JP2006005157A - 半導体製造装置 - Google Patents
半導体製造装置 Download PDFInfo
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- JP2006005157A JP2006005157A JP2004179946A JP2004179946A JP2006005157A JP 2006005157 A JP2006005157 A JP 2006005157A JP 2004179946 A JP2004179946 A JP 2004179946A JP 2004179946 A JP2004179946 A JP 2004179946A JP 2006005157 A JP2006005157 A JP 2006005157A
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- substrate
- catalyst
- semiconductor manufacturing
- substrate support
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Abstract
【解決手段】 基板表面上に形成した非結晶シリコン膜を結晶化するための触媒を塗布する工程において、触媒の塗布にはスピンコータ等の半導体製造装置を用いて触媒溶液を塗布して触媒を析出させる。半導体製造装置の基板8を支持する基板支持ピン7を中空の断熱構造とするものである。
【選択図】 図1
Description
2 塗布ノズル
3 モータ
4 HEPAフィルターユニット
5 排気口
6 位置決めピン
7 基板支持ピン
7a ピン部分
7b 台座部分
8 基板
9 筐体
10 カップ
12 触媒溶液液膜
Claims (3)
- 表面上に非結晶シリコン膜が形成された基板を基板テーブルで回転させ、回転する前記非結晶シリコン膜上に結晶化触媒溶液を塗布し、該触媒溶液の溶媒を乾燥して前記基板上に触媒を析出させる半導体製造工程に用いる半導体製造装置であって、
前記基板テーブルには、基板を支持する断熱構造の基板支持ピンが設けられていることを特徴とする半導体製造装置。 - 前記基板支持ピンの断熱構造は中空であることを特徴とする請求項1に記載の半導体製造装置。
- 前記基板支持ピンの材質はPVDFであることを特徴とする請求項1又は2に記載の半導体製造装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2004179946A JP4397742B2 (ja) | 2004-06-17 | 2004-06-17 | 半導体製造装置 |
Applications Claiming Priority (1)
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JP2004179946A JP4397742B2 (ja) | 2004-06-17 | 2004-06-17 | 半導体製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006005157A true JP2006005157A (ja) | 2006-01-05 |
JP4397742B2 JP4397742B2 (ja) | 2010-01-13 |
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JP2004179946A Expired - Lifetime JP4397742B2 (ja) | 2004-06-17 | 2004-06-17 | 半導体製造装置 |
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JP (1) | JP4397742B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101770221B1 (ko) * | 2016-05-03 | 2017-08-22 | (주)에스티아이 | 기판지지장치 |
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2004
- 2004-06-17 JP JP2004179946A patent/JP4397742B2/ja not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101770221B1 (ko) * | 2016-05-03 | 2017-08-22 | (주)에스티아이 | 기판지지장치 |
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Publication number | Publication date |
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JP4397742B2 (ja) | 2010-01-13 |
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