JP4391543B2 - High frequency heating device - Google Patents

High frequency heating device Download PDF

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JP4391543B2
JP4391543B2 JP2007079192A JP2007079192A JP4391543B2 JP 4391543 B2 JP4391543 B2 JP 4391543B2 JP 2007079192 A JP2007079192 A JP 2007079192A JP 2007079192 A JP2007079192 A JP 2007079192A JP 4391543 B2 JP4391543 B2 JP 4391543B2
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heating chamber
cleaning
steam
heating
frequency
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JP2007178119A (en
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浩二 神崎
雄二 早川
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/6402Aspects relating to the microwave cavity
    • H05B6/6405Self-cleaning cavity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/647Aspects related to microwave heating combined with other heating techniques
    • H05B6/6473Aspects related to microwave heating combined with other heating techniques combined with convection heating
    • H05B6/6479Aspects related to microwave heating combined with other heating techniques combined with convection heating using steam

Description

本発明は、高周波と蒸気とを組み合わせて被加熱物を加熱処理する一方、加熱処理によって汚れた加熱室内を清掃する高周波加熱装置に関する。   The present invention relates to a high-frequency heating apparatus that heats an object to be heated by combining high-frequency waves and steam, while cleaning a heating chamber that is soiled by the heat treatment.

高周波により被加熱物を加熱処理する高周波加熱装置には、高周波加熱のみの単機能型やオーブン機能の付加された複合機能型等があるが、これらの高周波加熱装置においては、被加熱物を収容して加熱処理する加熱室に、被加熱物の汁やカス等が加熱処理時に付着することがあり、これをそのまま放置していると、こびり付きや焦げが発生して加熱室内が汚れることになる。このような付着した汚れは、加熱室内を衛生的に維持する上で問題となるばかりか、高周波加熱時に発煙等が発生する要因ともなる。このため、加熱室内をこまめに清掃したり、加熱装置自身に設けられた高温焼き切り機能により、加熱室内の汚れを除去するようにしていた。   High-frequency heating devices that heat the object to be heated with high frequency include a single-function type that only has high-frequency heating and a composite function type that has an oven function added. These high-frequency heating devices contain the object to be heated. In the heating chamber, the juice or debris of the object to be heated may adhere to the heating chamber, and if left untreated, sticking or scorching will occur and the heating chamber will become dirty. . Such attached dirt not only causes a problem in maintaining the heating chamber in a sanitary manner, but also causes smoke and the like during high-frequency heating. For this reason, the heating chamber is frequently cleaned, or dirt in the heating chamber is removed by a high-temperature burn-out function provided in the heating device itself.

しかしながら、前述した加熱室内の清掃は面倒な作業であり、付着した汚れも簡単には落とせないものであった。汚れがひどい場合には中性洗剤を用いることがあり、この場合、十分な拭き取りが必要になって清掃作業が一層手の掛かるものとなる。また、高温焼き切り機能により清掃を行う場合には、汚れの一部が分解され臭気等が除去できても、付着した汚れを完全に除去することは困難なことが多く、結局、手作業に頼らざるを得ない状況にある。   However, the above-described cleaning of the heating chamber is a troublesome operation, and the attached dirt cannot be easily removed. If the dirt is severe, a neutral detergent may be used. In this case, sufficient wiping is required, and the cleaning work becomes more manual. In addition, when cleaning is performed using the high-temperature burn-out function, it is often difficult to completely remove the attached dirt even if part of the dirt is decomposed and odors can be removed. It must be in a situation.

一方、水を入れた容器を加熱室内に載置して高周波加熱し、加熱室内を蒸気で充満させることで、加熱室内に付着した汚れをその蒸気によって緩ませ、その後に清掃することにより、良好な洗浄性を得る清掃方法が知られている。しかし、この清掃方法で高周波加熱装置の加熱室内を清掃する場合には、その都度、耐熱容器に水を入れて加熱室に載置するという手間が掛かると共に、蒸気が充満するまでの間、加熱装置を監視し続けていなければならず、使い勝手が良いものではなかった。
また、蒸気を加熱室に供給する蒸気発生機能付き高周波加熱装置がいくつか提案されているが、いずれの加熱装置も、発生させる蒸気は被加熱物の加熱用であって、加熱室の清掃を目的としたものはなく、従って、加熱室の清掃用にプログラムされた自動清掃機能を備えた蒸気発生機能付き高周波加熱装置は見当たらない。つまり、上記同様に清掃時における使い勝手は良いものではなかった。
On the other hand, a container containing water is placed in a heating chamber and heated at high frequency, and the heating chamber is filled with steam, so that the dirt adhering to the heating chamber is loosened by the steam and then cleaned. A cleaning method for obtaining a good detergency is known. However, each time the heating chamber of the high-frequency heating device is cleaned by this cleaning method, it takes time to put water in the heat-resistant container and place it in the heating chamber, and heating until the steam fills up. We had to keep monitoring the device and it was not easy to use.
Several high-frequency heating devices with a steam generation function for supplying steam to the heating chamber have been proposed. In any heating device, the generated steam is used for heating an object to be heated, and the heating chamber must be cleaned. There is nothing intended, and therefore there is no high frequency heating device with a steam generating function with an automatic cleaning function programmed for cleaning the heating chamber. In other words, the usability at the time of cleaning was not good as described above.

また、上記の蒸気発生機能付き高周波加熱装置の蒸気発生部分には、蒸気発生の過程で水分中のカルシウムやマグネシウム等が濃縮され、気化部の底部や水供給用のパイプ内に沈殿固着する。すると、蒸気発生量が少なくなり、その結果、カビ等の繁殖しやすい不衛生な環境となる問題があった。特に、加熱蒸気発生のための気化部が加熱室の下方等の手の届かない部位に埋設された構成においては、上記の問題に加えて、日常における加熱室周辺の清掃作業も行いにくいという問題もあった。   Further, in the steam generation part of the high-frequency heating device with the steam generation function, calcium, magnesium, etc. in the moisture are concentrated in the course of steam generation, and settled and fixed in the bottom of the vaporization section and the water supply pipe. As a result, the amount of steam generated is reduced, and as a result, there is a problem that an unsanitary environment in which molds and the like are easy to propagate. In particular, in a configuration in which the vaporization section for generating heated steam is embedded in a part that is out of reach such as below the heating chamber, in addition to the above problems, it is difficult to perform daily cleaning work around the heating chamber There was also.

本発明は、このような状況に鑑みてなされたもので、被加熱物の加熱用に用いる蒸気を加熱室内の清掃用に用いると共に、この清掃作業を簡単に行うことのできる高周波加熱装置を提供することを目的としている。   The present invention has been made in view of such a situation, and provides a high-frequency heating apparatus that can use steam for heating an object to be heated for cleaning the heating chamber and can easily perform this cleaning operation. The purpose is to do.

上記目的達成のため、本発明に係る高周波加熱装置は、高周波加熱装置本体内に形成され被加熱物を収容する加熱室と、前記加熱室の被加熱物取出口を開閉する開閉扉と、高周波を発生し前記加熱室に高周波を供給する高周波発生部と、前記加熱室内蒸気を発生する蒸気発生部と、前記加熱室内の空気を攪拌・循環させる循環ファンと、前記開閉扉の下方に設けられた入力操作部と、前記入力操作部に設けられ清掃運転を実行可能にする清掃スイッチと、前記入力操作部からの信号を入力する制御部と、を有し、前記制御部は、前記清掃スイッチからの信号を入力し清掃運転を実行して前記加熱室内で蒸気を発生させ前記循環ファンを駆動し、前記加熱室の内面全体に蒸気を結露させ所定時間放置した後清掃を終了することを特徴とする。 To achieve the above object, a high- frequency heating device according to the present invention includes a heating chamber that is formed in a high-frequency heating device main body and accommodates an object to be heated, an open / close door that opens and closes the object to be heated in the heating chamber, a high frequency generating portion generates and supplies a high frequency to said heating chamber, a steam generator for generating steam in the heating chamber, a circulation fan for agitating and circulating the air in the heating chamber, provided below the door An input operation unit that is provided, a cleaning switch that is provided in the input operation unit and that can perform a cleaning operation, and a control unit that inputs a signal from the input operation unit. A signal from the switch is input to execute a cleaning operation to generate steam in the heating chamber, drive the circulation fan, condense the steam on the entire inner surface of the heating chamber, and leave the cleaning for a predetermined time to end cleaning. Features.

この高周波加熱装置によれば、加熱室清掃モードを実行させる信号が入力されると、制御部が加熱室内に蒸気を自動供給して加熱室内の汚れを清掃するため、煩雑な作業を行うことなく、汚れが付着した加熱室内を極めて容易に清掃でき、清潔な状態にすることができる。   According to this high-frequency heating device, when a signal for executing the heating chamber cleaning mode is input, the control unit automatically supplies steam into the heating chamber to clean dirt in the heating chamber, so that no complicated work is performed. It is possible to clean the inside of the heating chamber with dirt very easily and to keep it clean.

以下、本発明に係る高周波加熱装置の好適な実施の形態について、図面を参照して詳細に説明する。
図1は本発明に係る高周波加熱装置の開閉扉を開けた状態を示す正面図、図2はこの装置に用いられる蒸気発生部の蒸発皿を示す斜視図、図3は蒸気発生部の蒸発皿加熱ヒータと反射板を示す斜視図、図4は蒸気発生部の断面図である。
DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of a high-frequency heating device according to the invention will be described in detail with reference to the drawings.
FIG. 1 is a front view showing a state in which an opening / closing door of a high-frequency heating device according to the present invention is opened, FIG. 2 is a perspective view showing an evaporating dish of a steam generating unit used in this apparatus, and FIG. FIG. 4 is a cross-sectional view of the steam generating unit.

まず最初に、本発明に係る高周波加熱装置100の基本構成について説明する。
この蒸気発生機能付きの高周波加熱装置100は、被加熱物を収容する加熱室11に、高周波(マイクロ波)と蒸気との少なくともいずれかを供給して被加熱物を加熱処理する加熱調理器であって、高周波を発生する高周波発生部としてのマグネトロン13と、加熱室11内で蒸気を発生する蒸気発生部15と、加熱室11内の空気を撹拌・循環させる循環ファン17と、加熱室11内を循環する空気を加熱する室内気加熱ヒータとしてのコンベクションヒータ19と、加熱室11の壁面に設けた検出用孔を通じて加熱室11内の温度を検出する赤外線センサ20と、蒸気発生部15へ水を供給するための水タンク43とを備えている。
First, the basic configuration of the high-frequency heating device 100 according to the present invention will be described.
The high-frequency heating device 100 with a steam generation function is a heating cooker that supplies a high-frequency (microwave) and steam to the heating chamber 11 that houses the object to be heated to heat the object to be heated. There are a magnetron 13 as a high frequency generator for generating a high frequency, a steam generator 15 for generating steam in the heating chamber 11, a circulation fan 17 for stirring and circulating the air in the heating chamber 11, and the heating chamber 11. To the convection heater 19 as an indoor air heater that heats the air circulating inside, the infrared sensor 20 that detects the temperature in the heating chamber 11 through a detection hole provided in the wall surface of the heating chamber 11, and the steam generation unit 15 And a water tank 43 for supplying water.

