JP4405857B2 - Adsorbent - Google Patents

Description

  The present invention relates to an adsorbent for sucking and holding an object.

  Devices used for manufacturing processes such as semiconductor wafers used in semiconductor manufacturing and thin glass substrates used in liquid crystal manufacturing are equipped with vacuum suction devices for fixing semiconductor wafers and glass substrates. An adsorbent called a suction pad is used as a fixing jig.

  Recently, in the field of semiconductor manufacturing and liquid crystal manufacturing, the size has been increasing. For example, a line for manufacturing a substrate having a size of 550 × 650 mm has been put into full-scale operation, development of a substrate of 650 × 830 mm, In the next generation, it is said that a large substrate of about 700 × 900 mm is also adopted. As the size of the substrate increases, the size of the suction pad also needs to be increased.

  Conventionally, a suction pad with a through hole made of an iron-based material such as stainless steel has been used. However, as the suction pad becomes larger as described above, the weight becomes too large and the energy required for driving is reduced. There was a problem of getting bigger.

  For this reason, suction pads using porous ceramics that are light, have good dimensional stability, and are easy to increase in size have come to be used (Reference 1).

JP-A-6-8086

However, the suction pad using the porous ceramic does not have conductivity, and there is a problem that it is not suitable for the recent precise manufacturing process.
For example, when dicing with a semiconductor wafer fixed to the suction pad, prior to dicing, work to determine the reference position for performing vertical movement control (Z-axis control) is performed, and conductivity is reduced. When the held cutting blade comes into contact with the suction pad, a current flows from the cutting blade to the suction pad, the position is stored, and the cutting depth of the semiconductor wafer is precisely controlled. In the case of a semiconductor wafer or the like, various positioning and the like are necessary.
In such a process, a non-conductive porous ceramic suction pad may become an obstacle to positioning control as described above.
The object of the present invention is to solve the problems of the prior art.

In order to achieve the above-mentioned object, the present invention is an adsorption body for sucking and holding an object, which is connected to a suction means, and a suction surface for sucking and holding the object, and suction sucked by the suction means A plate-shaped porous carbon having a surface, a non-breathing body that blocks the portion other than the adsorption surface and the suction surface of the porous carbon to make the portion non-ventilated, and communicates with the suction surface for suction. A suction port connected to the means ,
The porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with a thermosetting resin. The invention of claim 2 is characterized in that the porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with glassy carbon.
In the above configuration, since the plate-shaped porous carbon is mainly used, it is possible to provide an adsorbent that is lightweight, has a simple structure, and has conductivity. Further, since the porous carbon is coated with a thermosetting resin or glassy carbon, there is an effect that dust generation can be suppressed.
The air-impermeable body can be a sealing treatment portion obtained by subjecting the plate-like porous carbon to a sealing treatment.
Further, a support material that supports the plate-like porous carbon may be used as an air-impermeable body. In this case, the air-permeable surface is continuous with the adsorption surface, and the member that forms the air-impermeable surface is an air-impermeable carbon. It is preferable.

  The adsorbent of the present invention has conductivity and is effective in being lightweight and capable of being enlarged.

Embodiments of the present invention will be described below.
<First Embodiment>
In FIG. 1, the suction pad X is mainly composed of a porous carbon plate 1. The porous carbon plate 1 has a plate shape and is mounted on a base 7. The surface of the porous carbon plate 1 is an adsorption surface 2 for adsorbing an object, and the back surface is an attraction surface 3.

The back surface of the porous carbon plate 1 abuts on the base 7, and the base 7 is provided with a gap 5 that does not contact the back surface of the porous carbon plate 1. It is three.
A suction port 6 is formed in communication with the gap 5, and suction means (not shown) such as a pump is connected to the suction port 6 to perform suction.

