

  The surface roughening treatment of the aluminum plate is performed by various methods. For example, a method of mechanically roughening, a method of electrochemically dissolving and roughening a surface, and a method of selectively dissolving a surface chemically. This is done by the method of As the mechanical method, known methods such as a ball polishing method, a brush polishing method, a blast polishing method, a buffing method, and a polishing method can be used. In addition, as an electrochemical surface roughening method, there is a method of performing alternating current or direct current in an electrolytic solution such as hydrochloric acid or nitric acid. Further, as disclosed in JP-A-54-63902, a method in which both are combined can also be used. Further, prior to roughening the aluminum plate, for example, a degreasing treatment with a surfactant, an organic solvent, an alkaline aqueous solution, or the like is performed in order to remove rolling oil on the surface, if desired.

  Furthermore, an aluminum plate that has been roughened and then immersed in an aqueous sodium silicate solution can be preferably used. As described in Japanese Examined Patent Publication No. 47-5125, an aluminum plate which has been anodized and then immersed in an aqueous solution of an alkali metal silicate is preferably used. The anodizing treatment is carried out in an electrolytic solution in which an inorganic acid such as phosphoric acid, chromic acid, sulfuric acid or boric acid, or an organic acid such as oxalic acid or sulfamic acid, or a salt solution thereof, or a combination of two or more thereof, is used. This is carried out by passing an electric current with the aluminum plate as the anode.

  Silicate electrodeposition as described in US Pat. No. 3,658,662 is also effective.

  Furthermore, a combination of a support with electrolytic grains as disclosed in JP-B-46-27481, JP-A-52-58602, JP-A-52-30503, and the above-mentioned anodizing treatment and sodium silicate treatment Surface treatment is also useful.

  Further, those obtained by performing mechanical surface roughening, chemical etching, electrolytic graining, anodizing treatment, and sodium silicate treatment in this order as disclosed in JP-A-56-28893 are also suitable.

  Furthermore, after performing these treatments, water-soluble resins such as polyvinylphosphonic acid, polymers and copolymers having sulfonic acid groups in the side chain, polyacrylic acid, water-soluble metal salts (for example, zinc borate) or Those having a primer such as a yellow dye or an amine salt are also suitable.

  Further, a sol-gel treated substrate in which a functional group capable of causing an addition reaction by a radical as disclosed in JP-A-7-159983 is covalently used.

  As another preferred example, a substrate provided with a water-resistant hydrophilic layer as a surface layer on an arbitrary support can be raised. As such a surface layer, for example, a layer comprising an inorganic pigment and a binder described in US Pat. No. 3,055,295 or JP-A-56-13168, a hydrophilic swelling layer described in JP-A-9-80744, and JP-T 8- Examples thereof include sol-gel films composed of titanium oxide, polyvinyl alcohol, silicic acids described in No. 507727.

  These hydrophilic treatments are performed to make the surface of the support hydrophilic, in order to prevent harmful reaction of the photopolymerizable composition provided thereon, and to improve the adhesion of the photosensitive layer. It is given for the purpose.

"Protective layer"
In the present invention, in the lithographic printing plate for scanning exposure, since the normal exposure is performed in the atmosphere, a protective layer can be further provided on the layer of the photopolymerizable composition. The protective layer prevents a low molecular weight compound such as a basic substance existing in the atmosphere that inhibits an image forming reaction caused by exposure in the photosensitive layer from being mixed into the photosensitive layer, and enables exposure in the air. Therefore, the properties desired for such a protective layer are low permeability of the low-molecular compound, and further, the transmission of light used for exposure is not substantially inhibited, the adhesiveness with the photosensitive layer is excellent, and It is desirable that it can be easily removed in the development process after exposure. Such a device for the protective layer has been conventionally devised, and is described in detail in US Pat. No. 3,458,311 and JP-A-55-49729. As a material that can be used for the protective layer, for example, a water-soluble polymer compound that is relatively excellent in crystallinity is preferably used. Specifically, polyvinyl alcohol, polyvinyl pyrrolidone, acidic celluloses, gelatin, gum arabic, Water-soluble polymers such as acrylic acid are known, but among these, the use of polyvinyl alcohol as a main component gives the best results in terms of basic properties such as oxygen barrier properties and development removability. The polyvinyl alcohol used for the protective layer may be partially substituted with an ester, an ether, and an acetal as long as it contains an unsubstituted vinyl alcohol unit for having necessary oxygen barrier properties and water solubility. Similarly, some of them may have other copolymer components. Specific examples of polyvinyl alcohol include those having a hydrolysis rate of 71 to 100 mol% and a molecular weight in the range of 300 to 2400 in terms of weight average molecular weight. Specifically, Kuraray Co., Ltd. PVA-105, PVA-110, PVA-117, PVA-117H, PVA-120, PVA-124, PVA-124H, PVA-CS, PVA-CST, PVA-HC, PVA-203, PVA-204, PVA-205, PVA-210, PVA-217, PVA-220, PVA-224, PVA-217EE, PVA-217E, PVA-220E, PVA-224E, PVA-405, PVA- 420, PVA-613, L-8 and the like.

  The components of the protective layer (selection of PVA, use of additives), coating amount, etc. are selected in consideration of fogging, adhesion, and scratch resistance in addition to low molecular substance blocking properties and development removability. In general, the higher the hydrolysis rate of the PVA used (the higher the content of unsubstituted vinyl alcohol units in the protective layer), the higher the film thickness, the lower the blocking of low molecular substances, which is advantageous in terms of sensitivity. . However, when the blocking property of the low molecular weight substance is extremely increased, there arises a problem that unnecessary polymerization reaction occurs during production and raw storage, and unnecessary fogging and image line thickening occur during image exposure. In addition, adhesion to the image area and scratch resistance are extremely important in handling the plate. That is, when a hydrophilic layer made of a water-soluble polymer is laminated on an oleophilic polymer layer, film peeling due to insufficient adhesion tends to occur. On the other hand, various proposals have been made to improve the adhesion between these two layers. For example, in U.S. Pat. Nos. 292501 and 44563, 20-60 wt% of an acrylic emulsion or a water-insoluble vinylpyrrolidone-vinyl acetate copolymer is mixed in a hydrophilic polymer mainly composed of polyvinyl alcohol. It is described that sufficient adhesion can be obtained by laminating on a polymerized layer. Any of these known techniques can be applied to the protective layer in the present invention. Such a coating method of the protective layer is described in detail in, for example, US Pat. No. 3,458,311 and JP-A-55-49729.

Furthermore, other functions can be imparted to the protective layer. For example, when laser light is used as the light source, the photosensitive composition is excellent in photosensitivity at the wavelength of the light source, but may not be sensitized at other wavelengths. For example, if the light source is in the infrared region of 750 nm or more, it can be used in a substantially bright room, but in fact, it may be sensitive to short-wave light such as light from a fluorescent lamp. In that case, it is preferable to add a colorant (such as a water-soluble dye) that is excellent in light transmittance of the light source and can efficiently absorb light having a wavelength of less than 700 nm.
As another example, if the light source is in the ultraviolet region of 450 nm or less, it can be used under a safelight substantially. However, in actuality, there are cases where exposure is made with visible light of 500 nm or more. In that case, the addition of a colorant (such as a water-soluble dye) that excels in light transmittance of the light source and can efficiently absorb light of 500 nm or more can further enhance the suitability for safelight without causing a decrease in sensitivity. be able to.

  When a photosensitive material using the photopolymerizable composition of the present invention is used as an image forming material, usually, after image exposure, an unexposed portion of the photosensitive layer is removed with a developer to obtain an image. Preferred developers when using these photopolymerizable compositions in the preparation of lithographic printing plates include those described in JP-B-57-7427, such as sodium silicate and potassium silicate. , Sodium hydroxide, potassium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic ammonium phosphate, dibasic ammonium phosphate, sodium metasilicate, sodium bicarbonate, aqueous ammonia etc. A suitable inorganic alkaline agent or an aqueous solution of an organic alkaline agent such as monoethanolamine or diethanolamine is suitable. Such an alkaline solution is added so that the concentration is 0.1 to 10% by weight, preferably 0.5 to 5% by weight.

  Such an alkaline aqueous solution can contain a small amount of an organic solvent such as a surfactant, benzyl alcohol, 2-phenoxyethanol, or 2-butoxyethanol as necessary. Examples thereof include those described in US Pat. Nos. 3,375,171 and 3,615,480.

  Further, the developers described in JP-A-50-26601, 58-54341, JP-B-56-39464, and 56-42860 are also excellent.