加熱室11は、前面開放の箱形の高周波加熱装置本体10内部に形成されており、高周波加熱装置本体10の前面に、加熱室11の被加熱物取出口を開閉する透光窓21a付きの開閉扉21が設けられている。開閉扉21は、下端が高周波加熱装置本体10の下縁にヒンジ結合されることで開閉可能となっている。加熱室11と高周波加熱装置本体10との壁面間には所定の断熱空間が確保されており、必要に応じてその空間には断熱材が装填されている。加熱室11の背後の空間は、循環ファン17及びその駆動モータ23(図9参照)を収容した循環ファン室25となっており、加熱室11の後面の壁が、加熱室11と循環ファン室25とを画成する仕切板27となっている。仕切板27には、加熱室11側から循環ファン室25側への吸気を行う吸気用通風孔29と、循環ファン室25側から加熱室11側への送風を行う送風用通風孔31とが形成エリアを区別して設けられている。各通風孔29,31は、多数のパンチ孔として形成されている。   The heating chamber 11 is formed inside a box-shaped high-frequency heating device body 10 that is open on the front surface, and has a translucent window 21 a that opens and closes a heated object outlet of the heating chamber 11 on the front surface of the high-frequency heating device body 10. An opening / closing door 21 is provided. The open / close door 21 can be opened and closed by a lower end hinged to the lower edge of the high-frequency heating apparatus body 10. A predetermined heat insulation space is secured between the wall surfaces of the heating chamber 11 and the high-frequency heating device main body 10, and a heat insulating material is loaded in the space as necessary. The space behind the heating chamber 11 is a circulation fan chamber 25 that houses the circulation fan 17 and its drive motor 23 (see FIG. 9), and the rear wall of the heating chamber 11 is the heating chamber 11 and the circulation fan chamber. 25 is a partition plate 27 that defines 25. The partition plate 27 has an intake vent hole 29 for sucking air from the heating chamber 11 side to the circulation fan chamber 25 side, and an air vent hole 31 for blowing air from the circulation fan chamber 25 side to the heating chamber 11 side. Different formation areas are provided. Each ventilation hole 29 and 31 is formed as many punch holes.

循環ファン17は、矩形の仕切板27の中央部を回転中心として配置されており、循環ファン室25内には、この循環ファン17を取り囲むようにして矩形環状のコンベクションヒータ19が設けられている。そして、仕切板27に形成された吸気用通風孔29は循環ファン17の前面に配置され、送風用通風孔31は矩形環状のコンベクションヒータ19に沿って配置されている。循環ファン17を回すと、風は循環ファン17の前面側から駆動モータ23のある後面側に流れるように設定されているので、加熱室11内の空気が、吸気用通風孔29を通して循環ファン17の中心部に吸い込まれ、循環ファン室25内のコンベクションヒータ19を通過して、送風用通風孔31から加熱室11内に送り出される。従って、この流れにより、加熱室11内の空気が、撹拌されつつ循環ファン室25を経由して循環されるようになっている。   The circulation fan 17 is arranged with the central portion of the rectangular partition plate 27 as the center of rotation, and a rectangular annular convection heater 19 is provided in the circulation fan chamber 25 so as to surround the circulation fan 17. . The intake vent holes 29 formed in the partition plate 27 are disposed in front of the circulation fan 17, and the blower vent holes 31 are disposed along the rectangular annular convection heater 19. When the circulation fan 17 is turned, the wind is set so as to flow from the front side of the circulation fan 17 to the rear side of the drive motor 23, so that the air in the heating chamber 11 passes through the intake vent hole 29. Is passed through the convection heater 19 in the circulation fan chamber 25 and sent out from the ventilation holes 31 into the heating chamber 11. Therefore, by this flow, the air in the heating chamber 11 is circulated through the circulation fan chamber 25 while being stirred.

マグネトロン13は、例えば加熱室11の下側の空間に配置されており、マグネトロン13より発生した高周波を受ける位置にはスタラー羽根33が設けられている。そして、スタラー羽根33を回転駆動することにより、スタラー羽根33に照射されたマグネトロン13からの高周波を加熱室11内に撹拌しながら供給するようになっている。なお、マグネトロン13やスタラー羽根33は、加熱室11の底部に限らず、加熱室11の上面や側面側に設けることもできる。また、高周波加熱方式としては、ターンテーブル式であってもよい。   The magnetron 13 is disposed, for example, in a space below the heating chamber 11, and a stirrer blade 33 is provided at a position for receiving a high frequency generated from the magnetron 13. By rotating the stirrer blade 33, the high frequency from the magnetron 13 irradiated to the stirrer blade 33 is supplied into the heating chamber 11 with stirring. Note that the magnetron 13 and the stirrer blade 33 are not limited to the bottom of the heating chamber 11, but can be provided on the upper surface or the side of the heating chamber 11. Further, the high frequency heating method may be a turntable method.

蒸気発生部15は、図2に示すように加熱により蒸気を発生する水溜凹所35aを有した蒸発皿35と、蒸発皿35の下側に配設され、図3及び図4に示すように蒸発皿35を加熱する蒸発皿加熱ヒータ37と、該ヒータの輻射熱を蒸発皿35に向けて反射する断面略U字形の反射板39とから構成されている。蒸発皿35は、例えばステンレス製の細長板状のもので、加熱室11の被加熱物取出口とは反対側の奥側底面に長手方向を仕切板27に沿わせた向きで配設され、赤外線センサ20の温度検出走査による検出範囲の実質的外部に設けている。なお、蒸発皿加熱ヒータ37としては、ガラス管ヒータ、シーズヒータ、プレートヒータ等が利用できる。   As shown in FIGS. 3 and 4, the steam generating unit 15 is disposed below the evaporating dish 35 and the evaporating dish 35 having a water reservoir recess 35 a that generates steam by heating as shown in FIG. 2. It comprises an evaporating dish heater 37 that heats the evaporating dish 35 and a reflecting plate 39 having a substantially U-shaped cross section that reflects the radiant heat of the heater toward the evaporating dish 35. The evaporating dish 35 is, for example, an elongated plate made of stainless steel, and is disposed on the back bottom surface of the heating chamber 11 opposite to the heated object outlet, with the longitudinal direction along the partition plate 27, The infrared sensor 20 is provided substantially outside the detection range by temperature detection scanning. As the evaporating dish heater 37, a glass tube heater, a sheathed heater, a plate heater, or the like can be used.