A sealing treatment portion 4 is formed on the side end face 20 of the porous carbon plate 1 and the edge portions of the front and back surfaces, and this portion is impermeable. Further, the back surface of the porous carbon plate 1 excluding the suction surface 3 is also in close contact with the base 7 and is impermeable.
With the above configuration, only the suction surface 2 and the suction surface 3 serve as ventilation portions, and when the suction surface 3 is sucked from the suction port 6 through the gap 5, the suction surface 2 functions as a suction portion, and the suction surface 2 has an object. Can be adsorbed and held.

  The sealing treatment section 4 can be formed by applying a thermosetting resin with a brush or the like, or by soaking in a cloth or the like, applying a curing treatment, and soaking the resin into the pores. Moreover, you may carbonize at 700 degreeC or more after a hardening process.

  Since the suction pad X having the above-described configuration has a very simple configuration in which the base 7 is mounted on the porous carbon plate 1, the weight can be reduced. In addition, since it is formed of a single material, distortion, deformation, and peeling due to a difference in thermal expansion are eliminated.

  In the case of a suction pad composed of an adsorbent and an outer frame, there is a difference in coefficient of thermal expansion due to the formation of different materials, so that the suction part is detached or distortion occurs. In addition, there is a disadvantage that the outer frame and the suction part are stepped due to grinding distortion due to thermal expansion difference or hardness difference and the flatness is deteriorated, or the suction force is reduced. These drawbacks can be eliminated.

Furthermore, since the coating of the thermosetting resin in the sealing treatment part 4 is brushed, it is very excellent in workability and can be coated at an arbitrary position.
In addition, the fluorine coating conventionally used as a shielding film does not penetrate and the coating layer becomes thick, so that air leakage occurs and costs are increased. Moreover, although there exists a problem of lack of electroconductivity, such a problem is solved with the said structure.

  As described above, according to the suction pad X shown in FIG. 1, since the suction surface 2 is made of carbon, the positioning of the workpiece and the cutting tool can be electrically controlled using the conductivity of the carbon.

  Further, since the suction pad 2 is formed of a single material only on the surface of the porous carbon plate 1, the suction pad 2 has no step difference, and there is no difference in expansion coefficient even if heat expansion occurs. The flatness can be maintained for a very long time. Further, when the suction part 2 is distorted due to wear, it is made of a single material, so that it can be polished with high accuracy. Moreover, since carbon is excellent in chemical resistance, it can be used even in a corrosive environment.

Furthermore, since the number of parts is reduced and the outer frame is not used, the weight can be reduced.
Further, since the thermosetting resin can be applied by brushing, it can be applied to any location, the sealing treatment portion 4 can be freely set, and the workability is excellent, so that it can be finished at low cost. Further, by providing the base 7 with air around the suction port 6 and the like, the shape can be simply summarized.

<Second Embodiment>
Next, another embodiment will be described.
As shown in FIG. 2, the porous carbon plate 1 is accommodated in a container 10 in the suction pad X ′ of this embodiment. The container 10 is composed of a side surface portion 8 and a bottom surface portion 9 so that the adsorption surface 2 of the porous carbon plate 1 is exposed, the side end surface 20 is blocked, and the portions other than the suction surface 3 on the back surface are blocked so as not to be ventilated. It has become.

  The side surface portion 8 is made of the same carbon as the porous carbon plate 1, and the carbon is sealed with a thermosetting resin in advance to make it non-ventilated, and the surface continuous to the adsorption surface 2 becomes the air non-permeable surface 80. Yes.

  Further, the bottom surface portion 9 is made of stainless steel, and a gap 5 and a suction port 6 are formed. The back surface of the porous carbon plate 1 corresponding to the gap 5 is the suction surface 3. The suction port 6 is configured to be connected to a suction device (not shown) such as a vacuum pump.

  The porous carbon plate 1 has a porosity of 40% and is bonded to the container 10 by bonding or shrink fitting. Further, after bonding, the non-venting surface 80 which is the surface of the suction surface 2 and the side surface portion 8 is polished so that the flatness is several μm or less.

  In the suction pad X ′ having the above configuration, since the porous carbon plate 1 and the side surface portion 8 are made of the same material, the difference in thermal expansion is almost zero, and even if expansion due to heat occurs, the suction surface 2 and the non-venting surface. There is no step in 80, and the flatness can be maintained for a long time. Moreover, since the adsorption | suction surface 2 and the air-impermeable surface 80 have the electroconductivity of carbon, the positioning of a workpiece | work or a cutting tool can be electrically controlled. Moreover, since carbon is excellent in chemical resistance, it can be used even in a corrosive environment.

  In the embodiment of FIG. 2, the side surface portion 8 and the bottom surface portion 9 are separated from each other. However, as shown in FIG. Even in this configuration, the same effect as the embodiment of FIG. 2 can be obtained.

<Material of porous carbon plate 1>
General porous carbon is a porous body with a binary system structure in which coke grains and pitch carbides are used as a binder, and by repeated operations of pressure and pressure reduction when objects such as semiconductor wafers are adsorbed and released. There is a possibility of damage or dust generation.
That is, the hardness of carbon is 100 Hv, whereas the hardness of a silicon wafer as an object to be adsorbed is generally 600 Hv, and the glass substrate is 950 Hv.
Therefore, by repeating the adsorption and release of the silicon wafer and the glass substrate on the porous carbon, adsorption marks, contact scratches and wear of the silicon wafer and the glass substrate are generated on the adsorption surface, and the adsorption power is reduced. In addition, wear may generate wear powder, which may contaminate the silicon wafer or the glass substrate.

  Therefore, it is preferable to use porous carbon, which is formed of self-sintering carbon and has a porosity of 10 to 50 vol%, as the material of the porous carbon plate 1. The porous carbon may be impregnated and cured with a thermosetting resin, and the surface of the skeleton made of self-sintering carbon may be coated with the thermosetting resin. Alternatively, the porous carbon may be impregnated and cured with a thermosetting resin, carbonized, and a skeleton surface made of self-sintering carbon may be coated with glassy carbon. With this configuration, it is possible to have sufficient strength and suppress dust generation while maintaining light weight and conductivity.

Hereinafter, the materials will be described in detail.
Self-sintering carbon is a carbon powder that can be sintered after molding without adding a pitch binder to form a high-strength carbon material, and the raw material particles themselves are strongly bonded. In order to show force, high strength porous carbon can be obtained even with a porous body having a large porosity.

  However, even with porous carbon made of high-strength self-sintering carbon material, due to local non-uniformity due to press molding, there are some parts where particles tend to fall off locally, and due to repeated stress of pressure and pressure reduction , There is a possibility that a small amount of carbon drops off in that part and dust is generated.

Therefore, as a method for preventing the generation of dust, it is desirable to coat with a thermosetting resin or glassy carbon.
As a method of coating, a porous carbon formed of a self-sintering carbon material is vacuum impregnated with a thermosetting resin whose concentration is adjusted using a vacuum impregnation apparatus. Although pressure impregnation may be performed after vacuum impregnation, the viscosity of the impregnating liquid is 1 P or less because the resin concentration is low, and it is not necessary to pressurize in particular.

  Thermosetting resins include phenolic resin, furan resin, epoxy resin, urea resin, melamine resin, unsaturated polyester resin, allyl resin, alkyd resin, urethane resin, silicone resin, etc. It is desirable to use a phenolic resin or an epoxy resin that has chemical resistance enough to withstand a semiconductor solution and that is inexpensive and has high adhesive strength and chemical resistance that is relatively inexpensive.

  If a porous carbon is impregnated and cured with a high concentration of thermosetting resin, some or all of the pores of the porous carbon are blocked and the performance is significantly reduced. Therefore, it is necessary to dilute the thermosetting resin with a solvent. When the impregnating resin concentration is diluted to 10 wt% or less, the coating layer portion can be thinned to 1 μm or less. In other words, a concentration of 3 to 4 wt% that hardly lowers the porosity before impregnation is desirable.

