JP4508701B2 - Water treatment system for electronic component parts manufacturing equipment - Google Patents

Description

  The present invention is an electronic component member manufacturing that can efficiently supply and recover ultrapure water used in a manufacturing device for electronic component members such as semiconductor devices, flat display devices, electronic components or their manufacturing components and members. The present invention relates to an apparatus water treatment system.

  In a general ultrapure water production system, for example, pretreatment by filtration treatment etc. → primary pure water pretreatment by reverse osmosis membrane treatment etc. → primary pure water post treatment by ion exchange or deaeration treatment → ultraviolet ray oxidation, Ultrapure water with desired water quality is produced through secondary pure water treatment including ion exchange, deaeration, ultrafiltration treatment, and the like, and supplied to a predetermined use point (for example, Patent Document 1). Further, the remaining (unused) ultrapure water at the use point is generally returned to the inlet of the secondary pure water system or the like (for example, Patent Document 2).

  In the manufacturing process of electronic components, for example, in the semiconductor manufacturing process using a wafer, wafer acceptance → cleaning before film formation → film formation → lithography (resist application / exposure / development / peeling / cleaning) → etching / cleaning → film formation → wiring / Processing such as polishing / cleaning → post-process (wafer backside polishing, chip cutting, molding, etc.) is employed. As the water quality level required for each of these ultrapure water usage processes, for example, “super high grade water quality” is required in the pre-deposition cleaning / etching / cleaning process, and “high grade water quality” is required in the lithographic process. In the wiring / polishing / cleaning process, “medium grade water quality” is required.

Although different grades of ultrapure water quality are required in this way, conventionally, the following ultrapure water supply method has been basically used.
(1) Uniform supply of water quality:
A method of supplying the highest quality ultrapure water with the same water quality to all processes that require ultrapure water.
(2) Batch manufacturing:
A method of producing ultrapure water in one system and supplying it to all processes that require ultrapure water.
(3) Long-distance water supply:
A method in which ultrapure water is manufactured outside a clean room, transported over long distances, and supplied to all processes that require ultrapure water.
Japanese Patent No. 3200301 Japanese Patent No. 3078146

However, in recent years, the following requirements for the manufacturing process of electronic component members are becoming increasingly severe.
(1) Cost saving: In the manufacture of electronic components such as semiconductor devices and flat panel display devices, there is a demand for further reduction in manufacturing costs.
(2) High quality: The structure and materials of electronic components are made finer and thinner, and the degree of cleanness required in a specific process is extremely high.
(3) Flexibility: Especially in the manufacture of semiconductor devices, it is required to produce a variety of products at one production factory and to cope with the fluctuations in the production amount.
(4) Energy saving: Especially in the manufacture of flat panel display devices, with the increase in the size of glass substrates used in the production of displays such as televisions, the size of manufacturing equipment has increased, the energy used by manufacturing equipment has increased, and the factory floor area has rapidly increased. As a result, the supply amount of ultrapure water and the like has become enormous, and energy consumption such as electricity bills due to long-distance water supply has also become enormous, and it is required to cope with energy saving from the viewpoint of factory location.

  Considering these various requirements from the viewpoint of problems in the ultrapure water production and supply system, in the conventional ultrapure water system as described above, in view of the above requirements, the ultrapure water supply method There are the following problems.

(1) Problems caused by "uniform water supply":
The method and system for supplying ultrapure water with the same water quality and the highest grade to all processes that require ultrapure water have the following two problems.
(A) High-grade ultra-pure water is supplied and used for processes that do not adversely affect the quality of electronic components even when low-grade ultra-pure water is used. This is an impediment to lower costs.
(B) On the other hand, when supplying ultra-pure water with an ultra-high grade water quality required in processes that require ultra-high cleanliness, it includes the amount of water supplied to processes that do not require such high grades. Higher grades are an obstacle to cost reduction and an obstacle to partial promotion of ultra-high quality.

