JP4514291B2 - マイクロ波プラズマ処理装置及びプラズマ処理方法 - Google Patents

マイクロ波プラズマ処理装置及びプラズマ処理方法 Download PDF

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Publication number
JP4514291B2
JP4514291B2 JP2000195201A JP2000195201A JP4514291B2 JP 4514291 B2 JP4514291 B2 JP 4514291B2 JP 2000195201 A JP2000195201 A JP 2000195201A JP 2000195201 A JP2000195201 A JP 2000195201A JP 4514291 B2 JP4514291 B2 JP 4514291B2
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Prior art keywords
microwave
dielectric member
plasma processing
dielectric
processing apparatus
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Japanese (ja)
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JP2002016046A5 (enExample
JP2002016046A (ja
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敏雄 中西
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2000195201A 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法 Expired - Fee Related JP4514291B2 (ja)

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JP2000195201A JP4514291B2 (ja) 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法

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JP2000195201A JP4514291B2 (ja) 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法

Publications (3)

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JP2002016046A JP2002016046A (ja) 2002-01-18
JP2002016046A5 JP2002016046A5 (enExample) 2007-08-23
JP4514291B2 true JP4514291B2 (ja) 2010-07-28

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JP2000195201A Expired - Fee Related JP4514291B2 (ja) 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法

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Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2925535B2 (ja) * 1997-05-22 1999-07-28 キヤノン株式会社 環状導波路を有するマイクロ波供給器及びそれを備えたプラズマ処理装置及び処理方法
JP3979453B2 (ja) * 1998-01-14 2007-09-19 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
JP4004154B2 (ja) * 1998-10-20 2007-11-07 東京エレクトロン株式会社 プラズマ処理装置
JP2000173797A (ja) * 1998-12-01 2000-06-23 Sumitomo Metal Ind Ltd マイクロ波プラズマ処理装置

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