In addition, as the plate making process of the lithographic printing plate precursor, which is a suitable application of the photopolymerizable composition of the present invention, the entire surface is heated before, during, and from exposure to development as necessary. Also good. By such heating, an image forming reaction in the photosensitive layer is promoted, and advantages such as improvement in sensitivity and printing durability and stabilization of sensitivity may occur. Further, for the purpose of improving the image strength and printing durability, it is also effective to carry out whole surface post-heating or whole surface exposure on the developed image. Usually, heating before development is preferably performed under mild conditions of 150 ° C. or less. If the temperature is too high, problems such as covering the non-image area occur. Very strong conditions are used for heating after development. Usually, it is the range of 200-500 degreeC. If the temperature is low, sufficient image strengthening action cannot be obtained. If the temperature is too high, problems such as deterioration of the support and thermal decomposition of the image area occur.
As a method for exposing a scanning exposure lithographic printing plate according to the present invention, a known method can be used without limitation. A laser is preferable as the light source. For example, the following can be used as an available laser light source having a wavelength of 350 to 450 nm.

As a gas laser, Ar ion laser (364 nm, 351 nm, 10 mW to 1 W), Kr ion laser (356 nm, 351 nm, 10 mW to 1 W), He—Cd laser (441 nm, 325 nm, 1 mW to 100 mW),
As solid laser, Nd: YAG (YVO ₄ ) and SHG crystal × 2 combinations (355 mm, 5 mW to 1 W), Cr: LiSAF and SHG crystal combination (430 nm, 10 mW),
As a semiconductor laser system, KNbO ₃ , ring resonator (430 nm, 30 mW), waveguide type wavelength conversion element and AlGaAs, InGaAs semiconductor combination (380 nm to 450 nm, 5 mW to 100 mW), waveguide type wavelength conversion element and AlGaInP, AlGaAs Combination of semiconductors (300 nm to 350 nm, 5 mW to 100 mW), AlGaInN (350 nm to 450 nm, 5 mW to 30 mW)
In addition, N ₂ laser (337 nm, pulse 0.1 to 10 mJ) as pulse laser, XeF (351 nm, pulse 10 to 250 mJ)

  Among them, an AlGaInN semiconductor laser (commercially available InGaN-based semiconductor laser 400 to 410 nm, 5 to 30 mW) is preferable in terms of wavelength characteristics and cost.

  Other available light sources from 450 nm to 700 nm include Ar + laser-(488 nm), YAG-SHG laser (532 nm), He-Ne laser (633 nm), He-Cd laser, red semiconductor laser (650-690 nm), and As an available light source of 700 nm to 1200 nm, a semiconductor laser (800 to 850 nm) and an Nd-YAG laser (1064 nm) can be suitably used.

  Other ultra high pressure, high pressure, medium pressure, low pressure mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, ultraviolet laser lamps (ArF excimer laser, KrF excimer laser, etc.), radiation as electron beam, X Although a line, an ion beam, a far-infrared ray, etc. can be used, the above-mentioned laser light source of 350 nm or more is particularly preferable in terms of low cost.

  The exposure mechanism may be any of an internal drum system, an external drum system, a flat bed system, and the like. The photosensitive layer component of the present invention can be made soluble in neutral water or weak alkaline water by using a highly water-soluble component. A lithographic printing plate having such a structure is placed on a printing machine. After loading, an exposure-development system can be performed on the machine.

  Moreover, as a use of the photopolymerizable composition by this invention, besides the planographic printing plate for scanning exposure, it can apply without limitation to what is widely known as a use of photocurable resin. For example, by applying to a liquid photopolymerizable composition used in combination with a cationically polymerizable compound as required, a highly sensitive optical modeling material can be obtained. Further, a hologram material can be obtained by utilizing a change in refractive index accompanying photopolymerization. It can be applied to various transfer materials (peeling sensitive material, toner developing sensitive material, etc.) by utilizing the change in surface tackiness due to photopolymerization. It can also be applied to photocuring of microcapsules. It can also be applied to the production of electronic materials such as photoresists, and photocurable resin materials such as inks, paints and adhesives.

  EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these Examples. In addition, Example 1, 2, 6, 8-11, 14, 17, 18 and 22 shall be read as Reference Example 1, 2, 6, 8-11, 14, 17, 18 and 22, respectively.

[Synthesis of a compound having a structure represented by the general formula (I) of the present invention]
<General synthesis method>
In general, the compound of the present invention (crosslinking agent having a structure represented by the general formula (I)) can be easily synthesized by, for example, the following method 1 and method 2. (Method 1: General formula (a))

(Method 2: in the case of general formula (b))

<Synthesis Example 1: Synthesis of I-4: (Example of Method 1)>
Trimethylolbutane (0.2 mol), 2-methacryloylethyl isocyanate (Z = CH ₃ , R ¹ = CH ₂ CH ₂ ) (0.6 mol), dibutyltin dilaurate (0.002 mol), N, N'-dimethylacetamide (300 ml) was added, stirred at 50 ° C for 5 hours, returned to room temperature, and poured into water (1 liter) to precipitate crystals. After filtration and drying, the desired product I-1 was obtained in a yield of 90%. The structure of the compound was confirmed by NMR, MASS, and IR.