ここで、図5に高周波加熱装置の側面に水タンクを収容する様子を表す説明図、図6に高周波加熱装置の側面図を示した。図5に示すように、高周波加熱装置本体10の側壁10aには水タンク用蓋41が開閉自在に設けられており、側壁10aの内部空間10bには、蒸気発生部15に水を供給するための水タンク43が脱着自在に収納されている。図6を併せて参照すると、水タンク43は薄型の矩形状で上部が開口した本体45と、本体45の開口に脱着自在に取り付けられる蓋47とを有している。蓋47には取水管取付け部49が設けられ、取水管取付け部49の下方には蓋47を貫通して本体45の底面45a付近まで延びる取水管51が設けられている。なお、取水管取付け部49の後方(図5における水タンク挿入方向先方)には、接続管53が突設されている。   Here, FIG. 5 is an explanatory view showing a state in which the water tank is housed on the side surface of the high-frequency heating device, and FIG. 6 shows a side view of the high-frequency heating device. As shown in FIG. 5, a water tank lid 41 is provided on the side wall 10a of the high-frequency heating device body 10 so as to be freely opened and closed. In order to supply water to the steam generator 15 in the internal space 10b of the side wall 10a. The water tank 43 is detachably stored. Referring also to FIG. 6, the water tank 43 includes a thin main body 45 having a rectangular shape and an upper opening, and a lid 47 detachably attached to the opening of the main body 45. The lid 47 is provided with a water intake pipe mounting portion 49, and a water intake pipe 51 that extends through the lid 47 to the vicinity of the bottom surface 45 a of the main body 45 is provided below the water intake pipe mounting portion 49. Note that a connecting pipe 53 protrudes behind the intake pipe mounting portion 49 (in the direction in which the water tank is inserted in FIG. 5).

また、図6に示すように、高周波加熱装置本体10の側壁10aの内部空間10bには、一定量の水を間欠的に吐出するポンプ55が設けられており、このポンプ55に取水側配管55aと供給側配管55bが接続されている。取水側配管55aのポンプ55側とは反対側の先端は、水タンク43が高周波加熱装置本体10内に収納された際に、水タンク43の接続管53の端部が脱着自在に接続されるジョイント部56に繋がっている。一方、供給側配管55bは、配管57を介して蒸気発生部15の蒸発皿35に接続されている。側壁10aの内部空間10bにおける、水タンク43の取水管取付け部49の上方位置には、水タンク43の脱着を検出するための水タンク脱着検出部59が設けられており、水タンク43が収納されているか否かを検出する。   As shown in FIG. 6, a pump 55 that intermittently discharges a constant amount of water is provided in the internal space 10 b of the side wall 10 a of the high-frequency heating device main body 10. And the supply side pipe 55b are connected. The end of the water intake side pipe 55a opposite to the pump 55 side is detachably connected to the end of the connection pipe 53 of the water tank 43 when the water tank 43 is accommodated in the high-frequency heating device main body 10. It is connected to the joint part 56. On the other hand, the supply side pipe 55 b is connected to the evaporating dish 35 of the steam generating unit 15 through the pipe 57. In the internal space 10b of the side wall 10a, a water tank attachment / detachment detection portion 59 for detecting the attachment / detachment of the water tank 43 is provided above the intake pipe attachment portion 49 of the water tank 43, and the water tank 43 is accommodated. It is detected whether it is done.

図7に高周波加熱装置100の開閉扉の一部を示すように、高周波加熱装置100の前面側の開閉扉21下方には、入力操作部61及び表示部63が設けられている。入力操作部61には、加熱調理の開始を指示するスタートスイッチ65、清掃を行う清掃スイッチ81、設定ダイアル82(信号入力手段)等が設けられている。また、表示部63には、報知手段としての表示パネル75等が設けられている。また、図示はしないが、音声や警告音を発する機能があってもよい。   As shown in a part of the opening / closing door of the high-frequency heating device 100 in FIG. 7, an input operation unit 61 and a display unit 63 are provided below the opening / closing door 21 on the front side of the high-frequency heating device 100. The input operation unit 61 is provided with a start switch 65 that instructs the start of cooking, a cleaning switch 81 that performs cleaning, a setting dial 82 (signal input means), and the like. Further, the display unit 63 is provided with a display panel 75 or the like as notification means. Further, although not shown, there may be a function of emitting a sound or a warning sound.

清掃スイッチ81は、このスイッチを押下することにより、各種モードの清掃運転を行うことができるようになっている。また、表示パネル75の両側部には、設定ダイアル82が設けられており、この設定ダイアル82を回すことにより、各種の設定を選択することができるようになっている。   The cleaning switch 81 can perform cleaning operations in various modes by pressing this switch. In addition, setting dials 82 are provided on both sides of the display panel 75, and various settings can be selected by turning the setting dial 82.