(2) Problems caused by “batch manufacturing”:
The method and system for producing ultrapure water with a single system and supplying it to all processes that require ultrapure water have the following two problems.
(A) The ultra-pure water batch manufacturing method itself requires ultra-pure water with uniform water quality, and contributes to cost reduction when manufacturing it, but has multiple processes with different required water quality grades. In this case, as described above, it becomes an impediment to cost reduction.
(B) Especially in semiconductor manufacturing, when it is required to produce multiple varieties at one production plant and to respond to fluctuations in production volume, it is not possible to deal with fluctuations in the amount of water used, and production flexibility is low. It becomes an impediment to cost.

(3) Problems caused by "Long distance water supply":
The method and system for producing ultrapure water outside a clean room, supplying water over a long distance, and supplying it to all processes that require ultrapure water have the following problems. That is, particularly in the manufacture of flat panel display devices, with the increase in the size of glass substrates used in the production of displays such as televisions, the size of manufacturing equipment, the use of manufacturing equipment increased, and the floor area of factories rapidly increased. The supply of pure water, etc. will become enormous, and the energy consumption such as electricity bills from long-distance water supply will also become enormous, which will be an obstacle to energy saving, lower costs, and flexibility in the location of factories.

  An object of the present invention is to provide a water treatment system for an electronic component member manufacturing apparatus that can solve these problems individually and preferably at once, paying attention to such problems in the conventional system. That is, an object of the present invention is to provide an ultrapure water production / supply system that can greatly contribute to low cost, high quality, flexibility, and energy saving in the production of electronic component members. To do.

  The present inventors have made various studies to solve the above-mentioned problems, and used the amount of ultrapure water used in each production process of the electronic component production factory, the required water quality grade, the ultrapure water supply system, and the system thereof. I did research. As a result, in a water treatment system in a manufacturing facility for electronic parts and components such as semiconductor devices and flat panel displays including a plurality of wet process steps with different purposes, ultrapure water is independently applied to each of the plurality of different wet process steps. It was found that by configuring with multiple water treatment systems that can be supplied, the above problems of conventional ultrapure water production systems such as uniform water quality supply, batch production, and long-distance water transfer can be solved. Based on this, the present invention has been completed.

That is, the water treatment system for an electronic component member manufacturing apparatus according to the present invention is a water treatment system in an electronic component member manufacturing apparatus including a plurality of wet processes having different purposes for using ultrapure water. to a wet process, and have a each independently plurality of ultra-pure water supply system for supplying ultra-pure water, at least one of ultrapure water supply system includes a collection processing system for collecting waste water In addition, the electronic component member manufacturing apparatus including the wet process that requires ultrapure water is installed in a clean room or under a clean room floor .

  In the water treatment system for an electronic component member manufacturing apparatus according to the present invention having such a basic configuration, ultrapure water is supplied independently for each water quality required in each manufacturing process (each use point). It is preferable that the quality of the ultrapure water supplied by the plurality of ultrapure water supply systems differs by at least two kinds.

  Moreover, in the water treatment system for an electronic component member manufacturing apparatus according to the present invention as described above, various parts can be independently installed (locally installed) for the ultrapure water supply system that supplies ultrapure water independently. It can be configured in a form.

  For example, as a form in which a secondary pure water treatment system is locally installed, at least one of the plurality of ultrapure water supply systems that supply ultrapure water independently includes a filtration process for filtering raw water such as industrial water. Secondary treatment for further purifying the primary pure water after passing through the primary pure water treatment system including pretreatment and / or collection treatment for collecting waste water, and then reverse osmosis membrane treatment and / or desalination treatment It can be set as the form containing a pure water processing system.

  Further, as a form in which the primary pure water post-treatment system and the subsequent are installed locally, at least one of the plurality of ultrapure water supply systems that supply ultrapure water independently of each other is a filtration process that filters raw water such as industrial water The primary pure water pre-treatment water that has undergone the pre-treatment and / or recovery treatment for collecting waste water, and then the primary pure water pre-treatment including reverse osmosis membrane treatment or desalination treatment, is further purified. 2 for further purifying the primary pure water from the primary pure water post-treatment system including reverse osmosis membrane treatment and / or desalination treatment to obtain primary pure water, and the primary pure water from the primary pure water post-treatment system. And a secondary pure water treatment system.