  The solvent is required to be an organic solvent in which the thermosetting resin dissolves. Examples of the organic solvent include acetone, ethanol, isopropyl alcohol, methanol, benzine, and the like, but versatile, safe and inexpensive materials are preferable. For example, when phenol resin is used, ethanol and isopropyl alcohol are desirable.

  After the vacuum impregnation, the impregnating resin is cured and the organic solvent is removed. For example, when ethanol is used as a solvent for the phenol resin, the temperature is not particularly specified, but by heating to about 180 ° C., the ethanol can be removed and the phenol resin can be completely cured.

  Since glassy carbon is produced by carbonizing a thermosetting resin, the higher the carbonization rate of the thermosetting resin, the lower the concentration of the thermosetting resin that can be carbonized, and the glassy carbon can be uniformly distributed to the inside. I can do it.

  Although it is not necessary to specify the thermosetting resin to be carbonized, among them, a phenol resin having a high carbonization rate and relatively inexpensive is desirable. The carbonization treatment needs to be performed at a temperature higher than the carbonization temperature of the resin. For example, in the case of a phenol resin, it can be carbonized by firing at 800 ° C. or higher in an inert atmosphere.

  In this way, by changing the surface of the self-sintering carbon skeleton of porous carbon made of self-sintering carbon from thermosetting resin to glassy carbon with low thermal expansion, temperature changes in the surrounding environment Also, the flatness of the suction surface can be maintained.

Examples are shown below.
<Examples 1-4>
○ Production process of carbon Self-sintering carbon powder adjusted to an average particle size of 20 μm is formed by a hydraulic press using a mold of φ120 mm at a molding pressure of 0.4, 0.5, 0.7, 0.8 t / cm ² , respectively. It shape | molded and obtained the disk molded object of (phi) 120 * 0 * 10mm. The disk compact was heated to 1000 ° C. at a temperature rising rate of 30 ° C./hr in a non-oxidizing atmosphere, held for 30 minutes and allowed to cool.
The obtained sintered body was processed into φ100 × 0 × 5 mm and then thoroughly washed to obtain porous carbon. As a result of measuring open pores by the Archimedes method for the workpiece, the open pore ratios were 50, 40, 20, and 10 vol%, respectively. This porous carbon was washed with acetone for 10 minutes with an ultrasonic washing machine and sufficiently dried. The obtained porous carbon was deaerated using a vacuum impregnation apparatus for 1 hour under a vacuum condition, and then a resol type phenol resin adjusted to 4 wt% in ethanol was added thereto and sufficiently impregnated. Subsequently, the temperature was raised to 200 ° C. at a rate of temperature rise of 10 ° C./hr in a drying furnace and held for 30 minutes, thereby removing ethanol used for the solvent and heating and curing the phenol resin. By this treatment, the porous carbon skeleton was coated with a phenol resin. As a result of measuring the open pores of the porous carbon for the adsorption pad obtained in the above step by Archimedes method, the open pore ratios were 50, 40, 20, and 10 vol%, respectively. The porous carbon for suction pads obtained by coating the skeleton surface of the self-sintering carbon obtained here with a thermosetting resin was used as the material of Examples 1, 2, 3, and 4.

<Examples 5 to 8>
Self-sintering carbon powder adjusted to an average particle size of 20 μm was molded by a hydraulic press using a mold of φ120 mm at a molding pressure of 0.4, 0.5, 0.7, 0.8 t / cm ² , and φ120 × A disk molded body of 0 × 10 mm was obtained. The disk compact was heated to 1000 ° C. at a temperature rising rate of 30 ° C./hr in a non-oxidizing atmosphere, held for 30 minutes and allowed to cool.
The obtained sintered body was processed into φ100 × 0 × 5 mm and then thoroughly washed to obtain porous carbon. As a result of measuring open pores by the Archimedes method for the workpiece, the open pore ratios were 50, 40, 20, and 10 vol%, respectively. This porous carbon was washed with acetone for 10 minutes with an ultrasonic washing machine and sufficiently dried.
The obtained porous carbon was deaerated using a vacuum impregnation apparatus for 1 hour under a vacuum condition, and then a resol type phenol resin adjusted to 4 wt% in ethanol was added thereto and sufficiently impregnated. Subsequently, the temperature was raised to 200 ° C. at a rate of temperature rise of 10 ° C./hr in a drying furnace and held for 30 minutes, thereby removing ethanol used for the solvent and heating and curing the phenol resin. Furthermore, the porous carbon for the adsorption pad coated with the phenol resin is heated to 900 ° C. at a temperature increase rate of 30 ° C./hr in a non-oxidizing atmosphere and held for 30 minutes, so that the phenol resin is carbonized to be glassy. Carbon. By this carbonization treatment, the phenol resin was carbonized, and the skeleton surface of the self-sintering carbon of the porous carbon for the adsorption pad was coated with glassy carbon. As a result of measuring the open pores of the porous carbon for the adsorption pad obtained in the above step by the Archimedes method, the open pore ratios were 50, 40, 20, and 10 vol%, respectively. The porous carbon for adsorbent pads obtained by coating glass-like carbon on the surface of the self-sintering carbon skeleton obtained here was used as the material of Examples 5, 6, 7, and 8.

<Experiment method>
A suction pad X shown in FIG. 3 was manufactured using the porous carbon plate obtained above. The adsorption surface 2 was adjusted to a flatness of 1 μm or less by polishing.

  Next, as shown in FIG. 4, the suction port 6 of the suction pad X and the vacuum pump P were connected via a valve 11 and a pressure gauge 14 to obtain a test apparatus.

  The suction pad X alone (in a state where nothing is sucked by the suction pad) is opened, the valve 12 and the valve 13 are closed, the vacuum pump P is started, and the pressure of the suction pad X alone (the resistance of the suction pad) is measured. Then, a φ150 mm glass plate B having a flatness of 1 μm or less was adsorbed to the adsorption pad X, and the pressure during glass adsorption was measured. The adsorptive power is expressed as differential pressure x adsorption area between glass adsorption and non-adsorption, and 30 kgf or more was accepted. Further, by closing the valve 11 and opening the valve 13, the glass plate can be opened from the nitrogen cylinder 15 by 0.4 MPaG nitrogen controlled by the pressure regulating valve 16.

Evaluation of the dust generation amount is performed by repeating the work of adsorbing glass B for 1 minute and opening glass B for 1 minute 1000 times, and the dust generation amount at that time is 0.5 μm present on the surface of the adsorbing portion by particle counter 17. The number of dusts of the above size was measured, and 352,000 / m ³ or less was accepted.

The results are shown in Table 1.
In any of the examples, excellent adsorbing power was exhibited and no dust was generated.

<Formation of protective film>
It is also possible to form a protective film on the adsorption surface 2 of the porous carbon plate 1 to strengthen the adsorption surface 2 and prevent dust generation. The protective film is conductive and has a surface hardness of 600 Hv or more and 10 μm or less. Moreover, as a material, it can be set as one protective film in DLC, TiN, TiCN, TiAlN, TiCrN, CrN, and Cr.

  In particular, TiN, TiCN, TiAlN, TiCrN, and CrN are good conductors, and DLC with a large amount of hydrogen addition has electrical conductivity and has a hardness of 1800 or more, so that there is no fear of scratches or wear, which is more preferable.

  Further, if the protective film is formed to exceed 10 μm, part or all of the pores are blocked, the air flow rate and the adsorption force are reduced, and the silicon wafer or the glass substrate cannot be firmly fixed and the performance as an adsorption pad is satisfied. Can not. The thinner the protective film, the less clogging of the pores, and the silicon wafer or the glass substrate can be firmly fixed. Therefore, the thinner protective film is desirable. Therefore, the protective film is desirably 10 μm or less.

  The suction pad to which the protective film having the above configuration is applied can suppress wear, dust generation, or shape change while maintaining air permeability, suction power, and conductivity.

  The protective film is preferably formed after the adsorption surface 2 is polished to a predetermined flatness.

This protective film is 600 Hv or higher, which is higher than the hardness of the silicon wafer. Preferably it is 1000 Hv or higher, which is higher than the hardness of the glass substrate.
Although better high hardness is desired as a protective film, film is not stabilized by the internal stress of the protective film, the hardness since peeled off is the upper limit of the 10000Hv.

  The thickness of the protective film is preferably 10 μm or less. This is because if it exceeds 10 μm, part or all of the pores are blocked, the air permeability is deteriorated, and sufficient adsorption power cannot be maintained. In addition, the thinner the protective film, the more the pores can be prevented from being blocked and the good adsorption power can be maintained. There is no particular lower limit on the thinness.

Examples will be described below.
1. Porous carbon Self-sintering carbon powder adjusted to an average particle size of 20 μm was molded by a hydraulic press with a molding pressure of 0.5 t / cm ^{2 using} a mold of φ120 mm to obtain a disk molded body of φ120 × 0 × 10 mm. The disk compact was heated to 1000 ° C. at a temperature rising rate of 30 ° C./hr in a non-oxidizing atmosphere, held for 30 minutes and allowed to cool.
The sintered body obtained by sintering was processed to φ100 × 0 × 5 mm and the flatness to 1 μm, and then washed sufficiently to obtain porous carbon. As a result of measuring open pores by the Archimedes method on the workpiece, the open porosity was 40%.

2. Protective film coated with a protective film shown in Table 2 on the attracting surface of the porous carbon was measured for its hardness a dynamic ultra microhardness tester, was hardness shown in Table 2.

3. Suction pad X
The suction pad X shown in FIG. 3 is manufactured using each porous carbon to which the protective film is applied, and the suction port 6 and the vacuum pump P are connected via the valve 11 and the pressure gauge 14 as shown in FIG. A test device was used.

4). Test method With the suction pad X alone (with no adsorption on the suction pad), the valve 11 is opened, the valve 12 and the valve 13 are closed, the vacuum pump 6 is started, and the pressure of the suction pad X alone (the resistance of the suction pad) After the measurement, the glass plate B having a flatness of 1 μm or less and having a flatness of 1 μm or less was adsorbed on the suction pad X, and the pressure at the time of glass adsorption was measured. The glass plate was opened by closing the valve 11 and opening the valve 13.
Table 2 shows the results of the adsorption and release of the glass plate B performed 10,000 times or more and the evaluation of the adsorption pad X after 10,000 times or more. In Examples 11 to 16, as shown in Table 2, there was no trace of wear or scratches on the glass plate B and the suction surface 1, and the flatness was 1 μm or less, the same as before the test. The evaluation method of the adsorption force was determined by passing the adsorption force of 30 kgf or more with the difference pressure between the glass adsorption time and the non-adsorption time x adsorption area as the adsorption force, and passing.

1 is a schematic front sectional view showing an embodiment of the present invention. The general | schematic front sectional view which shows other embodiment of this invention. The general | schematic front sectional view which shows other embodiment of this invention. BRIEF DESCRIPTION OF THE DRAWINGS Schematic explanatory drawing of the test apparatus of this invention. BRIEF DESCRIPTION OF THE DRAWINGS Schematic explanatory drawing of the test apparatus of this invention.

Explanation of symbols

1: porous carbon plate, 2: adsorption surface, 3: suction surface, 4: sealing treatment part, 5: gap, 6: suction port, 7: base, 8: side part, 9: bottom part, 10: container , 20: side end surface, 80: air-impermeable surface.

Claims (11)

An adsorbent that is connected to a suction means and sucks and holds an object,
Plate-like porous carbon having a suction surface for sucking and holding an object and a suction surface sucked by the suction means;
An impervious body that blocks parts other than the adsorption surface and the suction surface of the porous carbon to make the part impervious;
A suction port that communicates with the suction surface and is connected to the suction means.
The porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with a thermosetting resin.
An adsorbent characterized by that. An adsorbent that is connected to a suction means and sucks and holds an object,
Plate-like porous carbon having a suction surface for sucking and holding an object and a suction surface sucked by the suction means;
An impervious body that blocks parts other than the adsorption surface and the suction surface of the porous carbon to make the part impervious;
A suction port that communicates with the suction surface and is connected to the suction means.
The porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with glassy carbon.
An adsorbent characterized by that. The air-impermeable body is a support material for supporting the plate-like porous carbon;
Having an air-impermeable surface continuous with the adsorption surface;
The member forming the air-impermeable surface is an air-impermeable carbon.
The adsorbent according to claim 1 or 2 . An adsorbent that is connected to a suction means and sucks and holds an object,
Plate-like porous carbon having a suction surface for sucking and holding an object and a suction surface sucked by the suction means;
A sealing treatment portion applied to a portion other than the adsorption surface and the suction surface of the porous carbon;
A suction port connected to the suction means and connected to the suction surface;
The porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with a thermosetting resin.
An adsorbent characterized by that. An adsorbent that is connected to a suction means and sucks and holds an object,
Plate-like porous carbon having a suction surface for sucking and holding an object and a suction surface sucked by the suction means;
A sealing treatment portion applied to a portion other than the adsorption surface and the suction surface of the porous carbon;
A suction port connected to the suction means and connected to the suction surface;
The porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with glassy carbon.
An adsorbent characterized by that. An adsorbent that is connected to a suction means and sucks and holds an object,
Plate-like porous carbon whose front surface is a suction surface for sucking and holding an object and whose back surface is a suction surface sucked by the suction means;
An air-impermeable support for accommodating and supporting the porous carbon so as to block the portion other than the suction surface and the suction surface of the porous carbon,
The support;
A side surface portion made of a carbon material that covers a side end surface of the plate-like porous carbon and has an air-impermeable surface continuous with the adsorption surface;
A bottom surface portion that covers a portion other than the suction surface on the back surface of the plate-like porous carbon and exposes the suction surface; and a bottom surface portion that is connected to the suction means and communicates with the space. ,
The porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with a thermosetting resin.
An adsorbent characterized by that. An adsorbent that is connected to a suction means and sucks and holds an object,
Plate-like porous carbon whose front surface is a suction surface for sucking and holding an object and whose back surface is a suction surface sucked by the suction means;
An air-impermeable support for accommodating and supporting the porous carbon so as to block the portion other than the suction surface and the suction surface of the porous carbon,
The support;
A side surface portion made of a carbon material that covers a side end surface of the plate-like porous carbon and has an air-impermeable surface continuous with the adsorption surface;
A bottom surface portion that covers a portion other than the suction surface on the back surface of the plate-like porous carbon and exposes the suction surface; and a bottom surface portion that is connected to the suction means and communicates with the space. ,
The porous carbon is formed of self-sinterable carbon, and the skeleton surface of the self-sinterable carbon is coated with glassy carbon.
An adsorbent characterized by that. The side part and the bottom part are made of an integral air-impermeable carbon material,
The adsorbent according to claim 7 . The porosity of the porous carbon is 10 to 50 vol%.
The adsorbent according to claim 1 or 2 or 3 or 4 or 5 or 6 or 7 or 8 . A protective film having conductivity and a surface hardness of 600 Hv or more and 10 μm or less was formed on the adsorption surface.
The adsorbent according to claim 1 or 2 or 3 or 4 or 5 or 6 or 7 or 8 or 9 . The protective film is one protective film among DLC, TiN, TiCN, TiAlN, TiCrN, CrN, and Cr.
The adsorbent according to claim 10.

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