ここで、清掃モードとしては、蒸発皿清掃モード、加熱室清掃モード、脱臭モードがあり、清掃スイッチ81を押下した後に、設定ダイアル82を回すことにより、これら各種の清掃モードを任意に選択できるようになっている。そして、この設定ダイアル82によってモードを選択した状態で、スタートスイッチ65を押下することにより、高周波加熱装置100が、選択した清掃モードを実行するようになっている。   Here, as the cleaning mode, there are an evaporating dish cleaning mode, a heating chamber cleaning mode, and a deodorizing mode. After pressing the cleaning switch 81, the setting dial 82 is turned so that these various cleaning modes can be arbitrarily selected. It has become. Then, when the mode is selected by the setting dial 82, when the start switch 65 is pressed, the high frequency heating device 100 executes the selected cleaning mode.

図8は、清掃モードの制御系を示す制御ブロック図である。この制御系では、入力操作部61からの入力信号が入力される制御部83を有しており、この制御部83には、蒸発皿加熱ヒータ37、循環ファン17を回転させる駆動モータ23、蒸発皿へ水を供給するポンプ55をそれぞれ接続して、制御部83によって統括制御するようになっている。また、この制御部83は、蒸発皿35の温度を検知するサーミスタ等の温度センサ84を接続しており、この温度センサ84からの検知信号を入力することで、蒸発皿加熱ヒータ37等のフィードバック制御が行われる。そして、制御部83は入力操作部61からの入力信号及び温度センサ84からの検知信号に基づいて、蒸発皿加熱ヒータ37、駆動モータ23、ポンプ55を所定のシーケンスに基づいて制御する。   FIG. 8 is a control block diagram illustrating a control system in the cleaning mode. The control system includes a control unit 83 to which an input signal from the input operation unit 61 is input. The control unit 83 includes an evaporating dish heater 37, a drive motor 23 that rotates the circulation fan 17, and evaporation. Pumps 55 for supplying water to the dishes are connected to each other, and are controlled by the control unit 83. Further, the control unit 83 is connected to a temperature sensor 84 such as a thermistor for detecting the temperature of the evaporating dish 35, and by inputting a detection signal from the temperature sensor 84, feedback from the evaporating dish heater 37, etc. Control is performed. The control unit 83 controls the evaporating dish heater 37, the drive motor 23, and the pump 55 based on a predetermined sequence based on the input signal from the input operation unit 61 and the detection signal from the temperature sensor 84.

以上説明した構成の高周波加熱装置100による基本加熱動作の一例として、蒸気加熱時の動作を説明する。
高周波加熱モード、蒸気加熱モード、オーブン加熱モード等の各種加熱モードのうち、蒸気加熱モードを選択してスタートスイッチ65を押下すると、図9に本高周波加熱装置100の動作説明図を示すように、蒸発皿加熱ヒータ37がONにされることで、水タンク43からポンプ55によって供給される蒸発皿35内の水が加熱され、蒸気Sが発生する。蒸発皿35から上昇する蒸気Sは、仕切板27の略中央部に設けた吸気用通風孔29から循環ファン17の中心部に吸引され、循環ファン室25を経由して、仕切板27の周部に設けた送風用通風孔31から、加熱室11内へ向けて吹き出される。
As an example of the basic heating operation by the high-frequency heating device 100 having the above-described configuration, an operation during steam heating will be described.
When a steam heating mode is selected from various heating modes such as a high-frequency heating mode, a steam heating mode, and an oven heating mode and the start switch 65 is pressed, as shown in FIG. When the evaporating dish heater 37 is turned on, water in the evaporating dish 35 supplied from the water tank 43 by the pump 55 is heated, and steam S is generated. The steam S rising from the evaporating dish 35 is sucked into the central portion of the circulation fan 17 from the intake vent hole 29 provided in the substantially central portion of the partition plate 27, and passes through the circulation fan chamber 25 to surround the partition plate 27. It blows out toward the inside of the heating chamber 11 from the ventilation hole 31 for ventilation provided in the part.

吹き出された蒸気は、加熱室11内において撹拌されて、再度、仕切板27の略中央部の吸気用通風孔29から循環ファン室25側に吸引される。これにより加熱室11内と循環ファン室25に循環経路が形成される。なお、仕切板27の循環ファン17の配置位置下方には送風用通風孔31を設けずに、発生した蒸気を吸気用通風孔29に導かれるようにしている。従って、図中白抜き矢印で示すように、蒸気が加熱室11を循環し、被加熱物Mに効率よく蒸気が吹き付けられる。   The blown-out steam is stirred in the heating chamber 11 and again sucked into the circulation fan chamber 25 side from the intake vent hole 29 at the substantially central portion of the partition plate 27. Thereby, a circulation path is formed in the heating chamber 11 and the circulation fan chamber 25. The generated steam is guided to the intake vent hole 29 without providing the ventilation vent hole 31 below the position where the circulation fan 17 is disposed on the partition plate 27. Therefore, as shown by the white arrow in the figure, the steam circulates through the heating chamber 11, and the steam is efficiently sprayed on the object to be heated M.

この際、室内気加熱ヒータ19によって、加熱室11内の蒸気を加熱できるので、加熱室11内を循環する蒸気の温度を高温に設定することもできる。従って、いわゆる過熱蒸気が得られて、被加熱物Mの表面に焦げ目を付けた加熱調理も可能となる。   At this time, since the steam in the heating chamber 11 can be heated by the room air heater 19, the temperature of the steam circulating in the heating chamber 11 can be set to a high temperature. Therefore, so-called superheated steam is obtained, and heating cooking with a burnt surface on the surface of the article to be heated M is also possible.

また、高周波加熱を行う場合は、マグネトロン13をONにし、スタラー羽根33を回転することで、高周波を加熱室11内に撹拌しながら供給する。本高周波加熱装置100では、蒸気と高周波とを組み合わせた高周波加熱処理を行うことができる。   When performing high frequency heating, the magnetron 13 is turned on and the stirrer blade 33 is rotated to supply high frequency into the heating chamber 11 while stirring. In the high-frequency heating apparatus 100, high-frequency heat treatment combining steam and high-frequency can be performed.