  In addition, as a form in which the primary pure water pre-treatment system and the subsequent are installed locally, at least one of the plurality of ultrapure water supply systems that supply ultrapure water independently of each other is a filtration process that filters raw water such as industrial water Reverse osmosis membrane treatment or desalination for obtaining primary pure water by further purifying the pretreated water and / or the recovered treated water after recovering the recovered wastewater for recovering the wastewater. The primary pure water pretreatment system including the treatment and the reverse osmosis membrane treatment and / or desorption for further purifying the primary pure water pretreatment water from the primary pure water pretreatment system to obtain primary pure water A primary pure water post-treatment system including salt treatment and a secondary pure water treatment system for further purifying the primary pure water from the primary pure water post-treatment system can be used.

  Further, as a form in which the pretreatment system and the subsequent are installed locally, at least one of the plurality of ultrapure water supply systems that supply ultrapure water independently includes a pretreatment that includes a filtration process for filtering raw water such as industrial water. A form including a system can be adopted.

Further, the collection processing system in the form of local installation, at least one of said each independently plurality of ultra-pure water supply system for supplying ultra-pure water, Ru is a form containing the collection processing system for collecting waste water .

  In addition, when a plurality of series in each water quality grade are installed locally, at least one of the plurality of ultrapure water supply systems that supply ultrapure water independently of each other can obtain equivalent water quality and be independent. Thus, it can be divided into a plurality of series that can be controlled.

  In the case of local installation in a form that can be individually supplied for each manufacturing machine, at least one of the plurality of ultrapure water supply systems that supply ultrapure water independently of each other is the wet type that requires ultrapure water. It can be set as the form containing the system which supplies an ultrapure water separately to the electronic component member manufacturing apparatus containing a process.

Moreover, the electronic component member such manufacturing apparatus water treatment system according to the present invention, Ru can also be in the form of installed near manufacturing machine to avoid long distance water supply.

  According to the water treatment system for an electronic component member manufacturing apparatus according to the present invention, each process has a plurality of ultrapure water supply systems that independently supply ultrapure water to a plurality of wet processes having different purposes. It is possible to supply ultra-pure water of the optimum water quality grade for each, eliminating the waste of ultra-high grade supply to processes that do not require ultra-high grade, and reducing the overall cost, It becomes possible to perform partial ultrahigh water quality very efficiently.

  In addition, it eliminates the harmful effects of batch production of ultrapure water, making it possible to reduce costs as a whole, as well as being able to respond to a variety of products and changes in the timing of specified water volumes, thereby achieving production flexibility and cost reduction. it can.

  In addition, it is possible to install it in the vicinity of the target manufacturing machine individually, avoiding long-distance water transfer, reducing energy consumption, and reducing the total area occupied by the water treatment system. It will be possible to respond to the improvement in the degree of freedom of factory location, energy saving, and cost reduction, which are required as the manufacturing facilities become larger.

Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
In the present invention, as an electronic component member manufacturing apparatus to be implemented, for example, a silicon substrate, that is, a semiconductor substrate such as a III-V group semiconductor wafer, a glass substrate for a flat display device, a memory element, a CPU, a CCD, etc. Finished products such as flat panel display devices such as various sensor elements, liquid crystal displays, plasma displays, organic EL displays, etc. and semi-finished products thereof, parts for electronic parts manufacturing equipment such as quartz jigs, plastic jigs, metal jigs, etc. For example, a manufacturing facility such as

  FIG. 1 shows a water treatment system 1 for an electronic component member manufacturing apparatus according to a first embodiment of the present invention. In this embodiment, ultrapure water is dispersedly manufactured, supplied to and recovered from a plurality of wet processes having different purposes, and water quality is selectively used in three grades (high, medium, low, or ultrahigh, high, medium). Etc.), and the local installation range is the primary pure water to the secondary pure water, the wastewater recovery process. That is, the pretreatment system 2 including the filtration treatment of raw water such as industrial water (engineering water) is used as a common facility, and the pretreatment water supplied therefrom is used for a plurality of wet processes (manufacturing process group A 3) having different purposes. In addition, for the production process B group 4 and the production process C group 5), a system for independently producing ultrapure water and collecting wastewater is provided. The manufacturing process A group 3, the manufacturing process B group 4, and the manufacturing process C group 5 are provided in a clean room, for example, in the vicinity of each manufacturing apparatus provided in the clean room, with water quality required for each manufacturing process group. A system for producing and supplying ultrapure water and collecting wastewater is provided.

  In the example shown in FIG. 1, for the manufacturing process A group 3 in which high-grade water quality ultrapure water is required, the pretreatment water from the pretreatment water supply line 6 is supplied to the primary pure water production apparatus 7. Primary pure water is produced, the primary pure water is supplied to the secondary pure water production apparatus 8 to produce secondary pure water, and the secondary pure water is further produced by the functional water production apparatus and / or ions. High quality water ultrapure water is produced by supplying to the adsorption membrane device 9. This ultrapure water is supplied to the manufacturing process group A 3. For example, recovered water (hereinafter simply referred to as “recovered water”) having a relatively good water quality, which is used and discharged in the manufacturing process A group 3, is recovered by the waste water recovery device 10 and is primary. The water is joined to the pure water production apparatus 7 and again supplied to the ultrapure water production / supply system. The primary pure water production device 7 further purifies the primary pure water pre-treatment system including reverse osmosis membrane treatment or desalination treatment and primary pure water pre-treatment water from the primary pure water pre-treatment system. It may be configured to include a primary pure water post-treatment system including a reverse osmosis membrane treatment or a desalting treatment for obtaining primary pure water. Note that the functional water production apparatus is a known production apparatus for producing functional water having an increased cleaning effect in a wet process by dissolving a useful gas such as hydrogen gas or ozone gas in ultrapure water. .

  For the manufacturing process group B 4 requiring ultra-pure water of medium grade water quality, the pretreated water from the pretreated water supply line 6 is supplied to the primary pure water production apparatus 7 and the primary pure water is supplied. The secondary pure water is manufactured by supplying the secondary pure water to the secondary pure water manufacturing apparatus 8 and supplied to the manufacturing process group B 4 as ultrapure water to be supplied with the secondary pure water. The recovered water from the manufacturing process group B 4 is recovered by the wastewater recovery device 10, joined to the primary pure water manufacturing device 7, and again supplied to the ultrapure water manufacturing / supply system.

  For the manufacturing process group C 5 in which low grade ultrapure water is required, the pretreated water from the pretreated water supply line 6 is supplied to the primary pure water production apparatus 7 and the primary pure water is supplied. It is manufactured and supplied to the manufacturing process group C 5 as pure water to be supplied by the primary pure water. The recovered water from the manufacturing process group C 5 is recovered by the wastewater recovery device 10, joined to the primary pure water manufacturing device 7, and again supplied to the pure water manufacturing / supply system.

  In the water treatment system 11 for an electronic component member manufacturing apparatus according to the second embodiment of the present invention shown in FIG. 2, the pretreatment water supplied from the pretreatment system 2 is first a common primary pure water pretreatment system 12. To the primary pure water pre-stage treated water, and the primary pure water pre-stage treated water is used for a plurality of wet processes (manufacturing process A group 3, manufacturing process B group 4, and manufacturing process C group 5) having different purposes. For this reason, a system for producing ultrapure water and collecting wastewater is provided. That is, the proper use of water quality is the same as in the example shown in FIG. 1, but the local installation range is the primary pure water post-stage treatment system to the secondary pure water treatment system and the wastewater collection system.

