JP4444846B2 - 静電容量を制御する製造装置 - Google Patents
静電容量を制御する製造装置 Download PDFInfo
- Publication number
- JP4444846B2 JP4444846B2 JP2005035535A JP2005035535A JP4444846B2 JP 4444846 B2 JP4444846 B2 JP 4444846B2 JP 2005035535 A JP2005035535 A JP 2005035535A JP 2005035535 A JP2005035535 A JP 2005035535A JP 4444846 B2 JP4444846 B2 JP 4444846B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- potential
- static
- static elimination
- roller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Elimination Of Static Electricity (AREA)
- Control Of Conveyors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
Claims (1)
- ガラス基板を搬送する搬送コロと、該搬送コロで搬送される前記ガラス基板の近傍直下に設置された接地導体と、前記ガラス基板の帯電を除去する除電装置を有し、搬送されてきた前記ガラス基板を次の工程に移送するために該ガラス基板を前記搬送コロから上昇させるポイントで該ガラス基板の静電容量を制御する製造装置であって、
前記次の工程に移送させるために前記ガラス基板を前記搬送コロから上昇させるポイントに、前記除電装置による除電性能が高い側に対して除電性能が低い側の上昇速度を遅く前記ガラス基板を前記搬送コロから上昇させる搬出ピンを設けて前記ガラス基板の静電容量を制御することを特徴とする製造装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005035535A JP4444846B2 (ja) | 2005-02-14 | 2005-02-14 | 静電容量を制御する製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005035535A JP4444846B2 (ja) | 2005-02-14 | 2005-02-14 | 静電容量を制御する製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006221998A JP2006221998A (ja) | 2006-08-24 |
JP4444846B2 true JP4444846B2 (ja) | 2010-03-31 |
Family
ID=36984155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005035535A Expired - Fee Related JP4444846B2 (ja) | 2005-02-14 | 2005-02-14 | 静電容量を制御する製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4444846B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4752008B2 (ja) * | 2007-10-12 | 2011-08-17 | 武士 今野 | フィルムの帯電防止性評価装置 |
KR101014747B1 (ko) | 2008-09-19 | 2011-02-15 | 주식회사 에스에프에이 | 태양전지용 웨이퍼의 로딩 및 언로딩 장치 |
JP4785210B2 (ja) * | 2009-07-23 | 2011-10-05 | 東京エレクトロン株式会社 | 基板搬送装置 |
US9064920B2 (en) * | 2012-07-22 | 2015-06-23 | Varian Semiconductor Equipment Associates, Inc. | Electrostatic charge removal for solar cell grippers |
-
2005
- 2005-02-14 JP JP2005035535A patent/JP4444846B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2006221998A (ja) | 2006-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100980280B1 (ko) | 제전 반송장치 및 반송시의 제전방법 | |
CN102254764B (zh) | 器件承载装置 | |
JP4444846B2 (ja) | 静電容量を制御する製造装置 | |
US8450680B2 (en) | Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate support | |
JP5388643B2 (ja) | 基板搬送装置及び基板搬送方法 | |
JP3537843B2 (ja) | クリーンルーム用イオナイザー | |
JP2004299814A (ja) | 除電された絶縁体基板の製造方法及び製造装置 | |
CN1266740C (zh) | 用于去除微粒的装置 | |
TWI497581B (zh) | A substrate processing apparatus and an exhaust gas method | |
US20210020466A1 (en) | Method for Reducing Residual Micro-Particles on Wafer Surfaces | |
JP2015509141A (ja) | 基板を処理するシステムおよび方法 | |
US20120313308A1 (en) | Component Supporting Device | |
US10766713B2 (en) | Substrate carrier apparatus and liquid crystal display manufacturing device | |
US6432727B1 (en) | Method for eliminating a static electricity on a semiconductor wafer | |
TWI724316B (zh) | 平面面板顯示器製造裝置 | |
JP3545131B2 (ja) | 半導体装置の作製方法 | |
CN101933120B (zh) | 环境气氛净化装置 | |
US6873515B2 (en) | Method for preventing electrostatic discharge in a clean room | |
JPWO2017109901A1 (ja) | 除電ブラシ、除電装置及び除電方法 | |
JP4421597B2 (ja) | 基板搬送装置 | |
JP2013212920A (ja) | 搬送アーム、搬送装置および搬送方法 | |
JP2011208197A (ja) | インライン型プラズマ成膜装置およびこれを用いたプラズマ成膜方法 | |
JP2001267094A (ja) | 静電気除去装置及び静電気除去方法 | |
KR100993075B1 (ko) | 평판 디스플레이 패널과 고정척 분리용 정전기 제거장치 및방법 | |
JP2004014688A (ja) | 回転処理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061003 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090619 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090714 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090907 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100112 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100114 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130122 Year of fee payment: 3 |
|
S202 | Request for registration of non-exclusive licence |
Free format text: JAPANESE INTERMEDIATE CODE: R315201 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130122 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |