JP4397742B2 - 半導体製造装置 - Google Patents
半導体製造装置 Download PDFInfo
- Publication number
- JP4397742B2 JP4397742B2 JP2004179946A JP2004179946A JP4397742B2 JP 4397742 B2 JP4397742 B2 JP 4397742B2 JP 2004179946 A JP2004179946 A JP 2004179946A JP 2004179946 A JP2004179946 A JP 2004179946A JP 4397742 B2 JP4397742 B2 JP 4397742B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- catalyst
- substrate support
- support pin
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000000758 substrate Substances 0.000 claims description 149
- 239000003054 catalyst Substances 0.000 claims description 55
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 15
- 238000002425 crystallisation Methods 0.000 claims description 8
- 230000008025 crystallization Effects 0.000 claims description 8
- 239000002033 PVDF binder Substances 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 28
- 239000011521 glass Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 17
- 239000007788 liquid Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 11
- 239000010409 thin film Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 4
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Coating Apparatus (AREA)
- Recrystallisation Techniques (AREA)
Description
2 塗布ノズル
3 モータ
4 HEPAフィルターユニット
5 排気口
6 位置決めピン
7 基板支持ピン
7a ピン部分
7b 台座部分
8 基板
9 筐体
10 カップ
12 触媒溶液液膜
Claims (2)
- 表面上に非結晶シリコン膜が形成された基板を基板テーブルで回転させ、回転する前記非結晶シリコン膜上に結晶化触媒溶液を塗布し、該触媒溶液の溶媒を乾燥して前記基板上に触媒を析出させる半導体製造工程に用いる半導体製造装置であって、
前記基板テーブルには、基板を支持する断熱構造の基板支持ピンが設けられ、前記基板支持ピンの断熱構造は中空構造であることを特徴とする半導体製造装置。 - 前記請求項1に記載の半導体製造装置において、前記基板支持ピンの材質はPVDFであることを特徴とする半導体製造装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004179946A JP4397742B2 (ja) | 2004-06-17 | 2004-06-17 | 半導体製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004179946A JP4397742B2 (ja) | 2004-06-17 | 2004-06-17 | 半導体製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006005157A JP2006005157A (ja) | 2006-01-05 |
JP4397742B2 true JP4397742B2 (ja) | 2010-01-13 |
Family
ID=35773271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004179946A Expired - Lifetime JP4397742B2 (ja) | 2004-06-17 | 2004-06-17 | 半導体製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4397742B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101770221B1 (ko) * | 2016-05-03 | 2017-08-22 | (주)에스티아이 | 기판지지장치 |
-
2004
- 2004-06-17 JP JP2004179946A patent/JP4397742B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2006005157A (ja) | 2006-01-05 |
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