  And for the manufacturing process A group 3 in which ultra-pure water of high grade water quality is required, the primary pure water pre-treatment water from the primary pure water pre-treatment system 12 is the primary pure water post-treatment device 13. Is supplied to the primary pure water, and the primary pure water is supplied to the secondary pure water production apparatus 8 to produce the secondary pure water. The secondary pure water is further produced by the functional water production apparatus and / or Alternatively, it is supplied to the ion adsorption membrane device 9 to produce high water quality ultrapure water, and this ultrapure water is supplied to the manufacturing process group A 3. The recovered water from the manufacturing process group A 3 is recovered by the wastewater recovery device 10, joined to the primary pure water post-stage processing device 13, and again supplied to the ultrapure water production / supply system.

  For the manufacturing process B group 4 that requires ultra-pure water of medium quality, the primary pure water pre-treatment water from the primary pure water pre-treatment system 12 is supplied to the primary pure water post-treatment device 13. Thus, primary pure water is produced, the primary pure water is supplied to the secondary pure water production apparatus 8 to produce secondary pure water, and production process B as ultrapure water to be supplied with the secondary pure water. Supplied to Group 4. The recovered water from the manufacturing process group B 4 is recovered by the wastewater recovery device 10, joined to the primary pure water post-treatment device 13, and again supplied to the above-described ultrapure water production / supply system.

  For the manufacturing process group C 5 in which ultra-pure water with low grade water quality is required, the primary pure water pre-treatment water from the primary pure water pre-treatment system 12 is supplied to the primary pure water post-treatment device 13. Thus, primary pure water is manufactured, and the primary pure water is supplied to the manufacturing process group C 5 as pure water to be supplied. The recovered water from the manufacturing process group C 5 is recovered by the wastewater recovery device 10, joined to the primary pure water post-treatment device 13, and supplied again to the pure water manufacturing / supply system.

  In the water treatment system 21 for an electronic component member manufacturing apparatus according to the third embodiment of the present invention shown in FIG. 3, the pretreatment water supplied from the pretreatment system 2 is first a common primary pure water pretreatment system 12. To the primary pure water pre-treatment water, and then the primary pure water pre-treatment water is supplied to the common primary pure water post-treatment system 13 to form the primary pure water post-treatment water, Primary pure water and post-treatment water are supplied for a plurality of wet processes having different purposes (manufacturing process A group 3, manufacturing process B group 4, manufacturing process C group 5), A system for collecting wastewater is provided. That is, the water usage is the same as in the example shown in FIG. 1, but the local installation range is the secondary pure water treatment system and the wastewater collection system.

  And for the manufacturing process A group 3 in which high grade water quality ultrapure water is required, the primary pure water post-stage treated water from the primary pure water post-stage treatment system 13 is supplied to the secondary pure water production apparatus 8. The secondary pure water is supplied to produce the secondary pure water, and the secondary pure water is supplied to the functional water production device and / or the ion adsorption membrane device 9 to produce high quality grade ultra pure water. Supplyed to manufacturing process group A 3. The recovered water from the manufacturing process group A 3 is recovered by the wastewater recovery device 10, joined to the secondary pure water manufacturing device 8, and again supplied to the ultrapure water manufacturing / supply system.

  For the production process group B 4 requiring ultra-pure water of medium grade water quality, the primary pure water post-treatment water from the primary pure water post-treatment system 13 is supplied to the secondary pure water production apparatus 8. Secondary pure water is manufactured, and the secondary pure water is supplied to the manufacturing process group B 4 as ultrapure water to be supplied. The recovered water from the manufacturing process group B 4 is recovered by the wastewater recovery device 10, joined to the secondary pure water manufacturing device 8, and again supplied to the ultrapure water manufacturing / supply system.

  For the production process C group 5 that requires low-grade ultra-pure water, the primary pure water post-treatment water from the primary pure water post-treatment system 13 is directly produced as pure water to be supplied. C group 5 is supplied. The recovered water from the manufacturing process group C 5 is recovered by the wastewater recovery device 10 and is used for circulation.

