JP4444494B2 - 電子検出器 - Google Patents

電子検出器 Download PDF

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Publication number
JP4444494B2
JP4444494B2 JP2000512230A JP2000512230A JP4444494B2 JP 4444494 B2 JP4444494 B2 JP 4444494B2 JP 2000512230 A JP2000512230 A JP 2000512230A JP 2000512230 A JP2000512230 A JP 2000512230A JP 4444494 B2 JP4444494 B2 JP 4444494B2
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JP
Japan
Prior art keywords
electrons
electron
sample
electron detector
deflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000512230A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001516945A (ja
JP2001516945A5 (enExample
Inventor
モチャール エルゴマティ，モハメッド，
ルーデック フランク，
ムルロヴァ、イロナ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of York
Shimadzu Research Laboratory Europe Ltd
Original Assignee
University of York
Shimadzu Research Laboratory Europe Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of York, Shimadzu Research Laboratory Europe Ltd filed Critical University of York
Publication of JP2001516945A publication Critical patent/JP2001516945A/ja
Publication of JP2001516945A5 publication Critical patent/JP2001516945A5/ja
Application granted granted Critical
Publication of JP4444494B2 publication Critical patent/JP4444494B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2000512230A 1997-09-13 1998-09-14 電子検出器 Expired - Fee Related JP4444494B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9719417.9A GB9719417D0 (en) 1997-09-13 1997-09-13 Electron microscope
GB9719417.9 1997-09-13
PCT/GB1998/002720 WO1999014785A1 (en) 1997-09-13 1998-09-14 Electron detectors

Publications (3)

Publication Number Publication Date
JP2001516945A JP2001516945A (ja) 2001-10-02
JP2001516945A5 JP2001516945A5 (enExample) 2006-01-05
JP4444494B2 true JP4444494B2 (ja) 2010-03-31

Family

ID=10818965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000512230A Expired - Fee Related JP4444494B2 (ja) 1997-09-13 1998-09-14 電子検出器

Country Status (7)

Country Link
US (1) US6570163B1 (enExample)
EP (1) EP1012867B1 (enExample)
JP (1) JP4444494B2 (enExample)
AU (1) AU9083898A (enExample)
DE (1) DE69833772D1 (enExample)
GB (1) GB9719417D0 (enExample)
WO (1) WO1999014785A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6667476B2 (en) * 1998-03-09 2003-12-23 Hitachi, Ltd. Scanning electron microscope
DE60143751D1 (de) * 2000-04-24 2011-02-10 Fei Co Sammeln von sekundärelektronen durch die objektivl
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
DE60118070T2 (de) * 2001-09-04 2006-08-17 Advantest Corp. Partikelstrahlgerät
DE10301579A1 (de) 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
JP4200104B2 (ja) * 2003-01-31 2008-12-24 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5243793B2 (ja) * 2004-07-05 2013-07-24 シーイービーティー・カンパニー・リミティッド マルチマイクロコラムにおける電子ビームの制御方法及びこの方法を利用したマルチマイクロコラム
KR100926748B1 (ko) * 2004-08-11 2009-11-16 전자빔기술센터 주식회사 멀티 에스에프이디
US8642959B2 (en) * 2007-10-29 2014-02-04 Micron Technology, Inc. Method and system of performing three-dimensional imaging using an electron microscope
US8222600B2 (en) * 2009-05-24 2012-07-17 El-Mul Technologies Ltd. Charged particle detection system and method
JP6103678B2 (ja) * 2011-05-25 2017-03-29 株式会社ホロン 電子検出装置および電子検出方法
JP5663412B2 (ja) 2011-06-16 2015-02-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP2014521106A (ja) 2011-07-21 2014-08-25 ザ・トラスティーズ・オブ・コロンビア・ユニバーシティ・イン・ザ・シティ・オブ・ニューヨーク 電子線回折データの収集・処理方法
EP2682978B1 (en) 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Contamination reduction electrode for particle detector
JP6027150B2 (ja) * 2014-06-24 2016-11-16 内海　孝雄 低エネルギー電子ビームリソグラフィ
JP6742015B2 (ja) * 2016-01-29 2020-08-19 株式会社ホロン 電子検出装置および電子検出方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49118493A (enExample) * 1973-03-12 1974-11-12
EP0113746B1 (en) 1982-07-16 1988-01-07 Lintech Instruments Limited An elektrode system of a retarding-field spectrometer for a voltage measuring electron beam apparatus
GB8327737D0 (en) * 1983-10-17 1983-11-16 Texas Instruments Ltd Electron detector
DE3638682A1 (de) 1986-11-13 1988-05-19 Siemens Ag Spektrometerobjektiv fuer korpuskularstrahlmesstechnik
US4831267A (en) * 1987-02-16 1989-05-16 Siemens Aktiengesellschaft Detector for charged particles
US4988868A (en) * 1989-05-15 1991-01-29 Galileo Electro-Optics Corp. Ion detector
JP2919170B2 (ja) * 1992-03-19 1999-07-12 株式会社日立製作所 走査電子顕微鏡
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
US5408098A (en) * 1993-09-10 1995-04-18 International Business Machines Corporation Method and apparatus for detecting low loss electrons in a scanning electron microscope
JP3291880B2 (ja) * 1993-12-28 2002-06-17 株式会社日立製作所 走査形電子顕微鏡
US5466940A (en) * 1994-06-20 1995-11-14 Opal Technologies Ltd. Electron detector with high backscattered electron acceptance for particle beam apparatus
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
US6172363B1 (en) * 1996-03-05 2001-01-09 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
WO1998020518A1 (en) * 1996-11-06 1998-05-14 Hamamatsu Photonics K.K. Electron multiplier
IL124333A0 (en) * 1998-05-05 1998-12-06 El Mul Technologies Ltd Charges particle detector
JP2000034660A (ja) * 1998-07-17 2000-02-02 Uni Charm Corp 湿式不織布の製造方法および製造装置

Also Published As

Publication number Publication date
EP1012867A1 (en) 2000-06-28
GB9719417D0 (en) 1997-11-12
AU9083898A (en) 1999-04-05
JP2001516945A (ja) 2001-10-02
WO1999014785A1 (en) 1999-03-25
EP1012867B1 (en) 2006-03-08
DE69833772D1 (de) 2006-05-04
US6570163B1 (en) 2003-05-27

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