以上が通常の蒸気加熱を含む加熱処理の手順である。次に、本発明の特徴部分である加熱室内清掃機能について以下に説明する。
入力操作部61によって清掃モードが選択・実行された場合の高周波加熱装置100の作用を図10に示すフローチャート図に沿って説明する。
入力操作部61の清掃スイッチ81を押下すると(ステップ1、以下S1と称する)、入力操作部61から制御部83へ入力信号を送信して制御部83が清掃モードの選択待機状態となる(S2)。そして、この状態で設定ダイアル82を回すことにより、蒸発皿清掃モード、加熱室清掃モード、或いは脱臭モードを選択する。いずれかの清掃モードを選択してスタートスイッチ65を押下すると、選択された清掃モードによる運転が開始される(S3、S4)。
The above is the heat treatment procedure including normal steam heating. Next, the heating chamber cleaning function, which is a feature of the present invention, will be described below.
The operation of the high-frequency heating device 100 when the cleaning mode is selected and executed by the input operation unit 61 will be described with reference to the flowchart shown in FIG.
When the cleaning switch 81 of the input operation unit 61 is pressed (step 1, hereinafter referred to as S1), an input signal is transmitted from the input operation unit 61 to the control unit 83, and the control unit 83 enters a cleaning mode selection standby state (S2). ). Then, the evaporating dish cleaning mode, the heating chamber cleaning mode, or the deodorizing mode is selected by turning the setting dial 82 in this state. When one of the cleaning modes is selected and the start switch 65 is pressed, operation in the selected cleaning mode is started (S3, S4).

ここで、各清掃モードについて図11及び図12に示すフローチャート図に沿って説明する。
(蒸発皿清掃モード)
まず、蒸発皿35内に、クエン酸を水に溶解した洗浄液を注入する(S11)。この状態で、蒸発皿清掃モードを選択してスタートスイッチ65を押下すると、蒸発皿加熱ヒータ37によって蒸発皿35が加熱され、蒸発皿35内の洗浄液が約1分程度で約80℃に加熱される(S12)。そして、蒸発皿加熱ヒータ37は、5分間、洗浄液の温度を約60〜80℃の状態を維持するように断続的に作動される(S13)。その後、拭き取りが可能な40℃程度にまで徐々に温度を下げて、蒸発皿35の漬け置き処理が行われる。
Here, each cleaning mode will be described with reference to the flowcharts shown in FIGS. 11 and 12.
(Evaporation dish cleaning mode)
First, a cleaning solution in which citric acid is dissolved in water is poured into the evaporating dish 35 (S11). In this state, when the evaporating dish cleaning mode is selected and the start switch 65 is pressed, the evaporating dish 35 is heated by the evaporating dish heater 37, and the cleaning liquid in the evaporating dish 35 is heated to about 80 ° C. in about 1 minute. (S12). Then, the evaporating dish heater 37 is operated intermittently so as to maintain the temperature of the cleaning liquid at about 60 to 80 ° C. for 5 minutes (S13). Thereafter, the temperature is gradually lowered to about 40 ° C. where wiping can be performed, and the evaporating dish 35 is soaked.

洗浄液への漬け置き時間が所定時間(例えば加熱開始から約30分)経過したら(S14)、清掃処理の終了を報知するため、音声や警報音等とともに表示パネル75に清掃終了の旨を表示する(S15)。以上の清掃終了を確認したら、開閉扉21を開き、蒸発皿35を布等により拭き取る(S16)。
このような蒸発皿清掃モードを行うことにより、蒸発皿35に付着したカルシウムやマグネシウム等の付着物がクエン酸により分解され、確実かつ容易に除去できる。
なお、洗浄液としては食品衛生上安全でカルシウムやマグネシウム等の分解に効果の高いクエン酸を好適に用いているが、これに限らず、クエン酸溶液に界面活性剤等を添加して、油成分の汚れに対しても洗浄性を高めるようにしてもよく、また、他の洗浄液を用いてもよい。
When a predetermined time (for example, about 30 minutes from the start of heating) elapses in the cleaning liquid (S14), the end of cleaning is displayed on the display panel 75 together with a sound, an alarm sound, etc. in order to notify the end of the cleaning process. (S15). After confirming the completion of the above cleaning, the door 21 is opened and the evaporating dish 35 is wiped off with a cloth or the like (S16).
By performing such an evaporating dish cleaning mode, deposits such as calcium and magnesium adhering to the evaporating dish 35 are decomposed by citric acid and can be reliably and easily removed.
Note that citric acid that is safe for food hygiene and highly effective in decomposing calcium, magnesium, etc. is suitably used as the cleaning liquid, but is not limited to this, and a surfactant or the like is added to the citric acid solution to obtain an oil component. It is also possible to improve the cleaning performance against dirt, and other cleaning liquids may be used.

(加熱室清掃モード)
加熱室清掃モードを選択してスタートスイッチ65を押下すると、水タンク43からポンプ55によって蒸発皿35内に水が間欠的に供給される(S21)。そして、蒸発皿加熱ヒータ37がONにされ、これにより、蒸発皿35内の水が加熱され、蒸気が発生する(S22)。さらに、循環ファン17の駆動モータ23を断続的に駆動する(S23)。このときの駆動モータ23の駆動は、例えば30秒に2秒程度駆動するような断続運転とする。これにより、前述の図9に示す循環風が得られ、発生した蒸気が加熱室11内の上方に滞留して偏ることなく分散され、加熱室11の内面全体に蒸気が結露した状態となる。
(Heating chamber cleaning mode)
When the heating chamber cleaning mode is selected and the start switch 65 is pressed, water is intermittently supplied from the water tank 43 into the evaporating dish 35 by the pump 55 (S21). Then, the evaporating dish heater 37 is turned on, whereby the water in the evaporating dish 35 is heated and steam is generated (S22). Further, the drive motor 23 of the circulation fan 17 is intermittently driven (S23). At this time, the drive motor 23 is driven intermittently, for example, for about 2 seconds per 30 seconds. As a result, the circulating air shown in FIG. 9 is obtained, and the generated steam stays in the heating chamber 11 and is distributed without being biased, so that the steam is condensed on the entire inner surface of the heating chamber 11.

そして、約5〜8分の所定時間の経過後(S24)、ポンプ55及び駆動モータ23をOFFにし(S25)、この結露した状態で放置する(S26)。加熱室清掃モードの開始から30分経過したら(S27)、清掃の終了を知らせるため、音声や警報音等とともに表示パネル75に清掃終了の旨を表示する(S28)。清掃終了を確認したら、開閉扉21を開き、加熱室11の内面を布等により拭き取る(S29)。
このような加熱室清掃モードを行うことにより、加熱室11の内面にこびり付いた被加熱物Mからの飛散物等の汚れが加熱室11の内面から浮き上がる。この加熱室内面との密着度が低下した状態で、付着している汚れを拭き取ることで、汚れが一気に除去できるようになる。
Then, after a lapse of a predetermined time of about 5 to 8 minutes (S24), the pump 55 and the drive motor 23 are turned off (S25) and left in the dewed state (S26). When 30 minutes have elapsed from the start of the heating chamber cleaning mode (S27), in order to notify the end of cleaning, a message indicating the end of cleaning is displayed on the display panel 75 together with voice, alarm sound, etc. (S28). When the completion of cleaning is confirmed, the opening / closing door 21 is opened, and the inner surface of the heating chamber 11 is wiped with a cloth or the like (S29).
By performing such a heating chamber cleaning mode, dirt such as scattered matter from the heated object M sticking to the inner surface of the heating chamber 11 rises from the inner surface of the heating chamber 11. The dirt can be removed all at once by wiping off the attached dirt in a state where the degree of adhesion with the inner surface of the heating chamber is lowered.

なお、蒸気蒸発皿清掃モードと加熱室清掃モードとともに用意された脱臭モードにおいては、次の動作が行われる。
脱臭モードを選択してスタートスイッチ65を押下すると、コンベクションヒータ19及び循環ファン17の駆動モータ23がそれぞれ作動し、加熱室11内を約230℃相当まで加熱し、表面にセルフクリーニング加工が施された加熱室11の内面で、調理時に被加熱物Mから飛散して付着した油等の臭いのもとである付着物が焼き切られる。
In the deodorization mode prepared together with the steam evaporating dish cleaning mode and the heating chamber cleaning mode, the following operation is performed.
When the deodorization mode is selected and the start switch 65 is pressed, the convection heater 19 and the drive motor 23 of the circulation fan 17 are operated to heat the inside of the heating chamber 11 to about 230 ° C., and the surface is subjected to self-cleaning processing. On the inner surface of the heating chamber 11, the deposit that is the source of the odor of oil or the like scattered and adhered from the heated object M during cooking is burned out.

このように、上記構造の高周波加熱装置100によれば、制御部83が入力操作部61に入力された信号に基づいて、蒸気発生部15、給水用のポンプ55、循環ファン17等を制御して所望の清掃モードを実行することにより、加熱室11の内面や蒸発皿35の清掃を簡単な操作により行うことができ、煩雑な作業を行うことなく、汚れが付着した加熱室11の内面や蒸発皿35を極めて容易に清掃でき、清潔な状態にできる。   Thus, according to the high-frequency heating device 100 having the above structure, the control unit 83 controls the steam generation unit 15, the water supply pump 55, the circulation fan 17, and the like based on the signal input to the input operation unit 61. By executing a desired cleaning mode, the inner surface of the heating chamber 11 and the evaporating dish 35 can be cleaned by a simple operation, and without performing complicated work, The evaporating dish 35 can be cleaned very easily and can be kept clean.

即ち、蒸発皿清掃モードでは、蒸発皿35にクエン酸溶液からなる洗浄液を注入して、所定温度に加熱して漬け置きすることにより、蒸発皿35に付着したカルシウムやマグネシウム等の汚れが分解される。これにより、蒸発皿35を拭き取るだけで、確実かつ容易に付着物を除去することができる。また、加熱室清掃モードでは、加熱室11の内面を蒸気によって結露させ、加熱室11の内面に付着した汚れを浮き上がらせることにより、汚れの拭き取りを容易にし、これにより、加熱室11の内面を清潔な状態にすることができる。   That is, in the evaporating dish cleaning mode, a cleaning liquid made of a citric acid solution is poured into the evaporating dish 35, and heated and soaked at a predetermined temperature, so that dirt such as calcium and magnesium adhering to the evaporating dish 35 is decomposed. The Thereby, the deposits can be reliably and easily removed simply by wiping the evaporating dish 35. Further, in the heating chamber cleaning mode, the inner surface of the heating chamber 11 is condensed with steam, and the dirt adhering to the inner surface of the heating chamber 11 is lifted, thereby facilitating the wiping of the dirt. It can be in a clean state.

また、各清掃モードでは、スタートスイッチ65を押下した後は高周波加熱装置100側で自動的に清掃を行うため、操作者は常に高周波加熱装置100を監視する必要はなく、清掃終了が報知されるまで、何ら拘束を受けることがない。また、清掃終了後は、通常では取れにくかった汚れが、極めて簡単に除去できる状態になっており、力をかけずに軽く拭き取るだけで十分に汚れを払拭でき、良好な洗浄効果を簡単に得ることができる。   In each cleaning mode, after the start switch 65 is pressed, the high-frequency heating apparatus 100 automatically performs cleaning, so that the operator does not always have to monitor the high-frequency heating apparatus 100 and is notified of the end of cleaning. Until then, no restraint. In addition, after cleaning is finished, dirt that was usually difficult to remove is in a state that can be removed very easily, and it can be sufficiently wiped off by lightly wiping without applying force, easily obtaining a good cleaning effect be able to.