  The water treatment system 31 for an electronic component parts manufacturing apparatus according to the fourth embodiment of the present invention shown in FIG. 4 shows a more detailed configuration example of the system having the schematic configuration shown in FIG. This shows an example in which multiple series of grade water quality ultrapure water production systems are installed side by side. In FIG. 4, raw water 32 such as industrial water is stored in a raw water tank 33, and is made pretreated water by treatment by a pretreatment system 36 including a coagulation filtration system 34 and an adsorption treatment system 35 using activated carbon. A portion surrounded by a broken line indicates a spare sequence used as necessary. This pretreated water is supplied to each of the production / supply systems of ultrapure water installed in the vicinity of the electronic component member manufacturing apparatus and in the clean room 37 or under the floor of the clean room 37. The electronic component member manufacturing apparatus has a plurality of wet processes with different purposes. POU WET (A), POU WET (B), and POU CMP in FIG. These correspond to the process B group 4 and the manufacturing process C group 5, respectively. Each ultrapure water production / supply system, together with their wastewater recovery system, is provided as a separate system for each of the production process A group 3, the production process B group 4 and the production process C group 5, respectively. Some of them (portions surrounded by broken lines) are spare sequences that are used as necessary.

  For the manufacturing process group A 3 in which high quality ultrapure water is required, the pretreatment water from the pretreatment water supply line 38 is supplied to the primary receiving tank 39, for example, an ultraviolet sterilizer 40 (UVST ), Treated with the safety filter 41 (An F) and the first-stage reverse osmosis membrane device 42 (1stRO), the primary pure water is obtained. Subsequently, the second-stage reverse osmosis membrane device 43 (2ndRO), the membrane deaerator 44 (gas is removed to reduce the load on the next EDI), the electric regenerative ion exchanger 45 (D2EDI), the membrane deaerator 46 (mainly removes nitrogen gas), ultraviolet oxidizer 47 (UVOX), non-regenerative ion exchanger 48 (cartridge polisher, CP), and ultrafiltration device 49 (UF). Ultra pure water is supplied to the manufacturing process group A 3. The recovered water from the manufacturing process group A 3 is recovered in the recovered water tank 50 and neutralized in the neutralization tank 51, and then the activated carbon treatment device 52, the safety filter 53 (An F), the first-stage reverse osmosis membrane. After being processed by the device 54 (1stRO), it is returned to the primary receiving tank 39 and again supplied to the ultrapure water production / supply system.

  For the manufacturing process group B 4 requiring ultra-pure water of medium grade water quality, the pretreatment water from the pretreatment water supply line 38 is supplied to the primary receiving tank 39, for example, an ultraviolet sterilizer 40 (UVST ), Treated with the safety filter 41 (An F) and the first-stage reverse osmosis membrane device 42 (1stRO), the primary pure water is obtained. Subsequently, the second stage reverse osmosis membrane device 43 (2ndRO), membrane deaeration device 44, electric regeneration type ion exchange device 45 (D2EDI), ultraviolet oxidation device 47 (UVOX), non-regenerative ion exchange device 48 (cartridge polisher) , CP), ultrapure water composed of secondary pure water is processed by the ultrafiltration device 49 (UF) and supplied to the manufacturing process B group 4. The recovered water from the production process group B 4 is recovered in the recovery water tank 50 and neutralized in the neutralization tank 51, and then the activated carbon treatment device 52, the safety filter 53 (an F), the first-stage reverse osmosis membrane. After being processed by the device 54 (1stRO), it is returned to the primary receiving tank 39 and again supplied to the ultrapure water production / supply system. That is, in the ultrapure water production / supply system for the production process B group 4, the configuration is simplified as compared with the ultrapure water production / supply system for the production process A group 3, because the membrane deaerator 46 is omitted. The water quality is low.