<Synthesis Example 2: Synthesis of I-20: (Example of Method 2)>
Hexamethylene diisocyanate (0.2 mol), 2-hydroxypropionic acid (above R ² = CH ₂ CH ₂ ) (0.6 mol), dibutyltin dilaurate (0.002 mol), N, N′-dimethyl Acetamide (300 ml) was added, stirred at 50 ° C. for 5 hours, and returned to room temperature, and then methyl 2-bromomethacrylate (above R ^a = H, X ² = CH ₃ ) (0.6 mol) was added and stirred. Triethylamine (0.6 mol) was added dropwise over 1 hour. After dropping, the mixture was stirred for 3 hours and poured into water (1 liter) to precipitate crystals. After filtration and drying, the target product I-20 was obtained in a yield of 85%. The structure of the compound was confirmed by NMR, MASS, and IR.
As described above, all the compounds shown in the specific examples can be synthesized.

[Example 1 of photopolymerizable composition]
(Preparation of support)
An aluminum plate having a thickness of 0.3 mm was etched by being immersed in 10% by weight sodium hydroxide at 60 ° C. for 25 seconds, washed with running water, neutralized with 20% by weight nitric acid, and then washed with water. This was subjected to an electrolytic surface roughening treatment in a 1 wt% aqueous nitric acid solution using a sinusoidal alternating waveform current at an anode time electricity of 300 coulomb / dm ² . Subsequently, after dipping in a 1% by weight aqueous sodium hydroxide solution at 40 ° C. for 5 seconds and then in a 30% by weight sulfuric acid aqueous solution and desmutting at 60 ° C. for 40 seconds, the current density in a 20% by weight sulfuric acid aqueous solution was 2A / current density. At dm ² , the anodization treatment was performed for 2 minutes so that the thickness of the anodized film was 2.7 g / m ² . When the surface roughness was measured, it was 0.3 μm (Ra display according to JIS B0601).

The following sol-gel reaction liquid was applied to the back surface of the substrate thus treated with a bar coater, dried at 100 ° C. for 1 minute, and a support provided with a backcoat layer having a coating amount after drying of 70 mg / m ^2. It was created.

Sol-gel reaction solution Tetraethyl silicate 50 parts by weight Water 20 parts by weight Methanol 15 parts by weight Phosphoric acid 0.05 parts by weight

  When the above components were mixed and stirred, heat generation started in about 5 minutes. After reacting for 60 minutes, a backcoat coating solution was prepared by adding the following solution.

Pyrogallol formaldehyde condensation resin (molecular weight 2000) 4 parts by weight Dimethyl phthalate 5 parts by weight Fluorosurfactant (N-butyl perfluorooctane 0.7 parts by weight Sulfonamidoethyl acrylate / polyoxyethylene acrylate copolymer: molecular weight 20,000)
Methanol silica sol (manufactured by Nissan Chemical Industries, Ltd., 50 parts by weight methanol 30% by weight)
800 parts by weight of methanol

(Preparation of photosensitive layer)
A photopolymerizable composition (photosensitive layer forming solution) having the following composition was applied on the thus treated aluminum plate so that the dry coating amount was 1.5 g / m ² and dried at 100 ° C. for 1 minute. Layers were formed.

(Photosensitive layer forming solution)
The invention or comparative compound [X] in Table-1 below 0.8 g
Photopolymerization initiator [Y] in Table-1 below 0.3 g
Polymer binder [Z] in Table 1 below 1.2 g
Additives [S] in Table 1 below 0.4 g
Thermal polymerization inhibitor (N-nitrosophenyl 0.01 g
Hydroxylamine aluminum salt)
Pigment dispersion 2.0 g
Composition of pigment dispersion Composition: Pigment Blue 15: 6 15 parts by weight
Allyl methacrylate / methacrylic acid copolymer 10 parts by weight
(Copolymerization molar ratio 83/17)
15 parts by weight of cyclohexanone
20 parts by weight of methoxypropyl acetate
Propylene glycol monomethyl ether 40 parts by weight Methyl ethyl ketone 20 g
20 g of propylene glycol monomethyl ether

(Preparation of protective layer)
An aqueous solution of 3% by weight of polyvinyl alcohol (saponification degree: 98 mol%, polymerization degree: 550) was applied on the above-mentioned photosensitive layer so that the dry coating weight was 2 g / m ² and dried at 100 ° C. for 2 minutes.