なお、本発明に係る高周波加熱装置は、前述した各実施形態に限定されるものでなく、発明の主旨を逸脱しない範囲で適宜な変形、改良等が可能である。   The high-frequency heating device according to the present invention is not limited to the above-described embodiments, and appropriate modifications and improvements can be made without departing from the spirit of the invention.

以上説明したように、本発明に係る高周波加熱装置によれば、信号入力手段を介して制御部に入力される信号に基づいて、指定された清掃モードを実行することにより、煩雑な作業を行うことなく、汚れが付着した加熱室内を極めて容易に清掃することができる。   As described above, according to the high-frequency heating device according to the present invention, a complicated operation is performed by executing a designated cleaning mode based on a signal input to the control unit via the signal input means. The heating chamber in which dirt is attached can be cleaned very easily.

本発明に係る高周波加熱装置の開閉扉を開けた状態を示す正面図である。It is a front view which shows the state which opened the opening / closing door of the high frequency heating apparatus which concerns on this invention. 図1の高周波加熱装置に用いられる蒸気発生部の蒸発皿を示す斜視図である。It is a perspective view which shows the evaporating dish of the steam generation part used for the high frequency heating apparatus of FIG. 蒸気発生部の蒸発皿加熱ヒータと反射板を示す斜視図である。It is a perspective view which shows the evaporating dish heater of a steam generation part, and a reflecting plate. 蒸気発生部の断面図である。It is sectional drawing of a steam generation part. 高周波加熱装置の側面に水タンクを収容する様子を表す説明図である。It is explanatory drawing showing a mode that a water tank is accommodated in the side surface of a high frequency heating device. 高周波加熱装置の側面図である。It is a side view of a high frequency heating device. 高周波加熱装置の入力操作部及び表示部が設けられた開閉扉の正面図である。It is a front view of the opening-and-closing door provided with the input operation part and display part of a high frequency heating device. 高周波加熱装置の制御ブロック図である。It is a control block diagram of a high frequency heating device. 高周波加熱装置の動作説明図である。It is operation | movement explanatory drawing of a high frequency heating apparatus. 高周波加熱装置の清掃モードを説明するフローチャートである。It is a flowchart explaining the cleaning mode of a high frequency heating apparatus. 高周波加熱装置の蒸発皿清掃モードを説明するフローチャートである。It is a flowchart explaining the evaporating dish cleaning mode of a high frequency heating device. 高周波加熱装置の加熱室清掃モードを説明するフローチャートである。It is a flowchart explaining the heating chamber cleaning mode of a high frequency heating device.

符号の説明Explanation of symbols

11 加熱室
13 マグネトロン(高周波発生部)
15 蒸気発生部
35 蒸発皿
37 蒸発皿加熱ヒータ(蒸発皿加熱手段)
43 水タンク
57 配管(給水管路)
55 ポンプ
83 制御部
100 高周波加熱装置
M 被加熱物
11 Heating chamber 13 Magnetron (High frequency generator)
15 Steam generating part 35 Evaporating dish 37 Evaporating dish heater (evaporating dish heating means)
43 Water tank 57 Piping (water supply line)
55 Pump 83 Control unit 100 High-frequency heating device M Object to be heated

Claims (1)

高周波加熱装置本体内に形成され被加熱物を収容する加熱室と、前記加熱室の被加熱物取出口を開閉する開閉扉と、高周波を発生し前記加熱室に高周波を供給する高周波発生部と、前記加熱室内蒸気を発生する蒸気発生部と、前記加熱室内の空気を攪拌・循環させる循環ファンと、前記開閉扉の下方に設けられた入力操作部と、前記入力操作部に設けられ清掃運転を実行可能にする清掃スイッチと、前記入力操作部からの信号を入力する制御部と、を有し、
前記制御部は、前記清掃スイッチからの信号を入力し清掃運転を実行して前記加熱室内で蒸気を発生させ前記循環ファンを駆動し、前記加熱室の内面全体に蒸気を結露させ所定時間放置した後清掃を終了することを特徴とする高周波加熱装置。
A heating chamber that is formed in the main body of the high-frequency heating device and accommodates an object to be heated, an open / close door that opens and closes the object to be heated in the heating chamber, and a high-frequency generator that generates a high frequency and supplies the heating chamber with a high frequency a steam generator for generating steam in the heating chamber, a circulation fan for agitating and circulating the air in the heating chamber, and an input operation unit that is provided under the door, provided on the input operation unit cleaning A cleaning switch that enables operation, and a control unit that inputs a signal from the input operation unit,
The control unit inputs a signal from the cleaning switch and executes a cleaning operation to generate steam in the heating chamber and drive the circulation fan to condense the vapor on the entire inner surface of the heating chamber and leave it for a predetermined time. A high-frequency heating device, wherein post-cleaning is terminated .
JP2007079192A 2007-03-26 2007-03-26 High frequency heating device Expired - Fee Related JP4391543B2 (en)

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KR100938587B1 (en) 2007-12-12 2010-01-26 엘지전자 주식회사 Oven
KR101152540B1 (en) 2009-04-06 2012-06-01 엘지전자 주식회사 Method for cleaning cooking chamber in cooker
KR101152560B1 (en) 2009-04-06 2012-06-01 엘지전자 주식회사 Method for cleaning steam generator for cooker
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