  For the manufacturing process group C 5 where ultra-pure water of low quality is required, the pretreatment water from the pretreatment water supply line 38 is supplied to the primary receiving tank 39, for example, an ultraviolet sterilizer 40 (UVST ), Safety filter 41 (an F), first stage reverse osmosis membrane device 42 (1stRO), second stage reverse osmosis membrane device 43 (2ndRO), electric regenerative ion exchange device 45 (D2EDI), microfiltration membrane device 55 Ultra pure water substantially consisting of primary pure water is obtained by treatment with (MF) and supplied to the manufacturing process group C 5. The recovered water from the production process group C 5 is treated by the activated carbon treatment device 52 (CF), returned to the primary receiving tank 39, and again supplied to the ultrapure water production / supply system. That is, in the ultrapure water production / supply system for the production process C group 5, the configuration is further simplified by omitting the secondary pure water system compared to the ultrapure water production / supply system for the production process B group 4. The water quality is low. In addition, the wastewater collection system is simplified.

  FIG. 5 shows a schematic configuration of a conventional water treatment system 101 for an electronic component member manufacturing apparatus for comparison. Pretreated water that has passed through a pretreatment system 102 such as industrial water is a primary pure water system 103, 2. After passing through the next pure water system 104, it is converted to ultrapure water, which is sent over a long distance and supplied to the manufacturing machine group 105 as ultrapure water of the same grade, and the recovered water is recovered again by the long distance water supply. It is used for the production of the above ultrapure water. Therefore, as described above, the high-purity grade ultrapure water is also supplied to a user who does not require a high-water grade, which is disadvantageous in cost and lacks flexibility. In addition, energy loss due to long-distance water transfer is also large.

  In contrast, in the water treatment system for an electronic component member manufacturing apparatus according to the present invention as shown in FIGS. 1 to 4, a plurality of ultrapure waters are independently supplied to a plurality of wet processes having different purposes. The ultra-pure water supply system can be used to supply ultra-pure water of the optimum water quality grade for each process, and it is wasteful to make ultra-high grades even for the supply to processes that do not require ultra-high grades. The cost can be reduced as a whole, and the partial ultra-high water quality can be extremely efficiently performed. In addition, the adverse effects of batch production of ultrapure water can be eliminated, and the overall cost can be reduced. Also, it is possible to cope with the increase in variety and the fluctuation in the specification water amount, thereby giving the production flexibility. In addition, it is possible to install it in the vicinity of the target manufacturing machine individually, avoiding long-distance water transfer, reducing energy consumption, and reducing the total area occupied by the water treatment system. It will be possible to respond to the improvement in the degree of freedom of factory location, energy saving, and cost reduction, which are required as the manufacturing facilities become larger.

It is a general | schematic process flowchart of the water treatment system for electronic component member manufacturing apparatuses which concerns on the 1st embodiment of this invention. It is a general | schematic process flow figure of the water treatment system for electronic component member manufacturing apparatuses which concerns on the 2nd embodiment of this invention. It is a general | schematic process flow figure of the water treatment system for electronic component member manufacturing apparatuses which concerns on the 3rd embodiment of this invention. It is a process flow figure of the water treatment system for electronic component members manufacturing equipment concerning the 4th embodiment of the present invention. It is a general | schematic process flow figure of the water treatment system for the conventional electronic component member manufacturing apparatuses.