(Evaluation of sensitivity)
The light-sensitive material thus obtained was subjected to sensitivity evaluation using different light sources depending on the exposure wavelength.
For example, exposure was performed in the atmosphere using a 410 nm semiconductor laser, a 532 nm FD-YAG laser, and an 830 nm semiconductor laser. Development was performed by immersing in a developer having the following composition at 25 ° C. for 10 seconds, and the sensitivity under each exposure condition was calculated in units of mJ / cm ² from the minimum exposure amount capable of forming an image. The smaller this value, the higher the sensitivity. However, if the light source wavelength is different, the amount of energy per photon is different. Therefore, even if it is simply considered, it is possible to sensitize even if the above-mentioned exposure amount is smaller as the wavelength becomes shorter. It becomes. Therefore, Table 2 is meaningless for sensitivity comparison between different exposure conditions, and is intended only to see the difference between the example and the comparative example under the same exposure condition. The results are shown in Table 2 below.

(Developer composition)
・ DP-4 (Fuji Photo Film) 65.0g
・ Water 880.0g
・ Lipomin LA (20% aqueous solution, manufactured by Lion Corporation) 50.0 g

(Evaluation of storage stability)
The photosensitive material before laser exposure is allowed to stand under high temperature conditions (60 ° C.) for 3 days, after which the photosensitive material after storage is subjected to laser exposure in the same manner as described above to calculate the amount of energy required for recording. The energy ratio (energy after high temperature storage / energy before high temperature storage) was determined. This energy ratio of 1.1 or less is preferable for production, and it can be said that the storage stability is also good. The evaluation results are also shown in Table 2 below.

(Print life)
The developed sample after the sensitivity evaluation was printed using a commercially available eco-ink using a Komori Corporation Co., Ltd. printer Lithlon, and the number of finished prints was used as an index of printing durability. In addition, the first example in each exposure of 410 nm, 532 nm, and 830 nm was used as a reference, and the relative value was expressed as 100. Therefore, the larger one is the higher printing durability. The evaluation results are also shown in Table 2 below.

  As is apparent from Table 2, the printing plate using the photopolymerizable composition of the present invention has high sensitivity, and has good storage stability and printing durability.

Claims (7)

A compound represented by the following general formula (I), an alkali-soluble urethane resin and a photopolymerization initiator are contained, and the compound represented by the following general formula (I) and the urethane resin are 3/7 to 5 by weight ratio. / 5, a photopolymerizable composition,
_{^{(Q 1) k -R- (Q}} 2) m Formula (I)
(In the formula, Q ¹ and Q ² each independently represent a group represented by the following general formula (a) or (b), R represents an n-valent hydrocarbon linking group, n is k + m, 6 represents an integer, k represents an integer of 0 to 6, and m represents an integer of 0 to 6.)

Wherein Z is H, CH ₃ or CHR ^b X ¹ , X ¹ and X ² are each independently a substituted oxy group, a substituted amino group or a substituted thio group, and R ¹ and R ² are aliphatic hydrocarbons In the linking group, R ^a and R ^b represent a hydrogen atom or a hydrocarbon group.) The compound represented by the general formula (I) is a polyfunctional compound in which either Q ¹ or Q ² represents a group represented by the following general formula (a), and n represents an integer of 3 to 6 The photopolymerizable composition according to claim 1, wherein

(In the formula, Z represents CH ₃ and R ¹ represents an aliphatic hydrocarbon linking group.)   The photopolymerizable composition according to claim 1 or 2, wherein the compound represented by the general formula (I) has two or more ester groups in the R portion. Furthermore, a sensitizing dye is contained, The photopolymerizable composition in any one of Claims 1-3 characterized by the above-mentioned. The photopolymerization initiator includes (a) aromatic ketones, (b) aromatic onium salt compounds, (c) organic peroxides, (d) thio compounds, (e) hexaarylbiimidazole compounds, (f) keto It is at least one selected from oxime ester compounds, (g) borate compounds, (h) azinium compounds, (i) metallocene compounds, (j) active ester compounds, and (k) compounds having a carbon halogen bond. The photopolymerizable composition according to any one of claims 1 to 4 . It has a photosensitive layer containing the photopolymerizable composition according to any one of claims 1 to 5 on a hydrophilic support, and exposure with a laser light source having a wavelength of 350 nm to 450 nm is possible. An original for a lithographic printing plate. It has a photosensitive layer containing the photopolymerizable composition according to any one of claims 1 to 5 on a hydrophilic support, and exposure with a laser light source having a wavelength of 450 nm to 700 nm is possible. An original for a lithographic printing plate.