Explanation of symbols

1, 11, 21, 31 Water treatment system for electronic parts production equipment 2 Pretreatment system 3 Manufacturing process A group requiring high quality water ultrapure water 4 Medium grade water quality ultrapure water is required Production process group B 5 Production process group C requiring ultra-pure water of low grade water quality 6 Pretreatment water supply line 7 Primary pure water production device 8 Secondary pure water production device 9 Functional water production device and / or ion Adsorption membrane device 10 Wastewater recovery device 12 Primary pure water pre-treatment system 13 Primary pure water post-treatment device 32 Raw water 33 Raw water tank 34 Coagulation filtration system 35 Adsorption treatment system with activated carbon 36 Pretreatment system 37 Clean room 38 Pretreatment water supply line 39 Primary receiving tank 40 UV sterilizer 41 Filter 42 First stage reverse osmosis membrane device 43 Second stage reverse osmosis membrane device 44 Membrane deaeration device 45 Electric regenerative ion exchange device 46 Membrane Degasifier 47 ultraviolet oxidation device 48 non-regenerative ion exchanger 49 ultrafilter 50 recovered water tank 51 neutralization tank 52 activated carbon treatment apparatus 53 filter 54 first stage reverse osmosis membrane device 55 microfiltration membrane device

Claims (8)

In a water treatment system in an electronic component member manufacturing apparatus including a plurality of wet processes having different purposes using ultrapure water, a plurality of ultrapure waters are independently supplied to the plurality of wet processes having different purposes. and have a ultra-pure water supply system, at least one of ultrapure water supply system includes a collection processing system for collecting the waste water, and an electronic component including the wet processes that require ultrapure water A water treatment system for an electronic component parts manufacturing apparatus, which is installed in a clean room where a parts manufacturing apparatus is installed or under a clean room floor .   2. The apparatus for producing electronic component parts according to claim 1, wherein the quality of the ultrapure water supplied by the plurality of ultrapure water supply systems for supplying ultrapure water independently from each other is at least two or more. Water treatment system.   At least one of the plurality of ultrapure water supply systems that independently supply ultrapure water is a pretreatment including a filtration process for filtering raw water such as industrial water and / or a recovery process for recovering wastewater, 2. A secondary pure water treatment system for further purifying the primary pure water after passing through the primary pure water treatment system including reverse osmosis membrane treatment and / or desalination treatment. Or the water processing system for 2 electronic component member manufacturing apparatuses.   At least one of the plurality of ultrapure water supply systems that independently supply ultrapure water is a pretreatment including a filtration process for filtering raw water such as industrial water and / or a recovery process for recovering wastewater, Reverse osmosis membrane treatment and / or desalination for obtaining primary pure water by further purifying the primary pure water pre-treatment water after the primary pure water pre-treatment including reverse osmosis membrane treatment or desalting treatment A primary pure water post-treatment system including a treatment and a secondary pure water treatment system for further purifying primary pure water from the primary pure water post-treatment system. Or the water processing system for 2 electronic component member manufacturing apparatuses.   At least one of the plurality of ultrapure water supply systems for supplying ultrapure water independently collects pretreated water and / or wastewater after pretreatment including filtration treatment for filtering raw water such as industrial water. Primary pure water pre-treatment system including reverse osmosis membrane treatment or desalting treatment to obtain primary pure water by further purifying the recovered treated water after undergoing the recovery treatment for the purpose, and primary pure water pre-stage Primary pure water post-treatment system including reverse osmosis membrane treatment and / or desalination treatment for further purifying primary pure water pre-treatment water from the treatment system to obtain primary pure water, and primary pure water The water treatment system for an electronic component member manufacturing apparatus according to claim 1 or 2, further comprising a secondary pure water treatment system for further purifying the primary pure water from the post-stage treatment system.   The at least one of the plurality of ultrapure water supply systems that supply ultrapure water independently of each other includes a pretreatment system including a filtration process for filtering raw water such as industrial water. 5. A water treatment system for an electronic component member manufacturing apparatus according to any one of 5 above. At least one of the plurality of ultrapure water supply systems that supply ultrapure water independently is divided into a plurality of series that can obtain the same water quality and can be controlled independently. The water treatment system for an electronic component member manufacturing apparatus according to any one of claims 1 to 6 . At least one of the plurality of ultrapure water supply systems that supply ultrapure water independently supplies ultrapure water individually to the electronic component member manufacturing apparatus including the wet process that requires ultrapure water. characterized in that it comprises a system, the electronic component member such manufacturing apparatus water treatment system according to any one of claims 1-7.

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